CN118326161B - Method for preparing Si-Ti alloy solder and simultaneously recovering tungsten and vanadium by utilizing waste SCR catalyst and crystalline silicon waste - Google Patents
Method for preparing Si-Ti alloy solder and simultaneously recovering tungsten and vanadium by utilizing waste SCR catalyst and crystalline silicon waste Download PDFInfo
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- 229910045601 alloy Inorganic materials 0.000 title claims abstract description 130
- 239000000956 alloy Substances 0.000 title claims abstract description 130
- 239000002699 waste material Substances 0.000 title claims abstract description 121
- 229910008332 Si-Ti Inorganic materials 0.000 title claims abstract description 117
- 229910006749 Si—Ti Inorganic materials 0.000 title claims abstract description 117
- 229910052720 vanadium Inorganic materials 0.000 title claims abstract description 96
- 229910052721 tungsten Inorganic materials 0.000 title claims abstract description 93
- 229910000679 solder Inorganic materials 0.000 title claims abstract description 80
- 239000003054 catalyst Substances 0.000 title claims abstract description 74
- WFKWXMTUELFFGS-UHFFFAOYSA-N tungsten Chemical compound [W] WFKWXMTUELFFGS-UHFFFAOYSA-N 0.000 title claims abstract description 54
- 239000010937 tungsten Substances 0.000 title claims abstract description 54
- LEONUFNNVUYDNQ-UHFFFAOYSA-N vanadium atom Chemical compound [V] LEONUFNNVUYDNQ-UHFFFAOYSA-N 0.000 title claims abstract description 54
- 229910021419 crystalline silicon Inorganic materials 0.000 title claims abstract description 51
- 238000000034 method Methods 0.000 title claims abstract description 32
- 230000005496 eutectics Effects 0.000 claims abstract description 61
- 229910052719 titanium Inorganic materials 0.000 claims abstract description 39
- 239000002131 composite material Substances 0.000 claims abstract description 24
- 239000012300 argon atmosphere Substances 0.000 claims abstract description 20
- 239000012535 impurity Substances 0.000 claims abstract description 19
- 239000003795 chemical substances by application Substances 0.000 claims abstract description 18
- 239000000463 material Substances 0.000 claims abstract description 15
- 238000007711 solidification Methods 0.000 claims abstract description 14
- 230000008023 solidification Effects 0.000 claims abstract description 14
- 238000000926 separation method Methods 0.000 claims abstract description 12
- 238000003723 Smelting Methods 0.000 claims abstract description 10
- 239000000654 additive Substances 0.000 claims abstract description 7
- 230000000996 additive effect Effects 0.000 claims abstract description 7
- 238000000746 purification Methods 0.000 claims abstract description 7
- 239000010931 gold Substances 0.000 claims abstract description 4
- 229910052737 gold Inorganic materials 0.000 claims abstract description 4
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims description 38
- 229910052681 coesite Inorganic materials 0.000 claims description 19
- 229910052906 cristobalite Inorganic materials 0.000 claims description 19
- 238000010438 heat treatment Methods 0.000 claims description 19
- 239000000377 silicon dioxide Substances 0.000 claims description 19
- 235000012239 silicon dioxide Nutrition 0.000 claims description 19
- 229910052682 stishovite Inorganic materials 0.000 claims description 19
- 229910052905 tridymite Inorganic materials 0.000 claims description 19
- 229910052710 silicon Inorganic materials 0.000 claims description 16
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 claims description 15
- 239000010703 silicon Substances 0.000 claims description 14
- 239000002893 slag Substances 0.000 claims description 9
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N Titan oxide Chemical compound O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 claims description 8
- 238000005520 cutting process Methods 0.000 claims description 4
- 229910003460 diamond Inorganic materials 0.000 claims description 3
- 239000010432 diamond Substances 0.000 claims description 3
- 230000006698 induction Effects 0.000 claims description 3
- 229910021421 monocrystalline silicon Inorganic materials 0.000 claims description 3
- 229910021420 polycrystalline silicon Inorganic materials 0.000 claims description 3
- 235000012431 wafers Nutrition 0.000 claims description 3
- 238000002156 mixing Methods 0.000 claims description 2
- 239000000203 mixture Substances 0.000 claims description 2
- 238000003466 welding Methods 0.000 abstract description 9
- 239000002994 raw material Substances 0.000 abstract description 6
- 239000002910 solid waste Substances 0.000 abstract description 5
- 229910010293 ceramic material Inorganic materials 0.000 abstract description 3
- 239000010936 titanium Substances 0.000 description 38
- 239000000919 ceramic Substances 0.000 description 35
- 238000005219 brazing Methods 0.000 description 17
- 238000010586 diagram Methods 0.000 description 16
- 238000012512 characterization method Methods 0.000 description 12
- 229910010413 TiO 2 Inorganic materials 0.000 description 8
- 229910008484 TiSi Inorganic materials 0.000 description 8
- 229910052742 iron Inorganic materials 0.000 description 6
- 238000006722 reduction reaction Methods 0.000 description 6
- 229910052782 aluminium Inorganic materials 0.000 description 5
- 229910052760 oxygen Inorganic materials 0.000 description 5
- 238000004064 recycling Methods 0.000 description 5
- QGZKDVFQNNGYKY-UHFFFAOYSA-N Ammonia Chemical compound N QGZKDVFQNNGYKY-UHFFFAOYSA-N 0.000 description 4
- 229910052791 calcium Inorganic materials 0.000 description 4
- 230000005674 electromagnetic induction Effects 0.000 description 4
- 239000011888 foil Substances 0.000 description 4
- 229910052749 magnesium Inorganic materials 0.000 description 4
- 230000000694 effects Effects 0.000 description 3
- 230000008018 melting Effects 0.000 description 3
- 238000002844 melting Methods 0.000 description 3
- MWUXSHHQAYIFBG-UHFFFAOYSA-N nitrogen oxide Inorganic materials O=[N] MWUXSHHQAYIFBG-UHFFFAOYSA-N 0.000 description 3
- 238000002360 preparation method Methods 0.000 description 3
- 101001121408 Homo sapiens L-amino-acid oxidase Proteins 0.000 description 2
- 102100026388 L-amino-acid oxidase Human genes 0.000 description 2
- 101100233916 Saccharomyces cerevisiae (strain ATCC 204508 / S288c) KAR5 gene Proteins 0.000 description 2
- 229910004298 SiO 2 Inorganic materials 0.000 description 2
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 description 2
- 238000006243 chemical reaction Methods 0.000 description 2
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 description 2
- 229910018072 Al 2 O 3 Inorganic materials 0.000 description 1
- 101000827703 Homo sapiens Polyphosphoinositide phosphatase Proteins 0.000 description 1
- 206010027439 Metal poisoning Diseases 0.000 description 1
- 102100023591 Polyphosphoinositide phosphatase Human genes 0.000 description 1
- 229910000676 Si alloy Inorganic materials 0.000 description 1
- NINIDFKCEFEMDL-UHFFFAOYSA-N Sulfur Chemical compound [S] NINIDFKCEFEMDL-UHFFFAOYSA-N 0.000 description 1
- 239000000809 air pollutant Substances 0.000 description 1
- 231100001243 air pollutant Toxicity 0.000 description 1
- 229910052784 alkaline earth metal Inorganic materials 0.000 description 1
- 150000001342 alkaline earth metals Chemical class 0.000 description 1
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 description 1
- 229910021529 ammonia Inorganic materials 0.000 description 1
