CN103736372A - Normal-temperature flue gas denitration method - Google Patents
Normal-temperature flue gas denitration method Download PDFInfo
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- CN103736372A CN103736372A CN201310651475.2A CN201310651475A CN103736372A CN 103736372 A CN103736372 A CN 103736372A CN 201310651475 A CN201310651475 A CN 201310651475A CN 103736372 A CN103736372 A CN 103736372A
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- flue gas
- temperature flue
- plasma
- gas denitration
- oxidation
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- 238000000034 method Methods 0.000 title claims abstract description 31
- UGFAIRIUMAVXCW-UHFFFAOYSA-N Carbon monoxide Chemical compound [O+]#[C-] UGFAIRIUMAVXCW-UHFFFAOYSA-N 0.000 title claims abstract description 29
- 239000003546 flue gas Substances 0.000 title claims abstract description 29
- 230000003647 oxidation Effects 0.000 claims abstract description 21
- 238000007254 oxidation reaction Methods 0.000 claims abstract description 21
- 230000004888 barrier function Effects 0.000 claims abstract description 9
- 239000007864 aqueous solution Substances 0.000 claims abstract description 4
- 239000000178 monomer Substances 0.000 claims description 18
- 230000008569 process Effects 0.000 claims description 18
- 238000009413 insulation Methods 0.000 claims description 14
- 238000004157 plasmatron Methods 0.000 claims description 11
- 239000007921 spray Substances 0.000 claims description 9
- 238000006477 desulfuration reaction Methods 0.000 claims description 7
- 230000023556 desulfurization Effects 0.000 claims description 7
- 239000002828 fuel tank Substances 0.000 claims description 6
- 238000003825 pressing Methods 0.000 claims description 6
- 239000000463 material Substances 0.000 claims description 5
- 230000003009 desulfurizing effect Effects 0.000 claims description 3
- 238000007599 discharging Methods 0.000 claims description 3
- MWUXSHHQAYIFBG-UHFFFAOYSA-N Nitric oxide Chemical compound O=[N] MWUXSHHQAYIFBG-UHFFFAOYSA-N 0.000 abstract description 15
- 238000005516 engineering process Methods 0.000 abstract description 5
- 239000000126 substance Substances 0.000 abstract description 3
- 238000005507 spraying Methods 0.000 abstract 1
- QGZKDVFQNNGYKY-UHFFFAOYSA-N Ammonia Chemical compound N QGZKDVFQNNGYKY-UHFFFAOYSA-N 0.000 description 16
- 229910021529 ammonia Inorganic materials 0.000 description 8
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 4
- 235000011114 ammonium hydroxide Nutrition 0.000 description 3
- 239000002245 particle Substances 0.000 description 3
- 239000000779 smoke Substances 0.000 description 3
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 2
- 239000003054 catalyst Substances 0.000 description 2
- 238000010531 catalytic reduction reaction Methods 0.000 description 2
- 238000006243 chemical reaction Methods 0.000 description 2
- 229910052757 nitrogen Inorganic materials 0.000 description 2
- 230000001590 oxidative effect Effects 0.000 description 2
- 239000001301 oxygen Substances 0.000 description 2
- 229910052760 oxygen Inorganic materials 0.000 description 2
- 150000003254 radicals Chemical class 0.000 description 2
- XSQUKJJJFZCRTK-UHFFFAOYSA-N Urea Chemical compound NC(N)=O XSQUKJJJFZCRTK-UHFFFAOYSA-N 0.000 description 1
- 230000008901 benefit Effects 0.000 description 1
- 239000004202 carbamide Substances 0.000 description 1
- 230000008859 change Effects 0.000 description 1
- 239000012141 concentrate Substances 0.000 description 1
- 239000000356 contaminant Substances 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 230000007613 environmental effect Effects 0.000 description 1
- 238000005530 etching Methods 0.000 description 1
- 230000008020 evaporation Effects 0.000 description 1
- 238000001704 evaporation Methods 0.000 description 1
- 238000004880 explosion Methods 0.000 description 1
- 239000007789 gas Substances 0.000 description 1
- 230000006872 improvement Effects 0.000 description 1
- 230000036470 plasma concentration Effects 0.000 description 1
- 238000002360 preparation method Methods 0.000 description 1
- 238000000197 pyrolysis Methods 0.000 description 1
- 238000004064 recycling Methods 0.000 description 1
- 238000006479 redox reaction Methods 0.000 description 1
- 230000003319 supportive effect Effects 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 1
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- Treating Waste Gases (AREA)
Abstract
The invention relates to a method used for processing nitrogen oxide in boiler flue gas, and specifically relates to a normal-temperature flue gas denitration method. The normal-temperature flue gas denitration method comprises following steps: 1) dedusting; 2) desulphurization; 3) plasma oxidation, wherein processed flue gas is delivered into a row electrode type double-dielectric barrier discharge plasma oxidation device for oxidation treatment; and 4) collection of oxidized substances in the flue gas via spraying the oxidized flue gas with an alkaline aqueous solution. Compared with traditional technology, the normal-temperature flue gas denitration method is capable of realizing large wind amount treatment, is high in denitration efficiency, and can be widely used for boilers of different types; and denitration efficiency can be more than 90% via controlling plasma row electrode control.
