CN116810638A - Method and system for reducing crystallization of CMP (chemical mechanical polishing) machine grinding fluid in supply pipeline and element - Google Patents
Method and system for reducing crystallization of CMP (chemical mechanical polishing) machine grinding fluid in supply pipeline and element Download PDFInfo
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Abstract
一种减少CMP机台研磨液在供应管路及元件中结晶的供应方法，包括以下步骤：当CMP机台在idle状态时，执行内循环，研磨液经第一管路、阀门箱、第二管路、手阀、第三管路、过滤器、第四管路、供应切换模组、第六管路、流量控制模组、第七管路、第九管路、阀门箱以及第十管路返回至厂务中央供应系统或者本地供应系统循环；以及当第一研磨液常开阀、第四常开阀通气打开，第三常闭阀以及第五常闭阀通气被截断时，研磨液经第一管路、所述阀门箱、第二管路、手阀、第三管路、过滤器、第四管路、供应切换模组、第六管路、流量控制模组、第七管路、第四常开阀、第八管路供应至CMP机台内部的研磨液喷洒臂。
A supply method for reducing the crystallization of CMP machine grinding fluid in supply pipelines and components includes the following steps: when the CMP machine is in the idle state, internal circulation is executed, and the grinding fluid passes through the first pipeline, the valve box, and the second Pipe, hand valve, third pipe, filter, fourth pipe, supply switching module, sixth pipe, flow control module, seventh pipe, ninth pipe, valve box and tenth pipe The route returns to the factory central supply system or the local supply system for circulation; and when the ventilation of the first normally open valve and the fourth normally open valve of the grinding fluid is opened, and the ventilation of the third normally closed valve and the fifth normally closed valve is cut off, the grinding fluid Through the first pipeline, the valve box, the second pipeline, the hand valve, the third pipeline, the filter, the fourth pipeline, the supply switching module, the sixth pipeline, the flow control module, the seventh pipeline pipeline, the fourth normally open valve, and the eighth pipeline are supplied to the grinding fluid spray arm inside the CMP machine.
Description
Technical Field
The present invention relates to the field of front-end wafer manufacturing and packaging, and more particularly, to a method and system for reducing crystallization of CMP tool slurry in supply lines and devices.
Background
In the previous wafer foundry and advanced packaging factory, CMP (Chemical Mechanical Polishing ) machine is used, and the CMP machine is easy to form crystals in the polishing liquid supply pipeline and the components due to the characteristics of the polishing liquid, and the crystallization condition is aggravated by the running and stopping of the production line due to the down machine or insufficient production capacity, so that the unstable polishing rate and increased wafer defect scratch are easily caused by the crystallization of the polishing liquid, thereby influencing the product yield.
At present, the main current CMP equipment suppliers at home and abroad provide a grinding fluid supply system, because the grinding fluid circulation pipeline inside the machine is not needed, elements such as the grinding fluid pipeline, the dismantling and washing air valve and the like are often needed to be replaced periodically, so that the labor cost of materials for maintenance is increased, and the productivity of the machine is also influenced.
Disclosure of Invention
One of the objectives of the present invention is to provide a method and a system for reducing the crystallization of a CMP polishing slurry in a supply line and a device, which can effectively reduce the crystallization degree of the polishing slurry in the supply line and the device.
One of the objectives of the present invention is to provide a method and system for reducing crystallization of CMP tool slurry in supply lines and components, which can reduce the material and labor costs for periodic replacement of supply lines and disassembly and cleaning of components.
One of the objectives of the present invention is to provide a method and a system for reducing the crystallization of CMP polishing liquid in a supply pipeline and components, which can reduce the shutdown of the machine caused by pipeline maintenance and improve the utilization rate of the machine.
One of the objectives of the present invention is to provide a method and system for reducing crystallization of CMP slurry in a supply pipeline and a device, which can reduce unstable polishing rate and increased defect scratch caused by crystallization of the slurry, and improve product yield.
