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CN115813399A - A kind of nerve electrode modified by nanomaterial and its preparation method - Google Patents

A kind of nerve electrode modified by nanomaterial and its preparation method Download PDF

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CN115813399A
CN115813399A CN202211579165.XA CN202211579165A CN115813399A CN 115813399 A CN115813399 A CN 115813399A CN 202211579165 A CN202211579165 A CN 202211579165A CN 115813399 A CN115813399 A CN 115813399A
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electrode
deposition
nerve
nerve electrode
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张晓东
刘爽杰
王洋
王浩
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Tianjin University
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Abstract

The invention discloses a nanomaterial-modified nerve electrode and a preparation method thereof, wherein the preparation method comprises the following steps: carrying out roughening treatment and cleaning on the surface of a recording site of a nerve electrode, drying to obtain a working electrode, putting a nano material aqueous solution with the concentration of 0.5-10mg/mL serving as an electrodeposition working solution into an electrolytic cell, carrying out surface modification on the recording site of the nerve electrode, and carrying out deposition in an electrochemical deposition mode, wherein the number of deposition layers is 1-10, so that the nerve electrode modified by the nano material is obtained. According to the method, the nano material is used for modifying the recording sites of the nerve electrode, the physicochemical characteristics of the nano material are introduced into the electrode interface, and the surface of the electrode is provided with a controllable micro-nano structure so as to have a large effective reaction surface, so that the electrochemical performance and the detection sensitivity of the nerve electrode are improved.

Description

一种纳米材料修饰的神经电极及制备方法A kind of nerve electrode modified by nanomaterial and its preparation method

技术领域technical field

本发明属于材料领域,涉及一种纳米材料修饰的神经电极的制备方法。The invention belongs to the field of materials, and relates to a preparation method of a nerve electrode modified by a nanometer material.

背景技术Background technique

神经电极是脑-机接口的核心设备单元,作为神经系统疾病的诊断工具,通过记录和调控神经电活动被广泛应用于神经科学。大多数中枢神经系统性疾病,如脑卒中、帕金森病和癫痫,都与异常的大脑循环活动密切相关,需要灵敏且生物相容的神经电极来进行及时诊断和治疗。尽管目前在神经电极领域有重大突破性发现和技术创新,但现有临床金属电极仍面临生物相容性、采集灵敏度以及长期稳定性等一系列重大挑战和局限性。一方面,脑电信号十分微弱但噪声背景较强,且信号频带较宽,极易受到50Hz工频及高频电磁的干扰。临床的金属电极受限于电子转移速度慢及电荷注入能力有限等问题,组织-电极界面阻抗较高导致神经记录的信噪比和灵敏度低。另一方面,传统植入式神经电极主要为杨氏模量约102GPa的刚性金属,如钨、铂、铱、金等,相比于杨氏模量为1kPa的柔软脑组织,电极-组织之间的界面存在严重的机械失配现象,从而诱发一系列炎症反应。严重时将记录位点与神经元分离并诱发神经元死亡,降低神经记录信噪比,阻止有效的神经刺激。Neural electrodes are the core equipment unit of the brain-computer interface. As a diagnostic tool for nervous system diseases, they are widely used in neuroscience by recording and regulating neural electrical activities. Most central nervous system diseases, such as stroke, Parkinson's disease, and epilepsy, are closely related to abnormal brain circulation activities, requiring sensitive and biocompatible neural electrodes for timely diagnosis and treatment. Despite major breakthroughs and technological innovations in the field of neural electrodes, existing clinical metal electrodes still face a series of major challenges and limitations such as biocompatibility, acquisition sensitivity, and long-term stability. On the one hand, the EEG signal is very weak but the noise background is strong, and the signal frequency band is wide, so it is very vulnerable to 50Hz power frequency and high-frequency electromagnetic interference. Clinical metal electrodes are limited by problems such as slow electron transfer speed and limited charge injection ability, and the high impedance of the tissue-electrode interface leads to low signal-to-noise ratio and sensitivity of neural recordings. On the other hand, traditional implantable nerve electrodes are mainly rigid metals with a Young's modulus of about 10 2 GPa, such as tungsten, platinum, iridium, gold, etc. Compared with soft brain tissue with a Young's modulus of 1kPa, electrodes- There is a severe mechanical mismatch at the interface between tissues, which induces a series of inflammatory responses. In severe cases, the recording site is separated from the neuron and induces neuron death, which reduces the signal-to-noise ratio of neural recording and prevents effective neural stimulation.

