CN103324032B - Polyhedron main substrate, manufacturing method and processing method thereof - Google Patents
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Abstract
The invention relates to a polyhedron main substrate for installing support devices, a measurement device and a lens barrel device, wherein the main substrate is provided with at least a working position, and the outer surface of the main substrate is defined by polygon enveloping surfaces of installation regions of the support devices, the measurement device and the lens barrel device, and is a convex polyhedron formed through connecting a plurality of other planes according to a convex enveloping rule. According to the present invention, based on the polyhedron structure design, the whole structure of the obtained main substrate is simple and efficient, good dynamic performance and good stability can be achieved, processing characteristics of integrated main substrate casting are met, and the main substrate formed through the combination has performance advantages of high modality and low quality compared with the existing structure.
Description
Technical field
The present invention relates to a kind of semiconductor manufacturing facility, particularly relate to a kind of polyhedron main substrate structure for lithographic equipment and manufacture method thereof and job operation.
Background technology
Main substrate and measurement support are the cores of litho machine complete machine Frame Design, it had both needed the characteristic index possessing high mode, to meet the demand of short-term stability dynamic property, a good equilibrium point must be searched out to meet the demand of long-term thermal stability at material and field of heat transfer again simultaneously.In addition, along with the increase of object lens and measuring system quality, force again main substrate and measure support Design and will meet inferior quality, light-weighted development trend.Therefore the design direction of main substrate and measurement support needs to possess high mode and light-weighted double characteristic.
With regard to space constraint, development due to projection objective makes conjugate distance constantly increase, this makes complete machine Inner-world, specifically comprise main substrate and measure support, need the size provided from mask plane (object lens object plane) to the larger Z-direction height of silicon chip face (object lens image planes) span, for mask platform laser interferometer and work stage laser interferometer provide effective mounting plane.Meanwhile, litho machine is for improving complete machine work efficiency, and the development trend of main substrate is increased to two working positions by a working position, to adapt to X and the Y-direction plane space demand of double-workpiece-table and double-exposure design.Therefore, main substrate and measurement support need for photo-etching machine objective lens and measuring system are provided as the larger installation of spatial extent and seating surface.
US Patent No. 7130019 provides a kind of main substrate manufacture method of aluminum composite material, and increase feedback temperature control system carries out active cooling and temperature compensation.Such main substrate can use the material of higher thermal expansion coefficient, and this new material possesses higher rigidity to reach equal dynamic property simultaneously.But if adopt the material of the low thermal coefficient of expansion such as invar (Invar) to manufacture main substrate, can produce following defect: invar manufacturing cost is high, processibility is difficult, and delivery date is long.On the other hand, also there is the problems such as the bottleneck of dynamic property in the impact by invar material character.Main substrate disclosed in US Patent No. 7130019 is a kind of double, large area main substrate, although its lighter weight, mode value is relatively on the low side, is unfavorable for complete machine dynamic property.
US Patent No. 5691806 provides a kind of casting mold main substrate framework, and described casting mold frame installation is above work stage.The top of casting mold framework is body structure, and inside is provided with many reinforcements, framework is divided into several small box, to strengthen the rigidity of casting mold framework, fills up vibration-dampening bubble in framework simultaneously, improves system stability.Casting mold framework is enclosed construction, does not have particle contamination work stage.Main substrate disclosed in US Patent No. 5691806 is a kind of single station, small size main substrate, although its structural strength is good, mode value is high, causes quality excessive because of being casting mold main substrate.
For prior art Problems existing, this case designer is by means of being engaged in the industry experience for many years, and active research improves, so had polyhedron main substrate structure of the present invention and manufacture method thereof and job operation.
Summary of the invention
The present invention be directed in prior art, existing litho machine main substrate manufacturing cost is high, and processibility is difficult, and delivery date is long, bad dynamic performance, and the defect such as quality is excessive, provides a kind of polyhedron main substrate structure.
In order to solve the problem, the invention provides a kind of polyhedron main substrate, for fittable slackening device, measurement mechanism and body tube device, described main substrate offers at least one station, wherein, the outside surface of described main substrate limited by the polygon enveloping surface of the installation region of described bracing or strutting arrangement, measurement mechanism, body tube device, and the convex polyhedron connected and composed by convex closure rule by other planes some.