In order to achieve at least one of the objects of the present invention, there is provided a method for reducing crystallization of a CMP tool slurry in a supply line and a device, the method comprising the steps of: when the CMP machine is in the idle state, executing internal circulation, wherein the third normally-closed valve and the fifth normally-closed valve are kept in the normally-closed state, the first grinding fluid normally-open valve, the second deionized water normally-open valve and the fourth normally-open valve are in the normally-open state, and grinding fluid returns to the factory central supply system or the local supply system for circulation through the first pipeline, the valve box, the second pipeline, the hand valve, the third pipeline, the filter, the fourth pipeline, the supply switching module, the sixth pipeline, the flow control module, the seventh pipeline, the ninth pipeline, the valve box and the tenth pipeline; and when the ventilation of the first grinding fluid normally-open valve and the fourth normally-open valve is opened, and the ventilation of the third normally-closed valve and the fifth normally-closed valve is cut off, the grinding fluid is supplied to the grinding fluid spraying arm in the CMP machine table through the first pipeline, the valve box, the second pipeline, the hand valve, the third pipeline, the filter, the fourth pipeline, the supply switching module, the sixth pipeline, the flow control module, the seventh pipeline, the fourth normally-open valve and the eighth pipeline.
In some embodiments, the method for reducing crystallization of CMP tool slurry in the supply line and components further comprises the steps of: when the ventilation of the second normally-open valve and the fourth normally-open valve of the deionized water is opened, and the ventilation of the third normally-closed valve and the fifth normally-closed valve is cut off, the deionized water is supplied to the grinding fluid spraying arm in the CMP machine table through the fifth pipeline, the supply switching module, the sixth pipeline, the flow control module, the seventh pipeline, the fourth normally-open valve and the eighth pipeline.
In some embodiments, the installation position between the fourth normally open valve and the fifth normally closed valve is ensured to meet the shortest distance under the installation requirement when the polishing solution is installed, and the setting position of the fourth normally open valve is the shortest position near the polishing solution spraying arm inside the CMP machine table under the installation requirement.
In some embodiments, the method for reducing crystallization of CMP tool slurry in the supply line and components further comprises the steps of: and acquiring the drawn pipeline diagram information and the installation condition information, processing and outputting setting data of the nearest positions of the fourth normally-open valve and the fifth normally-closed valve meeting the installation requirement.
In some embodiments, the method for reducing crystallization of CMP tool slurry in the supply line and components further comprises the steps of: and acquiring the information of the drawn pipeline diagram and the information of the installation condition, processing and outputting the fourth normally open valve and the placement data of the nearest position of the grinding fluid spraying arm in the CMP machine table on the premise of meeting the installation requirement.
In some embodiments, wherein the third normally closed valve is disposed within the supply switching module, the fifth normally closed valve, the liquid check valve, and the ninth conduit are disposed at an outlet end of the flow control module to form a circulation branch, such that the slurry is internally circulated.
In some embodiments, the first slurry normally-open valve, the third normally-closed valve, the fourth normally-open valve, and the fifth normally-closed valve are the same set of gas sources, while the second deionized water normally-open valve, the third normally-closed valve, the fourth normally-open valve, and the fifth normally-closed valve are another set of gas sources, each set of gas sources being provided with a gas check valve.
In some embodiments, wherein the liquid check valve is disposed at an outlet end of a circulation branch that performs the internal circulation.
According to another aspect of the present invention, there is provided a supply system for reducing crystallization of CMP tool slurry in supply lines and components, to which a supply method for reducing crystallization of CMP tool slurry in supply lines and components is applied, the supply system for reducing crystallization of CMP tool slurry in supply lines and components including a first gas check valve, a second gas check valve, a third gas check valve, a fourth gas check valve, a fifth gas check valve, a sixth gas check valve, a flow control module, a supply switching module, a filter, a hand valve, a liquid check valve, a valve box, a first line, a second line, a third line, a fourth line, a fifth line, a sixth line, a seventh line, an eighth line, a ninth line, a tenth line, a first slurry normally open valve, a second deionized water normally open valve, a third normally open valve, a fourth normally open valve, and a fifth normally closed valve, wherein the third normally open valve is disposed in the supply switching module, the fifth normally closed valve, the liquid check valve, and the ninth line are disposed in the flow control module, thereby forming a circulation system for supplying slurry in the CMP tool and in the supply line.
