CN103630077A - Two-axis grating displacement measurement system adopting double-frequency laser - Google Patents
Two-axis grating displacement measurement system adopting double-frequency laser Download PDFInfo
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Abstract
一种使用双频激光的两轴光栅位移测量系统涉及一种光栅位移测量系统；该测量系统包括出射端接光纤的双频激光器、分光部件、干涉光路部件、光电探测及信号处理部件和一维反射式测量光栅；所述干涉光路部件包括偏振分光棱镜、测量臂四分之一波片、测量臂折光元件、参考臂四分之一波片、参考臂折光元件和一维反射式参考光栅；所述一维反射式测量/参考光栅周期、测量/参考臂折光元件折光角度、出射端接光纤的双频激光器的波长之间满足2d1sinθi1=±mλ1、2d2sinθi2=±mλ2；本发明不仅能够同时测量沿x轴、z轴两个方向的直线位移，而且提高了测量信号的抗干扰能力，同时相比已有技术该系统的z向位移量程得到了极大的扩展。
A two-axis grating displacement measurement system using a dual-frequency laser relates to a grating displacement measurement system; the measurement system includes a dual-frequency laser output terminal connected to an optical fiber, a light splitting component, an interference optical path component, a photoelectric detection and signal processing component, and a one-dimensional Reflective measuring grating; the interference optical path components include a polarization beam splitter, a measuring arm quarter-wave plate, a measuring arm refraction element, a reference arm quarter-wave plate, a reference arm refraction element and a one-dimensional reflective reference grating; The period of the one-dimensional reflective measurement/reference grating, the refraction angle of the refraction element of the measurement/reference arm, and the wavelength of the dual-frequency laser exiting the optical fiber satisfy 2d 1 sinθ i1 =±mλ 1 , 2d 2 sinθ i2 =±mλ 2 ; The present invention can not only measure the linear displacement along the two directions of x-axis and z-axis simultaneously, but also improve the anti-interference ability of the measurement signal, and the z-direction displacement range of the system has been greatly expanded compared with the prior art .
Description
Technical field
Use the diaxon grating displacement measuring system of double-frequency laser to relate to an a kind of grating displacement measuring system, particularly a kind of diaxon grating displacement measuring system that uses double-frequency laser.
Background technology
Pattern displacement measuring technique originated from for 19th century the earliest, had obtained development rapidly since the 1950's.At present, grating displacement measuring system has become a kind of typical displacement transducer, and is widely used in numerous electromechanical equipments.Grating displacement measuring system, because having the many merits such as resolving power is high, precision is high, cost is low, environmental sensitivity is low, is not only widely used in industry and scientific research field, and is studied by numerous Chinese scholars.
Litho machine is the nucleus equipment of producing semi-conductor chip.Ultraprecise work stage is the kernel subsystems of litho machine, for carrying substrates and complete the high speed ultraprecise motion of load, exposure, zapping, unloading piece process.The features such as ultraprecise work stage has at a high speed, high acceleration, multiple degrees of freedom, large stroke, ultraprecise.Two-frequency laser interferometer, because have advantages of high precision, wide range simultaneously, is widely used in the displacement measurement of ultraprecise work stage.Yet the technological level of semi-conductor chip manufacture in recent years constantly promotes: 2010, the processing of semi-conductor chip adopted 32nm live width technique; In the end of the year 2011, the cpu chip of 22nm live width is list marketing also.The semi-conductor chip level of processing improving constantly is all had higher requirement to indexs such as the resolving power of ultraprecise work stage displacement measurement, precision, two-frequency laser interferometer because it exists that environmental sensitivity is poor, large, the multi-degree of freedom measurement complex structure of taking up room, the problem such as expensive be difficult to meet new measurement demand.
