CN117281304A - A heater and smoking set - Google Patents
A heater and smoking set Download PDFInfo
- Publication number
- CN117281304A CN117281304A CN202210696557.8A CN202210696557A CN117281304A CN 117281304 A CN117281304 A CN 117281304A CN 202210696557 A CN202210696557 A CN 202210696557A CN 117281304 A CN117281304 A CN 117281304A
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- electrode film
- heating
- film
- heating film
- heater
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Classifications
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- A—HUMAN NECESSITIES
- A24—TOBACCO; CIGARS; CIGARETTES; SIMULATED SMOKING DEVICES; SMOKERS' REQUISITES
- A24F—SMOKERS' REQUISITES; MATCH BOXES; SIMULATED SMOKING DEVICES
- A24F40/00—Electrically operated smoking devices; Component parts thereof; Manufacture thereof; Maintenance or testing thereof; Charging means specially adapted therefor
- A24F40/40—Constructional details, e.g. connection of cartridges and battery parts
-
- A—HUMAN NECESSITIES
- A24—TOBACCO; CIGARS; CIGARETTES; SIMULATED SMOKING DEVICES; SMOKERS' REQUISITES
- A24F—SMOKERS' REQUISITES; MATCH BOXES; SIMULATED SMOKING DEVICES
- A24F40/00—Electrically operated smoking devices; Component parts thereof; Manufacture thereof; Maintenance or testing thereof; Charging means specially adapted therefor
- A24F40/40—Constructional details, e.g. connection of cartridges and battery parts
- A24F40/46—Shape or structure of electric heating means
-
- A—HUMAN NECESSITIES
- A24—TOBACCO; CIGARS; CIGARETTES; SIMULATED SMOKING DEVICES; SMOKERS' REQUISITES
- A24F—SMOKERS' REQUISITES; MATCH BOXES; SIMULATED SMOKING DEVICES
- A24F40/00—Electrically operated smoking devices; Component parts thereof; Manufacture thereof; Maintenance or testing thereof; Charging means specially adapted therefor
- A24F40/50—Control or monitoring
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- Resistance Heating (AREA)
Abstract
The application relates to a heater and smoking set, the smoking set includes the casing, and the heater is installed in the casing. The heater comprises a substrate and a heating film arranged on the substrate, the heating film can heat the aerosol forming substrate in a combined mode of infrared radiation and contact heat conduction, so that energy loss caused by overhigh infrared emissivity of the heating film in the working process is reduced, the energy utilization rate of the heating film is improved, the electric quantity of a power supply consumed by the heating film for heating the aerosol forming substrate is reduced, the usable time of the power supply is prolonged, and the cruising ability of a smoking set is further improved; meanwhile, a reflecting layer is not required to be added or a matrix made of transparent materials is not required, the structure and the processing technology of the heater are simplified, and the processing cost is reduced.
Description
Technical Field
The application relates to the technical field of smoking sets, in particular to a heater and a smoking set.
Background
The existing smoking set mainly comprises a base body, an infrared coating and a conductive layer, wherein the infrared coating and the conductive layer are coated on the outer surface of the base body, after the smoking set is electrified, infrared rays emitted by the infrared coating can penetrate through the base body and heat aerosol forming matrixes in the base body, and at least one component in the aerosol forming matrixes is volatilized to form aerosol for a user to inhale. In order to meet the requirements of heating temperature and heating efficiency of aerosol forming substrates, the infrared coating needs to have higher infrared emissivity, so that the infrared coating has higher heat loss in the use process, and the duration of the smoking set is shortened. In the prior art, the infrared reflection layer is added or the substrate is made of transparent materials to reduce the energy loss of infrared emission, but the defects of complex structure, higher cost process and the like exist in the modes.
Disclosure of Invention
The application provides a heater and smoking set, when reducing the energy loss of infrared emission, simplify the structure of heater.
A first aspect of the present application provides a heater for heating an aerosol-forming substrate and volatilizing at least one component of the aerosol-forming substrate to form an aerosol for inhalation by a user, the heater comprising a substrate and a heating film mounted to the substrate; wherein the heating film is capable of heating the aerosol-forming substrate by a combination of infrared radiation and contact heat conduction.