In some embodiments, the supply line and the circulation branch of the supply system for reducing crystallization of the CMP tool slurry in the supply line and the components are provided with the third normally-closed valve, the fifth normally-closed valve, and the fourth normally-open valve, respectively, and switching between the supply line and the circulation branch is performed
Drawings
FIG. 1 is a flow chart of steps in a method for reducing crystallization of CMP tool slurry in supply lines and components according to one embodiment of the present invention.
FIG. 2 is a flow chart of a piping arrangement of a supply system for reducing crystallization of CMP tool slurry in supply piping and components according to one embodiment of the invention.
Detailed Description
The following description is presented to enable one of ordinary skill in the art to make and use the invention. The preferred embodiments in the following description are by way of example only and other obvious variations will occur to those skilled in the art. The basic principles of the invention defined in the following description may be applied to other embodiments, variations, modifications, equivalents, and other technical solutions without departing from the spirit and scope of the invention.
It will be understood that the terms "a" and "an" should be interpreted as referring to "at least one" or "one or more," i.e., in one embodiment, the number of elements may be one, while in another embodiment, the number of elements may be plural, and the term "a" should not be interpreted as limiting the number.
The invention provides a method for reducing the crystallization of CMP machine grinding fluid in a supply pipeline and a component, which can effectively reduce the crystallization degree of the CMP machine grinding fluid in the supply pipeline and the component, reduce the material and labor cost for periodically replacing the components such as the supply pipeline, a dismantling and washing valve and the like, reduce the off-line condition of a server caused by pipeline maintenance, improve the utilization rate of the machine, reduce the unstable grinding rate and the defect caused by the crystallization of the grinding fluid, scratch the wafer and improve the product yield.
As shown in fig. 1, specifically, the method for reducing crystallization of CMP tool slurry in a supply line and components comprises the following steps:
s100: when the CMP machine is in the idle state, executing internal circulation, wherein the third normally-closed valve and the fifth normally-closed valve are kept in the normally-closed state, the first grinding fluid normally-open valve, the second deionized water normally-open valve and the fourth normally-open valve are in the normally-open state, and grinding fluid returns to the factory central supply system or the local supply system for circulation through the first pipeline, the valve box, the second pipeline, the hand valve, the third pipeline, the filter, the fourth pipeline, the supply switching module, the sixth pipeline, the flow control module, the seventh pipeline, the ninth pipeline, the valve box and the tenth pipeline;
s200: when the ventilation of the first grinding fluid normally-open valve and the fourth normally-open valve is opened, and the ventilation of the third normally-closed valve and the fifth normally-closed valve is cut off, grinding fluid is supplied to a grinding fluid spraying arm in the CMP machine table through a first pipeline, the valve box, a second pipeline, a hand valve, a third pipeline, a filter, a fourth pipeline, a supply switching module, a sixth pipeline, a flow control module, a seventh pipeline, a fourth normally-open valve and an eighth pipeline; and
s300: when the ventilation of the second normally-open valve and the fourth normally-open valve of the deionized water is opened, and the ventilation of the third normally-closed valve and the fifth normally-closed valve is cut off, the deionized water is supplied to the grinding fluid spraying arm in the CMP machine table through the fifth pipeline, the supply switching module, the sixth pipeline, the flow control module, the seventh pipeline, the fourth normally-open valve and the eighth pipeline.
Further, the method for reducing crystallization of the CMP polishing slurry in the supply pipeline and the components further comprises the following steps: and acquiring the drawn pipeline diagram information and the installation condition information, processing and outputting setting data of the nearest positions of the fourth normally-open valve and the fifth normally-closed valve meeting the installation requirement. Therefore, the distance between the two valves is set to meet the installation requirement, and the influence of the newly added pipeline on the original supply pipeline can be avoided to the greatest extent.
