CN116626555A - Magnetic field measurement method, magnetic field measurement system, and magnetic field measurement equipment - Google Patents

Abstract

The magnetic field measurement method includes: applying a magnetic field to the first particle and the second particle; generating a first output light according to the magnetic field and the first coupling strength between the first particle and the second particle through the first particle; and according to the first output The intensity of the light calculates the intensity of the magnetic field. In this way, fine measurements of the magnetic field can be made. In addition, a magnetic field measurement system and a magnetic field measurement device are also disclosed herein.

Description

Magnetic field measurement method, magnetic field measurement system, and magnetic field measurement equipment

technical field

The content of the present invention relates to a magnetic field measurement technology, in particular to a magnetic field measurement method, a magnetic field measurement system, and a magnetic field measurement device.

Background technique

When observing tiny cells or devices, it is necessary to measure weak magnetic fields. However, measuring devices for measuring weak magnetic fields have many disadvantages. For example, it needs to operate in an extremely low temperature environment, or the spatial resolution cannot be adjusted. Therefore, how to overcome the above-mentioned shortcomings is an important issue in this field.

Contents of the invention

An embodiment of the invention includes a magnetic field measurement method. The magnetic field measurement method includes: applying a magnetic field to the first particle and the second particle; generating a first output light according to the magnetic field and the first coupling strength between the first particle and the second particle through the first particle; and according to the first output The intensity of the light calculates the intensity of the magnetic field.

In some embodiments, generating the first output light includes: adjusting the distance between the first particle and the second particle to adjust the first coupling strength; and adjusting the intensity of the first output light by adjusting the first coupling strength.

In some embodiments, the magnetic field measurement method further includes: fixing the first particle by the first laser; and fixing the second particle by the second laser; wherein adjusting the distance between the first particle and the second particle includes: adjusting the first particle At least one of the position of the laser and the position of the second laser.

In some embodiments, calculating the strength of the magnetic field includes: generating an output signal according to the strength of the first output light; and calculating the strength of the magnetic field according to at least one coupling strength value of the first coupling strength corresponding to at least one local peak of the output signal.

An embodiment of the invention includes a magnetic field measurement system. The magnetic field measuring system includes a first particle, a second particle and a sensing device. The first particle is used for generating the first output light according to the first coupling strength and the magnetic field. The second particle is used for coupling with the first particle with a first coupling strength. The sensing device is used for generating a readout signal corresponding to the intensity of the magnetic field according to the intensity of the first output light.

In some embodiments, the magnetic field measurement system further includes: a first moving device for adjusting the distance between the first particle and the second particle to adjust the first coupling strength, wherein the distance is perpendicular to the direction of the magnetic field.

In some embodiments, the magnetic field measurement system further includes: a processing device, configured to calculate according to at least one coupling strength value of the first coupling strength corresponding to at least one local peak value of the readout signal after the first mobile device adjusts the distance The strength of the magnetic field.

Embodiments of the invention include a magnetic field measurement device. The magnetic field measuring device includes a first sensing module, a second sensing module, a first laser generating device, a second laser generating device and a moving device. The first sensing module is used for sensing the intensity of the magnetic field around the first sensing module. The second sensing module is used for sensing the intensity of the magnetic field around the second sensing module. The first laser generating device is used for positioning the first sensing module. The second laser generating device is used for positioning the second sensing module. The moving device is used to move at least one of the first laser generating device and the second laser generating device to adjust the distance between the first sensing module and the second sensing module.

In some embodiments, the first sensing module includes: a processing device for calculating the intensity of the magnetic field around the first sensing module according to the coupling strength between the first particle and the second particle, wherein the first laser generates The device is also used to generate a laser, and fix the first particle by the laser.

In some embodiments, the magnetic field measurement device further includes: a third sensing module, including a third particle and a fourth particle, and the third sensing module is used to measure the coupling strength between the third particle and the fourth particle The strength of the magnetic field around the third sensing module is calculated, wherein the first laser generating device is also used to fix the third particle through the laser.

Description of drawings

FIG. 1 is a schematic diagram of a magnetic field measurement system according to an embodiment of the present application.

FIG. 2 is a relationship diagram of signal strength, coupling strength and applied field of a readout signal according to an embodiment of the present application.

FIG. 3A is a schematic diagram of a magnetic field measurement system according to an embodiment of the present application.

FIG. 3B is a schematic diagram of a magnetic field measurement system according to an embodiment of the present application.

FIG. 4 is a schematic diagram of a magnetic field measuring device according to an embodiment of the present application.

