CN116511719A - Method and system for preparing micro-nano structure by laser-electron beam and micro-nano structure - Google Patents

Abstract

The invention discloses a method, a system and a micro-nano structure for preparing a micro-nano structure with a laser-electron beam. Coat the matching material on the surface of the substrate to form a film; focus the laser generated by the laser on the surface of the film, and control the scanning direction of the laser on the film surface by moving the scanning platform; adjust the processing parameters of the laser to achieve the light field on the film The surface of the periodic micro-nano structure has a power density processing window per unit area, forming an erasable periodic micro-nano structure; focusing the electron beam on the erasable periodic micro-nano structure, adjusting the processing parameters of the electron beam, and The beam reaches the processing window of modified erasable periodic micro-nanostructures to form permanent micro-nanostructures. The invention combines laser surface micro-nano preparation technology with electron beam exposure technology, fully utilizes the high efficiency of laser irradiation and the high precision of electron beam irradiation, and realizes the effect of large-area preparation of high-precision micro-nano structure.

Description

Method and system for preparing micro-nano structure by laser-electron beam and micro-nano structure

technical field

The invention relates to the technical field of micro-nano structure preparation, in particular to a laser-electron beam preparation method, system and micro-nano structure.

Background technique

Surface micro-nano structure processing can improve or endow materials with some novel properties, such as wettability, optical properties, friction and wear properties, catalytic properties, antibacterial properties, etc. People have developed a variety of micro-nano processing technologies. Among them, laser surface micro-nano preparation technology uses focused laser beams to directly write or directly induce micro-nano structures on the surface of materials; electron beam exposure technology uses extremely short-wavelength focused electron beams to directly act on On the surface of materials sensitive to electrons, a micro-nano structure consistent with the scanning path is prepared.

Common laser surface micro-nano preparation technologies include: laser direct writing technology, laser-induced periodic surface structure technology and laser interference direct writing technology.

Laser surface micro-nano preparation technology has the advantages of wide application of materials, flexibility, high efficiency and environmental friendliness. Electron beam lithography technology has the advantages of ultra-high resolution (the limit size can reach <10nm) and flexible preparation, and it is a powerful way to prepare high-precision nanostructures and devices.

However, the accuracy of laser direct writing technology is usually limited by the diffraction limit. Laser-induced periodic surface structure technology is not suitable for all materials. The optical device required by laser interference direct writing technology is complex and expensive. Electron beam lithography technology has low exposure efficiency and complicated control. It is only suitable for electron-sensitive materials and is difficult to apply to mass production.

Contents of the invention

The present invention provides a method, system and micro-nano structure for laser-electron beam preparation of micro-nano structure, in order to solve the problem that the laser surface micro-nano preparation technology has precision limited by diffraction limit, limited scope of application, complex optical device and low cost. High, low exposure efficiency and complex control of electron beam exposure technology, only suitable for electron-sensitive materials, difficult to apply to technical problems in large-scale production, to achieve overall high efficiency and local high precision in the preparation of micro-nano structures, preparation efficiency and preparation accuracy common improvement.

In order to solve the above technical problems, in the first aspect, an embodiment of the present invention provides a method for preparing a micro-nano structure with a laser-electron beam, the method comprising:

Coating matching material on the surface of the substrate to form a thin film;

placing the substrate coated with matching materials on a moving scanning platform, focusing the laser light generated by the laser on the surface of the film, and controlling the scanning direction of the laser on the surface of the film through the moving scanning platform;

Adjusting the processing parameters of the laser so that the optical field reaches the processing window of power density per unit area that produces periodic micro-nano structures on the surface of the film, so as to form erasable periodic micro-nano structures;

Focusing the electron beam on the erasable periodic micro-nano structure, adjusting the processing parameters of the electron beam, and bringing the electron beam to the processing window of the modified erasable periodic micro-nano structure to form a permanent micro-nano structure structure;

The permanent micro-nano structure is ultrasonically cleaned to remove the remaining matching material and the erasable periodic micro-nano structure.

In a further embodiment, the matching material is an organic pigment with characteristics of partial transmission and partial absorption of laser light.

In a further embodiment, the processing parameters of the laser include pulse width, effective number of pulses, laser flux and repetition rate, the range of the pulse width is 10 ns-50 ns, the range of the effective number of pulses is 20-20000, the The laser flux ranges from 0.381J/cm ² to 1.651J/cm ² , and the repetition frequency ranges from 1kHz to 40kHz.

