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CN102194835A - Wafer-level lens module, manufacturing method thereof, and wafer-level camera - Google Patents

Wafer-level lens module, manufacturing method thereof, and wafer-level camera Download PDF

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CN102194835A
CN102194835A CN2010101248612A CN201010124861A CN102194835A CN 102194835 A CN102194835 A CN 102194835A CN 2010101248612 A CN2010101248612 A CN 2010101248612A CN 201010124861 A CN201010124861 A CN 201010124861A CN 102194835 A CN102194835 A CN 102194835A
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wafer
layer
level
lens module
spacer layer
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薛全钦
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Himax Technologies Ltd
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Himax Technologies Ltd
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Abstract

A wafer-level lens module comprises a first optical layer, a spacing layer and a second optical layer. The spacing layer is arranged on the first optical layer and is provided with a hole penetrating through the spacing layer for transmitting light, wherein the surface of the hole substantially avoids light reflection, and the second optical layer is arranged on the spacing layer.

Description

晶圆级镜头模块及其制造方法、晶圆级摄影机Wafer-level lens module, manufacturing method thereof, and wafer-level camera

技术领域technical field

本发明涉及一种晶圆级(wafer level)镜头模块及其相关制造方法,尤其涉及一种用以消除/减少不必要的杂散(stray)光的晶圆级镜头模块以及相关制造方法。The present invention relates to a wafer-level lens module and a related manufacturing method thereof, in particular to a wafer-level lens module for eliminating/reducing unnecessary stray light and a related manufacturing method.

背景技术Background technique

随着光学科技的进步,影像撷取装置在各种不同产品的应用上也广受欢迎,举例来说,除了数字相机之外,一些移动装置:如手机、个人数字助理(personal digital assistant,PDA)以及笔记型计算机(notebook,NB)亦具有影像撷取功能的装置安装于其内。With the advancement of optical technology, image capture devices are also popular in the application of various products. For example, in addition to digital cameras, some mobile devices: such as mobile phones, personal digital assistants (personal digital assistant, PDA) ) and a notebook computer (notebook, NB) also have a device with image capture function installed in it.

镜头模块是影像撷取装置中最重要的元件之一,然而,设置于镜头模块之下的影像传感器(image sensor)会受到杂散光的影响,因而导致噪声的产生或影像对比的恶化。因此,如何有效地避免影像传感器接收到不必要的杂散光而增强影像撷取装置的整体效能,便成为相关产业中一个待解决的重要议题。The lens module is one of the most important components in the image capture device. However, the image sensor disposed under the lens module will be affected by stray light, thus causing noise or deterioration of image contrast. Therefore, how to effectively prevent the image sensor from receiving unnecessary stray light and enhance the overall performance of the image capture device has become an important issue to be solved in the related industries.

发明内容Contents of the invention

因此,本发明的目的之一在于提供一种晶圆级镜头模块、晶圆级摄影机以及相关的制造方法,以解决上述问题。Therefore, one of the objectives of the present invention is to provide a wafer-level lens module, a wafer-level camera and related manufacturing methods to solve the above problems.

依据本发明的一实施例,其提供一种晶圆级镜头模块。该晶圆级镜头模块包括第一光学层、间隔层以及第二光学层。该间隔层设置于该第一光学层之上,并具有穿透其中的孔洞,用以透光,其中该孔洞的表面大致上避免了光反射,以及该第二光学层设置于该间隔层上。According to an embodiment of the present invention, a wafer-level lens module is provided. The wafer-level lens module includes a first optical layer, a spacer layer and a second optical layer. The spacer layer is disposed on the first optical layer and has a hole penetrating therethrough for light transmission, wherein the surface of the hole substantially avoids light reflection, and the second optical layer is disposed on the spacer layer .

依据本发明的另一实施例,其提供一种晶圆级摄影机。该晶圆级摄影机包括影像传感器、间隔层以及晶圆级镜头模块。该间隔层设置于该影像传感器之上,并具有穿透其中的孔洞,用以透光,其中该孔洞的表面大致上避免了光反射,以及该晶圆级镜头模块设置于该间隔层之上。According to another embodiment of the present invention, a wafer-level camera is provided. The wafer-level camera includes an image sensor, a spacer layer and a wafer-level lens module. The spacer layer is disposed on the image sensor and has a hole penetrating therethrough for light transmission, wherein the surface of the hole substantially avoids light reflection, and the wafer-level lens module is disposed on the spacer layer .