In order to address the above problem, relevant company and numerous scholar in the field of ultra precise measurement both at home and abroad have carried out a large amount of research, and achievement in research all has exposure in many patents and paper.The patent US 7 of Holland ASML company, 483, open day on November 15th, 2007 of 120 B2() a kind of plane grating measuring system and arrangement that is applied to Ultra-precision Stages of Lithography disclosed, this measuring system is mainly utilized the large travel displacement of level of two-dimensional grating and read head measuring workpieces platform, the displacement of work stage vertical direction can be measured by the height sensor of independent layout, but uses multiple sensors can make the measuring accuracy of complex structure the meeting limiting displacement of ultraprecise work stage.Japanese scholars Gao Wei has proposed a kind of diaxon grating displacement measuring system based on diffraction interference principle in the paper of delivering " Design and construction of a two-degree-of-freedom linear encoder for nanometric measurement of stage position and straightness.Precision Engineering34 (2010) 145-155. " and " Position and out-of-straightness measurement of a precision linear air-bearing stage by using a two-degree-of-freedom linear encoder.Measurement Science and Technology21 (2010) 054005. ", can measure level and the vertically straight-line displacement of both direction simultaneously, but this system can cause the interference region of measuring light and reference light to diminish when measuring the straight-line displacement of vertical direction, therefore the range of the vertical direction straight-line displacement of system is limited to the size of beam diameter, cannot realize the measurement of the large stroke straight-line displacement of vertical direction.Open day on February 20th, 2013 of patent CN 102937411 A(of the people such as the Zhu Yu of Tsing-Hua University) in, a kind of dual-frequency grating interferometer displacement measurement system is disclosed, also can measure level and the vertically straight-line displacement of both direction simultaneously, and used double-frequency laser as light source to improve the antijamming capability of signal, but the range of the vertical direction straight-line displacement of this system is limited to the size of beam diameter equally, still cannot realize the measurement of the large stroke straight-line displacement of vertical direction.The people such as the Fan Kuang-Chao of Univ Nat Taiwan have developed a kind of two-dimensional grating displacement measuring device of nanometer scale resolving power in the paper of delivering " Displacement Measurement of Planar Stage by Diffraction Planar Encoder in Nanometer Resolution.I2MTC (2012) 894-897. ", can measure the straight-line displacement of two horizontal directions, but cannot measure the straight-line displacement of vertical direction, can not meet the displacement measurement requirement of ultraprecise work stage vertical direction.
Summary of the invention
In order to address the above problem, the object of this invention is to provide a kind of diaxon grating displacement measuring system that uses double-frequency laser, this measuring system not only can be measured along the straight-line displacement of x axle, z axle both direction simultaneously, and having improved the antijamming capability of measuring-signal, the z that simultaneously compares this system of prior art has obtained great expansion to displacement range.
The object of the present invention is achieved like this:
Use a diaxon grating displacement measuring system for double-frequency laser, comprise the reflective measurement grating of two-frequency laser, light splitting part, optical interference circuit parts, Photoelectric Inspect & Signal Processing parts and one dimension of outgoing terminated optical fiber; Described optical interference circuit parts comprise that polarization splitting prism, gage beam quarter-wave plate, gage beam dioptric element, reference arm quarter-wave plate, reference arm dioptric element and one dimension are reflective with reference to grating;
The reflective grating cycle with reference to grating of the reflective measurement grating of described one dimension and one dimension is respectively d
1and d
2; The refractive power angle of described gage beam dioptric element and reference arm dioptric element is respectively θ
i1and θ
i2, and meet respectively 2d
1sin θ
i1=± m λ
1, 2d
2sin θ
i2=± m λ
2, λ in formula
1, λ
2the wavelength, the m that are respectively two frequency light waves that the two-frequency laser of outgoing terminated optical fiber penetrates are the order of diffraction time;
The double-frequency laser that the two-frequency laser of described outgoing terminated optical fiber penetrates is divided into two bundle directional lights through light splitting part, and it is λ that this two bundles directional light is divided into the wavelength of being spent by deviation 90 direction of propagation again after polarization splitting prism
1measurement light and the wavelength of propagating along former direction be λ
