Disclosure of Invention
The invention aims to realize efficient harmless degradation of SF 6. In order to achieve the above purpose, the invention provides an SF 6 degradation device and method based on gas-liquid two-phase dielectric barrier discharge plasma.
In a first aspect, the embodiment of the invention provides an SF 6 degradation device based on gas-liquid two-phase dielectric barrier discharge plasma, which comprises an air inlet control module, a dielectric barrier discharge reaction module, an alkaline solution tank and an alkaline solution feeding module;
The air inlet control module comprises an air distribution air mixing unit, and an SF 6 air cylinder and an inert gas air cylinder which are connected with the air distribution air mixing unit, wherein the SF 6 air cylinder and the inert gas air cylinder are respectively used for supplying SF 6 air and inert gas to the air distribution air mixing unit, the air distribution air mixing unit is used for diluting the SF 6 air by using the inert gas and distributing the SF 6 air and the inert gas according to a preset proportion to obtain mixed gas;
The dielectric barrier discharge reaction module comprises a dielectric barrier reactor and a plasma power supply externally connected with the dielectric barrier reactor, wherein the plasma power supply is used for applying voltage to the dielectric barrier reactor so as to enable an electric field to be formed inside the dielectric barrier reactor, an air inlet of the dielectric barrier reactor is connected with the gas distribution gas mixing unit, and the dielectric barrier reactor is used for exciting inert gas in the mixed gas into plasma by utilizing the electric field and degrading SF 6 gas in the mixed gas based on the electric field and the plasma to obtain low-fluorine sulfide;
the alkali liquor supply module is respectively connected with the alkaline solution tank and the dielectric barrier reactor, and is used for supplying alkaline solution in the alkaline solution tank to the dielectric barrier reactor;
the dielectric barrier reactor is also used for exciting the alkaline solution by utilizing the plasma to generate hydroxyl ions, and degrading the low-fluorine sulfide based on the hydroxyl ions to obtain degradation tail gas;
the alkaline solution tank is connected with the air outlet of the dielectric barrier reactor and is used for absorbing the degradation tail gas.
Preferably, the method further comprises:
The alkali liquor gas washing tank is connected with the alkaline solution tank and is used for absorbing degradation tail gas which is not absorbed in the alkaline solution tank.
Preferably, the inert gas in the inert gas cylinder includes Ar gas.
Preferably, the distribution gas mixing unit comprises a mass flowmeter, wherein the mass flowmeter is used for controlling the feeding concentration and the feeding flow rate of SF 6 gas and inert gas in real time.
Preferably, the dielectric barrier reactor is a coaxial dielectric barrier reactor.
Preferably, the dielectric barrier reactor comprises a high-voltage electrode and a low-voltage electrode which are coaxially connected, wherein the high-voltage electrode is wrapped by a barrier medium, and the plasma power supply is externally connected with the high-voltage electrode and the low-voltage electrode.
Preferably, the alkali liquor feeding module comprises a pumping unit and an atomizing unit, wherein one end of the pumping unit is connected with the alkaline solution tank, the other end of the pumping unit is connected with the atomizing unit, the pumping unit is used for pumping alkaline solution in the alkaline solution tank into the atomizing unit, the atomizing unit is arranged on one side of an air inlet of the dielectric barrier reactor, and the atomizing unit is used for feeding uniformly atomized alkaline solution into the dielectric barrier reactor.
Preferably, the pumping unit is a peristaltic pump.
Preferably, the atomizing unit is an atomizing spray header.
Preferably, the alkaline solution in the alkaline solution tank comprises NaOH solution.
In a second aspect, an embodiment of the present invention provides an SF 6 degradation method based on a gas-liquid two-phase dielectric barrier discharge plasma, where the SF 6 degradation method is applied to an SF 6 degradation device as described above, and the SF 6 degradation method includes:
SF 6 gas cylinder and inert gas cylinder respectively supply SF 6 gas and inert gas to the gas distribution and mixing unit;
The gas distribution and mixing unit utilizes the inert gas to dilute the SF 6 gas, and distributes the SF 6 gas and the inert gas according to a preset proportion to obtain mixed gas;
The plasma power supply applies voltage to the dielectric barrier reactor so as to form an electric field inside the dielectric barrier reactor;
The dielectric barrier reactor utilizes the electric field to excite inert gas in the mixed gas into plasma, and based on the electric field and the plasma, SF 6 gas in the mixed gas is degraded to obtain low-fluorine sulfide;
An alkali liquor feeding module feeds an alkaline solution in an alkaline solution tank to the dielectric barrier reactor;
The dielectric barrier reactor utilizes the plasma to excite the alkaline solution to generate hydroxyl ions, and degrades the low-fluorine sulfide based on the hydroxyl ions to obtain degradation tail gas;
the alkaline solution tank absorbs the degradation tail gas.
