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CN102116675A - Method for making infrared (IR) focal plane package window by magnetic masks - Google Patents

Method for making infrared (IR) focal plane package window by magnetic masks Download PDF

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Publication number
CN102116675A
CN102116675A CN2009102476488A CN200910247648A CN102116675A CN 102116675 A CN102116675 A CN 102116675A CN 2009102476488 A CN2009102476488 A CN 2009102476488A CN 200910247648 A CN200910247648 A CN 200910247648A CN 102116675 A CN102116675 A CN 102116675A
Authority
CN
China
Prior art keywords
infrared
film
substrate
mask sheet
mask
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
CN2009102476488A
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Chinese (zh)
Inventor
周东平
赵培
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
SHANGHAI OUFEIR PHOTOELECTRIC TECHNOLOGY Co Ltd
Original Assignee
SHANGHAI OUFEIR PHOTOELECTRIC TECHNOLOGY Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by SHANGHAI OUFEIR PHOTOELECTRIC TECHNOLOGY Co Ltd filed Critical SHANGHAI OUFEIR PHOTOELECTRIC TECHNOLOGY Co Ltd
Priority to CN2009102476488A priority Critical patent/CN102116675A/en
Publication of CN102116675A publication Critical patent/CN102116675A/en
Pending legal-status Critical Current

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Abstract

The invention provides a method for making an infrared (IR) focal plane package window by magnetic masks. The method comprises the following steps of: 1. plating an IR film layer: clamping a substrate between a magnet and an IR film mask sheet which is made from a magnetic material, covering a metallized area around the substrate by the mask sheet so as to reserve a middle IR film area, and plating the IR film on the reserved area to form an IR film area; and 2. plating a metal film layer: clamping the substrate plated with the IR film between a magnet and a metal film mask sheet which is made from a magnetic material, covering the IR film so as to reserve the metallized area around the substrate, and plating the metal film on the reserved area to form a metal film area. The method provided by the invention has the advantages that the mask sheets are fixed together with the substrate by means of magnetic force, and graphs are not made by a chemical method, thus effectively reducing the chemical pollution during the preparation process, increasing the adhesive force between each film and the substrate, and reducing the environmental pollution during the production process; and meanwhile, the mask sheets and the magnets can be reused, thus greatly lowering the manufacture cost of the mask graphs.