Further, described main substrate outside surface comprises: main substrate upper surface, offers at least one station, and is provided with the installation region of corresponding described bracing or strutting arrangement, described main substrate upper surface is polygonized structure, and the edge of described polygonized structure is limited by the installation region of described bracing or strutting arrangement; Main substrate lower surface, corresponding main substrate upper surface offers corresponding station, and being respectively arranged with the installation region of corresponding some measuring systems, described main substrate lower surface is polygonized structure, and the edge of described polygonized structure is limited by the installation region of described each measuring system; Peripheral board, comprise some polygon panels, described peripheral board carries out transition with the polygon vertex of described main substrate lower surface with some polygon panels to the polygon vertex of described main substrate upper surface and is connected, and makes described main substrate upper surface, main substrate lower surface and peripheral board be connected to form convex polyhedron.
Optionally, some floors are also provided with between described main substrate upper surface and main substrate lower surface.
Optionally, described each floor is crisscross being evenly arranged between described main substrate upper surface and main substrate lower surface.
Optionally, the polygonized structure of described main substrate upper surface is the polygon limited with the envelope of each vibration damper installation region.
Optionally, the station that described main substrate upper surface and main substrate lower surface correspondence are offered comprises at least one exposure position and at least one measures position.
Optionally, described bracing or strutting arrangement is vibration damper.
Optionally, the quantity of described bracing or strutting arrangement is three or four.
Optionally, described bracing or strutting arrangement is arranged in the plane of at least two differing heights, and described main substrate upper surface is formed by connecting by the plane that at least two are connected respectively described differing heights.
Optionally, the polygonized structure of described main substrate lower surface is the polygon limited with the envelope of each measuring system installation region.
Optionally, described measuring system comprises work stage laser interferometer, null pick-up, off-axis alignment device, leveling and focusing device and secondary prealignment device.
Optionally, the space envelope that each polygon panel in described peripheral board is connected to form is by convex closure term restriction.
Another object of the present invention is the defect for prior art, provides a kind of manufacture method manufacturing above-mentioned polyhedron main substrate.
In order to achieve the above object, the invention provides a kind of manufacture method of polyhedron main substrate, described main substrate is arranged on a basic framework by some bracing or strutting arrangements, it comprises the following steps: provide main substrate upper surface: the installation region determining the corresponding described each bracing or strutting arrangement of described main substrate upper surface, using described each bracing or strutting arrangement installation region as the polygonized structure of marginal point determination main substrate upper surface, and offer at least one station at described main substrate upper surface; There is provided main substrate lower surface: the installation region determining corresponding some measuring systems respectively on described main substrate lower surface, determine the polygonized structure of described main substrate lower surface using described each measuring system installation region as marginal point, and offer the station of corresponding main substrate upper surface at described main substrate lower surface; There is provided peripheral board: with some polygon panels, transition is carried out with the polygon vertex of described main substrate lower surface to the polygon vertex of described main substrate upper surface and is connected, and make described main substrate upper surface, main substrate lower surface and peripheral board be connected to form convex polyhedron.
Optionally, this method is also included in the step arranging floor between described main substrate upper surface and main substrate lower surface.
Optionally, the polygonized structure of described main substrate upper surface is the polygon limited with the envelope of each vibration damper installation region.
Optionally, the station that described main substrate upper surface and main substrate lower surface correspondence are offered comprises at least one exposure position and at least one measures position.
Optionally, the polygonized structure of described main substrate lower surface is the polygon limited with the envelope of each measuring system installation region.
Optionally, described measuring system comprises work stage laser interferometer, null pick-up, off-axis alignment device, leveling and focusing device and secondary prealignment device.
Optionally, the polygon panel of described peripheral board adopts the polygon vertex of algorithm of convex hull to described main substrate upper surface and main substrate lower surface to solve in three dimensions, under the condition meeting installing space, obtains the structure of each polygon panel.
Optionally, provide in the step of peripheral board described, also comprise the step of peripheral board being carried out to Modifying model, described Modifying model comprises, and the polygon panel of described peripheral board is divided into two-layer up and down structure; The polygon limit number of polygon panel each in described peripheral board is remained on minimum.