Further, the method for reducing crystallization of the CMP polishing slurry in the supply pipeline and the components further comprises the following steps: and acquiring the information of the drawn pipeline diagram and the information of the installation condition, processing and outputting the fourth normally open valve and the placement data of the nearest position of the grinding fluid spraying arm in the CMP machine table on the premise of meeting the installation requirement. So that the circulation line is longest near the theoretical limit.
FIG. 2 illustrates a supply system for reducing crystallization of CMP tool slurry in supply lines and components in accordance with a preferred embodiment of the present invention. It is to be understood that the supply system for reducing crystallization of the CMP tool slurry in the supply line and the component of the present invention can be applied to the supply method for reducing crystallization of the CMP tool slurry in the supply line and the component, and that each step of the supply method for reducing crystallization of the CMP tool slurry in the supply line and the component can also be applied to the supply system for reducing crystallization of the CMP tool slurry in the supply line and the component. By the supply system for reducing crystallization of the CMP machine grinding fluid in the supply pipeline and the elements, the crystallization degree of the CMP machine grinding fluid in the supply pipeline and the elements can be effectively reduced, the material and labor cost for periodically replacing the supply pipeline and disassembling and cleaning the elements is reduced, the machine stop condition caused by pipeline maintenance is reduced, the machine utilization rate is improved, the unstable grinding rate caused by crystallization of the CMP machine grinding fluid and the increase of defect scratches are reduced, and the product yield is improved.
Specifically, the supply system for reducing crystallization of the CMP tool slurry in the supply line and the components includes a first gas check valve, a second gas check valve, a third gas check valve, a fourth gas check valve, a fifth gas check valve, a sixth gas check valve, a flow control module, a supply switching module, a filter, a hand valve, a liquid check valve, a VMB (valve manifold box valve box), a first line, a second line, a third line, a fourth line, a fifth line, a sixth line, a seventh line, an eighth line, a ninth line, a tenth line, a first slurry normally open valve (PV 1), a second deionized water normally open valve (PV 2), a third normally closed valve (PV 3), a fourth normally open valve (PV 4), and a fifth normally closed valve (PV 5). In a specific embodiment, the supply switching module may be implemented as a slurry supply switching module or a deionized water supply switching module. The first pipeline is a supply pipeline connected between the valve box and a factory central supply system or a local supply system. The second pipeline is connected with the hand valve and the valve box. The third pipeline is connected with the filter and the hand valve. The fourth pipeline is connected with the filter and the supply switching module. The fifth pipeline is connected with the second deionized water normally open valve, and deionized water enters the supply switching module through the fifth pipeline. The sixth pipeline is connected with the supply switching module and the flow control module. The seventh pipeline is connected with the fourth normally open valve and the flow control module. The eighth pipeline is connected with an abrasive liquid spraying arm (slurry arm) inside the CMP machine table and the fourth normally open valve. The ninth pipeline is connected between the seventh pipeline and the valve box, the fifth normally closed valve is arranged on the ninth pipeline, and a fluid one-way valve is further arranged between the ninth pipeline and the valve box. The tenth pipeline is a return pipeline and is connected with the valve box and a factory central supply system or a local supply system. The first gas check valve is connected with the fifth normally closed valve, and the second gas check valve is connected with the fifth normally closed valve. The third gas one-way valve is connected with the fourth normally open valve, and the fourth gas one-way valve is connected with the fourth normally open valve. The fifth gas check valve is disposed between the first slurry normally open valve and the fourth normally open valve. The sixth gas check valve is disposed between the second deionized water normally open valve and the third normally closed valve.
The first grinding fluid normally-open valve, the second deionized water normally-open valve and the fourth normally-open valve are normally-open pneumatic valves, and the third normally-closed valve and the fifth normally-closed valve are normally-closed pneumatic valves. It will be appreciated that the normally closed valve is normally fluid passage, the ventilation is cut off, and the normally open valve is reversed.
