CN116384328A - Correction method and device for fitting curve of layout graph and storage medium - Google Patents
Correction method and device for fitting curve of layout graph and storage medium Download PDFInfo
- Publication number
- CN116384328A CN116384328A CN202310189315.4A CN202310189315A CN116384328A CN 116384328 A CN116384328 A CN 116384328A CN 202310189315 A CN202310189315 A CN 202310189315A CN 116384328 A CN116384328 A CN 116384328A
- Authority
- CN
- China
- Prior art keywords
- potential energy
- energy field
- curve
- layout
- traction source
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Images
Classifications
-
- G—PHYSICS
- G06—COMPUTING OR CALCULATING; COUNTING
- G06F—ELECTRIC DIGITAL DATA PROCESSING
- G06F30/00—Computer-aided design [CAD]
- G06F30/30—Circuit design
- G06F30/39—Circuit design at the physical level
- G06F30/398—Design verification or optimisation, e.g. using design rule check [DRC], layout versus schematics [LVS] or finite element methods [FEM]
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02D—CLIMATE CHANGE MITIGATION TECHNOLOGIES IN INFORMATION AND COMMUNICATION TECHNOLOGIES [ICT], I.E. INFORMATION AND COMMUNICATION TECHNOLOGIES AIMING AT THE REDUCTION OF THEIR OWN ENERGY USE
- Y02D10/00—Energy efficient computing, e.g. low power processors, power management or thermal management
Landscapes
- Engineering & Computer Science (AREA)
- Computer Hardware Design (AREA)
- Physics & Mathematics (AREA)
- Theoretical Computer Science (AREA)
- Evolutionary Computation (AREA)
- Geometry (AREA)
- General Engineering & Computer Science (AREA)
- General Physics & Mathematics (AREA)
- Management, Administration, Business Operations System, And Electronic Commerce (AREA)
- Semiconductor Memories (AREA)
- Complex Calculations (AREA)
Abstract
The application relates to a correction method, a correction device and a storage medium of a fitting curve of a layout graph, wherein the method comprises the following steps: calculating a first potential energy field of a first fitting curve to be corrected of the layout graph; calculating a second potential energy field of a traction source of the layout graph; and generating a corrected second fitting curve of the layout graph according to the first potential energy field and the second potential energy field. Calculating a second potential energy field of a traction source of the layout graph by calculating a first potential energy field of a first fitting curve to be corrected of the layout graph, and generating a corrected second fitting curve of the layout graph according to the first potential energy field and the second potential energy field. Therefore, the fitting of the local detail characteristics of the layout graph is realized, and the problem that the local detail characteristics of the layout graph cannot be fitted by the existing curve fitting method is solved.
Description
Technical Field
The present invention relates to the field of chip manufacturing, and in particular, to a method, an apparatus, and a storage medium for correcting a fitting curve of a layout pattern.
Background
Curve fitting is applied in multiple steps in the field of chip manufacturing. For example, prediction of the metrology patterns on a wafer, it is desirable to fit the metrology patterns on the wafer closest to the actual production results based on the chip design patterns in advance. The optimization and manufacture of the novel curve mask also introduces more curve fitting tools for optimizing the fitting curve of the most suitable layout graph to mass-produce chips.
In layout processing in the electronic design automation industry, there is a very complex requirement for graph curve fitting. Most curve fits are based on conventional mathematical curve models such as elliptic curves, bezier curves and variations thereof.
The existing curve fitting method cannot fit local detail characteristics of the layout graph.
Disclosure of Invention
The embodiment provides a correction method, device and storage medium for a fitting curve of a layout graph, so as to solve the problem that the existing curve fitting method cannot fit local detail characteristics of the layout graph.
In a first aspect, in this embodiment, a method for correcting a fitted curve of a layout pattern is provided, where the method includes:
calculating a first potential energy field of a first fitting curve to be corrected of the layout graph;
calculating a second potential energy field of a traction source of the layout graph;
and generating a corrected second fitting curve of the layout graph according to the first potential energy field and the second potential energy field.
In some embodiments, the generating a modified second fitted curve of the layout pattern according to the first potential energy field and the second potential energy field includes:
calculating the first potential energy field and the second potential energy field to obtain a third potential energy field;
and generating a corrected second fitting curve of the layout graph according to the third potential energy field.
In some embodiments, the generating a modified second fitted curve of the layout pattern according to the third potential energy field includes:
calculating the position where potential energy in the third potential energy field is kept unchanged;
and generating a corrected second fitting curve of the layout graph according to the position where the potential energy is maintained unchanged.
In some of these embodiments, the method further comprises:
acquiring a target area of the layout graph; the length or width of the target area is smaller than a preset value;
and determining a traction source of the layout graph according to the target area.
In some of these embodiments, the method further comprises: and obtaining a first fitting curve to be corrected of the layout graph according to an elliptic model algorithm.
In some of these embodiments, the calculating the first potential energy field of the first fitted curve to be corrected of the layout pattern includes:
and obtaining a step function of the first fitting curve, and performing Gaussian convolution on the step function of the first fitting curve to obtain a first potential energy field of the first fitting curve.
In some of these embodiments, the calculating the second potential energy field of the traction source of the layout pattern includes:
and acquiring a step function of the traction source, and performing Gaussian convolution on the step function of the traction source to obtain a second potential energy field of the traction source.