- 230000009286 beneficial effect Effects 0.000 description 1
- 230000003197 catalytic effect Effects 0.000 description 1
- 238000010531 catalytic reduction reaction Methods 0.000 description 1
- 239000003638 chemical reducing agent Substances 0.000 description 1
- 238000011109 contamination Methods 0.000 description 1
- 229910052593 corundum Inorganic materials 0.000 description 1
- 238000003912 environmental pollution Methods 0.000 description 1
- 238000000605 extraction Methods 0.000 description 1
- 239000010419 fine particle Substances 0.000 description 1
- 239000007788 liquid Substances 0.000 description 1
- 229910052751 metal Inorganic materials 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 229910000069 nitrogen hydride Inorganic materials 0.000 description 1
- 230000003647 oxidation Effects 0.000 description 1
- 238000007254 oxidation reaction Methods 0.000 description 1
- 239000002574 poison Substances 0.000 description 1
- 231100000614 poison Toxicity 0.000 description 1
- 230000036619 pore blockages Effects 0.000 description 1
- 239000011863 silicon-based powder Substances 0.000 description 1
- 238000005245 sintering Methods 0.000 description 1
- 239000002002 slurry Substances 0.000 description 1
- 229910052717 sulfur Inorganic materials 0.000 description 1
- 239000011593 sulfur Substances 0.000 description 1
- 238000009736 wetting Methods 0.000 description 1
- 229910001845 yogo sapphire Inorganic materials 0.000 description 1
Classifications
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- C—CHEMISTRY; METALLURGY
- C22—METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
- C22B—PRODUCTION AND REFINING OF METALS; PRETREATMENT OF RAW MATERIALS
- C22B7/00—Working up raw materials other than ores, e.g. scrap, to produce non-ferrous metals and compounds thereof; Methods of a general interest or applied to the winning of more than two metals
- C22B7/001—Dry processes
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
- B23K35/00—Rods, electrodes, materials, or media, for use in soldering, welding, or cutting
- B23K35/22—Rods, electrodes, materials, or media, for use in soldering, welding, or cutting characterised by the composition or nature of the material
- B23K35/24—Selection of soldering or welding materials proper
- B23K35/32—Selection of soldering or welding materials proper with the principal constituent melting at more than 1550 degrees C
- B23K35/325—Ti as the principal constituent
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
- B23K35/00—Rods, electrodes, materials, or media, for use in soldering, welding, or cutting
- B23K35/40—Making wire or rods for soldering or welding
-
- C—CHEMISTRY; METALLURGY
- C22—METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
- C22B—PRODUCTION AND REFINING OF METALS; PRETREATMENT OF RAW MATERIALS
- C22B34/00—Obtaining refractory metals
- C22B34/10—Obtaining titanium, zirconium or hafnium
- C22B34/12—Obtaining titanium or titanium compounds from ores or scrap by metallurgical processing; preparation of titanium compounds from other titanium compounds see C01G23/00 - C01G23/08
- C22B34/1263—Obtaining titanium or titanium compounds from ores or scrap by metallurgical processing; preparation of titanium compounds from other titanium compounds see C01G23/00 - C01G23/08 obtaining metallic titanium from titanium compounds, e.g. by reduction
- C22B34/1277—Obtaining titanium or titanium compounds from ores or scrap by metallurgical processing; preparation of titanium compounds from other titanium compounds see C01G23/00 - C01G23/08 obtaining metallic titanium from titanium compounds, e.g. by reduction using other metals, e.g. Al, Si, Mn
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- C—CHEMISTRY; METALLURGY
- C22—METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
- C22B—PRODUCTION AND REFINING OF METALS; PRETREATMENT OF RAW MATERIALS
- C22B34/00—Obtaining refractory metals
- C22B34/20—Obtaining niobium, tantalum or vanadium
- C22B34/22—Obtaining vanadium
- C22B34/225—Obtaining vanadium from spent catalysts
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- C—CHEMISTRY; METALLURGY
- C22—METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
- C22B—PRODUCTION AND REFINING OF METALS; PRETREATMENT OF RAW MATERIALS
- C22B34/00—Obtaining refractory metals
- C22B34/30—Obtaining chromium, molybdenum or tungsten
- C22B34/36—Obtaining tungsten
- C22B34/365—Obtaining tungsten from spent catalysts
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- C—CHEMISTRY; METALLURGY
- C22—METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
- C22B—PRODUCTION AND REFINING OF METALS; PRETREATMENT OF RAW MATERIALS
- C22B5/00—General methods of reducing to metals
- C22B5/02—Dry methods smelting of sulfides or formation of mattes
- C22B5/04—Dry methods smelting of sulfides or formation of mattes by aluminium, other metals or silicon
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- C—CHEMISTRY; METALLURGY
- C22—METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
- C22C—ALLOYS
- C22C28/00—Alloys based on a metal not provided for in groups C22C5/00 - C22C27/00
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
- B23K2103/00—Materials to be soldered, welded or cut
- B23K2103/50—Inorganic material, e.g. metals, not provided for in B23K2103/02 – B23K2103/26
- B23K2103/52—Ceramics
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Abstract
本发明涉及一种利用废SCR催化剂和晶硅废料制备Si‑Ti合金焊料并同时回收钨和钒的方法,属于固废资源利用技术领域。本发明将废SCR催化剂、晶硅废料和造渣剂混合均匀得到混合物料;将混合物料置于氩气气氛中,升温至1773~1823K进行还原熔炼,渣金分离后得到含钨和钒的Si‑Ti合金和残渣;将含钨和钒的Si‑Ti合金置于真空或氩气气氛中加热至熔融状态并进行定向凝固分离提纯,依次得到(Ti,W,V)Si2相的富集物、含V共晶Si‑Ti合金焊料、杂质富集物;其中(Ti,W,V)Si2相的富集物既可以用作回收钨和钒的原料,也可以用作含V共晶Si‑Ti合金焊料的微量添加剂,与含V共晶Si‑Ti合金焊料在真空或氩气气氛中高温熔化形成复合Si‑Ti合金焊料。含V共晶Si‑Ti合金焊料和复合Si‑Ti合金焊料可用于SiC基陶瓷材料的焊接。
The present invention relates to a method for preparing Si-Ti alloy solder by using waste SCR catalyst and crystalline silicon waste and recovering tungsten and vanadium at the same time, belonging to the technical field of solid waste resource utilization. The present invention uniformly mixes waste SCR catalyst, crystalline silicon waste and slag-making agent to obtain a mixed material; the mixed material is placed in an argon atmosphere, heated to 1773-1823K for reduction smelting, and slag-gold separation is performed to obtain Si-Ti alloy and residue containing tungsten and vanadium; the Si-Ti alloy containing tungsten and vanadium is placed in a vacuum or argon atmosphere and heated to a molten state and directional solidification separation and purification is performed to obtain (Ti, W, V) Si 2 phase enrichment, V-containing eutectic Si-Ti alloy solder, and impurity enrichment in sequence; wherein the (Ti, W, V) Si 2 phase enrichment can be used as a raw material for recovering tungsten and vanadium, and can also be used as a trace additive for V-containing eutectic Si-Ti alloy solder, and is melted at high temperature with V-containing eutectic Si-Ti alloy solder in a vacuum or argon atmosphere to form a composite Si-Ti alloy solder. V-containing eutectic Si‑Ti alloy solder and composite Si‑Ti alloy solder can be used for welding SiC-based ceramic materials.
Description
技术领域Technical Field
本发明涉及一种利用废SCR催化剂和晶硅废料制备Si-Ti合金焊料并同时回收钨和钒的方法,属于固废资源利用技术领域。The invention relates to a method for preparing Si-Ti alloy solder by utilizing waste SCR catalyst and crystalline silicon waste and recovering tungsten and vanadium at the same time, belonging to the technical field of solid waste resource utilization.