In a further embodiment, the output pulse of the laser generates a periodic electric field and a temperature field on the surface of the film, the peak value of the electric field intensity of the periodic electric field and the temperature peak value of the temperature field are both within the damage threshold range, and the damage The threshold range is determined by the damage threshold of the substrate and matching material.

In a further embodiment, the electron beam processing parameters include acceleration voltage and irradiation time, the acceleration voltage ranges from 0.1-30kV, and the irradiation time is 10s or more.

In a further embodiment, when the light field reaches the processing window of power density per unit area for generating periodic micro-nano structures on the surface of the film, the organic pigment is partially carbonized by continuous laser irradiation to form a Erase periodic micro-nanostructures.

In a further embodiment, the adjustment of the processing parameters of the electron beam so that the electron beam reaches the processing window of the modified and erasable periodic micro-nano structure to form a permanent micro-nano structure includes:

Adjust the processing parameters of the electron beam, and the energy of the electron beam can reach the chemical bond breaking and/or crosslinking reaction of the polymer in the organic pigment, so as to cure the erasable periodic micro-nano structure modification into a permanent Sexual micro-nano structure.

In the second aspect, the micro-nano structure in the embodiment of the present invention is prepared by the method described in any one of the claims of the present invention.

In a further embodiment, the periodic micro-nano structure is a micro-nano grating with a periodic range of

950nm-1020nm.

In a third aspect, an embodiment of the present invention provides a laser-electron beam preparation system for micro-nano structures, the system comprising:

The system includes: a coating unit, a laser processing unit, an electron beam modification unit and an ultrasonic cleaning unit, wherein,

The coating unit is used to coat the matching material on the surface of the substrate to form a thin film;

The laser processing unit includes a laser, a focusing lens and a moving scanning platform;

The laser is used to generate laser light and focus on the surface of the film; and adjust the processing parameters of the laser to make the light field reach the processing window of power density per unit area that produces periodic micro-nano structures on the surface of the film , to form a first periodic micro-nano structure; the focusing lens is used to focus the laser light generated by the laser on the surface of the film; the moving scanning platform is used to carry the substrate coated with matching materials, to controlling the scanning direction of the laser on the surface of the film;

The electron beam modifying unit is used to focus the electron beam on the erasable periodic micro-nano structure, adjust the processing parameters of the electron beam, and make the electron beam reach the modified erasable periodic micro-nano structure processing window to form permanent micro-nano structures;

The ultrasonic cleaning unit is used to ultrasonically clean the permanent micro-nano structure to remove the remaining matching material and the erasable periodic micro-nano structure.

Embodiments of the present invention provide a laser-electron beam preparation method, system and micro-nano structure. Firstly, the thin film formed by the matching material coated on the substrate is irradiated with laser beam, and it is initially carbonized and modified to form an erasable periodic micro-nano structure, and then the periodic micro-nano structure can be erased by electron beam irradiation. Nano structure, so that the chemical bond breaking and/or cross-linking reaction of the polymer in the organic pigment can be erased and the periodic micro-nano structure modified and solidified into a permanent micro-nano structure. The present invention combines laser surface micro-nano preparation technology with electron beam exposure technology, laser irradiation generates erasable periodic micro-nano structures, and then electron beams are used to prepare finer micro-nano structures, giving full play to the high efficiency of laser irradiation. It can achieve the effect of large-area preparation of high-precision micro-nano structure through the refinement of electron beam irradiation and electron beam irradiation.

Description of drawings

Fig. 1 is a schematic diagram of the steps of a method for preparing a micro-nano structure by laser-electron beam provided by an embodiment of the present invention;

Fig. 2 is a schematic flow chart of a method for preparing a micro-nano structure by laser-electron beam provided by an embodiment of the present invention;

Fig. 3 is a comparison diagram of a permanent micro-nano structure obtained by curing an erasable micro-nano structure with a laser and an electron beam provided by an embodiment of the present invention;

Fig. 4 is a schematic diagram of a laser-electron beam preparation system of a micro-nano structure provided by an embodiment of the present invention;

Fig. 5 is a scanning electron microscope result diagram of preparing a micro-nano structure on a gold surface by adopting the laser-electron beam preparation method provided by the present invention according to the embodiment of the present invention.

