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CN102969303A - Semiconductor package structure and manufacturing method thereof - Google Patents

Semiconductor package structure and manufacturing method thereof Download PDF

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Publication number
CN102969303A
CN102969303A CN2012104180502A CN201210418050A CN102969303A CN 102969303 A CN102969303 A CN 102969303A CN 2012104180502 A CN2012104180502 A CN 2012104180502A CN 201210418050 A CN201210418050 A CN 201210418050A CN 102969303 A CN102969303 A CN 102969303A
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semiconductor element
substrate
semiconductor
semiconductor package
conductive layer
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沈家贤
刘盈男
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Advanced Semiconductor Engineering Inc
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Advanced Semiconductor Engineering Inc
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    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L23/00Details of semiconductor or other solid state devices
    • H01L23/552Protection against radiation, e.g. light or electromagnetic waves
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/10Bump connectors; Manufacturing methods related thereto
    • H01L2224/15Structure, shape, material or disposition of the bump connectors after the connecting process
    • H01L2224/16Structure, shape, material or disposition of the bump connectors after the connecting process of an individual bump connector
    • H01L2224/161Disposition
    • H01L2224/16151Disposition the bump connector connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive
    • H01L2224/16221Disposition the bump connector connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked
    • H01L2224/16225Disposition the bump connector connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked the item being non-metallic, e.g. insulating substrate with or without metallisation
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/42Wire connectors; Manufacturing methods related thereto
    • H01L2224/47Structure, shape, material or disposition of the wire connectors after the connecting process
    • H01L2224/48Structure, shape, material or disposition of the wire connectors after the connecting process of an individual wire connector
    • H01L2224/481Disposition
    • H01L2224/48151Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive
    • H01L2224/48221Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked
    • H01L2224/48225Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked the item being non-metallic, e.g. insulating substrate with or without metallisation
    • H01L2224/48227Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked the item being non-metallic, e.g. insulating substrate with or without metallisation connecting the wire to a bond pad of the item
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/42Wire connectors; Manufacturing methods related thereto
    • H01L2224/47Structure, shape, material or disposition of the wire connectors after the connecting process
    • H01L2224/49Structure, shape, material or disposition of the wire connectors after the connecting process of a plurality of wire connectors
    • H01L2224/491Disposition
    • H01L2224/4911Disposition the connectors being bonded to at least one common bonding area, e.g. daisy chain
    • H01L2224/49112Disposition the connectors being bonded to at least one common bonding area, e.g. daisy chain the connectors connecting a common bonding area on the semiconductor or solid-state body to different bonding areas outside the body, e.g. diverging wires
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/73Means for bonding being of different types provided for in two or more of groups H01L2224/10, H01L2224/18, H01L2224/26, H01L2224/34, H01L2224/42, H01L2224/50, H01L2224/63, H01L2224/71
    • H01L2224/732Location after the connecting process
    • H01L2224/73251Location after the connecting process on different surfaces
    • H01L2224/73253Bump and layer connectors
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/73Means for bonding being of different types provided for in two or more of groups H01L2224/10, H01L2224/18, H01L2224/26, H01L2224/34, H01L2224/42, H01L2224/50, H01L2224/63, H01L2224/71
    • H01L2224/732Location after the connecting process
    • H01L2224/73251Location after the connecting process on different surfaces
    • H01L2224/73257Bump and wire connectors
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L25/00Assemblies consisting of a plurality of semiconductor or other solid state devices
    • H01L25/03Assemblies consisting of a plurality of semiconductor or other solid state devices all the devices being of a type provided for in a single subclass of subclasses H10B, H10D, H10F, H10H, H10K or H10N, e.g. assemblies of rectifier diodes
    • H01L25/04Assemblies consisting of a plurality of semiconductor or other solid state devices all the devices being of a type provided for in a single subclass of subclasses H10B, H10D, H10F, H10H, H10K or H10N, e.g. assemblies of rectifier diodes the devices not having separate containers
    • H01L25/065Assemblies consisting of a plurality of semiconductor or other solid state devices all the devices being of a type provided for in a single subclass of subclasses H10B, H10D, H10F, H10H, H10K or H10N, e.g. assemblies of rectifier diodes the devices not having separate containers the devices being of a type provided for in group H10D89/00
    • H01L25/0655Assemblies consisting of a plurality of semiconductor or other solid state devices all the devices being of a type provided for in a single subclass of subclasses H10B, H10D, H10F, H10H, H10K or H10N, e.g. assemblies of rectifier diodes the devices not having separate containers the devices being of a type provided for in group H10D89/00 the devices being arranged next to each other
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/19Details of hybrid assemblies other than the semiconductor or other solid state devices to be connected
    • H01L2924/191Disposition
    • H01L2924/19101Disposition of discrete passive components
    • H01L2924/19107Disposition of discrete passive components off-chip wires
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/30Technical effects
    • H01L2924/301Electrical effects
    • H01L2924/3025Electromagnetic shielding