依据本发明的另一实施例,其提供一种制造晶圆级镜头模块的方法。该方法包括下列步骤:提供第一光学层、间隔层以及第二光学层,其中一孔洞穿透该间隔层以透光;将该间隔层设置于该第一光学层上,以及将该第二光学层设置于该间隔层上;以及将特定薄膜层设置于该孔洞的表面上。According to another embodiment of the present invention, a method for manufacturing a wafer-level lens module is provided. The method includes the steps of: providing a first optical layer, a spacer layer and a second optical layer, wherein a hole penetrates the spacer layer to transmit light; disposing the spacer layer on the first optical layer, and the second optical layer The optical layer is arranged on the spacer layer; and the specific film layer is arranged on the surface of the hole.

依据本发明的另一实施例,其提供一种制造晶圆级镜头模块的方法。该方法包括下列步骤:提供第一光学层、间隔层以及第二光学层;将该间隔层设置于该第一光学层上,以及将该第二光学层设置于该间隔层上;以及使穿透该间隔层的孔洞具有粗糙表面。According to another embodiment of the present invention, a method for manufacturing a wafer-level lens module is provided. The method includes the steps of: providing a first optical layer, a spacer layer, and a second optical layer; disposing the spacer layer on the first optical layer, and disposing the second optical layer on the spacer layer; Holes penetrating the spacer layer have rough surfaces.

附图说明Description of drawings

图1为本发明第一实施例的晶圆级摄影机的结构剖面图;FIG. 1 is a structural sectional view of a wafer-level camera according to a first embodiment of the present invention;

图2为图1中晶圆级摄影机内的间隔层的局部放大图;FIG. 2 is a partial enlarged view of the spacer layer in the wafer-level camera in FIG. 1;

图3为本发明第二实施例的晶圆级摄影机的结构剖面图;3 is a cross-sectional view of a wafer-level camera according to a second embodiment of the present invention;

图4为图3中晶圆级摄影机内的间隔层的局部放大图;FIG. 4 is a partial enlarged view of the spacer layer in the wafer-level camera in FIG. 3;

图5为本发明制造晶圆级镜头模块的方法的一个实施例的流程图;以及FIG. 5 is a flowchart of an embodiment of a method for manufacturing a wafer-level lens module according to the present invention; and

图6为本发明制造晶圆级镜头模块的方法的另一实施例的流程图。FIG. 6 is a flow chart of another embodiment of the method for manufacturing a wafer-level lens module of the present invention.

【主要元件符号说明】[Description of main component symbols]

100、300                        晶圆级摄影机100, 300 Wafer-level cameras

110、310                        影像传感器110, 310 Image sensor

120、132、134、320、332、334    间隔层120, 132, 134, 320, 332, 334 Spacers

130、330                        晶圆级镜头模块130, 330 Wafer-level lens module

131、133、331、333              透镜载板131, 133, 331, 333 Lens carrier plate

135、335                        光圈135, 335 Aperture

140                             特定薄膜层140 Specific film layer

具体实施方式Detailed ways

在说明书及权利要求书中使用了某些词汇来指称特定的元件。所属领域的技术人员应可理解,硬件制造商可能会用不同的名词来称呼同样的元件。本说明书及权利要求书并不以名称的差异来作为区分元件的方式,而是以元件在功能上的差异来作为区分的准则。在通篇说明书及权利要求书的权利要求中所提及的「包括」为一开放式的用语,应解释成「包括但不限于」。另外,「耦接」一词在此包括任何直接及间接的电气连接手段。因此,如果文中描述第一装置耦接于第二装置,则表示该第一装置可直接电气连接于该第二装置,或通过其它装置或连接手段间接地电气连接至该第二装置。Certain terms are used in the description and claims to refer to particular elements. Those skilled in the art should understand that hardware manufacturers may use different terms to refer to the same element. The specification and claims do not use the difference in name as a way to distinguish components, but use the difference in function of components as a criterion for distinguishing. The term "comprising" mentioned throughout the description and the claims in the claims is an open term and should be interpreted as "including but not limited to". In addition, the term "coupled" herein includes any direct and indirect means of electrical connection. Therefore, if it is described herein that a first device is coupled to a second device, it means that the first device may be directly electrically connected to the second device, or indirectly electrically connected to the second device through other devices or connection means.