2reference light, the polarization direction of measuring light and reference light is orthogonal, the two bundle directional lights of measuring light through quick shaft direction with measure light polarization direction and be after the gage beam quarter-wave plate of 45 degree all measured arm dioptric element deviations, after deviation two bundle measure light be incident to the reflective measurement grating of one dimension be diffracted to respectively+m order diffraction measure light and-m order diffraction measures light, ± m order diffraction is measured light respectively along the opposite direction propagation of incident light separately, and again pass through gage beam dioptric element, after gage beam quarter-wave plate and polarization splitting prism, be incident to Photoelectric Inspect & Signal Processing parts, equal referenced arm dioptric element deviation after the reference arm quarter-wave plate that two bundle directional lights of reference light are 45 degree through quick shaft direction and reference light polarization direction, after deviation two bundle reference light be incident to one dimension reflective with reference to grating be diffracted to respectively+m order diffraction reference light and-m order diffraction reference light, the edge opposite direction propagation of incident light separately respectively of ± m order diffraction reference light, and again after reference arm dioptric element, reference arm quarter-wave plate and polarization splitting prism, be incident to Photoelectric Inspect & Signal Processing parts, two bundle diffractometry light respectively with two bundle reference diffraction light form two groups of interfere beat frequency signals at Photoelectric Inspect & Signal Processing parts surface, interfere beat frequency signal is surveyed and is processed by Photoelectric Inspect & Signal Processing parts, when the relative optical interference circuit parts of the reflective measurement grating of one dimension move along x axle and z axle, Photoelectric Inspect & Signal Processing parts are exported respectively the straight-line displacement of x direction and z direction.
Above-mentioned a kind of diaxon grating displacement measuring system that uses double-frequency laser, described light splitting part is a kind of in following four kinds of structures:
The first, described light splitting part is comprised of collimation lens, unpolarized Amici prism, right-angle reflecting prism, the laser of the two-frequency laser transmitting of outgoing terminated optical fiber is incident to unpolarized Amici prism and is divided into that light intensity equates, the mutually perpendicular two-beam in the direction of propagation after collimation lens collimation, wherein light beam direction of propagation after right-angle reflecting prism is propagated by deviation 90 degree and another bundle parallel light, forms the parallel emergent light that two-beam equates by force;
The second, described light splitting part is comprised of collimation lens, one dimension transmission grating, catoptron, aperture diaphragm, the laser of the two-frequency laser transmitting of outgoing terminated optical fiber is incident to one dimension transmission grating diffracted after collimation lens collimation, ± 1 order diffraction light forms through catoptron deviation and by aperture diaphragm the parallel emergent light that two-beam equates by force, and the diffraction light of other grades times is filtered by aperture diaphragm;
Three, described light splitting part is comprised of collimation lens, one dimension transmission grating, lens, aperture diaphragm, the laser of the two-frequency laser transmitting of outgoing terminated optical fiber is incident to one dimension transmission grating diffracted after collimation lens collimation, ± 1 order diffraction light forms through lens deviation and by aperture diaphragm the parallel emergent light that two-beam equates by force, and the diffraction light of other grades times is filtered by aperture diaphragm;
Four, described light splitting part is comprised of collimation lens, one dimension transmission grating, prism, aperture diaphragm, the laser of the two-frequency laser transmitting of outgoing terminated optical fiber is incident to one dimension transmission grating diffracted after collimation lens collimation, ± 1 order diffraction light forms through prism deviation and by aperture diaphragm the parallel emergent light that two-beam equates by force, and the diffraction light of other grades times is filtered by aperture diaphragm.
Above-mentioned a kind of diaxon grating displacement measuring system that uses double-frequency laser, described gage beam dioptric element is a kind of in following four kinds of structures:
The first, described gage beam dioptric element comprises diaphragm and refractive power catoptron, described two bundle horizontal survey light after diaphragm and refractive power catoptron the direction of propagation respectively by deviation ± θ
i1and be incident to the reflective measurement grating of one dimension generation diffraction;
The second, described gage beam dioptric element comprises diaphragm and refractive prism, described two bundle horizontal survey light after diaphragm and refractive prism the direction of propagation respectively by deviation ± θ
i1and be incident to the reflective measurement grating of one dimension generation diffraction;
The 3rd, described gage beam dioptric element comprises diaphragm and first fold optical lens, described two bundle horizontal survey light after diaphragm and first fold optical lens the direction of propagation respectively by deviation ± θ
i1and be incident to the reflective measurement grating of one dimension generation diffraction;
The 4th, described gage beam dioptric element comprises diaphragm and the second dioptric lens, described two bundle horizontal survey light after diaphragm and the second dioptric lens the direction of propagation respectively by deviation ± θ
i1and be incident to the reflective measurement grating of one dimension generation diffraction;
Described reference arm dioptric element is a kind of in four kinds of structures adopting of gage beam dioptric element, and general ± θ
i1replace with ± θ
i2.