In some of these embodiments, the calculating the second potential energy field of the traction source of the layout pattern includes:
acquiring a target traction source point and a weight coefficient of the target traction source point;
and generating the traction source according to the target traction source point and the weight coefficient of the target traction source point.
In a second aspect, in this embodiment, there is provided a correction device for a fitting curve of a layout pattern, where the device includes:
the first calculation module is used for calculating a first potential energy field of a first fitting curve to be corrected of the layout graph;
the second calculation module is used for calculating a second potential energy field of the traction source of the layout graph;
and the correction module is used for generating a corrected second fitting curve of the layout graph according to the first potential energy field and the second potential energy field.
In a third aspect, in this embodiment, there is provided a computer readable storage medium having a computer program stored thereon, where the computer program when executed by a processor implements the steps of the method for correcting a fitted curve of a layout pattern according to the first aspect.
In a fourth aspect, in this embodiment, an electronic device is provided, including a memory, a processor, and a computer program stored in the memory and capable of running on the processor, where the processor implements the method for correcting a fitting curve of a layout pattern according to the first aspect when the processor executes the computer program.
Compared with the prior art, the correction method, the correction device and the storage medium for the fitting curve of the layout pattern are provided in the embodiment, the first potential energy field of the first fitting curve to be corrected of the layout pattern is calculated, the second potential energy field of the traction source of the layout pattern is calculated, and the corrected second fitting curve of the layout pattern is generated according to the first potential energy field and the second potential energy field. Therefore, the fitting of the local detail characteristics of the layout graph is realized, and the problem that the local detail characteristics of the layout graph cannot be fitted by the existing curve fitting method is solved.
The details of one or more embodiments of the application are set forth in the accompanying drawings and the description below to provide a more thorough understanding of the other features, objects, and advantages of the application.
Drawings
The accompanying drawings, which are included to provide a further understanding of the application and are incorporated in and constitute a part of this application, illustrate embodiments of the application and together with the description serve to explain the application and do not constitute an undue limitation to the application. In the drawings:
FIG. 1 is a block diagram of a hardware architecture of a terminal that performs a method for modifying a fitted curve of a layout pattern according to an embodiment of the present application;
FIG. 2 is a flow chart of a method for modifying a fitted curve of a layout pattern according to an embodiment of the present application;
FIG. 3 is a specific flowchart of a method for correcting a fitted curve of a layout pattern according to an embodiment of the present application;
FIG. 4 is a schematic illustration of an original polygon according to an embodiment of the present application;
FIG. 5 is an enlarged partial schematic view of a concave region of an original polygon according to an embodiment of the present application;
FIG. 6 is a schematic illustration of a simplified post-polygon and original fitted curve of an embodiment of the present application;
FIG. 7 is an enlarged partial schematic view of a simplified polygon and an original fitted curve of an embodiment of the present application;
FIG. 8 is a schematic of a potential energy function of an embodiment of the present application;
FIG. 9 is a schematic representation of potential energy fields calculated from raw fitted curves of an embodiment of the present application;
FIG. 10 is a schematic illustration of a calculated potential energy field of a traction source in accordance with an embodiment of the present application;
FIG. 11 is a schematic diagram of a new potential energy field calculated from the potential energy field of the original fitted curve and the potential energy field of the traction source in an embodiment of the present application;
FIG. 12 is a partial schematic view of a modified fitted curve of an embodiment of the present application in a plane;
FIG. 13 is a schematic representation of a modified fitted curve of an embodiment of the present application in a plane;
FIG. 14 is a schematic illustration of another calculated potential energy field of a traction source in accordance with an embodiment of the present application;
FIG. 15 is a schematic illustration of a potential energy field calculated by another traction source in accordance with an embodiment of the present application;
FIG. 16 is a schematic diagram of a correction curve of point clouds of different specific gravities according to an embodiment of the application;
FIG. 17 is a schematic diagram of another original polygon of an embodiment of the present application;
FIG. 18 is a schematic illustration of another simplified post-polygon and original fitted curve of an embodiment of the present application;
FIG. 19 is a schematic diagram of a rectangular concave potential energy field calculated by a traction source of a rectangular concave portion in an embodiment of the present application;
FIG. 20 is a schematic diagram of a rectangular bulge potential energy field calculated by a traction source of a rectangular bulge section in accordance with an embodiment of the present application;
fig. 21 is a block diagram of a layout pattern fitting curve correction device according to an embodiment of the present application.
Detailed Description
For a clearer understanding of the objects, technical solutions and advantages of the present application, the present application is described and illustrated below with reference to the accompanying drawings and examples.
Unless defined otherwise, technical or scientific terms used herein shall have the same meaning as commonly understood by one of ordinary skill in the art to which this application belongs. The terms "a," "an," "the," "these," and the like in this application are not intended to be limiting in number, but rather are singular or plural. The terms "comprising," "including," "having," and any variations thereof, as used in the present application, are intended to cover a non-exclusive inclusion; for example, a process, method, and system, article, or apparatus that comprises a list of steps or modules (units) is not limited to the list of steps or modules (units), but may include other steps or modules (units) not listed or inherent to such process, method, article, or apparatus. The terms "connected," "coupled," and the like in this application are not limited to physical or mechanical connections, but may include electrical connections, whether direct or indirect. Reference to "a plurality" in this application means two or more. "and/or" describes an association relationship of an association object, meaning that there may be three relationships, e.g., "a and/or B" may mean: a exists alone, A and B exist together, and B exists alone. Typically, the character "/" indicates that the associated object is an "or" relationship. The terms "first," "second," "third," and the like, as referred to in this application, merely distinguish similar objects and do not represent a particular ordering of objects.
