CN116984619A - Centrifugal atomizer and use method thereof - Google Patents

Abstract

This application relates to the field of additive manufacturing technology. Specifically, it relates to a centrifugal atomizer and a method of use. The working electrode is moved above the centrifugal turntable through a moving device, so that the working electrode extends into the alloy melt liquid film and interacts with it. There is a gap on the surface of the centrifugal turntable, then keep the working electrode fixed and turn on the external power supply. The graphite electrode, alloy melt and external power supply form a complete loop, which can charge the alloy melt and thereby reduce the surface tension of the alloy melt. Since the centrifugal turntable rotates relative to the working electrode, the working electrode can destroy the oxide film that may exist on the surface of the alloy melt liquid film, and can also increase the fluctuation level of the alloy melt liquid film, making the atomization effect better.

Description

A centrifugal atomizer and method of use

Technical field

The present application relates to the field of additive manufacturing technology, specifically, to a centrifugal atomizer and a method of use.

Background technique

In the process of producing metal powder using a centrifugal atomizer, the metal melt first flows into the surface of the turntable to form a liquid film, and then the metal melt breaks up at the edge of the turntable to form atomized droplets. Among them, by enhancing the strength of the metal melt on the turntable Fluctuating and reducing the surface tension of the metal melt helps to reduce the particle size of the atomized droplets. Especially when the turntable centrifugal atomization process is used for the production of metal powder raw materials for additive manufacturing, the temperature of the high-temperature alloy melt is not only high, but also many alloy melts The metal itself or some of its components are corrosive to metal materials. For example, aluminum alloys and titanium alloys will corrode most metal materials. Therefore, many alloy melts cannot use metal materials as turntables for centrifugal atomization operations. Therefore, when the turntable centrifugal atomization process is used for centrifugal atomization of corrosive high-temperature metal melts such as aluminum alloys and titanium alloys, in order to prevent the turntable material from contaminating the alloy melt and the turntable body from cracking, the centrifugal turntable is usually made of graphite or ceramic materials. ; The turntable in the existing technology CN112620642A is electrified. If it is used to produce aluminum alloy and titanium alloy powder, the turntable can be made of graphite, but the structural strength is low and fragile, and electrode brushes or wires need to be used to directly contact the turntable. Yes, it is impossible to form a closed circuit through which current flows without contact, but the turntable rotates at ultra-high speed. Once the electrode brush comes into contact with the turntable body or the driver, the turntable will easily become unbalanced, vibrate greatly, and even directly break. Moreover, although the solution in the comparison document can reduce the surface tension of the metal melt to a certain extent, it cannot enhance the fluctuation of the metal melt on the turntable, nor can it destroy the possible oxide layer on the surface of the metal melt, and its atomization effect is relatively poor. Difference.

There is currently no effective technical solution to the above problems.

Contents of the invention

The purpose of this application is to provide a centrifugal atomizer and a method of use, which can effectively reduce the surface tension of the melt, while enhancing the fluctuation level of the alloy melt liquid film on the centrifugal turntable, and also destroying the oxide layer that may exist on the surface of the alloy melt. .

This application provides a centrifugal atomizer, which includes a spray chamber, a centrifugal turntable, a driving device, at least two working electrodes, a moving device and an external power supply; the centrifugal turntable, the driving device, the working electrode and the mobile device is arranged in the atomization chamber;

The centrifugal turntable is connected to the driving device. The driving device is used to drive the centrifugal turntable to rotate. The centrifugal turntable is used to drive the alloy melt flowing onto the centrifugal turntable to perform centrifugal motion for atomization;

Each of the working electrodes is respectively fixed on the moving device and is evenly spaced around the central axis of the centrifugal turntable. The moving device is used to move the working electrode above the centrifugal turntable so that the working electrode The electrode extends into the alloy melt and has a gap with the surface of the centrifugal turntable. The positive electrode of the external power supply is disposed above the centrifugal turntable and is used to connect to the alloy melt. The negative electrode of the external power supply Connect to the working electrode.

Through the above settings, this application can effectively reduce the surface tension of the melt, simultaneously enhance the fluctuation level of the alloy melt on the centrifugal turntable, and also destroy the oxide layer that may exist on the surface of the alloy melt.

Optionally, the working electrode has a first distance from the central axis of the centrifugal turntable, and the first distance satisfies the following relationship:

;

In the formula, is the first distance, and R is the radius of the centrifugal turntable.