Detailed ways

Herein, when an element is referred to as "connected" or "coupled", it may mean "electrically connected" or "electrically coupled". "Connected" or "coupled" may also be used to mean that two or more elements operate or interact with each other. In addition, although terms such as "first", "second", ... etc. are used herein to describe different elements, these terms are only used to distinguish elements or operations described with the same technical terms. Unless the context clearly dictates otherwise, the terms do not specifically refer to or imply an order or sequence, nor are they intended to limit the case.

Unless otherwise defined, all terms (including technical and scientific terms) used herein have the same meaning as commonly understood by one of ordinary skill in the art to which this matter belongs. It will be further understood that terms such as those defined in commonly used dictionaries should be interpreted to have a meaning consistent with their meaning in the relevant art and in the context of the present case, and will not be interpreted as idealized or overly formal unless otherwise expressly defined herein.

The terminology used herein is for the purpose of describing particular embodiments only and is not intended to be limiting. As used herein, the singular forms "a", "an" and "the" are intended to include plural forms including "at least one" unless the content clearly dictates otherwise. "Or" means "and/or". As used herein, the term "and/or" includes any and all combinations of one or more of the associated listed items. It should also be understood that when used in this specification, the terms "comprising" and/or "comprising" designate the stated features, regions, integers, steps, operations, the presence of elements and/or parts, but do not exclude one or more Existence or addition of other features, regions as a whole, steps, operations, elements, parts and/or combinations thereof.

The following will disclose multiple implementations of the present case with the accompanying drawings. For the sake of clarity, many practical details will be described together in the following description. It should be understood, however, that these practical details should not be used to limit the present case. That is, in some embodiments of the present invention, these practical details are unnecessary. In addition, for the sake of simplifying the drawings, some existing conventional structures and elements will be shown in a simple and schematic way in the drawings.

FIG. 1 is a schematic diagram of a magnetic field measurement system 100 according to an embodiment of the present application. In some embodiments, the magnetic field measurement system 100 is used to measure the magnetic field B1 applied on the magnetic field measurement system 100 .

In some embodiments, the magnetic field measurement system 100 can be a quantum measurement system, including particles PT1, PT2, a light emitting device 110, a moving device 120, 130, a laser generating device 140, 150, a fixing device 160, 170, a sensor Measuring device 180 and processing device 190.

As shown in FIG. 1 , the light emitting device 110 is used for emitting input lights L11 and L12 to the particles PT1 and PT2 . The particle PT1 is used for generating the output light L13 according to the input light L11. The particle PT2 is used for generating the output light L14 according to the input light L12. In some embodiments, the wavelengths of the input lights L11 and L12 are about 473 nm, and the wavelengths of the output lights L13 and L14 are about 550 nm. In different embodiments, the input lights L11 and L12 and the output lights L13 and L14 may have different wavelengths.

As shown in FIG. 1 , the sensing device 180 is used for receiving at least one of the output lights L13 and L14 , and for generating a readout signal BS1 according to at least one of the output lights L13 and L14 . The processing device 190 performs calculation according to the readout signal BS1 to obtain the strength of the magnetic field B1.

In some embodiments, the particle PT1 includes a nucleus NC1 and a free radical pair RP1, and the particle PT2 includes a nucleus NC2 and a free radical pair RP2. The radical pair RP1 includes radicals RD1 and RD2, and the radical pair RP2 includes radicals RD3 and RD4. In some embodiments, nuclei NCl and NC2 may be implemented by proteins or synthetic molecules. The free radical pair RP1 and RP2 can be carried out by a lone pair of electrons (lone pair). The free radicals RD1-RD4 can be carried out by electrons.

As shown in FIG. 1 , the distance between radicals RD2 and RD3 is shorter than the distance between radicals RD2 and RD4 , and the distance between radicals RD2 and RD3 is shorter than the distance between radicals RD1 and RD3 . In some embodiments, the coupling strength G1 between radicals RD2 and RD3 is stronger than each of the coupling strength between radicals RD2 and RD4 and the coupling strength between radicals RD1 and RD3.

In some embodiments, magnetic field B1 is applied to particles PT1 and PT2. The particle PT1 is used for generating the output light L13 according to the input light L11, the magnetic field B1 and the coupling strength G1. The particle PT2 is used for generating the output light L14 according to the input light L12, the magnetic field B1 and the coupling strength G1. In some embodiments, the intensity of the output light L13 and the intensity of the output light L14 are related to the coupling intensity G1.

In some embodiments, the Hamiltonian function H representing the energies of the particles PT1 and PT2 can be expressed as the following formula (1).