Detailed ways

The embodiment of the present invention will be explained in detail below in conjunction with the accompanying drawings. The examples given are only for the purpose of illustration, and cannot be interpreted as limiting the present invention. The accompanying drawings are only for reference and description, and do not constitute the scope of patent protection of the present invention. limit. Based on the embodiments of the present invention, all other embodiments obtained by persons of ordinary skill in the art without creative efforts fall within the protection scope of the present invention.

Embodiment one

Please refer to Fig. 1, in an embodiment of the present invention, a method for preparing a micro-nano structure with a laser-electron beam, the method includes the following steps S1-S5:

S1. Coating a matching material on the surface of the substrate to form a thin film.

S2. Place the substrate coated with matching materials on a moving scanning platform, focus the laser light generated by the laser on the surface of the film, and control the scanning direction of the laser light on the surface of the film through the moving scanning platform.

S3. Adjusting the processing parameters of the laser so that the optical field reaches the processing window of power density per unit area for generating periodic micro-nano structures on the surface of the film, so as to form erasable periodic micro-nano structures.

S4. Focus the electron beam on the erasable periodic micro-nano structure, adjust the processing parameters of the electron beam, and make the electron beam reach the processing window of the modified erasable periodic micro-nano structure to form a permanent micro-nano structure.

S5. Ultrasonic cleaning the permanent micro-nano structure to remove the remaining matching material and the erasable periodic micro-nano structure.

Please refer to Figure 1 and Figure 2. In the embodiment of the present invention, in order to solve the contradiction between the existing laser surface micro-nano preparation technology and the electron beam exposure technology in the preparation efficiency and preparation accuracy, the laser surface micro-nano preparation technology and the electron beam exposure technology are combined. combined with electron beam lithography. The laser beam acts on the film formed by the matching material coated on the surface of the base layer, causing partial carbonization and modification of the matching material. At this time, the periodic micro-nano structure formed is an erasable micro-nano structure, which can be wiped by a specific solvent. remove. In order to improve the precision of micro-nano structure preparation, electron beams are used to irradiate erasable periodic micro-nano structures, which can prepare finer micro-nano structures in a shorter period of time compared with laser surface micro-nano preparation technology.

In the embodiment of the present invention, the matching material is an organic pigment with characteristics of partial transmission and partial absorption of laser light. The laser part is transmitted on the substrate-film interface, and the generated plasmons and interference effects determine the periodic electric field distribution, thereby generating a periodic temperature field. The peak value of the electric field intensity of the periodic electric field and the temperature peak value of the temperature field are both at Within the damage threshold range, the damage threshold range is determined by the damage threshold of the substrate and the matching material, and the film can be irradiated without damaging the substrate surface. The matching material absorbs part of the laser energy, and when the peak value of the electric field intensity or temperature peak value of the periodic electric field and temperature field exceeds the damage threshold of the matching material, it heats up to melt, vaporize, and modify, and then etches periodic microstructures on the film. At this time, the matching material is partially carbonized under the action of the laser, but its solubility is not changed, and the formed micro-nano structure can still be erased by a special solvent. In the embodiment of the present invention, nigrosine is taken as an example for illustration and picture display.

The matching material is coated on the surface of the substrate to form a thin film, and the thin film formed by the matching material on the substrate is used as the material layer of the micro-nano structure prepared by laser, and the preparation of the micro-nano structure can be completed without destroying the substrate. There is no limit to the type of substrate, which can be metal, semiconductor or dielectric, but the damage threshold of the matching material should be smaller than the damage threshold of the substrate, so as to ensure that the substrate will not be damaged when the film formed by the matching material is modified by laser irradiation. destroy.

Specifically, the substrate coated with the matching material is placed on a moving scanning platform, and the moving scanning platform is used to control the scanning direction of the laser on the surface of the film. First adjust the processing parameters of the laser. The processing parameters of the laser include pulse width, effective pulse number, laser flux and repetition frequency. The pulse width range is 10ns-50ns, the effective pulse number range is 20-20000, and the laser flux range is 0.381J /cm ² -1.651J/cm ² , the repetition frequency range is 1kHz-40kHz. Only when the laser flux range of the laser reaches the specified value, through continuous laser irradiation, the film formed by the organic pigment can be partially carbonized under the action of the electric field and energy field generated by the laser to form a rewritable periodic micro nanostructure.

