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CN1295768C - Integrated Circuit or Discrete Components Ultra-thin Footless Packaging Technology and Packaging Structure - Google Patents

Integrated Circuit or Discrete Components Ultra-thin Footless Packaging Technology and Packaging Structure Download PDF

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Publication number
CN1295768C
CN1295768C CNB2004100416456A CN200410041645A CN1295768C CN 1295768 C CN1295768 C CN 1295768C CN B2004100416456 A CNB2004100416456 A CN B2004100416456A CN 200410041645 A CN200410041645 A CN 200410041645A CN 1295768 C CN1295768 C CN 1295768C
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layer
metal
chip
silver
area
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CN1599046A (en
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梁志忠
黄能捷
韩蔚华
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Changdian Technology Management Co ltd
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Jiangsu Changjiang Electronics Technology Co Ltd
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    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L24/00Arrangements for connecting or disconnecting semiconductor or solid-state bodies; Methods or apparatus related thereto
    • H01L24/93Batch processes
    • H01L24/95Batch processes at chip-level, i.e. with connecting carried out on a plurality of singulated devices, i.e. on diced chips
    • H01L24/97Batch processes at chip-level, i.e. with connecting carried out on a plurality of singulated devices, i.e. on diced chips the devices being connected to a common substrate, e.g. interposer, said common substrate being separable into individual assemblies after connecting
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/26Layer connectors, e.g. plate connectors, solder or adhesive layers; Manufacturing methods related thereto
    • H01L2224/31Structure, shape, material or disposition of the layer connectors after the connecting process
    • H01L2224/32Structure, shape, material or disposition of the layer connectors after the connecting process of an individual layer connector
    • H01L2224/321Disposition
    • H01L2224/32151Disposition the layer connector connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive
    • H01L2224/32221Disposition the layer connector connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked
    • H01L2224/32245Disposition the layer connector connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked the item being metallic
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/42Wire connectors; Manufacturing methods related thereto
    • H01L2224/47Structure, shape, material or disposition of the wire connectors after the connecting process
    • H01L2224/48Structure, shape, material or disposition of the wire connectors after the connecting process of an individual wire connector
    • H01L2224/4805Shape
    • H01L2224/4809Loop shape
    • H01L2224/48091Arched
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/42Wire connectors; Manufacturing methods related thereto
    • H01L2224/47Structure, shape, material or disposition of the wire connectors after the connecting process
    • H01L2224/48Structure, shape, material or disposition of the wire connectors after the connecting process of an individual wire connector
    • H01L2224/481Disposition
    • H01L2224/48151Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive
    • H01L2224/48221Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked
    • H01L2224/48245Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked the item being metallic
    • H01L2224/48247Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked the item being metallic connecting the wire to a bond pad of the item
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/42Wire connectors; Manufacturing methods related thereto
    • H01L2224/47Structure, shape, material or disposition of the wire connectors after the connecting process
    • H01L2224/48Structure, shape, material or disposition of the wire connectors after the connecting process of an individual wire connector
    • H01L2224/484Connecting portions
    • H01L2224/48463Connecting portions the connecting portion on the bonding area of the semiconductor or solid-state body being a ball bond
    • H01L2224/48465Connecting portions the connecting portion on the bonding area of the semiconductor or solid-state body being a ball bond the other connecting portion not on the bonding area being a wedge bond, i.e. ball-to-wedge, regular stitch
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/73Means for bonding being of different types provided for in two or more of groups H01L2224/10, H01L2224/18, H01L2224/26, H01L2224/34, H01L2224/42, H01L2224/50, H01L2224/63, H01L2224/71
    • H01L2224/732Location after the connecting process
    • H01L2224/73251Location after the connecting process on different surfaces
    • H01L2224/73265Layer and wire connectors
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/93Batch processes
    • H01L2224/95Batch processes at chip-level, i.e. with connecting carried out on a plurality of singulated devices, i.e. on diced chips
    • H01L2224/97Batch processes at chip-level, i.e. with connecting carried out on a plurality of singulated devices, i.e. on diced chips the devices being connected to a common substrate, e.g. interposer, said common substrate being separable into individual assemblies after connecting
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/10Details of semiconductor or other solid state devices to be connected
    • H01L2924/11Device type
    • H01L2924/14Integrated circuits

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  • Engineering & Computer Science (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Laminated Bodies (AREA)
  • Structures Or Materials For Encapsulating Or Coating Semiconductor Devices Or Solid State Devices (AREA)

Abstract

The invention relates to an integrated circuit or discrete component ultra-thin pin-less packaging process and a packaging structure thereof, which comprises the following process steps: taking a substrate; coating dry ink on the substrate; etching the chip area and the inner pin area of the routing on the substrate; coating a layer of metal, metal activation layer, copper metal or alloy layer on the substrate; plating a silver layer or a nickel layer and a palladium layer on the copper metal or the alloy layer in the inner pin area of the routing; stripping the dry ink layer; coating silver glue on the copper or alloy layer of the chip area; implanting a chip on the silver colloid; routing operation; plastic packaging operation; laser printing; stripping the bottom metal substrate; sticking on the blue glue film; and (5) dividing the envelope. The invention has the advantages of strong weldability, excellent quality, lower cost, smooth production, strong applicability, high efficiency of the cutting machine and the blade, flexible arrangement of multiple chips, no occurrence of various troubles of plastic permeation and environmental protection.