In some embodiments, a in formula (1) represents the coefficient of hyperfine interaction (Hyperfine interaction), S _A1 corresponds to the spin of free radical RD1, I ₁ corresponds to the spin of particle PT1, and S _B1 corresponds to free radical RD2 The spin of I ₂ corresponds to the spin of the particle PT2, The component of the spin corresponding to the free radical RD1 in the Z direction, /> The component of the spin corresponding to the free radical RD2 in the Z direction, /> The component of the spin corresponding to the free radical RD4 in the Z direction, /> corresponds to the component of the spin of the radical RD3 in the Z direction, and θ corresponds to the external field applied to the particles PT1 and PT2. In some embodiments, the Z direction is parallel to the direction of the magnetic field B1. In some embodiments, the relationship between the applied field θ and the magnetic field B1 can be expressed as the following equation (2), where γ ₂ is a constant.

B1 = θ/γ _e ... Formula (2).

In some embodiments, corresponding to the Hamiltonian function H, the particles PT1 and PT2 have characteristic states |m> and |n>. Where m and n are positive integers. The energies corresponding to the eigenstates |m> and |n>, that is, the eigenvalues corresponding to the eigenstates |m> and |n> contain the information of the external field θ and the coupling strength G1. In other words, the eigenvalues corresponding to the eigenstates |m> and |n> will change with the change of the external field θ and/or the coupling strength G1.

In some embodiments, each of the intensity of the output light L13 and the intensity of the output light L14 can be represented by a function Φ(θ) as shown in the following formula (3). In some embodiments, the function Φ(θ) corresponds to the signal strength of the readout signal BS1 , such as the voltage level or current level of the readout signal BS1 . In some embodiments, the signal intensity of the readout signal BS1 corresponds to at least one of the intensity of the output light L13 and the intensity of the output light L14 .

In some embodiments, ρ _mn in formula (3) corresponds to a density function, and M is a positive integer. ω _mn corresponds to the energy difference between the energy level of the eigenstate |m> and the energy level of |n>. can be represented by the following formula (4), and f(ω _mn ) can be represented by the following formula (5).

In some embodiments, in formula (4) Corresponds to the projection operator. k in formula (5) is a constant.

As shown in the above formulas (1) to (5), the function Φ(θ) changes with the change of the applied field θ and/or the coupling strength G1. Calculated from the above formulas (1) to (5), it can be obtained that when the coupling strength G1 has the coupling strength values G11-G12 shown in the following formulas (6) to (7), the function Φ(θ) has a local peak.

In some embodiments, the function Ω in equations (6) to (7) is a function of the applied field θ. When the coupling strength values G11 and G12 are known, the strength of the applied field θ can be obtained by the following formula (8). .

θ=2·(G11+G12)...Formula (8).

In some embodiments, the processing device 190 is configured to perform the operations of formula (1) to formula (8). In various embodiments, formulas (1) to (8) may have various forms.

As shown in FIG. 1 , the fixing device 160 is used to fix the particle PT2 , and the fixing device 170 is used to fix the particle PT1 . The laser generating device 150 is used to generate a laser light LZ1, and position the fixing device 170 in space through the laser light LZ1. The laser generating device 140 is used to generate a laser light LZ2, and position the fixing device 160 in space through the laser light LZ2.

In some embodiments, the fixing device 170 includes a fixing body FB1 and a line segment SG1 , and the fixing device 160 includes a fixing body FB2 and a line segment SG2 . As shown in FIG. 1 , the fixed body FB1 is used to be fixed in space by the laser LZ1 , and the line segment SG1 is used to connect the fixed body FB1 and the particle PT1 . The fixed body FB2 is used to be fixed in space by the laser LZ2, and the line segment SG2 is used to connect the fixed body FB2 and the particle PT2. In some embodiments, the anchors FB1 and FB2 are implemented by plastic beads, and the segments SG1 and SG2 are formed by proteins. In different embodiments, the fixing bodies FB1 and FB2 and the line segments SG1 and SG2 can be implemented by different shapes and materials.

In some embodiments, the moving device 130 is used to move the position of the laser generating device 150 so that the position of the laser LZ1 changes, so as to adjust the positions of the fixing device 170 and the particle PT1. The moving device 120 is used to move the position of the laser generating device 140 so that the position of the laser LZ2 is changed, so as to adjust the positions of the fixing device 160 and the particle PT2. As shown in FIG. 1 , there is a distance D1 perpendicular to the Z direction between the particles PT1 and PT2 . The moving devices 120 and 130 are used to adjust the distance D1 by adjusting the positions of the particles PT1 and PT2.