Beneficial effect of the present invention is described as follows:
This measuring system has been used and has been met 2d
1sin θ
i1=± m λ
1, 2d
2sin θ
i2=± m λ
2the reflective measurement grating of one dimension of condition, the reflective two-frequency laser with reference to grating, gage beam dioptric element, reference arm dioptric element and outgoing terminated optical fiber of one dimension, guaranteed that two bundle diffractometry light are respectively along the opposite direction propagation of the incident light direction of propagation separately, therefore when the relative optical interference circuit parts of the reflective measurement grating of one dimension move along z axle, two bundle diffractometry light are constant at the facula position of Photoelectric Inspect & Signal Processing parts surface, again because system when measuring except one dimension reflective measurement grating the relative position of other elements constant all the time, therefore two bundle reference diffraction light are constant all the time at the facula position of Photoelectric Inspect & Signal Processing parts surface, so when the reflective measurement grating of one dimension relative measurement arm dioptric element moves along z axle, interfere the interference region of hot spot constant for two groups of Photoelectric Inspect & Signal Processing parts surface, the z of system is no longer limited to the size of spot diameter to displacement range, but depend on the coherent length of light source, light source of the present invention is the two-frequency laser of outgoing terminated optical fiber, its coherent length can reach even km magnitude of meter magnitude, therefore z of the present invention can expand to even km magnitude of meter magnitude to displacement range, the z of the measurement mechanism that in prior art, Japanese scholars Gao Wei develops is only 4mm to displacement range, though the z of undeclared system is to displacement range in the people's such as Zhu Yu patent, but its z is limited to the size of spot diameter to displacement range, cannot realize the z of centimetre magnitude to displacement measurement, therefore the remarkable beneficial effect that the present invention has is for not only proposed a kind of optical grating measuring system of two axial translations of can measuring simultaneously, and the z of this system compares prior art to displacement range and has obtained great expansion.In addition, the present invention uses dual-frequency laser source, has improved the antijamming capability of displacement measurement signal.
Accompanying drawing explanation
Fig. 1 is a kind of structural representation that uses the diaxon grating displacement measuring system of double-frequency laser of the present invention.
Fig. 2 is the structural representation of the first structure of light splitting part of the present invention.
Fig. 3 is the structural representation of the second structure of light splitting part of the present invention.
Fig. 4 is the structural representation of the third structure of light splitting part of the present invention.
Fig. 5 is the structural representation of the 4th kind of structure of light splitting part of the present invention.
Fig. 6 is the structural representation of the first structure of gage beam dioptric element of the present invention.
Fig. 7 is the structural representation of the second structure of gage beam dioptric element of the present invention.
Fig. 8 is the structural representation of the third structure of gage beam dioptric element of the present invention.
Fig. 9 is the structural representation of the 4th kind of structure of gage beam dioptric element of the present invention.
In figure: the two-frequency laser of 1 outgoing terminated optical fiber; 2 light splitting parts; 21 collimation lenses; 22 unpolarized Amici prisms; 23 right-angle reflecting prism; 24 one dimension transmission gratings; 251 catoptrons; 252 lens; 253 prisms; 26 aperture diaphragms; 3 optical interference circuit parts; 31 polarization splitting prisms; 32 gage beam quarter-wave plates; 33 gage beam dioptric elements; 331 diaphragms; 332 refractive power catoptrons; 333 refractive prisms; 334 first fold optical lenss; 335 second dioptric lenses; 34 reference arm quarter-wave plates; 35 reference arm dioptric elements; 36 one dimensions are reflective with reference to grating; 4 Photoelectric Inspect & Signal Processing parts; The reflective measurement grating of 5 one dimension.
