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CN111394716A - Multi-coating stacked structure, preparation method and application thereof - Google Patents

Multi-coating stacked structure, preparation method and application thereof Download PDF

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Publication number
CN111394716A
CN111394716A CN201910003801.6A CN201910003801A CN111394716A CN 111394716 A CN111394716 A CN 111394716A CN 201910003801 A CN201910003801 A CN 201910003801A CN 111394716 A CN111394716 A CN 111394716A
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phosphorus
nickel
plating
alloy
low
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朱振宇
张代琼
周建坤
张家林
黄忠喜
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Tyco Electronics Shanghai Co Ltd
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Tyco Electronics Shanghai Co Ltd
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    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C18/00Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
    • C23C18/16Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by reduction or substitution, e.g. electroless plating
    • C23C18/48Coating with alloys
    • C23C18/50Coating with alloys with alloys based on iron, cobalt or nickel
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C28/00Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of groups C23C2/00 - C23C26/00 or by combinations of methods provided for in subclasses C23C and C25C or C25D
    • C23C28/02Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of groups C23C2/00 - C23C26/00 or by combinations of methods provided for in subclasses C23C and C25C or C25D only coatings only including layers of metallic material
    • C23C28/021Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of groups C23C2/00 - C23C26/00 or by combinations of methods provided for in subclasses C23C and C25C or C25D only coatings only including layers of metallic material including at least one metal alloy layer
    • CCHEMISTRY; METALLURGY
    • C25ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25DPROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D3/00Electroplating: Baths therefor
    • C25D3/02Electroplating: Baths therefor from solutions
    • C25D3/56Electroplating: Baths therefor from solutions of alloys
    • CCHEMISTRY; METALLURGY
    • C25ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25DPROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D5/00Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
    • C25D5/10Electroplating with more than one layer of the same or of different metals
    • C25D5/12Electroplating with more than one layer of the same or of different metals at least one layer being of nickel or chromium
    • C25D5/14Electroplating with more than one layer of the same or of different metals at least one layer being of nickel or chromium two or more layers being of nickel or chromium, e.g. duplex or triplex layers

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  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Mechanical Engineering (AREA)
  • Electrochemistry (AREA)
  • General Chemical & Material Sciences (AREA)
  • Chemically Coating (AREA)
  • Electroplating Methods And Accessories (AREA)

Abstract

A multi-plating layer stack structure, its preparation method and application are disclosed. The multi-coating stacking structure comprises a nickel-phosphorus alloy combined coating, wherein the nickel-phosphorus alloy combined coating sequentially comprises the following components from bottom to top: a low-phosphorus nickel-phosphorus alloy plating layer with a phosphorus content of 0-4 wt%, a high-phosphorus nickel-phosphorus alloy plating layer with a phosphorus content of 9-20 wt%, and a low-medium-phosphorus nickel-phosphorus alloy plating layer with a phosphorus content of 3-9 wt%. According to the invention, through the special combination of the nickel-phosphorus alloy plating layers of low phosphorus, high phosphorus and low-medium phosphorus, a larger potential difference is generated among different nickel-phosphorus alloy plating layers, so that the corrosion can be prevented from developing in the depth direction, and more excellent corrosion resistance is provided.

Description

多镀层堆叠结构、其制备方法和应用Multi-plating stack structure, its preparation method and application

技术领域technical field

本发明涉及金属镀层领域,尤其涉及多镀层堆叠结构、其制备方法和应用。The invention relates to the field of metal plating, in particular to a multi-plating stack structure, a preparation method and application thereof.

背景技术Background technique

在电镀生产工艺中,电镀单层镍和多层镍(含硫镍)被广泛应用在各类产品中,起到防止腐蚀,阻止基材原子扩散迁移和增加表层镀层耐磨性的作用。随着耐蚀性和耐磨性应用要求的不断提高,上述电镀单层镍或多层镍出现了应用上的局限性,其整体镀层的综合性能亟需提高。In the electroplating production process, electroplating single-layer nickel and multi-layer nickel (sulfur-containing nickel) are widely used in various products to prevent corrosion, prevent the diffusion and migration of substrate atoms and increase the wear resistance of the surface coating. With the continuous improvement of application requirements for corrosion resistance and wear resistance, the above-mentioned electroplating of single-layer nickel or multi-layer nickel has limitations in application, and the comprehensive performance of the overall plating layer needs to be improved urgently.

发明内容SUMMARY OF THE INVENTION

本发明旨在提供一种包括镍磷合金组合镀层的多镀层堆叠结构、其制备方法和应用,以解决电镀单层镍和单层镀层作为底镀层或中间镀层的电镀多层镍耐腐蚀性和耐磨性不足等问题。The present invention aims to provide a multi-coating stack structure including nickel-phosphorus alloy composite coating, its preparation method and application, so as to solve the problem of corrosion resistance and corrosion resistance of electroplated multi-layer nickel in electroplating single-layer nickel and single-layer coating as bottom coating or intermediate coating. Insufficient wear resistance and other issues.

为了实现本发明的上述目的,本发明的一个方面提供一种包括镍磷合金组合镀层的多镀层堆叠结构,所述镍磷合金组合镀层自下而上依次包括:低磷的镍磷合金镀层、高磷的镍磷合金镀层和低-中磷的镍磷合金镀层,其中所述低磷的镍磷合金镀层的磷含量为0-4重量%,所述高磷的镍磷合金镀层的磷含量为9-20重量%,且所述低-中磷的镍磷合金镀层的磷含量为3-9重量%。In order to achieve the above object of the present invention, one aspect of the present invention provides a multi-plating layer stack structure comprising a nickel-phosphorus alloy composite coating layer, wherein the nickel-phosphorus alloy composite coating layer sequentially includes from bottom to top: a low-phosphorus nickel-phosphorus alloy coating layer, High phosphorus nickel phosphorus alloy coating and low-medium phosphorus nickel phosphorus alloy coating, wherein the phosphorus content of the low phosphorus nickel phosphorus alloy coating is 0-4 wt %, and the phosphorus content of the high phosphorus nickel phosphorus alloy coating is is 9-20 wt%, and the phosphorus content of the low-medium phosphorus nickel-phosphorus alloy coating is 3-9 wt%.

在某些实施方案中,镍磷合金组合镀层中相邻镀层之间的磷含量差为5重量%以上。In certain embodiments, the difference in phosphorus content between adjacent coatings in the nickel-phosphorus alloy composite coating is 5 wt% or more.

在某些实施方案中,多镀层堆叠结构还包括位于镍磷合金组合镀层的低-中磷镀层上的其他镀层。In certain embodiments, the multi-plating stack structure also includes other plating layers on the low-medium phosphorous plating layer of the nickel-phosphorus alloy combination plating.

在某些实施方案中,其他镀层包括单层、双层或多层的金属镀层、金属合金镀层或含磷合金镀层,或其组合。In certain embodiments, other coatings include single-, double-, or multi-layer metal coatings, metal alloy coatings, or phosphorous-containing alloy coatings, or combinations thereof.