Description

Method with magnetic force mask fabrication infrared focus plane package window
Technical field
The present invention relates to a kind of method for making of optical device, relate in particular to a kind of method with magnetic force mask fabrication infrared focus plane package window.
Background technology
The development of infrared focus plane Detection Techniques is had higher requirement to device package and infrared Thin Film Filter.A new generation's encapsulation technology integrates infrared Thin Film Filter and infrared window, and infrared Thin Film Filter directly is coated on infrared window central authorities, and metallization is welded into infrared focal plane detector with infrared window and infrared focal plane array at last around the window.
Adopt mask technique to make the figure of infrared film and weld metal in the infrared window manufacturing process.Earlier around make infrared film mask, block metallized area, remove mask after being coated with infrared film, stay central infrared film.Make metal mask then, shelter from infrared film, mask is removed in metallization again after finishing.
At present, generally adopt photoetching method to prepare mask pattern in the mask technique.This method precision height can reach micron dimension.But this method has following shortcoming:
1, cost height: litho machine, domain and photoresist cost an arm and a leg, and increase production cost, reduce product competitiveness.
2, complex process: photoetching process needs gluing, photoetching, exposure, development several steps could obtain required figure, complex technical process.
Charing takes place when surpassing 120 ℃ in 3, photoresist poor performance, influences the performance of infrared window.
4, infrared focus plane package window pattern precision is the submillimeter magnitude, the precision that does not need photoetching method and had.
Summary of the invention
Purpose of the present invention exactly in order to address the above problem, provides a kind of method with magnetic force mask fabrication infrared focus plane package window.
In order to achieve the above object, the present invention has adopted following technical scheme: a kind of method with magnetic force mask fabrication infrared focus plane package window, be that center section at a rectangle or circular substrate is coated with one deck rectangle or circular infrared film as infrared thin film region, around be coated with the layer of metal film as metallized area; Be characterized in that described infrared film is by substrate being clipped between the infrared film mask sheet that a magnet and makes of magnetic material, with the mask sheet will around metallized area hide, infrared thin film region is coated with and forms in the middle of reserving; Described metallic film is to be clipped between the metallic film mask sheet that a magnet and makes of magnetic material by the substrate that oneself has been coated with infrared film, and infrared film is covered, and metallized area is coated with and forms around reserving.
Described infrared film mask sheet is the annular slice structural member, and its integral body has shape and the size adaptive with substrate, and intermediate throughholes has shape and the size adaptive with the infrared thin film region of substrate.
Described metallic film mask sheet is a sheet structure, has with adaptive shape of the infrared thin film region of substrate and size and can cover whole infrared films.
Described infrared film mask sheet is made by siliconized plate.
Described metallic film mask sheet is made by siliconized plate, and its one side that is used for contacting with substrate is coated with one deck polyimide glue.
The present invention makes it compared with prior art owing to adopted above technical scheme, have following advantage and and characteristics:
1, the present invention utilizes magnetic force that mask sheet and substrate are fixed together, and does not relate to chemical method and prepares figure, therefore can effectively reduce the chemical contamination in the preparation process, increases the adhesion of film and substrate, and reduces the pollution of production run to environment.
2, the mask sheet and the magnet that use among the present invention all can reuse, and therefore greatly reduce the cost of manufacture of mask pattern.
Therefore 3, because the present invention utilizes magnetic force that mask sheet and substrate are fixed together, taking magnet away, just remove magnetic force after, mask sheet nature and substrate disengaging so this method is very simple, help large-scale production.
Embodiment
The present invention is with the method for magnetic force mask fabrication infrared focus plane package window, is that center section at a rectangle or circular substrate is coated with one deck rectangle or circular infrared film as infrared thin film region, around be coated with the layer of metal film as metallized area; Infrared film wherein is by substrate being clipped between the infrared film mask sheet that a magnet and makes of magnetic material, with the mask sheet will around metallized area hide, infrared thin film region is coated with and forms in the middle of reserving; Metallic film is to be clipped between the metallic film mask sheet that a magnet and makes of magnetic material by the substrate that oneself has been coated with infrared film, and infrared film is covered, and metallized area is coated with and forms around reserving.
The concrete steps that are coated with infrared film are:
The size of A, the infrared film made according to the size of substrate and needs is made an infrared film mask sheet with siliconized plate, and prepares the suitable magnet of a block size and a limit clamp;
B, the infrared film mask sheet of cleaning, magnet, substrate and limit clamp;
C, magnet, substrate, infrared film mask sheet are packed into limit clamp successively utilize magnetic force that magnet, substrate, infrared film mask sheet are fixed into an integral body;
D, remove limit clamp, magnet, substrate, infrared film mask sheet are put in the coating clamp, the coating machine of packing into is coated with infrared film;
E, be coated with finish after, take out substrate, take away magnet, infrared film mask sheet breaks away from naturally, finishes the making of infrared film.
The concrete steps that are coated with metallic film are:
A, make a metallic film mask sheet that is slightly larger than infrared thin film region with siliconized plate, and prepare the suitable magnet of a block size and a limit clamp according to the size of the infrared thin film region of substrate;
B, clean metal film mask sheet, magnet, substrate and limit clamp;
C, brush one deck polyimide glue on one of metallic film mask sheet surface, thickness is 200~2000nm, and solidifies 1 hour under 150 degree temperature;
D, metallic film mask sheet, substrate, magnet are packed into limit clamp successively.Allow the brush coating face of metallic film mask sheet contact, plated the surface of infrared film with effective protection with substrate.In limit clamp, utilize magnetic force that magnet, substrate, metallic film mask sheet are fixed into an integral body;
E, magnet, substrate, metallic film mask sheet are bonded on the offset plate, the coating machine of packing into is coated with metallic film;
F, be coated with finish after, take out substrate, take away magnet, the mask sheet breaks away from naturally, finishes the making of metallic film.
Embodiment 1
Adopt the said method step, the infrared focus plane package window of preparation a slice 10 * 8 * 1mm, substrate material is a monocrystalline silicon.The endoporus of used infrared film mask sheet is of a size of 8 * 6mm, and outside dimension is 10 * 8mm, and substrate edge 1mm is a metallized area.Metallic film mask chip size is 8.2 * 6.2mm.
Embodiment 2
Adopt the said method step, the infrared focus plane package window of preparation a slice 9.5 * 9.5 * 1mm, substrate material is a monocrystalline silicon.The endoporus of used infrared film mask sheet is of a size of 7.8 * 7.8mm, and outside dimension is 9.5 * 9.5mm, and substrate edge 1mm is a metallized area.Metallic film mask chip size is 8.0 * 8.0mm.