For above-mentioned polyhedron main substrate, the present invention also provides a kind of job operation of polyhedron main substrate, comprise the following steps: sheet material blanking, part preprocessing, arrange according to main substrate the polygon sheet material that station, bracing or strutting arrangement installation region and measuring system installation region process each plane of corresponding main substrate outside surface respectively, described main substrate outside surface comprises main substrate upper surface, main substrate lower surface and peripheral board; Sheet material welds, and comprises the base plate of welding main substrate lower surface and the base plate of corresponding measurement mechanism and body tube device; Weld floor crisscross between main substrate upper surface and main substrate lower surface successively, complete building of inner skeleton; And, each polygon face plate of welding peripheral board.
Optionally, adopt welding technology between each sheet material of described main substrate, its process sequence adopts and gets on, get off, mode outer after first.
In sum, relative to existing structure main substrate, present invention employs the design concept of polyhedral structure, according to the installation requirements of bracing or strutting arrangement in lithographic equipment and each measurement mechanism, it is more succinct polygonized structure form efficiently by the structure qualification of main substrate upper surface and main substrate lower surface, and convex polyhedron structure is connected into polygon panel between main substrate upper surface and main substrate lower surface, the main substrate one-piece construction more compact efficient formed, can reach better dynamic property and stability.
In addition, polygon and polyhedral geometry are not only applicable to the manufacturing process of plate cutting and welding, and meet main substrate cast-in-block processing characteristics, and the main substrate that its combination is formed is compared existing structure and had high mode, low-quality performance advantage.
Accompanying drawing explanation
Fig. 1 is the structural representation of polyhedron main substrate upper surface of the present invention;
Fig. 2 is the structural representation of polyhedron main substrate lower surface of the present invention;
Fig. 3 is the structural representation of polyhedron main substrate side periphery plate of the present invention;
Fig. 4 is the structural representation of the polyhedron main substrate back side of the present invention peripheral board;
Fig. 5 is the structural perspective of polyhedron main substrate of the present invention;
Fig. 6 is the schematic diagram of bracing or strutting arrangement and measuring system installation region on main substrate of the present invention;
Fig. 7 is the structural representation that main substrate of the present invention is arranged on basic framework;
Fig. 8 is main substrate processing and manufacturing process flow diagram of the present invention.
Embodiment
By describe in detail the invention technology contents, structural attitude, reached object and effect, coordinate accompanying drawing to be described in detail below in conjunction with embodiment.
Polyhedron main substrate of the present invention, for fittable slackening device, measurement mechanism and body tube device, described main substrate offers at least one station.Wherein, the outside surface of described main substrate limited by the polygon enveloping surface of the installation region of described bracing or strutting arrangement, measurement mechanism, body tube device, and the convex polyhedron connected and composed by convex closure rule by other planes some.In a specific embodiment, enumerating described polyhedron main substrate is double main substrate, should not be considered as limitation of the present invention.
Refer to Fig. 1, Fig. 2, Fig. 1 and the external structure schematic diagram that Figure 2 shows that main substrate 100.The external structure of described main substrate 100 comprises the main substrate upper surface 204 be made up of top board (not shown), the main substrate lower surface 203 be made up of base plate (not shown), and carries out for described main substrate upper surface 204 and described main substrate lower surface 203 peripheral board 205 that effective transition is connected.In the present embodiment, described main substrate 100 is double main substrate, specifically comprises the exposure position 101 of installing projection objective and the measurement position 102 of carrying out measurement update.
Wherein, the external structure of described main substrate 100 is that Y-direction symmetry is polyhedron-shaped.Described main substrate upper surface 204 is provided with the mounting plane of corresponding bracing or strutting arrangement.In the present embodiment, described bracing or strutting arrangement is active damper 201.Described active damper 201 is three or four, and described main substrate upper surface 204 corresponds to subtriangular structure, and the installation region of described active damper 201 is arranged at triangular apex position respectively.
Because active damper 201 described in the present embodiment is arranged in the plane of at least two differing heights, described main substrate upper surface 204 is formed by connecting by the plane that at least two are connected respectively active damper 201 height, main substrate 100 is steadily arranged on basic framework and (can consults Fig. 7).