Embodiment
Below in conjunction with accompanying drawing, the specific embodiment of the invention is described in further detail.
Specific embodiment one
The diaxon grating displacement measuring system of the use double-frequency laser of the present embodiment, structural representation as shown in Figure 1.This measuring system comprises the reflective measurement grating 5 of two-frequency laser 1, light splitting part 2, optical interference circuit parts 3, Photoelectric Inspect & Signal Processing parts 4 and one dimension of outgoing terminated optical fiber; Described optical interference circuit parts 3 comprise that polarization splitting prism 31, gage beam quarter-wave plate 32, gage beam dioptric element 33, reference arm quarter-wave plate 34, reference arm dioptric element 35 and one dimension are reflective with reference to grating 36;
The reflective grating cycle with reference to grating 36 of the reflective measurement grating 5 of described one dimension and one dimension is respectively d
1and d
2; The refractive power angle of described gage beam dioptric element 33 and reference arm dioptric element 35 is respectively θ
i1and θ
i2, and meet respectively 2d1sin θ
i1=± m λ
1, 2d2sin θ
i2=± m λ
2, λ in formula
1, λ
2the wavelength, the m that are respectively two frequency light waves that the two-frequency laser 1 of outgoing terminated optical fiber penetrates are the order of diffraction time;
The double-frequency laser that the two-frequency laser 1 of described outgoing terminated optical fiber penetrates is divided into two bundle directional lights through light splitting part 2, and it is λ that this two bundles directional light is divided into the wavelength of being spent by deviation 90 direction of propagation again after polarization splitting prism 31
1measurement light and the wavelength of propagating along former direction be λ
2reference light, the polarization direction of measuring light and reference light is orthogonal, the two bundle directional lights of measuring light through quick shaft direction with measure light polarization direction and be after the gage beam quarter-wave plate 32 of 45 degree all measured arm dioptric element 33 deviations, after deviation two bundle measure light be incident to the reflective measurement grating 5 of one dimension be diffracted to respectively+m order diffraction measure light and-m order diffraction measures light, ± m order diffraction is measured light respectively along the opposite direction propagation of incident light separately, and again pass through gage beam dioptric element 33, after gage beam quarter-wave plate 32 and polarization splitting prism 31, be incident to Photoelectric Inspect & Signal Processing parts 4, equal referenced arm dioptric element 35 deviations after the reference arm quarter-wave plate 34 that two bundle directional lights of reference light are 45 degree through quick shaft direction and reference light polarization direction, after deviation two bundle reference light be incident to one dimension reflective with reference to grating 36 be diffracted to respectively+m order diffraction reference light and-m order diffraction reference light, the edge opposite direction propagation of incident light separately respectively of ± m order diffraction reference light, and again after reference arm dioptric element 35, reference arm quarter-wave plate 34 and polarization splitting prism 31, be incident to Photoelectric Inspect & Signal Processing parts 4, two bundle diffractometry light respectively with two bundle reference diffraction light form two groups of interfere beat frequency signals on Photoelectric Inspect & Signal Processing parts 4 surfaces, interfere beat frequency signal is surveyed and is processed by Photoelectric Inspect & Signal Processing parts 4, when the relative optical interference circuit parts 3 of the reflective measurement grating 5 of one dimension move along x axle and z axle, Photoelectric Inspect & Signal Processing parts 4 are exported respectively the straight-line displacement of x direction and z direction.Specific embodiment two
The diaxon grating displacement measuring system of the use double-frequency laser of the present embodiment is identical with the one-piece construction of specific embodiment one.Wherein, the concrete structure of light splitting part 2 as shown in Figure 2.This light splitting part 2 is comprised of collimation lens 21, unpolarized Amici prism 22, right-angle reflecting prism 23, the laser of two-frequency laser 1 transmitting of outgoing terminated optical fiber is incident to unpolarized Amici prism 22 and is divided into that light intensity equates, the mutually perpendicular two-beam in the direction of propagation after collimation lens 21 collimations, wherein light beam direction of propagation after right-angle reflecting prism 23 is propagated by deviation 90 degree and another bundle parallel light, forms the parallel emergent light that two-beam equates by force.
