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CN114381709A - Coating, use and preparation method - Google Patents

Coating, use and preparation method Download PDF

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Publication number
CN114381709A
CN114381709A CN202011134111.3A CN202011134111A CN114381709A CN 114381709 A CN114381709 A CN 114381709A CN 202011134111 A CN202011134111 A CN 202011134111A CN 114381709 A CN114381709 A CN 114381709A
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coating
carbon
intermediate layer
catalyst
catalyst intermediate
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郭靖
孙红胜
杨海生
王加朋
杨旺林
张玉国
张鑫
吴柯萱
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Beijing Zhenxing Metrology and Test Institute
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    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/22Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
    • C23C16/26Deposition of carbon only
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/02Pretreatment of the material to be coated
    • C23C16/0272Deposition of sub-layers, e.g. to promote the adhesion of the main coating
    • C23C16/0281Deposition of sub-layers, e.g. to promote the adhesion of the main coating of metallic sub-layers
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/06Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of metallic material
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/50Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges

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  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Metallurgy (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • General Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Inorganic Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • Plasma & Fusion (AREA)
  • Carbon And Carbon Compounds (AREA)
  • Chemical Vapour Deposition (AREA)

Abstract

The invention provides a coating, application and a preparation method thereof. The special catalyst intermediate layer is prepared, and the carbon nano structure prepared by plasma enhanced chemical vapor deposition is introduced into the black body coating, so that the coating has high light absorption performance and high emissivity, has good bonding force with a substrate material, and improves stability and durability.

Description

涂层、用途及制备方法Coating, use and preparation method

技术领域technical field

本发明涉及涂层、用途及制备方法,属于黑体涂层制备技术领域。The invention relates to coatings, uses and preparation methods, and belongs to the technical field of preparation of black body coatings.

背景技术Background technique

黑体是基于普朗克定律的理想化物理模型,是理想的漫反射体,在科学研究、航空航天、工业生产等方面有广泛的应用。作为宽带红外辐射源,高稳定中温面源黑体的波长范围覆盖了从近红外到远红外的波段,是辐射理论分析和辐射测量的基础,在红外光学系统及测试设备的绝对校准、物体辐射特性测量、红外探测器定标及红外目标模拟的测试和整体性能评价方面,应用越来越广。面源黑体作为红外目标源可应用于红外系统的探测、识别和定位;可作为辐射源背景用于干扰红外系统的探测;也可作为校准辐射源用于黑体的辐射定标。而这些应用对辐射面的温度稳定性和辐射精度有很高的要求。The black body is an idealized physical model based on Planck's law. It is an ideal diffuse reflector and has a wide range of applications in scientific research, aerospace, and industrial production. As a broadband infrared radiation source, the wavelength range of the highly stable medium-temperature surface source blackbody covers the band from near-infrared to far-infrared, and is the basis for radiation theoretical analysis and radiation measurement. Measurement, infrared detector calibration and infrared target simulation testing and overall performance evaluation are more and more widely used. As an infrared target source, the surface blackbody can be applied to the detection, identification and positioning of the infrared system; it can be used as the background of the radiation source to detect the interference of the infrared system; it can also be used as the calibration radiation source for the radiation calibration of the blackbody. These applications have high requirements on the temperature stability and radiation accuracy of the radiation surface.

黑体涂层是面源黑体的核心组件之一,其参数直接决定了面源黑体的性能。目前,常见黑体所用涂层为具有高发射率的特种漆,可使用刷涂或者喷涂的方法进行沉积,如聚合物加碳或硅树脂加金属氧化物等,但其常温或高温下的发射率较低,其成分一般为聚合物(如硅橡胶、聚氨酯、环氧树脂、硅树脂等)和填料(如碳、金属氧化物等),然而,这些高发射率涂层的发射率一般为0.92~0.95,仍然达不到新一代高性能辐射源的要求;此外,由于部分聚合物与金属基底黏附性较差,且聚合物容易老化开裂,因此这些黑体涂层仍然存在稳定性低和耐久性差的问题。The blackbody coating is one of the core components of the area source blackbody, and its parameters directly determine the performance of the area source blackbody. At present, the coating used for common black bodies is a special paint with high emissivity, which can be deposited by brushing or spraying, such as polymer plus carbon or silicone resin plus metal oxide, etc., but its emissivity at room temperature or high temperature Lower, its components are generally polymers (such as silicone rubber, polyurethane, epoxy, silicone, etc.) and fillers (such as carbon, metal oxides, etc.), however, these high emissivity coatings are generally 0.92 emissivity ~0.95, still cannot meet the requirements of a new generation of high-performance radiation sources; in addition, due to the poor adhesion of some polymers to metal substrates, and the polymers are easy to age and crack, these blackbody coatings still have low stability and poor durability. The problem.