Description

集成电路或分立元件超薄无脚封装工艺及其封装结构Integrated Circuit or Discrete Components Ultra-thin Footless Packaging Technology and Packaging Structure

技术领域:Technical field:

本发明涉及一种集成电路或分立元件超薄无脚封装工艺及其封装结构。属集成电路或分立元件封装技术领域。The invention relates to an ultra-thin and footless packaging process for integrated circuits or discrete components and a packaging structure thereof. It belongs to the technical field of packaging of integrated circuits or discrete components.

背景技术:Background technique:

传统的集成电路或分立元件超薄无脚封装工艺及其封装结构,其封装型式为列陈式集合体经切割成为单一的单元。其基板型式为蚀刻。其主要存在以下不足:The traditional ultra-thin and footless packaging process of integrated circuits or discrete components and its packaging structure, its packaging type is an array-type assembly that is cut into a single unit. Its substrate type is etched. It mainly has the following deficiencies:

1、需使用专用胶带,为了要防止塑料高压包封时,其塑料会渗透到引线框上,增加焊点绝缘的危机,而且如果发生塑料渗透时的后处理很容易将焊点金属层破坏,影响焊性能力,如此材料成本,后处理成本及品质都有一定程度的影响。1. Special adhesive tape is required. In order to prevent the plastic from penetrating into the lead frame during high-pressure encapsulation, increasing the risk of solder joint insulation, and if the post-treatment of plastic penetration occurs, it is easy to destroy the metal layer of the solder joint. Affects weldability, so material cost, post-processing cost and quality all have a certain degree of influence.

2、为了使打线工艺及输出焊点,在此工艺中能顺利生产,所以在基板的两面镀上昂贵的钯材,除了电镀成本比较高之外,打线参数也要针对此材质设定特殊的参数,造成因为参数不统一直接影响生产线的顺畅性。2. In order to make the wire bonding process and output solder joints can be produced smoothly in this process, expensive palladium materials are plated on both sides of the substrate. In addition to the relatively high cost of electroplating, the wire bonding parameters must also be set for this material Due to the special parameters, the smoothness of the production line is directly affected by the inconsistency of the parameters.

3、基板一般使用的材质是使用CU194的材质,其导电率仅有65%且散热速率也比较慢,仅适合一般逻辑性或低功率的产品。3. The substrate is generally made of CU194, which has a conductivity of only 65% and a relatively slow heat dissipation rate, which is only suitable for general logic or low-power products.

4、因为使用专用化学胶带再各种高温工艺中胶带的溶剂容易因为高温而气化出来,间接污染或覆盖芯片的铝垫即打线的内脚,常常造成打线能力的不稳定。4. Because the use of special chemical tape and the solvent of the tape in various high-temperature processes are easy to vaporize due to high temperature, the aluminum pad that covers the chip, that is, the inner foot of the wire, is indirectly polluted or covered, which often causes instability in the wire bonding ability.

5、因为此产品是塑料加铜材质,所以在不同的材质下不能使用相同的刀片及刀片旋转速度来对列陈式集成电路或分立元件集合体进行分割,两种刀片也不能一样,而如果要强迫使用相同的刀片即转速参数时,则刀片的寿命则会大打折扣,当然维修成本及品质都会受到一定的影响。5. Because this product is made of plastic and copper, the same blade and blade rotation speed cannot be used to divide the array integrated circuit or discrete component assembly under different materials, and the two blades cannot be the same, and if When forcing the use of the same blade, that is, the speed parameter, the life of the blade will be greatly reduced. Of course, the maintenance cost and quality will be affected to a certain extent.

6、因为采用传统工艺的限制,造成多芯片及不同输出的焊点,也仅能死板的排列,活用性明显的大打折扣。6. Due to the limitation of the traditional technology, the solder joints of multiple chips and different outputs can only be arranged in a rigid manner, and the flexibility is obviously greatly reduced.

7、因为采用传统工艺的限制,造成输出的焊点也与塑料包封体底部是一样平,甚至有凹陷的危机,而在表面贴装时助焊剂,除锈剂及其他的化学药剂等都无法顺利排出,所以在焊性能力上是比较会大打折扣。7. Due to the limitation of the traditional process, the output solder joints are as flat as the bottom of the plastic package, and there is even a risk of depression, while flux, rust remover and other chemicals are all used in surface mounting. It cannot be discharged smoothly, so the solderability will be greatly reduced.

发明内容:Invention content:

本发明的目的在于克服上述不足,提供一种焊性能力强、品质优良、成本较低、生产顺畅、适用性较强、切割机具及刀片可以发挥出最高的效率、多芯片排列灵活、不会发生塑料渗透的种种困扰以及环保的集成电路或分立元件超薄无脚封装工艺及其封装结构。The purpose of the present invention is to overcome the above disadvantages, to provide a welding ability, high quality, low cost, smooth production, strong applicability, cutting tools and blades can play the highest efficiency, flexible arrangement of multi-chip, will not All kinds of troubles caused by plastic penetration, as well as the ultra-thin and footless packaging process and packaging structure of environmentally friendly integrated circuits or discrete components.

