CN102107162A - sprinkler - Google Patents
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- CN102107162A CN102107162A CN 201010568156 CN201010568156A CN102107162A CN 102107162 A CN102107162 A CN 102107162A CN 201010568156 CN201010568156 CN 201010568156 CN 201010568156 A CN201010568156 A CN 201010568156A CN 102107162 A CN102107162 A CN 102107162A
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- 239000000758 substrate Substances 0.000 claims abstract description 54
- 239000007921 spray Substances 0.000 claims abstract description 46
- 238000005507 spraying Methods 0.000 claims abstract description 38
- 239000007788 liquid Substances 0.000 claims abstract description 26
- 230000033001 locomotion Effects 0.000 claims abstract description 6
- 230000005540 biological transmission Effects 0.000 claims description 13
- 238000004140 cleaning Methods 0.000 abstract description 10
- 239000004065 semiconductor Substances 0.000 abstract description 9
- 238000000034 method Methods 0.000 description 6
- 238000005530 etching Methods 0.000 description 3
- 239000011521 glass Substances 0.000 description 3
- 239000003595 mist Substances 0.000 description 3
- 238000004148 unit process Methods 0.000 description 3
- 239000010409 thin film Substances 0.000 description 2
- 230000007547 defect Effects 0.000 description 1
- 238000001035 drying Methods 0.000 description 1
- 239000012535 impurity Substances 0.000 description 1
- 239000004973 liquid crystal related substance Substances 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 230000003287 optical effect Effects 0.000 description 1
- 238000000059 patterning Methods 0.000 description 1
- 230000003252 repetitive effect Effects 0.000 description 1
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- Cleaning Or Drying Semiconductors (AREA)
- Spray Control Apparatus (AREA)
Abstract
Description
技术领域technical field
本发明涉及一种喷淋设备,尤其涉及一种对显示器中的基板进行喷淋处理液清洗的喷淋装置。The invention relates to a spraying device, in particular to a spraying device for cleaning a substrate in a display with a spraying treatment liquid.
背景技术Background technique
生产半导体存储装置或液晶显示器、等离子体显示器和有机发光二极管显示器等平板显示器通常要在半导体基板和玻璃基板等基板上进行各种重复的单元处理。例如,在半导体基板或玻璃基板上进行诸如薄膜处理、给薄膜进行图案化处理以及清洁处理等各种单元处理,从而在基板上形成具有各种电气和光学特征的电路图形,而这些单元处理通常使用处于清洁室内的各种加工设备以一些特殊的处理方法进行。具体的,在半导体基板上进行刻蚀或清洁以及干燥处理等方法是将处理液供给到基板上。例如,在清洁处理中将各种清洁溶液输送到喷淋装置上再从喷淋装置供给到基板上,以将诸如玻璃基板等半导体基板上的杂质去除。但是,现有的喷淋装置均存在着结构复杂,不易控制、运动繁琐的技术缺陷。Production of semiconductor memory devices or flat panel displays such as liquid crystal displays, plasma displays, and organic light-emitting diode displays usually requires various repetitive unit processes on substrates such as semiconductor substrates and glass substrates. For example, various unit processes such as thin film processing, patterning of thin films, and cleaning processes are performed on semiconductor substrates or glass substrates to form circuit patterns with various electrical and optical characteristics on the substrates, and these unit processes are usually It is carried out with some special handling methods using various processing equipment in a clean room. Specifically, the method of performing etching, cleaning and drying on the semiconductor substrate is to supply the processing liquid onto the substrate. For example, in a cleaning process, various cleaning solutions are delivered to a shower device and supplied from the shower device to a substrate to remove impurities on a semiconductor substrate such as a glass substrate. However, the existing spraying devices all have the technical defects of complex structure, difficult control and cumbersome movement.
因此,需要一种能对半导体基板进行清洗,结构简单,操控方便、喷淋均匀的喷淋装置。Therefore, there is a need for a spraying device capable of cleaning the semiconductor substrate, which has a simple structure, is convenient to operate, and sprays evenly.
发明内容Contents of the invention
本发明的目的在于提供一种能对半导体基板进行清洗,结构简单,操控方便、喷淋均匀的喷淋装置。The object of the present invention is to provide a spraying device capable of cleaning semiconductor substrates, simple in structure, convenient in manipulation and uniform in spraying.
