CN117619819A - A circulating wafer cleaning equipment - Google Patents
A circulating wafer cleaning equipment Download PDFInfo
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- CN117619819A CN117619819A CN202311624734.2A CN202311624734A CN117619819A CN 117619819 A CN117619819 A CN 117619819A CN 202311624734 A CN202311624734 A CN 202311624734A CN 117619819 A CN117619819 A CN 117619819A
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- Prior art keywords
- filter
- hollow cylinder
- inner cavity
- hollow
- liquid
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67011—Apparatus for manufacture or treatment
- H01L21/67017—Apparatus for fluid treatment
- H01L21/67023—Apparatus for fluid treatment for general liquid treatment, e.g. etching followed by cleaning
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B08—CLEANING
- B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
- B08B13/00—Accessories or details of general applicability for machines or apparatus for cleaning
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B08—CLEANING
- B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
- B08B3/00—Cleaning by methods involving the use or presence of liquid or steam
- B08B3/04—Cleaning involving contact with liquid
- B08B3/10—Cleaning involving contact with liquid with additional treatment of the liquid or of the object being cleaned, e.g. by heat, by electricity or by vibration
- B08B3/14—Removing waste, e.g. labels, from cleaning liquid
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- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Cleaning Or Drying Semiconductors (AREA)
Abstract
本发明公开了一种循环式晶圆清洗设备，包括清洗槽，所述清洗槽的底部设有管道，且所述管道上安装有泵体和过滤器，还包括内部空心且上下端均为封闭的空心筒，所述过滤器设置有多个，多个所述过滤器呈圆周密封设置在所述空心筒的底部，所述过滤器的进液端与所述空心筒的内腔相通，所述空心筒的内腔设置有旋转板，且所述旋转板上开设有一个与所述过滤器进液端适配的进液孔，还包括自动更换单元。本晶圆清洗设备上设置有多个过滤器和自动更换单元，当过滤器堵塞时，其空心筒内水压变大，通过此变大的水压作用带动自动更换单元更换过滤路径，更换所需时间相比人工跟换所需时间大大缩短，有利于晶圆的快速清洗。
The invention discloses a circulating wafer cleaning equipment, which includes a cleaning tank. A pipeline is provided at the bottom of the cleaning tank, and a pump body and a filter are installed on the pipeline. It also includes a hollow interior with closed upper and lower ends. The hollow cylinder is provided with a plurality of filters. The plurality of filters are circumferentially sealed and arranged at the bottom of the hollow cylinder. The liquid inlet end of the filter is communicated with the inner cavity of the hollow cylinder, so The inner cavity of the hollow cylinder is provided with a rotating plate, and the rotating plate is provided with a liquid inlet hole adapted to the liquid inlet end of the filter, and also includes an automatic replacement unit. This wafer cleaning equipment is equipped with multiple filters and automatic replacement units. When the filter is clogged, the water pressure in the hollow cylinder increases. The increased water pressure drives the automatic replacement unit to replace the filter path and replace the filter path. The time required is greatly shortened compared with the time required for manual replacement, which is conducive to rapid cleaning of wafers.
Description
Technical Field
The invention relates to the technical field of wafer cleaning, in particular to circulating type wafer cleaning equipment.
Background
In the semiconductor manufacturing process, photolithography, etching, sputtering, deposition and the like are usually used, and inevitably
Since metal particles, organic impurities, and the like remain on the surface of the wafer and pollute the wafer, the wafer needs to be cleaned to remove photoresist, organic matters, adsorbates, and the like remaining on the surface of the wafer.
When cleaning a wafer, the wafer is generally required to be immersed in an ultrasonic cleaning tank containing cleaning liquid for cleaning, and is generally required to be cleaned for multiple times, that is, the cleaning liquid in the cleaning tank is required to be drained after each cleaning is completed, and then clean cleaning liquid is injected for cleaning for two or more times, which causes a great amount of waste of the cleaning liquid.