背景技术Background Art
燃煤电厂所排放的氮氧化物(NO x ,x=1,2)是主要的空气污染物之一。随着最新NO x 减排工作的实施,选择性催化还原脱硝(SCR)法已被认为是控制NO x 排放最有效的方法,SCR法脱硝是在特定催化剂的作用下,用氨(NH3)或其他还原剂选择性的将NO x 转化为N2和H2O。目前,V2O5-WO3/TiO2催化剂被认为是降低NO x 排放最有效的SCR催化剂,其具有NO x 转化率高、耐毒、耐硫以及催化活性好等优点,然而,由于活性成分的挥发、高温烧结、气孔堵塞以及碱土金属中毒等因素影响,从而导致SCR催化剂活性降低,失活的SCR催化剂最终变成废SCR催化剂。通常,废SCR催化剂中含有80~90 wt% TiO2,7~10 wt% WO3和0.5~1.5 wt% V2O5,其TiO2,WO3和V2O5的总含量往往高于90wt%。因此,非常有必要回收利用废SCR催化剂中Ti、W和V二次资源。Nitrogen oxides ( NOx , x = 1, 2) emitted by coal-fired power plants are one of the main air pollutants. With the implementation of the latest NOx emission reduction work, the selective catalytic reduction (SCR) method has been considered to be the most effective method for controlling NOx emissions. SCR denitrification is the selective conversion of NOx into N2 and H2O using ammonia ( NH3 ) or other reducing agents under the action of a specific catalyst. At present, V2O5 - WO3 / TiO2 catalyst is considered to be the most effective SCR catalyst for reducing NOx emissions. It has the advantages of high NOx conversion rate, poison resistance, sulfur resistance and good catalytic activity. However, due to the volatilization of active components, high-temperature sintering, pore blockage and alkaline earth metal poisoning, the activity of SCR catalyst is reduced, and the deactivated SCR catalyst eventually becomes a waste SCR catalyst. Typically, spent SCR catalyst contains 80-90 wt% TiO 2 , 7-10 wt% WO 3 and 0.5-1.5 wt% V 2 O 5 , and the total content of TiO 2 , WO 3 and V 2 O 5 is often higher than 90 wt%. Therefore, it is very necessary to recycle the secondary resources of Ti, W and V in spent SCR catalyst.
晶体硅片太阳能电池便是基于光伏效应将太阳能转化为电能的器件。在制备硅片的过程中,需要用金刚线切割多晶硅或单晶硅锭,在切割过程将近35%-40%的晶体硅以硅粉的形式进入切割废料浆损失掉,造成了极大的硅资源浪费和严重的环境污染;此外,由于晶硅废料极细的粒径,硅的氧化和损失成为了制约回收晶硅废料制备高纯硅和硅合金的最大挑战,晶硅废料中最主要和最难去除的是O杂质;因此,如何实现去除晶硅废料中O杂质并高效回收其中硅资源是目前所面临的难题。Crystalline silicon solar cells are devices that convert solar energy into electrical energy based on the photovoltaic effect. In the process of preparing silicon wafers, diamond wires are used to cut polycrystalline silicon or monocrystalline silicon ingots. During the cutting process, nearly 35%-40% of the crystalline silicon enters the cutting waste slurry in the form of silicon powder and is lost, resulting in a huge waste of silicon resources and serious environmental pollution. In addition, due to the extremely fine particle size of crystalline silicon waste, the oxidation and loss of silicon have become the biggest challenges restricting the recycling of crystalline silicon waste to prepare high-purity silicon and silicon alloys. The main and most difficult impurity to remove in crystalline silicon waste is O; therefore, how to remove O impurities in crystalline silicon waste and efficiently recover silicon resources is a problem currently faced.
在SiC陶瓷制备生产大尺寸和复杂形状器件的过程中,液态钎料合金对SiC陶瓷的润湿结合以及SiC陶瓷/合金界面的残余应力是影响SiC陶瓷焊接的关键因素。在SiC陶瓷焊接的合金中,共晶Si-Ti合金是其中最有前途的一种钎焊合金,这主要是因为Ti和Si元素对SiC陶瓷具有良好的润湿性,共晶Si-Ti合金具有理想的高温组织性能,且在高温下流动性好,有利于与SiC陶瓷之间形成致密紧实的接头结构。然而,目前制备共晶Si-Ti合金焊料的主要方法是采用昂贵的高纯硅和高纯钛作为原料,不利于资源的可持续和成本的降低。若能利用废SCR催化剂和晶硅废料直接制备共晶Si-Ti合金焊料,便可解决共晶Si-Ti合金焊料制备的高成本问题。In the process of preparing SiC ceramics to produce large-sized and complex-shaped devices, the wetting and bonding of the liquid solder alloy to SiC ceramics and the residual stress at the SiC ceramic/alloy interface are the key factors affecting SiC ceramic welding. Among the alloys for SiC ceramic welding, eutectic Si-Ti alloy is the most promising brazing alloy. This is mainly because Ti and Si elements have good wettability to SiC ceramics, eutectic Si-Ti alloy has ideal high-temperature microstructure and good fluidity at high temperatures, which is conducive to forming a dense and tight joint structure with SiC ceramics. However, the main method for preparing eutectic Si-Ti alloy solder is to use expensive high-purity silicon and high-purity titanium as raw materials, which is not conducive to resource sustainability and cost reduction. If the eutectic Si-Ti alloy solder can be directly prepared using waste SCR catalyst and crystalline silicon waste, the high cost problem of eutectic Si-Ti alloy solder preparation can be solved.
发明内容Summary of the invention
针对现有技术废SCR催化剂中Ti、W和V二次资源回收利用困难,晶硅废料中Si回收困难以及共晶Si-Ti合金焊料制备成本高昂等问题,本发明提出一种利用废SCR催化剂和晶硅废料制备Si-Ti合金焊料并同时回收钨和钒的方法,不仅可实现废SCR催化剂和晶硅废料这两种工业固废的清洁再利用,还同时制备出用于SiC基陶瓷材料焊接的Si-Ti合金焊料。具有明显的经济效益和广阔的应用前景。In view of the problems of difficulty in recycling Ti, W and V in the waste SCR catalyst in the prior art, difficulty in recycling Si in crystalline silicon waste, and high cost of preparing eutectic Si-Ti alloy solder, the present invention proposes a method for preparing Si-Ti alloy solder using waste SCR catalyst and crystalline silicon waste and recovering tungsten and vanadium at the same time, which can not only realize the clean recycling of the two industrial solid wastes, waste SCR catalyst and crystalline silicon waste, but also prepare Si-Ti alloy solder for welding SiC-based ceramic materials. It has obvious economic benefits and broad application prospects.