Claims (5)

1. method with magnetic force mask fabrication infrared focus plane package window is that center section at a rectangle or circular substrate is coated with one deck rectangle or circular infrared film as infrared thin film region, around be coated with the layer of metal film as metallized area; It is characterized in that: described infrared film is by substrate being clipped between the infrared film mask sheet that a magnet and makes of magnetic material, with the mask sheet will around metallized area hide, infrared thin film region is coated with and forms in the middle of reserving; Described metallic film is to be clipped between the metallic film mask sheet that a magnet and makes of magnetic material by the substrate that oneself has been coated with infrared film, and infrared film is covered, and metallized area is coated with and forms around reserving.
2. the method with magnetic force mask fabrication infrared focus plane package window as claimed in claim 1, it is characterized in that: described infrared film mask sheet is the annular slice structural member, its integral body has shape and the size adaptive with substrate, and intermediate throughholes has shape and the size adaptive with the infrared thin film region of substrate.
3. the method with magnetic force mask fabrication infrared focus plane package window as claimed in claim 1, it is characterized in that: described metallic film mask sheet is a sheet structure, has with adaptive shape of the infrared thin film region of substrate and size and can cover whole infrared films.
4. the method with magnetic force mask fabrication infrared focus plane package window as claimed in claim 1, it is characterized in that: described infrared film mask sheet is made by siliconized plate.
5. the method with magnetic force mask fabrication infrared focus plane package window as claimed in claim 1, it is characterized in that: described metallic film mask sheet is made by siliconized plate, and its one side that is used for contacting with substrate is coated with one deck polyimide glue.
CN2009102476488A 2009-12-30 2009-12-30 Method for making infrared (IR) focal plane package window by magnetic masks Pending CN102116675A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
CN2009102476488A CN102116675A (en) 2009-12-30 2009-12-30 Method for making infrared (IR) focal plane package window by magnetic masks

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
CN2009102476488A CN102116675A (en) 2009-12-30 2009-12-30 Method for making infrared (IR) focal plane package window by magnetic masks

Publications (1)

Publication Number Publication Date
CN102116675A true CN102116675A (en) 2011-07-06

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Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN108983329A (en) * 2018-07-11 2018-12-11 无锡奥夫特光学技术有限公司 Prepare the process of infrared optical window
CN114231900A (en) * 2021-12-20 2022-03-25 唐山斯腾光电科技有限公司 Method for metalizing mask on optical coated substrate

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7166168B1 (en) * 2002-10-18 2007-01-23 Carl Zeiss Smt Ag Substrate-coating system and an associated substrate-heating method
CN201060877Y (en) * 2007-04-18 2008-05-14 曜富科技股份有限公司 Manufacturing device for metal electrode of light-emitting diode

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7166168B1 (en) * 2002-10-18 2007-01-23 Carl Zeiss Smt Ag Substrate-coating system and an associated substrate-heating method
CN201060877Y (en) * 2007-04-18 2008-05-14 曜富科技股份有限公司 Manufacturing device for metal electrode of light-emitting diode

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN108983329A (en) * 2018-07-11 2018-12-11 无锡奥夫特光学技术有限公司 Prepare the process of infrared optical window
CN114231900A (en) * 2021-12-20 2022-03-25 唐山斯腾光电科技有限公司 Method for metalizing mask on optical coated substrate
CN114231900B (en) * 2021-12-20 2023-11-21 唐山斯腾光电科技有限公司 Method for metallizing mask for optical film-coated substrate

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Application publication date: 20110706