通过等离子体增强化学气相沉积制备的碳纳米结构具有非常高的光吸收率和红外发射率,然而,现有基于等离子体增强化学气相沉积制备的碳纳米涂层具有较高的基底选择性,只能在金属或者硅片等特定基底上进行制备,面内均匀性会随着基底尺寸增大而降低。同时,由于碳材料和基底材料结合力弱,涂层力学强度较低,稳定性和耐久性较差,因此很少被应用于面源黑体辐射层的制备。Carbon nanostructures prepared by plasma-enhanced chemical vapor deposition have very high light absorption and infrared emissivity. However, existing carbon nanocoatings based on plasma-enhanced chemical vapor deposition have high substrate selectivity, only It can be fabricated on specific substrates such as metal or silicon wafers, and the in-plane uniformity will decrease as the size of the substrate increases. At the same time, due to the weak bonding force between carbon materials and substrate materials, the mechanical strength of the coating is low, and the stability and durability are poor, so it is rarely used in the preparation of surface source blackbody radiation layers.

发明内容SUMMARY OF THE INVENTION

本发明的目的在于克服现有技术不足,提供一种具有高吸光性能、高发射率、稳定性高、耐久性好的涂层、用途及其制备方法。The purpose of the present invention is to overcome the deficiencies of the prior art, and to provide a coating with high light absorption performance, high emissivity, high stability and good durability, application and preparation method thereof.

本发明的技术解决方案:涂层,包括催化剂中间层和碳基涂层,所述的催化剂中间层为岛状结构,碳基涂层通过等离子体增强化学气相沉积工艺沉积在岛状结构的催化剂中间层上。Technical solution of the present invention: the coating includes a catalyst intermediate layer and a carbon-based coating, the catalyst intermediate layer is an island-shaped structure, and the carbon-based coating is deposited on the catalyst with the island-shaped structure by a plasma-enhanced chemical vapor deposition process. on the middle layer.

一种黑体,包括黑体基底和附着在黑体基底上的黑体涂层,所述的黑体涂层包括催化剂中间层和碳基涂层,所述的催化剂中间层为岛状结构,碳基涂层通过等离子体增强化学气相沉积工艺沉积在岛状结构的催化剂中间层上。A black body, comprising a black body base and a black body coating attached to the black body base, the black body coating comprising a catalyst intermediate layer and a carbon-based coating, the catalyst intermediate layer is an island structure, and the carbon-based coating passes through Plasma-enhanced chemical vapor deposition process deposits on the catalyst intermediate layer of island structure.

一种涂层制备方法,通过以下步骤实现:A coating preparation method is realized by the following steps:

基底预处理;substrate pretreatment;

催化剂中间层制备,Preparation of catalyst intermediate layer,

基底上制备过渡金属催化剂形成的岛状结构;The island structure formed by preparing the transition metal catalyst on the substrate;

碳基涂层沉积,Carbon based coating deposition,

在岛状结构的催化剂中间层上沉积得到碳基涂层。The carbon-based coating is obtained by depositing on the catalyst intermediate layer of island structure.

一种催化剂中间层和催化剂中间层上的碳基涂层组成的复合涂层在黑体涂层中的应用。An application of a composite coating consisting of a catalyst intermediate layer and a carbon-based coating on the catalyst intermediate layer in a black body coating.