神经电极既要保证电极-组织界面的阻抗足够低,又要使其尺寸足够小以保证对目标组织电信号的精确提取,同时减少组织损伤,但尺寸的降低又会引起阻抗的大幅度增加。Neural electrodes should not only ensure that the impedance of the electrode-tissue interface is low enough, but also make their size small enough to ensure accurate extraction of electrical signals from the target tissue, while reducing tissue damage, but the reduction in size will cause a substantial increase in impedance.

发明内容Contents of the invention

本发明的目的是克服现有技术的不足,提供一种提高神经电极生物相容性、采集灵敏度以及长期稳定性,在保持神经电极原有空间选择性的前提下,使阻抗降低的纳米材料修饰的神经电极。The purpose of the present invention is to overcome the deficiencies of the prior art, provide a nano-material modification that improves the biocompatibility, acquisition sensitivity and long-term stability of the nerve electrode, and reduces the impedance on the premise of maintaining the original space selectivity of the nerve electrode. nerve electrodes.

本发明的第二个目的是提供一种纳米材料修饰的神经电极的制备方法。The second object of the present invention is to provide a method for preparing a nanomaterial-modified nerve electrode.

本发明的技术方案概述如下:Technical scheme of the present invention is summarized as follows:

一种纳米材料修饰的神经电极的制备方法,包括如下步骤:A preparation method of a nanomaterial-modified nerve electrode, comprising the steps of:

(1)对神经电极的记录位点表面进行粗糙化处理,用去离子水冲洗,依次放入丙酮、无水乙醇中超声清洗,干燥;(1) Roughen the surface of the recording site of the nerve electrode, rinse it with deionized water, put it into acetone and absolute ethanol for ultrasonic cleaning, and dry it;

(2)将步骤(1)获得的电极为工作电极,以铂电极作为对电极,以Ag/AgCl作为参比电极,接入电化学工作站中,以浓度0.5-10mg/mL的纳米材料水溶液为电沉积工作液放入电解池中,进行沉积,沉积层数1-10层,对神经电极的记录位点进行表面修饰;(2) The electrode obtained in step (1) is used as the working electrode, the platinum electrode is used as the counter electrode, and Ag/AgCl is used as the reference electrode, which is connected to the electrochemical workstation, and the nanomaterial aqueous solution with a concentration of 0.5-10mg/mL is used as the The electrodeposition working solution is put into the electrolytic cell for deposition, the number of deposition layers is 1-10 layers, and the surface modification of the recording site of the nerve electrode is carried out;

(3)用聚酰亚胺或聚对二甲苯对除了记录位点外的神经电极的其它部分进行绝缘处理,获得一种纳米材料修饰的神经电极。(3) Use polyimide or parylene to insulate the other parts of the nerve electrode except the recording site to obtain a nanomaterial-modified nerve electrode.

纳米材料优选二维纳米材料、纳米团簇或单原子材料。Nanomaterials are preferably two-dimensional nanomaterials, nanoclusters or single-atom materials.

二维纳米材料的材质优选为石墨烯,MoS2或MoTe2The material of the two-dimensional nanomaterial is preferably graphene, MoS 2 or MoTe 2 .

纳米团簇优选为Au纳米团簇,Ag纳米团簇,Mn纳米团簇或Pt纳米团簇。The nanoclusters are preferably Au nanoclusters, Ag nanoclusters, Mn nanoclusters or Pt nanoclusters.

单原子材料优选为MN4,所述MN4中的M为Fe、Cu、Rh、V、Pd、Pt、Ni、Mn、Zn、Ru、Ir、Cr、Zr、Mo、Re、Au、Cd、Tb、W、Ce或Co。The monoatomic material is preferably MN 4 , and M in the MN 4 is Fe, Cu, Rh, V, Pd, Pt, Ni, Mn, Zn, Ru, Ir, Cr, Zr, Mo, Re, Au, Cd, Tb, W, Ce or Co.

沉积的方式为恒电流沉积、恒电压沉积或多电位阶跃沉积。The deposition method is constant current deposition, constant voltage deposition or multi-potential step deposition.

恒电流沉积的参数为沉积电流0.01-1mA,共沉积时间为120-1200s。The parameters of constant current deposition are deposition current 0.01-1mA, co-deposition time is 120-1200s.

恒电压沉积的参数为沉积电压0.1-2V,共沉积时间为96-300s。The parameters of the constant voltage deposition are a deposition voltage of 0.1-2V, and a co-deposition time of 96-300s.

多电位阶跃沉积的参数为沉积电压0.1-2V,共沉积时间为96-300s。The parameters of multi-potential step deposition are deposition voltage 0.1-2V, co-deposition time 96-300s.