Specifically, when the CMP machine is in idle (normal use of the machine, but no product is running) for internal circulation, the third normally closed valve and the fifth normally closed valve are in normally closed states, the first polishing liquid normally open valve, the second deionized water normally open valve and the fourth normally open valve are in normally open states, and the polishing liquid returns to the factory central supply system or the local supply system for circulation through paths of the pipeline (1) (2) (3) (4) (6) (7) (9) and the pipeline. More specifically, the third normally closed valve and the fifth normally closed valve are in a normally closed state, the first grinding fluid normally open valve, the second deionized water normally open valve and the fourth normally open valve are in a normally open state, and grinding fluid returns to a factory central supply system or a local supply system to circulate through a first pipeline, the valve box, a second pipeline, the hand valve, a third pipeline, the filter, a fourth pipeline, the supply switching module, a sixth pipeline, the flow control module, a seventh pipeline, a ninth pipeline, the valve box and a tenth pipeline.
Further, when the CMP machine performs the CMP operation, the first polishing liquid normally-open valve and the fourth normally-open valve are opened by ventilation, the third normally-closed valve and the fifth normally-closed valve are cut off by ventilation, and the polishing liquid is supplied to the polishing liquid spray arm inside the CMP machine through (1) (2) (3) (4) (6) (7) (8), that is, the polishing liquid is supplied to the polishing liquid spray arm inside the CMP machine through the first pipeline, the valve box, the second pipeline, the hand valve, the third pipeline, the filter, the fourth pipeline, the supply switching module, the sixth pipeline, the flow control module, the seventh pipeline, the fourth normally-open valve and the eighth pipeline. Wherein, the grinding fluid flows to the sixth pipeline through the first grinding fluid normally open valve at the supply switching module.
Further, when the polishing pad of the CMP machine needs DIW (Deionized water) to be kept wet, the second and fourth normally-open valves are opened and the third and fifth normally-closed valves are closed and the DIW (Deionized water) is supplied to the polishing liquid spray arm inside the CMP machine through (5) (6) (7) (8), that is, the Deionized water is supplied to the polishing liquid spray arm inside the CMP machine through the fifth, the supply switching, the sixth, the flow control, the seventh, the fourth and the eighth pipelines. The DIW (Deionized water) flows to the sixth pipeline through the second Deionized water normally open valve at the supply switching module.
It will be appreciated that the PV in FIG. 2 is Pneumatic valve; the CDA is Compressed dry air, and the dry air is compressed to drive the PV valve (comprising a first grinding fluid normally-open valve, a second deionized water normally-open valve, a third normally-closed valve, a fourth normally-open valve and a fifth normally-closed valve) to work; chamber interior refers to the interior of the process Chamber.
It should be noted that the first grinding fluid normally-open valve, the third normally-closed valve, the fourth normally-open valve and the fifth normally-closed valve are the same air source and are driven by the same compressed air; the second deionized water normally-open valve, the third normally-closed valve, the fourth normally-open valve and the fifth normally-closed valve are of the same air source and are driven by the same compressed air.
The supply system for reducing crystallization of the CMP machine table grinding fluid in the supply pipeline and the elements is provided with two groups of air sources, wherein the first grinding fluid normally-open valve, the third normally-closed valve, the fourth normally-open valve and the fifth normally-closed valve are the same group of air sources, the second deionized water normally-open valve, the third normally-closed valve, the fourth normally-open valve and the fifth normally-closed valve are the other air source, and the two air sources are provided with air check valves.
It should be noted that the eighth pipeline and the ninth pipeline are thinner than the inner diameters of other pipelines, and are preferably set to be 1/4 inch and 3/8 inch, so that the pressure of the branch pipeline is increased, the flow rate of liquid in the pipeline is increased, and crystallization is reduced.
It should be noted that, the distance between the fourth normally-open valve and the fifth normally-closed valve in the actual pipeline is set to be the position closest to the physical limit, so that when the CMP machine performs the CMP operation, the polishing solution can be prevented from crystallizing in a section of the ninth pipeline between the fifth normally-closed valve and the seventh pipeline to the greatest extent. The location where the physical limit is closest may be implemented as: the fourth normally open valve and the fifth normally closed valve can meet the latest position setting of installation requirements when being installed.