本发明与现有技术相比的有益效果:The beneficial effects of the present invention compared with the prior art:

(1)本发明制备特殊的催化剂中间层,将等离子体增强化学气相沉积制备的碳纳米结构引入到黑体涂层中,使得涂层具有高吸光性能、高发射率,且与基底材料结合力好,提高稳定性和耐久性;(1) The present invention prepares a special catalyst intermediate layer, and introduces the carbon nanostructure prepared by plasma enhanced chemical vapor deposition into the black body coating, so that the coating has high light absorption performance, high emissivity, and good bonding force with the base material , improve stability and durability;

(2)本发明通过制备岛状的催化剂中间层,使后续沉积的碳基涂层具有疏松的纳米片层结构,具有较高的粗糙度,提高涂层的发射率,满足新一代高性能辐射源的要求;(2) In the present invention, by preparing an island-shaped catalyst intermediate layer, the subsequently deposited carbon-based coating has a loose nano-sheet structure with high roughness, improves the emissivity of the coating, and satisfies the new generation of high-performance radiation source requirements;

(3)本发明可制备具有高表面粗糙度的碳基涂层,常温和200℃发射率不低于0.98;(3) The present invention can prepare carbon-based coatings with high surface roughness, and the emissivity at room temperature and 200°C is not less than 0.98;

(4)本发明采用较为成熟的等离子体增强化学气相沉积等工艺,可以用于大面积涂层制备(最大1m×1m),且制备的黑体涂层具有均匀性高、稳定性好等优点;(4) The present invention adopts relatively mature technologies such as plasma enhanced chemical vapor deposition, which can be used for the preparation of large-area coatings (maximum 1m×1m), and the prepared blackbody coating has the advantages of high uniformity and good stability;

(5)本发明采用催化剂中间层,使得等离子体增强化学气相沉积可适用于金属、石墨等高导热率基底,实现在多种基底上的适用性,可用于新一代高性能辐射源的制备;(5) The present invention adopts a catalyst intermediate layer, so that the plasma enhanced chemical vapor deposition can be applied to substrates with high thermal conductivity such as metals and graphite, so as to realize the applicability on various substrates, and can be used for the preparation of a new generation of high-performance radiation sources;

(6)本发明由于碳基涂层较高的发射率和导热性能,使用本发明制备的黑体涂层的黑体具有较高的综合性能,是制备高性能辐射源的必要条件。(6) In the present invention, due to the higher emissivity and thermal conductivity of the carbon-based coating, the blackbody of the blackbody coating prepared by the present invention has higher comprehensive properties, which is a necessary condition for preparing a high-performance radiation source.

附图说明Description of drawings

图1为本发明制备流程图;Fig. 1 is the preparation flow chart of the present invention;

图2为本发明实施例1铜基底上沉积碳基黑体涂层的电子扫描显微镜照片;2 is a scanning electron microscope photograph of a carbon-based blackbody coating deposited on a copper substrate in Example 1 of the present invention;

图3为本发明实施例2铝基底上沉积碳基黑体涂层的电子扫描显微镜照片。FIG. 3 is a scanning electron microscope photograph of a carbon-based blackbody coating deposited on an aluminum substrate in Example 2 of the present invention.

具体实施方式Detailed ways

下面结合具体实例及附图对本发明进行详细说明。The present invention will be described in detail below with reference to specific examples and accompanying drawings.

本发明提供一种涂层,包括催化剂中间层和催化剂中间层上的碳基涂层,催化剂中间层为岛状结构,碳基涂层通过等离子体增强化学气相沉积工艺沉积在岛状结构的催化剂中间层上。The invention provides a coating, comprising a catalyst intermediate layer and a carbon-based coating on the catalyst intermediate layer, the catalyst intermediate layer is an island-shaped structure, and the carbon-based coating is deposited on the catalyst with the island-shaped structure by a plasma enhanced chemical vapor deposition process on the middle layer.

本发明催化剂中间层为过渡金属涂层,通过电镀、磁控溅射或者电子束沉积等方法在基底上沉积制成。The catalyst intermediate layer of the present invention is a transition metal coating, which is deposited on the substrate by methods such as electroplating, magnetron sputtering or electron beam deposition.