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Abstract

The invention provides a semiconductor packaging structure and a manufacturing method thereof, wherein in the manufacturing method, a substrate is provided, and a plurality of grounding pads are arranged on the substrate; then, arranging a first semiconductor element and a second semiconductor element on the substrate, wherein the grounding pad is positioned between the first semiconductor element and the second semiconductor element; then, a plurality of conductive bonding wires are connected to the grounding pad. The semiconductor packaging structure can effectively shield electromagnetic interference by using the conductive bonding wire.

Description

半导体封装结构及其制造方法Semiconductor package structure and manufacturing method thereof

技术领域 technical field

本发明涉及一种半导体封装结构及其制造方法,特别是涉及一种具有电磁信号屏蔽结构的半导体封装结构及其制造方法。The invention relates to a semiconductor packaging structure and a manufacturing method thereof, in particular to a semiconductor packaging structure with an electromagnetic signal shielding structure and a manufacturing method thereof.

背景技术 Background technique

在半导体生产过程中,集成电路封装(IC package)是制程的重要步骤之一,用以保护IC芯片与提供外部电性连接,以防止在输送及取置过程中外力或环境因素的破坏。此外,集成电路元件亦需与电阻、电容等被动元件组合成为一个系统,才能发挥既定的功能,而电子封装(Electronic Packaging)即是用于建立集成电路元件的保护与组织架构。一般而言,在集成电路芯片制程之后始进行电子封装,包括IC芯片的黏结固定、电路联机、结构密封、与电路板之接合、系统组合、直至产品完成之间的所有制程。In the semiconductor production process, integrated circuit packaging (IC package) is one of the important steps in the manufacturing process. It is used to protect the IC chip and provide external electrical connections to prevent damage from external forces or environmental factors during transportation and placement. In addition, integrated circuit components also need to be combined with passive components such as resistors and capacitors to form a system in order to perform the intended function, and electronic packaging (Electronic Packaging) is used to establish the protection and organizational structure of integrated circuit components. Generally speaking, electronic packaging begins after the integrated circuit chip manufacturing process, including IC chip bonding and fixing, circuit connection, structural sealing, bonding with circuit boards, system assembly, and all processes until product completion.

目前,在半导体封装结构中,芯片之间会有不必要的噪声(noise)或干扰,如电磁干扰(electro-magnetic interference,EMI),特别在无线通讯的芯片上此问题更为明显。此时,一般是使用金属盖(metal lid)来屏蔽电磁信号干扰。然而,此金属盖的设置会增加半导体封装结构的重量及厚度,且会增加金属盖的制作成本。At present, in the semiconductor packaging structure, there will be unnecessary noise or interference between chips, such as electromagnetic interference (EMI), especially on chips for wireless communication, this problem is more obvious. At this time, a metal lid is generally used to shield electromagnetic signal interference. However, the disposition of the metal cover will increase the weight and thickness of the semiconductor package structure, and will increase the manufacturing cost of the metal cover.

