CN111710580A - Ion source electric field structure and ion source device - Google Patents

Abstract

The present application relates to an ion source electric field structure and an ion source device. The ion source electric field structure includes: an anode component disposed in a casing, an isolation metal layer is further arranged between the anode component and the casing; the isolation metal The layer is a ring-shaped design corresponding to the anode part, and is kept insulated from the anode part and the casing; the isolating metal layer induces an electric field of a voltage through the anode part, and the ion beam emitted by the ion source is affected by the electric field through the electric field. control the launch angle. In the technical solution of the present application, a ring-shaped isolating metal layer corresponding to the anode component is provided between the anode component and the casing; the isolating metal layer is at a floating potential, and an electric field of a voltage is induced by the anode component, and the ion is affected by the electric field. The emission angle of the ion beam emitted by the source is controlled; the electric field structure can effectively control the emission angle range of the ion beam of the ion source, and improves the concentration effect of the ion beam emitted by the ion source.

Description

Ion source electric field structure and ion source device

technical field

The present application relates to the technical field of ion sources, in particular to an ion source electric field structure and an ion source device.

Background technique

Ion source is an applied science and technology with a wide range of uses, many types, many sciences, strong process technology, and very rapid development. As a very common type of ion source, Hall ion source is mostly used in the field of thin film deposition, as a deposition auxiliary component to improve the physical properties of thin films. The Hall ion source is that the anode plasmons the process gas under the cooperation of a strong axial magnetic field, and the plasma gas is accelerated by the anode to separate the gas ions and form an ion beam.

In the commonly used ion source, the electric field structure is mainly realized by the anode component 10, as shown in FIG. 1, which is a schematic diagram of the emission angle of the commonly used ion source. The anode component 10 accelerates the ion beam through the action of the electric field, It can be seen from the figure that the divergence angle of the ion source itself is very large, generally reaching more than 90°, and the excessive divergence angle makes the ion beam distribution less concentrated. If the emission angle range is too large, the ion beam will be too scattered and the density will be low, resulting in a lower effective use efficiency of the ion beam.

SUMMARY OF THE INVENTION

The purpose of this application is to solve one of the above-mentioned technical defects, especially the defect that the effective use efficiency of the ion beam is low, and to provide an ion source electric field structure and an ion source device.

The present application provides an ion source electric field structure, including:

An electric field structure of an ion source, comprising an anode component arranged in a casing, and an isolation metal layer is also arranged between the anode component and the casing;

The isolation metal layer is of annular design corresponding to the anode part, and is kept insulated from the anode part and the casing;

The isolating metal layer induces an electric field of a voltage through the anode part, and the emission angle of the ion beam emitted by the ion source is controlled by the electric field.

In one embodiment, the isolating metal layer has a circular design, and the shape is the same as that of the upper section of the anode component.

In one embodiment, the ion source electric field structure further includes a support structure for fixing the isolation metal layer.

In one embodiment, isolation spacers are respectively provided above and below the isolation metal layer, the isolation spacers are used to support the isolation metal layer and fix the isolation metal layer between the anode component and the casing the set distance.

In one embodiment, the spacer is a quartz spacer.

In one embodiment, the isolation metal layer is further connected to a voltage source, and the voltage source outputs a voltage to the isolation metal layer to generate a corresponding induced electric field.

In one embodiment, the ion source electric field structure further includes a human-computer interaction module connected to the control circuit;

The control circuit is further configured to receive input parameter data through the human-computer interaction module.

In one embodiment, the control circuit is further configured to calculate the emission angle according to the coverage area input, and calculate the output voltage of the voltage source according to the emission angle.

In one embodiment, the control circuit is further configured to calculate the emission angle according to the coverage according to the input coverage.

The present application also provides an ion source device, comprising: a cathode, an anode component and a casing, and the above-mentioned electric field structure of the ion source.

In the ion source electric field structure and ion source device of the present application, a ring-shaped isolation metal layer corresponding to the anode part is provided between the anode part and the casing; the isolation metal layer is at a floating potential, and an electric field of a voltage is induced through the anode part , the emission angle of the ion beam emitted by the ion source is controlled by the electric field; the electric field structure can effectively control the emission angle range of the ion beam of the ion source and improve the concentration effect of the ion beam emitted by the ion source.

Further, adding isolation gaskets on the top and bottom of the isolation metal layer to support the isolation metal layer to be fixed at the set distance between the anode part and the casing, the distance between the anode and the casing can be better controlled, ions can be blocked from entering the ion source, and ions can be prevented from entering the ion source. Sparking conditions caused within the source.

Furthermore, the isolation metal sheet is also connected to a voltage source, and the voltage source outputs a voltage to the isolation metal layer to generate a corresponding induced electric field, and the emission angle of the ion beam can be controlled by the induced electric field.