一种利用废SCR催化剂和晶硅废料制备Si-Ti合金焊料并同时回收钨和钒的方法,具体步骤如下:A method for preparing Si-Ti alloy solder by using waste SCR catalyst and crystalline silicon waste and recovering tungsten and vanadium at the same time, the specific steps are as follows:
(1)将废SCR催化剂、晶硅废料和造渣剂混合均匀得到混合物料;将混合物料置于氩气气氛中,升温至1773~1823K进行还原熔炼,经渣金分离后得到含钨和钒的Si-Ti合金和无害残渣;(1) Mixing the waste SCR catalyst, crystalline silicon waste and slag-forming agent uniformly to obtain a mixed material; placing the mixed material in an argon atmosphere, heating it to 1773-1823K for reduction smelting, and obtaining Si-Ti alloy containing tungsten and vanadium and harmless residue after slag and gold separation;
(2)将步骤(1)含钨和钒的Si-Ti合金置于真空或氩气气氛中加热至熔融状态并进行定向凝固分离提纯,依次得到(Ti, W, V)Si2相的富集物、含V共晶Si-Ti合金焊料(>99.4%)、杂质富集物;所述(Ti, W, V)Si2相的富集物既可以用作回收钨和钒的原料;所述含V共晶Si-Ti合金焊料可直接用于钎焊SiC陶瓷;(2) placing the Si-Ti alloy containing tungsten and vanadium in step (1) in a vacuum or argon atmosphere, heating it to a molten state and subjecting it to directional solidification separation and purification, thereby obtaining in sequence a (Ti, W, V)Si 2 phase enrichment, a V-containing eutectic Si-Ti alloy solder (>99.4%), and an impurity enrichment; the (Ti, W, V)Si 2 phase enrichment can be used as a raw material for recovering tungsten and vanadium; the V-containing eutectic Si-Ti alloy solder can be directly used for brazing SiC ceramics;
(3)将步骤(2)中(Ti, W, V)Si2相的富集物作为微量添加剂,与步骤2中得到的含V共晶Si-Ti合金焊料在真空或氩气气氛中进行高温熔化形成复合Si-Ti合金焊料;所述复合Si-Ti合金焊料相比纯原料合成的共晶Si-Ti合金焊料具有制备成本低、共晶组织细密的优点。(3) The enriched product of (Ti, W, V) Si2 phase in step (2) is used as a trace additive and is melted at high temperature with the V-containing eutectic Si-Ti alloy solder obtained in step 2 in a vacuum or argon atmosphere to form a composite Si-Ti alloy solder; the composite Si-Ti alloy solder has the advantages of low preparation cost and fine eutectic structure compared with the eutectic Si-Ti alloy solder synthesized from pure raw materials.
所述步骤(1)晶硅废料为金刚石线切割多晶硅或单晶硅锭制备硅片过程中产生的晶硅废料,废SCR催化剂为V2O5-WO3/TiO2废催化剂。The crystalline silicon waste in step (1) is crystalline silicon waste generated in the process of preparing silicon wafers by diamond wire cutting polycrystalline silicon or single crystal silicon ingots, and the waste SCR catalyst is V2O5 - WO3 / TiO2 waste catalyst.
所述步骤(1)造渣剂为CaO、SiO2和MgO的混合物,CaO的添加量为废SCR催化剂的15~30%,SiO2的添加量为废SCR催化剂的6~24%,MgO的添加量为废SCR催化剂的15~30%。;晶硅废料的质量为废SCR催化剂和造渣剂总质量的1.48~1.52倍;熔炼还原之后的残渣成分主要以CaO、SiO2和MgO为主,属于无害残渣。The slagging agent in step (1) is a mixture of CaO, SiO2 and MgO, wherein the amount of CaO added is 15-30% of the waste SCR catalyst, the amount of SiO2 added is 6-24% of the waste SCR catalyst, and the amount of MgO added is 15-30% of the waste SCR catalyst. The mass of the crystalline silicon waste is 1.48-1.52 times the total mass of the waste SCR catalyst and the slagging agent. The residue after smelting reduction is mainly composed of CaO, SiO2 and MgO, and is harmless residue.
所述步骤(2)真空度<10Pa;加热方式为电阻加热或感应加热;定向凝固中样品的移动速率不大于2μm/s;由于具有合金分离效果好和共晶组织细密的优点,优选感应加热下的定向凝固分离和提纯。In step (2), the vacuum degree is less than 10Pa; the heating method is resistance heating or induction heating; the movement rate of the sample during directional solidification is not greater than 2 μm/s; due to the advantages of good alloy separation effect and fine eutectic structure, directional solidification separation and purification under induction heating is preferred.
所述步骤(3)(Ti, W, V)Si2相的富集物的添加量为含V共晶Si-Ti合金焊料质量的0.5~0.8%;真空度<10Pa。In the step (3), the amount of the (Ti, W, V)Si 2 phase enrichment added is 0.5-0.8% of the mass of the V-containing eutectic Si-Ti alloy solder; and the vacuum degree is <10Pa.
晶硅废料中的O杂质在熔炼过程中被熔渣去除,废SCR催化剂中TiO2、WO3和V2O5在熔炼过程中被硅还原进入到硅熔体中,经渣金分离后得到含钨和钒的Si-Ti合金和以CaO、SiO2和MgO为主的无害残渣;含钨和钒的Si-Ti合金熔融后经定向凝固分离提纯,依次分离为 (Ti, W, V)Si2相的富集物、含V共晶Si-Ti合金焊料、杂质富集物;(Ti, W, V)Si2相的富集物既可继续回收钨和钒,也可作为含V共晶Si-Ti合金焊料的微量添加剂,与含V共晶Si-Ti合金焊料熔化后形成复合Si-Ti合金焊料。含V共晶Si-Ti合金焊料和复合Si-Ti合金焊料可用于SiC基陶瓷材料的焊接。The O impurities in the crystalline silicon waste are removed by the slag during the smelting process. The TiO 2 , WO 3 and V 2 O 5 in the waste SCR catalyst are reduced by silicon and enter the silicon melt during the smelting process. After separation of slag and gold, Si-Ti alloy containing tungsten and vanadium and harmless residue mainly composed of CaO, SiO 2 and MgO are obtained. After melting, the Si-Ti alloy containing tungsten and vanadium is separated and purified by directional solidification, and is successively separated into (Ti, W, V)Si 2 phase enrichment, V-containing eutectic Si-Ti alloy solder, and impurity enrichment. The (Ti, W, V)Si 2 phase enrichment can not only continue to recover tungsten and vanadium, but also be used as a trace additive for V-containing eutectic Si-Ti alloy solder, and form a composite Si-Ti alloy solder after melting with V-containing eutectic Si-Ti alloy solder. V-containing eutectic Si-Ti alloy solder and composite Si-Ti alloy solder can be used for welding SiC-based ceramic materials.