在某些实施方案中,金属镀层包括铜,镍、金、银、锡、钯、铑镀层等;金属合金镀层包括银钯、金银、金镍、金钴、钯镍、钯钴、铑钌、铑钴、铑钯、镍钨、镍钴镀层等;含磷合金镀层包括镍磷、镍钴磷镀层等。In certain embodiments, metal coatings include copper, nickel, gold, silver, tin, palladium, rhodium coatings, etc.; metal alloy coatings include silver-palladium, gold-silver, gold-nickel, gold-cobalt, palladium-nickel, palladium-cobalt, rhodium-ruthenium , rhodium-cobalt, rhodium-palladium, nickel-tungsten, nickel-cobalt coating, etc.; phosphorus-containing alloy coating includes nickel-phosphorus, nickel-cobalt-phosphorus coating, etc.

在某些实施方案中,多镀层堆叠结构还包括基材,其中镍磷合金组合镀层直接形成在基材上。In certain embodiments, the multi-plating stack structure further includes a substrate, wherein the nickel-phosphorus alloy composite coating is formed directly on the substrate.

在某些实施方案中,多镀层堆叠结构还包括在基材上的底镀层,其中镍磷合金组合镀层形成在所述底镀层上。In certain embodiments, the multi-plating stack structure further includes an underplating layer on the substrate, wherein the nickel-phosphorus alloy combination plating layer is formed on the underplating layer.

在某些实施方案中,底镀层可以与其他镀层相同或不同,包括金属镀层、金属合金镀层、含磷合金镀层的单层、双层或者多层组合。In certain embodiments, the primer layer may be the same as or different from the other coatings, including single, double, or multi-layer combinations of metal coatings, metal alloy coatings, phosphorous-containing alloy coatings.

本发明的另一个方面提供一种制备多镀层堆叠结构的方法,包括:在基材上或者在基材表面的底镀层上,使用低磷的镀镍磷药水、高磷的镀镍磷药水和低-中磷的镀镍磷药水依次形成磷含量为0-4重量%的低磷的镍磷合金镀层、磷含量为9-20重量%的高磷的镍磷合金镀层和磷含量为3-9重量%的低-中磷的镍磷合金镀层。Another aspect of the present invention provides a method for preparing a multi-plating layer stack structure, comprising: using a low-phosphorus nickel-plating phosphorus solution, a high-phosphorus nickel-phosphorus solution, and The low-to-medium-phosphorus nickel-phosphorus plating solution sequentially forms a low-phosphorus nickel-phosphorus alloy coating with a phosphorus content of 0-4 wt%, a high-phosphorus nickel-phosphorus alloy coating with a phosphorus content of 9-20 wt%, and a phosphorus content of 3- 9 wt% low-medium phosphorus nickel-phosphorus alloy coating.

在某些实施方案中,采用化学镀方法形成低磷的镍磷合金镀层、高磷的镍磷合金镀层和低-中磷的镍磷合金镀层。In certain embodiments, electroless plating methods are employed to form low phosphorus nickel phosphorus alloy coatings, high phosphorus nickel phosphorus alloy coatings, and low-medium phosphorus nickel phosphorus alloy coatings.

在某些实施方案中,采用脉冲电镀方法形成低磷的镍磷合金镀层、高磷的镍磷合金镀层和低-中磷的镍磷合金镀层。In certain embodiments, pulsed electroplating methods are used to form low phosphorus nickel phosphorus alloy coatings, high phosphorus nickel phosphorus alloy coatings, and low-medium phosphorus nickel phosphorus alloy coatings.

在某些实施方案中,脉冲电镀的条件包括:脉冲电流密度1-100A/dm2,占空比0.1-0.5,频率1-100KHz。In certain embodiments, the conditions of pulse electroplating include: pulse current density 1-100 A/dm 2 , duty cycle 0.1-0.5, frequency 1-100 KHz.

在某些实施方案中,形成低磷的镍磷合金镀层的步骤可以用电镀镍或化学镀镍代替。In certain embodiments, the step of forming a low phosphorus nickel phosphorus alloy coating may be replaced by electroplating nickel or electroless nickel plating.

本发明的另一个方面提供多镀层堆叠结构的应用,包括在连接器和其他工业设备、通讯设备、电子设备、家用电器、航天航空、汽车零件、五金卫浴产品中的应用,以及在包括连续镀、滚镀和挂镀的电镀工艺生产中的应用。Another aspect of the present invention provides applications of multi-plating stack structures, including applications in connectors and other industrial equipment, communication equipment, electronic equipment, household appliances, aerospace, automotive parts, hardware and sanitary products, and applications including continuous plating , application in the production of electroplating process of barrel plating and rack plating.

根据本发明,通过特殊的低磷+高磷+低-中磷的镍磷合金镀层组合,在不同的镍磷合金镀层之间产生较大的电位差,从而能够防止腐蚀向纵深方向发展,提供更优异的耐腐蚀性能,且以硬度最大的低-中磷的镍磷合金镀层为最上层,使产品具备更优异的耐磨性能。According to the present invention, a large potential difference is generated between different nickel-phosphorus alloy coatings through a special combination of low-phosphorus + high-phosphorus + low-medium phosphorus nickel-phosphorus alloy coatings, so that corrosion can be prevented from developing in the depth direction, providing More excellent corrosion resistance, and the highest hardness low-medium phosphorus nickel-phosphorus alloy coating is the top layer, so that the product has more excellent wear resistance.

附图说明Description of drawings

参考以下附图对本发明的实施方案进行详细说明,以便于更全面地理解本发明,其中:Embodiments of the present invention are described in detail in order to facilitate a more complete understanding of the present invention with reference to the following drawings, wherein:

图1为本发明的多镀层堆叠结构中组合镍磷镀层的一个结构示意图。FIG. 1 is a schematic structural diagram of the combined nickel-phosphorus coating in the multi-coating stack structure of the present invention.

图2显示了不同磷含量的镍磷合金镀层对应的显微硬度值。Figure 2 shows the corresponding microhardness values of nickel-phosphorus alloy coatings with different phosphorus contents.

图3为显示本发明的镀层产品和比较镀层产品1的磨损测试结果的图(A:比较镀层产品1,B:本发明的镀层产品)。3 is a graph showing the abrasion test results of the plated product of the present invention and the comparative plated product 1 (A: the comparative plated product 1, B: the plated product of the present invention).

具体实施方式Detailed ways

本申请的发明人在对相关的堆叠镀层结构进行研究时发现:堆叠镀层结构,如镍+钯镍+金、铜+镍+钯镍+金等,大都采用电镀镍、电镀铜等作为打底或中间镀层,但是电镀镍、电镀铜等无法满足更高耐腐蚀性和耐磨性的要求。在采用电镀镍钨或镍磷合金代替电镀镍或电镀铜时,存在电镀镍钨、电镀镍磷存在工艺不稳定、镀层不均匀的问题,尤其是电镀镍磷合金,会在镀件的尖端区域和平面区域会出现镀层厚度和镍磷合金比例不均匀的现象,导致产品性能的不稳定性。而且,在单一镀层(镍、铜、镍钨等)作为底镀层或中间镀层时,一旦发生腐蚀,容易使得腐蚀向纵深方向迅速发展,产品迅速腐蚀而失效。The inventors of the present application found out when researching related stacked plating structures that the stacked plating structures, such as nickel+palladium-nickel+gold, copper+nickel+palladium-nickel+gold, etc., mostly use electroplating nickel, electroplating copper, etc. as the primer Or intermediate coating, but electroplating nickel, electroplating copper, etc. cannot meet the requirements of higher corrosion resistance and wear resistance. When electroplating nickel-tungsten or nickel-phosphorus alloy is used instead of nickel-plating or copper-plating, there are problems of unstable process and uneven coating of nickel-tungsten electroplating and nickel-phosphorus electroplating. There will be uneven coating thickness and nickel-phosphorus alloy ratio in the flat area, resulting in unstable product performance. Moreover, when a single coating (nickel, copper, nickel-tungsten, etc.) is used as the bottom coating or intermediate coating, once corrosion occurs, it is easy to cause the corrosion to develop rapidly in the depth direction, and the product quickly corrodes and fails.