本发明的催化剂采用与碳材料具有较强相互作用的过渡金属催化剂,包括但不限于镍、钴、铁、锰等材料,优选催化剂为金属镍。催化剂的沉积对于黑体涂层的沉积有着非常重要的影响,催化剂种类、厚度和形貌对于黑体涂层的微观结构和热辐射性能起到了决定性的作用。本发明中优选催化剂中间层厚度为5纳米至20纳米,优选不大于10纳米,在该催化剂中间层上沉积所得的碳基涂层能形成疏松的纳米片层结构。若催化剂中间层厚度太厚,沉积所得的碳纳米结构非常致密,发射率较低;而催化剂中间层厚度太小,则无法得到连续的碳基涂层。The catalyst of the present invention adopts a transition metal catalyst with strong interaction with carbon materials, including but not limited to nickel, cobalt, iron, manganese and other materials, and the catalyst is preferably metal nickel. The deposition of the catalyst has a very important influence on the deposition of the blackbody coating. The type, thickness and morphology of the catalyst play a decisive role in the microstructure and thermal radiation performance of the blackbody coating. In the present invention, the thickness of the catalyst intermediate layer is preferably 5 nanometers to 20 nanometers, preferably not more than 10 nanometers, and the carbon-based coating deposited on the catalyst intermediate layer can form a loose nano-sheet structure. If the thickness of the catalyst intermediate layer is too thick, the deposited carbon nanostructures are very dense and have low emissivity; while the thickness of the catalyst intermediate layer is too small, a continuous carbon-based coating cannot be obtained.

本发明的催化剂层沉积量为0.01~1mg/cm2,通过控制催化剂层的沉积量,使催化剂层的生长被控制在成核阶段,能够形成岛状结构。岛状结构的存在,能够使得碳材料在生长过程中形成疏松的纳米片层结构,该粗糙结构能够增大涂层发射率。若催化剂沉积量过高,会导致催化剂颗粒之间发生聚并,则碳材料在基底上的生长不具有选择性,所得碳纳米结构会相对更加致密,发射率较低。The deposition amount of the catalyst layer in the present invention is 0.01-1 mg/cm 2 , and by controlling the deposition amount of the catalyst layer, the growth of the catalyst layer is controlled in the nucleation stage, and an island-like structure can be formed. The existence of the island-like structure can make the carbon material form a loose nano-sheet structure during the growth process, and the rough structure can increase the emissivity of the coating. If the catalyst deposition amount is too high, coalescence will occur between catalyst particles, the growth of carbon materials on the substrate will not be selective, and the resulting carbon nanostructures will be relatively denser and have lower emissivity.

本发明通过制备催化剂中间层,在这些催化剂存在的条件下,碳前驱体如常见甲烷、乙烯、乙炔等在催化剂作用下分解为碳,并且沿着碳的特定晶面进行生长,形成片状结构,最终得到具有较高粗糙度的纳米片层状碳基涂层。The present invention prepares a catalyst intermediate layer, and in the presence of these catalysts, carbon precursors such as common methane, ethylene, acetylene, etc. are decomposed into carbon under the action of the catalyst, and grow along a specific crystal plane of the carbon to form a sheet-like structure , and finally a nanosheet layered carbon-based coating with higher roughness was obtained.

本发明碳基涂层使用等离子体增强化学气相沉积的方法,在负载有催化剂中间层的基底上进行碳材料的气相沉积。The carbon-based coating of the present invention utilizes a plasma-enhanced chemical vapor deposition method to perform vapor deposition of carbon materials on a catalyst intermediate layer-supported substrate.