Described main substrate lower surface 203 is provided with the mounting interface (consulting shown in Fig. 6) of corresponding work stage laser interferometer 301 and other litho machine measuring system, and the structure of described main substrate lower surface 203 is the polygons limited with the envelope of above-mentioned each measuring system installation region.Envelope described in the present invention refers to the contour structure that the girth of encirclement periphery, appointed area is minimum, and its polygon limited is the minimal convex polygon surrounding periphery, appointed area.
In the present embodiment, the peripheral envelope of described measuring system is made up of six work stage laser interferometer 301 (respectively corresponding exposure position 101 and measurement position 102), because described work stage laser interferometer 301 installation region exists one fixed width, therefore the envelope structure of the corresponding work stage laser interferometer 301 of main substrate lower surface 203 that limits in installation region is in approximate eight-sided formation.
Main substrate of the present invention is applied in lithographic equipment, installs bracing or strutting arrangement and the measuring system of litho machine.Due in the lithographic apparatus, support system layout (corresponding active damper etc.) is completely different in functional characteristics, design requirement etc. with measuring system layout (corresponding laser interferometer, alignment device etc.), make the installation region of support system and measuring system also thereupon different, thus obtain the different version in the upper and lower surface of main substrate of the present invention respectively.
It is to be noted; in the present invention, the main substrate upper surface of indication, main substrate lower surface are only for ease of more clearly demonstrating the definition that main substrate ingredient and relativeness thereof are done; not should be understood to the restriction to corresponding site absolute position; in fact; the installed surface of the measuring systems such as described active damper 201 and work stage laser interferometer 301 can exchange completely in whole or in part; the upper and lower surface of main substrate also can horizontal or slant setting; all do not affect the enforcement of technical solution of the present invention, should protection scope of the present invention be belonged to.
Refer to Fig. 3, Fig. 4, between main substrate upper surface 204 and the point of main substrate lower surface 203, adopt several polygon panels to form peripheral board 205, described peripheral board 205 forms the convex polyhedron structure of main substrate 100, and is formed between described main substrate upper surface 204 with described main substrate lower surface 203 and be effectively connected transition.In the present embodiment, described peripheral board 205 is the convex polyhedrons be connected to form by the polygon vertex of each polygon panel to described main substrate upper surface 204 and main substrate lower surface 203, and the formation of described each polygon panel can solve acquisition according to algorithm of convex hull with being connected.
Refer to Fig. 5, Figure 5 shows that the structural perspective of main substrate 100.Described main substrate 100 inside is provided with along X to the inside floor 207 staggered with Y-direction.Be that space is arranged in parallel with predeterminable range between described inner floor 207, in exposure position, measure the important area peripheries such as position and is also provided with the oblique side rib plate be connected between X, the inner floor 207 of Y-direction.Described main substrate 100 arranges the stiffening plate 206 of having an appointment and tilting in 45 ° to the left and right sides of active damper 201 installation place.Described stiffening plate 206, as the installation deep floor of main substrate 100, makes the natural transition of described stiffening plate 206 and can form overall reinforcement with peripheral board 205.
On the other hand, the present invention also provides a kind of manufacture method of above-mentioned polyhedron main substrate, specifically comprises the following steps.
Perform step S1: data acquisition;
Please continue to refer to Fig. 6, Fig. 7, Figure 6 shows that polyhedron main substrate and measuring system interface and installation site schematic diagram, Figure 7 shows that main substrate is arranged on the structural representation on basic framework.As shown in Figure 6, first main substrate 100 and the measuring system interface measured on the installed surface of support (not shown) and bracing or strutting arrangement position effectively identified and defined, specifying the location point of all relevant interfaces or the three-dimensional space data of installation region.In the present embodiment, described main substrate 100 is double main substrate, specifically comprises the exposure position 101 of installing projection objective and the measurement position 102 of carrying out measurement update.The interface position of collection and definition and installation region is needed to comprise: the some measuring systems (not shown) being arranged on main substrate lower surface 203, described measuring system includes but not limited to work stage laser interferometer, null pick-up, off-axis alignment, leveling and focusing, secondary prealignment, and the mounting means of described measuring system can be installation by adhering or flat placed type is installed; Be arranged on the mask platform laser interferometer (not shown) of described measurement rack upper surface 202; Be arranged on 3 active damper 201 installation sites on described main substrate upper surface 204.As shown in Figure 7, described active damper 201 is arranged on basic framework, and described main substrate 100 horizontal in active damper 201, and is supported by the air supporting pressure of active damper 201 and reaches static balancing.