In order to solve the problems, the conventional circulating filter device is generally arranged on a cleaning tank and comprises a pump body, a connecting pipeline and a single filter, when the cleaning tank is cleaned, cleaning liquid in the cleaning tank is pumped into the filter by the pump body to be filtered and then returned to the cleaning tank, so that the circulation of the cleaning liquid can be formed, the waste of the cleaning liquid is greatly reduced, and the cleaning of the wafer can be completed by only a small amount of cleaning liquid. There are some problems with using a single filter, such as when the filter is found to be blocked seriously in the cleaning process (when the internal filter is blocked, the filtering efficiency of the cleaning liquid is reduced, the cleaning time of the wafer is prolonged, meanwhile, the internal pressure of the filter is too high, the filter is easy to leak due to the too high internal pressure), the pump body is required to be stopped timely by an operator, the filter is replaced, the cleaning liquid in the cleaning tank cannot continue to be filtered circularly, and impurities in the cleaning liquid cannot be removed timely, so that the subsequent cleaning time is prolonged.
Disclosure of Invention
An object of the present application is to provide a circulating wafer cleaning equipment for solve the technical problem that current cleaning equipment can't be when the filter filtration spare blocks up automatic change filter.
In order to achieve the above purpose, the present application provides the following technical solutions: the utility model provides a circulating wafer cleaning equipment, includes the washing tank, the bottom of washing tank is equipped with the pipeline, just install pump body and filter on the pipeline, the leakage fluid dram of filter is located the top of washing tank still includes inside hollow and upper and lower end is confined hollow section of thick bamboo, just the feed liquor end of hollow section of thick bamboo with the play liquid end of pipeline is connected, the filter is provided with a plurality of, a plurality of the filter is circumference sealed the setting in the bottom of hollow section of thick bamboo, a plurality of the filter all with the removable washing formula installation of hollow section of thick bamboo, the feed liquor end of filter with the inner chamber of hollow section of thick bamboo communicates with each other, the inner chamber of hollow section of thick bamboo is provided with the rotor plate, just offer one with the feed liquor hole of filter feed liquor end adaptation on the rotor plate, the bottom of rotor plate is fixed with elastic sealing pad, just the lower extreme of elastic sealing pad and the inner chamber bottom of hollow section of thick bamboo contact, a plurality of filters the upper end with the bottom of hollow section of thick bamboo flushes still including automatic change unit when the filter blocks up and leads to the automatic hollow section of thick bamboo internal pressure becomes big, and drives the angle change filter, the filter carries out when the rotatory plate is carried out the rotation, the filter is carried out the rotation when the rotor plate is the filter, the rotatory is stopped, and the filter is rotated down, and the realization is rotated when the filter is the dead than.
As a preferred implementation manner in this embodiment, the automatic replacement unit includes a pressure-sensing driving unit and a rotating unit, and when the water pressure in the hollow cylinder increases, the pressure-sensing driving unit drives the rotating unit to operate under the action of water pressure, and the rotating unit is used to drive the selection plate to rotate.
As a preferred implementation manner in this embodiment, the pressure-sensitive driving unit includes the mounting bracket that installs in the rotary unit top, fix on the mounting bracket with the hollow post, the inner chamber of hollow post is provided with the sealing block, just wrap up on the outer wall of sealing block has the elastic sealing ring, the outer wall of elastic sealing ring with the inner wall slip conflict of hollow post, the upper end of sealing block is fixed with the extrusion pole, the lower extreme of extrusion pole is located the below of mounting bracket, and be located the top of rotary unit.
As a preferred implementation manner in this embodiment, the rotating unit includes a cylinder body disposed in the mounting hole at the axis of the rotating plate, the lower end of the cylinder body is rotationally connected with the bottom of the inner cavity of the hollow cylinder, a pressing down column is slidably disposed in the cylinder body, the pressing down column is fixedly connected with the bottom of the inner cavity of the hollow cylinder through a spring, a driving rod is rotationally disposed on the pressing down column, and the end portion of the driving rod is disposed in a running groove disposed on the inner wall of the cylinder body.
As a preferable implementation manner in the embodiment, the liquid inlet ends of a plurality of filters are in threaded connection with the bottom of the inner cavity of the hollow cylinder.
As a preferred implementation manner in this embodiment, the bottom of the hollow cylinder is connected with a conical liquid receiving groove through a plurality of connecting rods arranged circumferentially, and the liquid outlet of the liquid receiving groove is located above the cleaning tank, and an operation space convenient for disassembling the filter is arranged between the upper end of the liquid receiving groove and the lower end of the hollow cylinder.