In one possible design, the infrared radiation heating power of the heating film is smaller than the contact heat conduction heating power.
In one possible design, the infrared emissivity of the heating film is less than 20%.
In one possible design, the heating film is made of one or more of platinum, titanium nitride, doped indium oxide and doped zinc oxide.
In one possible design, the heating film is made of tin-doped indium oxide or aluminum-doped zinc oxide.
In one possible design, the sheet resistance R of the heating film sq The requirements are as follows: r is more than or equal to 0.5 omega/sq sq Less than or equal to 15 omega/sq; and/or the thickness tR of the heating filmThe method meets the following conditions: t is more than or equal to 0.05 mu m and less than or equal to 5 mu m; and/or the resistivity ρ of the heating film is required to satisfy: 1E-7Ω & m is less than or equal to ρ and less than or equal to 1E-5Ω & m.
In one possible design, the heater further comprises an electrode membrane group electrically connected to the heating membrane, the electrode membrane group being mounted to the base body and/or to the heating membrane, and the extending direction of the electrode membrane group being parallel to the axial direction of the base body.
In one possible design, the electrode film group comprises a positive electrode film and a negative electrode film, and the positive electrode film and the negative electrode film are respectively connected with the positive electrode and the negative electrode of the power supply;
the number of the electrode film groups is one or more, and when the number of the electrode film groups is a plurality of the electrode film groups, the positive electrode films and the negative electrode films are alternately arranged along the circumferential direction of the substrate at intervals.
In one possible design, the electrode film set is made of one or more of gold, silver, platinum, titanium oxide, and thick film paste.
In one possible design, the sheet resistance of the electrode film stack is less than or equal to 0.01 Ω/sq.
In one possible design, the electrode membrane set includes a body portion extending axially along the base body, the body portion including a first body in contact with an outer surface of the heating membrane and a second body in contact with the outer surface of the base body;
one end of the second body far away from the first body is provided with a connecting part extending along the circumference of the substrate, and the electrode film group is connected with a power supply through the connecting part.
A second aspect of the present application provides a smoking article comprising a housing and a heater mounted to the housing, the heater being any of the above.
In the application, the heating film has two heating modes of infrared radiation and contact heat conduction at the same time, so that the energy loss caused by the over-high infrared emissivity of the heating film in the working process is reduced, the energy utilization rate of the heating film is improved, the electric quantity of a power supply consumed by the heating film for heating the aerosol forming substrate is reduced, the usable time of the power supply is prolonged, and the endurance capacity of a smoking set is further improved; meanwhile, a reflecting layer is not required to be added or a matrix made of transparent materials is not required, the structure and the processing technology of the heater are simplified, and the processing cost is reduced.
It is to be understood that both the foregoing general description and the following detailed description are exemplary and explanatory only and are not restrictive of the application.
Drawings
FIG. 1 is a schematic diagram of a heater provided herein;
FIG. 2 is a top view of FIG. 1, wherein the number of electrode membrane sets is one;
FIG. 3 is a top view of FIG. 1, wherein the number of electrode membrane sets is two;
FIG. 4 is a table showing the materials and operating conditions of the heater according to the embodiments of the present application.
Reference numerals:
1-a substrate;
2-heating the film;
3-electrode film group;
31-positive electrode film;
32-a negative electrode film;
33-a body portion;
331-a first body;
332-a second body;
34-connection.
The accompanying drawings, which are incorporated in and constitute a part of this specification, illustrate embodiments consistent with the application and together with the description, serve to explain the principles of the application.
Detailed Description
For a better understanding of the technical solutions of the present application, embodiments of the present application are described in detail below with reference to the accompanying drawings.
It should be understood that the described embodiments are merely some, but not all, of the embodiments of the present application. All other embodiments, based on the embodiments herein, which would be apparent to one of ordinary skill in the art without making any inventive effort, are intended to be within the scope of the present application.