本发明等离子体增强化学气相沉积工艺中,反应气体流速为0.1~5L/h,优选0.1~2L/h;在反应气体流速为0.1~5L/h工艺控制下,沉积得到的碳基涂层具有碳纳米片层结构,且片层厚度在10~50nm之间,碳基涂层易于形成高粗糙度。当片层厚度处于10~50nm之间的纳米尺寸范围内,由于量子尺寸效应,受光激发振动的电子会受到更大的阻尼,因此吸光效果更强,根据基尔霍夫定律,其发射率更高。In the plasma enhanced chemical vapor deposition process of the present invention, the flow rate of the reactive gas is 0.1-5L/h, preferably 0.1-2L/h; under the process control of the flow rate of the reactive gas being 0.1-5L/h, the deposited carbon-based coating has The carbon nanosheet structure, and the thickness of the sheet is between 10 and 50 nm, and the carbon-based coating is easy to form high roughness. When the thickness of the lamella is in the nanometer size range between 10 and 50 nm, due to the quantum size effect, the electrons excited by light will be more damped, so the light absorption effect is stronger. According to Kirchhoff's law, the emissivity is higher. high.

若流速太高,超过5L/h时,所得碳基涂层结构非常致密,发射率较低,不具备实用价值;当流速小于0.1L/h时,沉积速度非常慢,生产效率太低。If the flow rate is too high and exceeds 5L/h, the obtained carbon-based coating has a very dense structure and low emissivity, which is not practical. When the flow rate is less than 0.1L/h, the deposition rate is very slow and the production efficiency is too low.

本发明中碳基涂层厚度优选500nm~20μm,若涂层厚度太低,则无法实现对入射光线的全部吸收,基底的反射会导致其反射率增大,发射率降低;若涂层厚度太高,则碳纳米结构支撑力较弱,涂层稳定性降低。In the present invention, the thickness of the carbon-based coating is preferably 500 nm to 20 μm. If the thickness of the coating is too low, it will not be able to fully absorb the incident light, and the reflection of the substrate will lead to an increase in reflectivity and a decrease in emissivity. If it is high, the supporting force of the carbon nanostructure is weak, and the stability of the coating is reduced.

本发明中其他等离子体增强化学气相沉积工艺为本领域公知技术,本领域技术人员根据反应气体流速及碳基涂层厚度要求,结合实际需要进行调整。Other plasma-enhanced chemical vapor deposition processes in the present invention are known in the art, and those skilled in the art can adjust the flow rate of the reactive gas and the thickness of the carbon-based coating in combination with actual needs.

本发明优选以下等离子体增强化学气相沉积条件:The present invention prefers the following plasma enhanced chemical vapor deposition conditions:

a.载气:选用氢气或者氩气,载气中可加入1%~20%的氮气作为氮掺杂源;a. Carrier gas: choose hydrogen or argon, and 1% to 20% of nitrogen can be added to the carrier gas as a nitrogen doping source;

b.反应气体:碳前驱体(甲烷、乙烯、乙炔等)b. Reactive gas: carbon precursor (methane, ethylene, acetylene, etc.)

c.气体纯度:载气和反应气体的纯度在3N~5N间可调;c. Gas purity: the purity of carrier gas and reaction gas can be adjusted between 3N and 5N;

d.反应气体流速:0.1~5L/h;d. Flow rate of reaction gas: 0.1~5L/h;

e.载气流速:5~10L/h;e. Carrier gas flow rate: 5~10L/h;

f.反应室总压力:1×10-5Torr~500×10-5Torr;f. The total pressure of the reaction chamber: 1×10 -5 Torr~500×10 -5 Torr;

g.基底温度:400~800℃;g. Substrate temperature: 400~800℃;

h.等离子功率:10W~100W;h. Plasma power: 10W~100W;

i.沉积时间:10min~50min;i. Deposition time: 10min~50min;

优选等离子体增强化学气相沉积中,首先抽真空至10~50Torr数量级范围内,使用氩气或者氢气进行洗涤,将基底升温至指定温度后,开始通入反应气体/载气,开启等离子体装置进行化学气相沉积。Preferably, in plasma-enhanced chemical vapor deposition, the vacuum is firstly pumped to the order of magnitude of 10-50 Torr, washed with argon or hydrogen, and the substrate is heated to a specified temperature, and then the reaction gas/carrier gas is introduced, and the plasma device is turned on. chemical vapor deposition.

