CN114236662A - High-cut-off-depth dual-channel optical filter and preparation method thereof - Google Patents
High-cut-off-depth dual-channel optical filter and preparation method thereof Download PDFInfo
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- CN114236662A CN114236662A CN202111344287.6A CN202111344287A CN114236662A CN 114236662 A CN114236662 A CN 114236662A CN 202111344287 A CN202111344287 A CN 202111344287A CN 114236662 A CN114236662 A CN 114236662A
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- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B5/00—Optical elements other than lenses
- G02B5/20—Filters
- G02B5/28—Interference filters
- G02B5/283—Interference filters designed for the ultraviolet
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- A—HUMAN NECESSITIES
- A61—MEDICAL OR VETERINARY SCIENCE; HYGIENE
- A61B—DIAGNOSIS; SURGERY; IDENTIFICATION
- A61B18/00—Surgical instruments, devices or methods for transferring non-mechanical forms of energy to or from the body
- A61B18/18—Surgical instruments, devices or methods for transferring non-mechanical forms of energy to or from the body by applying electromagnetic radiation, e.g. microwaves
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- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B5/00—Optical elements other than lenses
- G02B5/20—Filters
- G02B5/28—Interference filters
- G02B5/281—Interference filters designed for the infrared light
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- A—HUMAN NECESSITIES
- A61—MEDICAL OR VETERINARY SCIENCE; HYGIENE
- A61B—DIAGNOSIS; SURGERY; IDENTIFICATION
- A61B18/00—Surgical instruments, devices or methods for transferring non-mechanical forms of energy to or from the body
- A61B2018/00315—Surgical instruments, devices or methods for transferring non-mechanical forms of energy to or from the body for treatment of particular body parts
- A61B2018/00452—Skin
- A61B2018/00458—Deeper parts of the skin, e.g. treatment of vascular disorders or port wine stains
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- A—HUMAN NECESSITIES
- A61—MEDICAL OR VETERINARY SCIENCE; HYGIENE
- A61B—DIAGNOSIS; SURGERY; IDENTIFICATION
- A61B18/00—Surgical instruments, devices or methods for transferring non-mechanical forms of energy to or from the body
- A61B2018/00315—Surgical instruments, devices or methods for transferring non-mechanical forms of energy to or from the body for treatment of particular body parts
- A61B2018/00452—Skin
- A61B2018/00476—Hair follicles
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- A—HUMAN NECESSITIES
- A61—MEDICAL OR VETERINARY SCIENCE; HYGIENE
- A61B—DIAGNOSIS; SURGERY; IDENTIFICATION
- A61B18/00—Surgical instruments, devices or methods for transferring non-mechanical forms of energy to or from the body
- A61B18/18—Surgical instruments, devices or methods for transferring non-mechanical forms of energy to or from the body by applying electromagnetic radiation, e.g. microwaves
- A61B2018/1807—Surgical instruments, devices or methods for transferring non-mechanical forms of energy to or from the body by applying electromagnetic radiation, e.g. microwaves using light other than laser radiation
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- Optical Filters (AREA)
Abstract
The invention relates to the technical field of optical filter coating, in particular to a high-cut-off depth dual-channel optical filter and a preparation method thereof, wherein the dual-channel optical filter comprises a substrate, a main laminated film system and an auxiliary laminated film system, the main laminated film system and the auxiliary laminated film system are respectively positioned at two sides of the substrate, the combined system of the main laminated film system and the auxiliary laminated film system enables the optical filter to be capable of transmitting light with wavelength of 540-minus-plus-570 nm and 680-minus-700 nm, and the optical filter cuts off light with other wave bands in the wavelength range from ultraviolet to near infrared. The invention has the advantages that: target light in wavebands near 560nm and 690nm can be selectively transmitted, and the filter can cut off other wavebands from ultraviolet to near infrared, and has the characteristics of high passband transmittance, deep cut-off depth and wide cut-off bandwidth; the terminal product has the dual functions of removing color spots and unhairing, the defect that the existing single-channel optical filter can only solve a single problem (color spots removal or unhairing) is overcome, and the requirements of simultaneously solving the two problems in a specific occasion are met.