Finally, a control circuit is also set up, through which the output voltage of the voltage source can be controlled, so as to automatically adjust the emission angle of the ion beam, and the output voltage of the voltage source can be calculated by using the control circuit to receive the input emission angle, and also according to the input Coverage calculates the launch angle. The intelligent adjustment of the coverage of the ion source is realized.

Additional aspects and advantages of the present application will be set forth in part in the following description, which will become apparent from the following description, or may be learned by practice of the present application.

Description of drawings

The above and/or additional aspects and advantages of the present application will become apparent and readily understood from the following description of embodiments taken in conjunction with the accompanying drawings, wherein:

Figure 1 is a schematic diagram of the emission angle of a common ion source;

2 is a perspective view of the electric field structure of the ion source of the present application;

3 is a schematic cross-sectional view of the electric field structure of the ion source of the present application;

4 is a schematic diagram of a support structure of an embodiment;

5 is a structural diagram of a connection circuit of an isolation metal layer according to an embodiment;

Fig. 6 is the connection circuit structure diagram of the isolation metal layer of another embodiment;

Figure 7 is a schematic diagram of the ion source overlay.

Detailed ways

The following describes in detail the embodiments of the present application, examples of which are illustrated in the accompanying drawings, wherein the same or similar reference numerals refer to the same or similar elements or elements having the same or similar functions throughout. The embodiments described below with reference to the accompanying drawings are exemplary and are only used to explain the present application, but not to be construed as a limitation on the present application.

It will be understood by those skilled in the art that the singular forms "a", "an", "the" and "the" as used herein can include the plural forms as well, unless expressly stated otherwise. It should be further understood that the word "comprising" as used in the specification of this application refers to the presence of the stated features, integers, steps, operations, but does not exclude the presence or addition of one or more other features, integers, steps, operations.

1 and 2, FIG. 2 is a perspective view of the electric field structure of the ion source of the present application; The cathode 30 used in the figure is a cathode neutralizer, and the ion source shown in the figure adopts a bottom ventilation structure. Generally, the housing 20 of the ion source is designed as a circular structure.

Referring to FIG. 3, FIG. 3 is a schematic cross-sectional view of the electric field structure of the ion source of the present application. As shown in FIG. 3, in the technical solution of the present application, an isolation metal layer 40 is further provided between the anode component 10 and the casing 20 (as shown in FIG. The middle shaded part); the isolation metal layer 40 is of annular design corresponding to the anode part 10 , and the isolation metal layer 40 is kept insulated from the anode part 10 and the casing 20 . During the operation of the ion source, the isolation metal layer 40 is at a floating potential, and an electric field of a voltage can be induced through the anode component 10, and the electric field exerts a force on the ion beam emitted by the ion source, thereby controlling the emission angle of the ion beam.

Referring to FIG. 2 , the shell of the ion source is of circular design, and the isolation metal layer 40 in the electric field structure of the ion source is also of circular design, and its shape can be the same as the upper section of the anode part 10 . In the present application, a ring-shaped isolation metal layer 40 corresponding to the anode part 10 is provided between the anode part 10 and the casing 20; the isolation metal layer 40 is at a floating potential, and an electric field of a voltage is induced through the anode part 10, and through the electric field The emission angle of the ion beam emitted by the ion source is controlled; the electric field structure can effectively control the emission angle range of the ion beam of the ion source, and can improve the concentration effect of the ion beam emitted by the ion source.

More embodiments of the present application will be described below with reference to the accompanying drawings.

In one embodiment, the electric field structure of the ion source of the present application may further include a support structure 50 for fixing the isolation metal layer 40 . For the support structure 50, the shape and structure can be designed according to actual requirements, and its function is to fix the isolation metal layer.

As an example, in the solution provided in the present application, a first isolation gasket 501 and a second isolation gasket 502 are respectively provided up and down the isolation metal layer 40 , and the first isolation gasket 501 and the second isolation gasket 502 are used for supporting The isolation metal layer 40 is fixed at a set distance between the anode part 10 and the casing 20 . As shown in FIG. 4 , FIG. 4 is a schematic diagram of a support structure 50 according to an embodiment (only a schematic diagram of the ion source is shown in the figure); The sheet 502 can fix the isolation metal sheet between the casing 20 and the anode component 10. Generally, the isolation gasket and the isolation metal layer 40 have the same shape and are of annular design. Optionally, the isolation spacer can be realized by using a quartz spacer, and of course spacers made of other insulating materials can also be used.

In the technical solution of the above-mentioned embodiment, isolation gaskets are added on the top and bottom of the isolation metal layer 40 to support the isolation metal layer 40 to be fixed at a set distance between the anode component 10 and the outer casing 20, so that the distance between the anode and the outer casing 20 can be better controlled, Moreover, through the upper and lower spacers, the ions can also be blocked from entering the inside of the ion source, and the ignition caused by the inside of the ion source can be prevented.