Preferably, after the dielectric barrier reactor excites the alkaline solution by the plasma to generate hydroxyl ions and degrades the hypofluorite based on the hydroxyl ions to obtain degradation tail gas, the method further comprises:
And detecting components of the degraded tail gas to obtain SF 6 degradation rate and SF 6 energy efficiency, wherein the SF 6 energy efficiency is the SF 6 gas degradation quality under unit input energy.
Compared with the prior art, the SF 6 degradation device and method based on the gas-liquid two-phase dielectric barrier discharge plasma have the advantages that SF 6/inert gas mixed gas is introduced into a dielectric barrier reactor to enable SF 6 to be activated and decomposed under the action of plasma, meanwhile, alkaline solution is introduced into the dielectric barrier reactor, the alkaline solution is excited and activated to generate a large number of hydroxyl ions under the action of the plasma to react with SF 6 primary decomposer to promote decomposition of SF 6, and degraded gas is treated through an alkali liquor gas washing tank to realize harmless emission of SF 6.
Detailed Description
The following describes in further detail the embodiments of the present invention with reference to the drawings and examples. The following examples are illustrative of the invention and are not intended to limit the scope of the invention.
As shown in FIG. 1, the embodiment of the invention provides an SF 6 degradation device based on gas-liquid two-phase dielectric barrier discharge plasma, which comprises an air inlet control module, a dielectric barrier discharge reaction module, an alkaline solution tank and an alkaline solution supply module.
The air inlet control module comprises an air distribution and mixing unit 11, and an SF 6 air cylinder 12 and an inert gas cylinder 13 which are connected with the air distribution and mixing unit 11.
Specifically, the SF 6 gas cylinder 12 and the inert gas cylinder 13 are used to supply SF 6 gas and inert gas, respectively, to the gas distribution gas mixing unit 11. The gas distribution and mixing unit 11 is used for diluting SF 6 gas by using inert gas and distributing SF 6 gas and the inert gas according to a preset proportion to obtain mixed gas.
Further, the inert gas in the inert gas cylinder includes Ar gas. The inert gas is Ar, and the preset proportion is 2% SF 6/98% Ar. That is, the gas distribution and mixing unit of this embodiment uses Ar gas to dilute SF 6 gas, and distributes gas according to the ratio of 2% SF 6/98% Ar, thus obtaining mixed gas. The distribution gas mixing unit comprises a mass flowmeter, wherein the mass flowmeter is used for controlling the feeding concentration and the feeding flow rate of SF 6 gas and inert gas in real time. Through setting up mass flowmeter, distribution gas mixing unit can accurate regulation and control the concentration and the velocity of flow of gas of letting in to concentration and velocity of flow show in real time. The gas distribution and mixing unit controls the feeding flow rate of SF 6 gas and inert gas to be 200mL/min, and the gas distribution and mixing unit can better realize the gas distribution and mixing function under the flow rate.
The dielectric barrier discharge reaction module comprises a dielectric barrier reactor 21 and a plasma power supply 22 externally connected to the dielectric barrier reactor 21.
Specifically, the plasma power supply 22 is used to apply a voltage to the dielectric barrier reactor 21 so that an electric field is formed inside the dielectric barrier reactor 21. Further, the dielectric barrier reactor 21 is a coaxial dielectric barrier reactor. The dielectric barrier reactor 21 comprises a high-voltage electrode 211 and a high-voltage electrode 212 which are coaxially connected, the high-voltage electrode 211 is wrapped by a barrier dielectric 213, and a plasma power supply 22 is externally connected to the high-voltage electrode 211 and the high-voltage electrode 212.
The process of forming an electric field inside the dielectric barrier reactor is specifically described as follows:
the input power is adjusted to be preset power (100W in this embodiment) by the plasma power supply, and an ac electric field is generated between the high voltage electrode and the low voltage electrode. In a single discharge period, positive charges in the discharge gap are transferred to the direction of the high-voltage electrode, negative charges are transferred to the direction of the high-voltage electrode, positive charges and negative charges are attached to the inner surface of the blocking medium, and an electric field is formed in the discharge gap along with the increase of the input voltage.
Specifically, the gas inlet of the dielectric barrier reactor 21 is connected to the gas distribution gas mixing unit 11, so that the dielectric barrier reactor 21 receives the mixed gas output from the gas distribution gas mixing unit 11. The dielectric barrier reactor 21 is used for exciting inert gas in the mixed gas into plasma by using an electric field, and degrading SF 6 gas in the mixed gas based on the electric field and the plasma to obtain the low-fluorine sulfide.