Description
Technical field
The present invention relates to a kind of method of processing nitrogen oxide in boiler smoke, specifically a kind of normal temperature flue-gas denitration process.
Background technology
At present main denitrating technique is SNCR(SNCR method), SCR(selective catalytic reduction) technology.By add ammonia or ammoniacal liquor in flue gas, control its reaction condition, make nitrogen oxide and ammonia generation redox reaction generate nitrogen, reach the object of denitration.
The weak point that above-mentioned denitrating technique exists is: SNCR method: in stove, spray ammonia is removed nitrogen oxide treatment effeciency low (30%-50%), and the escaping of ammonia is serious, is difficult to mark discharge; Selective catalytic reduction is used catalyst, and efficiency relatively high energy reaches 80% efficiency, but invests highly, and catalyst layer needs 2-3 to change once, and operating cost is high.Simultaneity factor participates in the ammonia of reaction, need to evaporate by liquefied ammonia, the method such as ammoniacal liquor evaporation, urea pyrolysis obtains, and has very large potential safety hazard.
Use plasma technique a lot of to the research of denitration, mostly concentrate on pulsed discharge plasma and corona plasma.
" low temperature plasma improvement gaseous contaminant " (Yan Xuefeng etc. " chemical research and application " the 16th the 2nd phase of volume of April in 2004) and " progress of low temperature plasma flue gas desulfurization and denitrification technology " (Wang Xiaochen etc. " environmental protection and recycling economy ") have been studied the technical prospect of low temperature plasma on denitrating flue gas.In prior art, according to the knowledge of the applicant, also not having can be at industrial practical application technique and device.
Summary of the invention
The invention provides a kind of normal temperature flue-gas denitration process, it adopts bi-medium to block plasma generator and spray column group technology to process the nitrogen oxide in boiler smoke, and denitration efficiency is high, simple to operate, and operating cost is low, and the scope of application is wide.
The concrete scheme that the present invention adopts is:
A normal temperature flue-gas denitration process, is characterized in that, comprises the steps:
1) dedusting;
2) desulfurization;
3) plasma oxidation: the flue gas after processing enters level of platoon leader formula double-dielectric barrier discharge plasma oxidation device and carries out oxidation processes;
4) adopt the flue gas after the oxidation of alkaline aqueous solution spray, the strong oxidation material in trapping flue gas.
Wherein, dedusting operation adopts cloth-bag type dedusting and/or spiral-flow type dedusting; Described desulfurization process adopts the desulfurizing tower of prior art to carry out.
In plasma oxidation operation, effect due to high energy electron, form charged particle or intermolecular chemical bond and interrupted generation free radical isoreactivity particle, airborne water and oxygen also can produce the strong oxidizing property materials such as OH free radical, active oxygen under high energy electron bombardment simultaneously, and these strong oxidizing property materials are oxidized to NO by NO
xcontour valence state nitrogen.
Described level of platoon leader formula double-dielectric barrier discharge plasma oxidation device comprises casing, in casing, there is frame, monomer air duct is set in frame, sets gradually from top to bottom air inlet, spray equipment, plasma dish, monomer fuel tank and dish pressing device in monomer air duct, monomer air duct lower end connects air outlet.Wherein, monomer fuel tank provides high voltage source to plasma dish, and dish pressing device is used for fixedly plasma dish.In casing, be also provided with heat abstractor and power supply.
Described plasma dish comprises plate rail, and the two ends of plate rail arrange insulation cover plate, is provided with many plasmatrons between insulation cover plate.On plate rail, be also provided with insulation sleeve, cable is connected with plasmatron by insulation sleeve.
In each plasmatron, be equipped with high-field electrode and earth electrode, between high-field electrode and earth electrode, adopt two dielectric impedances, between two media, form discharging gap.