For different substrates and matching materials, according to the damage threshold of the substrate and matching materials, the absorption peak of the matching material spectrum determines the processing parameters such as laser pulse width, effective pulse number, laser flux and repetition frequency, etc., to determine each substrate The laser processing parameters combined with matching materials are used as parameter data for the mass production of micro-nano structures disclosed in the embodiments of the present invention, so as to improve the quality and efficiency of laser-fabricated micro-nano structures.

After completing the preparation of the erasable periodic micro-nano structure, in order to improve the precision of the preparation of the micro-nano structure, the electron beam is used to cure and modify the erasable periodic micro-nano structure, and the processing parameters of the electron beam are adjusted. In the example, the acceleration voltage and irradiation time of the electron beam are mainly adjusted, the acceleration voltage range is 0.1-30kV, and the irradiation time is 10s or more. Adjust the processing parameters of the electron beam so that the energy of the electron beam reaches the level of chemical bond breakage and/or crosslinking reaction of the polymer in the organic pigment. The permanent micro-nano structure is modified and solidified into a permanent micro-nano structure.

If a laser is used to cure the erasable micro-nano structure, the period of the formed micro-nano structure is close to the wavelength level. Due to the limitation of the wavelength of the laser (about 1 μm), the edges of the micro-nano structure are generally rough and cannot be prepared finer. micro-nano structure. Since the beam diameter of the focused electron beam is much smaller than the laser beam spot, it has ultra-high resolution (the limit size can reach <10nm) and preparation flexibility, and can generate finer micro-nano structures with sharper edges. As shown in Figure 3, the comparison diagram of the permanent micro-nano structure obtained by curing the erasable micro-nano structure with laser and electron beam, the area cured by laser beam is the smallest spot size, the edge is rough, and its fineness cannot be controlled; The area cured by the electron beam is smaller, the edges of the cured rectangle are sharper and clearer, and the micro-nano structure is finer. This is an effect that cannot be achieved by laser modification and curing of erasable periodic micro-nano structures.

In the embodiment of the present invention, the matching material is an organic pigment, which is difficult to be directly partially carbonized and modified by the focused electron beam of an electron microscope. Even if the energy of the electron beam is increased, a long time of electrons is required to carbonize and modify the organic pigment. Beam irradiation time, low production efficiency. In the embodiment of the present invention, the organic pigments selected in the present invention are firstly carbonized and modified by laser beam irradiation to form an erasable periodic micro-nano structure, and then irradiated by electron beams for a short time. Curing and modifying the erasable periodic micro-nano structure, adopting the laser-electron beam preparation method of the micro-nano structure provided by the embodiment of the present invention, the curing modification of the erasable periodic micro-nano structure can be completed in at least 10s , to generate a permanent micro-nano structure, on the premise of ensuring the preparation accuracy of the micro-nano structure, the efficiency of the preparation of the micro-nano structure can be greatly improved, and the contradiction between the overall high efficiency and the local high precision of the preparation of the micro-nano structure can be overcome, and the preparation efficiency can be realized. Together with the improvement of preparation accuracy.

The micro-nano structure prepared by the laser-electron beam preparation method provided in the embodiment of the present invention is a micro-nano grating with a period range of 950-1020 nm.

In the embodiment of the present invention, in order to solve the problem that the precision of the laser surface micro-nano preparation technology is limited by the diffraction limit, the scope of application is limited, the optical device is complicated, the cost is high, the exposure efficiency of the electron beam exposure technology is low, and the control is complicated, which is only applicable to Electron-sensitive materials are difficult to apply to the technical problems of large-scale production, and a laser-electron beam preparation method for micro-nano structures is provided. Firstly, the thin film formed by the matching material coated on the substrate is irradiated with laser beam, and it is initially carbonized and modified to form an erasable periodic micro-nano structure, and then the periodic micro-nano structure can be erased by electron beam irradiation. Nano structure, so that the chemical bond breaking and/or cross-linking reaction of the polymer in the organic pigment can be erased and the periodic micro-nano structure modified and solidified into a permanent micro-nano structure. The present invention combines laser surface micro-nano preparation technology with electron beam exposure technology, laser irradiation generates erasable periodic micro-nano structures, and then electron beams are used to prepare finer micro-nano structures, giving full play to the high efficiency of laser irradiation. The combination of high precision and high precision of electron beam irradiation realizes the effect of large-scale preparation of high-precision micro-nano structures.