针对上述问题,发明人设计了一种新型的多层镍磷合金镀层组合结构,在该结构的多层镍磷合金镀层中,由于在不同镀层之间产生足够的电势差,可防止腐蚀向纵深方向迅速发展;发明人还设计了通过化学镀或脉冲电镀形成镍磷合金镀层的方法,以解决电镀镍磷工艺不稳定、镀层不均匀的问题,从而完成了本发明。In view of the above problems, the inventor has designed a new type of composite structure of multi-layer nickel-phosphorus alloy coating. In the multi-layer nickel-phosphorus alloy coating of this structure, due to the sufficient potential difference between different coatings, corrosion can be prevented in the depth direction. Rapid development; the inventor also designed a method for forming a nickel-phosphorus alloy coating by electroless plating or pulse electroplating to solve the problems of unstable nickel-phosphorus electroplating process and uneven coating, thus completing the present invention.

以下将结合具体实施方式对本发明作进一步详细描述。将会懂得,考虑了其他实施方式,且不脱离本发明的范围或精神,可以实施这些其他实施方式。因此,以下的详细描述是非限制性的。The present invention will be described in further detail below with reference to specific embodiments. It will be understood that other embodiments are contemplated, which may be practiced without departing from the scope or spirit of the invention. Accordingly, the following detailed description is not limiting.

除非另外指明,否则本说明书和权利要求中使用的表示特征尺寸、数量和物化特性的所有数字均应该理解为在所有情况下均是由术语“约”来修饰的。因此,除非有相反的说明,否则上述说明书和所附权利要求书中列出的数值参数均是近似值,本领域的技术人员能够利用本文所公开的教导内容寻求获得的所需特性,适当改变这些近似值。用端点表示的数值范围的使用包括该范围内的所有数字以及该范围内的任何范围,例如,1至5包括1、1.1、1.3、1.5、2、2.75、3、3.80、4和5等等。Unless otherwise indicated, all numbers used in this specification and claims for the dimensions, quantities, and physicochemical properties of features should be understood to be modified in all instances by the term "about." Accordingly, unless indicated to the contrary, the numerical parameters set forth in the foregoing specification and attached claims are approximations that can be modified by those skilled in the art to obtain the desired properties sought to be obtained by the teachings disclosed herein. approximation. The use of numerical ranges by endpoints includes all numbers within that range and any range within that range, eg, 1 to 5 includes 1, 1.1, 1.3, 1.5, 2, 2.75, 3, 3.80, 4, and 5, etc. .

多镀层堆叠结构Multi-plating stack structure

本发明提供一种新的包含组合镍磷镀层的多镀层堆叠结构。The present invention provides a novel multi-coating stack structure comprising combined nickel-phosphorus coatings.

图1为本发明的多镀层堆叠结构中组合镍磷镀层的一个结构示意图。FIG. 1 is a schematic structural diagram of the combined nickel-phosphorus coating in the multi-coating stack structure of the present invention.

图1所示的组合镍磷镀层含有三层镀层,自下而上依次为低磷的镍磷合金镀层1、高磷的镍磷合金镀层2和低-中磷的镍磷合金镀层3。The combined nickel-phosphorus coating shown in FIG. 1 contains three layers, from bottom to top, low-phosphorus nickel-phosphorus alloy coating 1 , high-phosphorus nickel-phosphorus alloy coating 2 and low-medium phosphorus nickel-phosphorus alloy coating 3 .

在上述低磷+高磷+低-中磷三层镀层结构中,低磷的镍磷合金镀层1的磷含量可以为0-4重量%(即,当磷含量为0时,低磷的镍磷合金镀层可以为纯镍镀层),厚度可以为0.01-0.5μm,优选0.05-0.5μm。高磷的镍磷合金镀层2的磷含量可以为9-20重量%,低-中磷的镍磷合金镀层3的磷含量可以为3-9重量%,高磷镀层和低-中磷镀层的厚度可以依照实际需要适当调节,例如,高磷镀层的厚度可以为0.1-5μm,低-中磷镀层的厚度可以0.1-1μm等等。In the above-mentioned low-phosphorus+high-phosphorus+low-middle-phosphorus three-layer coating structure, the phosphorus content of the low-phosphorus nickel-phosphorus alloy coating 1 may be 0-4 wt % (that is, when the phosphorus content is 0, the low-phosphorus nickel The phosphorus alloy coating can be pure nickel coating), and the thickness can be 0.01-0.5 μm, preferably 0.05-0.5 μm. The phosphorus content of the high-phosphorus nickel-phosphorus alloy coating 2 may be 9-20 wt %, and the phosphorus content of the low-medium phosphorus nickel-phosphorus alloy coating 3 may be 3-9 wt %. The thickness can be appropriately adjusted according to actual needs, for example, the thickness of the high-phosphorus coating can be 0.1-5 μm, the thickness of the low-medium phosphorus coating can be 0.1-1 μm, and so on.

由于采用了低磷+高磷+低-中磷的特殊设计,不同镍磷合金镀层之间的磷浓度相差较大,可以在不同镀层之间产生较大的电位差,从而能够防止腐蚀向纵深方向发展,提供更优异的耐腐蚀性能。而且,以低磷的镍磷合金镀层作为最下层,可发挥低磷镀层上镀快、结合力好的特点;以高磷的镍磷合金镀层作为中间层,发挥高磷镀层的耐腐蚀性能高的优点(尤其当磷含量高于10%时,镍磷合金具有非晶结构,耐腐蚀性能大大提高);而以硬度最高的低-中磷镀层作为最上层,可以有效发挥中磷合金的高硬度,对上层金属起到砧板效应,使产品具备更优异的耐磨性能。Due to the special design of low phosphorus + high phosphorus + low-medium phosphorus, the phosphorus concentration between different nickel-phosphorus alloy coatings is quite different, and a large potential difference can be generated between different coatings, thereby preventing corrosion from deep. direction development, to provide more excellent corrosion resistance. In addition, the low-phosphorus nickel-phosphorus alloy coating is used as the bottom layer, which can exert the characteristics of fast plating and good bonding force on the low-phosphorus coating; the high-phosphorus nickel-phosphorus alloy coating is used as the middle layer, and the high-phosphorus coating has high corrosion resistance. (especially when the phosphorus content is higher than 10%, the nickel-phosphorus alloy has an amorphous structure, and the corrosion resistance is greatly improved); and the low-medium phosphorus coating with the highest hardness is used as the top layer, which can effectively exert the high performance of the medium phosphorus alloy. The hardness has a chopping block effect on the upper metal, so that the product has better wear resistance.