Perform step S2: main substrate external structure builds;
Refer to Fig. 7, and Fig. 1 to Fig. 4 is consulted in combination, the external overall structure building main substrate 100 needs to build main substrate upper surface 204, main substrate lower surface 203 and peripheral board 205 3 parts respectively.Wherein, building described main substrate upper surface 204 is the subtriangular structures limited with the installation region of three active damper 201, it offers the exposure position 101 of installing projection objective and the measurement position 102 of carrying out measurement update.
Described main substrate lower surface 203 be the polygonized structure that limits with the peripheral envelope in the installation region of each measuring system defined in above-mentioned steps S1 (in the present embodiment, the peripheral envelope of each measuring system of lower surface is limited by six work stage laser interferometer), and correspondence offers exposure position 101 and measures position 102.
Between the polygon vertex and the polygon vertex of described main substrate lower surface 203 of main substrate upper surface 204, use some polygon panels to carry out transition be connected, and make main substrate upper surface 204, main substrate lower surface 203 and peripheral board 205 form convex polyhedron structure.
In the present embodiment, the polygon panel of above-mentioned peripheral board 205 adopts the polygon vertex of algorithm of convex hull to described main substrate upper surface and main substrate lower surface to solve acquisition in three dimensions, and the concrete steps of Algorithm for Solving are as follows.
Refer to Fig. 1 to Fig. 4, and Fig. 6 is consulted in combination.Figure 6 shows that polyhedron main substrate and measuring system interface and installation site schematic diagram, can according to the measuring system interface gathered in above-mentioned steps S1 and bracing or strutting arrangement position three-dimensional space data as input parameter when solving, the algorithm of convex hull in computational geometry is adopted to solve arbitrfary point known in three dimensions, under the precondition meeting installing space, export peripheral board 205 structure obtaining main substrate 100.
By above-mentioned design construction step, the one-piece construction of described main substrate 100 can be made more succinct efficient, upper and lower surface lifting erection space can be effectively reduced.Simultaneously, between main substrate upper surface 204 and main substrate lower surface 203, adopt several polygons to form peripheral board 205, using the effective transition as described main substrate upper surface 204 and described main substrate lower surface 203, eliminate volume unnecessary outside main substrate 100, make upper and lower surface rationally effectively overlap joint and transition.Gengon and polygonal geometric configuration are not only applicable to the manufacturing process of plate cutting and welding, and meet main substrate 100 cast-in-block processing characteristics, make main substrate 100 present high mode, low-quality performance advantage.
Perform step S3: main substrate external structure Modifying model.
Modifying model refers to effectively to be revised according to the external structure of more design constraint to the main substrate 100 of algorithm gained, and it a kind ofly carries out local, the correction of application and perfect process to model.Described Modifying model comprises: (1) simplifies the base plate of main substrate lower surface 203 and reduces peripheral board 205 quantity, described base plate can need to carry out partial structurtes simplification according to application, in the present embodiment, peripheral board 205 adopts and the polygon facet Slab of preliminary planning is carried out the number simplification of polygon limit, some polygon vertexs that combined distance is nearer, thus make the polygon limit number of each polygon panel remain on minimum; (2) consider that main substrate and basic framework spatially exist interference, two-layer carrying out up and down is divided into by the polyhedral structure of peripheral board to plan (consulting Fig. 3, Fig. 4), in the present embodiment, the polygon panel of peripheral board 205 for boundary, forms convex polyhedron peripheral board structure between its upper and lower two-layer polygon panel with basic framework place height; (3) according to the restraint condition of active damper 201 by litho machine layout, in the present embodiment, active damper 201 is arranged on two different elevation plane according to basic framework, and carry out local ribs reinforcement to active damper 201 installation place, and consider to install and reserved maintenance maintenance space.