故,有必要提供一种半导体封装结构及其制造方法,以解决现有技术所存在的问题。Therefore, it is necessary to provide a semiconductor packaging structure and a manufacturing method thereof to solve the problems existing in the prior art.

发明内容 Contents of the invention

本发明的一目的在于提供一种半导体封装结构,所述半导体封装结构包括基板、第一半导体元件、第二半导体元件及多条导电焊线。基板的一表面上设有多个接地垫,第一及第二半导体元件设置于基板上,其中第一半导体元件包含一靠近基板的第一表面、远离基板的第二表面及导电层,导电层是形成于所述第一半导体元件的第二表面上。多个接地垫设置于第一与第二半导体元件之间,多条导电焊线连接于第一半导体元件的导电层与接地垫之间。An object of the present invention is to provide a semiconductor package structure, which includes a substrate, a first semiconductor element, a second semiconductor element, and a plurality of conductive bonding wires. One surface of the substrate is provided with a plurality of ground pads, and the first and second semiconductor elements are arranged on the substrate, wherein the first semiconductor element includes a first surface close to the substrate, a second surface away from the substrate and a conductive layer, the conductive layer is formed on the second surface of the first semiconductor element. A plurality of ground pads are arranged between the first and second semiconductor elements, and a plurality of conductive bonding wires are connected between the conductive layer of the first semiconductor element and the ground pads.

本发明的另一目的在于提供一种半导体封装结构,所述半导体封装结构包括基板、第一半导体元件、第二半导体元件及多条导电焊线。基板的一表面设有多个接地垫,第一及第二半导体元件设置于基板上,多个接地垫设置于第一半导体元件的两侧,且至少部分接地垫是位于第一与第二半导体元件之间,多条导电焊线连接于第一半导体元件两侧的接地垫之间。Another object of the present invention is to provide a semiconductor package structure, which includes a substrate, a first semiconductor element, a second semiconductor element, and a plurality of conductive bonding wires. One surface of the substrate is provided with a plurality of ground pads, the first and second semiconductor elements are arranged on the substrate, the plurality of ground pads are arranged on both sides of the first semiconductor element, and at least part of the ground pads are located on the first and second semiconductor elements. Between the elements, a plurality of conductive bonding wires are connected between the ground pads on both sides of the first semiconductor element.

本发明的又一目的在于提供一种半导体封装结构的制造方法。在此半导体封装结构的制造方法中,首先,提供一基板,其中多个接地垫排列于基板上,接着,设置第一半导体元件及第二半导体元件于基板上,其中接地垫是位于第一半导体元件与第二半导体元件之间,第一半导体元件包含一靠近基板的第一表面,远离基板的第二表面及一导电层,导电层是形成于第一半导体元件的第二表面上,接着,将多条导电焊线连接于接地垫与第一半导体元件的导电层之间。Another object of the present invention is to provide a method for manufacturing a semiconductor package structure. In the manufacturing method of this semiconductor package structure, first, a substrate is provided, wherein a plurality of ground pads are arranged on the substrate, and then, a first semiconductor element and a second semiconductor element are arranged on the substrate, wherein the ground pads are located on the first semiconductor Between the element and the second semiconductor element, the first semiconductor element includes a first surface close to the substrate, a second surface away from the substrate and a conductive layer, the conductive layer is formed on the second surface of the first semiconductor element, and then, A plurality of conductive bonding wires are connected between the ground pad and the conductive layer of the first semiconductor element.

本发明的半导体封装结构可通过将半导体元件之间接地的导电焊线来屏蔽不必要的干扰,例如电磁干扰(EMI/EMC),因而可有效地隔离相邻半导体元件的电磁信号。由于本发明的半导体封装结构可减少或省略现有金属盖来屏蔽电磁波干扰,因而减少整体重量及制程成本。The semiconductor package structure of the present invention can shield unnecessary interference, such as electromagnetic interference (EMI/EMC), by grounding conductive bonding wires between semiconductor elements, thereby effectively isolating electromagnetic signals of adjacent semiconductor elements. Because the semiconductor packaging structure of the present invention can reduce or omit the existing metal cover to shield electromagnetic wave interference, the overall weight and process cost are reduced.