By setting the first distance, the working electrode can enhance the fluctuation level of the alloy melt liquid film, and can also directly destroy the oxide film on the surface of the alloy melt liquid film, thereby making the atomization effect better.

Optionally, the gap satisfies the following relationship:

;

In the formula, is the height of the gap,/> is a first thickness, which is the thickness of the alloy melt at a first distance between the working electrode and the central axis of the centrifugal turntable.

By setting the gap, a safe distance between the working electrode and the centrifugal turntable can be ensured, and accidents such as collision between the working electrode and the centrifugal turntable can be avoided.

Optionally, the first thickness is calculated according to the following formula:

;

In the formula, is the density of the alloy melt, q is the flow rate of the alloy melt flowing into the centrifugal turntable per unit time,/> is the dynamic viscosity of the alloy melt,/> is the angular velocity of the centrifugal turntable,/> is pi.

Optionally, the moving device includes a servo motor, a fixing mechanism, a feeding mechanism and a clamping mechanism. The fixing mechanism is connected to the top wall of the atomization chamber, and the servo motor is hooked to the feeding mechanism. On the fixing mechanism, the clamping mechanism is provided at the output end of the feeding mechanism. The clamping mechanism is provided with a chuck corresponding to the working electrode. The chuck is used to clamp Holding the working electrode, the servo motor is used to drive the feeding mechanism to move the working electrode on the chuck close to or away from the centrifugal turntable.

Optionally, the working electrode is a graphite electrode.

Optionally, the centrifugal turntable is provided with an annular groove, the opening of the annular groove faces the working electrode, and the depth of the annular groove does not exceed 0.5 mm and is less than 5 times the thickness of the centrifugal turntable. %.

Optionally, the width of the working electrode does not exceed 3 mm, the width of the annular groove is at least 2 mm larger than the width of the working electrode, and the width of the annular groove is 2.5 mm-6 mm.

Optionally, the end of the working electrode is flush with the upper surface of the centrifugal turntable.

In a second aspect, this application provides a method of using a centrifugal atomizer. The method of use includes:

S1. Start the driving device to make the rotation speed of the centrifugal turntable meet the requirements of the atomization process;

S2. Move the working electrode to a designated position in the alloy melt through the moving device;

S3. Pour the alloy melt into the centrifugal turntable;

S4. Turn on the external power supply;

S5. After atomization is completed, turn off the external power supply, move the working electrode away from the centrifugal turntable through the moving device, and turn off the driving device.

Beneficial effects: This application provides a centrifugal atomizer and a method of use. The working electrode is moved above the centrifugal turntable through a moving device, so that the working electrode extends into the alloy melt liquid film and has a gap with the surface of the centrifugal turntable, and then Keep the working electrode stationary and turn on the external power supply. The graphite electrode, alloy melt and external power supply form a complete circuit, which can charge the alloy melt and thereby reduce the surface tension of the alloy melt. As the centrifugal turntable rotates relative to the working electrode , the working electrode can destroy the oxide film that may exist on the surface of the alloy melt liquid film, and can also increase the fluctuation level of the alloy melt liquid film, making the atomization effect better.

Description of drawings

Figure 1 is a schematic diagram of the overall structure of the centrifugal atomizer provided by this application.

Figure 2 is a partial structural schematic diagram of the centrifugal atomizer provided by this application.

Figure 3 is a schematic diagram of the positional relationship between the annular groove and the working electrode provided by this application.

Figure 4 is a schematic flow chart of the use method of the centrifugal atomizer provided by this application.

Label description: 11. Centrifugal turntable; 12. Driving device; 13. Working electrode; 14. External power supply; 15. Alloy melt; 16. Gap; 21. Servo motor; 22. Fixing mechanism; 23. Feeding mechanism; 24 , clamping mechanism; 31. annular groove.

Detailed ways

The technical solutions in the embodiments of the present application will be clearly and completely described below with reference to the accompanying drawings in the embodiments of the present application. Obviously, the described embodiments are only some of the embodiments of the present application, rather than all of the embodiments. The components of the embodiments of the present application generally described and illustrated in the figures herein may be arranged and designed in a variety of different configurations. Accordingly, the following detailed description of the embodiments of the application provided in the appended drawings is not intended to limit the scope of the claimed application, but rather to represent selected embodiments of the application. Based on the embodiments of this application, all other embodiments obtained by those skilled in the art without any creative work shall fall within the scope of protection of this application.

It should be noted that similar reference numerals and letters represent similar items in the following figures, therefore, once an item is defined in one figure, it does not need further definition and explanation in subsequent figures. Meanwhile, in the description of the present application, the terms "first", "second", etc. are only used to differentiate the description and cannot be understood as indicating or implying relative importance.