Specific embodiment three
The diaxon grating displacement measuring system of the use double-frequency laser of the present embodiment is identical with the one-piece construction of specific embodiment one.Wherein, the concrete structure of light splitting part 2 as shown in Figure 3.This light splitting part 2 is comprised of collimation lens 21, one dimension transmission grating 24, catoptron 251, aperture diaphragm 26, the laser of two-frequency laser 1 transmitting of outgoing terminated optical fiber is incident to one dimension transmission grating 24 diffracted after collimation lens 21 collimations, ± 1 order diffraction light forms through catoptron 251 deviations and by aperture diaphragm 26 the parallel emergent light that two-beam equates by force, and the diffraction light of other grades times is filtered by aperture diaphragm 26.Specific embodiment four
The diaxon grating displacement measuring system of the use double-frequency laser of the present embodiment is identical with the one-piece construction of specific embodiment one.Wherein, the concrete structure of light splitting part 2 as shown in Figure 4.This light splitting part 2 is comprised of collimation lens 21, one dimension transmission grating 24, lens 252, aperture diaphragm 26, the laser of two-frequency laser 1 transmitting of outgoing terminated optical fiber is incident to one dimension transmission grating 24 diffracted after collimation lens 21 collimations, ± 1 order diffraction light forms through lens 252 deviations and by aperture diaphragm 26 the parallel emergent light that two-beam equates by force, and the diffraction light of other grades times is filtered by aperture diaphragm 26.
Specific embodiment five
The diaxon grating displacement measuring system of the use double-frequency laser of the present embodiment is identical with the one-piece construction of specific embodiment one.Wherein, the concrete structure of light splitting part 2 as shown in Figure 5.This light splitting part 2 is comprised of collimation lens 21, one dimension transmission grating 24, prism 253, aperture diaphragm 26, the laser of two-frequency laser 1 transmitting of outgoing terminated optical fiber is incident to one dimension transmission grating 24 diffracted after collimation lens 21 collimations, ± 1 order diffraction light forms through prism 253 deviations and by aperture diaphragm 26 the parallel emergent light that two-beam equates by force, and the diffraction light of other grades times is filtered by aperture diaphragm 26.
Specific embodiment six
The diaxon grating displacement measuring system of the use double-frequency laser of the present embodiment is identical with the one-piece construction of specific embodiment one.Wherein, the concrete structure of gage beam dioptric element 33 as shown in Figure 6.This gage beam dioptric element 33 comprises diaphragm 331 and refractive power catoptron 332, described two bundle horizontal survey light after diaphragm 331 and refractive power catoptron 332 direction of propagation respectively by deviation ± θ
i1and be incident to the reflective measurement grating of one dimension 5 diffraction occur.
Specific embodiment seven
The diaxon grating displacement measuring system of the use double-frequency laser of the present embodiment is identical with the one-piece construction of specific embodiment one.Wherein, the concrete structure of gage beam dioptric element 33 as shown in Figure 7.This gage beam dioptric element 33 comprises diaphragm 331 and refractive prism 333, described two bundle horizontal survey light after diaphragm 331 and refractive prism 333 direction of propagation respectively by deviation ± θ
i1and be incident to the reflective measurement grating of one dimension 5 diffraction occur.
Specific embodiment eight
The diaxon grating displacement measuring system of the use double-frequency laser of the present embodiment is identical with the one-piece construction of specific embodiment one.Wherein, the concrete structure of gage beam dioptric element 33 as shown in Figure 8.This gage beam dioptric element 33 comprises diaphragm 331 and first fold optical lens 334, described two bundle horizontal survey light after diaphragm 331 and first fold optical lens 334 direction of propagation respectively by deviation ± θ
i1and be incident to the reflective measurement grating of one dimension 5 diffraction occur.
Specific embodiment nine
The diaxon grating displacement measuring system of the use double-frequency laser of the present embodiment is identical with the one-piece construction of specific embodiment one.Wherein, the concrete structure of gage beam dioptric element 33 as shown in Figure 9.This gage beam dioptric element 33 comprises diaphragm 331 and the second dioptric lens 335, described two bundle horizontal survey light after diaphragm 331 and the second dioptric lens 335 direction of propagation respectively by deviation ± θ
i1and be incident to the reflective measurement grating of one dimension 5 diffraction occur.