本发明的目的是这样实现的:一种集成电路或分立元件超薄无脚封装工艺及其封装结构,包括以下工艺步骤:The purpose of the present invention is achieved in this way: an ultra-thin and footless packaging process for integrated circuits or discrete components and its packaging structure, including the following process steps:

1)取一片适合厚度的金属基板材;1) Take a piece of metal substrate with suitable thickness;

2)在金属基板上进行干墨涂布,其用意是方便后续各项必要区域金属浅镀中与不必要的区域作绝缘的程序。金属基板上没有被涂上干墨的区域形成芯片区及打线的内脚区;2) Dry ink coating is carried out on the metal substrate, and its purpose is to facilitate the subsequent procedure of insulating unnecessary areas in metal plating in necessary areas. The area on the metal substrate that is not coated with dry ink forms the chip area and the inner foot area for wiring;

3)在金属基板上将芯片区及打线的内脚区,进行蚀刻,其用意是方便将各项金属层的最底层金属,露出墨色胶体表面,使塑料包封体底部再执行表面粘着时,粘着能力更好,不容易产生表面粘着焊点有空气或空焊的现象;3) On the metal substrate, etch the chip area and the inner foot area of the wire bonding. The purpose is to facilitate the bottom metal of each metal layer to expose the surface of the ink-colored colloid, so that the bottom of the plastic package can be adhered to the surface. , the adhesion ability is better, and it is not easy to produce the phenomenon of air or empty soldering in the surface adhesion solder joints;

4)在芯片区及打线内脚区的金属基板上,溅镀一层金属,而此金属主要功能是发挥出金属在执行表面粘着时其粘着能力的信赖性及导电能力较好;4) Sputter a layer of metal on the metal substrate in the chip area and the wire-bonding inner foot area, and the main function of this metal is to exert the reliability and conductivity of the metal's adhesion ability when performing surface adhesion;

5)在芯片区及打线内脚区的金属层上,溅镀一层金属活化层,而此金属活化层主要功能是发挥出金属与铜金属或合金层在执行双向表面的活化作用,使得金属活化层上下两种不同的金属层能够紧密接合;5) Sputter a layer of metal activation layer on the metal layer in the chip area and the wire-bonding inner pin area, and the main function of this metal activation layer is to play the activation role of metal and copper metal or alloy layer in the implementation of the bidirectional surface, so that Two different metal layers above and below the metal activation layer can be tightly bonded;

6)在芯片区及打线内脚区的金属活化层上,溅镀一层铜金属或合金层,而此铜金属或合金层主要功能是当作此颗芯片的真正承载底座,又因为是铜金属或合金,所以导电能力及散热能力都有非常好的表现;6) A layer of copper metal or alloy layer is sputtered on the metal activation layer in the chip area and the wire-bonding inner pin area, and the main function of this copper metal or alloy layer is to serve as the real bearing base of the chip, and because it is Copper metal or alloy, so the conductivity and heat dissipation performance are very good;

7)在打线内脚区的铜金属或合金层上,溅镀一层银金属或镍金属或钯金属层,而此金属层主要功能是发挥金属线顺利且牢固的与打线内脚区域执行紧密接合;7) Sputter a layer of silver metal or nickel metal or palladium metal layer on the copper metal or alloy layer in the inner foot area of the wire, and the main function of this metal layer is to play a smooth and firm connection between the metal wire and the inner foot area of the wire perform a tight fit;

8)将原先在金属基板上的干墨进行剥除,准备后续进行封装/测试的作业;8) Peel off the dry ink that was originally on the metal substrate, and prepare for subsequent packaging/testing operations;

9)将芯片区的铜金属或合金层上进行银胶的涂布,以利后续晶片粘着的程序;9) Coating silver glue on the copper metal or alloy layer in the chip area, so as to facilitate the subsequent wafer adhesion procedure;

10)将刚刚完成银胶涂布的芯片区进行芯片的植入,完成后依据银胶的特性进行银胶后固化的作业,制成集成电路或分立元件的列陈式集合体半成品;10) Implant the chip in the chip area that has just been coated with silver glue, and then perform post-curing of the silver glue according to the characteristics of the silver glue to make a semi-finished product of integrated circuits or discrete components;

11)将已完成芯片植入作业的半成品,依据产品的特性进行打线作业;11) The semi-finished product that has completed the chip implantation operation is carried out according to the characteristics of the product;

12)将已打线完成的半成品,进行塑料包封作业;12) Perform plastic encapsulation of the semi-finished products that have been wired;

13)将已完成塑料包封作业的半成品,在塑料包封体表面进行激光打印;13) Laser print the semi-finished product that has completed the plastic encapsulation operation on the surface of the plastic encapsulation body;

14)将已完成塑料包封作业的半成品,进行底层金属基板剥除作业,如此已可完全在黑色包封体看出每一个联接焊点位置;14) The semi-finished product that has completed the plastic encapsulation operation is stripped off the underlying metal substrate, so that the position of each joint solder joint can be seen completely in the black encapsulation;

15)将已完成金属基板剥除作业后,再将产品的塑料包封体正面粘贴于蓝胶膜上,准备进行后续胶体切割作业;15) After peeling off the metal substrate, paste the front side of the product's plastic package on the blue film to prepare for the subsequent colloid cutting operation;

16)将已完成产品贴附于蓝胶膜后,即可利用切割机进行将胶体切割开,使原本是列陈式集合体方式连在一起的集成电路或分立元件,而经过切割后每一颗集成电路或分立元件即可各自独立。16) After attaching the completed product to the blue adhesive film, the glue can be cut with a cutting machine, so that the integrated circuits or discrete components that were originally connected together in the form of a display assembly, and after cutting each Individual integrated circuits or discrete components can be independent.