本发明的有益效果是:The beneficial effects of the present invention are:
(1)本发明以晶硅废料和废SCR催化剂两种固废为原料,利用晶硅废料中的硅提取废SCR催化剂中的Ti、W和V,得到较高的Ti、W和V的提取率,同时利用废SCR催化剂和造渣剂形成的熔渣去除晶硅废料中的O杂质,还原熔炼后得到含钨和钒的Si-Ti合金;含钨和钒的Si-Ti合金经过定向凝固分离和提纯后得到含有少量V的共晶Si-Ti合金焊料以及含W和V的(Ti, W, V)Si2相的富集物;(Ti, W, V)Si2相的富集物既可以用作回收钨和钒的原料;含V共晶Si-Ti合金焊料可直接用于钎焊SiC陶瓷;(1) The present invention uses two solid wastes, crystalline silicon waste and waste SCR catalyst, as raw materials, and utilizes silicon in the crystalline silicon waste to extract Ti, W and V in the waste SCR catalyst, thereby obtaining a higher extraction rate of Ti, W and V. At the same time, the slag formed by the waste SCR catalyst and the slag-forming agent is utilized to remove the O impurity in the crystalline silicon waste, and a Si-Ti alloy containing tungsten and vanadium is obtained after reduction smelting; the Si-Ti alloy containing tungsten and vanadium is subjected to directional solidification separation and purification to obtain a eutectic Si-Ti alloy solder containing a small amount of V and a (Ti, W, V)Si 2 phase enrichment containing W and V; the (Ti, W, V)Si 2 phase enrichment can be used as a raw material for recovering tungsten and vanadium; the V-containing eutectic Si-Ti alloy solder can be directly used for brazing SiC ceramics;
(2)本发明选用CaO、SiO2和MgO为造渣剂,熔炼还原之后的残渣成分主要以CaO、SiO2和MgO为主,属于无害残渣,不会对环境造成二次污染;造渣剂没有含Al2O3,避免造成Al杂质对共晶Si-Ti合金焊料的污染;(2) The present invention selects CaO, SiO2 and MgO as slag-forming agents. The residue components after smelting reduction are mainly CaO, SiO2 and MgO, which are harmless residues and will not cause secondary pollution to the environment; the slag-forming agent does not contain Al2O3 , avoiding the contamination of eutectic Si-Ti alloy solder by Al impurities;
(3)与传统的采用高纯硅和高纯钛制备共晶Si-Ti合金焊料相比,本发明得到的含V共晶Si-Ti合金焊料以及复合Si-Ti合金焊料具有制备成本低、共晶组织细密的优点;(Ti,W, V)Si2相的富集物可作为微量添加剂有效调节含V共晶Si-Ti合金焊料的熔化温度和流动性;(3) Compared with the traditional method of preparing eutectic Si-Ti alloy solder using high-purity silicon and high-purity titanium, the V-containing eutectic Si-Ti alloy solder and the composite Si-Ti alloy solder obtained by the present invention have the advantages of low preparation cost and fine eutectic structure; the enriched product of (Ti, W, V)Si 2 phase can be used as a trace additive to effectively adjust the melting temperature and fluidity of the V-containing eutectic Si-Ti alloy solder;
(4)本发明有效实现了废SCR催化剂和晶硅废料的回收再利用,同时实现了这两种废料中Ti、W、V和Si的有效利用,不仅可以缓解Ti、W和V金属资源以及Si资源的消耗,保护环境,而且可以产生良好的经济效益,实现“固废资源化”和“以废治废”的目的。(4) The present invention effectively realizes the recycling and reuse of waste SCR catalyst and crystalline silicon waste, and at the same time realizes the effective utilization of Ti, W, V and Si in these two wastes. It can not only alleviate the consumption of Ti, W and V metal resources and Si resources and protect the environment, but also generate good economic benefits and achieve the purpose of "solid waste resourceization" and "waste treatment with waste".
附图说明BRIEF DESCRIPTION OF THE DRAWINGS
图1为实施例1和4的工艺流程图;Fig. 1 is a process flow chart of Examples 1 and 4;
图2为实施例2和3的工艺流程图;Fig. 2 is a process flow chart of Examples 2 and 3;
图3为实施例1含V共晶Si-Ti合金焊料的微观结构表征图;FIG3 is a microstructure characterization diagram of the V-containing eutectic Si-Ti alloy solder of Example 1;
图4为实施例1含V共晶Si-Ti合金钎焊SiC陶瓷的结构表征图;FIG4 is a structural representation diagram of SiC ceramic brazed with V-containing eutectic Si-Ti alloy in Example 1;
图5为实施例2复合Si-Ti合金焊料的微观结构表征图;FIG5 is a microstructure characterization diagram of the composite Si-Ti alloy solder of Example 2;
图6为实施例2复合Si-Ti合金钎焊SiC陶瓷的结构表征图;FIG6 is a structural representation diagram of the composite Si-Ti alloy brazing SiC ceramic in Example 2;
图7为实施例3复合Si-Ti合金焊料的微观结构表征图;FIG7 is a microstructure characterization diagram of the composite Si-Ti alloy solder of Example 3;
图8为实施例3复合Si-Ti合金钎焊SiC陶瓷的结构表征图;FIG8 is a structural representation diagram of the composite Si-Ti alloy brazing SiC ceramic in Example 3;
图9为实施例4含V共晶Si-Ti合金焊料的微观结构表征图;FIG9 is a microstructure characterization diagram of the V-containing eutectic Si-Ti alloy solder of Example 4;
图10为实施例4含V共晶Si-Ti合金钎焊SiC陶瓷的结构表征图。FIG. 10 is a structural representation diagram of SiC ceramic brazed with V-containing eutectic Si-Ti alloy in Example 4.
具体实施方式DETAILED DESCRIPTION
下面结合具体实施方式对本发明作进一步详细说明,但本发明的保护范围并不限于所述内容。The present invention is further described in detail below in conjunction with specific implementation modes, but the protection scope of the present invention is not limited to the described contents.
实施例1:本实施例废SCR催化剂(V2O5-WO3/TiO2废催化剂)中TiO2含量为84.9wt%,WO3含量为4.36wt%,V2O5含量为0.64wt%,其它主要成分为1.31wt%CaO、0.4wt%Fe2O3、3.36wt%SiO2和0.72wt%Al2O3;晶硅废料中Si的含量为86.9wt%,其中Fe、O和Al杂质的含量分别为0.4wt%,5.2wt%和0.87wt%;Example 1: The TiO 2 content of the waste SCR catalyst (V 2 O 5 -WO 3 /TiO 2 waste catalyst) in this example is 84.9wt%, the WO 3 content is 4.36wt%, the V 2 O 5 content is 0.64wt%, and the other main components are 1.31wt% CaO, 0.4wt% Fe 2 O 3 , 3.36wt% SiO 2 and 0.72wt% Al 2 O 3 ; the Si content in the crystalline silicon waste is 86.9wt%, of which the contents of Fe, O and Al impurities are 0.4wt%, 5.2wt% and 0.87wt% respectively;
一种利用废SCR催化剂和晶硅废料制备Si-Ti合金焊料并同时回收钨和钒的方法(见图1),具体步骤如下:A method for preparing Si-Ti alloy solder using waste SCR catalyst and crystalline silicon waste and simultaneously recovering tungsten and vanadium (see FIG1 ), the specific steps are as follows:
(1)将废SCR催化剂、晶硅废料和造渣剂(CaO、SiO2和MgO)混合均匀得到混合物料;将混合物料置于氩气气氛中,升温至温度1823K并还原熔炼60min,渣金分离得到含钨和钒的Si-Ti合金和无害残渣(主要成分为CaO、SiO2和MgO);CaO的添加量为废SCR催化剂的30%,SiO2的添加量为废SCR催化剂的6%,MgO的添加量为废SCR催化剂的30%;晶硅废料的质量为废SCR催化剂和造渣剂总质量的1.50倍;(1) The waste SCR catalyst, crystalline silicon waste and slag-forming agent (CaO, SiO2 and MgO) are mixed uniformly to obtain a mixed material; the mixed material is placed in an argon atmosphere, heated to a temperature of 1823K and reduced and smelted for 60 minutes, and the slag is separated to obtain a Si-Ti alloy containing tungsten and vanadium and a harmless residue (mainly composed of CaO, SiO2 and MgO); the amount of CaO added is 30% of the waste SCR catalyst, the amount of SiO2 added is 6% of the waste SCR catalyst, and the amount of MgO added is 30% of the waste SCR catalyst; the mass of the crystalline silicon waste is 1.50 times the total mass of the waste SCR catalyst and the slag-forming agent;
本实施例含钨和钒的Si-Ti合金中Ti的含量为24.5wt%,钨的含量为1.63wt%,钒的含量为0.23wt%,杂质O、Fe、Ca、Mg和Al含量分别为0.02wt%,0.26wt%,0.3wt%,0.12wt%和0.06wt%;In the Si-Ti alloy containing tungsten and vanadium in this embodiment, the content of Ti is 24.5wt%, the content of tungsten is 1.63wt%, the content of vanadium is 0.23wt%, and the contents of impurities O, Fe, Ca, Mg and Al are 0.02wt%, 0.26wt%, 0.3wt%, 0.12wt% and 0.06wt% respectively;