In some embodiments, when the distance D1 increases, the coupling strength G1 decreases, and when the distance D1 decreases

, the coupling strength G1 increases. In some embodiments, the mobile devices 120 and 130 are used to adjust the coupling strength G1 by adjusting the distance D1 to change the signal strength of the readout signal BS1. The details about adjusting the coupling strength G1 are further explained in the following embodiment with respect to FIG. 2 .

FIG. 2 is a graph 200 showing the relationship between the signal strength of the readout signal BS1 , the coupling strength G1 and the applied field θ according to an embodiment of the present application. As shown in FIG. 2 , the horizontal axis of the relationship diagram 200 corresponds to the coupling strength G1,

The vertical axis of the relationship graph 200 corresponds to the signal strength of the readout signal BS1. The relationship diagram 200 includes curves CV1 to CV7.

In some embodiments, the curves CV1 - CV7 correspond to different intensities of the applied field θ. In the embodiment shown in FIG. 2 , the curves CV1 - CV7 correspond to the applied field θ with intensities of 0.3, 0.25, 0.2, 0.15, 0.1, 0.05 and 0, respectively.

1 and 2, when the external field θ (that is, the magnetic field B1) is applied to the particles PT1 and PT2, the moving devices 120 and 130 are used to change the distance D1 to obtain a corresponding one of the curves CV1-CV7, and Get the corresponding local peak. After obtaining the local peak value, the external field can be calculated according to the local peak value and formula (8)

The strength of θ.

In the following, the curve CV1 with the strength of the applied field θ being 0.3 is used as an example for illustration. When the mobile device 130 will

When the sub PT1 is close to the particle PT2 and/or when the moving device 120 moves the particle PT2 close to the particle PT1, the distance D1 from 0 decreases gradually, so that the coupling strength G1 gradually increases.

During the above operations, the coupling strength G1 has coupling strength values G21 , G11 , G22 , G23 , G12 and G24 in sequence. The sensing device 180 receives at least one of the output lights L13 and L14 to sequentially obtain the signal strength values of the readout signal BS1 corresponding to the coupling strength values G21 , G11 , G22 , G23 , G12 and G24 .

As shown in FIG. 2, when the coupling strength G1 has a coupling strength value G21, the readout signal BS1 has a signal strength value F21. When the coupling strength G1 has a coupling strength value G11, the readout signal BS1 has a signal strength value F11. When the coupling strength G1 has a coupling strength value G22, the readout signal BS1 has a signal strength value F22. When the coupling strength G1 has a coupling strength value G23, the readout signal BS1 has a signal strength value F23. When the coupling strength G1 has a coupling strength value G12, the readout signal BS1 has a signal strength value F12. When the coupling strength G1 has a coupling strength value G24, the readout signal BS1 has a signal strength value F24.

As shown in FIG. 2 , the signal strength value F11 is greater than the signal strength values F21 and F22 , and the signal strength value F12 is greater than the signal strength values F23 and F24 . It can be seen from this that the signal strength values F11 and F12 are local peaks of the curve CV1. In this way, the processing device 190 shown in FIG. 1 can calculate the strength of the external field θ to be 0.3 through the coupling strength values G11 and G12 corresponding to the signal strength values F11 and F12 and the formula (8).

For another example, when the moving device 130 moves the particle PT1 away from the particle PT2 and/or when the moving device 120 moves the particle PT2 away from the particle PT1 , the distance D1 increases, so that the coupling strength G1 decreases.

During the above operations, the coupling strength G1 has coupling strength values G24, G12, G23, G22, G11, and G21 in sequence. The sensing device 180 receives at least one of the output lights L13 and L14 to sequentially obtain the signal strength values of the readout signal BS1 corresponding to the coupling strength values G24 , G12 , G23 , G22 , G11 and G21 .

In various embodiments, the sensing device 180 and the mobile devices 120 and 130 are used to perform similar operations to obtain the local peak values of the curves CV2 - CV7 , and calculate the corresponding intensity of the applied field θ according to the local peak values.

In some approaches, the measuring device for precise measurement of the magnetic field requires an extremely low temperature operating environment, or the spatial resolution of the measuring device is limited by the manufacturing process and cannot be easily changed.

Compared with the above method, in the embodiment of the present invention, the sensing device 180 generates the readout signal BS1 corresponding to the magnetic field B1 according to the coupling strength G1 between the particle PT1 with the radical pair RP1 and the particle PT2 with the free radical pair RP2 . The magnetic field measurement system 100 does not require a low temperature environment, and can also perform precise measurements on the magnetic field B1. In some embodiments, the sensitivity of the magnetic field measurement system 100 is approximately Where nT is nano-Tesla (nano-Tesla), and Hz is Hertz.