Description
Technical Field
The invention relates to the technical field of optical filter coating, in particular to a double-channel optical filter with high cut-off depth and a preparation method thereof.
Background
In the field of medical cosmetology, photon skin tendering is an item for beautifying skin by utilizing intense pulse light, the intense pulse light of a specific wave band is selectively irradiated on the skin, and the generated energy is acted on a target tissue of the skin by utilizing the action of photo-heat, so that the skin tendering effects of tendering the skin, whitening the skin, removing freckles, removing hair and the like are achieved.
The 560nm wave band pulse light has the functions of tendering skin and treating pigment and vascular diseases, the light absorption rate of melanin to the wave band is highest, melanin groups absorb light energy and convert the light energy into heat energy, the melanin is crushed by heat and shock waves, pigment particles can be phagocytized and metabolized by macrophages, and the skin color at the color spot position is more consistent with the surrounding skin.
The 690nm wave band pulse light can penetrate into skin for 3.5mm, can destroy hair follicle tissue, and has effects of removing hair and treating inflammatory acne.
The light source of the photon tender muscle is a xenon lamp which is full-wave band white light, when the power is high, the full-wave band can not act on the skin for a long time, otherwise, ultraviolet injury and burning of the skin are easily caused, so that most wave band light energy is filtered out by a specific optical filter, and proper pulse time is given by selecting proper xenon lamp power to act on specific skin target tissues, so that the skin can be not damaged, and the specific treatment purpose can be achieved.
Disclosure of Invention
The invention aims to provide a dual-channel optical filter with high cut-off depth and a preparation method thereof according to the defects of the prior art, a main laminated film system and an auxiliary laminated film system are arranged on two sides of a substrate, light with wavelengths of 560nm and 690nm nearby passes through the main laminated film system and is cut off from ultraviolet to near-infrared bands, high transmittance of light with wavelengths of 560nm and 690nm nearby is ensured through the auxiliary laminated film system, the near-infrared cut-off of the main film system is further widened, and the design of the dual-channel narrow-band optical filter with high cut-off depth is realized.
The purpose of the invention is realized by the following technical scheme:
the utility model provides a high cut-off depth's double-channel narrow band pass filter, this filter includes base plate, main stromatolite membrane system and vice stromatolite membrane system, main stromatolite membrane system with vice stromatolite membrane system is located respectively the both sides of base plate, its characterized in that: the combination system of the main laminated film system and the auxiliary laminated film system enables the optical filter to transmit light with wavelength of 540-570nm and 680-700nm, and the optical filter cuts off light with other wave bands in the wavelength range from ultraviolet to near infrared.
The main laminated film system and the sub laminated film system are formed by alternately superposing a high refractive index layer and a low refractive index layer.
The high-refractive-index material is NbOx, and the low-refractive-index material is SiOx.
The transmittance of the filter in the wavelength bands of 540-570nm and 680-700nm is more than 95%.
The total thickness of the secondary laminated film system is not more than 110 percent of the total thickness of the main laminated film system
A preparation method of the dual-channel narrow-band filter with the high cut-off depth is characterized by comprising the following steps: the preparation method comprises the following steps:
the method comprises the steps of sequentially plating laminated film systems on two side surfaces of a substrate of the optical filter, firstly plating a main laminated film system on one side surface of the substrate, and then plating an auxiliary laminated film system on the other side surface of the substrate, wherein the number of layers of the main laminated film system is larger than that of the auxiliary laminated film system.
The substrate is rotated during the plating of the multilayer film system.
The invention has the advantages that: target light in wavebands near 560nm and 690nm can be selectively transmitted, and the filter can cut off other wavebands from ultraviolet to near infrared, and has the characteristics of high passband transmittance, deep cut-off depth and wide cut-off bandwidth; the terminal product has dual functions of removing color spots and removing hair, overcomes the defect that the conventional single-channel optical filter can only solve a single problem (color spot removal or hair removal), and meets the requirement of simultaneously solving the two problems in a specific occasion; the scattering phenomenon is effectively reduced by reasonably distributing the main laminated film system and the auxiliary laminated film system, and meanwhile, the deformation of the optical filter caused by uneven stress is avoided, and the quality and the service performance of the optical filter are obviously improved.