上述方法制备的一种纳米材料修饰的神经电极。A nerve electrode modified by nanomaterials prepared by the above method.

本发明的优点:Advantages of the present invention:

本发明的制备方法,通过引入纳米材料对神经电极记录位点进行表面修饰,能够在保持原有空间选择性的前提下增大与电解质的接触面积,改善其界面性能。纳米材料的小尺寸、大比表面积、良好生物相容性等特性,作为电极修饰材料能显著加速电子传输速率。利用纳米材料对神经电极记录位点进行修饰,除了将材料本身的物化特性引入电极界面外,还使电极表面具有可控的微纳米结构从而拥有大的有效反应面,提高神经电极的电化学性能,及检测灵敏度。In the preparation method of the present invention, by introducing nanomaterials to modify the surface of the nerve electrode recording site, the contact area with the electrolyte can be increased under the premise of maintaining the original space selectivity, and the interface performance can be improved. The small size, large specific surface area, and good biocompatibility of nanomaterials can significantly accelerate the electron transport rate as electrode modification materials. Using nanomaterials to modify the recording sites of nerve electrodes, in addition to introducing the physical and chemical properties of the material itself into the electrode interface, also makes the electrode surface have a controllable micro-nano structure so as to have a large effective reaction surface and improve the electrochemical performance of nerve electrodes. , and detection sensitivity.

附图说明Description of drawings

图1为实施例1的电沉积示意图。FIG. 1 is a schematic diagram of electrodeposition in Example 1.

图2为纳米材料修饰电极的结构表征。Figure 2 shows the structural characterization of nanomaterial modified electrodes.

图3为纳米材料修饰电极的电学性能。Figure 3 shows the electrical properties of the nanomaterial modified electrode.

图4为纳米团簇修饰电极的电学性能。Figure 4 shows the electrical properties of the nanocluster modified electrode.

图5为二维纳米材料修饰电极的电学性能。Figure 5 shows the electrical properties of the two-dimensional nanomaterial modified electrode.

具体实施方式Detailed ways

下面通过具体实施例对本发明作进一步的说明The present invention will be further described below by specific embodiment

神经电极为市售,基底材料为金属或半导体硅,其中的金属为铂、金、铂铱合金、不锈钢、钨或铜。神经电极单针直径为2-100微米。Neural electrodes are commercially available, and the base material is metal or semiconductor silicon, and the metal is platinum, gold, platinum-iridium alloy, stainless steel, tungsten or copper. The single needle diameter of the nerve electrode is 2-100 microns.

实施例1Example 1

一种纳米材料修饰的神经电极及制备方法,包括如下步骤:A nerve electrode modified by nanomaterials and a preparation method thereof, comprising the steps of:

(1)对神经电极(商品化直径为100μm)的记录位点表面进行粗糙化处理,(用400目砂纸进行打磨,其目的是将神经电极的记录位点表面进行活化处理并提高电化学沉积膜层与神经电极的材料之间的结合力),用去离子水冲洗,依次放入丙酮、无水乙醇中超声清洗,干燥;(1) Roughen the surface of the recording site of the nerve electrode (commercialized diameter is 100 μm), (polish with 400 mesh sandpaper, the purpose is to activate the surface of the recording site of the nerve electrode and improve the electrochemical deposition The binding force between the film layer and the material of the nerve electrode), rinsed with deionized water, placed in acetone and absolute ethanol for ultrasonic cleaning, and dried;

(2)将步骤(1)获得的电极为工作电极,以铂电极作为对电极,以Ag/AgCl作为参比电极,接入电化学工作站中,以浓度3mg/mL的Au纳米团簇水溶液为电沉积工作液放入电解池中,选择多电位阶跃沉积方式,在沉积电压为0.1V,每层沉积时间为24s,进行沉积,沉积层数4层,共沉积96s(如图1)所示,得电化学沉积膜层,对神经电极的记录位点进行表面修饰;(2) The electrode obtained in step (1) was used as the working electrode, the platinum electrode was used as the counter electrode, and Ag/AgCl was used as the reference electrode, connected to the electrochemical workstation, and the aqueous solution of Au nanoclusters with a concentration of 3 mg/mL was used as the The electrodeposition working solution was put into the electrolytic cell, and the multi-potential step deposition method was selected. The deposition voltage was 0.1V, and the deposition time of each layer was 24s. As shown, the electrochemically deposited film layer is obtained, and the surface modification of the recording site of the nerve electrode is carried out;

(3)用聚酰亚胺对除了记录位点外的神经电极的其它部分进行绝缘处理(涂覆),获得一种纳米材料修饰的神经电极。(3) Use polyimide to insulate (coat) the other parts of the nerve electrode except the recording site to obtain a nanomaterial-modified nerve electrode.