Please refer to Figures 1-4. Figure 1 is a schematic diagram of the overall structure of a centrifugal atomizer in an embodiment of the present application, which effectively reduces the surface tension of the alloy melt 15 and at the same time enhances the liquid film of the alloy melt 15 on the centrifugal turntable. The level of fluctuation can also destroy the oxide layer that may exist on the surface of the alloy melt 15 .

This application provides a centrifugal atomizer, which includes a spray chamber, a centrifugal turntable 11, a driving device 12, at least two working electrodes 13, a moving device and an external power supply 14; the centrifugal turntable 11, the driving device 12, the working electrode 13 and the mobile device are set up in the atomization chamber;

The centrifugal turntable 11 is connected to the driving device 12. The driving device 12 is used to drive the centrifugal turntable 11 to rotate. The centrifugal turntable 11 is used to drive the alloy melt 15 flowing onto the centrifugal turntable 11 to perform centrifugal motion for atomization;

Each working electrode 13 is respectively fixed on a moving device and is evenly spaced around the central axis of the centrifugal turntable 11. The moving device is used to move the working electrode 13 above the centrifugal turntable 11 so that the working electrode 13 extends into the alloy melt 15 and There is a gap 16 with the surface of the centrifugal turntable 11 . The positive electrode of the external power supply 14 is arranged above the centrifugal turntable 11 and is used to connect to the alloy melt 15 . The negative electrode of the external power supply 14 is connected to the working electrode 13 .

Among them, the external power supply 14 is a DC power supply, and its voltage does not exceed the pressure limit of the human body to prevent harm to personnel. The specific voltage can be determined according to the type of alloy, and there is no specific limit here; in addition, the external power supply 14 is connected to the alloy melt 15 The methods include: one is to place the positive electrode of the external power supply 14 directly in the alloy melt 15, such as placing it in the alloy melt 15 in the tundish or the guide tube; the other is that the guide tube is made of graphite material, which can Connect the positive electrode of the external power supply 14 to the draft tube to charge the alloy melt 15 in direct contact with the draft tube; in this application, two working electrodes 13 are preferably provided, and the two working electrodes 13 revolve around the centrifugal turntable 11 The central axes are evenly spaced, which can make the electric field formed in the alloy melt 15 more uniform. The specific number of working electrodes 13 can be set according to actual needs; the driving device 12 is an existing technology and is not specifically limited here.

Specifically, as shown in Figure 1, after the centrifugal turntable 11 reaches the rated rotation speed, the working electrode 13 is moved above the centrifugal turntable 11 through the moving device, so that the working electrode 13 extends into the liquid film of the alloy melt 15 and is in contact with the centrifugal turntable. There is a gap 16 on the surface of 11, and then the working electrode 13 is kept fixed. A complete circuit is formed by the working electrode 13, the alloy melt 15 and the external power supply 14, which can charge the alloy melt 15, thereby reducing the power of the alloy melt 15. Surface tension, since the centrifugal turntable 11 rotates relative to the working electrode 13, the working electrode 13 can destroy the oxide film that may exist on the surface of the liquid film of the alloy melt 15, and can also increase the fluctuation level of the liquid film of the alloy melt 15, thereby causing mist The effect is better.

Among them, reducing the surface tension of the alloy melt 15, destroying the oxide film that may exist on the surface of the liquid film of the alloy melt 15, and increasing the fluctuation level of the liquid film of the alloy melt 15 all have a positive effect on improving the atomization effect.

In some embodiments, the working electrode 13 has a first distance from the central axis of the centrifugal turntable 11 , and the first distance satisfies the following relationship:

;

In the formula, is the first distance, and R is the radius of the centrifugal turntable 11 .

Specifically, by setting the first distance, the working electrode 13 can enhance the fluctuation level of the liquid film of the alloy melt 15, and can also directly destroy the oxide film on the surface of the liquid film of the alloy melt 15, thereby making the atomization effect better.

In some embodiments, gap 16 satisfies the following relationship:

;

In the formula, is the height of the gap 16 (that is, the straight-line distance between the end of the working electrode 13 and the upper surface of the centrifugal turntable 11),/> is the first thickness, and the first thickness is the thickness of the alloy melt 15 at the first distance between the working electrode 13 and the central axis of the centrifugal turntable 11 .