Drawings
FIG. 1 is a schematic diagram illustrating the effect of the present invention;
FIG. 2 is a graph of T% and R% for NbOx and SiOx of the present invention;
FIG. 3 is a graph of optical constants of NbOx and SiOx in the present invention;
FIG. 4 is a schematic structural diagram of a dual-channel filter according to the present invention;
FIG. 5 is a design spectrum of a dual channel filter of the present invention;
FIG. 6 is a graph of the signal intensity measurements of samples of the present invention;
FIG. 7 is a graph showing the results of measuring the photoresist of the sample according to the present invention.
Detailed Description
The features of the present invention and other related features are described in further detail below by way of example in conjunction with the following drawings to facilitate understanding by those skilled in the art:
as shown in fig. 1-7, the labels 1-3 in the figures are respectively expressed as: a substrate 1, a main laminated film system 2, and a sub laminated film system 3.
Example (b): as shown in fig. 1, the dual-channel narrow-band filter with a high cut-off depth in this embodiment can selectively transmit target light in wavelength bands near 560nm and 690nm, and cut off other wavelength bands from ultraviolet to near-infrared, and has the characteristics of high pass-band transmittance, deep cut-off depth, and cut-off bandwidth. The dual-channel narrow-band filter in the embodiment can be used in cooperation with a beauty terminal product, such as a xenon lamp for photon skin tendering, so that the terminal product has dual functions of color spot removal and hair removal, the defect that the existing single-channel filter can only solve a single problem (color spot removal or hair removal) is overcome, and the requirement that two problems need to be solved simultaneously in a specific occasion is met.
Specifically, as shown in fig. 4, the dual-channel narrowband filter of the present embodiment includes a substrate 1, and a main multilayer film system 2 of 148 layers and a sub-multilayer film system 3 of 84 layers are plated on both sides of the substrate 1, respectively. The main laminated film system 2 is used for keeping high transmission near the wavelength of 540-570nm and 680-700nm and simultaneously cutting off the rest wavelength less than 750 nm; the sub-laminated film system 3 is used for cutting off light with the wavelength of 750nm-1100nm and simultaneously keeping high transmission near light with the wavelength of 540nm-570nm and 680nm-700 nm; because actual light rays pass through two surfaces of the filter, the function that the filter is high in transmission in a specific wave band and cut off in other wave bands is realized under the combined action of the main laminated film system 2 and the auxiliary laminated film system 3.
Based on this, the dual-channel narrowband filter in this embodiment has the following properties: can transmit light with wavelength of 540-570nm and 680-700nm, and cut off light in the rest wavelength range from ultraviolet to near infrared, wherein the cut-off rate of light in the rest wavelength range from ultraviolet to near infrared is above 99.9%.
In the present embodiment, the main laminated film system 2 and the sub laminated film system 3 are each formed by alternately stacking a high refractive index layer and a low refractive index layer. In this embodiment, the high refractive index layer may be made of NbOx, and the low refractive index layer may be made of SiOx.
When the dual-channel narrowband optical filter is prepared, the method comprises the following steps:
1) the main laminated film system 2 and the auxiliary laminated film system 3 are plated by a sputtering coating device. In this sputtering apparatus, an Si target and an Nb target are arranged, the target power source is an intermediate frequency power source, and Ar, O2, N2, and the like are used as operating gases, and an inductively coupled radio frequency source, and Ar, O2, N2, and the like are used as operating gases. In the sputter coating apparatus, the substrate 1 may be loaded on a work spin stand, the rotation speed of which may be selected to be 10-100 rpm/Min, to improve coating quality.
2) The substrate 1 may be made of D263T glass with a thickness of 1 mm.