(2)将步骤(1)含钨和钒的Si-Ti合金置于真空(真空度<10 Pa)中加热至1773K保持熔融状态并保温1h,在电磁感应加热条件下定向凝固分离提纯(定向凝固过程中样品向下移动速率为1.5μm/s),依次得到(Ti, W, V)Si2相的富集物、含V共晶Si-Ti合金焊料、杂质富集物;所述(Ti, W, V)Si2相的富集物可继续回收钨和钒;所述含V共晶Si-Ti合金焊料可直接用于钎焊SiC陶瓷;(2) placing the Si-Ti alloy containing tungsten and vanadium in step (1) in a vacuum (vacuum degree <10 Pa), heating it to 1773K, keeping it in a molten state and keeping it warm for 1 hour, and directional solidification separation and purification under electromagnetic induction heating conditions (the sample moving downward at a rate of 1.5 μm/s during directional solidification) to obtain a (Ti, W, V)Si 2 phase enrichment, a V-containing eutectic Si-Ti alloy solder, and an impurity enrichment in turn; the (Ti, W, V)Si 2 phase enrichment can further recover tungsten and vanadium; the V-containing eutectic Si-Ti alloy solder can be directly used for brazing SiC ceramics;
本实施例 (Ti, W, V)Si2相的富集物中钨的含量为15.3wt%,钒的含量0.48wt%;含V共晶Si-Ti合金焊料的纯度为99.6wt.%,V含量为0.1wt.%;含V共晶Si-Ti合金焊料的微观结构表征图如图3所示,其中Si相(黑色相)和含V的TiSi2相(白色相)交替分布,形成均匀且致密的共晶组织,TiSi2相中含有0.38at%的V;In this embodiment, the enrichment of (Ti, W, V)Si 2 phase has a tungsten content of 15.3wt%, and a vanadium content of 0.48wt%; the purity of the V-containing eutectic Si-Ti alloy solder is 99.6wt.%, and the V content is 0.1wt.%; the microstructure characterization diagram of the V-containing eutectic Si-Ti alloy solder is shown in FIG3 , wherein the Si phase (black phase) and the V-containing TiSi 2 phase (white phase) are alternately distributed to form a uniform and dense eutectic structure, and the TiSi 2 phase contains 0.38at% of V;
含V共晶Si-Ti合金焊料直接作为焊接SiC陶瓷的钎焊合金:将含V共晶Si-Ti合金焊料切割成厚度为300µm的合金箔放置在待钎焊的SiC陶瓷片中间,然后在1693K的氩气气氛下保温20min进行高温钎焊,钎焊的SiC陶瓷经剪切强度测试后,其剪切强度为86.5MPa;含V共晶Si-Ti合金钎焊SiC陶瓷的结构表征图如图4所示,含V共晶Si-Ti合金与SiC陶瓷之间结合良好,且均匀的分布在焊缝区域。The V-containing eutectic Si-Ti alloy solder is directly used as a brazing alloy for welding SiC ceramics: the V-containing eutectic Si-Ti alloy solder is cut into alloy foil with a thickness of 300µm and placed in the middle of the SiC ceramic sheet to be brazed, and then high-temperature brazing is performed in an argon atmosphere at 1693K for 20 minutes. After the shear strength test, the brazed SiC ceramic has a shear strength of 86.5MPa; the structural characterization diagram of SiC ceramic brazed with the V-containing eutectic Si-Ti alloy is shown in Figure 4. The V-containing eutectic Si-Ti alloy and the SiC ceramic are well bonded and evenly distributed in the weld area.
实施例2:本实施例废SCR催化剂(V2O5-WO3/TiO2废催化剂)、晶硅废料均与实施例1相同;Example 2: The waste SCR catalyst (V 2 O 5 -WO 3 /TiO 2 waste catalyst) and crystalline silicon waste in this example are the same as those in Example 1;
一种利用废SCR催化剂和晶硅废料制备Si-Ti合金焊料并同时回收钨和钒的方法(见图2),具体步骤如下:A method for preparing Si-Ti alloy solder using waste SCR catalyst and crystalline silicon waste and recovering tungsten and vanadium at the same time (see Figure 2), the specific steps are as follows:
(1)将废SCR催化剂、晶硅废料和造渣剂(CaO、SiO2和MgO)混合均匀得到混合物料;将混合物料置于氩气气氛中,升温至温度1773K并还原熔炼40min,渣金分离得到含钨和钒的Si-Ti合金和无害残渣(主要成分为CaO、SiO2和MgO);CaO的添加量为废SCR催化剂的25%,SiO2的添加量为废SCR催化剂的12%,MgO的添加量为废SCR催化剂的25%;晶硅废料的质量为废SCR催化剂和造渣剂总质量的1.51倍;(1) The waste SCR catalyst, crystalline silicon waste and slag-forming agent (CaO, SiO2 and MgO) are mixed uniformly to obtain a mixed material; the mixed material is placed in an argon atmosphere, heated to a temperature of 1773K and reduced and smelted for 40 minutes, and the slag is separated to obtain a Si-Ti alloy containing tungsten and vanadium and a harmless residue (mainly composed of CaO, SiO2 and MgO); the amount of CaO added is 25% of the waste SCR catalyst, the amount of SiO2 added is 12% of the waste SCR catalyst, and the amount of MgO added is 25% of the waste SCR catalyst; the mass of the crystalline silicon waste is 1.51 times the total mass of the waste SCR catalyst and the slag-forming agent;
本实施例含钨和钒的Si-Ti合金中Ti的含量为24.3wt%,钨的含量为1.56wt%,钒的含量为0.21wt%,杂质O、Fe、Ca、Mg和Al含量分别为0.01wt%,0.24wt%,0.28wt%,0.1wt%和0.05wt%;In the Si-Ti alloy containing tungsten and vanadium in this embodiment, the content of Ti is 24.3wt%, the content of tungsten is 1.56wt%, the content of vanadium is 0.21wt%, and the contents of impurities O, Fe, Ca, Mg and Al are 0.01wt%, 0.24wt%, 0.28wt%, 0.1wt% and 0.05wt% respectively;
(2)将步骤(1)含钨和钒的Si-Ti合金置于氩气气氛中加热至1723K保持熔融状态并保温0.5h,在电磁感应加热条件下定向凝固分离提纯(定向凝固过程中样品向下移动速率为1.8μm/s),依次得到(Ti, W, V)Si2相的富集物、含V共晶Si-Ti合金焊料、杂质富集物;所述(Ti, W, V)Si2相的富集物可继续回收钨和钒;(2) placing the Si-Ti alloy containing tungsten and vanadium in step (1) in an argon atmosphere, heating it to 1723K to keep it in a molten state and keeping it warm for 0.5h, and directional solidifying, separating and purifying it under electromagnetic induction heating conditions (the downward movement rate of the sample during the directional solidification process is 1.8μm/s), and obtaining a (Ti, W, V) Si2 phase enrichment, a V-containing eutectic Si-Ti alloy solder, and an impurity enrichment in turn; the (Ti, W, V) Si2 phase enrichment can continue to recover tungsten and vanadium;
本实施例 (Ti, W, V)Si2相的富集物中钨的含量为14.6wt%,钒的含量0.42wt%;含V共晶Si-Ti合金焊料的纯度为99.7wt.%,V含量为0.09wt.%;In this embodiment, the tungsten content in the enriched material of (Ti, W, V)Si 2 phase is 14.6wt%, and the vanadium content is 0.42wt%; the purity of the V-containing eutectic Si-Ti alloy solder is 99.7wt.%, and the V content is 0.09wt.%;
(3)将(Ti, W, V)Si2相的富集物作为添加剂加入到含钨和钒的Si-Ti合金中,在氩气气氛下加热至1823K使其高温熔化并保温0.5h形成复合Si-Ti合金焊料;(Ti, W, V)Si2相的富集物的添加量为含V共晶Si-Ti合金焊料质量的0.5%;复合Si-Ti合金焊料的微观结构表征图如图5所示,其中Si相(黑色相)和含W和V的TiSi2相(白色相)交替分布,形成均匀且致密的共晶组织,TiSi2相中含有少量的V和W,其含量分别为3.13at%和0.7at%;(3) The enriched product of (Ti, W, V)Si 2 phase was added as an additive to the Si-Ti alloy containing tungsten and vanadium, and heated to 1823K in an argon atmosphere to make it melt at high temperature and kept warm for 0.5h to form a composite Si-Ti alloy solder; the amount of the enriched product of (Ti, W, V)Si 2 phase added was 0.5% of the mass of the eutectic Si-Ti alloy solder containing V; the microstructure characterization diagram of the composite Si-Ti alloy solder is shown in Figure 5, in which the Si phase (black phase) and the TiSi 2 phase (white phase) containing W and V are alternately distributed to form a uniform and dense eutectic structure, and the TiSi 2 phase contains a small amount of V and W, whose contents are 3.13at% and 0.7at%, respectively;
复合Si-Ti合金焊料作为焊接SiC陶瓷的钎焊合金:将复合Si-Ti合金焊料切割成厚度为300µm的合金箔放置在待钎焊的SiC陶瓷片中间,然后在1723K的氩气气氛下保温20min进行高温钎焊,钎焊的SiC陶瓷经剪切强度测试后,其剪切强度为88.3MPa;复合Si-Ti合金钎焊SiC陶瓷的结构表征图如图6所示,复合Si-Ti合金与SiC陶瓷之间结合良好,且均匀的分布在焊缝区域。Composite Si-Ti alloy solder is used as a brazing alloy for welding SiC ceramics: the composite Si-Ti alloy solder is cut into alloy foil with a thickness of 300µm and placed in the middle of the SiC ceramic sheet to be brazed, and then high-temperature brazing is performed in an argon atmosphere at 1723K for 20 minutes. After the shear strength test, the shear strength of the brazed SiC ceramic is 88.3MPa; the structural characterization diagram of the composite Si-Ti alloy brazing SiC ceramic is shown in Figure 6. The composite Si-Ti alloy and SiC ceramic are well bonded and evenly distributed in the weld area.