各个镀层的磷含量范围是基于上述考虑并结合镍磷合金的性质而确定的。例如,镍磷合金(镀层)随着磷含量的增加,其硬度先增大后减小。图2显示了不同磷含量的镍磷合金镀层对应的显微硬度值。可以看出,随着磷含量从0开始增加,镍磷合金的硬度快速增大,在磷含量约2-5重量%时,达到峰值,随后随着磷含量的进一步增加,硬度开始下降,在磷含量达到约8重量%后,下降明显。因此,本发明中,作为最上层的低-中磷镀层,其磷含量设定为3-9重量%,优选3-8重量%,以尽可能有效地发挥镍磷合金的高硬度优点。另外,随着镍磷合金中磷含量的增加,镍磷合金(镀层)的耐腐蚀性提高,尤其当磷含量高于10%时,镍磷合金的晶体结构表现为非晶,相比纯镍(晶体)和低磷的镀层更加细致,从而具有更优异的耐腐蚀性能。因此,本发明的高磷镀层的磷含量设定为9-20重量%,优选10-20重量%。The phosphorus content range for each coating was determined based on the above considerations in conjunction with the properties of the nickel-phosphorus alloy. For example, the hardness of nickel-phosphorus alloy (coating) increases first and then decreases with the increase of phosphorus content. Figure 2 shows the corresponding microhardness values of nickel-phosphorus alloy coatings with different phosphorus contents. It can be seen that as the phosphorus content increases from 0, the hardness of the nickel-phosphorus alloy increases rapidly, reaching a peak when the phosphorus content is about 2-5 wt%, and then with the further increase of the phosphorus content, the hardness begins to decrease, at After the phosphorus content reached about 8% by weight, the decrease was significant. Therefore, in the present invention, as the uppermost low-medium phosphorus plating layer, the phosphorus content is set at 3-9 wt %, preferably 3-8 wt %, so as to exert the high hardness advantage of nickel-phosphorus alloy as effectively as possible. In addition, with the increase of phosphorus content in the nickel-phosphorus alloy, the corrosion resistance of the nickel-phosphorus alloy (coating) is improved, especially when the phosphorus content is higher than 10%, the crystal structure of the nickel-phosphorus alloy is amorphous, compared with pure nickel. (Crystalline) and low-phosphorus coatings are more detailed, resulting in better corrosion resistance. Therefore, the phosphorus content of the high-phosphorus plating layer of the present invention is set to 9-20 wt %, preferably 10-20 wt %.

为了保证不同镍磷合金镀层之间存在较大的电位差,优选地,组合镍磷镀层中相邻镀层之间的磷含量差可以为5重量%以上,甚至6重量%或8重量%以上。In order to ensure that there is a large potential difference between different nickel-phosphorus alloy coatings, preferably, the phosphorus content difference between adjacent coatings in the combined nickel-phosphorus coating can be more than 5 wt %, or even more than 6 wt % or 8 wt %.

本发明的多镀层堆叠结构还可以包括位于组合镍磷镀层的低-中磷镀层上的其他镀层。The multi-plating stack structure of the present invention may also include other coatings on the low-medium phosphorus coating combined with the nickel phosphorus coating.

此处,其他镀层可以是本领域已知的任何金属镀层或其组合,包括金属镀层、金属合金镀层、含磷合金镀层的单层、双层或者多层组合等。例如,金属镀层可以包括铜,镍、金、银、锡、钯、铑等的镀层及其组合;金属合金镀层可以包括银钯、金银、金镍、金钴、钯镍、钯钴、铑钌、铑钴、铑钯、镍钨、镍钴等的镀层及其组合;含磷合金镀层可以包括镍磷、镍钴磷镀层等。其他镀层还可以是上述金属镀层、金属合金镀层和含磷合金镀层的组合。Here, the other coating may be any metal coating known in the art or a combination thereof, including metal coating, metal alloy coating, single-layer, double-layer or multi-layer combination of phosphorus-containing alloy coating, and the like. For example, metal coatings may include coatings of copper, nickel, gold, silver, tin, palladium, rhodium, etc., and combinations thereof; metal alloy coatings may include silver-palladium, gold-silver, gold-nickel, gold-cobalt, palladium-nickel, palladium-cobalt, rhodium Coatings of ruthenium, rhodium-cobalt, rhodium-palladium, nickel-tungsten, nickel-cobalt, etc., and combinations thereof; phosphorus-containing alloy coatings may include nickel-phosphorus, nickel-cobalt-phosphorus coatings, and the like. The other coating may also be a combination of the above-mentioned metal coating, metal alloy coating and phosphorus-containing alloy coating.

因此,多镀层堆叠结构可以具有以下结构之一:组合镍磷镀层;组合镍磷镀层+外层;组合镍磷镀层+中间层+外层;组合镍磷镀层+中间层1+中间层2+外层;组合镍磷镀层+中间层1+中间层2+中间层3+外层;组合镍磷镀层+中间层1+中间层2+中间层3+中间层4+外层;组合镍磷镀层+中间层1+中间层2+中间层3+中间层4+中间层5+外层,其中的外层和中间层可以为金属镀层、金属合金镀层、含磷合金镀层中的任一种。Therefore, the multi-plating stack structure may have one of the following structures: combined nickel phosphorus coating; combined nickel phosphorus coating + outer layer; combined nickel phosphorus coating + intermediate layer + outer layer; combined nickel phosphorus coating + intermediate layer 1 + intermediate layer 2+ Outer layer; combined nickel phosphorus coating + intermediate layer 1 + intermediate layer 2 + intermediate layer 3 + outer layer; combined nickel phosphorus coating + intermediate layer 1 + intermediate layer 2 + intermediate layer 3 + intermediate layer 4 + outer layer; combined nickel phosphorus coating Coating layer + intermediate layer 1 + intermediate layer 2 + intermediate layer 3 + intermediate layer 4 + intermediate layer 5 + outer layer, wherein the outer layer and the intermediate layer can be any one of metal coating, metal alloy coating and phosphorus-containing alloy coating .

本发明的多镀层堆叠结构形成在基材上,其中组合镍磷镀层可以直接形成在基材上,或者组合镍磷镀层可以形成在基材的底镀层上。The multi-plating layer stack structure of the present invention is formed on the substrate, wherein the combined nickel-phosphorus coating layer can be directly formed on the substrate, or the combined nickel-phosphorus coating layer can be formed on the bottom coating layer of the substrate.

此处所述的基材可以为本领域常用的基材,例如金属或合金基材。为了形成良好的镀层,可以对基材表面进行预处理,例如,除油和去表面氧化层处理。The substrates described herein can be substrates commonly used in the art, such as metal or alloy substrates. In order to form a good coating, the surface of the substrate can be pretreated, such as degreasing and surface oxide treatment.