3) Setting process conditions in a process document of sputtering coating equipment, wherein the process of Si + O → SiOx (or Nb + O → NbOx) is completed at an ICP position by target atoms deposited on a substrate due to rapid revolution of the substrate, and oxygen ions assist in depositing a film layer so as to improve the compactness of the film layer, respectively plating a SiOx single-layer film and a NbOx single-layer film on the surface of a D263T substrate, then measuring 6 DEG T% and 6 DEG R%, and calculating the optical constants of the film layer by a photometry method as shown in FIG. 3, as shown in FIG. 2.
4) The optical constants of the SiOx single-layer film and the NbOx single-layer film are taken as material parameters, D263T is taken as a substrate 1, and the special structural design of the dual-band filter film stack is carried out, wherein the design comprises a main laminated film system 2 and an auxiliary laminated film system 3, the main laminated film system 2 is positioned on one surface of the substrate, the auxiliary laminated film system 3 is positioned on the other surface of the substrate, and the main laminated film system 2 and the auxiliary laminated film system 3 are both of high-refractive index and low-refractive index material alternating structures. As shown in fig. 4, SiOx is represented by L, NbOx is represented by H, the main laminated film system 2 is 148 layers, and the sub laminated film system 3 is 84 layers; the main laminated film system 2 and the sub laminated film system 3 are formed in a reciprocating manner by using a high refractive index material H as a first layer in contact with the substrate 1, a second layer is a low refractive index material L, and a third layer is a high refractive index material H.
The thickness distribution of each layer of the main laminated film system 2 and the sub laminated film system 3 is shown in table 1, and the design spectrum T% is shown in fig. 5.
As shown in the above table, in the present embodiment, the total thickness of the main laminated film system 2 and the total thickness of the sub-laminated film system 3 are controlled, so that the total thickness of the sub-laminated film system 3 does not exceed 110% of the total thickness of the main laminated film system 2, thereby avoiding the occurrence of the significant scattering phenomenon due to the excessive thickness of the single-side laminated film system, and further ensuring the usability of the optical filter. Meanwhile, the number of layers of the main laminated film system 2 and the number of layers of the auxiliary laminated film system 3 are reasonably distributed on two sides of the substrate, so that film lamination stress of the main laminated film system and the auxiliary laminated film system can be mutually offset, and the substrate 1 is prevented from being deformed due to the film lamination stress.
5) The substrate 1 is plated by a sputtering plating apparatus.
The sputtering coating equipment executes the process according to the process conditions set in the process file, and sequentially coats the laminated film systems on the two side surfaces of the substrate 1, and firstly coats the main laminated film system 2 on one side surface of the substrate 1; turning over the substrate 1 after completion; then, a sub-laminate film system 3 is plated on the other surface of the substrate 1.
The transmittance of the optical filter sample prepared by the preparation method is measured, the measurement result is shown in fig. 6, the transmittance of the optical filter sample in the target wavelength of 560nm and 690nm is more than 95%, and the optical filter sample has good signal intensity.
The optical filter sample prepared by the preparation method is subjected to photoresistance, namely signal-to-noise ratio measurement, the measurement result is shown in figure 7, and the signal-to-noise ratio of most wave bands is more than 10000 in the wave band from 350nm to 1100nm (the wavelength range from ultraviolet rays to near infrared rays): 1, fractional band up to 1000000: 1, having good signal-to-noise ratio effect.
The actual cut-off rate of the filter sample prepared by the preparation method is more than OD3 (99.9%), the cut-off rate of the waveband below 950nm is more than OD4 (99.99%), and the cut-off rate of the waveband between 950nm and 1100nm is more than OD3, and the cut-off effect is excellent.
Although the conception and the embodiments of the present invention have been described in detail with reference to the drawings, those skilled in the art will recognize that various changes and modifications can be made therein without departing from the scope of the appended claims, and therefore, they are not to be considered repeated herein.
Claims (7)
1. The utility model provides a high cut-off depth's double-channel narrow band pass filter, this filter includes base plate, main stromatolite membrane system and vice stromatolite membrane system, main stromatolite membrane system with vice stromatolite membrane system is located respectively the both sides of base plate, its characterized in that: the combination system of the main laminated film system and the auxiliary laminated film system enables the optical filter to transmit light with wavelength of 540-570nm and 680-700nm, and the optical filter cuts off light with other wave bands in the wavelength range from ultraviolet to near infrared.