The diaxon grating displacement measuring system of the use double-frequency laser of above embodiment, reference arm dioptric element 35 is a kind of in gage beam dioptric element 33 structures described in specific embodiment six, specific embodiment seven, specific embodiment eight, specific embodiment nine, and general ± θ
i1replace with ± θ
i2.
The present invention is not limited to above-mentioned preferred forms, and anyone should learn structural change or the method improvement of making under enlightenment of the present invention, and every have identical or close technical scheme with the present invention, within all falling into protection scope of the present invention.
Claims (4)
1. a diaxon grating displacement measuring system that uses double-frequency laser, is characterized in that: the two-frequency laser (1), light splitting part (2), optical interference circuit parts (3), Photoelectric Inspect & Signal Processing parts (4) and the reflective measurement grating of one dimension (5) that comprise outgoing terminated optical fiber; Described optical interference circuit parts (3) comprise that polarization splitting prism (31), gage beam quarter-wave plate (32), gage beam dioptric element (33), reference arm quarter-wave plate (34), reference arm dioptric element (35) and one dimension are reflective with reference to grating (36);
The reflective grating cycle with reference to grating (36) of the reflective measurement grating of described one dimension (5) and one dimension is respectively d
1and d
2; The refractive power angle of described gage beam dioptric element (33) and reference arm dioptric element (35) is respectively θ
i1and θ
i2, and meet respectively 2d
1sin θ
i1=± m λ
1, 2d
2sin θ
i2=± m λ
2, λ in formula
1, λ
2the wavelength, the m that are respectively two frequency light waves that the two-frequency laser (1) of outgoing terminated optical fiber penetrates are the order of diffraction time;
The double-frequency laser that the two-frequency laser of described outgoing terminated optical fiber (1) penetrates is divided into two bundle directional lights through light splitting part (2), and it is λ that this two bundles directional light is divided into the wavelength of being spent by deviation 90 direction of propagation again after polarization splitting prism (31)
1measurement light and the wavelength of propagating along former direction be λ
2reference light, the polarization direction of measuring light and reference light is orthogonal, measure after the gage beam quarter-wave plate (32) that two bundle directional lights of light are 45 degree through quick shaft direction and measurement light polarization direction all measured arm dioptric element (33) deviations, after deviation two bundle measure light be incident to the reflective measurement grating of one dimension (5) be diffracted to respectively+m order diffraction measure light and-m order diffraction measures light, ± m order diffraction is measured light respectively along the opposite direction propagation of incident light separately, and again pass through gage beam dioptric element (33), after gage beam quarter-wave plate (32) and polarization splitting prism (31), be incident to Photoelectric Inspect & Signal Processing parts (4), equal referenced arm dioptric element (35) deviation after the reference arm quarter-wave plate (34) that two bundle directional lights of reference light are 45 degree through quick shaft direction and reference light polarization direction, after deviation two bundle reference light be incident to one dimension reflective with reference to grating (36) be diffracted to respectively+m order diffraction reference light and-m order diffraction reference light, ± m order diffraction reference light is respectively along the opposite direction propagation of incident light separately, and again pass through reference arm dioptric element (35), after reference arm quarter-wave plate (34) and polarization splitting prism (31), be incident to Photoelectric Inspect & Signal Processing parts (4), two bundle diffractometry light respectively with two bundle reference diffraction light form two groups of interfere beat frequency signals on Photoelectric Inspect & Signal Processing parts (4) surface, interfere beat frequency signal is surveyed and is processed by Photoelectric Inspect & Signal Processing parts (4), the reflective measurement grating of one dimension (5) is when relatively optical interference circuit parts (3) move along x axle and z axle, the straight-line displacement that Photoelectric Inspect & Signal Processing parts (4) are exported respectively x direction and z direction.