The terminology used in the embodiments of the application is for the purpose of describing particular embodiments only and is not intended to be limiting of the application. As used in this application and the appended claims, the singular forms "a," "an," and "the" are intended to include the plural forms as well, unless the context clearly indicates otherwise.
It should be understood that the term "and/or" as used herein is merely one relationship describing the association of the associated objects, meaning that there may be three relationships, e.g., a and/or B, may represent: a exists alone, A and B exist together, and B exists alone. In addition, the character "/" herein generally indicates that the front and rear associated objects are an "or" relationship.
It should be noted that, the terms "upper", "lower", "left", "right", and the like in the embodiments of the present application are described in terms of the angles shown in the drawings, and should not be construed as limiting the embodiments of the present application. In the context of this document, it will also be understood that when an element is referred to as being "on" or "under" another element, it can be directly on the other element or be indirectly on the other element through intervening elements.
The application provides a smoking set, this smoking set includes the casing and installs in the heater of casing, and the heater is connected with the power. When the smoking set is in an operating state, the heater is capable of heating the aerosol-forming substrate disposed within the housing such that at least one component of the aerosol-forming substrate volatilizes into an aerosol for inhalation by a user.
Specifically, as shown in fig. 1, the heater includes a base 1, a heating film 2 mounted on the base 1, and an electrode film group 3 mounted on the base 1 and/or on the heating film 2, and the heating film 2 is electrically connected to a power supply through the electrode film group 3. Wherein, in order to facilitate the installation of heating film 2 and electrode membrane group 3, heating film 2 sets up in the surface of base member 1, and electrode membrane group 3 sets up in the surface of base member 1 and/or the surface of heating film 2.
In the operation process of the heater, the heating film 2 is connected with a power supply through the electrode film group 3, so that the heating film 2 is electrified and generates heat, and the electrode film 2 directly heats the aerosol-forming substrate through the heat generated by the electrode film group 3 so as to promote the decomposition of the aerosol-forming substrate. Meanwhile, the heating film 2 can generate infrared light after being energized, and the infrared light can penetrate the substrate 1 and heat the aerosol-forming substrate in the substrate 1 to promote the decomposition of the aerosol-forming substrate.
In this application, heating film 2 heats aerosol formation matrix through infrared radiation heating and contact heat conduction's combined mode, when guaranteeing heating film 2's heating efficiency, reduced heating film 2 because the loss of the too high energy that leads to of infrared emittance in the course of the work to promoted the utilization ratio of heating film 2 energy, reduced the electric quantity of the power that heating film 2 heated aerosol formation matrix consumed, thereby promoted the live time of power, and then promoted the duration of smoking set. Meanwhile, compared with the mode of adding a reflecting layer or selecting a transparent substrate 1 in the prior art, the heater is simpler in structure, so that the processing technology of the heater is simplified, and the processing cost of the heater is reduced.
The infrared radiation heating power of the heating film 2 is smaller than the contact heat conduction heating power, the heating efficiency of the heating film 2 is met, meanwhile, the energy loss of infrared radiation of the heating film 2 is further reduced, the energy utilization rate of the heating film 2 is improved, meanwhile, the electric quantity of a power supply consumed by the heating film 2 for heating the aerosol forming substrate is reduced, the usable time of the power supply is prolonged, and the cruising ability of a smoking set is improved.
Preferably, the infrared emissivity of the heating film 2 is less than 20%, and in order to satisfy the infrared emissivity of the heating film 2 being less than 20%, the heating film 2 may be made of several materials with low resistivity, which specifically include: one of a metal, an alloy, a conductive nitride, a conductive oxide; or one or more of platinum, titanium nitride, doped indium oxide and doped zinc oxide; alternatively, tin-doped indium oxide (ITO) or aluminum-doped zinc oxide (AZO).
The mixing mode and mixing proportion of various materials are not particularly limited, and the materials can be flexibly blended according to actual production requirements and use requirements, so that the flexibility of selecting the materials of the heating film 2 is improved, and the purposes of reducing the production cost of the heating film 2 and simplifying the manufacturing process of the heating film 2 are achieved.