Embodiment two

Correspondingly, as shown in FIG. 4 , based on a method for preparing a micro-nano structure with a laser-electron beam, an embodiment of the present invention also provides a system for preparing a micro-nano structure with a laser-electron beam. The system includes: a coating unit 1. Laser processing unit 2, electron beam modification unit 3 and ultrasonic cleaning unit 4, wherein,

The coating unit 1 is used to coat the matching material on the surface of the substrate to form a thin film;

The laser processing unit 2 includes a laser 201, a focusing lens 202 and a moving scanning platform 203;

The laser 201 is used to generate laser light and focus it on the surface of the film; and adjust the processing parameters of the laser to process the light field to a power density per unit area that produces periodic micro-nano structures on the surface of the film window to form an erasable periodic micro-nano structure; the focusing lens 202 is used to focus the laser light generated by the laser on the surface of the film; the moving scanning platform 203 is used to carry the completed matching material coating coated substrate to control the scanning direction of the laser on the surface of the film;

The electron beam modification unit 3 is used to focus the electron beam on the erasable periodic micro-nano structure, adjust the processing parameters of the electron beam, and make the electron beam reach the modified erasable periodic micro-nano structure. Structural processing windows to form permanent micro-nano structures;

The ultrasonic cleaning unit 4 is used to ultrasonically clean the permanent micro-nano structure to remove the remaining matching material and the erasable periodic micro-nano structure.

As a preferred solution of this embodiment, the laser 201 is an Nd:YAG infrared nanosecond laser with a wavelength of 1064nm, a pulse width in the range of 10ns-50ns, a repetition rate in the range of 1kHz-10kHz, and a laser flux in the range of 0.381J/cm ² -1.651J/cm ² ,; the focal length of the focusing lens 202 is 15cm, and the diameter of the focusing spot is 100μm; the period of the prepared micro-nanostructure grating is about 1μm, specifically 950-1020nm. The motion scanning platform 203 is a stepper motor, the moving speed range of the stepper motor is 0.1mm/s-0.6mm/s, and the filling pitch range is 0.1mm-0.2mm. The stepper motor can be replaced by the galvanometer system for large-area micro Preparation of nanostructures. The electron beam modifying unit 3 is the electron beam generated by the Schottky field emission filament in the scanning electron microscope. The accelerating voltage range is 0.1-30kV, and the beam current range is 0-100nA, which are continuously adjustable.

Use a beam expander to expand the laser beam to improve the beam quality. After the expanded laser beam is focused on the surface of the film through the focusing lens 202, the processing parameters such as the pulse width, effective pulse number, laser flux and repetition frequency of the laser 201 are adjusted. Adjustment is made so that the output laser flux range of the laser 201 reaches 0.381J/cm ² -1.651J/cm ² , so as to prepare an erasable micro-nano structure. Focusing the electron beam on the erasable periodic micro-nano structure, adjusting the acceleration voltage and irradiation time of the electron beam, and adjusting the energy of the electron beam of the electron beam modification unit 3 to make the polymer in the organic pigment produce Chemical bond breaking and/or cross-linking reactions to modify and cure erasable periodic micro-nanostructures into permanent micro-nanostructures.

For specific limitations on a system for preparing micro-nano structures with laser-electron beams, please refer to the above-mentioned limitations on the method for preparing micro-nano structures with laser-electron beams, which will not be repeated here. Those skilled in the art can appreciate that the various modules and steps described in connection with the disclosed embodiments of the present invention can be implemented by hardware, software or a combination of both. Whether these functions are executed by hardware or software depends on the specific application and design constraints of the technical solution. Those skilled in the art may use different methods to implement the described functions for each specific application, but such implementation should not be regarded as exceeding the scope of the present invention.

Embodiment three

In the embodiment of the present invention, the laser-electron beam composite processing of grating-type micro-nano structures is realized on the surface of metal gold through the above-mentioned method and system for preparing micro-nano structures on the matching layer surface by laser-electron beams.