As a preferred implementation manner in this embodiment, the filter includes a housing with a liquid inlet at an upper end, a first annular filter screen and a second annular filter screen are installed in an inner cavity of the housing, the first annular filter screen is located on the second annular filter screen, inner cavities of the first annular filter screen and the second annular filter screen are respectively provided with a filter gauze and an ion filter membrane layer, and upper and lower ends of the first annular filter screen and the second annular filter screen are respectively fixedly connected with the housing and the sealing plate.
In summary, the invention has the technical effects and advantages that:
the invention has reasonable structure, and the wafer cleaning equipment is provided with a plurality of filters and the automatic replacement units, when the filters are blocked, the water pressure in the hollow cylinder of the wafer cleaning equipment is increased, and the automatic replacement units are driven by the increased water pressure to replace the filter paths, so that the time required for replacement is greatly shortened compared with the time required for manual replacement, and the rapid cleaning of the wafer is facilitated;
adopt the rotor plate that has single feed liquor hole, change the filtration route through the fixed angle rotation of rotor plate, the sealed cover of elasticity that the rotor plate bottom set up simultaneously can be with the feed liquor end and the filter installing port of the filter that does not participate in the filtration operation for the seal for personnel can change the filter that is blocked, and can not cause the excessive of washing liquid.
Drawings
In order to more clearly illustrate the embodiments of the present application or the technical solutions in the prior art, the drawings that are required in the embodiments or the description of the prior art will be briefly described below, it being obvious that the drawings in the following description are only some embodiments of the present application, and that other drawings may be obtained according to these drawings without inventive effort for a person skilled in the art.
FIG. 1 is a schematic perspective view of the present invention;
FIG. 2 is a schematic view of the filter of FIG. 1 in a split configuration;
FIG. 3 is a schematic diagram illustrating a split structure of the pressure-sensitive driving unit and the rotating unit in FIG. 2;
FIG. 4 is a schematic cross-sectional view of the hollow column of FIG. 3;
FIG. 5 is a schematic cross-sectional view of the cylinder of FIG. 3;
FIG. 6 is an expanded and partially enlarged view of the movement groove in the barrel of FIG. 5;
fig. 7 is a schematic cross-sectional view of the filter of fig. 3.
In the figure: 1. a cleaning tank; 2. a pipe; 3. a pump body; 4. a filter; 41. a housing; 42. a first annular filter screen; 43. a second annular filter screen; 44. an ion filtration membrane layer; 45. filtering gauze; 46. a sealing plate; 5. a hollow cylinder; 6. a connecting rod; 7. a liquid receiving tank; 8. a pressure-sensitive driving unit; 81. a hollow column; 82. a mounting frame; 83. an extrusion rod; 84. a sealing block; 85. an elastic sealing ring; 9. a rotating unit; 91. a cylinder; 92. pressing down a column; 93. a spring; 94. a driving rod; 95. a running groove; 10. a rotating plate; 11. a liquid inlet hole; 12. an elastic sealing gasket.
Detailed Description
The following description of the embodiments of the present invention will be made clearly and completely with reference to the accompanying drawings, in which it is apparent that the embodiments described are only some embodiments of the present invention, but not all embodiments. All other embodiments, which can be made by those skilled in the art based on the embodiments of the invention without making any inventive effort, are intended to be within the scope of the invention.
Examples: referring to a circulation type wafer cleaning equipment shown in fig. 1, including washing tank 1, the bottom of washing tank 1 is equipped with pipeline 2, just install pump body 3 and filter 4 on the pipeline 2, the leakage fluid dram of filter 4 is located the top of washing tank 1 still includes inside hollow and upper and lower end is confined hollow section of thick bamboo 5, just the inlet end of hollow section of thick bamboo 5 with the liquid outlet end of pipeline 2 is connected, filter 4 is provided with a plurality of filter 4 is the circumference and seals the bottom of hollow section of thick bamboo 5, a plurality of filter 4 all with the removable washing type installation of hollow section of thick bamboo 5, the inlet end of filter 4 with the inner chamber of hollow section of thick bamboo 5 communicates with each other, the inner chamber of hollow section of thick bamboo 5 is provided with rotor plate 10, just offer one with the inlet port 11 of filter 4 inlet end adaptation on the rotor plate 10, the bottom of rotor plate 10 is fixed with elastic sealing pad 12, just the lower extreme of elastic sealing pad 12 with the inner chamber bottom of hollow section of thick bamboo 5 is connected, a plurality of filter 4 are in circumference sealing arrangement in the bottom of hollow section of thick bamboo 5, a plurality of filter 4 all with the inner chamber 5 is rotatable, and the filter 4 is carried out the filter 4 and is carried out to the rotation when the filter 4 is changed to the volume change the inner chamber of hollow section of thick bamboo 5, and the filter 4 is changed, and the filter is changed to the volume is changed, and the filter is changed to the volume when the filter is changed.