实施例3:本实施例废SCR催化剂(V2O5-WO3/TiO2废催化剂)、晶硅废料均与实施例1相同;Example 3: The waste SCR catalyst (V 2 O 5 -WO 3 /TiO 2 waste catalyst) and crystalline silicon waste in this example are the same as those in Example 1;
一种利用废SCR催化剂和晶硅废料制备Si-Ti合金焊料并同时回收钨和钒的方法(见图2),具体步骤如下:A method for preparing Si-Ti alloy solder using waste SCR catalyst and crystalline silicon waste and recovering tungsten and vanadium at the same time (see Figure 2), the specific steps are as follows:
(1)将废SCR催化剂、晶硅废料和造渣剂(CaO、SiO2和MgO)混合均匀得到混合物料;将混合物料置于氩气气氛中,升温至温度1823K并还原熔炼80min,渣金分离得到含钨和钒的Si-Ti合金和无害残渣(主要成分为CaO、SiO2和MgO);CaO的添加量为废SCR催化剂的20%,SiO2的添加量为废SCR催化剂的18%,MgO的添加量为废SCR催化剂的20%;晶硅废料的质量为废SCR催化剂和造渣剂总质量的1.48倍;(1) The waste SCR catalyst, crystalline silicon waste and slag-forming agent (CaO, SiO2 and MgO) are mixed uniformly to obtain a mixed material; the mixed material is placed in an argon atmosphere, heated to a temperature of 1823K and reduced and smelted for 80 minutes, and the slag is separated to obtain a Si-Ti alloy containing tungsten and vanadium and a harmless residue (mainly composed of CaO, SiO2 and MgO); the amount of CaO added is 20% of the waste SCR catalyst, the amount of SiO2 added is 18% of the waste SCR catalyst, and the amount of MgO added is 20% of the waste SCR catalyst; the mass of the crystalline silicon waste is 1.48 times the total mass of the waste SCR catalyst and the slag-forming agent;
本实施例含钨和钒的Si-Ti合金中Ti的含量为24.8wt%,钨的含量为1.78wt%,钒的含量为0.26wt%,杂质O、Fe、Ca、Mg和Al含量分别为0.02wt%,0.29wt%,0.34wt%,0.16wt%和0.07wt%;In the Si-Ti alloy containing tungsten and vanadium in this embodiment, the content of Ti is 24.8wt%, the content of tungsten is 1.78wt%, the content of vanadium is 0.26wt%, and the contents of impurities O, Fe, Ca, Mg and Al are 0.02wt%, 0.29wt%, 0.34wt%, 0.16wt% and 0.07wt% respectively;
(2)将步骤(1)含钨和钒的Si-Ti合金置于氩气气氛中加热至1723K保持熔融状态并保温0.5h,在电磁感应加热条件下定向凝固分离提纯(定向凝固过程中样品向下移动速率为1.0μm/s),依次得到(Ti, W, V)Si2相的富集物、含V共晶Si-Ti合金焊料、杂质富集物;所述(Ti, W, V)Si2相的富集物可继续回收钨和钒;(2) placing the Si-Ti alloy containing tungsten and vanadium in step (1) in an argon atmosphere, heating it to 1723K to keep it in a molten state and keeping it warm for 0.5h, and directional solidifying, separating and purifying it under electromagnetic induction heating conditions (the downward movement rate of the sample during the directional solidification process is 1.0μm/s), and obtaining a (Ti, W, V) Si2 phase enrichment, a V-containing eutectic Si-Ti alloy solder, and an impurity enrichment in sequence; the (Ti, W, V) Si2 phase enrichment can continue to recover tungsten and vanadium;
本实施例 (Ti, W, V)Si2相的富集物中钨的含量为15.9wt%,钒的含量0.68wt%;含V共晶Si-Ti合金焊料的纯度为99.7wt.%,V含量为0.11wt.%;In this embodiment, the tungsten content in the enriched product of (Ti, W, V)Si 2 phase is 15.9wt%, and the vanadium content is 0.68wt%; the purity of the V-containing eutectic Si-Ti alloy solder is 99.7wt.%, and the V content is 0.11wt.%;
(3)将(Ti, W, V)Si2相的富集物作为添加剂加入到含钨和钒的Si-Ti合金中,真空(真空度<10 Pa)条件下加热至1773K使其高温熔化并保温1h形成复合Si-Ti合金焊料;(Ti, W, V)Si2相的富集物的添加量为含V共晶Si-Ti合金焊料质量的0.8%;复合Si-Ti合金焊料的微观结构表征图如图7所示,其中Si相(黑色相)和含W和V的TiSi2相(白色相)交替分布,形成均匀且致密的共晶组织,TiSi2相中含有少量的V和W,其含量分别为3.16at%和0.73at%;(3) The enriched product of (Ti, W, V)Si 2 phase is added as an additive to the Si-Ti alloy containing tungsten and vanadium, and heated to 1773K under vacuum (vacuum degree <10 Pa) to make it melt at high temperature and keep it at this temperature for 1 hour to form a composite Si-Ti alloy solder. The amount of the enriched product of (Ti, W, V)Si 2 phase added is 0.8% of the mass of the eutectic Si-Ti alloy solder containing V. The microstructure characterization diagram of the composite Si-Ti alloy solder is shown in Figure 7, in which the Si phase (black phase) and the TiSi 2 phase (white phase) containing W and V are alternately distributed to form a uniform and dense eutectic structure. The TiSi 2 phase contains a small amount of V and W, and the contents are 3.16at% and 0.73at%, respectively.