Specifically, by setting the gap 16 , a safe distance between the working electrode 13 and the centrifugal turntable 11 can be ensured, and accidents such as collision between the working electrode 13 and the centrifugal turntable 11 can be avoided.

In some embodiments, the first thickness is calculated according to the following formula:

;

In the formula, is the density of the alloy melt 15, q is the flow rate of the alloy melt 15 flowing into the centrifugal turntable 11 per unit time,/> is the dynamic viscosity of alloy melt 15,/> is the angular velocity of the centrifugal turntable 11,/> is pi.

Specifically, the calculation formula of the first thickness is derived by the following process, specifically:

At a distance r from the center of the centrifugal turntable 11, the velocity of the alloy melt 15 along the thickness direction It conforms to the following relationship:

(Formula 1);

In the formula, is the velocity of alloy melt 15 along the thickness direction,/> is the partial derivative of the velocity of the alloy melt 15 along the thickness direction, z is the height r along the thickness direction of the alloy melt 15 from the center of the centrifugal turntable 11,/> is the density of alloy melt 15,/> is the dynamic viscosity of alloy melt 15,/> is the angular velocity of the centrifugal turntable 11;

The alloy melt 15 close to the surface of the centrifugal turntable 11 has no slip relative to the surface of the centrifugal turntable 11, and the boundary conditions are z=0, u=0; the height h of the upper surface of the alloy melt 15 (h is the alloy melt here) thickness of the body 15), where the upper surface of the alloy melt 15 is in contact with the inert gas, and the boundary condition is:

(Formula 2);

It can be obtained that at any r distance from the center of the centrifugal turntable 11, the velocity distribution of the alloy melt 15 along its thickness direction is:

(Formula 3);

According to the conservation of mass, the flow rate of the alloy melt 15 flowing to the surface of the centrifugal turntable 11 can be expressed as:

(Formula 4);

In the formula, q is the flow rate of atomized alloy melt per unit time, which is determined by the atomization process and is an existing technology.

According to Formula 1-4, the thickness h of the alloy melt 15 at a distance r from the center of the centrifugal turntable 11 can be obtained as:

(Formula 5);

In order to simultaneously charge the alloy melt 15, enhance the fluctuation level of the alloy melt 15, and directly destroy the oxide film on the liquid film surface of the alloy melt 15, there is a suitable distance X between the graphite electrode and the center of the centrifugal turntable 11, According to Formula 5, the thickness of the alloy melt 15 at the distance X from the center of the centrifugal turntable 11 is:

(Formula 6).

In some embodiments, the moving device includes a servo motor 21, a fixing mechanism 22, a feeding mechanism 23 and a clamping mechanism 24. The fixing mechanism 22 is connected to the top wall of the atomization chamber, and the servo motor 21 and the feeding mechanism 23 are hooked on On the fixing mechanism 22, the clamping mechanism 24 is provided at the output end of the feeding mechanism 23. The clamping mechanism 24 is provided with a chuck corresponding to the working electrode 13. The chuck is used to clamp the working electrode 13. The servo motor 21 It is used to drive the feeding mechanism 23 to move to drive the working electrode 13 on the chuck close to or away from the centrifugal turntable 11 .

Wherein, the clamping mechanism 24 and the chuck are both made of insulating materials.

Specifically, as shown in Figure 1, a fixing mechanism 22 is provided to connect to the top wall of the atomization chamber. The servo motor 21 and the feeding mechanism 23 are hooked on the fixing mechanism 22. The servo motor 21 rotates to drive the feeding mechanism 23 to press. The preset step length (can be set according to actual needs) movement drives the working electrode 13 on the chuck close to the centrifugal turntable 11 until it reaches the specified position. The initial position of the working electrode 13 to the position of the centrifugal turntable 11 can be set in advance. Well, there are no specific restrictions here. In actual use, the working electrode 13 can reach the designated position by directly controlling the number of rotations of the servo motor 21. After the atomization work is completed, the servo motor 21 drives the feeding mechanism 23. The working electrode 13 on the chuck moves away from the centrifugal turntable 11 to the initial position.

In some embodiments, working electrode 13 is a graphite electrode.

Specifically, since electrodes made of general metal materials cannot be used in highly corrosive melts such as aluminum alloys, if the alloy melt 15 is not highly corrosive, electrodes made of refractory metals or high-temperature metals can be used. In this case, In the application, the working electrode 13 is preferably a graphite electrode, and graphite can be used in most alloy melts 15 .