Level of platoon leader formula double-dielectric barrier discharge plasma oxidation device of the present invention can be 0.1～10 * 10
5under the air pressure of Pa, work, there is the feature of the large space Uniform Discharge of glow discharge and the operation of the hyperbar of corona discharge.Whole electric discharge be by many on room and time the micro discharge of random distribution form, the duration of these micro discharges is very short, generally in 10ns magnitude.Dielectric layer has two Main Functions to this type of electric discharge: the one, and in restriction micro discharge, the motion of charged particle, makes micro discharge become very brief one by one pulse; The 2nd, allow micro discharge be distributed in uniformly and stably between whole plane-shape electrode, prevent spark discharge.Dielectric barrier discharge due to electrode directly and discharge gas come in contact, thereby avoided the etching problem of electrode.
Compared with prior art, advantage of the present invention is:
1) the present invention can realize Wind Volume and processes, and can process air quantity more than 100,000 grades, can extensive use and various model boiler;
2) denitration efficiency is high, by controlling plasma level of platoon leader, controls, and can realize denitration efficiency more than 90%;
3) operating cost is low;
4) safe, without ammonia preparation system, eliminate liquefied ammonia hidden peril of explosion.
Accompanying drawing explanation
Fig. 1 is level of platoon leader formula double-dielectric barrier discharge plasma oxidation device structural representation of the present invention;
Fig. 2 is plasma dish structural representation;
Fig. 3 is plasmatron structure principle chart.
In figure, 1-air inlet, 2-frame, 3-spray equipment, 4-plasma dish, 5-monomer fuel tank, 6-coils pressing device, 7-air outlet, 8-monomer air duct, 9-casing, 10-heat abstractor, 11-power supply, 12-high-field electrode, 13-medium, 14-earth electrode, 4-1 is cable, 4-2 is insulation sleeve, 4-3 is plate rail, and 4-4 is plasmatron, and 4-5 is insulation cover plate.
The specific embodiment
A normal temperature flue-gas denitration process, is characterized in that, comprises the steps:
1) dedusting;
2) desulfurization;
3) plasma oxidation;
4) adopt the flue gas after the oxidation of alkaline aqueous solution spray, the oxidized material in trapping flue gas.
Wherein, dedusting operation adopts cloth-bag type dedusting, and desulfurization process adopts desulfurizing tower to carry out.
Described level of platoon leader formula double-dielectric barrier discharge plasma oxidation device comprises casing 9, in casing 9, there is frame 2, monomer air duct 8 is set in frame 2, in monomer air duct 8, set gradually from top to bottom air inlet 1, spray equipment 3, plasma dish 4, monomer fuel tank 5 and dish pressing device 6, monomer air duct 8 lower ends connect air outlet 7.In casing 9, be also provided with heat abstractor 10 and power supply 11.
Wherein, frame 2 is supportive body equipment, and monomer fuel tank 5 and power supply 11 provide high voltage source to plasma dish 4, the fixing plasma dish 4 of dish pressing device 6, and monomer air duct 8 is for supporting plasma dish 4, and in the interior smoke treatment of monomer air duct 8.
Described plasma dish comprises plate rail 4-3, and the two ends of plate rail 4-3 arrange insulation cover plate 4-5, is provided with many plasmatron 4-4 between insulation cover plate 4-5.On plate rail 4-3, be also provided with insulation sleeve 4-2, cable 4-1 is connected with plasmatron 4-4 by insulation sleeve 4-2.
In each plasmatron 4-4, be equipped with high-field electrode 12 and earth electrode 14, between high-field electrode 12 and earth electrode 14, adopt two media 13 to stop, between two media 13, form discharging gap.
Claims (5)
1. a normal temperature flue-gas denitration process, is characterized in that, comprises the steps:
1) dedusting;
2) desulfurization;
3) plasma oxidation: the flue gas after processing enters level of platoon leader formula double-dielectric barrier discharge plasma oxidation device and carries out oxidation processes;
4) adopt the flue gas after the oxidation of alkaline aqueous solution spray, the material after the oxidation in trapping flue gas.
2. normal temperature flue-gas denitration process according to claim 1, is characterized in that, described dedusting operation adopts cloth-bag type dedusting and/or spiral-flow type dedusting; Described desulfurization process adopts desulfurizing tower to carry out.
3. normal temperature flue-gas denitration process according to claim 1, it is characterized in that, described level of platoon leader formula double-dielectric barrier discharge plasma oxidation device comprises casing, in casing, there is frame, monomer air duct is set in frame, in monomer air duct, set gradually from top to bottom air inlet, spray equipment, plasma dish, monomer fuel tank and dish pressing device, monomer air duct lower end connects air outlet, is also provided with heat abstractor and power supply in casing.
4. normal temperature flue-gas denitration process according to claim 3, is characterized in that, described plasma dish comprises plate rail, the two ends of plate rail arrange insulation cover plate, between insulation cover plate, be provided with many plasmatrons, be also provided with insulation sleeve on plate rail, cable is connected with plasmatron by insulation sleeve.