进一步,本发明催化剂中间层和催化剂中间层上的碳基涂层组成的复合涂层,在黑体涂层中的应用。Further, the application of the composite coating composed of the catalyst intermediate layer and the carbon-based coating on the catalyst intermediate layer of the present invention in the black body coating.

进一步,本发明如图1所示,提供一种涂层制备方法,包括基底预处理、催化剂中间层沉积和碳基涂层沉积。Further, as shown in FIG. 1 , the present invention provides a coating preparation method, which includes substrate pretreatment, catalyst intermediate layer deposition and carbon-based coating deposition.

基底预处理:Substrate pretreatment:

基底的预处理,是指用过化学(包括但不限于酸洗、碱洗、水或者有机溶剂洗)、物理(包括但不限于喷砂、打磨、超声)或者两者相结合的方法,清除基底材料表面的杂质,提高基底与后续沉积涂层间的结合力。The pretreatment of the substrate refers to the removal of the substrate by chemical (including but not limited to acid washing, alkali washing, water or organic solvent washing), physical (including but not limited to sandblasting, grinding, ultrasonic) or a combination of the two methods. Impurities on the surface of the substrate material that improve the bond between the substrate and the subsequently deposited coating.

基底的预处理方式的选择为本领域公知技术,本领域技术人员根据实际情况具体确定。The selection of the pretreatment mode of the substrate is a well-known technology in the art, and is specifically determined by those skilled in the art according to the actual situation.

优选喷砂或打磨后使用有机溶剂清洗,这种组合处理方法有利于形成粗糙表面,能够增大最终所得涂层的发射率。It is preferable to use an organic solvent for cleaning after sandblasting or sanding. This combined treatment method is conducive to the formation of a rough surface and can increase the emissivity of the final resulting coating.

催化剂中间层制备:Preparation of catalyst intermediate layer:

催化剂中间层采用过渡金属催化剂,催化剂中间层厚度为5纳米至20纳米,本发明催化剂中间层形貌为岛状结构。The catalyst intermediate layer adopts a transition metal catalyst, the thickness of the catalyst intermediate layer is 5 nanometers to 20 nanometers, and the morphology of the catalyst intermediate layer of the present invention is an island structure.

本步骤采用公知的电镀、磁控溅射或者电子束沉积等方法在基底上制成催化剂中间层,根据上述对得到催化剂中间层的要求,本领域技术人员对现有技术进行调整,得到合适的工艺参数。In this step, a known method such as electroplating, magnetron sputtering or electron beam deposition is used to form a catalyst intermediate layer on the substrate. According to the above requirements for obtaining a catalyst intermediate layer, those skilled in the art adjust the prior art to obtain a suitable catalyst. process parameters.

碳基涂层沉积:Carbon based coating deposition:

本步骤碳基涂层沉积使用等离子体增强化学气相沉积的方法,在催化剂中间层上沉积而成,反应气体流速为0.1~5L/h,碳基涂层厚度优选500nm~20μm。In this step, the carbon-based coating is deposited on the catalyst intermediate layer by plasma-enhanced chemical vapor deposition. The flow rate of the reaction gas is 0.1-5 L/h, and the thickness of the carbon-based coating is preferably 500 nm to 20 μm.

进一步,本发明提供一种黑体,包括黑体基底和黑体涂层。Further, the present invention provides a blackbody comprising a blackbody base and a blackbody coating.

基底包括金属基底(包括但不限于黄铜、紫铜、铝、不锈钢)或压片石墨基底等。优选基底具有较高的导热能力(热导率大于20W/(m·K)),方便对黑体涂层进行升温和降温控制,同时其较强的匀热性能可确保面内温度具有较高的均匀性。Substrates include metal substrates (including but not limited to brass, copper, aluminum, stainless steel) or extruded graphite substrates. Preferably, the substrate has high thermal conductivity (thermal conductivity is greater than 20W/(m·K)), which is convenient for heating and cooling control of the blackbody coating, and its strong uniform heat performance can ensure that the in-plane temperature has a relatively high temperature. uniformity.