In some embodiments, the centrifuge turntable 11 is provided with an annular groove 31 , the opening of the annular groove 31 faces the working electrode 13 , and the depth d of the annular groove 31 does not exceed 0.5 mm and is less than 5% of the thickness of the centrifuge turntable 11 .

Specifically, when the atomization process of the centrifugal turntable 11 is used for the production of metal powder raw materials for additive manufacturing, the powder particle size is usually less than 150 μm. For example, the powder particle size range required for the SLM process is 15 μm-53 μm. At this time, the centrifugal turntable 11 The thickness of the alloy melt 15 on the surface will be reduced to less than 100 μm, which brings certain difficulties to the precise positioning of the working electrode 13. Therefore, as shown in Figures 2 and 3, an annular groove 31 is provided on the centrifugal turntable 11. And the opening of the annular groove 31 is facing the working electrode 13, so there is no need to accurately calculate the gap 16 between the working electrode 13 and the upper surface of the centrifugal turntable 11. By limiting the depth of the annular groove 31, the centrifugal turntable 11 is prevented from operating at high speed. During rotation, stress concentration occurs at the position of the annular groove 31 and it is broken.

Wherein, the cross section of the annular groove 31 may be rectangular, trapezoidal, semi-elliptical or semi-circular.

In some embodiments, the width of the working electrode 13 does not exceed 3 mm, the width of the annular groove 31 is at least 2 mm larger than the width of the working electrode 13 , and the width of the annular groove 31 is 2.5 mm-6 mm.

Specifically, by setting the width c of the annular groove 31 to be at least 2 mm larger than the width b of the working electrode 13 , as shown in FIG. 3 , the positioning accuracy requirements of the working electrode 13 can be reduced, and at the same time, the working electrode 13 can be prevented from contacting the centrifugal turntable 11 Collision.

In some embodiments, the end of the working electrode 13 is flush with the upper surface of the centrifuge turntable 11 .

Specifically, in order to facilitate positioning, the end of the working electrode 13 is directly flush with the upper surface of the centrifugal turntable 11 (the dotted line position on the annular groove 31 in Figure 3), thereby eliminating the need for precise positioning and reducing the cost of use; in practical applications , the specific position of the working electrode 13 can also be controlled based on the gap 16 between the working electrode 13 and the lower surface of the centrifugal turntable 11 (that is, the bottom surface of the annular groove 31) (the calculation process is as described above), and there is no specific restriction here.

In the second aspect, this application provides a method of using a centrifugal atomizer. The method of use includes:

S1. Start the driving device 12 to make the rotation speed of the centrifugal turntable 11 meet the requirements of the atomization process;

S2. Move the working electrode 13 to the designated position in the alloy melt 15 through the moving device;

S3. Pour the alloy melt 15 into the centrifugal turntable 11;

S4. Turn on the external power supply 14;

S5. After atomization is completed, turn off the external power supply 14, move the working electrode 13 away from the centrifugal turntable 11 through the moving device, and turn off the driving device 12.

Specifically, by setting steps S1-S5, it can be realized that when the centrifugal turntable 11 performs atomization, the centrifugal turntable 11 rotates relative to the working electrode 13, so that the working electrode 13 destroys the oxide film that may exist on the liquid film surface of the alloy melt 15. , and can also increase the fluctuation of the liquid film of the alloy melt 15, thereby making the atomization effect better. At the same time, due to the closed loop formed between the external power supply 14, the alloy melt 15 and the working electrode 13, the alloy melt 15 can be effectively reduced The surface tension is beneficial to improving the atomization effect.

In the embodiments provided in this application, it should be understood that the disclosed devices and methods can be implemented in other ways. The device embodiments described above are only illustrative. For example, the division of units is only a logical function division. In actual implementation, there may be other division methods. For example, multiple units or components may be combined or integrated. to another system, or some features can be ignored, or not implemented. On the other hand, the coupling or direct coupling or communication connection between each other shown or discussed may be through some communication interfaces, and the indirect coupling or communication connection of the devices or units may be in electrical, mechanical or other forms.

In addition, units described as separate components may or may not be physically separated, and components shown as units may or may not be physical units, that is, they may be located in one place, or they may be distributed to multiple network units. Some or all of the units can be selected according to actual needs to achieve the purpose of the solution of this embodiment.

Furthermore, each functional module in each embodiment of the present application can be integrated together to form an independent part, each module can exist alone, or two or more modules can be integrated to form an independent part.

In this document, relational terms such as first, second, etc. are used merely to distinguish one entity or operation from another entity or operation and do not necessarily require or imply the existence of any such entity or operation between these entities or operations. Actual relationship or sequence.