图1为本发明第一实施例的晶圆级摄影机100的结构剖面图。晶圆级摄影机100包括(但不限于)影像传感器110、第一间隔层120、晶圆级镜头模块130以及多个特定薄膜层140。如图1所示,晶圆级镜头模块130包括设置于第一间隔层120上的第一透镜载板(lens plate)131、设置于第二间隔层132上的第二透镜载板133以及设置于第三间隔层134上的光圈(diaphragm)135。请注意,在此实施例中,这些特定薄膜层140分别设置于间隔层120、132以及134中孔洞的表面(如图2所示),但本发明并不限于此。换句话说,特定薄膜层可依实际设计需求而设置于晶圆级摄影机100内的任何间隔层上。FIG. 1 is a cross-sectional view of a wafer-level camera 100 according to a first embodiment of the present invention. The wafer-level camera 100 includes (but not limited to) an image sensor 110 , a first spacer layer 120 , a wafer-level lens module 130 and a plurality of specific film layers 140 . As shown in FIG. 1 , the wafer-level lens module 130 includes a first lens carrier plate (lens plate) 131 arranged on the first spacer layer 120, a second lens plate 133 arranged on the second spacer layer 132 and a lens plate arranged on the second spacer layer 132. A diaphragm 135 on the third spacer layer 134 . Please note that in this embodiment, the specific film layers 140 are respectively disposed on the surfaces of the holes in the spacer layers 120 , 132 and 134 (as shown in FIG. 2 ), but the invention is not limited thereto. In other words, the specific film layer can be disposed on any spacer layer in the wafer-level camera 100 according to actual design requirements.

举例来说,晶圆级摄影机100可以是微型摄影模块(compact cameramodule,CCM)且设置于影像撷取装置内,但本发明并不限于此,除此之外,特定薄膜层140的数量及厚度亦无特定限制。也就是说,在不违背本发明的精神下,特定薄膜层140的数量及厚度可依照实际需求进行调整及修正,这类设计上的变化均属本发明的范围。For example, the wafer-level camera 100 can be a miniature camera module (compact camera module, CCM) and is set in the image capture device, but the present invention is not limited thereto. In addition, the number and thickness of the specific film layer 140 There are also no specific restrictions. That is to say, without departing from the spirit of the present invention, the quantity and thickness of the specific film layer 140 can be adjusted and modified according to actual needs, and such design changes are within the scope of the present invention.

在一实施例中,这些特定薄膜层140均为光屏蔽(light-shielding)层,所以当杂散光照射于间隔层120、132以及134中孔洞的表面时,大部分亦或所有的杂散光会被这些光屏蔽层吸收,因此,设置于晶圆级镜头模块130之下的影像传感器110不会受到不必要的杂散光的影响,进而提升影像质量。然而,本发明并不限于此,也就是说,其它能大幅避免或大量减少光反射的薄膜层亦属本发明的范围。此外,图1中晶圆级摄影机100的结构仅是作为范例说明,本发明并不限于此。In one embodiment, these specific thin film layers 140 are light-shielding (light-shielding) layers, so when the stray light is irradiated on the surfaces of the holes in the spacer layers 120, 132 and 134, most or all of the stray light will be Absorbed by these light-shielding layers, the image sensor 110 disposed under the wafer-level lens module 130 will not be affected by unnecessary stray light, thereby improving image quality. However, the present invention is not limited thereto, that is, other film layers that can largely avoid or greatly reduce light reflection also fall within the scope of the present invention. In addition, the structure of the wafer-level camera 100 in FIG. 1 is only used as an example, and the present invention is not limited thereto.