In addition, compared with the above-mentioned method, in the embodiment of the present invention, the mobile devices 120 and 130 can be configured in various spaces to have various spatial resolutions. In some embodiments, the spatial resolution of the magnetic field measurement system 100 may be less than 10 nanometers.

FIG. 3A is a schematic diagram of a magnetic field measurement system 300A according to an embodiment of the present application. In some embodiments, the magnetic field measurement system 300A includes particles PA1 - PA3 . As shown in FIG. 3A , there is a coupling strength GA1 between the particles PA1 and PA2 . There is a coupling strength GA2 between the particles PA3 and PA2. There is a coupling strength GA3 between the particles PA1 and PA3. In some embodiments, each of the coupling strengths GA1 - GA3 is affected by a magnetic field applied on the particles PA1 - PA3 . In some embodiments, the magnetic field measurement system 300A only operates according to a part of the coupling strengths GA1 - GA3 . For example, the magnetic field measurement system 300A can only operate according to the coupling strengths GA1 and GA2. In some embodiments, the particles PA1-PA3 do not need an all-to-all connection.

Referring to FIG. 1 and FIG. 3A , the magnetic field measurement system 300A is a variation example of the magnetic field measurement system 100 . In some embodiments, two of the particles PA1-PA3 have a configuration relationship similar to that of the particles PT1 and PT2. Therefore, some details will not be repeated.

For example, in some embodiments, the fixing device 170 is used to fix the particle PA1, and the fixing device 160 is used to fix the particle PA2. The light emitting device 110 is used for emitting input lights L11 and L12 to the particles PA1 and PA2 respectively. The particles PA1 and PA2 are used to generate output lights L13 and L14 respectively according to the coupling strength GA1 . The sensing device 180 is used for generating a readout signal BS1 corresponding to the magnetic field applied to the particles PA1 and PA2 according to the output lights L13 and L14 .

In some embodiments, the particles PA1 and PA2 are also used to generate output lights L13 and L14 according to the coupling strengths GA1 - GA3 . The sensing device 180 is used for generating a readout signal BS1 corresponding to the magnetic field applied to the particles PA1 - PA3 according to the output lights L13 and L14 .

In some embodiments, the moving device 130 is used to adjust the distance between the particles PA1 and PA2 to adjust the coupling strength GA1 . In some embodiments, the moving device 130 is also used to adjust the distance between the particles PA1 and PA3 to adjust the coupling strength GA3.

Similarly, in some embodiments, the moving device 140 is used to adjust the distance between the particles PA1 and PA2 to adjust the coupling strength GA1 . In some embodiments, the moving device 140 is also used to adjust the distance between the particles PA2 and PA3 to adjust the coupling strength GA2.

In some embodiments, the magnetic field measurement system 300A further includes a moving device (not shown) for controlling the particle PA3. The moving device controlling the particle PA3 is used to adjust the distance between the particles PA1 and PA3 to adjust the coupling strength GA3. The moving device controlling the particle PA3 is also used to adjust the distance between the particles PA2 and PA3 to adjust the coupling strength GA2.

FIG. 3B is a schematic diagram of a magnetic field measurement system 300B according to an embodiment of the present application. In some embodiments, the magnetic field measurement system 300B includes particles PB1 - PB4 .

As shown in FIG. 3B , there is a coupling strength GB1 between the particles PB1 and PB2 . There is a coupling strength GB2 between the particles PB3 and PB2. There is a coupling strength GB3 between the particles PB1 and PB3. There is a coupling strength GB4 between the particles PB1 and PB4. There is a coupling strength GB5 between the particles PB4 and PB2. There is a coupling strength GB6 between the particles PB4 and PB3. In some embodiments, each of the coupling strengths GB1-GB6 is affected by a magnetic field applied on the particles PB1-PB4. In some embodiments, the magnetic field measurement system 300B only operates according to a part of the coupling strengths GB1 - GB6 . For example, the magnetic field measuring system 300B can only operate according to the coupling strengths GB1 , GB2 and GB5 , but not according to the coupling strengths GB3 , GB4 and GB6 . In some embodiments, the particles PB1-PB4 do not need an all-to-all connection.

Referring to FIG. 1 and FIG. 3B , the magnetic field measurement system 300B is a variation example of the magnetic field measurement system 100 . In some embodiments, two of the particles PB1 - PB4 have a configuration relationship similar to that of the particles PT1 and PT2 . Therefore, some details will not be repeated.