Preferably, the mixing ratio of tin-doped indium oxide (ITO) is 90% of indium oxide (In 2 O 3 ) And 10% tin oxide (SnO 2 ) The mixing ratio of aluminum-doped zinc oxide (AZO) is 95% zinc oxide (ZnO) and 5% aluminum oxide (Al 2 O 3 ) The resistivity of the heating film 2 can be reduced to reduce the energy consumption of the heating film 2, and at the same time, the infrared emissivity of the heating film 2 can be reduced to reduce the energy consumption in the heating process of the heating film 2. Therefore, indium oxide (In) having a mixing ratio of 90% of tin-doped indium oxide (ITO) 2 O 3 ) And 10% tin oxide (SnO 2 ) The mixing ratio of aluminum-doped zinc oxide (AZO) is 95% zinc oxide (ZnO) and 5% aluminum oxide (Al 2 O 3 ) The energy consumption and the energy loss of the heating film 2 can be reduced at the same time, and the usability of the heating film 2 can be improved.
Wherein the sheet resistance R of the heating film 2 sq The requirements are as follows: r is more than or equal to 0.5 omega/sq sq ≤15Ω/sq。
In the present embodiment, if the sheet resistance R of the heating film 2 sq Less than 0.5 omega/sq, which results in an increase in the processing accuracy of the heating film 2, thereby improving the processing cost of the heating film 2; if the sheet resistance R of the heating film 2 sq Greater than 15 Ω/sq results in a greater infrared emissivity of the heating film 2, thereby increasing the energy loss during operation of the heating film 2. Thus, 0.5. OMEGA/. Ltoreq.R sq The energy consumption of the heating film 2 can be reduced and the processing cost of the heating film 2 can be reduced at the same time by less than or equal to 15 omega/sq.
Specifically, the thickness t of the heating film 2 needs to satisfy: t is more than or equal to 0.05 mu m and less than or equal to 5 mu m.
According to the square resistance R sq Calculation formula R sq It is known that when the material of the heating film 2 is determined, the resistivity of the heating film 2 is constant, and at this time, the square resistance of the heating film 2 is 0.5 Ω/sq.ltoreq.R sq And the thickness t of the heating film 2 is less than or equal to 15 omega/sq, and the thickness t of the heating film is required to satisfy the following conditions: t is more than or equal to 0.05 mu m and less than or equal to 5 mu m, and the square resistance of the heating film 2 is prevented from being too small or too large due to the fact that the heating film 2 is too thick or too thin. Thus, t.ltoreq.0.05. Mu.m.ltoreq.5. Mu.mm, the space occupied by the installation of the heating film 2 can be reduced, so that the installation space of a heater is reduced, the size of a smoking set is further reduced, and the use experience of a user is improved; meanwhile, the square resistance of the heating film 2 can be facilitated to meet the requirements, so that the working performance and the working stability of the heating film 2 are improved.
Further, the resistivity ρ of the heating film 2 needs to satisfy: 1E-7Ω & m is less than or equal to ρ and less than or equal to 1E-5Ω & m.
According to the square resistance R sq Calculation formula R sq As is known from =ρ/t, when the thickness of the heating film 2 is limited to a constant value by the installation space, in order to satisfy the sheet resistance of the heating film 2 of 0.5 Ω/sq.ltoreq.r sq And if the resistivity rho of the heating film 2 is less than or equal to 15 omega/sq, the resistivity rho of the heating film 2 needs to satisfy the following conditions: 1E-7Ω & m is less than or equal to ρ is less than or equal to 1E-5Ω & m, and the square resistance of the heating film 2 is prevented from being too small or too large due to the fact that the heating film 2 is too thick or too thin. Therefore, 1E-7Ω.m is less than or equal to ρ and less than or equal to 1E-5Ω.m, which can facilitate the selection of the material of the heating film 2 and increase the selection range and the selection flexibility of the material of the heating film 2; meanwhile, the square resistance of the heating film 2 can be facilitated to meet the requirements, so that the working performance and the working stability of the heating film 2 are improved.