The method embodiments provided in the present embodiment may be executed in a terminal, a computer, or similar computing device. For example, the method runs on a terminal, and fig. 1 is a block diagram of a hardware structure of the terminal for executing a correction method of a fitting curve of a layout graph according to an embodiment of the present application. As shown in fig. 1, the terminal may include one or more (only one is shown in fig. 1) processors 102 and a memory 104 for storing data, wherein the processors 102 may include, but are not limited to, a microprocessor MCU, a programmable logic device FPGA, or the like. The terminal may also include a transmission device 106 for communication functions and an input-output device 108. It will be appreciated by those skilled in the art that the structure shown in fig. 1 is merely illustrative and is not intended to limit the structure of the terminal. For example, the terminal may also include more or fewer components than shown in fig. 1, or have a different configuration than shown in fig. 1.
The memory 104 may be used to store a computer program, for example, a software program of application software and a module, such as a computer program corresponding to a correction method of a fitting curve of a layout pattern in the present embodiment, and the processor 102 executes the computer program stored in the memory 104 to perform various functional applications and data processing, that is, to implement the above-described method. Memory 104 may include high-speed random access memory, and may also include non-volatile memory, such as one or more magnetic storage devices, flash memory, or other non-volatile solid-state memory. In some examples, the memory 104 may further include memory remotely located relative to the processor 102, which may be connected to the terminal via a network. Examples of such networks include, but are not limited to, the internet, intranets, local area networks, mobile communication networks, and combinations thereof.
The transmission device 106 is used to receive or transmit data via a network. The network includes a wireless network provided by a communication provider of the terminal. In one example, the transmission device 106 includes a network adapter (Network Interface Controller, simply referred to as NIC) that can connect to other network devices through a base station to communicate with the internet. In one example, the transmission device 106 may be a Radio Frequency (RF) module, which is configured to communicate with the internet wirelessly.
In this embodiment, a method for correcting a fitting curve of a layout pattern is provided, and fig. 2 is a flowchart of a method for correcting a fitting curve of a layout pattern according to an embodiment of the present application, as shown in fig. 2, where the flowchart includes the following steps:
step S210, a first potential energy field of a first fitting curve to be corrected of the layout graph is calculated.
Specifically, obtaining a layout graph to be subjected to curve fitting, performing curve fitting on the layout graph according to a preset curve fitting algorithm to obtain a first fitting curve to be corrected of the layout graph, and calculating a first potential energy field of the first fitting curve. Illustratively, the layout patterns include circuit design patterns, mask layout patterns, and the like. In addition, the preset curve fitting algorithm may be an elliptic model algorithm, a bezier curve algorithm, or the like, for example, and is not particularly limited herein.
Step S220, a second potential energy field of a traction source of the layout graph is calculated.
Specifically, a traction source of a layout figure to be subjected to curve fitting is obtained, the traction source of the layout figure is obtained, and a second potential energy field of the traction source is calculated. The traction source can be generated by a target area of the layout graph which cannot be subjected to curve fitting according to a preset curve fitting algorithm, and the traction source can also be a target area of the layout graph which cannot be subjected to curve fitting according to the preset curve fitting algorithm.
Further specifically, after a preset curve fitting algorithm is determined, according to performance parameters of the curve fitting algorithm, parameter information of a target area where curve fitting cannot be performed on a layout graph to be subjected to curve fitting is determined, and according to the parameter information and graph parameters of the layout graph, a target area where curve fitting cannot be performed is determined, so that a traction source of the layout graph is determined. Illustratively, the predetermined curve fitting algorithm as determined is an elliptical model algorithm, and the target area to which the elliptical model algorithm can perform curve fitting is a corner greater than M nanometers, where M is an integer greater than 5. If the length or width of the concave or convex target area in the layout pattern is smaller than M nanometers, the elliptic model algorithm cannot perform curve fitting on the target area, the target area incapable of performing curve fitting can be determined to be a traction source, parameters of the target area are obtained according to pattern parameters of the layout pattern, the traction source is determined according to the parameters of the target area, and a second potential energy field of the traction source is calculated.
In addition, more specifically, a threshold value is preset, and a target area where the layout pattern to be subjected to curve fitting cannot be subjected to curve fitting is determined according to the set threshold value, so that a traction source of the layout pattern is determined. Illustratively, the threshold is N nanometers, where N is an integer greater than 5, as predetermined. If the length or width of the concave or convex target area in the layout pattern is smaller than N nanometers, determining that the elliptic model algorithm cannot perform curve fitting on the target area, determining the target area incapable of performing curve fitting as a traction source, acquiring parameters of the target area according to pattern parameters of the layout pattern, determining the traction source according to the parameters of the target area, and calculating a second potential energy field of the traction source. The set threshold value may be adjusted according to factors such as the production process, and is not particularly limited herein.
Step S230, generating a corrected second fitting curve of the layout graph according to the first potential energy field and the second potential energy field.
Specifically, the first potential energy field calculated in step S210 is corrected according to the second potential energy field calculated in step S220, a corrected third potential energy field is obtained, and a corrected second fitting curve of the layout pattern is generated according to the third potential energy field.