本发明的目的还可以是这样实现的:一种集成电路或分立元件超薄无脚封装结构,包括芯片承载底座、打线的内脚承载底座、芯片、金属线以及包封层,其特点是:The purpose of the present invention can also be achieved in the following way: an ultra-thin package structure for integrated circuits or discrete components, including a chip carrier base, a wire-bonded inner leg carrier base, a chip, metal wires and an encapsulation layer, which is characterized in that :

a)芯片承载底座及打线的内脚承载底座的底层为金属层;a) The bottom layer of the chip carrying base and the inner foot carrying base for wiring is a metal layer;

b)芯片承载底座及打线内脚承载底座的金属层上,先溅镀一层金属活化层,再溅镀一层铜金属或合金层;b) On the metal layer of the chip carrying base and the metal layer of the wiring inner pin carrying base, first sputter a layer of metal activation layer, and then sputter a layer of copper metal or alloy layer;

c)打线的内脚承载底座的铜金属或合金层上,溅镀一层银金属或镍金属或钯金属层;c) A layer of silver metal, nickel metal or palladium metal layer is sputtered on the copper metal or alloy layer of the inner foot of the wiring;

d)芯片承载底座的铜金属或合金层上涂布一层银胶层;d) Coating a silver glue layer on the copper metal or alloy layer of the chip carrying base;

e)芯片承载底座的银胶层上植入芯片;e) Implanting the chip on the silver glue layer of the chip carrying base;

f)芯片承载底座的最上层的芯片和打线的内脚承载底座最上层的银金属或镍金属或钯金属层上表面分别与金属线两端连接;f) The uppermost chip of the chip carrying base and the upper surface of the silver metal, nickel metal or palladium metal layer on the uppermost layer of the inner foot carrying base of the wire bonding are respectively connected to both ends of the metal wire;

g)除芯片承载底座底层和打线的内脚承载底座底层外,芯片承载底座、打线的内脚承载底座、芯片以及金属线的外围均用塑料包封。g) Except for the bottom layer of the chip carrier base and the bottom layer of the inner leg carrier base for wire bonding, the periphery of the chip carrier base, the inner leg carrier base for wire bonding, chips and metal wires are all encapsulated with plastic.

本发明集成电路或分立元件超薄无脚封装工艺及其封装结构,其封装型式亦采用列陈式集合体经切割成为单一的单元。其基板型式为利用基板再长出其他需要的金属。与传统的集成电路或分立元件封装工艺及结构相比,本发明具有如下优点:The ultra-thin and footless packaging process and packaging structure of the integrated circuit or discrete components of the present invention also adopts an array-type assembly and cuts it into a single unit. The substrate type is to use the substrate to grow other required metals. Compared with the traditional integrated circuit or discrete component packaging process and structure, the present invention has the following advantages:

1、不需使用专用高温高压胶带材料,所以材料成本较低,且完全不会发生塑料渗透的种种困扰与品质不良等成本的浪费。1. There is no need to use special high-temperature and high-pressure tape materials, so the material cost is low, and there will be no waste of costs such as various troubles of plastic penetration and poor quality.

2、芯片用的基板正面在打线的内脚部份采用传统镀银方式,比较大众化成本较低,打线参数使用一般即可,基板背面讯号输出焊点采用局部镀金属层的方式,可使芯片的功能达到最高的传输及散热功能,但是成本并不会增加。2. The front side of the substrate for the chip adopts the traditional silver-plating method on the inner foot part of the wire bonding. Make the function of the chip achieve the highest transmission and heat dissipation function, but the cost will not increase.

3、基板采用纯铜或合金的材质,其导电率及散热性几乎可以达到100%,除了一般逻辑性产品外,甚至中高功率的产品也是非常适用。3. The substrate is made of pure copper or alloy, and its conductivity and heat dissipation can reach almost 100%. In addition to general logic products, it is also very suitable for medium and high power products.

4、完全不需要使用任何化学胶带,所以完全可以不用考虑污染的问题。4. There is no need to use any chemical tape at all, so there is no need to consider the problem of pollution.

5、新式的封装型式则要进入切割时,包封体的部分是没有不同材质的物质要一并切割,所以在仅有一种材质的情况下,切割机具及刀片可以发挥出最高的效率,品质亦比较稳定。5. When the new type of package is cut, the part of the package has no materials of different materials to be cut together. Therefore, in the case of only one material, the cutting machine and blade can exert the highest efficiency and quality. Also relatively stable.