为让本发明的上述内容能更明显易懂,下文特举优选实施例,并配合所附图式,作详细说明如下:In order to make the above content of the present invention more obvious and understandable, the preferred embodiments are specifically cited below, and in conjunction with the accompanying drawings, the detailed description is as follows:

附图说明 Description of drawings

图1显示依照本发明的第一实施例的半导体封装结构的剖面图;1 shows a cross-sectional view of a semiconductor package structure according to a first embodiment of the present invention;

图2显示依照本发明的第一实施例的半导体封装结构的上视图;2 shows a top view of a semiconductor package structure according to a first embodiment of the present invention;

图3显示依照本发明的一实施例的半导体封装结构的导电焊线的线距与耦合效应之间的关系图;FIG. 3 shows the relationship between the pitch of the conductive bonding wires and the coupling effect of the semiconductor package structure according to an embodiment of the present invention;

图4A至图4C显示依照本发明的一实施例的封装基板的制造流程图;4A to 4C show a manufacturing flow chart of a packaging substrate according to an embodiment of the present invention;

图5显示依照本发明的第二实施例的半导体封装结构的上视图;5 shows a top view of a semiconductor package structure according to a second embodiment of the present invention;

图6A、图6B及图6C显示依照本发明的第三至第五实施例的半导体封装结构的上视图;FIG. 6A, FIG. 6B and FIG. 6C show top views of semiconductor package structures according to third to fifth embodiments of the present invention;

图7显示依照本发明的第六实施例的半导体封装结构的上视图;7 shows a top view of a semiconductor package structure according to a sixth embodiment of the present invention;

图8,其显示依照本发明的第七实施例的半导体封装结构的上视图;FIG. 8, which shows a top view of a semiconductor package structure according to a seventh embodiment of the present invention;

图9显示依照本发明的第八实施例的半导体封装结构的剖面图;以及9 shows a cross-sectional view of a semiconductor package structure according to an eighth embodiment of the present invention; and

图10显示依照本发明的第八实施例的半导体封装结构的立体图。FIG. 10 shows a perspective view of a semiconductor package structure according to an eighth embodiment of the present invention.

具体实施方式 Detailed ways

以下各实施例的说明是参考附加的图式,用以例示本发明可用以实施的特定实施例。本发明所提到的方向用语,例如「上」、「下」、「前」、「后」、「左」、「右」、「内」、「外」、「侧面」等,仅是参考附加图式的方向。因此,使用的方向用语是用以说明及理解本发明,而非用以限制本发明。The following descriptions of the various embodiments refer to the accompanying drawings to illustrate specific embodiments in which the present invention can be practiced. The directional terms mentioned in the present invention, such as "up", "down", "front", "back", "left", "right", "inside", "outside", "side", etc., are for reference only The orientation of the attached schema. Therefore, the directional terms used are used to illustrate and understand the present invention, but not to limit the present invention.

在图中,结构相似的单元是以相同标号表示。In the figures, structurally similar units are denoted by the same reference numerals.

请参照图1及图2,图1显示依照本发明的第一实施例的半导体封装结构的剖面图,图2显示依照本发明的第一实施例的半导体封装结构的上视图。本实施例的半导体封装结构100包括基板110、第一半导体元件120、第二半导体元件130、多个接地垫140、多条导电焊线150及封装胶体160。第一半导体元件120、第二半导体元件130及接地垫140是设置于基板110上,接地垫140是至少位于第一半导体元件120及第二半导体元件130之间。导电焊线150是连接于接地垫140与第一半导体元件120之间,用于形成屏蔽效果。封装胶体160是形成于基板110上,并包覆第一半导体元件120、第二半导体元件130及多条导电焊线150。Please refer to FIG. 1 and FIG. 2 , FIG. 1 shows a cross-sectional view of a semiconductor package structure according to a first embodiment of the present invention, and FIG. 2 shows a top view of a semiconductor package structure according to a first embodiment of the present invention. The semiconductor package structure 100 of this embodiment includes a substrate 110 , a first semiconductor element 120 , a second semiconductor element 130 , a plurality of ground pads 140 , a plurality of conductive bonding wires 150 and an encapsulant 160 . The first semiconductor element 120 , the second semiconductor element 130 and the ground pad 140 are disposed on the substrate 110 , and the ground pad 140 is at least located between the first semiconductor element 120 and the second semiconductor element 130 . The conductive bonding wire 150 is connected between the ground pad 140 and the first semiconductor element 120 for forming a shielding effect. The encapsulant 160 is formed on the substrate 110 and covers the first semiconductor device 120 , the second semiconductor device 130 and the plurality of conductive bonding wires 150 .