It should be noted that the physical limit of the position of the fourth normally open valve in the actual pipeline is close to the polishing liquid spraying arm in the CMP machine table, so that the circulating pipeline is the longest near the theoretical limit. The physical limit approach here means that the fourth normally open valve is placed in close proximity to the slurry spray arm inside the CMP tool under the premise of meeting the installation requirements. The fact that the circulating pipeline is the longest is that all pipelines on the right side of the fourth normally open valve are arranged, the limit of the installation position of the fourth normally open valve is close to the grinding fluid spraying arm in the CMP machine table, the circulating pipeline is the longest, and when the CMP machine table is in an idle (normal use of the machine table but no product is in operation) state for internal circulation, grinding fluid in the corresponding pipeline flows as much as possible to the greatest extent.
It should be noted that, by means of the supply system for reducing crystallization of the CMP machine polishing liquid in the supply pipeline and the component of the present invention, especially the circulation pipeline in the process of machine idle, the internal circulation of the full circulation pipeline can be realized by setting a new branch at the outlet end of the control flow module, that is, the ninth pipeline in the preferred embodiment. In the prior art, only the pipeline before entering the machine is realized through the circulation pipeline in the process of the machine idle, the pipeline inside the machine cannot circulate, and crystallization phenomenon can be generated when the grinding liquid stops flowing during idle, so that the product quality is affected, and the influence caused by crystallization can be reduced only by replacing the pipeline inside the machine, disassembling and washing components such as a PV valve and the like. Although the internal circulation is mainly realized by using a machine table original supply pipeline without adding a branch, the method needs to change the spraying of the slery arm from a fixed position into motor driving, and needs to set an independent grinding liquid collecting device in a process cavity, and periodically or in real time, the grinding liquid is recovered to a factory central system or a local grinding liquid supply machine table through a pump in the pipeline. Therefore, the supply system for reducing the crystallization of the CMP machine grinding fluid in the supply pipeline and the elements has low cost, only three PV valves, six gas check valves and one liquid check valve are needed to be added, and no additional motor, air pump, grinding fluid collecting device and the like are needed to be arranged. In addition, the functions can be realized by only using the original CDA source of the first grinding fluid normally-open valve (PV 1) and the second deionized water normally-open valve (PV 2) of the machine, and a new air source is not needed. It is worth mentioning that the supply system for reducing the crystallization of the CMP machine grinding fluid in the supply pipeline and the elements does not need to change any computer program, does not need to change the driving mode of the original slery arm and the electrification control system thereof, and is very convenient to implement.
It is worth mentioning that DIW pneumatic valves can work independently. Specifically, the supply system for reducing crystallization of the CMP machine table grinding fluid in the supply pipeline and the elements utilizes the original air sources of the machine table for respectively controlling the first grinding fluid normally-open valve (PV 1), the second deionized water normally-open valve (PV 2) to realize the work of adding the third normally-closed valve (PV 3), the fourth normally-open valve (PV 4) and the fifth normally-closed valve (PV 5), only two paths of CDA air sources are arranged in the air path, one path of CDA air source controls the first grinding fluid normally-open valve (PV 1) and simultaneously controls the third normally-closed valve (PV 3), the fourth normally-open valve (PV 4) and the fifth normally-closed valve (PV 5) to realize the control of the CMP machine table flow grinding fluid; the other path of CDA air source controls the second Deionized water normally-open valve (PV 2) and simultaneously controls the third normally-closed valve (PV 3), the fourth normally-open valve (PV 4) and the fifth normally-closed valve (PV 5) to control the CMP machine flow DIW (Deionized water), and when the machine works normally, the two paths of CDA air sources cannot be compressed and ventilated simultaneously, so that the use of six gas check valves in FIG. 2 can enable the two paths of CDA air sources to work independently and are not influenced by each other. It is understood that the CDA air source for controlling the first grinding fluid normally-open valve (PV 1) is provided with 4 air pipes, and the 4 air pipes are respectively connected with the first grinding fluid normally-open valve (PV 1), the fifth air check valve, the third air check valve and the first air check valve; the CDA air source for controlling the second deionized water normally-open valve (PV 2) is provided with 4 air pipes, and the 4 air pipes are respectively connected with the second deionized water normally-open valve (PV 2), the sixth air one-way valve, the fourth air one-way valve and the second air one-way valve.