6、因采用新式的封装工艺及结构,在芯片区或是打线输出的焊点都可以有充分的发挥能力及空间。6. Due to the adoption of the new packaging technology and structure, the solder joints in the chip area or the wire bonding output can have full capacity and space.

7、而新式的封装结构则可以选择是否要使用输出的焊点是凸出于包封体表面,如此单点独立的焊接方面可以维持目前一般芯片的焊性能力,比较不会担心表面贴装时的不稳定性,当然品质更加比传统封装型式更加安定。7. With the new packaging structure, you can choose whether to use the output solder joints that protrude from the surface of the package, so that the single-point independent welding can maintain the solderability of the current general chip, and you will not worry about surface mount The instability of time, of course, the quality is more stable than the traditional package type.

附图说明:Description of drawings:

图1~19分别为本发明的集成电路或分立元件超薄无脚封装工艺各工序示意图。1 to 19 are schematic diagrams of each process of the ultra-thin and leadless packaging process for integrated circuits or discrete components of the present invention.

图20为本发明的集成电路或分立元件超薄无脚封装结构示意图。FIG. 20 is a schematic diagram of the structure of an ultra-thin package without pins for integrated circuits or discrete components of the present invention.

具体实施方式:Detailed ways:

1)参见图1,取一片适合厚度的金属基板材A。金属基板的材质可依据芯片的功能与特性进行变换,例如:合金或铜等;1) Referring to Figure 1, take a piece of metal substrate A with a suitable thickness. The material of the metal substrate can be changed according to the function and characteristics of the chip, such as: alloy or copper;

2)参见图2,在金属基板A上进行干墨B涂布。金属基板上没有被涂上干墨的区域形成芯片区C1及打线的内脚区C2;2) Referring to FIG. 2, dry ink B coating is carried out on the metal substrate A. The area on the metal substrate that is not coated with dry ink forms the chip area C1 and the inner foot area C2 for wiring;

3)参见图3,在金属基板上将芯片区C1及打线的内脚区C2,进行蚀刻D;3) Referring to FIG. 3, etch the chip area C1 and the inner foot area C2 of the wiring on the metal substrate;

4)参见图4,在芯片区C1及打线内脚区C2的金属基板A1、A2上,溅镀一层纯金属层1;4) Referring to FIG. 4, a layer of pure metal layer 1 is sputtered on the metal substrates A1 and A2 in the chip area C1 and the wire bonding inner pin area C2;

5)参见图5,在芯片区C1及打线内脚区C2的纯金属11、12上,溅镀一层金属活化层2,如铝层或镍、钛、银、金层;5) Referring to FIG. 5, on the pure metals 11 and 12 in the chip area C1 and the wire-bonding inner foot area C2, a layer of metal activation layer 2 is sputtered, such as an aluminum layer or a nickel, titanium, silver, or gold layer;

6)参见图6,在芯片区C1及打线内脚区C2的金属活化层21、22上,溅镀一层纯铜金属或合金层3;6) Referring to FIG. 6 , on the metal activation layers 21 and 22 in the chip area C1 and the wire bonding inner pin area C2, a layer of pure copper metal or alloy layer 3 is sputtered;

7)参见图7,在芯片区C1和打线内脚区C2的纯铜金属或合金层31、32上,溅涂一层金属活化层41、42,而此金属活化层主要功能是发挥出纯铜金属或合金层与银或镍层在执行双向表面的活化作用,使得金属活化层上下两种不同的金属层能够紧密接合;7) Referring to Fig. 7, on the pure copper metal or alloy layers 31, 32 in the chip area C1 and the wire-bonding inner foot area C2, a layer of metal activation layer 41, 42 is sputtered, and the main function of this metal activation layer is to exert The pure copper metal or alloy layer and the silver or nickel layer are activated on the two-way surface, so that the two different metal layers above and below the metal activation layer can be tightly bonded;

8)参见图8,在芯片区C1和打线内脚区C2的金属活化层41、42上,溅镀一层银金属或镍金属或钯金属层51、52;8) Referring to FIG. 8, on the metal activation layers 41, 42 in the chip region C1 and the wire-bonding inner pin region C2, a layer of silver metal, nickel metal or palladium metal layer 51, 52 is sputtered;

9)参见图9,将原先在金属基板A上方的干墨B进行剥除;9) Referring to FIG. 9, the dry ink B previously on the metal substrate A is stripped off;

10)参见图10,将芯片区C1的银金属或镍金属或钯金属层51上进行银胶61的涂布;10) Referring to FIG. 10, silver glue 61 is coated on the silver metal or nickel metal or palladium metal layer 51 in the chip area C1;

11)参见图11,将刚刚完成银胶涂布的芯片区C1进行芯片7的植入,完成后依据银胶的特性进行银胶后固化的作业,制成集成电路或分立元件的列陈式集合体半成品;11) Referring to Figure 11, the chip area C1 that has just been coated with silver glue is implanted with the chip 7, and after completion, the silver glue is post-cured according to the characteristics of the silver glue to make a display of integrated circuits or discrete components. Aggregate semi-finished products;