图3为本发明第二实施例的晶圆级摄影机300的结构剖面图,其类似于图1中所示的晶圆级摄影机100。晶圆级摄影机300包括(但不限于)影像传感器310、第一间隔层320以及晶圆级镜头模块330。如图3所示,晶圆级镜头模块330包括设置于第一间隔层320上的第一透镜载板331、设置于第二间隔层332上的第二透镜载板333以及设置于第三间隔层334上的光圈335。请注意,在此实施例中,间隔层320、332以及334中孔洞的表面(如图4所示)均为粗糙表面,但本发明并不限于此,换句话说,位于间隔层中孔洞的任何表面可个别地依设计需求而为粗糙表面。当杂散光照射于间隔层320、332以及334中孔洞的粗糙表面时,入射的杂散光会往随机的方向散射,如此一来,影像传感器310便不容易受到杂散光的严重影响。FIG. 3 is a cross-sectional view of a wafer-level camera 300 according to a second embodiment of the present invention, which is similar to the wafer-level camera 100 shown in FIG. 1 . The wafer-level camera 300 includes (but not limited to) an image sensor 310 , a first spacer layer 320 and a wafer-level lens module 330 . As shown in FIG. 3 , the wafer-level lens module 330 includes a first lens carrier 331 disposed on the first spacer layer 320 , a second lens carrier 333 disposed on the second spacer layer 332 , and a second lens carrier 333 disposed on the third spacer layer 320 . Aperture 335 on layer 334 . Please note that in this embodiment, the surfaces of the holes in the spacer layers 320, 332, and 334 (as shown in FIG. 4 ) are all rough surfaces, but the present invention is not limited thereto. In other words, the holes in the spacer layers Any surface can be roughened individually according to design requirements. When the stray light is irradiated on the rough surfaces of the holes in the spacer layers 320 , 332 and 334 , the incident stray light will be scattered in random directions, so that the image sensor 310 is not easily affected by the stray light.

请注意,上述的实施例仅用来说明本发明的技术特征,并非用来限制本发明的范围。本领域技术人员应可了解,图1以及图3中的晶圆级摄影机的结构亦可在不违背本发明的精神下作适当的变化及修正。Please note that the above-mentioned embodiments are only used to illustrate the technical features of the present invention, and are not intended to limit the scope of the present invention. Those skilled in the art should understand that the structures of the wafer-level cameras in FIG. 1 and FIG. 3 can also be appropriately changed and modified without departing from the spirit of the present invention.

参考图5,图5为本发明制造晶圆级镜头模块的方法的一实施例的流程图。请注意,假如可大致上获得相同的结果,步骤不一定要遵照图5中所示的次序来依次执行。该方法包括下列步骤:Referring to FIG. 5 , FIG. 5 is a flowchart of an embodiment of a method for manufacturing a wafer-level lens module according to the present invention. Please note that the steps do not have to be performed sequentially in the order shown in FIG. 5 if substantially the same result can be obtained. The method includes the following steps:

步骤502:提供第一光学层、间隔层以及第二光学层,其中一孔洞穿透该间隔层以透光。Step 502: Provide a first optical layer, a spacer layer, and a second optical layer, wherein a hole penetrates the spacer layer to transmit light.

步骤504:将该间隔层设置于该第一光学层上,以及将该第二光学层设置于该间隔层上。Step 504: disposing the spacer layer on the first optical layer, and disposing the second optical layer on the spacer layer.

步骤506:将特定薄膜层设置于该孔洞的表面上。Step 506: Disposing a specific film layer on the surface of the hole.

在步骤502中,该第一光学层可为透镜载板,以及该第二光学层可为光圈或透镜载板。在步骤506中,该特定薄膜层为光屏蔽层。结合图5的步骤、图1以及图2中的元件可清楚了解制造晶圆级镜头模块(例如晶圆级镜头模块130)的步骤,详细的步骤说明在此不另赘述。In step 502, the first optical layer may be a lens carrier, and the second optical layer may be an aperture or a lens carrier. In step 506, the specific film layer is a light shielding layer. The steps of manufacturing the wafer-level lens module (such as the wafer-level lens module 130 ) can be clearly understood by referring to the steps of FIG. 5 and the components in FIG. 1 and FIG. 2 , and the detailed description of the steps will not be repeated here.

参考图6,图6为本发明制造晶圆级镜头模块的方法的另一实施例的流程图。该方法包括(但不限于)下列步骤:Referring to FIG. 6 , FIG. 6 is a flow chart of another embodiment of the method for manufacturing a wafer-level lens module according to the present invention. The method includes (but is not limited to) the following steps:

步骤602:提供第一光学层、间隔层以及第二光学层。Step 602: providing a first optical layer, a spacer layer and a second optical layer.