2. The high-cut-depth dual-channel narrow-band filter as claimed in claim 1, wherein: the main laminated film system and the sub laminated film system are formed by alternately superposing a high refractive index layer and a low refractive index layer.
3. The high-cut-depth dual-channel narrow-band filter as claimed in claim 2, wherein: the high-refractive-index material is NbOx, and the low-refractive-index material is SiOx.
4. The high-cut-depth dual-channel narrow-band filter as claimed in claim 1, wherein: the transmittance of the filter in the wavelength bands of 540-570nm and 680-700nm is more than 95%.
5. The high-cut-depth dual-channel narrow-band filter as claimed in claim 1, wherein: the total thickness of the secondary laminated film series does not exceed 110% of the total thickness of the main laminated film series.
6. A method of manufacturing a dual channel narrow band filter involving a high cut-off depth according to any one of claims 1 to 5, wherein: the preparation method comprises the following steps:
the method comprises the steps of sequentially plating laminated film systems on two side surfaces of a substrate of the optical filter, firstly plating a main laminated film system on one side surface of the substrate, and then plating an auxiliary laminated film system on the other side surface of the substrate, wherein the number of layers of the main laminated film system is larger than that of the auxiliary laminated film system.
7. The method according to claim 6, wherein the method comprises: the substrate is rotated during the plating of the multilayer film system.
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| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202111344287.6A CN114236662B (en) | 2021-11-12 | 2021-11-12 | Dual-channel optical filter with high cut-off depth and preparation method thereof |
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| CN202111344287.6A CN114236662B (en) | 2021-11-12 | 2021-11-12 | Dual-channel optical filter with high cut-off depth and preparation method thereof |
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| CN114236662A true CN114236662A (en) | 2022-03-25 |
| CN114236662B CN114236662B (en) | 2024-09-17 |
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Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN120527741A (en) * | 2025-07-22 | 2025-08-22 | 上海高能煜镀科技有限公司 | A multi-band laser window suitable for high-power lasers |
Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2003139947A (en) * | 2001-10-31 | 2003-05-14 | Hitachi Maxell Ltd | Optical filter |
| WO2004038061A1 (en) * | 2002-10-22 | 2004-05-06 | Asahi Glass Company, Limited | Substrate having multilayer film and method for manufacturing the same |
| CN109932774A (en) * | 2017-12-19 | 2019-06-25 | 张家港康得新光电材料有限公司 | A kind of infrared narrow-band-filter film and infrared recognition system |
| JP2020008797A (en) * | 2018-07-12 | 2020-01-16 | 株式会社小松プロセス | Retroreflection material, retroreflection object, retroreflective ink or paint, manufacturing method of retroreflective sheet, and manufacturing method of retroreflection object |
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2021
- 2021-11-12 CN CN202111344287.6A patent/CN114236662B/en active Active
Patent Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2003139947A (en) * | 2001-10-31 | 2003-05-14 | Hitachi Maxell Ltd | Optical filter |
| WO2004038061A1 (en) * | 2002-10-22 | 2004-05-06 | Asahi Glass Company, Limited | Substrate having multilayer film and method for manufacturing the same |
| CN109932774A (en) * | 2017-12-19 | 2019-06-25 | 张家港康得新光电材料有限公司 | A kind of infrared narrow-band-filter film and infrared recognition system |
| JP2020008797A (en) * | 2018-07-12 | 2020-01-16 | 株式会社小松プロセス | Retroreflection material, retroreflection object, retroreflective ink or paint, manufacturing method of retroreflective sheet, and manufacturing method of retroreflection object |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN120527741A (en) * | 2025-07-22 | 2025-08-22 | 上海高能煜镀科技有限公司 | A multi-band laser window suitable for high-power lasers |
| CN120527741B (en) * | 2025-07-22 | 2025-09-23 | 上海高能煜镀科技有限公司 | Multiband laser window piece suitable for high-power laser |
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| CN114236662B (en) | 2024-09-17 |
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