This cleaning device is provided with a plurality of filters, when the filter that one of them filter 4 is inside takes place to block up, the automatic change unit that accessible set up on it makes automatically feed liquor hole 11 and next the feed liquor end coincidence of filter 4, fluid will get into next filter 4 through feed liquor hole 11 and filter this moment, and other filter 4 are inoperative this moment (shelter from sealed with other filter feed liquor end through elastic sealing pad 12), change required time and manual work and change required time shorten greatly, be favorable to the quick washing of wafer, because the elastic sealing pad 12 that sets up contacts with the inner chamber bottom of hollow section of thick bamboo 5, it shelters from sealed with the installation mouth of filter 4, can dismantle the filter 4 of jam this moment and wash or change, also can not cause the washing liquid to spill from this installation mouth in the hollow section of thick bamboo 5.
As a preferred implementation manner in this embodiment, as shown in fig. 2, the automatic replacement unit includes a pressure-sensitive driving unit 8 and a rotating unit 9, where when the water pressure in the hollow cylinder 5 increases, the pressure-sensitive driving unit 8 drives the rotating unit 9 to operate under the action of water pressure, and the rotating unit is used to drive the selection plate 10 to rotate.
As a preferred implementation manner in this embodiment, as shown in fig. 4, the pressure-sensitive driving unit 8 includes a mounting frame 82 mounted above the rotating unit 9, a sealing block 84 is fixed on the mounting frame 82 and is provided with a hollow column 81, an outer wall of the sealing block 84 is wrapped with an elastic sealing ring 85, an outer wall of the elastic sealing ring 85 is in sliding contact with an inner wall of the hollow column 81, an extrusion rod 83 is fixed at an upper end of the sealing block 84, and a lower end of the extrusion rod 83 is located below the mounting frame 82 and above the rotating unit 9.
When the filter element in the filter 4 is blocked, the pressure in the inner cavity of the hollow cylinder 5 is increased, so that the sealing block 84 drives the extruding rod 83 to move downwards, the extruding rod 83 moving downwards contacts with the rotating unit and drives the rotating unit to move, after the filter 4 is replaced, the extruding force acting on the sealing block 84 is reduced, and the high air pressure in the hollow cylinder 5 pushes the sealing block 84 to move upwards and finally restore to the original position.
As a preferred implementation manner in this embodiment, as shown in fig. 5 and 6, the rotating unit 9 includes a cylinder 91 disposed in an installation hole at the axis of the rotating plate 10, the lower end of the cylinder 91 is rotatably connected with the bottom of the inner cavity of the hollow cylinder 5, a pressing post 92 is slidably disposed in the cylinder 91, and the pressing post 92 is fixedly connected with the bottom of the inner cavity of the hollow cylinder 5 through a spring 93, a driving rod 94 is rotatably disposed on the pressing post 92, and an end portion of the driving rod 94 is disposed in an operation groove 95 disposed on the inner wall of the cylinder 91.
The downward extrusion rod 83 contacts with the upper end of the downward pressing column 92 and drives the downward pressing column 92 to move downward, the driving rod 94 on the downward pressing column 92 moves along the movement groove 95 in a V shape, after one V shape movement is completed, the liquid inlet 11 coincides with the liquid inlet end of the next filter 4, at this time, the cleaning liquid in the hollow cylinder 5 will be filtered by the filter 4, and when the filter 4 is blocked, the liquid inlet 11 coincides with the next filter 4 automatically.