5. normal temperature flue-gas denitration process according to claim 4, is characterized in that, is equipped with high-field electrode and earth electrode in each plasmatron, adopts two dielectric impedances between high-field electrode and earth electrode, between two media, forms discharging gap.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201310651475.2A CN103736372B (en) | 2013-12-05 | 2013-12-05 | A kind of normal temperature flue-gas denitration process |
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| CN201310651475.2A CN103736372B (en) | 2013-12-05 | 2013-12-05 | A kind of normal temperature flue-gas denitration process |
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| Publication Number | Publication Date |
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| CN103736372A true CN103736372A (en) | 2014-04-23 |
| CN103736372B CN103736372B (en) | 2016-02-10 |
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Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN104307326A (en) * | 2014-10-24 | 2015-01-28 | 沈阳万捷重工机械有限公司 | Low-temperature wet-type ionization oxidization denitration and super-purification process |
| CN105311947A (en) * | 2015-12-08 | 2016-02-10 | 济南乾坤环保设备有限公司 | Boiler fume denitration and desulfuration dedusting device and process |
| CN110772990A (en) * | 2019-11-13 | 2020-02-11 | 扬州大学 | A low temperature plasma generator |
Citations (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN101234211A (en) * | 2007-12-27 | 2008-08-06 | 上海市政工程设计研究总院 | Apparatus and method for treating malodorous gas in municipal facilities |
| CN101274213A (en) * | 2007-12-29 | 2008-10-01 | 大连理工大学 | Device and method for combined treatment of waste gas by dielectric barrier discharge plasma oxidation/solution absorption |
| CN102688671A (en) * | 2012-06-11 | 2012-09-26 | 赵晓东 | Synthesis method for removing nitric oxide in flue gas |
| CN202478804U (en) * | 2012-04-01 | 2012-10-10 | 蓝天环保设备工程股份有限公司 | Sintering machine flue gas desulphurization denitration device |
| CN103111166A (en) * | 2013-03-08 | 2013-05-22 | 山东科源化工有限公司 | Method for treating 2, 4-D waste gas |
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2013
- 2013-12-05 CN CN201310651475.2A patent/CN103736372B/en active Active
Patent Citations (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN101234211A (en) * | 2007-12-27 | 2008-08-06 | 上海市政工程设计研究总院 | Apparatus and method for treating malodorous gas in municipal facilities |
| CN101274213A (en) * | 2007-12-29 | 2008-10-01 | 大连理工大学 | Device and method for combined treatment of waste gas by dielectric barrier discharge plasma oxidation/solution absorption |
| CN202478804U (en) * | 2012-04-01 | 2012-10-10 | 蓝天环保设备工程股份有限公司 | Sintering machine flue gas desulphurization denitration device |
| CN102688671A (en) * | 2012-06-11 | 2012-09-26 | 赵晓东 | Synthesis method for removing nitric oxide in flue gas |
| CN103111166A (en) * | 2013-03-08 | 2013-05-22 | 山东科源化工有限公司 | Method for treating 2, 4-D waste gas |
Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN104307326A (en) * | 2014-10-24 | 2015-01-28 | 沈阳万捷重工机械有限公司 | Low-temperature wet-type ionization oxidization denitration and super-purification process |
| CN104307326B (en) * | 2014-10-24 | 2016-08-24 | 沈阳万捷重工机械有限公司 | Low temperature wet type ionized oxygen denitration, ultrapurification technique |
| CN105311947A (en) * | 2015-12-08 | 2016-02-10 | 济南乾坤环保设备有限公司 | Boiler fume denitration and desulfuration dedusting device and process |
| CN110772990A (en) * | 2019-11-13 | 2020-02-11 | 扬州大学 | A low temperature plasma generator |
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| CN103736372B (en) | 2016-02-10 |
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Effective date of registration: 20180712 Address after: 255086 B 2201, advanced ceramic industry innovation park, No. 125, Liu Quan Road, hi tech Zone, Zibo, Shandong Patentee after: Shandong Paris Plasma Technology Co., Ltd. Address before: 255086 the development zone of Zibo hi tech Development Zone, east of North Road and north of Xin Road, Shandong. Patentee before: Shandong Pallet Environment Protection Engineering Co., Ltd. |
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Address after: 255086 room 706, building 9, Chuangye center, Zibo Economic Development Zone, Zibo City, Shandong Province Patentee after: Shandong pailidi Environmental Technology Co., Ltd Address before: 255086 B 2201, advanced ceramic industry innovation park, No. 125, Liu Quan Road, hi tech Zone, Zibo, Shandong Patentee before: Shandong Paris Plasma Technology Co., Ltd. |