实施例2Example 2

一种纳米材料修饰的神经电极及制备方法,包括如下步骤:A nerve electrode modified by nanomaterials and a preparation method thereof, comprising the steps of:

(1)对神经电极(商品化直径为100μm)的记录位点表面进行粗糙化处理,(用400目砂纸进行打磨),用去离子水冲洗,依次放入丙酮、无水乙醇中超声清洗,干燥;(1) Roughen the surface of the recording site of the nerve electrode (commercialized with a diameter of 100 μm), (polish with 400-grit sandpaper), rinse with deionized water, and ultrasonically clean it in acetone and absolute ethanol in turn, dry;

(2)将步骤(1)获得的电极为工作电极,以铂电极作为对电极,以Ag/AgCl作为参比电极,接入电化学工作站中,分别以浓度0.5mg/mL的Ag纳米团簇水溶液、Au纳米团簇水溶液,Mn纳米团簇水溶液、Pt纳米团簇水溶液为电沉积工作液放入电解池中,选择恒电压沉积方式,在沉积电压为0.1V,每层沉积时间为24s,进行沉积,沉积层数4层,共沉积96s,得电化学沉积膜层,对神经电极的记录位点进行表面修饰;(2) The electrode obtained in step (1) is used as the working electrode, the platinum electrode is used as the counter electrode, and Ag/AgCl is used as the reference electrode. Aqueous solution, aqueous solution of Au nanocluster, aqueous solution of Mn nanocluster, aqueous solution of Pt nanocluster are placed in the electrolytic cell as the electrodeposition working solution, and the constant voltage deposition method is selected. The deposition voltage is 0.1V, and the deposition time of each layer is 24s. Depositing, the number of deposition layers is 4 layers, and the co-deposition is 96s to obtain an electrochemical deposition film layer, and to modify the surface of the recording site of the nerve electrode;

(3)用聚酰亚胺对除了记录位点外的神经电极的其它部分进行绝缘处理(涂覆),获得4个一种纳米材料修饰的神经电极。(3) Use polyimide to insulate (coat) the other parts of the nerve electrodes except the recording site, and obtain 4 nerve electrodes modified by a kind of nanomaterial.

实施例3Example 3

一种纳米材料修饰的神经电极及制备方法,包括如下步骤:A nerve electrode modified by nanomaterials and a preparation method thereof, comprising the steps of:

(1)对神经电极(商品化直径为2μm)的记录位点表面进行粗糙化处理,(用400目砂纸进行打磨),用去离子水冲洗,依次放入丙酮、无水乙醇中超声清洗,干燥;(1) Roughen the surface of the recording site of the nerve electrode (commercialized with a diameter of 2 μm), (polish with 400-grit sandpaper), rinse with deionized water, and ultrasonically clean it in acetone and absolute ethanol in turn, dry;

(2)将步骤(1)获得的电极为工作电极,以铂电极作为对电极,以Ag/AgCl作为参比电极,接入电化学工作站中,以浓度10mg/mL的Mn纳米团簇水溶液为电沉积工作液放入电解池中,选择恒电流沉积方式,沉积电流0.01mA,每层沉积时间为600s,进行沉积,沉积层数2层,共沉积1200s,得电化学沉积膜层,对神经电极的记录位点进行表面修饰;(2) The electrode obtained in step (1) is used as the working electrode, the platinum electrode is used as the counter electrode, and Ag/AgCl is used as the reference electrode, which is connected to the electrochemical workstation, and the aqueous solution of Mn nanoclusters with a concentration of 10 mg/mL is used as the Put the electrodeposition working solution into the electrolytic cell, select the constant current deposition method, the deposition current is 0.01mA, and the deposition time of each layer is 600s. The deposition is carried out. The number of deposition layers is 2 layers, and the total deposition time is 1200s. The electrochemical deposition film layer is obtained. Surface modification of the recording site of the electrode;

(3)用聚酰亚胺对除了记录位点外的神经电极的其它部分进行绝缘处理(涂覆),获得一种纳米材料修饰的神经电极。(3) Use polyimide to insulate (coat) the other parts of the nerve electrode except the recording site to obtain a nanomaterial-modified nerve electrode.