For example, in some embodiments, the fixing device 170 is used to fix the particle PB1, and the fixing device 160 is used to fix the particle PB2. The light emitting device 110 is used for emitting input lights L11 and L12 to the particles PB1 and PB2 respectively. The particles PB1 and PB2 are used to generate output lights L13 and L14 respectively according to the coupling strength GB1. The sensing device 180 is used for generating a readout signal BS1 corresponding to the magnetic field applied to the particles PB1 and PB2 according to the output lights L13 and L14 .

In some embodiments, the particles PB1 and PB2 are also used to generate output lights L13 and L14 according to part or all of the coupling strengths GB1 - GB6 . The sensing device 180 is used for generating a readout signal BS1 corresponding to the magnetic field applied to the particles PB1 - PB4 according to the output lights L13 and L14 .

In some embodiments, the moving device 130 is used to adjust the distance between the particles PB1 and PB2 to adjust the coupling strength GB1. The moving device 130 is also used to adjust the distance between the particles PB1 and PB3 to adjust the coupling strength GB3. The moving device 130 is also used to adjust the distance between the particles PB1 and PB4 to adjust the coupling strength GB4.

Similarly, in some embodiments, the moving device 140 is used to adjust the distance between the particles PB1 and PB2 to adjust the coupling strength GB1. The moving device 140 is also used to adjust the distance between the particles PB2 and PB3 to adjust the coupling strength GB2. The moving device 140 is also used to adjust the distance between the particles PB2 and PB4 to adjust the coupling strength GB5.

In some embodiments, the magnetic field measurement system 300B further includes a moving device (not shown) for controlling the particle PB3. The moving device controlling the particle PB3 is used to adjust the distance between the particles PB1 and PB3 to adjust the coupling strength GB3. The moving device controlling the particle PB3 is also used to adjust the distance between the particles PB2 and PB3 to adjust the coupling strength GB2. The moving device controlling the particle PB3 is also used to adjust the distance between the particles PB4 and PB3 to adjust the coupling strength GB6.

In some embodiments, the magnetic field measurement system 300B further includes a moving device (not shown) for controlling the particle PB4. The moving device controlling the particle PB4 is used to adjust the distance between the particles PB1 and PB4 to adjust the coupling strength GB4. The moving device controlling the particle PB4 is also used to adjust the distance between the particles PB2 and PB4 to adjust the coupling strength GB5. The moving device controlling the particle PB4 is also used to adjust the distance between the particles PB4 and PB3 to adjust the coupling strength GB6.

FIG. 4 is a schematic diagram of a magnetic field measurement device 400 according to an embodiment of the present application. In some embodiments, the magnetic field measurement device 400 includes a sensing block 410 , a moving device 420 and a laser generating device set 430 . As shown in FIG. 4 , the sensing block 410 , the laser generating device group 430 and the moving device 420 are arranged sequentially in the Z direction.

In some embodiments, the sensing block 410 is used to sense the magnetic field B4 applied to the sensing block 410 . The laser generating device group 430 is used to emit laser light Z1 - Z12 to the sensing block 410 in a direction opposite to the Z direction. The moving device 420 is used for moving the laser generating device group 430 . In some embodiments, the direction of the magnetic field B4 is the Z direction.

In some embodiments, the sensing block 410 includes sensing module columns CL1 - CL6 . In some embodiments, each of the sensing module columns CL1 - CL6 is used to sense the intensity of the magnetic field B4 around it. As shown in FIG. 4 , the sensing module columns CL1 - CL6 are arranged sequentially along the X direction which is different from the Z direction. In some embodiments, the X direction is perpendicular to the Z direction.

In some embodiments, the laser generating device group 430 includes laser generating devices LG1 - LG6 . As shown in FIG. 4 , the laser generating devices LG1 to LG6 are arranged sequentially along the X direction. The laser generating device LG1 is used to emit laser light Z1 and Z2 to the sensing module column CL1. The laser generating device LG2 is used to emit laser light Z3 and Z4 to the sensing module column CL2. The laser generating device LG3 is used to emit laser light Z5 and Z6 to the sensing module column CL3. The laser generating device LG4 is used to emit laser light Z7 and Z8 to the sensing module column CL4. The laser generating device LG5 is used to emit laser light Z9 and Z10 to the sensing module column CL5. The laser generating device LG6 is used to emit laser light Z11 and Z12 to the sensing module column CL6.

In some embodiments, the moving device 420 is used to move the laser generating devices LG1 - LG6 to adjust the positions of the sensing module columns CL1 - CL6 . For example, as shown in FIG. 4 , there is a distance D41 between the sensing module columns CL6 and CL5 . The moving device 420 is used to move the laser generating device LG5 close to the laser generating device LG6 to reduce the distance D41. For another example, the moving device 420 is used to move the laser generating device LG5 away from the laser generating device LG6 to increase the distance D41.