12)参见图12,将已完成芯片植入作业的半成品,依据产品的特性进行打线8作业;12) Referring to Figure 12, the semi-finished product that has completed the chip implantation operation is performed according to the characteristics of the product for wire bonding 8 operations;

13)参见图13,将已打线完成的半成品除底层金属层1外,进行塑料包封9作业,并依据塑料的特性进行塑料包封后固化作业,这样使底层金属层1凸出于塑料包封体9外;13) Referring to Fig. 13, except for the bottom metal layer 1, the semi-finished product that has been wire-bonded is subjected to plastic encapsulation 9 operations, and the plastic encapsulation and post-curing operation is performed according to the characteristics of the plastic, so that the bottom metal layer 1 protrudes from the plastic Encapsulation body 9 outside;

14)参见图14,将已完成塑料包封及后固化作业的半成品,进行激光打印10;14) Referring to Figure 14, the semi-finished product that has completed the plastic encapsulation and post-curing operations is laser printed 10;

15)参见图15,将已完成塑料包封及后固化作业的半成品,进行底层金属基板A剥除作业;15) Referring to Figure 15, the semi-finished product that has completed plastic encapsulation and post-curing operations is stripped off the underlying metal substrate A;

16)参见图16,完成金属基板层的剥除作业后,即可进行产品功能测试作业,而测试的方式除了可以采用整片列阵式集合体探针测试方式也可以采用单颗集成电路或分立元件的测试方式;16) Referring to Figure 16, after the stripping operation of the metal substrate layer is completed, the product function test operation can be carried out, and the test method can not only use the whole chip array assembly probe test method, but also use a single integrated circuit or Test methods for discrete components;

17)参见图17,将已完成金属基板剥除作业后,再将产品的胶体正面贴于蓝胶膜E上;17) Referring to Figure 17, after the metal substrate has been stripped off, attach the colloid front of the product to the blue adhesive film E;

18)参见图18,将已完成产品贴附于蓝胶膜后,即可利用切割机进行将塑料包封体切割开;18) Referring to Figure 18, after attaching the completed product to the blue film, the plastic package can be cut with a cutting machine;

19)参见图19,将完成切割的产品利用取放转换设备将单颗集成电路或分立元件的包封体逐一的吸出蓝胶膜E,并置放于塑料承载盘内。参见图20,集成电路或分立元件超薄无脚封装结构,主要由芯片承载底座X、打线的内脚承载底座Y、芯片7、金属线8以及包封层9组成。其特点是:19) Referring to Figure 19, use the pick-and-place conversion equipment to suck out the encapsulation of individual integrated circuits or discrete components from the blue adhesive film E one by one, and place them in the plastic carrier tray. Referring to FIG. 20 , the ultra-thin leadless package structure of integrated circuits or discrete components is mainly composed of chip carrier base X, wire-bonded inner leg carrier base Y, chip 7 , metal wire 8 and encapsulation layer 9 . Its characteristics are:

a)芯片承载底座X及打线的内脚承载底座Y的底层为金属层11、12;a) The bottom layer of the chip carrying base X and the inner foot carrying base Y for wiring are metal layers 11 and 12;

b)芯片承载底座X及打线内脚承载底座Y的金属层11、12上,先溅镀一层金属活化层21、22,再溅镀一层铜金属或合金层31、32;b) On the metal layers 11, 12 of the chip carrying base X and the metal layer 11, 12 of the wire-bonding inner pin carrying base Y, a layer of metal activation layer 21, 22 is sputtered first, and then a layer of copper metal or alloy layer 31, 32 is sputtered;

c)芯片承载底座X和打线的内脚承载底座Y的铜金属或合金层31、32上,先溅镀一层金属活化层41、42,再溅镀一层银金属或镍金属或钯金属层51、52;c) On the copper metal or alloy layers 31, 32 of the chip carrying base X and the inner leg carrying base Y for bonding, first sputter a layer of metal activation layer 41, 42, and then sputter a layer of silver metal or nickel metal or palladium metal layers 51, 52;

d)芯片承载底座1的银金属或镍金属或钯金属层51上,涂布一层银胶层61;d) On the silver metal or nickel metal or palladium metal layer 51 of the chip carrying base 1, a layer of silver glue layer 61 is coated;

e)芯片承载底座X的银胶层61上植入芯片7;e) chip 7 is implanted on the silver glue layer 61 of the chip carrying base X;

f)芯片承载底座X的最上层的芯片7和打线的内脚承载底座Y最上层的银金属或镍金属或钯金属层52上表面分别与金属线8两端连接;f) The uppermost surface of the chip 7 on the chip carrier base X and the uppermost layer of the silver metal or nickel metal or palladium metal layer 52 on the inner foot carrier base Y for bonding is connected to both ends of the metal wire 8;

g)除芯片承载底座X底层11和打线的内脚承载底座Y底层12外,芯片承载底座X、打线的内脚承载底座Y、芯片7以及金属线8的外围均用塑料包封体9包封。g) In addition to the bottom layer 11 of the chip carrier base X and the bottom layer 12 of the inner foot carrier base Y for wire bonding, the periphery of the chip carrier base X, the inner leg carrier base Y for wire bonding, the chip 7 and the metal wire 8 are all encapsulated with plastic 9 encapsulation.