The process of degrading SF 6 gas to obtain low-fluorine sulfide by using a dielectric barrier reactor is specifically described below, wherein Ar particles are excited into plasma under the action of an electric field, SF 6 gas is activated and bond-broken and decomposed under the action of the electric field and Ar plasma, and SF 5, SF 4 and other low-fluorine sulfides are generated.
The lye supply module is connected to the alkaline solution reservoir 31 and the dielectric barrier reactor 21, respectively. The lye supply module is used to supply alkaline solution in the alkaline solution tank 31 to the dielectric barrier reactor 21.
In particular, the lye feeding module comprises a pumping unit 41 and an atomizing unit 42. One end of the pumping unit 41 is connected to the alkaline solution tank 31, and the other end of the pumping unit 41 is connected to the atomizing unit 42. The pumping unit 41 is used for pumping the alkaline solution in the alkaline solution tank 31 into the atomizing unit 42, the atomizing unit 42 is arranged at the air inlet side of the dielectric barrier reactor 21, and the atomizing unit 42 is used for feeding the uniformly atomized alkaline solution into the dielectric barrier reactor 21. Further, the pumping unit 41 is a peristaltic pump, and the atomizing unit 42 is an atomizing shower head.
The dielectric barrier reactor 21 is further used for exciting an alkaline solution by utilizing plasma to generate hydroxyl ions and degrading low-fluorine sulfide based on the hydroxyl ions to obtain degradation tail gas.
The process of degrading low-fluorine sulfide in the dielectric barrier reactor to obtain degraded tail gas is specifically described below:
and (3) pumping the alkaline solution above the dielectric barrier reactor by adopting a peristaltic pump circulation pump, and uniformly atomizing the alkaline solution into the dielectric barrier reactor through an atomization spray header. The alkaline solution is excited and activated under the action of plasma to generate a large amount of hydroxide ions, and the hydroxide ions react with SF 5, SF 4 and other low-fluorine sulfides to enable SF 6 degradation reaction to be carried out forward and promote SF 6 degradation, SO that degradation tail gases such as SO 2, SOF 2 and the like are obtained.
The alkaline solution tank 31 is connected with the air outlet of the dielectric barrier reactor 21, and the alkaline solution tank 31 is used for absorbing degradation tail gas.
Specifically, the alkaline solution in the alkaline solution tank includes NaOH solution. The alkaline solution in this example is a NaOH solution. In the process of degrading the low-fluorine sulfide in the dielectric barrier reactor to obtain degradation tail gas, the low-fluorine sulfide reacts with hydroxide ions in the NaOH solution to generate substances such as SO 2、SO3 2-、SO4 2-, SOF 2 and the like, and the substances are combined with sodium ions in the NaOH solution to generate stable Na 2SO4.
In order to ensure harmless emission of SF 6, as shown in FIG. 2, the SF 6 degradation device based on gas-liquid two-phase dielectric barrier discharge plasma in the embodiment of the invention further comprises an alkali liquor gas washing tank 51. The lye gas washing tank 51 is connected with the alkaline solution tank 31, and the lye gas washing tank 51 is used for absorbing degradation tail gas which is not absorbed in the alkaline solution tank 31. Acid gases such as unabsorbed SO 2, SOF 2 and the like still exist in the degradation tail gas, and the degradation tail gas is subjected to secondary treatment through the alkali liquor gas washing tank 51, SO that harmful substances in the degradation tail gas are fully absorbed, and harmless emission of SF 6 is realized.
In a specific embodiment, the process of applying the SF 6 degradation device described above is as follows:
1) The preparation work is that the air paths of the modules are connected and the corresponding power supply and grounding electrode are connected. Periodically checking the air tightness of the dielectric barrier reactor, periodically checking alkali liquor in the alkali liquor gas washing tank, periodically treating sediment in the alkali liquor gas washing tank, and periodically replacing the alkali liquor to prevent insufficient treatment of toxic gas in tail gas;
2) When in degradation, a plasma power supply is turned on, SF 6 gas and Ar gas are introduced into the dielectric barrier reactor through a gas distribution and mixing unit according to a certain concentration and a certain flow rate, meanwhile, a peristaltic pump is turned on to pump NaOH solution above the dielectric barrier reactor, the NaOH solution is uniformly atomized through an atomization spray header and enters the dielectric barrier reactor, and the degradation reaction starts. After a few minutes, the temperature of the dielectric barrier reactor tends to be stable, and the discharge degradation reaction is carried out stably;
3) Stopping degradation, namely firstly closing an input air valve and a peristaltic pump of SF 6 gas, keeping the dielectric barrier reactor to stably run, closing a plasma power supply after ten minutes, always introducing Ar, introducing the gas in the dielectric barrier reactor into an alkaline solution tank, and after ten minutes, lifting an air inlet pipe in the alkaline solution tank from the bottom of the liquid to the surface of the liquid, preventing suck-back, and stopping inputting Ar.