可以先在基材上形成底镀层,再在底镀层上形成组合镍磷镀层及其他镀层。此处,底镀层可以包括上述的金属镀层、金属合金镀层、含磷合金镀层的单层、双层或者多层组合,其可以与其他镀层相同也可以与其他镀层不同。An undercoating layer can be formed on the base material first, and then a combined nickel-phosphorus plating layer and other plating layers can be formed on the undercoating layer. Here, the undercoating layer may include single-layer, double-layer or multi-layer combination of the above-mentioned metal plating layer, metal alloy plating layer and phosphorus-containing alloy plating layer, which may be the same as or different from other plating layers.

制备多镀层堆叠结构的方法Method for preparing multi-layer stack structure

本发明还提供一种制备多镀层堆叠结构的方法,包括在基材上或者在基材表面的底镀层上,使用低磷的镀镍磷药水、高磷的镀镍磷药水和低-中磷的镀镍磷药水依次形成低磷的镍磷合金镀层、高磷的镍磷合金镀层和低-中磷的镍磷合金镀层。The present invention also provides a method for preparing a multi-plating layer stack structure, comprising using a low-phosphorus nickel-phosphorus-plating solution, a high-phosphorus nickel-phosphorus solution, and a low-medium phosphorus solution on the substrate or on the bottom coating layer on the surface of the substrate. The nickel-phosphorus plating solution forms a low-phosphorus nickel-phosphorus alloy coating layer, a high-phosphorus nickel-phosphorus alloy coating layer, and a low-medium phosphorus nickel-phosphorus alloy coating layer in turn.

此处,低磷的镍磷合金镀层、高磷的镍磷合金镀层、低-中磷的镍磷合金镀层、以及基材和底镀层与上面的“多镀层堆叠结构”部分中的描述相同。Here, the low-phosphorus nickel-phosphorus alloy coating, the high-phosphorus nickel-phosphorus alloy coating, the low-medium phosphorus nickel-phosphorus alloy coating, and the substrate and undercoating layers are the same as described in the "Multi-Plating Stacked Structure" section above.

低磷镀镍磷药水、高磷镀镍磷药水和低-中磷的镀镍磷药水可以从市场上购买得到。可以根据用于形成镍磷合金镀层的方法,选择相应的低磷、高磷和低-中磷的镀镍磷药水。Low-phosphorus nickel-plated phosphorus potions, high-phosphorus nickel-plated phosphorus potions, and low-medium-phosphorus nickel-plated phosphorus potions are commercially available. Corresponding low-phosphorus, high-phosphorus, and low-medium-phosphorus nickel-phosphorus plating solutions can be selected according to the method used to form the nickel-phosphorus alloy coating.

本发明用于形成低磷、高磷和低-中磷的镍磷合金镀层的方法可以包括化学镀和脉冲电镀方法。发明人发现电镀镍磷工艺存在以下问题:电镀过程中由于电流分布的不一致,使镀件上存在明显的边缘效应或者尖端放电的效应,使得镍磷镀层在边缘和尖端的厚度远高于平面区域,这会使得尺寸要求高的产品达不到使用要求。同时,电镀合金层在边缘和尖端区域的磷含量低于平面区域,不同的镍磷合金比例会造成产品性能的不一致性。为此,本发明采用化学镀镍磷,使得产品的不同位置都能获得一致的厚度和镍磷合金比例。进一步,针对直流电镀镍磷存在的镀层分布不均匀、孔隙率高、结晶不细致等问题以及化学镀镍磷生产效率较低的问题,本发明还可以采用脉冲电镀镍磷工艺,使镍磷镀层的结晶更加细致和均匀,且电镀效率更高,延长药水的使用寿命。The methods of the present invention for forming low-phosphorus, high-phosphorus, and low-medium-phosphorus nickel-phosphorus alloy coatings may include electroless plating and pulse electroplating methods. The inventor found that the nickel-phosphorus electroplating process has the following problems: due to the inconsistent current distribution during the electroplating process, there is an obvious edge effect or tip discharge effect on the plated part, so that the thickness of the nickel-phosphorus coating at the edge and tip is much higher than the flat area. , which will make products with high size requirements fail to meet the requirements for use. At the same time, the phosphorus content of the plated alloy layer in the edge and tip regions is lower than that in the flat region, and different nickel-phosphorus alloy ratios will cause inconsistencies in product performance. To this end, the present invention adopts electroless nickel-phosphorus plating, so that consistent thickness and nickel-phosphorus alloy ratio can be obtained at different positions of the product. Further, in view of the problems of uneven distribution of the coating layer, high porosity, and imprecise crystallization in direct current electroplating of nickel and phosphorus, as well as the problems of low production efficiency of electroless nickel and phosphorus plating, the present invention can also adopt the pulse electroplating nickel phosphorus process to make the nickel phosphorus coating layer. The crystals are more detailed and uniform, and the electroplating efficiency is higher, extending the service life of the potion.

本发明的化学镀镍磷可以选用从市场上购买得到的化学镀镍磷药水,包括低磷、高磷和低-中磷的化学镀镍磷药水,按照一般的化学镀工艺进行。当然,各个镍磷合金镀层的厚度可以通过调节化学镀的工艺条件(例如温度)和时间等加以控制。The electroless nickel-phosphorus plating of the present invention can be selected from commercially available electroless nickel-phosphorus syrups, including low-phosphorus, high-phosphorus and low-medium-phosphorus electroless nickel-phosphorus syrups, and is carried out according to a general electroless plating process. Of course, the thickness of each nickel-phosphorus alloy plating layer can be controlled by adjusting the process conditions (eg, temperature) and time of electroless plating.

本发明的脉冲电镀镍磷可以选用从市场上购买得到的电镀镍磷药水,在以下脉冲条件下进行:脉冲电流密度1-100A/dm2,占空比0.1-0.5,频率1-100KHz。例如,脉冲条件可以为10-30A/dm2,占空比0.1-0.3,频率5-50KHz。The pulsed nickel-phosphorus electroplating of the present invention can be carried out by using commercially available electroplating nickel-phosphorus syrup under the following pulse conditions: pulse current density 1-100A/dm 2 , duty ratio 0.1-0.5, frequency 1-100KHz. For example, the pulse condition may be 10-30A/dm 2 , duty cycle 0.1-0.3, frequency 5-50KHz.

虽然低磷、高磷和低-中磷的三层镍磷合金镀层都可以采用化学镀和脉冲电镀方法形成,但是,形成低磷的镍磷合金镀层的步骤可以用电镀镍(例如电镀冲击镍)或化学镀镍代替,即,形成磷含量为0的镍镀层。Although low-phosphorus, high-phosphorus, and low-medium phosphorus three-layer nickel-phosphorus alloy coatings can all be formed by electroless plating and pulse plating methods, the step of forming a low-phosphorus nickel-phosphorus alloy coating can be performed with electroplated nickel (such as electroplating shock Nickel) or electroless nickel plating, ie, a nickel plating layer with 0 phosphorus content is formed.

本发明的制备多镀层堆叠结构的方法还可以包括在低-中磷的镍磷合金镀层上形成其他镀层的步骤。The method for preparing the multi-plating layer stack structure of the present invention may further include the step of forming other plating layers on the low-medium phosphorus nickel-phosphorus alloy plating layer.