As shown in fig. 1 to 3, the electrode film group 3 is composed of a positive electrode film 31 and a negative electrode film 32, and the structure of the positive electrode film 31 is the same as that of the negative electrode film 32, and taking the positive electrode film 31 as an example, as shown in fig. 1, the positive electrode film 31 includes a body portion 33 extending along the axial direction of the substrate 1, a first body 331 of the body portion 33 is attached to the outer surface of the heating film 2, a second body 332 of the body portion 33 is attached to the outer surface of the substrate 1, one end of the second body 332, far from the first body 331, is provided with a connecting portion 34 extending along the circumferential direction of the substrate 1, and the positive electrode film 31 is connected with a power supply through the connecting portion 34, so that the connectable area of the positive electrode film 31 is increased, the connection stability of the positive electrode film 31 and the power supply is further increased, and the working stability of the positive electrode film 31 is improved. Specifically, the projected shape of the positive electrode film 31 in the direction perpendicular to the outer surface of the substrate 1 may be L-shaped, or the like, and the specific structure and shape of the positive electrode film 31 are not particularly limited in this application.
When the number of the electrode film groups 3 is one, as shown in fig. 2, the positive electrode films 31 and the negative electrode films 32 are uniformly distributed on two sides of the substrate 1 along the circumferential direction of the substrate 1, and the heating film 2 is divided into two parts connected in parallel by the positive electrode films 31 and the negative electrode films 32. When the number of electrode film groups 3 is plural, taking the number of electrode film groups 3 as two as an example, as shown in fig. 3, the positive electrode films 31 and the negative electrode films 32 are alternately arranged at intervals in the circumferential direction of the base 1, and the positive electrode films 31 and the negative electrode films 32 are uniformly distributed in the axial direction of the base 1, at this time, the heating film 2 is divided into four parts connected in parallel to each other by the two positive electrode films 31 and the two negative electrode films 32. Wherein, the positive electrode film 31 and the negative electrode film 32 are uniformly distributed, so that the heat generated between the parts of the heating films 2 which are mutually connected in parallel is the same, thereby enabling the heater to uniformly heat the aerosol-forming substrate, and further improving the working performance of the heater.
In addition, the material of the positive electrode film 31 may be one of gold (Au), silver (Ag), platinum (Pt), titanium oxide, and thick film paste, the material of the negative electrode film 32 may be one of gold (Au), silver (Ag), platinum (Pt), titanium oxide, and thick film paste, and the material of the positive electrode film 31 may be the same as or different from the material of the negative electrode film 32, so as to increase the flexibility of the materials of the positive electrode film 31 and the negative electrode film 32, thereby facilitating replacement of the damaged positive electrode film 31 and negative electrode film 32. Meanwhile, the sheet resistances of the positive electrode film 31 and the negative electrode film 32 are required to be 0.01 Ω/sq or less to reduce the infrared emissivity of the positive electrode film 31 and the negative electrode film 32, thereby further reducing the energy loss of the heater.
Because electrode film group 3 and heating film 2 are electrically conductive material, consequently, matrix 1 need adopt insulating material to make, avoids matrix 1 electrode film group 3 intercommunication to lead to heating film 2 short circuit to the stability of heating film 2 work has been promoted, and then the job stabilization nature of heater has been promoted.
Specifically, the material of the substrate 1 includes, but is not limited to, glass, ceramic, and the like. The substrate 1 can also be made of metal materials, and when the substrate 1 is made of metal, insulating layers are arranged between the substrate 1 and the heating film 2 and between the substrate 1 and the electrode film group 3, so that the substrate 1 is prevented from shorting the heating film 2.
Wherein, the material of base member 1 can select for use the transparent material of non-infrared such as aluminium oxide, zirconia, metal, after the infrared ray that heating film 2 produced penetrated into base member 1, reduced the inside infrared ray of base member 1 and penetrated the risk that base member 1 was radiated to the outside of base member 1 to promoted the inside infrared ray's of base member 1 utilization ratio, under the condition that satisfies the infrared radiation heating demand, reduced the infrared emissivity of heating film 2.