It should be noted that, the number of the filters divided by 360 ° is the angle rotated by the rotating plate 10 when the driving rod 94 moves along the motion groove in a V shape; as shown in fig. 6, after the driving rod 94 moves in V-shape and the axis of the driving rod 94 moves to the left side of the vertical imaginary line L1, the liquid inlet 11 starts to move above the liquid inlet end of the next filter 4, and as the contact ratio between the liquid inlet 11 and the liquid inlet end becomes higher, the cleaning liquid in the hollow cylinder 5 can enter the filter 4 through the liquid inlet end to be filtered, at this moment, the water pressure in the hollow cylinder 5 will start to decrease, under the action of the spring 93, the driving rod 94 will be driven to move upwards, and move upwards in the inclined plane extrusion contact with the operation groove 95, and when the liquid inlet 11 moves to the highest point, the liquid inlet 11 coincides with the liquid inlet end.
As a preferred implementation manner in this embodiment, as shown in fig. 3, the liquid inlet ends of a plurality of filters 4 are all in threaded connection with the bottom of the inner cavity of the hollow cylinder 5.
The threaded connection facilitates the disassembly and the installation of the filter 4 and the hollow cylinder 5, the outer wall of the liquid inlet end of the filter 4 is provided with threads, and the bottom of the hollow cylinder 5 is provided with a threaded installation hole matched with the threaded installation hole.
As a preferred implementation manner in this embodiment, as shown in fig. 1, the bottom of the hollow cylinder 5 is connected with a conical liquid receiving groove 7 through a plurality of connecting rods 6 arranged circumferentially, a liquid outlet of the liquid receiving groove 7 is located above the cleaning groove 1, and an operation space convenient for disassembling the filter 4 is arranged between the upper end of the liquid receiving groove 7 and the lower end of the hollow cylinder 5.
The liquid receiving tank 7 is provided to collect the cleaning liquid flowing out from the bottom of the filter so that it is concentrated to be discharged into the cleaning tank 1.
As a preferred implementation manner in this embodiment, as shown in fig. 7, the filter 4 includes a housing 41 with a liquid inlet at an upper end, a first annular filter screen 42 and a second annular filter screen 43 are installed in an inner cavity of the housing 41, the first annular filter screen 42 is located in the second annular filter screen 43, inner cavities of the first annular filter screen 42 and the second annular filter screen 43 are respectively provided with a filter gauze 45 and an ion filter membrane layer 44, and upper and lower ends of the first annular filter screen 42 and the second annular filter screen 43 are respectively fixedly connected with the housing 41 and a sealing plate 46.
The large particles or suspended matters in the cleaning solution are filtered through the filter gauze 45, and the ions in the cleaning solution are removed through the ion filtering membrane layer 44, so that the cleaning solution has a good cleaning effect, the filtered cleaning solution is purer, and the cleanliness of the fine wafer can be improved.
It should be noted that, first, the first annular filter screen 42 and the second annular filter screen 43 play a role in supporting the filter gauze 45 and the ion filter membrane layer 44, and prevent being hydraulically pressed by high pressure; second, the filtered water is discharged downward from the space between the housing 41 and the outer wall of the second circular filter screen 43.
Finally, it should be noted that: the foregoing description is only illustrative of the preferred embodiments of the present invention, and although the present invention has been described in detail with reference to the foregoing embodiments, it will be apparent to those skilled in the art that modifications may be made to the embodiments described, or equivalents may be substituted for elements thereof, and any modifications, equivalents, improvements or changes may be made without departing from the spirit and principles of the present invention.
Claims (7)
1. The utility model provides a circulation formula wafer cleaning equipment, includes washing tank (1), the bottom of washing tank (1) is equipped with pipeline (2), just install pump body (3) and filter (4) on pipeline (2), the leakage fluid dram of filter (4) is located the top of washing tank (1), its characterized in that: the automatic quantitative liquid-filtering device further comprises a hollow cylinder (5) with the inside hollow and the upper end and the lower end being closed, wherein the liquid inlet end of the hollow cylinder (5) is connected with the liquid outlet end of the pipeline (2), the filter (4) is provided with a plurality of elastic sealing gaskets (12), the lower ends of the elastic sealing gaskets (12) are in circumferential sealing arrangement at the bottom of the hollow cylinder (5), the plurality of filters (4) are detachably arranged on the bottom of the hollow cylinder (5), the liquid inlet end of the filter (4) is communicated with the inner cavity of the hollow cylinder (5), the inner cavity of the hollow cylinder (5) is provided with a rotating plate (10), the rotating plate (10) is provided with a liquid inlet hole (11) matched with the liquid inlet end of the filter (4), the bottom of the rotating plate (10) is fixedly provided with an elastic sealing gasket (12), the lower ends of the elastic sealing gaskets (12) are in contact with the inner cavity bottom of the hollow cylinder (5), the upper ends of the plurality of the filters (4) are flush with the inner bottom of the hollow cylinder (5), when the filter (4) is automatically replaced, the filter (10) is blocked, and when the inner cavity of the hollow cylinder (5) is not blocked, the filter (10) is automatically rotates, and the liquid inlet hole (10) is automatically rotates, and the liquid is stopped when the inner cavity (4) is blocked, and the liquid is automatically quantitatively rotates, by repeating this, the filter (4) which is blocked can be automatically replaced.