In the embodiment, a first potential energy field of a first fitting curve of the layout pattern to be corrected is calculated, a second potential energy field of a traction source of the layout pattern is calculated, and a corrected second fitting curve of the layout pattern is generated according to the first potential energy field and the second potential energy field. Therefore, the fitting of the local detail characteristics of the layout graph is realized, and the problem that the local detail characteristics of the layout graph cannot be fitted by the existing curve fitting method is solved.
In some of these embodiments, calculating a first potential energy field of a first fitted curve of the layout pattern to be modified comprises: and obtaining a simplified graph of the layout graph, and calculating a first potential energy field of a first fitting curve to be corrected of the layout graph according to the simplified graph.
Specifically, a simplified graph of a layout graph is obtained, curve fitting is carried out on the simplified graph according to a preset curve fitting algorithm, a first fitting curve to be corrected of the layout graph is obtained, and a first potential energy field of the first fitting curve is calculated.
In some of these embodiments, generating a modified second fitted curve of the layout pattern from the first potential energy field and the second potential energy field includes: calculating the first potential energy field and the second potential energy field to obtain a third potential energy field; and generating a corrected second fitting curve of the layout graph according to the third potential energy field.
Specifically, the first potential energy field and the second potential energy field are calculated to obtain a third potential energy field, the position of the constant potential energy in the third potential energy field is calculated, and a corrected second fitting curve of the layout graph is generated according to the position of the constant potential energy. The location where the potential energy remains unchanged may be determined based on a calculated function or calculation of the first potential energy field and the second potential energy field.
Further specifically, the calculated form of the first potential energy field and the second potential energy field is determined according to the form of the traction source. For example, when the traction source is a concave part relative to the original graph of the layout graph, the generated simplified graph of the layout graph ignores the concave part, and the first potential energy field and the second potential energy field are subtracted to obtain a third potential energy field; when the traction source is a convex part relative to the original graph of the layout graph, the generated simplified graph of the layout graph ignores the convex part, and the first potential energy field and the second potential energy field are added to obtain a third potential energy field.
In some of these embodiments, calculating a first potential energy field of a first fitted curve of the layout pattern to be modified comprises: and obtaining a step function of the first fitting curve, and carrying out Gaussian convolution on the step function of the first fitting curve to obtain a first potential energy field of the first fitting curve. Calculating a second potential energy field of a traction source of the layout graph, comprising: and obtaining a step function of the traction source, and performing Gaussian convolution on the step function of the traction source to obtain a second potential energy field of the traction source.
Specifically, the step function of the first fitted curve is stepped from 1 to 0 with respect to the function value at the curve position thereof, and one side of the original pattern close to the layout pattern is 1, and the other side is 0. After generating the step function of the first fitting curve, performing Gaussian convolution on the step function of the first fitting curve to obtain a first potential energy field of the first fitting curve. When constructing the step function, one side of the first fitting curve is all regarded as 1, and the other side is all regarded as 0, and then the value on the first fitting curve is 0.5. The interior of the target area corresponding to the traction source is 1, and the exterior of the target area corresponding to the traction source is 0, so that a step function corresponding to the traction source is obtained, and Gaussian convolution is performed on the step function, so that a second potential energy field of the traction source is obtained.
Further specifically, the first fitting curve to be corrected is the intersection line of the function of the first potential energy field and the z=0.5 plane. Calculating a position where potential energy in the third potential energy field is kept unchanged, and generating a corrected second fitting curve of the layout graph according to the position where the potential energy is kept unchanged, wherein the method comprises the following steps: and calculating an intersection line of the function of the third potential energy field and the z=0.5 plane, wherein the intersection line is the corrected second fitting curve.
In some of these embodiments, calculating a second potential energy field of the traction source of the layout pattern includes: acquiring a target traction source point of a traction source and acquiring a weight coefficient of the target traction source point; generating a traction source according to the target traction source point and the weight coefficient of the target traction source point; and obtaining a step function of the traction source, and performing Gaussian convolution on the step function of the traction source to obtain a second potential energy field of the traction source.
Specifically, after a target area of a layout graph which cannot be subjected to curve fitting according to a preset curve fitting algorithm is obtained, a target traction source point of the target area and a weight coefficient of the target traction source point are obtained, the target traction source point is multiplied by the weight coefficient of the corresponding target traction source point to obtain a weighted target traction source point, and a traction source of the layout graph is generated according to the weighted target traction source point. And obtaining a step function of the traction source, and performing Gaussian convolution on the step function of the traction source to obtain a second potential energy field of the traction source.
The embodiments of the present application are described and illustrated below by way of specific examples.
Fig. 3 is a specific flowchart of a method for correcting a fitting curve of a layout pattern according to an embodiment of the present application, as shown in fig. 3, the method for correcting a fitting curve of a layout pattern includes the following steps:
step S310, a curve fitting algorithm is used to obtain a curve fitting result of the simplified graph.