关于“其他镀层”,详见上面的“多镀层堆叠结构”中的相关描述。例如,其他镀层可以包括铜、镍、金、银、锡、钯、铑、银钯、金银、金镍、金钴、钯镍、钯钴、铑钌、铑钴、铑钯、镍钨、镍钴、镍钴磷、镍磷等的单层、双层、多层镀层或其组合。For the "other plating layers", please refer to the relevant descriptions in the "Multiple Plating Layer Stacked Structure" above. For example, other coatings may include copper, nickel, gold, silver, tin, palladium, rhodium, silver palladium, gold silver, gold nickel, gold cobalt, palladium nickel, palladium cobalt, rhodium ruthenium, rhodium cobalt, rhodium palladium, nickel tungsten, Single-layer, double-layer, multi-layer plating of nickel-cobalt, nickel-cobalt-phosphorus, nickel-phosphorus, etc., or a combination thereof.

在形成镍磷合金镀层,或者在形成底镀层之前,可以对基材进行表面预处理。对于金属或合金基材而言,表面预处理可以包括除油(例如电解除油)和去表面氧化层处理(例如用酸进行处理)。The substrate may be subjected to surface pretreatment prior to forming the nickel-phosphorus alloy coating, or prior to forming the undercoating. For metal or alloy substrates, surface pretreatment may include degreasing (eg, electrolytic degreasing) and surface oxide removal (eg, treatment with acid).

多镀层堆叠的应用Application of Multiple Plating Stacks

依据实际需求,本发明的镍磷合金组合镀层可应用在任何基材或者镀层上,而且可以应用在连续镀、滚镀、挂镀等不同的电镀生产工艺中。According to actual needs, the nickel-phosphorus alloy composite coating of the present invention can be applied to any substrate or coating, and can be applied to different electroplating production processes such as continuous plating, barrel plating, and rack plating.

因此,本发明的多镀层堆叠结构可用于但不限于以下应用:连接器和其他工业设备、通讯设备、电子设备、家用电器、航天航空、汽车零件、五金卫浴产品,尤其是用于连接器、电子设备、汽车等行业的防腐、耐蚀、耐磨、耐温、焊接、导磁等功能。Therefore, the multi-plating stack structure of the present invention can be used for but not limited to the following applications: connectors and other industrial equipment, communication equipment, electronic equipment, household appliances, aerospace, auto parts, hardware and sanitary products, especially for connectors, Anti-corrosion, corrosion resistance, wear resistance, temperature resistance, welding, magnetic conductivity and other functions in electronic equipment, automobile and other industries.

实施例Example

以下通过举例说明的方式示出若干具体实施例。应当理解,在不脱离本发明的范围或精神的情况下,设想了其他实施例并可以进行修改。因此,以下的具体实施例不具有限制性意义。Several specific embodiments are shown below by way of illustration. It is to be understood that other embodiments are contemplated and modifications may be made without departing from the scope or spirit of the invention. Therefore, the following specific examples are not intended to be limiting.

除非另外指出,以下提及的“%”为“重量%”。Unless otherwise indicated, "%" mentioned below is "% by weight".

实施例1Example 1

选取铜合金基材的样品,先电解除油,再用5%硫酸活化,去除表面氧化层。A sample of a copper alloy substrate was selected, first electrolyzed to remove oil, and then activated with 5% sulfuric acid to remove the surface oxide layer.

把样品放入低磷化学镀镍磷药水(硫酸镍35g/L,次磷酸钠20g/L,乙酸钠6g/L,乳酸20ml/L,丙酸8ml/L,十二烷基苯磺酸钠0.04g/L,pH5.5,温度75℃)中,控制pH=9.5,温度40摄氏度,使样品快速上镀,在表面沉积约0.1μm的低磷镍(磷含量1%)。Put the sample into the low phosphorus electroless nickel plating phosphorus solution (nickel sulfate 35g/L, sodium hypophosphite 20g/L, sodium acetate 6g/L, lactic acid 20ml/L, propionic acid 8ml/L, sodium dodecylbenzenesulfonate 0.04g/L, pH5.5, temperature 75°C), control pH=9.5, temperature 40°C, make the sample quickly plated, and deposit about 0.1 μm low-phosphorus nickel (phosphorus content 1%) on the surface.

把样品放入高磷化学镀镍磷药水(硫酸镍20g/L,次磷酸钠45g/L,乙酸钠6g/L,乳酸20ml/L,丙酸8ml/L,十二烷基苯磺酸钠0.04g/L,pH4.5,温度75℃)中,控制pH=9.5,温度40摄氏度,使样品沉积上非晶结构的高磷合金(磷含量12%),厚度1μm。Put the sample into high phosphorus electroless nickel plating phosphorus solution (nickel sulfate 20g/L, sodium hypophosphite 45g/L, sodium acetate 6g/L, lactic acid 20ml/L, propionic acid 8ml/L, sodium dodecylbenzenesulfonate 0.04g/L, pH 4.5, temperature 75°C), control pH=9.5, temperature 40°C, so that the sample is deposited on an amorphous high phosphorus alloy (phosphorus content 12%) with a thickness of 1 μm.

把样品放入低-中磷化学镀镍磷药水(硫酸镍30g/L,次磷酸钠40g/L,乙酸钠6g/L,乳酸20ml/L,丙酸8ml/L,十二烷基苯磺酸钠0.04g/L,pH5.0,温度75℃)中,控制pH=9.5,温度40摄氏度,使样品表面沉积上0.2μm厚度的低-中磷镍(磷含量4%)。Put the sample into the low-medium phosphorus electroless nickel plating phosphorus solution (nickel sulfate 30g/L, sodium hypophosphite 40g/L, sodium acetate 6g/L, lactic acid 20ml/L, propionic acid 8ml/L, dodecylbenzenesulfonic acid Sodium 0.04g/L, pH 5.0, temperature 75°C), control pH=9.5, temperature 40°C, and deposit 0.2 μm-thick low-medium phosphorus nickel (phosphorus content 4%) on the surface of the sample.

然后,把样品放入镀钴金药水中,电镀上0.76μm的金钴合金。Then, the sample was placed in a cobalt-plated gold solution and electroplated with a 0.76 μm gold-cobalt alloy.

如此,获得以三层化学镍磷为组合底镀层的镀层产品1。In this way, a plating product 1 with three layers of chemical nickel-phosphorus as a combined bottom plating layer is obtained.

实施例2Example 2

重复与实施例1相同的工序,但是在形成低磷镍镀层、高磷合金镀层和低-中磷镍镀层的步骤中分别形成磷含量为4%的低磷镍镀层(厚度约0.1μm)、磷含量为15%的高磷合金镀层(厚度1μm)和磷含量为8%的低-中磷镍镀层(厚度0.2μm),获得镀层产品2。The same procedure as in Example 1 was repeated, but in the steps of forming the low-phosphorus nickel coating, the high-phosphorus alloy coating, and the low-medium phosphorus nickel coating, respectively, a low-phosphorus nickel coating (thickness about 0.1 μm) with a phosphorus content of 4% was formed, A high-phosphorus alloy coating (thickness 1 μm) with a phosphorus content of 15% and a low-medium phosphorus nickel coating (thickness 0.2 μm) with a phosphorus content of 8% were obtained as a coating product 2.