步骤604:将该间隔层设置于该第一光学层上,以及将该第二光学层设置于该间隔层上。Step 604: disposing the spacer layer on the first optical layer, and disposing the second optical layer on the spacer layer.

步骤606:使得穿透该间隔层的孔洞具有粗糙表面。Step 606 : Make the holes penetrating through the spacer layer have a rough surface.

在步骤602中,该第一光学层可为透镜载板,以及该第二光学层可为光圈或透镜载板。结合图6的步骤、图3以及图4中的元件可清楚了解制造晶圆级镜头模块(例如晶圆级镜头模块330)的步骤,故详细的步骤说明在此不另赘述。In step 602, the first optical layer may be a lens carrier, and the second optical layer may be an aperture or a lens carrier. The steps of manufacturing the wafer-level lens module (such as the wafer-level lens module 330 ) can be clearly understood by combining the steps of FIG. 6 and the elements in FIG. 3 and FIG. 4 , so the detailed description of the steps will not be repeated here.

上述流程图中的步骤仅作为本发明可实施的实施例,本发明并不限于此。本领域技术人员应可了解,在不违背本发明的精神下,上述制造方法亦可插入其它步骤或将数个步骤合并成单一步骤,均属本发明的范畴。举例来说,在一种设计变化下,图5以及图6中的步骤可选择性地合并。The steps in the above flow chart are only used as a practical example of the present invention, and the present invention is not limited thereto. Those skilled in the art should understand that without departing from the spirit of the present invention, other steps may be inserted into the above-mentioned manufacturing method or several steps may be combined into a single step, all of which belong to the scope of the present invention. For example, under one design change, the steps in FIG. 5 and FIG. 6 can be combined selectively.

综上所述,本发明的这些实施例提供了晶圆级镜头模块、晶圆级摄影机以及制造晶圆级镜头模块的相关方法。在一实施例中,本发明将特定薄膜层设置于晶圆级摄影机内间隔层中的孔洞的表面,因此,当杂散光照射间隔层中孔洞的表面时,杂散光会被该特定薄膜层吸收,因此,晶圆级摄影机内的影像传感器便不会受到不必要的杂散光的影响。在另一实施例中,晶圆级摄影机内间隔层中的孔洞具有粗糙的表面,因此,当杂散光照射间隔层中孔洞的粗糙表面时,入射的杂散光会随机地往不同方向散射,由此可防止晶圆级摄影机内的影像传感器受到杂散光的严重影响。简言之,任何采用本发明的技术特征的影像撷取装置可大幅地改善其整体效能。In summary, these embodiments of the present invention provide a wafer-level lens module, a wafer-level camera, and related methods for manufacturing the wafer-level lens module. In one embodiment, the present invention arranges a specific film layer on the surface of the hole in the spacer layer in the wafer-level camera. Therefore, when stray light irradiates the surface of the hole in the spacer layer, the stray light will be absorbed by the specific film layer. , therefore, the image sensor in the wafer-level camera will not be affected by unwanted stray light. In another embodiment, the hole in the spacer layer in the wafer-level camera has a rough surface, so when the stray light illuminates the rough surface of the hole in the spacer layer, the incident stray light will randomly scatter in different directions, by This prevents the image sensor inside the wafer-level camera from being severely affected by stray light. In short, any image capturing device adopting the technical features of the present invention can greatly improve its overall performance.

以上所述仅为本发明的优选实施例,凡依本申请权利要求的范围所做的等同变型与修改,均应属本发明的范围。The above descriptions are only preferred embodiments of the present invention, and all equivalent variations and modifications made according to the scope of the claims of the present application shall fall within the scope of the present invention.