Specifically, the graph to be curve-fitted, i.e., the layout graph, may be a design layout graph or a mask layout graph, etc., such as the original polygons in fig. 4 and 5, where the graph has an L-shaped recess near the origin that is smaller than the entire graph, and fig. 5 is a partial enlarged view of the recess region in fig. 4. For the original polygon, the ellipse model algorithm cannot handle the existence of the recess, and only the influence thereof can be ignored; the Bezier curve can calculate the influence of the concave, but the Bezier curve algorithm is global calculation, and the concave graph can sharply increase the operation amount of the Bezier curve, and can negatively influence other partial curves with good fitting results. The concave with smaller scale is ignored first, only the simplified polygon is considered, and curve fitting is carried out on the simplified polygon to obtain an original fitting curve, wherein the simplified polygon and the original fitting curve are shown in fig. 6 and 7. Thus, an original fitted curve is obtained, where the original fitted curve is the original fitted curve in fig. 6 and 7, and then the influence of the traction source on the original fitted curve needs to be considered, where the traction source is a concave portion, that is, a portion of the simplified polygon that is omitted from the original polygon, and has a traction effect on the original fitted curve. Illustratively, the traction source 110 is an L-shaped region as in FIG. 7. Judging whether the original polygon has a concave part and a convex part with the length or the width smaller than a threshold value, if so, acquiring information of the concave part and the convex part, and generating a traction source according to the information. It should be noted that, the original fitting curve is the first fitting curve to be corrected in the foregoing embodiment, and the traction source may be a convex portion smaller than the whole graph.
Step S320, calculate the original fitting curve and the potential energy field of the traction source.
Specifically, it is first necessary to determine a potential energy function, where we select the convolution result of a Gaussian function acting on a step function as the potential energy function, that is, a Gaussian function of a certain length acting on the step function to generate the potential energy function, denoted as a Gaussian Table function (Gao Sibiao function), whose function graph is shown in fig. 8, where the Gaussian Table function intersects the step function at (0, 0.5). It should be noted that, the shape, such as a Gaussian Table function, maintains monotonically decreasing property, and decreases to 0 in a given range (here, the width of the Gaussian convolution), which can be used as a potential energy function, and the Gaussian Table function has certain advantages in terms of convenience and smoothness of the result; meanwhile, the two-dimensional potential energy function is a tensor product of the one-dimensional potential energy function.
The potential energy field of the traction source and the original fitting curve can be calculated based on the potential energy function. The potential energy field calculated from the original fitted curve is shown in fig. 9, and the potential energy field calculated from the traction source is shown in fig. 10. The x and y directions show the fitting curve and the position information of the traction source, the z direction is the potential energy, and the calculation process is to perform Gaussian convolution on the two-dimensional step function. First, a step function of an original fitting curve and a step function of a traction source are constructed, wherein for the original fitting curve, the step function is from 1 step to 0 relative to the position function value of the original fitting curve, and one side close to the traction source is 0, and the other side is 1. Illustratively, as shown in fig. 6, the original fitted curve is y=f 1 (x) The step function of the original fitted curve is:
for a traction source, the function value of the step function of the traction source is changed from 1 step to 0 on the rectangular boundary, the inner part of the L-shaped traction source is 1, and the outer side of the L-shaped traction source is 0. Illustratively, as shown in fig. 7, the fit curve of traction source 110 is y=f 2 (x)，f 2 (x) Is an L-shaped region in FIG. 7, where-1.ltoreq.x5.ltoreq.2.ltoreq.y.ltoreq.1, the step function of the traction source 110 is:
since only the potential energy field in the local range is considered, it can be assumed that the side of the original fitted curve far away from the traction source is large enough and exceeds the width of the Gaussian convolution, when the convolution calculation is performed, one side of the original fitted curve is all regarded as 1, and the other side is all regarded as 0, then the value on the original fitted curve is just 0.5, the intersection line of the step function of the original fitted curve and the potential energy field function 91 of the original fitted curve is in the z=0.5 plane 92, that is, the intersection line of the z=0.5 plane 92 and the potential energy field function 91 of the original fitted curve is the original fitted curve 93. As shown in fig. 10, the pulling source 110 is an L-shaped region, and because of the small dimensions of the pulling source, the potential energy field function 102 of the pulling source fails to intersect the z=0.5 plane 92. FIG. 9 is a potential energy field generated by a fitting curve for a simplified polygon, the field inside the layout pattern is stronger, the field outside the layout pattern is weaker, the image expression is from inside to outside of the pattern, and the value of the potential energy field is reduced from large. It should be noted that, the potential energy field of the original fitted curve is the first potential energy field of the first fitted curve to be corrected in the foregoing embodiment, and the potential energy field of the traction source is the second potential energy field of the traction source in the foregoing embodiment.
Step S330, calculating the potential energy field of the original fitting curve and the potential energy field of the traction source to obtain a new potential energy field, and calculating the corrected fitting curve. Specifically, a new potential energy field is calculated from the potential energy field of the original fitted curve and the potential energy field of the traction source, a new potential energy field function 111 is calculated from the potential energy field function 91 of the original fitted curve and the potential energy field function 102 of the traction source, as shown in fig. 11, and then a position in the new potential energy field, where the potential energy remains unchanged, is calculated, that is, the intersection line of the new potential energy field function 111 and the z=0.5 plane 92, which is the corrected fitted curve 112. Fig. 11 is a graph of the potential energy field of the original fitted curve subtracted from the potential energy field of the traction source, and attention is paid to the subtraction.
Fig. 12 is a partial schematic view of the corrected fitted curve on the plane, and fig. 13 is a schematic view of the corrected fitted curve on the plane. As shown in fig. 12 and 13, the corrected fitting curve is only local, and the curve is corrected for the area of 0 < x < 10, -10 < y < 0, namely, the corrected fitting curve is only small and distinct from the original fitting curve of 0 < x < 10, -10 < y < 0, and the original fitting curve is tangent to the polygon in contact with other parts, and the corrected fitting curve is tangent to the polygon in contact with other parts. I.e. the correction of the curve does not affect this property, the tangent place is still tangent after correction.