实施例4Example 4

一种纳米材料修饰的神经电极及制备方法,包括如下步骤:A nerve electrode modified by nanomaterials and a preparation method thereof, comprising the steps of:

(1)同实施例1步骤(1);(1) with embodiment 1 step (1);

(2)将步骤(1)获得的电极为工作电极,以铂电极作为对电极,以Ag/AgCl作为参比电极,接入电化学工作站中,以浓度0.5mg/mL的石墨烯水溶液为电沉积工作液放入电解池中,选择多电位阶跃沉积方式,在沉积电压为2V,每层沉积时间为300s,进行沉积,沉积层数1层,得电化学沉积膜层,对神经电极的记录位点进行表面修饰;(2) The electrode obtained in step (1) is used as the working electrode, the platinum electrode is used as the counter electrode, and the Ag/AgCl is used as the reference electrode, which is connected to the electrochemical workstation, and the graphene aqueous solution with a concentration of 0.5 mg/mL is used as the electrode. The deposition working solution is put into the electrolytic cell, and the multi-potential step deposition method is selected. The deposition voltage is 2V, and the deposition time of each layer is 300s. Record the site for surface modification;

(3)用聚酰亚胺对除了记录位点外的神经电极的其它部分进行绝缘处理(涂覆),获得一种纳米材料修饰的神经电极。(3) Use polyimide to insulate (coat) the other parts of the nerve electrode except the recording site to obtain a nanomaterial-modified nerve electrode.

实施例5Example 5

一种纳米材料修饰的神经电极及制备方法,包括如下步骤:A nerve electrode modified by nanomaterials and a preparation method thereof, comprising the steps of:

(1)对神经电极(商品化直径为100μm)的记录位点表面进行粗糙化处理,(用400目砂纸进行打磨,用去离子水冲洗,依次放入丙酮、无水乙醇中超声清洗,干燥;(1) Roughen the surface of the recording site of the nerve electrode (commercialized with a diameter of 100 μm), (polish with 400-grit sandpaper, rinse with deionized water, put in acetone and absolute ethanol for ultrasonic cleaning, and dry ;

(2)将步骤(1)获得的电极为工作电极,以铂电极作为对电极,以Ag/AgCl作为参比电极,接入电化学工作站中,分别以浓度0.5mg/mL的MoS2水溶液、MoTe2水溶液、石墨烯水溶液为电沉积工作液放入电解池中,选择恒电压沉积方式,在沉积电压为2V,每层沉积时间为300s,进行沉积,沉积层数1层,得电化学沉积膜层,对神经电极的记录位点进行表面修饰;(2) The electrode obtained in step (1) is used as a working electrode, the platinum electrode is used as a counter electrode, and Ag/AgCl is used as a reference electrode, which is connected to an electrochemical workstation, and MoS with a concentration of 0.5 mg/mL aqueous solution, The MoTe 2 aqueous solution and the graphene aqueous solution are put into the electrolytic cell as the electrodeposition working solution, and the constant voltage deposition method is selected. The deposition voltage is 2V, and the deposition time of each layer is 300s. Membrane layer to modify the surface of the recording site of the nerve electrode;

(3)用聚酰亚胺对除了记录位点外的神经电极的其它部分进行绝缘处理(涂覆),获得3个一种纳米材料修饰的神经电极。(3) Use polyimide to insulate (coat) the other parts of the nerve electrodes except the recording site, and obtain three nerve electrodes modified by a kind of nanomaterial.

实施例6Example 6

一种纳米材料修饰的神经电极及制备方法,包括如下步骤:A nerve electrode modified by nanomaterials and a preparation method thereof, comprising the steps of:

(1)同实施例3步骤(1);(1) with embodiment 3 steps (1);

(2)将步骤(1)获得的电极为工作电极,以铂电极作为对电极,以Ag/AgCl作为参比电极,接入电化学工作站中,以浓度10mg/mL的MoTe2水溶液为电沉积工作液放入电解池中,选择恒电流沉积方式,沉积电流1mA,每层沉积时间为120s,进行沉积,沉积层数1层,得电化学沉积膜层,对神经电极的记录位点进行表面修饰;(2) The electrode obtained in step (1) is used as the working electrode, the platinum electrode is used as the counter electrode, and Ag/AgCl is used as the reference electrode, connected to the electrochemical workstation, and the MoTe 2 aqueous solution with a concentration of 10mg/mL is used for electrodeposition Put the working solution into the electrolytic cell, select the constant current deposition method, the deposition current is 1mA, and the deposition time of each layer is 120s. The deposition is carried out. The number of deposition layers is 1 layer, and the electrochemical deposition film is obtained. modification;

(3)用聚酰亚胺对除了记录位点外的神经电极的其它部分进行绝缘处理(涂覆),获得一种纳米材料修饰的神经电极。(3) Use polyimide to insulate (coat) the other parts of the nerve electrode except the recording site to obtain a nanomaterial-modified nerve electrode.