It is worth mentioning that, the supply system for reducing the crystallization of the CMP machine grinding fluid in the supply pipeline and the components of the invention realizes the full loop circulation of the grinding fluid by arranging a new branch at the outlet end of the control flow module; according to the supply system for reducing crystallization of CMP machine grinding fluid in the supply pipeline and the elements, the normally-open pneumatic valve and the normally-closed pneumatic valve are respectively arranged on the original supply pipeline and the newly-added branch, so that the switching between the circulation pipeline and the original supply pipeline is realized; according to the supply system for reducing crystallization of the CMP machine grinding fluid in the supply pipeline and the elements, the air sources for controlling the grinding fluid and the DIW air valves are respectively connected to the newly added air valves, the air sources in the air paths are divided into two groups, each air path is provided with an air check valve, one path of CDA air source for controlling the grinding fluid is prevented from flowing from the corresponding air pipe to the air pipe communicated with the CDA air source for controlling the DIW (Deionized water) of the other path, or one path of CDA air source for controlling the DIW (Deionized water) is prevented from flowing from the corresponding air pipe to the air pipe communicated with the CDA air source for controlling the grinding fluid of the other path, so that the pressure of the corresponding air valve is weakened, and the air valves are not adequately controlled to be opened or closed, and the air valves are enabled to work independently; according to the supply system for reducing the crystallization of the CMP machine grinding fluid in the supply pipeline and the elements, the liquid check valve is additionally arranged at the outlet end of the newly added branch, so that the machine is ensured to be only supplied by the original supply pipeline when the grinding fluid is normally required to be used; the pipe diameter of a branch pipe of a supply system for reducing crystallization of the CMP machine grinding liquid in a supply pipeline and a component is smaller than that of an original supply pipeline, and the pipe pressure is increased to reduce crystallization.
It will be appreciated by persons skilled in the art that the embodiments of the invention described above and shown in the drawings are by way of example only and are not limiting. The objects of the present invention have been fully and effectively achieved. The functional and structural principles of the present invention have been shown and described in the examples and embodiments of the invention may be modified or practiced without departing from such principles.
Claims (10)
1. A method for reducing crystallization of a CMP tool slurry in a supply line and a device, the method comprising: when the CMP machine is in the idle state, executing internal circulation, wherein the third normally-closed valve and the fifth normally-closed valve are kept in the normally-closed state, the first grinding fluid normally-open valve, the second deionized water normally-open valve and the fourth normally-open valve are in the normally-open state, and grinding fluid returns to the factory central supply system or the local supply system for circulation through the first pipeline, the valve box, the second pipeline, the hand valve, the third pipeline, the filter, the fourth pipeline, the supply switching module, the sixth pipeline, the flow control module, the seventh pipeline, the ninth pipeline, the valve box and the tenth pipeline; and when the ventilation of the first grinding fluid normally-open valve and the fourth normally-open valve is opened, and the ventilation of the third normally-closed valve and the fifth normally-closed valve is cut off, the grinding fluid is supplied to the grinding fluid spraying arm in the CMP machine table through the first pipeline, the valve box, the second pipeline, the hand valve, the third pipeline, the filter, the fourth pipeline, the supply switching module, the sixth pipeline, the flow control module, the seventh pipeline, the fourth normally-open valve and the eighth pipeline.