The influence range of the potential energy field of the traction source is local, as shown in fig. 10, the potential energy field of the traction source has a corresponding potential energy field value in the area corresponding to the traction source, namely, the z-axis value is not 0, and the potential energy field value (z-axis value) at other positions, such as the boundary of the coordinate axes shown in fig. 10, is close to 0, wherein the smaller the potential energy field value is, the smaller the influence of the potential energy field of the traction source on the potential energy field of the original fitting curve is, the potential energy field value is 0, namely, the potential energy field of the traction source has no influence on the potential energy field of the original fitting curve is, that is, the correction only occurs in the range which is not 0. I.e. the potential energy field of the traction source is not 0 within a limited range, beyond which it is 0. This is because the potential energy field is calculated using a Gaussian convolution function, the size of which limited range is determined by the length of the convolution. The step function of the traction source is 1 at the point inside the traction source, the step function of the point outside the traction source is 0, then the step function of the traction source is subjected to Gaussian convolution, the part which is not 0 is only a small part corresponding to the traction source, the part which is not 0 after the convolution is the length of the convolution function added to the boundary of the traction source, and the other parts are all 0.
The correction method not only shows the correction effect, but also has quite good local operability and does not have negative influence on the overall situation. The good local operability is because the potential energy function decays to 0 within a certain range without affecting the farther place, such as the original fit curve at two places (-10, 0), (0, 10) and the good property of the corrected fit curve tangential to the boundary in fig. 12 are not changed, such as the original fit curve at two places (-10, 0), (0, 10) and the good property of the corrected fit curve tangential to the boundary in fig. 13 are not changed.
As shown in fig. 14 and 15, the L-shaped traction source 110 in fig. 10 is divided into two rectangular areas to obtain two rectangular traction sources, namely a first traction source 141 and a second traction source 151, a first partial potential energy field 142 of the first traction source 141 is calculated by using Gaussian convolution, and a second partial potential energy field 152 of the second traction source 151 is calculated, and the first partial potential energy field 142 and the second partial potential energy field 152 are superimposed to obtain the potential energy field of the traction source 110 in fig. 10. The demonstration can be made by the calculation of the potential energy field, i.e. Gaussian convolution. This in turn illustrates: the process of fig. 9 to 12 corresponds to the potential energy field of the original fitting curve minus the potential energy field of the L-shaped traction source, a new potential energy field can be obtained, the potential energy field is denoted as F1, and the corrected fitting curve can be calculated from the potential energy field F1. The L-shaped traction source can be divided into two rectangles, the two rectangles are respectively denoted by B1 and B2, the potential energy field of the rectangle B1 can be subtracted from the potential energy field of the original curve, and then the potential energy field of the rectangle B2 is subtracted, so that the field potential energy field F2 can be obtained. Since the L-shaped traction source is equal to the sum of the two rectangular fields, f1=f2, the corrected fitted curve calculated in both ways is also identical.
Therefore, in the process of correcting a large or complex traction source, the traction source can be decomposed into a plurality of small blocks, and each small block can be corrected in turn, and the whole traction source can be corrected in two correction modes, and the correction results are consistent. The small part is corrected, and in the correction process, certain advantages are achieved in terms of calculation amount. Alternatively, the layout pattern may be being adjusted, the shape of the corresponding traction source may be adjusted, the final layout pattern may be corrected, and the correction may be performed during each adjustment, and the results of the two methods are consistent.
In some embodiments, points such as P1, P2 and P3 in fig. 16 may be set near the original fitted curve by using the point cloud as the traction source, and the specific gravity of the traction points may be set, so as to calculate the traction source formed by the weighted traction points, and then calculate the corrected curve of the original fitted curve after traction. The specific gravity of the points can be used as a variable to participate in optimization, and after a cost function (or a loss function) is given, the specific gravity of the point cloud can be adjusted through an optimization algorithm so as to obtain a correction curve with smaller cost value. If P1, P2 and P3 can be given different specific gravities, specific gravity 1= [ -1,0], specific gravity 2= [1, 0], specific gravity 3= [1, 3].
As in the original polygon of fig. 17, which has a rectangular protrusion smaller than the entire pattern and a rectangular recess smaller than the entire pattern near the origin, the elliptical model algorithm cannot cope with the existence of the rectangular protrusion and the rectangular recess, and can only ignore the influence thereof. Rectangular protrusions and rectangular depressions with smaller dimensions are ignored, only the simplified polygons are considered, curve fitting is conducted on the simplified polygons to obtain original fitting curves, and the simplified polygons and the original fitting curves are shown in fig. 18.