实施例7Example 7

一种纳米材料修饰的神经电极及制备方法,包括如下步骤:A nerve electrode modified by nanomaterials and a preparation method thereof, comprising the steps of:

(1)同实施例1步骤(1);(1) with embodiment 1 step (1);

(2)将步骤(1)获得的电极为工作电极,以铂电极作为对电极,以Ag/AgCl作为参比电极,接入电化学工作站中,以浓度3mg/mL的FeN4水溶液为电沉积工作液放入电解池中,选择多电位阶跃沉积方式,在沉积电压为0.3V,每层沉积时间为10s,进行沉积,沉积层数10层,共沉积时间100s,得电化学沉积膜层,对神经电极的记录位点进行表面修饰;(2) The electrode obtained in step (1) is used as the working electrode, the platinum electrode is used as the counter electrode, and Ag/AgCl is used as the reference electrode, which is connected to the electrochemical workstation, and the FeN aqueous solution with a concentration of 3 mg/mL is used as the electrodeposited electrode. The working solution is put into the electrolytic cell, and the multi-potential step deposition method is selected. The deposition voltage is 0.3V, and the deposition time of each layer is 10s, and the deposition is carried out. The number of deposition layers is 10 layers, and the co-deposition time is 100s, and the electrochemical deposition film is obtained. , to modify the surface of the recording site of the nerve electrode;

(3)用聚对二甲苯对除了记录位点外的神经电极的其它部分进行绝缘处理(涂覆),获得一种纳米材料修饰的神经电极。(3) Insulate (coat) the parts of the nerve electrode except the recording site with parylene to obtain a nanomaterial-modified nerve electrode.

实施例8Example 8

一种纳米材料修饰的神经电极及制备方法,包括如下步骤:A nerve electrode modified by nanomaterials and a preparation method thereof, comprising the steps of:

(1)同实施例1步骤(1);(1) with embodiment 1 step (1);

(2)将步骤(1)获得的电极为工作电极,以铂电极作为对电极,以Ag/AgCl作为参比电极,接入电化学工作站中,以浓度3mg/mL的VN4水溶液为电沉积工作液放入电解池中,选择恒电压沉积方式,在沉积电压为0.3V,每层沉积时间为10s,进行沉积,沉积层数10层,共沉积时间100s,得电化学沉积膜层,对神经电极的记录位点进行表面修饰;(2) The electrode obtained in step (1) is used as the working electrode, the platinum electrode is used as the counter electrode, and Ag/AgCl is used as the reference electrode, connected to the electrochemical workstation, and the VN 4 aqueous solution with a concentration of 3 mg/mL is used as the electrodeposited electrode. The working solution was put into the electrolytic cell, and the constant voltage deposition method was selected. The deposition voltage was 0.3V, the deposition time of each layer was 10s, and the deposition was carried out. The number of deposition layers was 10 layers, and the co-deposition time was 100s. Surface modification of the recording site of the nerve electrode;

(3)用聚对二甲苯对除了记录位点外的神经电极的其它部分进行绝缘处理(涂覆),获得一种纳米材料修饰的神经电极。(3) Insulate (coat) the parts of the nerve electrode except the recording site with parylene to obtain a nanomaterial-modified nerve electrode.

实施例9Example 9

一种纳米材料修饰的神经电极及制备方法,包括如下步骤:A nerve electrode modified by nanomaterials and a preparation method thereof, comprising the steps of:

(1)同实施例3步骤(1);(1) with embodiment 3 steps (1);

(2)将步骤(1)获得的电极为工作电极,以铂电极作为对电极,以Ag/AgCl作为参比电极,接入电化学工作站中,以浓度3mg/mL的MnN4水溶液为电沉积工作液放入电解池中,选择恒电流沉积方式,沉积电流0.1mA,每层沉积时间为60s,进行沉积,沉积层数10层,共沉积时间600s,得电化学沉积膜层,对神经电极的记录位点进行表面修饰;(2) The electrode obtained in step (1) is used as the working electrode, the platinum electrode is used as the counter electrode, and Ag/AgCl is used as the reference electrode, connected to the electrochemical workstation, and the MnN aqueous solution with a concentration of 3mg/mL is used as the electrodeposited electrode. Put the working solution into the electrolytic cell, select the constant current deposition method, the deposition current is 0.1mA, and the deposition time of each layer is 60s. The deposition is carried out. The number of deposition layers is 10 layers, and the deposition time is 600s. Surface modification of the recording site;

(3)用聚对二甲苯对除了记录位点外的神经电极的其它部分进行绝缘处理(涂覆),获得一种纳米材料修饰的神经电极。(3) Insulate (coat) the parts of the nerve electrode except the recording site with parylene to obtain a nanomaterial-modified nerve electrode.