实施例3Example 3

除了采用电镀冲击镍代替形成低磷镍镀层的步骤之外,重复与实施例1相同的工序,获得镀层产品3。A plated product 3 was obtained by repeating the same procedure as in Example 1, except that electroplating impact nickel was used instead of the step of forming the low-phosphorus nickel plated layer.

实施例4Example 4

选取铜合金基材的样品,先电解除油,再用5%硫酸活化,去除表面氧化层。A sample of a copper alloy substrate was selected, first electrolyzed to remove oil, and then activated with 5% sulfuric acid to remove the surface oxide layer.

把样品放入低磷电镀镍磷药水(氨基磺酸镍495g/L,氯化镍10g/L,次磷酸钠30g/L,硼酸35g/L,氨基磺酸40g/L)中,控制温度65℃,pH=1.2,在脉冲电流密度20A/dm2,占空比0.2,频率10KHz的条件下,通过脉冲电镀在表面沉积约0.1μm左右的低磷镍(磷含量1%)。Put the sample into the low-phosphorus electroplating nickel-phosphorus solution (495g/L of nickel sulfamate, 10g/L of nickel chloride, 30g/L of sodium hypophosphite, 35g/L of boric acid, 40g/L of sulfamic acid), and control the temperature to 65 g/L. ℃, pH=1.2, under the conditions of pulse current density 20A/dm 2 , duty cycle 0.2, frequency 10KHz, low phosphorus nickel (phosphorus content 1%) of about 0.1 μm was deposited on the surface by pulse electroplating.

把样品放入高磷电镀镍磷药水(氨基磺酸镍380g/L,氯化镍10g/L,次磷酸钠70g/L,硼酸35g/L,氨基磺酸60g/L)中,控制温度65℃,pH=1.2,脉冲电流密度20A/dm2,占空比0.2,频率10KHz,在刚沉积的低磷镍镀层表面脉冲电镀上非晶结构的高磷合金(磷含量12%),厚度1μm。Put the sample into high-phosphorus electroplating nickel-phosphorus syrup (nickel sulfamate 380g/L, nickel chloride 10g/L, sodium hypophosphite 70g/L, boric acid 35g/L, sulfamic acid 60g/L), control the temperature 65g/L ℃, pH=1.2, pulse current density 20A/dm 2 , duty cycle 0.2, frequency 10KHz, high-phosphorus alloy with amorphous structure (phosphorus content 12%) was pulse-plated on the surface of the just-deposited low-phosphorus nickel coating, thickness 1μm .

把样品放入低-中磷电镀镍磷药水(氨基磺酸镍430g/L,氯化镍10g/L,次磷酸钠50g/L,硼酸35g/L,氨基磺酸55g/L)中,控制温度65℃,pH=1.2,脉冲电流密度20A/dm2,占空比0.2,频率10KHz。在刚沉积的高磷镍镀层表面脉冲电镀上0.2μm厚度低-中磷镍(磷含量4%)。Put the sample into the low-medium phosphorus electroplating nickel phosphorus solution (430g/L of nickel sulfamate, 10g/L of nickel chloride, 50g/L of sodium hypophosphite, 35g/L of boric acid, 55g/L of sulfamic acid), control The temperature is 65°C, pH=1.2, pulse current density is 20A/dm 2 , duty cycle is 0.2, and frequency is 10KHz. Low-medium phosphorus nickel (4% phosphorus content) was pulse plated on the surface of the freshly deposited high phosphorus nickel coating with a thickness of 0.2 μm.

把样品放入电镀金钴的药水中,直流电镀上0.76μm金钴合金。Put the sample into the electroplating gold-cobalt potion, and direct-current electroplating on 0.76μm gold-cobalt alloy.

如此,获得以三层化学镍磷为组合底镀层的镀层产品4。In this way, a coating product 4 with three layers of chemical nickel phosphorus as the combined bottom coating layer is obtained.

实施例5Example 5

重复与实施例4相同的工序,但是将脉冲电镀条件变为:脉冲电流密度10A/dm2,占空比0.5,频率20KHz,并且在形成低磷镍镀层、高磷合金镀层和低-中磷镍镀层的步骤中分别形成磷含量为4%的低磷镍镀层(厚度约0.1μm)、磷含量为15%的高磷合金镀层(厚度1μm)和磷含量为8%的低-中磷镍镀层(厚度0.2μm),获得镀层产品5。The same procedure as in Example 4 was repeated, but the pulse plating conditions were changed to: pulse current density of 10A/dm 2 , duty cycle of 0.5, frequency of 20KHz, and the formation of low-phosphorus nickel plating, high-phosphorus alloy plating and low-medium phosphorus In the nickel plating step, a low-phosphorus nickel coating (thickness of about 0.1 μm) with a phosphorus content of 4%, a high-phosphorus alloy coating (thickness 1 μm) with a phosphorus content of 15%, and a low-medium phosphorus nickel layer with a phosphorus content of 8% are respectively formed Plating (thickness 0.2 μm), plating product 5 was obtained.

实施例6Example 6

除了采用化学镀镍代替形成脉冲电镀低磷镍镀层的步骤之外,重复与实施例4相同的工序,获得镀层产品6。A plated product 6 was obtained by repeating the same procedure as in Example 4, except that electroless nickel plating was used instead of the step of forming the pulse electroplating low-phosphorus nickel plated layer.

比较例1Comparative Example 1

选取铜合金基材的样品,先电解除油,再用5%硫酸活化,去除表面氧化层。A sample of a copper alloy substrate was selected, first electrolyzed to remove oil, and then activated with 5% sulfuric acid to remove the surface oxide layer.

采用直流电镀工艺,在样品上电镀厚度为1.27μm的单层镍作为底镀层,然后,放入镀钴金药水中,电镀上0.76μm的金钴合金,获得比较镀层产品1。Using the DC electroplating process, a single layer of nickel with a thickness of 1.27 μm was electroplated on the sample as the bottom coating, and then, it was placed in a cobalt-plated gold solution and electroplated with a gold-cobalt alloy of 0.76 μm to obtain a comparative coating product 1.

比较例2Comparative Example 2

选取铜合金基材的样品,先电解除油,再用5%硫酸活化,去除表面氧化层。A sample of a copper alloy substrate was selected, first electrolyzed to remove oil, and then activated with 5% sulfuric acid to remove the surface oxide layer.

采用电镀镀镍磷药水(硫酸镍35g/L,次磷酸钠20g/L,乙酸钠6g/L,乳酸20ml/L,丙酸8ml/L,十二烷基苯磺酸钠0.04g/L,pH 5.5,温度75℃),通过直流电镀工艺在样品上电镀厚度约1.2μm的单层镍磷合金镀层作为底镀层,然后,放入镀钴金药水中,电镀上0.76μm的金钴合金,获得比较镀层产品2。Electroplating nickel-plated phosphorus solution (nickel sulfate 35g/L, sodium hypophosphite 20g/L, sodium acetate 6g/L, lactic acid 20ml/L, propionic acid 8ml/L, sodium dodecylbenzenesulfonate 0.04g/L, pH 5.5, temperature 75°C), a single-layer nickel-phosphorus alloy coating with a thickness of about 1.2 μm was electroplated on the sample through the DC electroplating process as the bottom coating, and then, put into the cobalt-plating gold solution, and electroplated with 0.76 μm of gold-cobalt alloy, Comparative Coated Product 2 was obtained.