In some practices, the spatial resolution of the metrology device that makes fine measurements of the magnetic field is limited by the manufacturing process and cannot be easily changed.

Compared with the above method, in the embodiment of the present invention, the mobile device 420 can adjust the positions of the sensing module columns CL1 - CL6 to adjust the spatial resolution of the magnetic field measuring device 400 . In this way, the user can optimize the magnetic field measuring device 400 according to the magnetic field B4 to be measured.

In some embodiments, each of the sensing module columns CL1 - CL6 includes a plurality of sensing modules sequentially arranged along the Z direction. Each of the above-mentioned sensing modules is used for sensing the strength of the magnetic field B4 around it. In the embodiment shown in FIG. 4 , the sensing module column CL6 includes sensing modules 411 , 412 and two other sensing modules. The sensing module column CL5 includes the sensing module 413 and other three sensing modules. The sensing modules 412 and 411 are arranged in sequence along the Z direction. The sensing modules 413 and 411 are arranged in sequence along the X direction.

Referring to FIG. 1 and FIG. 4 , the magnetic field measurement device 400 is a variation example of the magnetic field measurement system 100 . The mobile devices 120 and 130 correspond to the mobile device 420 . The laser generating devices 140 and 150 correspond to the laser generating devices LG1-LG6. The light emitting device 110 , the sensing device 180 , the particles PT1 , PT2 , the fixing devices 160 , 170 and the processing device 190 correspond to the sensing modules in the sensing module columns CL1 - CL6 . Lasers Z1 to Z12 correspond to lasers LZ1 and LZ2. Therefore, some details will not be repeated.

For example, in some embodiments, the sensing module 412 includes the light emitting device 110 , the sensing device 180 , the particles PT1 , PT2 , the fixing devices 160 , 170 and the processing device 190 . The laser generating device LG6 includes laser generating devices 140 and 150 . Lasers Z11 and Z12 correspond to lasers LZ1 and LZ2 respectively. The laser Z11 is used to position the fixing device 170 . The laser Z12 is used to position the fixing device 160 . Mobile device 420 includes mobile devices 120 and 130 . The distance between the lasers Z11 and Z12 corresponds to the distance D1. The sensing module 412 is used for measuring the intensity of the magnetic field B4 around the sensing module 412 according to the coupling strength G1 of the particles PT1 and PT2.

For another example, in some embodiments, the sensing module 411 includes the light emitting device 110 , the sensing device 180 , the particles PT1 , PT2 , the fixing devices 160 , 170 and the processing device 190 . The laser generating device LG6 includes laser generating devices 140 and 150 . Lasers Z11 and Z12 correspond to lasers LZ1 and LZ2 respectively. The laser Z11 is used to position the fixing device 170 . The laser Z12 is used to position the fixing device 160 . Mobile device 420 includes mobile devices 120 and 130 . The distance between the lasers Z11 and Z12 corresponds to the distance D1. The sensing module 411 is used for measuring the intensity of the magnetic field B4 around the sensing module 411 according to the coupling strength G1 of the particles PT1 and PT2. In some embodiments, the particles in the sensing modules 411 and 412 are positioned by the same laser Z11 and Z12.

In some embodiments, other sensing modules in the sensing module columns CL1 - CL6 also have the above configuration similar to the sensing module 412 . For example, the sensing module 413 includes a first particle corresponding to the particle PT1 and a second particle corresponding to the particle PT2. Laser Z9 is used to immobilize the first particle. Laser Z10 is used to immobilize the second particle. The moving device 420 is used to move the positions of the lasers Z9 and Z10 to adjust the coupling strength between the first particle and the second particle. The sensing module 413 is used for calculating the strength of the magnetic field B4 around the sensing module 413 according to the coupling strength between the first particle and the second particle.

In some embodiments, the moving device 420 is also used to adjust the positions of the lasers Z11 and Z10 to adjust the distance D41 between the second particle and the particle PT1 in the sensing module 412 to adjust the space of the magnetic field measurement device 400 resolution.

As shown in FIG. 4 , the sensing modules in the sensing module columns CL1 - CL6 , such as the sensing module 412 , are used to perform the method 499 . Method 499 includes operations OP41-OP44.

In some embodiments, at operation OP41, radical pairs are prepared. For example, the particles PT1 and PT2 having the radical pairs RP1 and RP2 are fixed by the fixing devices 170 and 160 , and the distance D1 is adjusted by the moving devices 120 and 130 .

In some embodiments, at operation OP42, the output light of the radical pair is measured. For example, the intensities of the output lights L13 and L14 are measured by the sensing device 180 .