如图1及图2所示,基板110包括至少一线路层111及至少一导电孔112。当基板110包括多层线路层111,此些线路层111以导电孔112电性连接。基板110上的接地垫140电性连接于基板110之线路层111。基板110可例如为多层印刷电路基板。As shown in FIGS. 1 and 2 , the substrate 110 includes at least one circuit layer 111 and at least one conductive hole 112 . When the substrate 110 includes multiple circuit layers 111 , these circuit layers 111 are electrically connected by conductive holes 112 . The ground pad 140 on the substrate 110 is electrically connected to the circuit layer 111 of the substrate 110 . The substrate 110 may be, for example, a multilayer printed circuit substrate.

第一半导体元件120包含凸块121、导电层122、一靠近基板的第一表面123及远离基板的第二表面124。第一半导体元件120及第二半导体元件130分别可以选自半导体芯片(chip)或半导体封装体(package),例如第一半导体元件120可通过例如球状引脚栅格阵列(Ball Grid Array,B GA)封装技术、芯片级封装(ChipScale Package)技术、倒装芯片(Flip chip)技术或其它封装方式来设置于基板110上。此时,第一半导体元件120的主动表面(第一表面123)是朝向基板110的表面。第一半导体元件120及第二半导体组件130可分别例如通过凸块121、131来设置于基板110上,通过凸块121、131与基板110内的线路电性连接。The first semiconductor device 120 includes a bump 121 , a conductive layer 122 , a first surface 123 close to the substrate, and a second surface 124 away from the substrate. The first semiconductor element 120 and the second semiconductor element 130 can be respectively selected from a semiconductor chip (chip) or a semiconductor package (package). ) packaging technology, chip scale packaging (ChipScale Package) technology, flip chip (Flip chip) technology or other packaging methods to be disposed on the substrate 110 . At this time, the active surface (first surface 123 ) of the first semiconductor element 120 is a surface facing the substrate 110 . The first semiconductor element 120 and the second semiconductor component 130 can be disposed on the substrate 110 through bumps 121 , 131 , respectively, and electrically connected to circuits in the substrate 110 through the bumps 121 , 131 .

第一半导体元件120具有导电层122,其形成于第一半导体元件120的背面(第二表面124),导电层122可为金属(例如铜、镍、金、银)薄膜。在本实施例中,第一半导体元件120为欲屏蔽的半导体元件(芯片或封装体),而第二半导体元件130则可为任意的半导体元件(芯片或封装体)或电子元件(如被动元件)。The first semiconductor device 120 has a conductive layer 122 formed on the back side (second surface 124 ) of the first semiconductor device 120 , and the conductive layer 122 can be a metal (eg, copper, nickel, gold, silver) thin film. In this embodiment, the first semiconductor element 120 is a semiconductor element (chip or package) to be shielded, and the second semiconductor element 130 can be any semiconductor element (chip or package) or electronic element (such as a passive element). ).