Furthermore, the roughness of the inner surface of the substrate 1 is less than or equal to 0.16 μm and/or the roughness of the outer surface of the substrate 1 is less than or equal to 0.16 μm, i.e. the inner and/or outer surface of the substrate 1 is a mirror effect.
In the present embodiment, if the surface roughness of the substrate 1 is large (including the inner surface and the outer surface), the reflectance of the infrared light emitted from the heating film 2 on the surface of the substrate 1 is large. Therefore, the surface roughness of the substrate 1 is less than or equal to 0.16 μm, and the reflectivity of the infrared light generated by the heating film 2 on the surface of the substrate 1 can be reduced, so that the utilization rate of the infrared light emitted by the heating film 2 is improved, and the infrared emissivity of the heating film 2 is reduced under the condition that the infrared radiation heating requirement is met.
The following is an example of the selection of the material of the substrate 1, the material of the heating film 2, and the material of the electrode film set 3, and is shown in the table of fig. 4:
in the first embodiment, a high borosilicate glass is used as the substrate 1, a Pt film is coated on the outer surface of the substrate 1 to form a heating film 2, and at this time, the thickness t=0.05 μm of the heating film 2 is equal to the square resistance R sq =2Ω/sq, infrared emissivity of 3.2%, tiN plating was performed on the outer surface of the heating film 2 in a direction parallel to the axis of the substrate 1 to form the positive electrode film 31 and the negative electrode film 32, and at this time, the sheet resistance of the positive electrode film 31 and the negative electrode film 32 was 0.008 Ω/sq. Wherein the number of the electrode film groups 3 is 1.
In this embodiment, the resistance of the heater is 0.71 Ω, 3.7V is applied to the positive electrode film 31 and the electrode film, the stable temperature field is uniformly distributed, the temperature difference between the two parallel parts of the heating film 2 is less than 5 ℃, and the highest temperature can reach 262 ℃.
In the second embodiment, an aluminum tube is selected as the substrate 1, an insulating layer is arranged on the outer surface of the aluminum tube, a TiN film is plated on the outer surface of the insulating layer to form a heating film 2, and at the moment, the thickness t=0.1 μm of the heating film 2 is equal to the square resistance R sq =4.2 Ω/sq, redThe external emissivity was 15.5%, and Au was plated on the outer surface of the heating film 2 in a direction parallel to the axis of the substrate 1 to form the positive electrode film 31 and the negative electrode film 32, and at this time, the sheet resistance of the positive electrode film 31 and the negative electrode film 32 was 0.01 Ω/sq. Wherein the number of the electrode film groups 3 is 1.
In this embodiment, the resistance of the heater is 1.5 Ω, a voltage of 6V is applied to the positive electrode film 31 and the electrode film, the temperature field after stabilization is uniformly distributed, the temperature difference between the two parallel parts of the heating film 2 is less than 5 ℃, and the maximum temperature can reach 325 ℃.
In the third embodiment, the substrate 1 is made of quartz glass, and the AZO film is coated on the outer surface of the substrate 1 to form the heating film 2, wherein the thickness t=5μm of the heating film 2 is the square resistor R sq The external surface of the heating film 2 was Ag-plated in a direction parallel to the axis of the substrate 1 to form a positive electrode film 31 and a negative electrode film 32, and at this time, the sheet resistance of the positive electrode film 31 and the negative electrode film 32 was 0.002 Ω/sq. Wherein the number of the electrode film groups 3 is 1.
In this embodiment, the resistance of the heater is 0.35 Ω, a voltage of 3V is applied to the positive electrode film 31 and the electrode film, the temperature field after stabilization is uniformly distributed, the temperature difference between the two parallel parts of the heating film 2 is less than 5 ℃, and the maximum temperature can reach 302 ℃.