实验证明,用Cu、Rh、Pd、Pt、Ni、Zn、Ru、Ir、Cr、Zr、Mo、Re、Au、Cd、Tb、W、Ce或Co替代本实施例的MnN4中的Mn,其它同本实施例,制备的相应的一种纳米材料修饰的神经电极。Experiments have shown that replacing Mn in MnN 4 in this embodiment with Cu, Rh, Pd, Pt, Ni, Zn, Ru, Ir, Cr, Zr, Mo, Re, Au, Cd, Tb, W, Ce or Co, Others are the same as in this embodiment, and a corresponding nanomaterial-modified nerve electrode is prepared.

实验例:Experimental example:

一种纳米材料修饰的神经电极(实施例1制备)的结构表征及电化学性能测试Structural characterization and electrochemical performance test of a nanomaterial-modified nerve electrode (prepared in Example 1)

图2为利用扫描电子显微镜和原子力显微镜对实施例1制备的一种纳米材料修饰的神经电极表面形貌及粗糙度的表征。与祼电极相比,一种纳米材料修饰的神经电极表面纳米功能层均匀且致密,在界面处形成大的比表面积,并与基底紧密结合。可以在不增加电极几何尺寸的前提下增大电极-组织界面的有效接触面积,增强电极电荷传输性能。FIG. 2 is a characterization of the surface morphology and roughness of a nanomaterial-modified nerve electrode prepared in Example 1 by scanning electron microscope and atomic force microscope. Compared with the bare electrode, the nano-functional layer on the surface of the nerve electrode modified by a nano-material is uniform and dense, forming a large specific surface area at the interface and tightly combined with the substrate. The effective contact area of the electrode-tissue interface can be increased without increasing the geometric size of the electrode, and the charge transport performance of the electrode can be enhanced.

图3为纳米材料修饰的神经电极(实施例1制备)的电学性能。相比于未修饰的神经电极(祼电极),一种纳米材料修饰的神经电极的电化学阻抗在生物相关频率1kHz下降低。一种纳米材料修饰的神经电极表面通过的电流幅值明显上升,且循环伏安曲线包围的面积比祼电极面积明显增大,电荷存储量提升。说明一种纳米材料修饰的神经电极由于界面修饰功能层的作用,能显著提升祼神经电极的电学性能。FIG. 3 is the electrical performance of the nanomaterial-modified nerve electrode (prepared in Example 1). Compared to unmodified nerve electrodes (bare electrodes), the electrochemical impedance of a nanomaterial-modified nerve electrode was reduced at a biologically relevant frequency of 1 kHz. The amplitude of the current passing through the surface of the nerve electrode modified by a nanomaterial is significantly increased, and the area surrounded by the cyclic voltammetry curve is significantly larger than that of the bare electrode, and the charge storage capacity is improved. It shows that a nerve electrode modified by nanomaterials can significantly improve the electrical performance of the bare nerve electrode due to the function of the interface modification functional layer.

图4为实施例2制备的不同纳米团簇修饰的神经电极的电学性能,Fig. 4 is the electrical performance of the nerve electrode modified by different nanoclusters prepared in Example 2,

图5为不同二维纳米材料修饰的神经电极(实施例5)的电学性能,均能显著降低神经电极的电化学阻抗,显著提升神经电极的电学性能。Fig. 5 shows the electrical properties of nerve electrodes modified by different two-dimensional nanomaterials (Example 5), all of which can significantly reduce the electrochemical impedance of the nerve electrodes and significantly improve the electrical properties of the nerve electrodes.

实验证明,实施例3、4、6、7、8、9制备的一种纳米材料修饰的神经电极的电极表面形貌及粗糙度与祼电极相比粗糙度增大。阻抗降低,电荷存储量增加。Experiments have shown that the electrode surface morphology and roughness of a kind of nanomaterial-modified nerve electrode prepared in Examples 3, 4, 6, 7, 8, and 9 are larger than those of the bare electrode. Impedance decreases and charge storage increases.