如图1及图2所示,在本实施例中,接地垫140可排列于第一半导体元件120的周围,并与基板的内部的接地线路电性连结,而导电焊线150是焊接于第一半导体元件120的导电层122与接地垫140之间。其中,导电焊线150的材料可为铜、金或其它金属材料,每一条导电焊线150的线宽可为15微米(μm)~30.5微米,导电焊线150之间的间距(pitch)可小于300微米(μm),例如为60μm~280μm,当导电焊线之间的间距大于300微米时,对电磁波干扰的屏蔽效果不佳。As shown in Figures 1 and 2, in this embodiment, the ground pads 140 can be arranged around the first semiconductor element 120 and electrically connected to the ground circuit inside the substrate, while the conductive bonding wire 150 is soldered to the first semiconductor element 120. Between the conductive layer 122 of a semiconductor device 120 and the ground pad 140 . Wherein, the material of the conductive bonding wires 150 may be copper, gold or other metal materials, the line width of each conductive bonding wire 150 may be 15 microns (μm) to 30.5 microns, and the pitch between the conductive bonding wires 150 may be Less than 300 microns (μm), for example, 60 μm˜280 μm, when the distance between the conductive bonding wires is greater than 300 μm, the shielding effect on electromagnetic wave interference is poor.

如图1及图2所示,本实施例的封装胶体160可用于包覆及保护第一半导体元件120、及导电焊线150及第二半导体元件130。所述封装胶体160的绝缘基材可为环氧树脂(epoxy)、聚甲基丙烯酸甲酯(PMMA)、聚碳酸酯(Polycarbonate)或硅胶,其用以保护封装构造内部的元件免于受到外界温度、湿度或大气的影响。As shown in FIGS. 1 and 2 , the encapsulant 160 of this embodiment can be used to cover and protect the first semiconductor device 120 , the conductive bonding wire 150 and the second semiconductor device 130 . The insulating base material of the encapsulant 160 can be epoxy resin (epoxy), polymethyl methacrylate (PMMA), polycarbonate (Polycarbonate) or silicone, which is used to protect the components inside the encapsulation structure from the outside world. Effects of temperature, humidity or atmosphere.

导电层122及导电焊线150除做为电磁信号屏蔽功效之外,同时还可具有提升半导体组件的散热之功效。The conductive layer 122 and the conductive bonding wire 150 not only have the function of electromagnetic signal shielding, but also have the function of improving the heat dissipation of the semiconductor device.

请参照图3,其显示依照本发明的一实施例的半导体封装结构的导电焊线的线距与耦合效应之间的关系图。线L1表示为未具有导电焊线150的封装结构的耦合效应(coupling effect),线L2表示具有导电焊线150的半导体封装结构100的线距与耦合效应之间的关系。相较于未具有导电焊线150的封装结构(如线L1所示),具有导电焊线150的半导体封装结构100可具有较低的耦合效应(如线L2所示),亦即导电焊线150可有效屏蔽电子元件之间的电磁耦合效应,而具有电磁信号屏蔽功效。Please refer to FIG. 3 , which shows a relationship diagram between the pitch of the conductive bonding wires and the coupling effect of the semiconductor package structure according to an embodiment of the present invention. The line L1 represents the coupling effect of the package structure without the conductive bonding wire 150 , and the line L2 represents the relationship between the line pitch and the coupling effect of the semiconductor package structure 100 with the conductive bonding wire 150 . Compared with the package structure without the conductive bonding wire 150 (as shown by the line L1), the semiconductor package structure 100 with the conductive bonding wire 150 may have a lower coupling effect (as shown by the line L2), that is, the conductive bonding wire 150 can effectively shield the electromagnetic coupling effect between electronic components, and has the effect of shielding electromagnetic signals.