In some embodiments, at operation OP43, a readout signal is generated based on the output light. For example, the sensing device 180 generates the readout signal BS1 according to the intensity of the output lights L13 and L14.

In some embodiments, in operation OP44, the strength of the magnetic field is calculated according to the read signal. for example,

The processing device 190 performs calculations according to the readout signal BS1 and equations (1) to (8) to calculate the intensity of the magnetic field OB1 or B4. In various embodiments, the processing device 190 may be located within the sensing module 412

internal or external.

Although the present invention has been disclosed above with the embodiments, it is not intended to limit the present invention. Any person skilled in the art may make some changes and modifications without departing from the spirit and scope of the present invention. Therefore, this The scope of protection of the invention should be defined by the claims.

5 [Description of symbols]

100, 300A, 300B: magnetic field measurement system

B1, B4: magnetic field

PT1, PT2, PA1～PA3, PB1～PB4: particles

110: Lighting device

0 120, 130, 420: mobile device

140, 150, LG1～LG6: laser generating device

160, 170: Fixtures

180: Sensing device

190: Processing device

5L11, L12: input light

L13, L14: output light

BS1: read signal

NC1, NC2: Nuclei

RP1, RP2: free radical pair

RD1～RD4: free radicals

G1, GA1～GA3, GB1～GB6: Coupling strength θ: Applied field

G11～G12, G21～G24: Coupling strength value LZ1, LZ2, Z1～Z12: Laser FB1, FB2: Fixed body

SG1, SG2: line segment

200: Relationship Diagram

CV1～CV7: curve

D1, D41: distance

400: Magnetic field measurement equipment

410: Sensing block

430:Laser generating device group

Z: Direction

X: direction

CL1～CL6: Sensing module row

499: method

OP41～OP44: Operation.

Claims (10)

1. A method of magnetic field measurement, comprising:

applying a magnetic field to the first particles and the second particles;

generating, by the first particle, a first output light according to the magnetic field and a first coupling strength between the first particle and the second particle; and

the intensity of the magnetic field is calculated based on the intensity of the first output light.

2. The method of claim 1, wherein generating the first output light comprises:

adjusting the distance between the first particle and the second particle to adjust the first coupling strength; and

the intensity of the first output light is adjusted by adjusting the first coupling intensity.

3. The magnetic field measurement method of claim 2, further comprising:

fixing the first particles by a first laser; and

fixing the second particles by a second laser;

wherein adjusting the distance between the first particle and the second particle comprises:

at least one of the position of the first laser and the position of the second laser is adjusted.

4. The method of claim 1, wherein calculating the strength of the magnetic field comprises:

generating an output signal according to the intensity of the first output light; and

the strength of the magnetic field is calculated according to at least one coupling strength value of the first coupling strength corresponding to at least one local peak of the output signal.

5. A magnetic field measurement system, comprising:

the first particles are used for generating first output light according to the first coupling strength and the magnetic field;

a second particle for coupling with the first particle with the first coupling strength; and

the sensing device is used for generating a read-out signal corresponding to the intensity of the magnetic field according to the intensity of the first output light.

6. The magnetic field measurement system of claim 5, further comprising:

a first moving device for adjusting the distance between the first particle and the second particle to adjust the first coupling strength,

wherein the distance is perpendicular to the direction of the magnetic field.

7. The magnetic field measurement system of claim 6, further comprising:

the processing device is used for calculating the intensity of the magnetic field according to at least one coupling intensity value of the first coupling intensity corresponding to at least one local peak value of the read-out signal after the first moving device adjusts the distance.

8. A magnetic field measurement apparatus, comprising:

the first sensing module is used for sensing the intensity of the magnetic field around the first sensing module;

the second sensing module is used for sensing the intensity of the magnetic field around the second sensing module;

the first laser generating device is used for positioning the first sensing module;

the second laser generating device is used for positioning the second sensing module; and

and the moving device is used for moving at least one of the first laser generating device and the second laser generating device so as to adjust the distance between the first sensing module and the second sensing module.

9. The magnetic field measurement apparatus of claim 8, wherein the first sensing module comprises:

processing means for calculating the strength of the magnetic field around the first sensing module based on the coupling strength between the first particles and the second particles,

the first laser generating device is also used for generating laser and fixing the first particles through the laser.

10. The magnetic field measurement apparatus of claim 9, further comprising:

a third sensing module including third particles and fourth particles, the third sensing module being configured to calculate the strength of the magnetic field around the third sensing module according to the coupling strength between the third particles and the fourth particles,

wherein the first laser generating device is further configured to fix the third particles by the laser.