Perform step S4: main substrate inner structure builds.
Refer to Fig. 5, floor for main substrate designs, adopt crisscross floor to carry out inside to strengthen, comprise along X to the inside floor 207 staggered with Y-direction, be that space is arranged in parallel with predeterminable range between described inner floor 207, in exposure position, measure the important area peripheries such as position and is also provided with the oblique side rib plate be connected between X, the inner floor 207 of Y-direction.
The technological method for processing of main substrate of the present invention refers to Fig. 8, Figure 8 shows that main substrate 100 processing and manufacturing process flow diagram.Adopt welding technology between each sheet material of main substrate 100, its technique is the order of " getting on, get off, outer after first ".The technological process of described main substrate 100 welding manufacture comprises: according to design elements drawing, carry out sheet material blanking, part preprocessing, is specially: carry out preprocessing to sheet material profile, reaches the design shape of sheet material, completes the preliminary work of part; Part pre-assembled, inspection one-piece construction; Sheet material welds, and welding technology comprises: the base plate of welding main substrate lower surface 203 and the base plate (not shown) of projection objective and off-axis alignment; Weld inside floor 207 crisscross in main substrate 100 successively, complete building of inner skeleton; Welding peripheral board 205 polygon sheet material, the welding sequence of peripheral board 205 still adopts the order of " getting on, get off "; The top board of welding main substrate upper surface 204, completes the welding of main substrate 100 entirety and closes; Test mode, Performance Detection.
When welding peripheral board 205 special frock can be set and angled support carries out supplemental support and location, guarantee the dimensional accuracy between sheet material and welding quality.First with spot welding location in the step of welding technology, carry out discontinuous welding or the full weld of whole piece fillet subsequently.Mortise structure can be provided with in advance, to realize interrupted welding between fillet with inner floor 207 and peripheral board 205 of the top board of main substrate upper surface 204.
By carrying out simulating, verifying, compute mode and weight to the main substrate 100 in the present embodiment in Hyperworks and Nastran finite element software, main substrate 100 of the present invention presents high mode, low-quality dual property advantage.Improve 10% with existing main substrate design mode of comparing, weight reduces by 30%, achieves obvious effect.The PSD value of litho machine Inner-world vibration control main substrate vibration acceleration, and the response limiting of its key position at maximum amplitude within the scope of 1nm.
In sum, the present invention is based on the overall polyhedral structure design of main substrate, effectively can not only improve the dynamic property of complete machine Inner-world, and effectively alleviate the quality of Inner-world, reduce purchase cost and manufacturing cycle simultaneously.
It is pointed out that the present embodiment is only and describe specific structural features of the present invention and function mode in detail, substantive restriction is not formed to technical scheme of the present invention.Thought of the present invention should be spreaded to according to the technical scheme that the present invention records and is applied in other common enforcement scenes by those skilled in the art, includes but not limited to following situation.
The main substrate station Configuration Type enumerated in the present embodiment is not to main substrate Structure composing restriction of the present invention, those skilled in the art freely can select the single station main substrate only having single exposure position completely according to actual needs, have and singly expose position, single double main substrate measuring position, or there is the multistation main substrate of two or more station.
The configuration quantity of the basic framework bracing or strutting arrangement enumerated in the present embodiment and type are not construed as limiting main substrate technical scheme of the present invention, this bracing or strutting arrangement can be active damper, damping block or other conventional bracing or strutting arrangements, quantity can be three, four or other can realize the layout quantity of stable support, bracing or strutting arrangement can be positioned in sustained height plane, also can be positioned in two planes even more than two differing heights.
The kind of the measuring system enumerated in the present embodiment, mounting means and configuration quantity are not construed as limiting main substrate technical scheme of the present invention, described measuring system can be one or more in work stage laser interferometer, null pick-up, off-axis alignment, leveling and focusing, secondary prealignment or other conventional measurement mechanisms according to practical application needs, and the location layout of each measurement mechanism and quantity also can be selected according to practical measurement requirement.