Next, consideration is given to the effect of the traction source on the original fitted curve, where the traction source includes two parts, namely, rectangular convex 181 and rectangular concave 182 in fig. 18, that is, the simplified polygonal omitted parts from the original polygon, which has traction effect on the original fitted curve. Fig. 19 shows a rectangular concave potential field 191 calculated by the traction source of the rectangular concave 182 portion, fig. 20 shows a rectangular convex potential field 201 calculated by the traction source of the rectangular convex 181 portion, and the potential field of the traction source of the rectangular concave 182 portion needs to be subtracted and the potential field of the traction source of the rectangular convex 181 portion needs to be added. The potential energy field obtained by subtracting the rectangular concave potential energy field 191 and the rectangular convex potential energy field 201 from the potential energy field of the original fitting curve, or directly subtracting the rectangular concave potential energy field 191 obtained by calculating the traction source of the rectangular concave 182 part from the potential energy field of the original fitting curve, and adding the rectangular convex potential energy field 201 obtained by calculating the traction source of the rectangular convex 181 part, wherein the calculation results of the two modes are consistent. The potential energy fields corresponding to the rectangular concave 182 parts to be described are subtracted, and because the polygonal simplification process is to supplement the notch parts, the potential energy fields of the supplemented graph, namely the potential energy fields of the traction source, are required to be subtracted to obtain the true curve; the potential energy fields corresponding to the rectangular protrusions 181 are added, and because the polygonal simplification process ignores the protruding portions, to obtain a true curve, the potential energy fields of the ignored pattern, that is, the potential energy fields of the traction source, need to be added.
The embodiment also provides a correction device for the fitting curve of the layout graph, which is used for realizing the embodiment and the preferred implementation manner, and the description is omitted. The terms "module," "unit," "sub-unit," and the like as used below may refer to a combination of software and/or hardware that performs a predetermined function. While the means described in the following embodiments are preferably implemented in software, implementations in hardware, or a combination of software and hardware, are also possible and contemplated.
Fig. 21 is a block diagram of a layout pattern fitting curve correction device according to an embodiment of the present application, and as shown in fig. 21, the device includes:
a first calculation module 410, configured to calculate a first potential energy field of a first fitting curve to be corrected of the layout pattern;
a second calculation module 420, configured to calculate a second potential energy field of the traction source of the layout pattern;
and the correction module 430 is configured to generate a corrected second fitted curve of the layout pattern according to the first potential energy field and the second potential energy field.
The above-described respective modules may be functional modules or program modules, and may be implemented by software or hardware. For modules implemented in hardware, the various modules described above may be located in the same processor; or the above modules may be located in different processors in any combination.
There is also provided in this embodiment an electronic device comprising a memory having stored therein a computer program and a processor arranged to run the computer program to perform the steps of any of the method embodiments described above.
Optionally, the electronic apparatus may further include a transmission device and an input/output device, where the transmission device is connected to the processor, and the input/output device is connected to the processor.
Alternatively, in the present embodiment, the above-described processor may be configured to execute the following steps by a computer program:
s1, calculating a first potential energy field of a first fitting curve to be corrected of the layout graph.
S2, calculating a second potential energy field of the traction source of the layout graph.
S3, generating a corrected second fitting curve of the layout graph according to the first potential energy field and the second potential energy field.
It should be noted that, specific examples in this embodiment may refer to examples described in the foregoing embodiments and alternative implementations, and are not described in detail in this embodiment.
In addition, in combination with the correction method of the fitting curve of the layout graph provided in the above embodiment, a storage medium may be further provided in this embodiment to implement the correction method. The storage medium has a computer program stored thereon; the computer program when executed by the processor implements the steps of the method for correcting the fitting curve of any layout pattern in the above embodiments.
It should be understood that the specific embodiments described herein are merely illustrative of this application and are not intended to be limiting. All other embodiments, which can be made by one of ordinary skill in the art without undue burden from the present application, are within the scope of the present application in light of the embodiments provided herein.
It is evident that the drawings are only examples or embodiments of the present application, from which the present application can also be adapted to other similar situations by a person skilled in the art without the inventive effort. In addition, it should be appreciated that while the development effort might be complex and lengthy, it would nevertheless be a routine undertaking of design, fabrication, or manufacture for those of ordinary skill having the benefit of this disclosure, and thus should not be construed as an admission of insufficient detail.
The term "embodiment" in this application means that a particular feature, structure, or characteristic described in connection with the embodiment may be included in at least one embodiment of the application. The appearances of such phrases in various places in the specification are not necessarily all referring to the same embodiment, nor are separate or alternative embodiments mutually exclusive. It will be clear or implicitly understood by those of ordinary skill in the art that the embodiments described in this application can be combined with other embodiments without conflict.
The above examples only represent a few embodiments of the present application, which are described in more detail and are not to be construed as limiting the scope of the patent. It should be noted that it would be apparent to those skilled in the art that various modifications and improvements could be made without departing from the spirit of the present application, which would be within the scope of the present application. Accordingly, the scope of protection of the present application shall be subject to the appended claims.
Claims (10)
1. A correction method of a fitting curve of a layout graph is characterized by comprising the following steps:
calculating a first potential energy field of a first fitting curve to be corrected of the layout graph;
calculating a second potential energy field of a traction source of the layout graph;
and generating a corrected second fitting curve of the layout graph according to the first potential energy field and the second potential energy field.
2. The method for modifying a fitted curve of a layout pattern according to claim 1, wherein the generating a modified second fitted curve of the layout pattern according to the first potential energy field and the second potential energy field comprises:
calculating the first potential energy field and the second potential energy field to obtain a third potential energy field;
and generating a corrected second fitting curve of the layout graph according to the third potential energy field.
3. The method for modifying a fitted curve of a layout pattern according to claim 2, wherein the generating a modified second fitted curve of the layout pattern according to the third potential energy field comprises:
calculating the position where potential energy in the third potential energy field is kept unchanged;
and generating a corrected second fitting curve of the layout graph according to the position where the potential energy is maintained unchanged.
4. The method for modifying a fitted curve of a layout pattern according to claim 1, wherein the method further comprises:
acquiring a target area of the layout graph; the length or width of the target area is smaller than a preset value;
and determining a traction source of the layout graph according to the target area.