The above are only examples of the present application and are not intended to limit the scope of protection of the present application. For those skilled in the art, the present application may have various modifications and changes. Any modifications, equivalent replacements, improvements, etc. made within the spirit and principles of this application shall be included in the protection scope of this application.

Claims (10)

1. A centrifugal atomizer, including a spray chamber, characterized in that it also includes a centrifugal turntable (11), a driving device (12), at least two working electrodes (13), a moving device and an external power supply (14); The centrifugal turntable (11), the driving device (12), the working electrode (13) and the moving device are arranged in the atomization chamber; The centrifugal turntable (11) is connected to the driving device (12). The driving device (12) is used to drive the centrifugal turntable (11) to rotate. The centrifugal turntable (11) is used to drive the flow to the The alloy melt (15) on the centrifugal turntable (11) undergoes centrifugal motion for atomization; Each of the working electrodes (13) is respectively fixed on the moving device and is evenly spaced around the central axis of the centrifugal turntable (11). The moving device is used to move the working electrode (13) to the Above the centrifugal turntable (11), so that the working electrode (13) extends into the liquid film of the alloy melt (15) and has a gap (16) with the surface of the centrifugal turntable (11), the external power supply ( The positive electrode of 14) is arranged above the centrifugal turntable (11) and is used to connect to the alloy melt (15). The negative electrode of the external power supply (14) is connected to the working electrode (13). 2. The centrifugal atomizer according to claim 1, characterized in that the working electrode (13) and the central axis of the centrifugal turntable (11) have a first distance, and the first distance satisfies the following relationship : ; In the formula, is the first distance, and R is the radius of the centrifugal turntable (11). 3. The centrifugal atomizer according to claim 2, characterized in that the gap (16) satisfies the following relationship: ; In the formula, is the height of the gap (16),/> is the first thickness, which is the thickness of the alloy melt (15) at a first distance between the working electrode (13) and the central axis of the centrifugal turntable (11). 4. The centrifugal atomizer according to claim 3, wherein the first thickness is calculated according to the following formula: ; In the formula, is the density of the alloy melt (15), q is the flow rate of the alloy melt (15) flowing into the centrifugal turntable (11) per unit time,/> is the dynamic viscosity of the alloy melt (15),/> is the angular velocity of the centrifugal turntable (11), is pi. 5. The centrifugal atomizer according to claim 1, characterized in that the moving device includes a servo motor (21), a fixing mechanism (22), a feeding mechanism (23) and a clamping mechanism (24), so The fixing mechanism (22) is connected to the top wall of the atomization chamber, the servo motor (21) and the feeding mechanism (23) are hooked on the fixing mechanism (22), and the clamping mechanism (24) is provided at the output end of the feeding mechanism (23). The clamping mechanism (24) is provided with a chuck corresponding to the working electrode (13). The chuck is used for clamping. Holding the working electrode (13), the servo motor (21) is used to drive the feeding mechanism (23) to move the working electrode (13) on the chuck close to or away from the centrifugal turntable. (11). 6. The centrifugal atomizer according to claim 5, characterized in that the working electrode (13) is a graphite electrode. 7. The centrifugal atomizer according to claim 1, characterized in that an annular groove (31) is provided on the centrifugal turntable (11), and the opening of the annular groove (31) faces the working For the electrode (13), the depth of the annular groove (31) does not exceed 0.5mm and is less than 5% of the thickness of the centrifugal turntable (11). 8. The centrifugal atomizer according to claim 7, characterized in that the width of the working electrode (13) does not exceed 3 mm, and the width of the annular groove (31) is larger than the width of the working electrode (13). The width is at least 2mm larger, and the width of the annular groove (31) is 2.5mm-6mm. 9. The centrifugal atomizer according to claim 7, characterized in that the end of the working electrode (13) is flush with the upper surface of the centrifugal turntable (11). 10. A method of using a centrifugal atomizer, characterized in that, based on the centrifugal atomizer according to any one of claims 1 to 9, the method of use includes: S1. Start the driving device (12) to make the rotation speed of the centrifugal turntable (11) meet the requirements of the atomization process; S2. Move the working electrode (13) to the designated position in the alloy melt (15) through the moving device; S3. Pour the alloy melt (15) into the centrifugal turntable (11); S4. Turn on the external power supply (14); S5. After atomization is completed, turn off the external power supply (14), move the working electrode (13) away from the centrifugal turntable (11) through the moving device, and turn off the driving device (12).