Claims (10)

1、一种集成电路或分立元件超薄无脚封装工艺,其特征在于它包括以下工艺步骤:1. An ultra-thin and footless packaging process for integrated circuits or discrete components, characterized in that it comprises the following process steps: 1)取一片金属基板(A);1) Take a metal substrate (A); 2)在金属基板(A)上进行干墨(B)涂布,金属基板上没有被涂上干墨的区域形成芯片区(C1)及打线的内脚区(C2);2) Coating dry ink (B) on the metal substrate (A), the area on the metal substrate that is not coated with dry ink forms the chip area (C1) and the inner leg area (C2) for wiring; 3)在金属基板上将芯片区(C1)及打线的内脚区(C2),进行蚀刻(D);3) Etching the chip area (C1) and the inner leg area (C2) for wiring on the metal substrate (D); 4)在芯片区(C1)及打线内脚区(C2)的金属基板(A1、A2)上,溅涂一层金属(1);4) Sputtering a layer of metal (1) on the metal substrates (A1, A2) in the chip area (C1) and the wire bonding inner foot area (C2); 5)在芯片区(C1)及打线内脚区(C2)的金属层(11)、(12)上,溅镀一层金属活化层(2);5) Sputtering a layer of metal activation layer (2) on the metal layers (11) and (12) of the chip area (C1) and the wire bonding inner pin area (C2); 6)在芯片区(C1)及打线内脚区(C2)的金属活化层(21)、(22)上,溅镀一层铜金属或合金层(3);6) Sputtering a layer of copper metal or alloy layer (3) on the metal activation layers (21) and (22) in the chip area (C1) and the wire bonding inner foot area (C2); 7)在打线内脚区(C2)的铜金属或合金层(32)上,溅镀一层银金属或镍金属或钯金属层(52);7) Sputtering a layer of silver metal, nickel metal or palladium metal layer (52) on the copper metal or alloy layer (32) in the inner leg area (C2) of the wire bonding; 8)将原先在金属基板(A)上方的干墨层(B)进行剥除;8) peeling off the dry ink layer (B) originally above the metal substrate (A); 9)将芯片区(C1)的铜金属或合金层(31)上进行银胶(61)的涂布;9) Coating silver glue (61) on the copper metal or alloy layer (31) in the chip area (C1); 10)将刚刚完成银胶涂布的芯片区(C1)进行芯片(7)的植入,完成后进行银胶后固化的作业,制成集成电路或分立元件的列陈式集合体半成品;10) Implant the chip (7) in the chip area (C1) that has just been coated with silver glue, and perform post-curing of the silver glue after completion to make an integrated circuit or a semi-finished product of a display assembly of discrete components; 11)将已完成芯片植入作业的半成品,进行打线(8)作业;11) Perform wire bonding (8) on the semi-finished product that has completed the chip implantation operation; 12)将已打线完成的半成品,进行塑料包封(9)作业;12) Perform plastic encapsulation (9) on the semi-finished product that has been wired; 13)将已完成塑料包封的半成品,在塑料包封体(9)表面进行激光打印(10);13) Perform laser printing (10) on the surface of the plastic encapsulation (9) of the semi-finished product that has completed the plastic encapsulation; 14)将已完成塑料包封的半成品,进行底层金属基板(A)剥除作业;14) Perform the stripping operation of the bottom metal substrate (A) on the semi-finished product that has completed the plastic encapsulation; 15)将已完成金属基板剥除作业后,再将产品的胶体正面粘贴于蓝胶膜(E)上;15) After peeling off the metal substrate, paste the colloidal front of the product on the blue adhesive film (E); 16)将已完成产品贴附于蓝胶膜后,进行塑料包封体(9)分割。16) After attaching the completed product to the blue film, divide the plastic package (9). 2、根据权利要求1所述的一种集成电路或分立元件超薄无脚封装工艺,其特征在于在进行干墨层剥除前,先在于芯片区(C1)的铜金属或合金层(31)上溅镀一层金属活化层(41)或/和一层金属层(51),该金属层是银层或镍层或钯层。2. An ultra-thin and footless packaging process for integrated circuits or discrete components according to claim 1, characterized in that before peeling off the dry ink layer, the copper metal or alloy layer (31) in the chip area (C1) ) is sputtered with a metal activation layer (41) or/and a metal layer (51), which is a silver layer or a nickel layer or a palladium layer. 3、根据权利要求1或2所述的一种集成电路或分立元件超薄无脚封装工艺,其特征在于打线内脚区(C2)的铜金属或合金层(32)上,在溅涂一层银金属或镍金属或钯金属层(52)前先溅涂一层金属活化层(42)。3. An ultra-thin and footless packaging process for integrated circuits or discrete components according to claim 1 or 2, characterized in that on the copper metal or alloy layer (32) in the inner foot area (C2) of the bonding wire, after sputtering One layer of metal activation layer (42) is sputtered earlier before one layer of silver metal or nickel metal or palladium metal layer (52). 4、根据权利要求1所述的一种集成电路或分立元件超薄无脚封装工艺,其特征在于金属活化层(2)为铝层或镍、钛、银、金层。4. An ultra-thin and leadless packaging process for integrated circuits or discrete components according to claim 1, characterized in that the metal activation layer (2) is an aluminum layer or a nickel, titanium, silver, or gold layer. 