2. The circulating wafer cleaning apparatus of claim 1, wherein: the automatic replacement unit comprises a pressure-sensing driving unit (8) and a rotating unit (9), when the water pressure in the hollow cylinder (5) is increased, the pressure-sensing driving unit (8) drives the rotating unit (9) to operate under the action of water pressure, and the rotating unit is utilized to drive the selection plate (10) to rotate.
3. A circulating wafer cleaning apparatus as claimed in claim 2, wherein: the pressure sensing drive unit (8) is including installing mounting bracket (82) of rotary unit (9) top, fix on mounting bracket (82) with hollow post (81), the inner chamber of hollow post (81) is provided with sealing block (84), just wrap up on the outer wall of sealing block (84) has elastic sealing ring (85), the outer wall of elastic sealing ring (85) with the inner wall slip of hollow post (81) is contradicted, the upper end of sealing block (84) is fixed with extrusion rod (83), the lower extreme of extrusion rod (83) is located the below of mounting bracket (82), and be located the top of rotary unit (9).
4. A cyclical wafer cleaning apparatus as defined in claim 3, wherein: the rotary unit (9) comprises a cylinder body (91) arranged in a mounting hole at the axis of the rotary plate (10), the lower end of the cylinder body (91) is rotationally connected with the bottom of the inner cavity of the hollow cylinder (5), a lower pressing column (92) is arranged in the cylinder body (91) in a sliding mode, the lower pressing column (92) is fixedly connected with the bottom of the inner cavity of the hollow cylinder (5) through a spring (93), a driving rod (94) is rotationally arranged on the lower pressing column (92), and the end portion of the driving rod (94) is located in an operation groove (95) formed in the inner wall of the cylinder body (91).
5. The circulating wafer cleaning apparatus of claim 1, wherein: the liquid inlet ends of the filters (4) are connected with the bottom of the inner cavity of the hollow cylinder (5) in a threaded manner.
6. The circulating wafer cleaning apparatus of claim 1, wherein: the bottom of hollow section of thick bamboo (5) is connected with conical liquid receiving groove (7) through a plurality of connecting rods (6) that are the circumference setting, just the liquid outlet of liquid receiving groove (7) is located the top of washing tank (1), liquid receiving groove (7) upper end with be provided with between the lower extreme of hollow section of thick bamboo (5) the convenience is right filter (4) are dismantled the operating space.
7. The circulating wafer cleaning apparatus of claim 1, wherein: the filter (4) comprises a shell (41) with a liquid inlet at the upper end, a first annular filter screen (42) and a second annular filter screen (43) are installed in the inner cavity of the shell (41), the first annular filter screen (42) is located in the second annular filter screen (43), filter gauze (45) and an ion filter membrane layer (44) are arranged in the inner cavity of the first annular filter screen (42) and the inner cavity of the second annular filter screen (43) respectively, and the upper end and the lower end of the first annular filter screen (42) and the upper end and the lower end of the second annular filter screen (43) are fixedly connected with the shell (41) and a sealing plate (46) respectively.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202311624734.2A CN117619819B (en) | 2023-11-30 | 2023-11-30 | A circulating wafer cleaning equipment |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202311624734.2A CN117619819B (en) | 2023-11-30 | 2023-11-30 | A circulating wafer cleaning equipment |
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| CN117619819A true CN117619819A (en) | 2024-03-01 |
| CN117619819B CN117619819B (en) | 2025-11-18 |
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| US3445002A (en) * | 1966-09-30 | 1969-05-20 | Jacques Muller | Filter unit with automatic cleaning and automatic discharge of collected impurities |
| US4523993A (en) * | 1983-06-27 | 1985-06-18 | Resource Associates International Corp. | Precious metal recovery apparatus |
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