2. a kind of diaxon grating displacement measuring system that uses double-frequency laser according to claim 1, is characterized in that: a kind of in following four kinds of structures of described light splitting part (2):
The first, described light splitting part (2) is comprised of collimation lens (21), unpolarized Amici prism (22), right-angle reflecting prism (23), the laser of the two-frequency laser of outgoing terminated optical fiber (1) transmitting is incident to unpolarized Amici prism (22) and is divided into that light intensity is equal, the mutually perpendicular two-beam in the direction of propagation after collimation lens (21) collimation, wherein light beam direction of propagation after right-angle reflecting prism (23) is propagated by deviation 90 degree and another bundle parallel light, forms the parallel emergent light that two-beam equates by force;
The second, described light splitting part (2) is comprised of collimation lens (21), one dimension transmission grating (24), catoptron (251), aperture diaphragm (26), the laser of the two-frequency laser of outgoing terminated optical fiber (1) transmitting is incident to one dimension transmission grating (24) diffracted after collimation lens (21) collimation, ± 1 order diffraction light forms through catoptron (251) deviation and by aperture diaphragm (26) the parallel emergent light that two-beam equates by force, and the diffraction light of other grades times is filtered by aperture diaphragm (26);
Three, described light splitting part (2) is comprised of collimation lens (21), one dimension transmission grating (24), lens (252), aperture diaphragm (26), the laser of the two-frequency laser of outgoing terminated optical fiber (1) transmitting is incident to one dimension transmission grating (24) diffracted after collimation lens (21) collimation, ± 1 order diffraction light forms through lens (252) deviation and by aperture diaphragm (26) the parallel emergent light that two-beam equates by force, and the diffraction light of other grades times is filtered by aperture diaphragm (26);
Four, described light splitting part (2) is comprised of collimation lens (21), one dimension transmission grating (24), prism (253), aperture diaphragm (26), the laser of the two-frequency laser of outgoing terminated optical fiber (1) transmitting is incident to one dimension transmission grating (24) diffracted after collimation lens (21) collimation, ± 1 order diffraction light forms through prism (253) deviation and by aperture diaphragm (26) the parallel emergent light that two-beam equates by force, and the diffraction light of other grades times is filtered by aperture diaphragm (26).
3. a kind of diaxon grating displacement measuring system that uses double-frequency laser according to claim 1, is characterized in that: a kind of in following four kinds of structures of described gage beam dioptric element (33):
The first, described gage beam dioptric element (33) comprises diaphragm (331) and refractive power catoptron (332), described two bundle horizontal survey light after diaphragm (331) and refractive power catoptron (332) direction of propagation respectively by deviation ± θ
i1and be incident to the reflective measurement grating of one dimension (5) diffraction occurs;
The second, described gage beam dioptric element (33) comprises diaphragm (331) and refractive prism (333), described two bundle horizontal survey light after diaphragm (331) and refractive prism (333) direction of propagation respectively by deviation ± θ
i1and be incident to the reflective measurement grating of one dimension (5) diffraction occurs;
The 3rd, described gage beam dioptric element (33) comprises diaphragm (331) and first fold optical lens (334), described two bundle horizontal survey light after diaphragm (331) and first fold optical lens (334) direction of propagation respectively by deviation ± θ
i1and be incident to the reflective measurement grating of one dimension (5) diffraction occurs;
The 4th, described gage beam dioptric element (33) comprises diaphragm (331) and the second dioptric lens (335), described two bundle horizontal survey light after diaphragm (331) and the second dioptric lens (335) direction of propagation respectively by deviation ± θ
i1and be incident to the reflective measurement grating of one dimension (5) diffraction occurs.
4. a kind of diaxon grating displacement measuring system that uses double-frequency laser according to claim 3, is characterized in that: a kind of in four kinds of structures that described reference arm dioptric element (35) adopts for gage beam dioptric element (33), and general ± θ
i1replace with ± θ
i2.
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| CN110907140B (en) * | 2019-11-25 | 2024-10-29 | 南京南智先进光电集成技术研究院有限公司 | Grating period measuring device and method |
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| CN115808119A (en) * | 2022-11-21 | 2023-03-17 | 清华大学 | A kind of interferometer measuring system and measuring method |
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