本发明的一种纳米材料修饰的神经电极具有优异的生物相容性、高比表面积及稳定性,并且在长时间使用后依然能保持良好的性能,满足长期植入体内的需求。The nerve electrode modified by the nanometer material of the present invention has excellent biocompatibility, high specific surface area and stability, and can still maintain good performance after long-term use, meeting the requirement of long-term implantation in the body.

Claims (10)

1.一种纳米材料修饰的神经电极的制备方法,其特征是包括如下步骤:1. A preparation method for a nerve electrode modified by nanomaterials, characterized in that it may further comprise the steps: (1)对神经电极的记录位点表面进行粗糙化处理,用去离子水冲洗,依次放入丙酮、无水乙醇中超声清洗,干燥;(1) Roughen the surface of the recording site of the nerve electrode, rinse it with deionized water, put it into acetone and absolute ethanol for ultrasonic cleaning, and dry it; (2)将步骤(1)获得的电极为工作电极,以铂电极作为对电极,以Ag/AgCl作为参比电极,接入电化学工作站中,以浓度0.5-10mg/mL的纳米材料水溶液为电沉积工作液放入电解池中,进行沉积,沉积层数1-10层,对神经电极的记录位点进行表面修饰;(2) The electrode obtained in step (1) is used as the working electrode, the platinum electrode is used as the counter electrode, and Ag/AgCl is used as the reference electrode, which is connected to the electrochemical workstation, and the nanomaterial aqueous solution with a concentration of 0.5-10mg/mL is used as the The electrodeposition working solution is put into the electrolytic cell for deposition, the number of deposition layers is 1-10 layers, and the surface modification of the recording site of the nerve electrode is carried out; (3)用聚酰亚胺或聚对二甲苯对除了记录位点外的神经电极的其它部分进行绝缘处理,获得一种纳米材料修饰的神经电极。(3) Use polyimide or parylene to insulate other parts of the nerve electrode except the recording site to obtain a nanomaterial-modified nerve electrode. 2.根据权利要求1所述的方法,其特征是所述纳米材料为二维纳米材料、纳米团簇或单原子材料。2. The method according to claim 1, characterized in that the nanomaterials are two-dimensional nanomaterials, nanoclusters or single-atom materials. 3.根据权利要求2所述的方法,其特征是所述二维纳米材料的材质为石墨烯,MoS2或MoTe23. The method according to claim 2, characterized in that the material of the two-dimensional nanomaterial is graphene, MoS 2 or MoTe 2 . 4.根据权利要求2所述的方法,其特征是所述纳米团簇为Au纳米团簇,Ag纳米团簇,Mn纳米团簇或Pt纳米团簇。4. The method according to claim 2, characterized in that the nanoclusters are Au nanoclusters, Ag nanoclusters, Mn nanoclusters or Pt nanoclusters. 5.根据权利要求2所述的方法,其特征是所述单原子材料为MN4,所述MN4中的M为Fe、Cu、Rh、V、Pd、Pt、Ni、Mn、Zn、Ru、Ir、Cr、Zr、Mo、Re、Au、Cd、Tb、W、Ce或Co。5. The method according to claim 2, characterized in that the monoatomic material is MN 4 , and M in the MN 4 is Fe, Cu, Rh, V, Pd, Pt, Ni, Mn, Zn, Ru , Ir, Cr, Zr, Mo, Re, Au, Cd, Tb, W, Ce or Co. 6.根据权利要求1所述的方法,其特征是所述沉积的方式为恒电流沉积、恒电压沉积或多电位阶跃沉积。6. The method according to claim 1, characterized in that the deposition method is constant current deposition, constant voltage deposition or multi-potential step deposition. 7.根据权利要求6所述的方法,其特征是所述恒电流沉积的参数为沉积电流0.01-1mA,共沉积时间为120-1200s。7. The method according to claim 6, characterized in that the parameters of the constant current deposition are a deposition current of 0.01-1mA, and a co-deposition time of 120-1200s. 8.根据权利要求6所述的方法,其特征是所述恒电压沉积的参数为沉积电压0.1-2V,共沉积时间为96-300s。8. The method according to claim 6, characterized in that the parameters of the constant voltage deposition are a deposition voltage of 0.1-2V, and a co-deposition time of 96-300s. 9.根据权利要求6所述的方法,其特征是所述多电位阶跃沉积的参数为沉积电压0.1-2V,共沉积时间为96-300s。9. The method according to claim 6, characterized in that the parameters of the multi-potential step deposition are a deposition voltage of 0.1-2V, and a co-deposition time of 96-300s. 10.权利要求1-9之一的方法制备的一种纳米材料修饰的神经电极。10. A nanomaterial-modified nerve electrode prepared by the method according to any one of claims 1-9.
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