5. The method for modifying a fitted curve of a layout pattern according to claim 1, wherein the method further comprises: and obtaining a first fitting curve to be corrected of the layout graph according to an elliptic model algorithm.
6. The method for modifying a fitted curve of a layout pattern according to claim 1, wherein the calculating a first potential energy field of a first fitted curve to be modified of the layout pattern comprises:
and obtaining a step function of the first fitting curve, and performing Gaussian convolution on the step function of the first fitting curve to obtain a first potential energy field of the first fitting curve.
7. The method for correcting a fitted curve of a layout pattern according to claim 1, wherein the calculating the second potential energy field of the traction source of the layout pattern comprises:
and acquiring a step function of the traction source, and performing Gaussian convolution on the step function of the traction source to obtain a second potential energy field of the traction source.
8. The method for modifying a fitted curve of a layout pattern according to any one of claims 1 to 7, wherein the calculating the second potential energy field of the traction source of the layout pattern comprises:
acquiring a target traction source point and a weight coefficient of the target traction source point;
and generating the traction source according to the target traction source point and the weight coefficient of the target traction source point.
9. A correction device for a fitting curve of a layout pattern, the device comprising:
the first calculation module is used for calculating a first potential energy field of a first fitting curve to be corrected of the layout graph;
the second calculation module is used for calculating a second potential energy field of the traction source of the layout graph;
and the correction module is used for generating a corrected second fitting curve of the layout graph according to the first potential energy field and the second potential energy field.
10. A computer-readable storage medium, on which a computer program is stored, characterized in that the computer program, when being executed by a processor, carries out the steps of the method for modifying a fitted curve of a layout pattern according to any one of claims 1 to 8.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202310189315.4A CN116384328A (en) | 2023-02-23 | 2023-02-23 | Correction method and device for fitting curve of layout graph and storage medium |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202310189315.4A CN116384328A (en) | 2023-02-23 | 2023-02-23 | Correction method and device for fitting curve of layout graph and storage medium |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN116384328A true CN116384328A (en) | 2023-07-04 |
Family
ID=86960561
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN202310189315.4A Pending CN116384328A (en) | 2023-02-23 | 2023-02-23 | Correction method and device for fitting curve of layout graph and storage medium |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN116384328A (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN117541635A (en) * | 2024-01-09 | 2024-02-09 | 杭州广立微电子股份有限公司 | Layout graph scaling correction method and device, electronic device and storage medium |
-
2023
- 2023-02-23 CN CN202310189315.4A patent/CN116384328A/en active Pending
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN117541635A (en) * | 2024-01-09 | 2024-02-09 | 杭州广立微电子股份有限公司 | Layout graph scaling correction method and device, electronic device and storage medium |
| CN117541635B (en) * | 2024-01-09 | 2024-05-14 | 杭州广立微电子股份有限公司 | Layout graph scaling correction method and device, electronic device and storage medium |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| CN110689492B (en) | Image edge smoothing method and device | |
| CN115981115B (en) | Optical proximity correction method, optical proximity correction device, computer equipment and storage medium | |
| CN110765724B (en) | Mask optimization method and electronic equipment | |
| CN116384328A (en) | Correction method and device for fitting curve of layout graph and storage medium | |
| CN109697748B (en) | Model compression processing method, model mapping processing method, model compression processing device, and storage medium | |
| CN113779779A (en) | Method, apparatus and computer-readable storage medium for optimizing a mask | |
| CN113240578A (en) | Image special effect generation method and device, electronic equipment and storage medium | |
| US20240062469A1 (en) | Data processing method, apparatus, device, and medium | |
| CN117933175B (en) | Layout equivalent line width calculation method and device, electronic device and storage medium | |
| CN113673532B (en) | Target detection method and device based on quantitative model | |
| CN114429534A (en) | Three-dimensional model processing method, device, electronic device and storage medium | |
| CN112200860B (en) | Object position relation determining method and device, storage medium and electronic device | |
| CN115630600B (en) | Method, apparatus, and medium for layout processing | |
| CN118247289A (en) | Layout figure processing method and device for chemical mechanical polishing simulation and electronic device | |
| CN114549783B (en) | Virtual model generation method and device, electronic equipment and storage medium | |
| CN117541635B (en) | Layout graph scaling correction method and device, electronic device and storage medium | |
| CN117152236B (en) | A method, apparatus, and storage medium for calculating the projected area of a 3D mesh model. | |
| CN119540244B (en) | Layout matching method and device, computer equipment and readable storage medium | |
| US6751599B2 (en) | Fuzzy inference system for simplifying mesh | |
| CN115034966B (en) | Image deformation method, device, equipment and storage medium based on interpolation algorithm | |
| CN118940711B (en) | Layout processing method and device and computer readable storage medium | |
| US20250117924A1 (en) | Method for generating proximity correction model, method for processing proximity correction using generated proximity correction model and proximity correction system thereof | |
| CN118528545B (en) | Model slice consistency processing methods, devices, electronic equipment and storage media | |
| CN117152236A (en) | A method, device and storage medium for calculating the projected area of a 3D grid model | |
| CN115359209B (en) | Image processing apparatus and method |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| PB01 | Publication | ||
| PB01 | Publication | ||
| SE01 | Entry into force of request for substantive examination | ||
| SE01 | Entry into force of request for substantive examination |