5、根据权利要求2所述的一种集成电路或分立元件超薄无脚封装工艺,其特征在于金属活化层(2)为铝层或镍、钛、银、金层。5. An ultra-thin and footless packaging process for integrated circuits or discrete components according to claim 2, characterized in that the metal activation layer (2) is an aluminum layer or a nickel, titanium, silver, or gold layer. 6、根据权利要求3所述的一种集成电路或分立元件超薄无脚封装工艺,其特征在于金属活化层(42)为铝层或镍、钛、银、金层。6. An ultra-thin and footless packaging process for integrated circuits or discrete components according to claim 3, characterized in that the metal activation layer (42) is an aluminum layer or a nickel, titanium, silver, or gold layer. 7、根据权利要求1或2所述的一种集成电路或分立元件超薄无脚封装工艺,其特征在于完成金属基板层的剥除作业后,进行产品功能测试作业。7. An ultra-thin and leadless packaging process for integrated circuits or discrete components according to claim 1 or 2, characterized in that after the stripping of the metal substrate layer is completed, the product function test is performed. 8、一种集成电路或分立元件超薄无脚封装结构,包括芯片承载底座(X)、打线的内脚承载底座(Y)、芯片(7)、金属线(8)以及包封层(9),其特征在于:8. An ultra-thin leadless packaging structure for integrated circuits or discrete components, including a chip carrying base (X), a wire-bonded inner foot carrying base (Y), a chip (7), metal wires (8) and an encapsulation layer ( 9), characterized in that: a)芯片承载底座(X)及打线的内脚承载底座(Y)的底层为金属层(11、12);a) The bottom layer of the chip carrying base (X) and the inner foot carrying base (Y) for wiring is a metal layer (11, 12); b)芯片承载底座(X)及打线内脚承载底座(Y)的金属层(11、12)上,先溅镀一层金属活化层(2),再溅镀一层铜金属或合金层(31、32);b) On the metal layers (11, 12) of the chip carrier base (X) and the wire-bonding inner pin carrier base (Y), first sputter a layer of metal activation layer (2), and then sputter a layer of copper metal or alloy layer (31, 32); c)打线的内脚承载底座(Y)的铜金属或合金层(32)上,溅镀一层银金属或镍金属或钯金属层(52);c) sputtering a layer of silver metal, nickel metal or palladium metal layer (52) on the copper metal or alloy layer (32) of the inner foot carrying base (Y) for wiring; d)芯片承载底座(X)的铜金属或合金层(31)上涂布一层银胶层(61);d) Coating a silver glue layer (61) on the copper metal or alloy layer (31) of the chip carrying base (X); e)芯片承载底座(X)的银胶层(61)上植入芯片(7);e) chip (7) is implanted on the silver glue layer (61) of the chip carrying base (X); f)芯片承载底座(X)的最上层的芯片(7)和打线的内脚承载底座(Y)最上层的银金属或镍金属或钯金属层(52)上表面分别与金属线(8)两端连接;f) The uppermost surface of the uppermost chip (7) of the chip carrying base (X) and the uppermost silver metal or nickel metal or palladium metal layer (52) of the wire-bonding inner foot carrying base (Y) is connected with the metal wire (8) respectively ) connected at both ends; g)除芯片承载底座(X)底层(11)和打线的内脚承载底座(Y)底层(12)外,芯片承载底座(X)、打线的内脚承载底座(Y)、芯片(7)以及金属线(8)的外围均用塑料(9)包封。g) In addition to the bottom layer (11) of the chip carrier base (X) and the bottom layer (12) of the inner leg carrier base (Y) for wire bonding, the chip carrier base (X), the inner leg carrier base (Y) for wire bonding, and the chip ( 7) and the periphery of metal wire (8) are all encapsulated with plastics (9). 9、根据权利要求8所述的一种集成电路或分立元件超薄无脚封装结构,其特征在于在涂布一层银胶层(61)前,在于芯片区(C1)的铜金属或合金层(31)上先溅涂一层金属活化层(41)或/和一层金属层(51),该金属层是银层或镍层或钯层。9. An ultra-thin and footless packaging structure for integrated circuits or discrete components according to claim 8, characterized in that before coating a layer of silver glue (61), the copper metal or alloy in the chip area (C1) On the layer (31), one deck of metal activation layer (41) or/and one deck of metal layer (51) is sputtered earlier, and the metal layer is a silver layer or a nickel layer or a palladium layer. 10、根据权利要求8或9所述的一种集成电路或分立元件超薄无脚封装结构,其特征在于打线的内脚承载底座(Y)的铜金属层(32)上,在溅涂一层银金属或镍金属或钯金属层(52)前先溅镀一层金属活化层(42)。10. An ultra-thin leadless packaging structure for integrated circuits or discrete components according to claim 8 or 9, characterized in that on the copper metal layer (32) of the inner leg bearing base (Y) of the wire bonding, after sputtering One layer of metal activation layer (42) is sputtered before one layer of silver metal, nickel metal or palladium metal layer (52).
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