对所得的镀层产品1-6和比较镀层产品1-2进行耐腐蚀性测试(盐雾测试)和磨损测试。Corrosion resistance test (salt spray test) and abrasion test were performed on the resultant coated products 1-6 and comparative coated products 1-2.

耐腐蚀性测试条件:把500ml的硝酸溶液倒入干净的干燥器中,密封静置30分钟后。把镀好的样品放置在干燥器中高于液面5cm的位置,使样品充分暴露在密封好的硝酸蒸汽中,30分钟后取出样品放入125摄氏度的干燥箱中干燥30分钟,随后在显微镜下观察样品表面的腐蚀状态。Corrosion resistance test conditions: Pour 500ml of nitric acid solution into a clean desiccator, seal it and let it stand for 30 minutes. Place the plated sample in a desiccator at a position 5cm above the liquid surface, so that the sample is fully exposed to the sealed nitric acid vapor. After 30 minutes, take out the sample and put it in a drying box at 125 degrees Celsius to dry for 30 minutes, and then put it under a microscope. The corrosion state of the sample surface was observed.

磨损测试实验条件:在样品(平板状)上方用同样材质的半圆球施加正向压力50N,来回5cm往复运动,50个循环后在显微镜下观察样品表面划痕。Abrasion test experimental conditions: apply a positive pressure of 50N on the top of the sample (flat plate) with a hemisphere of the same material, reciprocate back and forth 5cm, and observe the scratches on the surface of the sample under a microscope after 50 cycles.

结果显示:比较镀层产品1-2的表面上,平均每平方厘米出现了15个腐蚀点,镀层产品1-6表面只有1或2个腐蚀点。另外,如图3所示,比较镀层产品1划痕较深、划痕区域较宽,而镀层产品1-6划痕很浅,很轻微。The results show that on the surface of the comparative coating products 1-2, there are 15 corrosion points per square centimeter on average, and the surface of the coating products 1-6 has only 1 or 2 corrosion points. In addition, as shown in Fig. 3, the comparison coating product 1 has deeper scratches and wider scratch areas, while the coating products 1-6 have very shallow and slight scratches.

应当理解,本发明并非意图受本文所给出的示例性实施例和实例的不当限制,这些实例和实施例仅以举例的方式提供,本发明的范围旨在仅受所附权利要求的限制。It should be understood that the present invention is not intended to be unduly limited by the exemplary embodiments and examples presented herein, which are provided by way of example only, and that the scope of the present invention is intended to be limited only by the appended claims.

Claims (15)

1. The utility model provides a many cladding material stack structure, it includes nickel phosphorus alloy combination cladding material, nickel phosphorus alloy combination cladding material includes from bottom to top in proper order: a low-phosphorus nickel-phosphorus alloy plating layer, a high-phosphorus nickel-phosphorus alloy plating layer, and a low-medium phosphorus nickel-phosphorus alloy plating layer, wherein the phosphorus content of the low-phosphorus nickel-phosphorus alloy plating layer is 0-4 wt%, the phosphorus content of the high-phosphorus nickel-phosphorus alloy plating layer is 9-20 wt%, and the phosphorus content of the low-medium phosphorus nickel-phosphorus alloy plating layer is 3-9 wt%.
2. The multiple plating layer stack structure of claim 1, wherein the difference in phosphorous content between adjacent plating layers in the nickel phosphorous alloy combination plating layer is 5 wt.% or more.
3. The multi-plating layer stack of claim 1, wherein the multi-plating layer stack further comprises an additional plating layer on the low-mid-phosphorous plating layer of the nickel phosphorous alloy combination plating layer.
4. The multiple plating stack structure of claim 3, wherein the additional plating layer comprises a single, double, or multiple layer metal plating, metal alloy plating, or phosphorous alloy plating, or a combination thereof.
5. The multi-plating stack structure of claim 4, wherein the metal plating comprises copper, nickel, gold, silver, tin, palladium, rhodium plating; the metal alloy plating layer comprises silver palladium, gold and silver, gold nickel, gold cobalt, palladium nickel, palladium cobalt, rhodium ruthenium, rhodium cobalt, rhodium palladium, nickel tungsten and nickel cobalt plating layers; the phosphorus-containing alloy coating comprises a nickel-phosphorus coating and a nickel-cobalt-phosphorus coating.
6. The multi-plating layer stack structure of claim 1, wherein the multi-plating layer stack structure further comprises a substrate, wherein the nickel phosphorous alloy combination plating layer is formed directly on the substrate.
7. The multi-plating layer stack structure of claim 1, wherein the multi-plating layer stack structure further comprises a substrate having an undercoat layer formed thereon, wherein a nickel-phosphorus alloy composite plating layer is formed on the undercoat layer.
8. The multiple plating stack structure of claim 7, wherein the base plating layer may be the same or different from the other plating layers, including a single layer, a double layer, or a multi-layer combination of metal plating, metal alloy plating, phosphorous alloy plating.
9. A method of making the multi-plating stack structure of any of claims 1-8, comprising: on the base material or on the bottom plating layer of the surface of the base material, a low-phosphorus nickel-phosphorus alloy plating layer with the phosphorus content of 0-4 wt%, a high-phosphorus nickel-phosphorus alloy plating layer with the phosphorus content of 9-20 wt% and a low-medium-phosphorus nickel-phosphorus alloy plating layer with the phosphorus content of 3-9 wt% are formed in sequence by using low-phosphorus nickel-phosphorus liquid medicine, high-phosphorus nickel-phosphorus liquid medicine and low-medium-phosphorus nickel-phosphorus liquid medicine.
10. The method of claim 9, wherein the low-phosphorous, high-phosphorous, and low-intermediate phosphorous nickel phosphorous alloy plating is formed using an electroless plating process.
11. The method of claim 9, wherein the low-phosphorous, high-phosphorous, and low-intermediate phosphorous nickel-phosphorous alloy plating is formed using a pulse plating process.
12. The method of claim 11, wherein the conditions of the pulse plating comprise: pulse current density of 1-100A/dm2Duty ratio of 0.1-0.5, and frequency of 1-100 KHz.
13. The method of claim 9, wherein the step of forming the low-phosphorous nickel-phosphorous alloy plating is replaced with electro-or electroless nickel plating.
14. Use of the multi-coating stack according to any of claims 1-8 in connectors and other industrial equipment, communication equipment, electronic equipment, household appliances, aerospace, automotive parts, sanitary and bathroom hardware products.
15. Use of a multi-layer stack according to any of claims 1-8 in the production of an electroplating process, including continuous plating, barrel plating and rack plating.
CN201910003801.6A 2019-01-03 2019-01-03 Multi-coating stacked structure, preparation method and application thereof Pending CN111394716A (en)

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