Claims (19)

1.一种晶圆级镜头模块,包括:1. A wafer-level lens module, comprising: 第一光学层;first optical layer; 间隔层,设置于所述第一光学层上,所述间隔层具有穿透其中的孔洞,用以透光,其中所述孔洞的表面大致上避免了光反射;以及a spacer layer disposed on the first optical layer, the spacer layer has a hole penetrating therethrough for light transmission, wherein the surface of the hole substantially avoids light reflection; and 第二光学层,设置于所述间隔层上。The second optical layer is disposed on the spacer layer. 2.根据权利要求1所述的晶圆级镜头模块,其中特定薄膜层设置于所述间隔层中的所述孔洞的表面上。2. The wafer-level lens module according to claim 1, wherein a specific thin film layer is disposed on a surface of the hole in the spacer layer. 3.根据权利要求2所述的晶圆级镜头模块,其中所述第一光学层包括透镜载板。3. The wafer level lens module of claim 2, wherein the first optical layer comprises a lens carrier. 4.根据权利要求2所述的晶圆级镜头模块,其中所述第二光学层包括光圈或透镜载板。4. The wafer level lens module of claim 2, wherein the second optical layer comprises an aperture or a lens carrier. 5.根据权利要求2所述的晶圆级镜头模块,其中所述特定薄膜层为光屏蔽层。5. The wafer level lens module according to claim 2, wherein the specific thin film layer is a light shielding layer. 6.根据权利要求1所述的晶圆级镜头模块,其中所述间隔层中的所述孔洞的表面为粗糙表面。6. The wafer-level lens module according to claim 1, wherein the surface of the hole in the spacer layer is a rough surface. 7.根据权利要求6所述的晶圆级镜头模块,其中所述第一光学层包括透镜载板。7. The wafer level lens module of claim 6, wherein the first optical layer comprises a lens carrier. 8.根据权利要求6所述的晶圆级镜头模块,其中所述第二光学层包括光圈或透镜载板。8. The wafer level lens module of claim 6, wherein the second optical layer comprises an aperture or a lens carrier. 9.一种晶圆级摄影机,包括:9. A wafer-level camera comprising: 影像传感器;image sensor; 间隔层,设置于所述影像传感器上,所述间隔层具有穿透其中的孔洞,用以透光,其中所述孔洞的表面大致上避免了光反射;以及a spacer layer disposed on the image sensor, the spacer layer has a hole penetrating therethrough for light transmission, wherein the surface of the hole substantially avoids light reflection; and 晶圆级镜头模块,设置于所述间隔层上。The wafer-level lens module is arranged on the spacer layer. 10.根据权利要求9所述的晶圆级摄影机,其中特定薄膜层设置于所述间隔层中的所述孔洞的表面上。10. The wafer-level camera according to claim 9, wherein a specific thin film layer is disposed on a surface of the hole in the spacer layer. 11.根据权利要求10所述的晶圆级摄影机,其中所述特定薄膜层为光屏蔽层。11. The wafer-level camera according to claim 10, wherein the specific thin film layer is a light shielding layer. 12.根据权利要求9所述的晶圆级摄影机,其中所述间隔层中的所述孔洞的表面为粗糙表面。12. The wafer-level camera according to claim 9, wherein the surface of the hole in the spacer layer is a rough surface. 13.一种制造晶圆级镜头模块的方法,包括:13. A method of manufacturing a wafer-level lens module, comprising: 提供第一光学层、间隔层以及第二光学层,其中一孔洞穿透所述间隔层以透光;providing a first optical layer, a spacer layer and a second optical layer, wherein a hole penetrates the spacer layer to transmit light; 将所述间隔层设置于所述第一光学层上,以及将所述第二光学层设置于所述间隔层上;以及disposing the spacer layer on the first optical layer, and disposing the second optical layer on the spacer layer; and 将特定薄膜层设置于所述孔洞的表面上。A specific film layer is disposed on the surface of the hole. 14.根据权利要求13所述的方法,其中所述第一光学层包括透镜载板。14. The method of claim 13, wherein the first optical layer comprises a lens carrier. 15.根据权利要求13所述的方法,其中所述第二光学层包括光圈或透镜载板。15. The method of claim 13, wherein the second optical layer comprises an aperture or a lens carrier. 16.根据权利要求13所述的方法,其中所述特定薄膜层为光屏蔽层。16. The method of claim 13, wherein the specific film layer is a light shielding layer. 17.一种制造晶圆级镜头模块的方法,包括:17. A method of manufacturing a wafer-level lens module, comprising: 提供第一光学层、间隔层以及第二光学层;providing a first optical layer, a spacer layer, and a second optical layer; 将所述间隔层设置于所述第一光学层上,以及将所述第二光学层设置于所述间隔层上;以及disposing the spacer layer on the first optical layer, and disposing the second optical layer on the spacer layer; and 使得穿透所述间隔层的孔洞具有粗糙表面。The holes penetrating through the spacer layer are made to have a rough surface. 18.根据权利要求17所述的方法,其中所述第一光学层包括透镜载板。18. The method of claim 17, wherein the first optical layer comprises a lens carrier. 19.根据权利要求17所述的方法,其中所述第二光学层包括光圈或透镜载板。19. The method of claim 17, wherein the second optical layer comprises an aperture or a lens carrier.
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Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN104122989A (en) * 2013-04-29 2014-10-29 敦南科技股份有限公司 Motion sensing device
CN105445825A (en) * 2014-09-04 2016-03-30 全视技术有限公司 Wafer level method of making aperture lens and related aperture lens system
CN106443844A (en) * 2015-08-05 2017-02-22 豪威科技股份有限公司 Optical spacer including controlled located aperture and method of manufacturing the same
CN106993120A (en) * 2015-12-15 2017-07-28 三星半导体(中国)研究开发有限公司 Wafer Level Camera Module
CN109473451A (en) * 2017-09-07 2019-03-15 采钰科技股份有限公司 Image sensor package
CN110534538A (en) * 2019-09-03 2019-12-03 豪威光电子科技(上海)有限公司 Lens module and forming method thereof

Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20020163741A1 (en) * 2000-08-18 2002-11-07 Yuichi Shibazaki Optical element holding device
US20070166029A1 (en) * 2006-01-18 2007-07-19 Visera Technologies, Co. Ltd. Image sensor module having precise image-projection control
CN101266985A (en) * 2007-03-14 2008-09-17 格科微电子(上海)有限公司 Method for Reducing Incident Light Noise of Image Sensor
JP2009218357A (en) * 2008-03-10 2009-09-24 Panasonic Corp Solid-state image pickup device
US20090256931A1 (en) * 2008-04-11 2009-10-15 Samsung Electronics Co., Ltd. Camera module, method of manufacturing the same, and electronic system having the same

Patent Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20020163741A1 (en) * 2000-08-18 2002-11-07 Yuichi Shibazaki Optical element holding device
US20070166029A1 (en) * 2006-01-18 2007-07-19 Visera Technologies, Co. Ltd. Image sensor module having precise image-projection control
CN101266985A (en) * 2007-03-14 2008-09-17 格科微电子(上海)有限公司 Method for Reducing Incident Light Noise of Image Sensor
JP2009218357A (en) * 2008-03-10 2009-09-24 Panasonic Corp Solid-state image pickup device
US20090256931A1 (en) * 2008-04-11 2009-10-15 Samsung Electronics Co., Ltd. Camera module, method of manufacturing the same, and electronic system having the same

Cited By (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN104122989A (en) * 2013-04-29 2014-10-29 敦南科技股份有限公司 Motion sensing device
US9677930B2 (en) 2013-04-29 2017-06-13 Dyna Image Corporation Method of interrupt control and electronic system using the same
CN104122989B (en) * 2013-04-29 2017-06-30 敦宏科技股份有限公司 motion sensing device
CN105445825A (en) * 2014-09-04 2016-03-30 全视技术有限公司 Wafer level method of making aperture lens and related aperture lens system
CN106443844A (en) * 2015-08-05 2017-02-22 豪威科技股份有限公司 Optical spacer including controlled located aperture and method of manufacturing the same
CN106993120A (en) * 2015-12-15 2017-07-28 三星半导体(中国)研究开发有限公司 Wafer Level Camera Module
US10338353B2 (en) 2015-12-15 2019-07-02 Samsung Electronics Co., Ltd. Wafer level camera module
US10690891B2 (en) 2015-12-15 2020-06-23 Samsung Electronics Co., Ltd. Wafer level camera module
CN109473451A (en) * 2017-09-07 2019-03-15 采钰科技股份有限公司 Image sensor package
CN109473451B (en) * 2017-09-07 2020-11-13 采钰科技股份有限公司 Image sensor package
CN110534538A (en) * 2019-09-03 2019-12-03 豪威光电子科技(上海)有限公司 Lens module and forming method thereof

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Application publication date: 20110921