请参照图4A至图4C,其显示依照本发明的一实施例的封装基板的制造流程图。当制造本实施例的半导体封装结构100时,首先,如图4A所示,提供基板110,此时,接地垫140可预先排列于基板110上并与基板的内部接地线路电性连结。接着,如图4B所示,设置第一半导体元件120及第二半导体元件130于基板110上,此时,接地垫140至少是位于第一半导体元件120及第二半导体元件130之间。接着,如图4C所示,进行打线步骤,而将导电焊线150连接于接地垫140与第一半导体元件120的导电层122之间。接着,形成封装胶体160来包覆第一半导体元件120、第二半导体元件130及导电焊线150。Please refer to FIG. 4A to FIG. 4C , which show a manufacturing flow chart of a packaging substrate according to an embodiment of the present invention. When manufacturing the semiconductor package structure 100 of this embodiment, first, as shown in FIG. 4A , the substrate 110 is provided. At this time, the ground pads 140 can be pre-arranged on the substrate 110 and electrically connected to the internal ground circuit of the substrate. Next, as shown in FIG. 4B , the first semiconductor device 120 and the second semiconductor device 130 are disposed on the substrate 110 . At this time, the ground pad 140 is at least located between the first semiconductor device 120 and the second semiconductor device 130 . Next, as shown in FIG. 4C , a wire bonding step is performed to connect the conductive bonding wire 150 between the ground pad 140 and the conductive layer 122 of the first semiconductor device 120 . Next, an encapsulant 160 is formed to cover the first semiconductor device 120 , the second semiconductor device 130 and the conductive bonding wire 150 .

请参照图5,其显示依照本发明的第二实施例的半导体封装结构的上视图。在第二实施例中,导电焊线150可交错地连接于接地垫140与导电层122之间。Please refer to FIG. 5 , which shows a top view of a semiconductor package structure according to a second embodiment of the present invention. In the second embodiment, the conductive bonding wires 150 can be alternately connected between the ground pads 140 and the conductive layer 122 .

请参照图6A、图6B及图6C,其显示依照本发明的第三至第五实施例的半导体封装结构的上视图。接地垫140是至少排列于第一半导体元件120与第二半导体元件130之间。在在第三至第五实施例中,接地垫140可仅设置于第一半导体元件120的一侧、二侧或三侧。Please refer to FIG. 6A , FIG. 6B and FIG. 6C , which show top views of semiconductor package structures according to third to fifth embodiments of the present invention. The ground pad 140 is at least arranged between the first semiconductor element 120 and the second semiconductor element 130 . In the third to fifth embodiments, the ground pad 140 may be disposed on only one side, two sides or three sides of the first semiconductor element 120 .

请参照图7,其显示依照本发明的第六实施例的半导体封装结构的上视图。在第六实施例中,每一接地垫140可为长条形,其围绕于第一半导体元件120的周围,可多条导电焊线同时打在同一个接地垫上。Please refer to FIG. 7 , which shows a top view of a semiconductor package structure according to a sixth embodiment of the present invention. In the sixth embodiment, each ground pad 140 can be in the shape of a strip, which surrounds the first semiconductor element 120 , and multiple conductive bonding wires can be bonded on the same ground pad at the same time.

请参照图8,其显示依照本发明的第七实施例的半导体封装结构的上视图。在另一实施例中,第一半导体元件120可通过例如表面黏着层125来设置于基板110上,而无需通过焊球121。此时,第一半导体元件120可通过例如触点栅格阵列(Land GridArray,LGA)封装技术、方形扁平无引脚封装(Quad Flat No-leadPackage)技术或其它封装方式来设置于基板110上。Please refer to FIG. 8 , which shows a top view of a semiconductor package structure according to a seventh embodiment of the present invention. In another embodiment, the first semiconductor element 120 may be disposed on the substrate 110 through, for example, the surface adhesive layer 125 instead of the solder ball 121 . At this time, the first semiconductor element 120 may be disposed on the substrate 110 by, for example, Land Grid Array (LGA) packaging technology, Quad Flat No-lead Package (Quad Flat No-lead Package) technology or other packaging methods.