2. The method for reducing crystal growth of CMP tool slurry in a supply line and a device as recited in claim 1, wherein the method for reducing crystal growth of CMP tool slurry in a supply line and a device further comprises the steps of: when the ventilation of the second normally-open valve and the fourth normally-open valve of the deionized water is opened, and the ventilation of the third normally-closed valve and the fifth normally-closed valve is cut off, the deionized water is supplied to the grinding fluid spraying arm in the CMP machine table through the fifth pipeline, the supply switching module, the sixth pipeline, the flow control module, the seventh pipeline, the fourth normally-open valve and the eighth pipeline.
3. The method for reducing crystallization of CMP tool slurry in a supply line and component as recited in claim 2, wherein the fourth normally open valve and the fifth normally closed valve are secured in a mounted position that satisfies a shortest distance under mounting requirements, and the fourth normally open valve is disposed in a shortest position near the slurry spray arm inside the CMP tool under mounting requirements.
4. The method for reducing crystal growth of CMP tool slurry in a supply line and a device as recited in claim 1, wherein the method for reducing crystal growth of CMP tool slurry in a supply line and a device further comprises the steps of: and acquiring the drawn pipeline diagram information and the installation condition information, processing and outputting setting data of the nearest positions of the fourth normally-open valve and the fifth normally-closed valve meeting the installation requirement.
5. The method for reducing crystal growth of CMP tool slurry in a supply line and a device as recited in claim 1, wherein the method for reducing crystal growth of CMP tool slurry in a supply line and a device further comprises the steps of: and acquiring the information of the drawn pipeline diagram and the information of the installation condition, processing and outputting the fourth normally open valve and the placement data of the nearest position of the grinding fluid spraying arm in the CMP machine table on the premise of meeting the installation requirement.
6. The method for reducing crystallization of CMP tool slurry in a supply line and a device according to any one of claims 1 to 5, wherein a third normally-closed valve is provided in the supply switching module, and a fifth normally-closed valve, a liquid check valve, and a ninth line are provided at an outlet end of the flow control module to form a circulation branch, so that the slurry is internally circulated.
7. The method of claim 6, wherein the first slurry normally-open valve, the third normally-closed valve, the fourth normally-open valve, and the fifth normally-closed valve are the same set of gas sources, and the second deionized water normally-open valve, the third normally-closed valve, the fourth normally-open valve, and the fifth normally-closed valve are another set of gas sources, each set of gas sources being provided with a gas check valve.
8. The method of claim 7, wherein the liquid check valve is disposed at an outlet end of a circulation path for performing the internal circulation.
9. A supply system for reducing crystallization of CMP tool slurry in supply lines and components, to which the method of any one of claims 1-8 is applied, wherein the supply system for reducing crystallization of CMP tool slurry in supply lines and components comprises a first gas check valve, a second gas check valve, a third gas check valve, a fourth gas check valve, a fifth gas check valve, a sixth gas check valve, a flow control module, a supply switching module, a filter, a hand valve, a liquid check valve, a valve box, a first line, a second line, a third line, a fourth line, a fifth line, a sixth line, a seventh line, an eighth line, a ninth line, a tenth line, a first slurry normally open valve, a second deionized water normally open valve, a third normally closed valve, a fourth normally open valve, and a fifth normally closed valve, wherein the third normally closed valve is disposed in the supply switching module, the fifth normally closed valve, the liquid check valve, and the ninth line are disposed at an outlet end of the flow control module, forming a circulation bypass, thereby performing circulation of the CMP tool slurry in the supply line and the polishing tool slurry in the supply line and components.
10. The supply system for reducing crystallization of CMP tool slurry in a supply line and a component as recited in claim 9, wherein the supply line and the circulation branch of the supply system for reducing crystallization of CMP tool slurry in a supply line and a component are provided with the third normally-closed valve, the fifth normally-closed valve, and the fourth normally-open valve, respectively, and switching of the supply line and the circulation branch is performed.
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| CN202310578030.XA CN116810638A (en) | 2023-05-22 | 2023-05-22 | Method and system for reducing crystallization of CMP (chemical mechanical polishing) machine grinding fluid in supply pipeline and element |
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