The employing algorithm of convex hull enumerated in the present embodiment solves acquisition polygon panel and is not construed as limiting the building mode of peripheral board of the present invention, those skilled in the art are on the basis understanding the technology of the present invention thought, the polygon panel connecting method between main substrate upper and lower surface polygon vertex can be built completely as required, and the peripheral board making polygon panel form is convex polyhedron structure, basic object of the present invention can be realized.Under the prerequisite that summit and mounting condition are determined, the General Principle of computational geometry or existing algorithm model can be used, or adopt existing software for mathematical computing product (such as: the Mathematica computing platform etc. that Wolfram company provides), even can the structure of hand-designed polygon panel and array mode according to the actual requirements.
Those skilled in the art all should be appreciated that, without departing from the spirit or scope of the present invention, can carry out various modifications and variations to the present invention.Thus, if when any amendment or modification fall in the protection domain of appended claims and equivalent, will be understood that these amendment and modification are contained in the present invention.
Claims (21)
1. a polyhedron main substrate, for fittable slackening device, measurement mechanism and body tube device, described main substrate offers at least one station, it is characterized in that, the outside surface of described main substrate limited by the polygon enveloping surface of the installation region of described bracing or strutting arrangement, measurement mechanism, body tube device, and the convex polyhedron connected and composed by convex closure rule by other planes some, described main substrate outside surface comprises:
Main substrate upper surface, offers at least one station, and is provided with the installation region of corresponding described bracing or strutting arrangement, and described main substrate upper surface is polygonized structure, and the edge of described polygonized structure is limited by the installation region of described bracing or strutting arrangement;
Main substrate lower surface, corresponding main substrate upper surface offers corresponding station, and being respectively arranged with the installation region of corresponding some measuring systems, described main substrate lower surface is polygonized structure, and the edge of described polygonized structure is limited by the installation region of described each measuring system; And,
Peripheral board, comprise some polygon panels, described peripheral board carries out transition with the polygon vertex of described main substrate lower surface with some polygon panels to the polygon vertex of described main substrate upper surface and is connected, and makes described main substrate upper surface, main substrate lower surface and peripheral board be connected to form convex polyhedron.
2. polyhedron main substrate as claimed in claim 1, is characterized in that, be also provided with some floors between described main substrate upper surface and main substrate lower surface.
3. polyhedron main substrate as claimed in claim 1, it is characterized in that, described each floor is crisscross being evenly arranged between described main substrate upper surface and main substrate lower surface.
4. polyhedron main substrate as claimed in claim 1, it is characterized in that, the polygonized structure of described main substrate upper surface is the polygon limited with the envelope of each vibration damper installation region.
5. polyhedron main substrate as claimed in claim 1, is characterized in that, the station that described main substrate upper surface and main substrate lower surface correspondence are offered comprises at least one exposure position and at least one measures position.
6. polyhedron main substrate as claimed in claim 1, it is characterized in that, described bracing or strutting arrangement is vibration damper.
7. the polyhedron main substrate as described in claim 1 or 6, is characterized in that, the quantity of described bracing or strutting arrangement is three or four.
8. polyhedron main substrate as claimed in claim 7, it is characterized in that, described bracing or strutting arrangement is arranged in the plane of at least two differing heights, and described main substrate upper surface is formed by connecting by the plane that at least two are connected respectively described differing heights.
9. polyhedron main substrate as claimed in claim 1, it is characterized in that, the polygonized structure of described main substrate lower surface is the polygon limited with the envelope of each measuring system installation region.
10. the polyhedron main substrate as described in claim 1 or 9, is characterized in that, described measuring system comprises work stage laser interferometer, null pick-up, off-axis alignment device, leveling and focusing device and secondary prealignment device.
11. polyhedron main substrates as claimed in claim 1, is characterized in that, the space envelope that each polygon panel in described peripheral board is connected to form is by convex closure term restriction.
The manufacture method of 12. 1 kinds of polyhedron main substrates as claimed in claim 1, described main substrate is arranged on a basic framework by some bracing or strutting arrangements, and it comprises the following steps:
There is provided main substrate upper surface: the installation region determining the corresponding described each bracing or strutting arrangement of described main substrate upper surface, using described each bracing or strutting arrangement installation region as the polygonized structure of marginal point determination main substrate upper surface, and offer at least one station at described main substrate upper surface;
There is provided main substrate lower surface: the installation region determining corresponding some measuring systems respectively on described main substrate lower surface, determine the polygonized structure of described main substrate lower surface using described each measuring system installation region as marginal point, and offer the station of corresponding main substrate upper surface at described main substrate lower surface; And,
There is provided peripheral board: with some polygon panels, transition is carried out with the polygon vertex of described main substrate lower surface to the polygon vertex of described main substrate upper surface and is connected, and make described main substrate upper surface, main substrate lower surface and peripheral board be connected to form convex polyhedron.