The coating method is a manual coating method, the coating tool is a marker pen, the base material is metal gold, and the matching material is a marker pen ink whose main component includes aniline black. Laser 201 adopts Nd:YAG infrared nanosecond laser, its wavelength is 1064nm, the pulse width is selected as 50ns, the repetition frequency is selected as 1kHz, linearly polarized light, the focal length of focusing lens 202 is 15cm, and the diameter of focusing spot is 100μm. Laser processing parameters Among them, the laser flux is selected as 1.4J/cm ² , and the number of effective pulses is selected as 250. Among the electron beam processing parameters, the acceleration voltage is selected as 5kV, and the irradiation time is selected as 120s. The specific solvent is absolute ethanol.

Coating the alcohol-based marker ink containing nigrosine on the surface of the gold substrate to prepare a film, placing the coated sample on the motion scanning platform 203, adjusting the pulse width, effective pulse number, laser flux and repetition rate of the laser 201, The laser beam emitted by the laser 201 is expanded by using a beam expander, and the expanded laser beam passes through the focusing lens 202 and then focuses on the coated gold substrate surface film, and an erasable periodic micro-nano structure is produced by continuous irradiation, as shown in the figure As shown in the light-colored area in the center circle spot in the upper left figure of 5, the laser-induced plasmon at the metal interface (approximately sinusoidal electric field distribution) engraves a grating structure on the ink, and the matching material has not been completely carbonized and modified , still soluble in absolute ethanol. Then adjust the acceleration voltage and irradiation time of the electron beam, irradiate the white dotted rectangular area in the center, modify the erasable micro-nano structure into a permanent micro-nano structure, match the chemical bond breaking or cross-linking reaction of the polymer in the material, Become a permanent micro-nano structure insoluble in absolute ethanol. As shown in the upper right figure of Figure 5, after ultrasonic cleaning in absolute ethanol, only the permanent micro-nano structure in the rectangular area irradiated by the electron beam is left, and the micro-nano structure and the matching layer material not irradiated by the laser can be erased All are removed. As shown in the lower left figure of Figure 5, erasable micro-nano structures are produced within the irradiation range of the laser spot, but the edges are rough and irregular. As shown in the lower right figure of Figure 5, the rectangular area modified by the electron beam has sharp edges and high fineness, and the substrate is not damaged by the influence of laser and electron beam irradiation. The grating micro-nano structure prepared in this example The period is about 1 μm, between 9500nm and 1020nm.

In the embodiment of the present invention, a marker pen is directly used to coat the matching layer on the surface of the precious metal, and the film preparation is convenient and the overall cost is low. Nanostructure with grating properties. It can be applied to the preparation of composite micro-nano structures, using lasers to prepare large-area erasable periodic micro-nano structures, using electron beam curing to modify erasable periodic micro-nano structures to prepare high-precision permanent micro-nano structures, and to prepare multi-scale Composite micro-nano structure.

In summary, the present invention combines laser and electron beam micro-nano structure preparation technology. Compared with single laser or electron beam preparation micro-nano structure preparation technology, it has the advantages of large-area preparation and high precision. The composite micro-nano structure The preparation process is flexible.

In this embodiment, a laser-electron beam preparation method, system, and micro-nano structure address the technical problem of the contradiction between preparation efficiency and preparation accuracy of the existing laser surface micro-nano preparation technology or electron beam exposure technology. Firstly, the thin film formed by the matching material coated on the substrate is irradiated with laser beam, and it is initially carbonized and modified to form an erasable periodic micro-nano structure, and then the periodic micro-nano structure can be erased by electron beam irradiation. Nano structure, so that the chemical bond breaking and/or cross-linking reaction of the polymer in the organic pigment can be erased and the periodic micro-nano structure modified and solidified into a permanent micro-nano structure. The present invention combines laser surface micro-nano preparation technology with electron beam exposure technology, laser irradiation generates erasable periodic micro-nano structures, and then electron beams are used to prepare finer micro-nano structures, giving full play to the high efficiency of laser irradiation. The combination of high precision and high precision of electron beam irradiation realizes the effect of large-scale preparation of high-precision micro-nano structures.