In one embodiment, referring to FIG. 5 , FIG. 5 is a schematic diagram of a connection circuit of the isolation metal layer 40 according to an embodiment. The isolation metal layer 40 of the ion source electric field structure of the present application may also be connected to a voltage source 60 , through which the voltage The source 60 outputs a voltage to the isolation metal layer 40 to generate a corresponding induced electric field. Through the induced electric field, the emission angle of the ion beam can be controlled, thereby controlling the coverage of the ion source.

As an embodiment, referring to FIG. 6 , FIG. 6 is a diagram of a connection circuit structure of the isolation metal layer 40 according to another embodiment. For the electric field structure of the ion source, a control circuit 70 connected to the voltage source 60 may also be included, and the control circuit 70 may use to control the output voltage of the voltage source 60 . For example, the control circuit 70 can perform human-computer interaction through the human-computer interaction module 710, the user can input the emission angle range of the desired coating on the human-computer interaction module 710, and the control circuit 70 receives the emission angle range data input by the user, and according to The emission angle range data calculates the output voltage of the voltage source 60, and then controls the voltage source 60 to output the corresponding voltage, so as to achieve the purpose of intelligently controlling the emission angle range of the ion source.

In addition, as shown in FIG. 7 , which is a schematic diagram of ion source coverage, the user can also input data such as the coverage diameter R of the target object, the distance D between the ion source and the covered target object, and other data on the human-computer interaction module 710 , and the control circuit 70 The output voltage required by the voltage source 60 can be calculated according to the coverage diameter R of the target object and the distance D between the ion source and the covered target object, so as to intelligently adjust the coverage of the ion source. In order to achieve the purpose of intelligently controlling the emission angle range of the ion source.

In the technical solutions of the above embodiments, the voltage source 60 outputs a voltage to the isolation metal layer 40 to generate a corresponding induced electric field, and the emission angle of the ion beam can be controlled by the induced electric field. The output voltage of the voltage source 60 can be controlled by the control circuit 70 to automatically adjust the emission angle of the ion beam,

The following describes embodiments of the ion source device of the present application.

The ion source device provided in the present application may include components such as the cathode 30, the anode component 10, and the casing 20, and also include the ion source electric field structure referred to in any of the above embodiments. The basic structure of the ion source device can be the commonly used ion source device structure as shown in Figures 1-2, and of course other improved ion source devices can also be included. In the present application, an isolation metal layer 40 is added between the casing 20 and the anode component 10 to induce an electric field of a voltage, so as to control the angle range of the ion beam emitted by the ion source, which has great use value in practical applications; In the coating equipment, using the ion source device provided by the present application, when only a target object with a small area needs to be coated, the emission process of the ion source device can be adjusted by controlling the emission angle range, thereby improving the use of the ion beam. Efficiency for precise coating.

It will be understood by those skilled in the art that, unless otherwise defined, all terms (including technical and scientific terms) used herein have the same meaning as commonly understood by one of ordinary skill in the art to which this application belongs. It should also be understood that terms, such as those defined in a general dictionary, should be understood to have meanings consistent with their meanings in the context of the prior art and, unless specifically defined as herein, should not be interpreted in idealistic or overly formal meaning to explain.

The above are only some embodiments of the present application. It should be pointed out that for those skilled in the art, without departing from the principles of the present application, several improvements and modifications can be made. It should be regarded as the protection scope of this application.

Claims (10)

1. An electric field structure of an ion source comprises an anode part arranged in a shell, and is characterized in that an isolating metal layer is also arranged between the anode part and the shell;

the isolating metal layer is in an annular design corresponding to the anode part and keeps an insulating state with the anode part and the shell;

the isolating metal layer induces an electric field of voltage through the anode part, and the emission angle of the ion beam emitted by the ion source is controlled through the electric field.

2. The ion source electric field structure of claim 1, wherein said barrier metal layer is of circular ring design and has the same shape as the upper cross-section of said anode member.

3. The ion source electric field structure of claim 1, further comprising a support structure for securing said barrier metal layer.

4. The ion source electric field structure of claim 3, wherein a spacer is disposed above and below the metal isolating layer, the spacer is used for supporting the metal isolating layer and fixing the metal isolating layer at a predetermined distance between the anode member and the housing.

5. The ion source electric field structure of claim 4, wherein the spacer is a quartz spacer.

6. The ion source electric field structure of claim 1, wherein the isolation metal layer is further connected to a voltage source, and a voltage is output from the voltage source to the isolation metal layer to generate a corresponding induced electric field.

7. The ion source electric field structure of claim 6, further comprising: and the control circuit is connected with the voltage source and is used for controlling the output voltage of the voltage source.

8. The ion source electric field structure of claim 7, further comprising a human-machine interaction module coupled to said control circuitry;

the control circuit is also used for receiving input parameter data through the man-machine interaction module.

9. The ion source electric field structure of claim 8, wherein the control circuit is further configured to calculate the emission angle from the input coverage, and to calculate the output voltage of the voltage source from the emission angle.

10. An ion source apparatus comprising: cathode, anode member and shell, its characterized in that still includes: an ion source electric field structure as claimed in any one of claims 1 to 9.

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