复合Si-Ti合金焊料作为焊接SiC陶瓷的钎焊合金:将复合Si-Ti合金焊料切割成厚度为300µm的合金箔放置在待钎焊的SiC陶瓷片中间,然后在1693K的氩气气氛下保温25min进行高温钎焊,钎焊的SiC陶瓷经剪切强度测试后,其剪切强度为87.9MPa;复合Si-Ti合金钎焊SiC陶瓷的结构表征图如图8所示,复合Si-Ti合金与SiC陶瓷之间结合良好,且均匀的分布在焊缝区域。Composite Si-Ti alloy solder is used as a brazing alloy for welding SiC ceramics: the composite Si-Ti alloy solder is cut into alloy foil with a thickness of 300µm and placed in the middle of the SiC ceramic sheet to be brazed, and then high-temperature brazing is performed in an argon atmosphere at 1693K for 25 minutes. After the shear strength test, the shear strength of the brazed SiC ceramic is 87.9MPa; the structural characterization diagram of the composite Si-Ti alloy brazing SiC ceramic is shown in Figure 8. The composite Si-Ti alloy and SiC ceramic are well bonded and evenly distributed in the weld area.
实施例4:本实施例废SCR催化剂(V2O5-WO3/TiO2废催化剂)、晶硅废料均与实施例1相同;Example 4: The waste SCR catalyst (V 2 O 5 -WO 3 /TiO 2 waste catalyst) and crystalline silicon waste in this example are the same as those in Example 1;
一种利用废SCR催化剂和晶硅废料制备Si-Ti合金焊料并同时回收钨和钒的方法(见图1),具体步骤如下:A method for preparing Si-Ti alloy solder using waste SCR catalyst and crystalline silicon waste and simultaneously recovering tungsten and vanadium (see FIG1 ), the specific steps are as follows:
(1)将废SCR催化剂、晶硅废料和造渣剂(CaO、SiO2和MgO)混合均匀得到混合物料;将混合物料置于氩气气氛中,升温至温度1773K并还原熔炼30min,渣金分离得到含钨和钒的Si-Ti合金和无害残渣(主要成分为CaO、SiO2和MgO);CaO的添加量为废SCR催化剂的25%,SiO2的添加量为废SCR催化剂的12%,MgO的添加量为废SCR催化剂的25%;晶硅废料的质量为废SCR催化剂和造渣剂总质量的1.52倍;(1) The waste SCR catalyst, crystalline silicon waste and slag-forming agent (CaO, SiO2 and MgO) are mixed uniformly to obtain a mixed material; the mixed material is placed in an argon atmosphere, heated to a temperature of 1773K and reduced and smelted for 30 minutes, and the slag is separated to obtain a Si-Ti alloy containing tungsten and vanadium and a harmless residue (mainly composed of CaO, SiO2 and MgO); the amount of CaO added is 25% of the waste SCR catalyst, the amount of SiO2 added is 12% of the waste SCR catalyst, and the amount of MgO added is 25% of the waste SCR catalyst; the mass of the crystalline silicon waste is 1.52 times the total mass of the waste SCR catalyst and the slag-forming agent;
本实施例含钨和钒的Si-Ti合金中Ti的含量为24.1wt%,钨的含量为1.52wt%,钒的含量为0.19wt%,杂质O、Fe、Ca、Mg和Al含量分别为0.01wt%,0.21wt%,0.22wt%,0.08wt%和0.04wt%;In the Si-Ti alloy containing tungsten and vanadium in this embodiment, the content of Ti is 24.1wt%, the content of tungsten is 1.52wt%, the content of vanadium is 0.19wt%, and the contents of impurities O, Fe, Ca, Mg and Al are 0.01wt%, 0.21wt%, 0.22wt%, 0.08wt% and 0.04wt% respectively;
(2)将步骤(1)含钨和钒的Si-Ti合金置于真空(真空度<10 Pa)中加热至1723K保持熔融状态并保温0.5h,在电磁感应加热条件下定向凝固分离提纯(定向凝固过程中样品向下移动速率为1.8μm/s),依次得到(Ti, W, V)Si2相的富集物、含V共晶Si-Ti合金焊料、杂质富集物;所述(Ti, W, V)Si2相的富集物可继续回收钨和钒;所述含V共晶Si-Ti合金焊料可直接用于钎焊SiC陶瓷;(2) placing the Si-Ti alloy containing tungsten and vanadium in step (1) in a vacuum (vacuum degree <10 Pa), heating it to 1723K, keeping it in a molten state and keeping it warm for 0.5h, and directional solidification, separation and purification under electromagnetic induction heating conditions (the sample moving downward at a rate of 1.8μm/s during directional solidification) to obtain a (Ti, W, V)Si 2 phase enrichment, a V-containing eutectic Si-Ti alloy solder, and an impurity enrichment in turn; the (Ti, W, V)Si 2 phase enrichment can further recover tungsten and vanadium; the V-containing eutectic Si-Ti alloy solder can be directly used for brazing SiC ceramics;
本实施例 (Ti, W, V)Si2相的富集物中钨的含量为14.2wt%,钒的含量0.38wt%;含V共晶Si-Ti合金焊料的纯度为99.6wt.%,V含量为0.08wt.%;含V共晶Si-Ti合金焊料的微观结构表征图如图9所示,其中Si相(黑色相)和含V的TiSi2相(白色相)交替分布,形成均匀且致密的共晶组织,TiSi2相中含有0.33at%的V;In this embodiment, the tungsten content in the enriched product of (Ti, W, V)Si 2 phase is 14.2wt%, and the vanadium content is 0.38wt%; the purity of the eutectic Si-Ti alloy solder containing V is 99.6wt.%, and the V content is 0.08wt.%; the microstructure characterization diagram of the eutectic Si-Ti alloy solder containing V is shown in FIG9 , wherein the Si phase (black phase) and the TiSi 2 phase containing V (white phase) are alternately distributed to form a uniform and dense eutectic structure, and the TiSi 2 phase contains 0.33at% of V;
含V共晶Si-Ti合金焊料直接作为焊接SiC陶瓷的钎焊合金:将含V共晶Si-Ti合金焊料切割成厚度为300µm的合金箔放置在待钎焊的SiC陶瓷片中间,然后在1693K的氩气气氛下保温20min进行高温钎焊,钎焊的SiC陶瓷经剪切强度测试后,其剪切强度为87.0MPa;含V共晶Si-Ti合金钎焊SiC陶瓷的结构表征图如图10所示,含V共晶Si-Ti合金与SiC陶瓷之间结合良好,且均匀的分布在焊缝区域。The V-containing eutectic Si-Ti alloy solder is directly used as a brazing alloy for welding SiC ceramics: the V-containing eutectic Si-Ti alloy solder is cut into an alloy foil with a thickness of 300µm and placed in the middle of the SiC ceramic sheet to be brazed, and then high-temperature brazing is performed in an argon atmosphere at 1693K for 20 minutes. After the shear strength test, the brazed SiC ceramic has a shear strength of 87.0MPa; the structural characterization diagram of SiC ceramic brazed with the V-containing eutectic Si-Ti alloy is shown in Figure 10. The V-containing eutectic Si-Ti alloy and the SiC ceramic are well bonded and evenly distributed in the weld area.
以上对本发明的具体实施方式作了详细说明,但是本发明并不限于上述实施方式,在本领域普通技术人员所具备的知识范围内,还可以在不脱离本发明宗旨的前提下做出各种变化。The specific implementation modes of the present invention are described in detail above, but the present invention is not limited to the above implementation modes, and various changes can be made within the knowledge scope of ordinary technicians in this field without departing from the purpose of the present invention.
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