The manufacture method of 13. polyhedron main substrates as claimed in claim 12, is characterized in that, be also included in the step arranging floor between described main substrate upper surface and main substrate lower surface.
The manufacture method of 14. polyhedron main substrates as claimed in claim 12, is characterized in that, the polygonized structure of described main substrate upper surface is the polygon limited with the envelope of each vibration damper installation region.
The manufacture method of 15. polyhedron main substrates as claimed in claim 12, is characterized in that, the station that described main substrate upper surface and main substrate lower surface correspondence are offered comprises at least one exposure position and at least one measures position.
The manufacture method of 16. polyhedron main substrates as claimed in claim 12, is characterized in that, the polygonized structure of described main substrate lower surface is the polygon limited with the envelope of each measuring system installation region.
The manufacture method of 17. polyhedron main substrates as described in claim 12 or 16, it is characterized in that, described measuring system comprises work stage laser interferometer, null pick-up, off-axis alignment device, leveling and focusing device and secondary prealignment device.
The manufacture method of 18. polyhedron main substrates as claimed in claim 12, it is characterized in that, the polygon panel of described peripheral board adopts the polygon vertex of algorithm of convex hull to described main substrate upper surface and main substrate lower surface to solve in three dimensions, under the condition meeting installing space, obtain the structure of each polygon panel.
The manufacture method of 19. polyhedron main substrates as described in claim 12 or 18, it is characterized in that, there is provided in the step of peripheral board described, also comprise the step of peripheral board being carried out to Modifying model, described Modifying model comprises, and the polygon panel of described peripheral board is divided into two-layer up and down structure; The polygon limit number of polygon panel each in described peripheral board is remained on minimum.
The job operation of 20. 1 kinds of polyhedron main substrates as claimed in claim 1, comprises the following steps:
Sheet material blanking, part preprocessing, arrange according to main substrate the polygon sheet material that station, bracing or strutting arrangement installation region and measuring system installation region process each plane of corresponding main substrate outside surface respectively, described main substrate outside surface comprises main substrate upper surface, main substrate lower surface and peripheral board;
Sheet material welds, and comprises the base plate of welding main substrate lower surface and the base plate of corresponding measurement mechanism and body tube device; Weld floor crisscross between main substrate upper surface and main substrate lower surface successively, complete building of inner skeleton; And,
Each polygon face plate of welding peripheral board.
The job operation of 21. polyhedron main substrates as claimed in claim 20, is characterized in that, adopt welding technology between each sheet material of described main substrate, and its process sequence adopts and gets on, get off, mode outer after first.
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| CN111381450B (en) * | 2018-12-29 | 2025-06-17 | 上海微电子装备（集团）股份有限公司 | Photolithography machine frame and photolithography machine |
| CN110161807A (en) * | 2019-05-06 | 2019-08-23 | 深圳市华芯技研科技有限公司 | A kind of polyhedron main substrate and its processing method |
| CN112402070A (en) * | 2019-08-23 | 2021-02-26 | 北京智塑健康科技有限公司 | Pore structure part of interbody fusion cage |
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| US7061579B2 (en) * | 2003-11-13 | 2006-06-13 | Asml Netherlands B.V. | Lithographic apparatus and device manufacturing method |
| JP4318561B2 (en) * | 2004-02-09 | 2009-08-26 | Ｈｏｙａ株式会社 | Photomask blank manufacturing method and photomask manufacturing method |
| CN201017175Y (en) * | 2007-02-16 | 2008-02-06 | 上海微电子装备有限公司 | Large damping precision flexible supporting mechanism |
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| JP5251367B2 (en) * | 2008-09-01 | 2013-07-31 | 株式会社ニコン | Exposure apparatus, exposure method, and device manufacturing method |
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