实施例1Example 1

使用面积为20cm×20cm,纯度为99.8%的紫铜作为基底,在经过喷砂打磨后,使用丙酮对其表面进行擦洗、超声、冲洗,之后用电子束沉积的方法在铜基底上沉积一层10纳米厚,沉积量为0.05mg/cm2的具有岛状结构的金属镍作为催化剂中间层。The copper with an area of 20cm×20cm and a purity of 99.8% was used as the substrate. After sandblasting, the surface was scrubbed, ultrasonicated and rinsed with acetone, and then a layer of 10 was deposited on the copper substrate by electron beam deposition. A nanometer-thick, deposited amount of 0.05 mg/ cm2 of metallic nickel with island-like structure was used as the catalyst intermediate layer.

将上述铜基底放置于等离子体增强化学气相沉积设备中,抽真空至1×10-5Torr,使用氩气冲洗三次,将基底升温至800℃,通入甲烷/氩气/氮气的混合气体(三者流速分别为0.5、9.0和1.0L/h)。调节等离子体发生器的输出功率为50W,沉积30min后,得到碳基涂层。The above-mentioned copper substrate was placed in a plasma-enhanced chemical vapor deposition apparatus, evacuated to 1 × 10 -5 Torr, rinsed with argon three times, the substrate was heated to 800° C., and a mixed gas of methane/argon/nitrogen was introduced ( The flow rates of the three are 0.5, 9.0 and 1.0 L/h, respectively). The output power of the plasma generator was adjusted to 50W, and the carbon-based coating was obtained after 30 min of deposition.

涂层形貌如附图2所示,其结构为随机排列的碳纳米片层结构,片层厚度为20纳米,高度为5微米。由于其结构非常疏松,表面粗糙度较高,常温时其发射率为0.991,200℃时其发射率为0.995。The morphology of the coating is shown in Figure 2, and its structure is a randomly arranged carbon nanosheet structure with a thickness of 20 nanometers and a height of 5 micrometers. Due to its very loose structure and high surface roughness, its emissivity is 0.991 at room temperature and 0.995 at 200 °C.

实施例2、3Embodiment 2, 3

其他条件及制备工艺与实施例1一致,当催化剂中间层厚度分别为5纳米和8纳米,沉积量分别为0.02~0.04mg/cm2,得到涂层形貌、发射率与实施例1类似。Other conditions and preparation process are the same as in Example 1. When the thickness of the catalyst intermediate layer is 5 nm and 8 nm, and the deposition amount is 0.02-0.04 mg/cm 2 , the morphology and emissivity of the coating are similar to those in Example 1.

实施例4Example 4

其他条件及制备工艺与实施例1一致,当催化剂中间层厚度为20纳米,沉积量为0.7mg/cm2,所得催化剂岛状结构之间间距较小,经等离子体增强化学气相沉积后,所得碳涂层结构中碳纳米片层结构较实施例1~3致密,片层厚度为50纳米,碳涂层厚度为10微米,常温时其发射率为0.985,200℃时其发射率为0.989。Other conditions and preparation process are the same as in Example 1. When the thickness of the catalyst intermediate layer is 20 nm and the deposition amount is 0.7 mg/cm 2 , the distance between the obtained catalyst island-like structures is small. The carbon nanosheet structure in the carbon coating structure is denser than that of Examples 1-3, the sheet thickness is 50 nanometers, and the carbon coating thickness is 10 micrometers.

实施例5Example 5

使用面积为50cm×50cm铝板作为基底,经砂纸打磨后,使用丙酮对其表面进行擦洗,快速吹干后,使用化学电镀的方法在铝基底上沉积一层10纳米厚的沉积量为0.05mg/cm2的具有岛状结构的金属镍作为催化剂中间层。An aluminum plate with an area of 50cm×50cm was used as the substrate. After sanding, the surface was scrubbed with acetone. After drying quickly, a 10-nanometer-thick layer was deposited on the aluminum substrate by chemical plating. The deposition amount was 0.05mg/ cm2 of metallic nickel with island-like structure was used as the catalyst intermediate layer.