请参照图9及图10,图9显示依照本发明的第八实施例的半导体封装结构的剖面图,图10显示依照本发明的第八实施例的半导体封装结构的立体图。在第八实施例中,第一半导体元件220可未具有导电层122,接地垫240是设置于第一半导体元件220的两侧,且至少部分接地垫240是位于第一半导体元件220与第二半导体元件130之间。多条导电焊线250是连接于第一半导体元件220两侧的接地垫240之间,且横跨过第一半导体元件220,以屏蔽第一半导体元件220。Please refer to FIG. 9 and FIG. 10 , FIG. 9 shows a cross-sectional view of a semiconductor package structure according to an eighth embodiment of the present invention, and FIG. 10 shows a perspective view of a semiconductor package structure according to an eighth embodiment of the present invention. In the eighth embodiment, the first semiconductor element 220 may not have the conductive layer 122, the ground pads 240 are disposed on both sides of the first semiconductor element 220, and at least part of the ground pads 240 are located between the first semiconductor element 220 and the second Between semiconductor elements 130 . A plurality of conductive bonding wires 250 are connected between the ground pads 240 on both sides of the first semiconductor element 220 and cross over the first semiconductor element 220 to shield the first semiconductor element 220 .

综上所述,虽然本发明已以优选实施例揭露如上,但上述优选实施例并非用以限制本发明,本领域的普通技术人员,在不脱离本发明的精神和范围内,均可作各种更动与润饰,因此本发明的保护范围以权利要求界定的范围为准。In summary, although the present invention has been disclosed above with preferred embodiments, the above preferred embodiments are not intended to limit the present invention, and those of ordinary skill in the art can make various modifications without departing from the spirit and scope of the present invention. Therefore, the protection scope of the present invention shall be determined by the scope defined in the claims.

Claims (10)

1. semiconductor package, it is characterized in that: described semiconductor package comprises:
One substrate, a surface of described substrate is provided with a plurality of ground mats;
One first semiconductor element, be arranged on the described substrate, wherein said the first semiconductor element comprises one near the first surface of substrate, away from second surface and a conductive layer of substrate, and described conductive layer is to be formed on the described second surface of described the first semiconductor element;
One second semiconductor element is arranged on the described substrate, and wherein said a plurality of ground mats are arranged between described first and second semiconductor element; And
Many conduction bonding wires are connected between the described conductive layer and described ground mat of described the first semiconductor element.
2. semiconductor package according to claim 1, it is characterized in that: described the first semiconductor element is selected from semiconductor chip or semiconductor package body.
3. semiconductor package according to claim 1, it is characterized in that: the spacing between the described conduction bonding wire is less than 300 microns.
4. semiconductor package according to claim 1, it is characterized in that: the live width of each described conduction bonding wire is 15 microns~30.5 microns.
5. semiconductor package according to claim 1, it is characterized in that: described conductive layer is metallic film.
6. semiconductor package according to claim 1 is characterized in that: described ground mat be arranged in described the first semiconductor element around.
7. semiconductor package according to claim 1, it is characterized in that: each described ground mat is elongated, and around described the first semiconductor element, wherein a plurality of conduction bonding wires are beaten simultaneously on same ground mat.
8. semiconductor package according to claim 1, it is characterized in that: described conduction bonding wire is to be connected in alternately between described ground mat and the described conductive layer.
9. semiconductor package, it is characterized in that: described semiconductor package comprises:
One substrate, a surface of described substrate is provided with a plurality of ground mats;
One first semiconductor element is arranged on the described substrate;
One second semiconductor element is arranged on the described substrate, and wherein said a plurality of ground mats are arranged at the both sides of described the first semiconductor element, and at least part of described ground mat is between described first and second semiconductor element; And
Many conduction bonding wires are connected between the described ground mat of described the first semiconductor element both sides.
10. the manufacture method of a semiconductor package, it is characterized in that: described manufacture method comprises:
One substrate is provided, and wherein a plurality of ground mats are arranged on the described substrate;
The first semiconductor element and the second semiconductor element are set on described substrate, wherein said ground mat is between described first and second semiconductor element, described the first semiconductor element comprises a first surface near substrate, away from second surface and a conductive layer of substrate, described conductive layer is to be formed on the described second surface of described the first semiconductor element; And
Many conduction bonding wires are connected between the described conductive layer of described ground mat and described the first semiconductor element.
CN2012104180502A 2012-10-26 2012-10-26 Semiconductor package structure and manufacturing method thereof Pending CN102969303A (en)

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Application publication date: 20130313