The above-mentioned examples only express several preferred implementation modes of the present invention, and the description thereof is relatively specific and detailed, but should not be construed as limiting the patent scope of the invention. It should be noted that those skilled in the art can make some improvements and substitutions without departing from the technical principle of the present invention, and these improvements and substitutions should also be regarded as the protection scope of the present invention. Therefore, the protection scope of the patent for the present invention should be based on the protection scope of the claims.

Claims (10)

1. A method of preparing a micro-nanostructure with a laser-electron beam, the method comprising:

coating matching materials on the surface of a substrate to form a film;

placing the substrate coated with the matching material on a motion scanning platform, focusing laser generated by a laser on the surface of the film, and controlling the scanning direction of the laser on the surface of the film through the motion scanning platform;

adjusting the processing parameters of the laser, and enabling the light field to reach a processing window of unit area power density for generating a periodic micro-nano structure on the surface of the film so as to form an erasable periodic micro-nano structure;

focusing an electron beam on the erasable periodic micro-nano structure, adjusting processing parameters of the electron beam, and enabling the electron beam to reach a processing window for modifying the erasable periodic micro-nano structure so as to form a permanent micro-nano structure;

and ultrasonically cleaning the permanent micro-nano structure, and removing the residual matching material and the erasable periodic micro-nano structure.

2. The method of preparing micro-nano structure according to claim 1, wherein the matching material is an organic pigment having characteristics of partial transmission and partial absorption of laser light.

3. The method of preparing micro-nano structure according to claim 2, wherein the processing parameters of the laser include pulse width, effective pulse number, laser flux and repetition rate, the pulse width is in the range of 10ns-50ns, the effective pulse number is in the range of 20-20000, and the laser flux is in the range of 0.381J/cm ² -1.651J/cm ² The repetition frequency ranges from 1kHz to 40kHz.

4. The method of claim 3, wherein the output pulse of the laser produces a periodic electric field and a temperature field at the surface of the thin film, the peak electric field strength of the periodic electric field and the peak temperature of the temperature field both being within a damage threshold range, the damage threshold range being determined by the damage threshold of the substrate and the matching material.

5. The method of preparing micro-nano structure according to claim 2, wherein the electron beam processing parameters include an acceleration voltage and an irradiation time, the acceleration voltage is in the range of 0.1-30kV, and the irradiation time is 10s and above.

6. The method for preparing micro-nano structure according to claim 2, wherein the method comprises the steps of,

and when the light field reaches a unit area power density processing window for generating the periodic micro-nano structure on the surface of the film, the organic pigment is partially carbonized through continuous laser irradiation to form the erasable periodic micro-nano structure.

7. The method of claim 2, wherein adjusting the processing parameters of the electron beam to achieve the processing window of the modified erasable periodic micro-nanostructure comprises:

and adjusting the processing parameters of the electron beam, and enabling the energy of the electron beam to achieve chemical bond fracture and/or crosslinking reaction of the polymer in the organic pigment so as to modify and solidify the erasable periodic micro-nano structure into a permanent micro-nano structure.

8. A micro-nano structure, characterized in that it is prepared by the method according to any one of claims 1 to 7.

9. The micro-nano structure of claim 8, wherein the periodic micro-nano structure is a micro-nano grating with a period ranging from 950nm to 1020nm.

10. A system for laser-electron beam fabrication of micro-nano structures, the system comprising: a coating unit, a laser processing unit, an electron beam modification unit and an ultrasonic cleaning unit, wherein,

the coating unit is used for coating matching materials on the surface of the substrate to form a film;

the laser processing unit comprises a laser, a focusing lens and a motion scanning platform;

the laser is used for generating laser and focusing on the surface of the film; adjusting the processing parameters of the laser, and enabling the light field to reach a unit area power density processing window for generating a periodic micro-nano structure on the surface of the film so as to form an erasable periodic micro-nano structure; the focusing lens is used for focusing laser generated by the laser on the surface of the film; the motion scanning platform is used for bearing a substrate coated with a matching material so as to control the scanning direction of laser on the surface of the film;

the electron beam modification unit is used for focusing an electron beam on the erasable periodic micro-nano structure, adjusting processing parameters of the electron beam, and enabling the electron beam to reach a processing window for modifying the erasable periodic micro-nano structure so as to form a permanent micro-nano structure;

the ultrasonic cleaning unit is used for carrying out ultrasonic cleaning on the permanent micro-nano structure to remove the remained matching material and the erasable periodic micro-nano structure.