将上述铝基底放置于等离子体增强化学气相沉积设备中,抽真空至1×10-5Torr,使用氢气冲洗三次,将基底升温至400℃,通入甲烷/氢气的混合气体(两者流速分别为1.0和10L/h)。调节等离子体发生器的输出功率为100W,沉积20min后,得到碳基涂层。The above aluminum substrate was placed in a plasma-enhanced chemical vapor deposition equipment, evacuated to 1 × 10 -5 Torr, rinsed three times with hydrogen, and the substrate was heated to 400° C. 1.0 and 10L/h). The output power of the plasma generator was adjusted to 100 W, and the carbon-based coating was obtained after 20 min of deposition.

涂层形貌如附图3所示,其结构为随机排列的碳纳米片层结构,片层厚度为50纳米,高度为3微米。由于其结构非常疏松,表面粗糙度较高,常温时其发射率为0.982,200℃时其发射率为0.987。The morphology of the coating is shown in Figure 3, and its structure is a randomly arranged carbon nanosheet structure, the thickness of the sheet is 50 nanometers, and the height is 3 micrometers. Due to its very loose structure and high surface roughness, its emissivity is 0.982 at room temperature and 0.987 at 200 °C.

实施例6、7Embodiment 6, 7

通入甲烷/氢气的混合气体,两者流速分别为(5.0和10L/h)和(0.1、10L/h),其他条件和工艺同实施例6,得到涂层形貌和发射率与实施例5类似。The mixed gas of methane/hydrogen was introduced, and the flow rates of the two were respectively (5.0 and 10L/h) and (0.1, 10L/h), and other conditions and processes were the same as those in Example 6, and the coating morphology and emissivity were obtained as in Example 6. 5 is similar.

本发明未详细说明部分为本领域技术人员公知技术。The parts of the present invention that are not described in detail are well known to those skilled in the art.

Claims (12)

1. A coating, characterized by: the catalyst comprises a catalyst middle layer and a carbon-based coating, wherein the catalyst middle layer is of an island-shaped structure, and the carbon-based coating is deposited on the catalyst middle layer of the island-shaped structure through a plasma enhanced chemical vapor deposition process.
2. A coating according to claim 1, wherein: the catalyst intermediate layer is a transition metal catalyst and has a thickness of 5-20 nm.
3. A coating according to claim 1, wherein: the deposition amount of the catalyst intermediate layer is 0.01-1 mg/cm2
4. A coating according to claim 2, wherein: the thickness of the catalyst intermediate layer is not more than 10 nanometers.
5. A coating according to claim 1, wherein: the carbon-based coating has a carbon nano-sheet layer structure, and the thickness of the sheet layer is 10-50 nm.
6. A blackbody comprising a blackbody substrate and a blackbody coating attached to the blackbody substrate, wherein the blackbody coating is any one of the coatings of claims 1-5.
7. A coating preparation method is characterized by comprising the following steps:
pre-treating a substrate;
preparing a catalyst intermediate layer, namely preparing a catalyst intermediate layer,
preparing an island-shaped structure formed by a transition metal catalyst on a substrate;
the preparation of the carbon-based coating,
and depositing the carbon-based coating on the catalyst intermediate layer with the island-shaped structure.
8. A method of preparing a coating according to claim 7, wherein: in the preparation step of the catalyst intermediate layer, the thickness of the catalyst intermediate layer is 5 to 20 nanometers, and the deposition amount is 0.01 to 1mg/cm2
9. A method of preparing a coating according to claim 8, wherein: in the preparation step of the catalyst intermediate layer, the thickness of the catalyst intermediate layer is not more than 10 nanometers.
10. A method of preparing a coating according to claim 7, wherein: in the carbon-based coating deposition step, the carbon-based coating has a carbon nano sheet layer structure, and the thickness of the sheet layer is 10-50 nm.
11. A method of preparing a coating according to claim 10, wherein: in the carbon-based coating deposition step, a plasma enhanced chemical vapor deposition process is adopted, and the flow speed of reaction gas is 0.1-5L/h.
12. Use of a coating according to any one of claims 1 to 5 in a blackbody coating.
CN202011134111.3A 2020-10-21 2020-10-21 Coating, use and preparation method Pending CN114381709A (en)

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