The SF 6 degradation device based on the gas-liquid two-phase dielectric barrier discharge plasma comprises a step of introducing SF 6/inert gas mixed gas into a dielectric barrier reactor, enabling SF 6 to be activated and decomposed under the action of the plasma, a step of introducing alkaline solution into the dielectric barrier reactor, enabling the alkaline solution to be excited and activated under the action of the plasma to generate a large number of hydroxyl ions, enabling the alkaline solution to react with SF 6 primary decomposers, promoting the decomposition of SF 6, and a step of treating the degraded gas through an alkali lye gas washing tank, so that harmless emission of SF 6 is achieved.
As shown in fig. 3, the embodiment of the invention provides an SF 6 degradation method based on gas-liquid two-phase dielectric barrier discharge plasma, which is applied to the SF 6 degradation device described above, and comprises the following steps:
S1, an SF 6 gas cylinder and an inert gas cylinder respectively supply SF 6 gas and inert gas to a gas distribution and mixing unit;
s2, diluting SF 6 gas by using inert gas by a gas distribution gas mixing unit, and distributing SF 6 gas and the inert gas according to a preset proportion to obtain mixed gas;
s3, applying voltage to the dielectric barrier reactor by the plasma power supply so as to form an electric field inside the dielectric barrier reactor;
S4, exciting inert gas in the mixed gas into plasma by using an electric field by the dielectric barrier reactor, and degrading SF 6 gas in the mixed gas based on the electric field and the plasma to obtain low-fluorine sulfide;
s5, an alkali liquor supply module supplies an alkaline solution in an alkaline solution tank to the dielectric barrier reactor;
S6, exciting an alkaline solution by using plasma in the dielectric barrier reactor to generate hydroxyl ions, and degrading the low-fluorine sulfide based on the hydroxyl ions to obtain degradation tail gas;
S7, absorbing and degrading tail gas by an alkaline solution pool.
In order to verify the effectiveness of the SF 6 degradation method based on the gas-liquid two-phase dielectric barrier discharge plasma, the method further comprises the step of detecting components of degradation tail gas after the step S6 to obtain SF 6 degradation rate and SF 6 energy efficiency. The effectiveness of the SF 6 degradation method can be quantitatively evaluated by calculating two evaluation indexes, namely the SF 6 degradation rate and the SF 6 energy efficiency.
Specifically, SF 6 energy efficiency is the SF 6 gas degradation mass per unit of input energy. Further, the SF 6 degradation rate was calculated using the following formula:
wherein DRE represents SF 6 degradation rate, the unit is, Represents the concentration of SF 6 before degradation,Represents SF 6 concentration after degradation.
The energy efficiency of SF 6 was calculated using the following formula:
wherein EY represents SF 6 energy efficiency in g/kWh, The mass of the SF 6 gas is degraded in the time t, the unit is g, the P is the discharge power, and the time t is the time required for degrading the SF 6 gas, and the unit is h.
It should be noted that, the specific limitation of the SF 6 degradation method based on the gas-liquid two-phase dielectric barrier discharge plasma is referred to above for the limitation of the SF 6 degradation device based on the gas-liquid two-phase dielectric barrier discharge plasma, and the two have the same functions and effects, which are not described herein.
In summary, according to the SF 6 degradation device and method based on the gas-liquid two-phase dielectric barrier discharge plasma, SF 6/inert gas mixed gas is introduced into a dielectric barrier reactor to enable SF 6 to be activated and decomposed under the action of the plasma, meanwhile, alkaline solution is introduced into the dielectric barrier reactor, the alkaline solution is excited and activated to generate a large amount of hydroxyl ions under the action of the plasma to react with SF 6 primary decomposers to promote the decomposition of SF 6, and the degraded gas is treated through an alkali lye gas washing tank to realize harmless emission of SF 6.
In this specification, each embodiment is described in a progressive manner, and all the embodiments are directly the same or similar parts referring to each other, and each embodiment mainly describes differences from other embodiments. In particular, for the method embodiments, since they are substantially similar to the apparatus embodiments, the description is relatively simple, and reference is made to the description of the method embodiments in part. It should be noted that, any combination of the technical features of the foregoing embodiments may be used, and for brevity, all of the possible combinations of the technical features of the foregoing embodiments are not described, however, as long as there is no contradiction between the combinations of the technical features, they should be considered as the scope of the description.
The foregoing is merely a preferred embodiment of the present invention, and it should be noted that modifications and substitutions can be made by those skilled in the art without departing from the technical principles of the present invention, and these modifications and substitutions should also be considered as being within the scope of the present invention.