In the fourth embodiment, the substrate 1 is made of alumina, and the ITO film is coated on the outer surface of the substrate 1 to form the heating film 2, and at this time, the thickness t=1.5 μm of the heating film 2, the sheet resistance R sq =2.3 Ω/sq, infrared emissivity of 4.8%, and Ag plating was performed on the outer surface of the heating film 2 in a direction parallel to the axis of the substrate 1 to form the positive electrode film 31 and the negative electrode film 32, and at this time, the sheet resistance of the positive electrode film 31 and the negative electrode film 32 was 0.002 Ω/sq. Wherein the number of the electrode film groups 3 is 1.
In this embodiment, the resistance of the heater is 0.81 Ω, a voltage of 4V is applied to the positive electrode film 31 and the electrode film, the temperature field after stabilization is uniformly distributed, the temperature difference between the two parallel parts of the heating film 2 is less than 5 ℃, and the highest temperature can reach 284 ℃.
In the fifth embodiment, zirconia is used as the substrate 1, and an ITO film is coated on the outer surface of the substrate 1 to form a heating film 2, wherein the thickness t=0.5 μm of the heating film 2 is the square resistor R sq The external surface of the heating film 2 was Ag-plated in a direction parallel to the axis of the substrate 1 to form a positive electrode film 31 and a negative electrode film 32, and at this time, the square resistance of the positive electrode film 31 and the negative electrode film 32 was 0.002 Ω/sq. Wherein the number of the electrode film groups 3 is 2.
In this embodiment, the resistance of the heater is 0.68Ω, 3.7V is applied to the positive electrode film 31 and the electrode film, the stable temperature field is uniformly distributed, the temperature difference between the two parallel parts of the heating film 2 is less than 5 ℃, and the highest temperature can reach 278 ℃.
The foregoing description is only of the preferred embodiments of the present application and is not intended to limit the same, but rather, various modifications and variations may be made by those skilled in the art. Any modification, equivalent replacement, improvement, etc. made within the spirit and principles of the present application should be included in the protection scope of the present application.
Claims (13)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202210696557.8A CN117281304A (en) | 2022-06-20 | 2022-06-20 | A heater and smoking set |
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| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202210696557.8A CN117281304A (en) | 2022-06-20 | 2022-06-20 | A heater and smoking set |
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| CN117281304A true CN117281304A (en) | 2023-12-26 |
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| CN202210696557.8A Pending CN117281304A (en) | 2022-06-20 | 2022-06-20 | A heater and smoking set |
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| WO2021143874A1 (en) * | 2020-01-17 | 2021-07-22 | 深圳市合元科技有限公司 | Heating device |
| CN113749298A (en) * | 2020-06-01 | 2021-12-07 | 深圳市合元科技有限公司 | Heater and aerosol generating device |
| CN218219099U (en) * | 2022-06-20 | 2023-01-06 | 深圳市卓力能技术有限公司 | Heater and smoking set |
-
2022
- 2022-06-20 CN CN202210696557.8A patent/CN117281304A/en active Pending
Patent Citations (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2008037671A (en) * | 2006-08-02 | 2008-02-21 | Asahi Glass Co Ltd | Glass plate with infrared shielding film |
| US20140017849A1 (en) * | 2011-03-24 | 2014-01-16 | Sanyo Electric Co., Ltd. | Method for producing transparent conductive film and method for manufacturing solar cell |
| CN113080521A (en) * | 2019-12-23 | 2021-07-09 | 深圳市合元科技有限公司 | Heater and smoking set comprising same |
| WO2021143874A1 (en) * | 2020-01-17 | 2021-07-22 | 深圳市合元科技有限公司 | Heating device |
| CN113749298A (en) * | 2020-06-01 | 2021-12-07 | 深圳市合元科技有限公司 | Heater and aerosol generating device |
| CN113040432A (en) * | 2021-04-19 | 2021-06-29 | 杭州莱维光电技术有限公司 | Electronic cigarette lighter and manufacturing method thereof |
| CN218219099U (en) * | 2022-06-20 | 2023-01-06 | 深圳市卓力能技术有限公司 | Heater and smoking set |
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