为了实现上述目的,本发明提供一种喷淋装置,适用于对显示器中的基板进喷淋处理液,包括机架、直线驱动器、喷淋支架、水平输送装置及若干喷管,所述基板承载于所述水平输送装置上,所述水平输送装置带动所述基板在水平方向传输,所述喷淋支架活动连接于所述机架上并位于所述基板的上方,所述直线驱动器驱动所述喷淋支架在水平方向作直线往复运动,所述喷淋支架的运动方向垂直于所述基板的传输方向,所述喷管呈平行的安装于所述喷淋支架上,所述喷管开设有与处理液连通的处理液进入口,所述喷管朝向所述基板的一侧设有若干呈针孔状的喷嘴。In order to achieve the above object, the present invention provides a spraying device, which is suitable for spraying treatment liquid on the substrate in the display, including a frame, a linear drive, a spraying bracket, a horizontal conveying device, and several nozzles. On the horizontal conveying device, the horizontal conveying device drives the substrate to be transported in the horizontal direction, the spray bracket is movably connected to the frame and located above the substrate, and the linear driver drives the The spraying support moves linearly and reciprocatingly in the horizontal direction, the moving direction of the spraying support is perpendicular to the conveying direction of the substrate, the nozzles are installed in parallel on the spraying support, and the nozzles are provided with The inlet of the treatment liquid communicated with the treatment liquid, the side of the nozzle facing the substrate is provided with a number of pinhole-shaped nozzles.
较佳地,所述喷管均匀分布于所述喷淋支架上。多个所述喷管分布在所述喷淋支架上,能有效提高喷淋效率。Preferably, the spray pipes are evenly distributed on the spray bracket. A plurality of spray pipes are distributed on the spray bracket, which can effectively improve the spray efficiency.
较佳地,所述处理液进入口开设于所述喷管的中部且竖直向上。竖直向上的处理液入口方便地使处理液进入。Preferably, the inlet of the treatment liquid is opened in the middle of the nozzle and vertically upward. The vertically upward processing liquid inlet allows the processing liquid to enter conveniently.
较佳地,所述喷嘴均匀分布于所述喷管上且竖直向下。所述喷嘴能喷出雾状的处理液,竖直向下便能使处理液直接落到所述基板上,使所述基板喷淋得非常均匀。Preferably, the nozzles are evenly distributed on the spray pipe and vertically downward. The nozzle can spray mist-like processing liquid, and the processing liquid can be directly dropped onto the substrate vertically downward, so that the substrate can be sprayed very evenly.
较佳地,所述喷淋支架包括喷管承载框、支撑轴及传动轴,所述喷管固定于所述喷管承载框上,所述传动轴呈水平设置且一端与所述喷管承载框固定连接,所述传动轴的另一端与所述直线驱动器连接,所述支撑轴呈水平设置且一端固定于所述机架上,所述支撑轴的另一端呈滑动的连接于所述机架上。通过所述传动轴及所述支撑轴的直线运动,使所述喷管承载框沿与所述基板输送方向轴向垂直的方向来回运动,进一步使所述基板喷淋得更加均匀。Preferably, the spray bracket includes a nozzle bearing frame, a support shaft and a transmission shaft, the nozzle is fixed on the nozzle bearing frame, the transmission shaft is horizontally arranged and one end is carried by the nozzle The frame is fixedly connected, the other end of the transmission shaft is connected to the linear driver, the support shaft is horizontally arranged and one end is fixed on the frame, and the other end of the support shaft is slidably connected to the machine frame. on the shelf. Through the linear movement of the transmission shaft and the support shaft, the nozzle carrying frame moves back and forth along the direction perpendicular to the conveying direction of the substrate, further making the substrate spray more evenly.
较佳地,所述水平输送装置包括旋转马达及若干滚轮轴,所述滚轮轴上套接有滚轮,所述滚轮轴均匀的安装于所述机架上且位于同一平面,所述旋转马达驱动所述滚轮轴转动,所述基板承载于所述滚轮上。通过驱动所述滚轮轴转动从而驱动所述滚轮滚动,使所述滚轮带动所述基板移动,结构简单,传输可靠,控制容易。Preferably, the horizontal conveying device includes a rotating motor and a plurality of roller shafts, rollers are sleeved on the roller shafts, the roller shafts are uniformly installed on the frame and located on the same plane, and the rotating motor drives The roller shaft rotates, and the substrate is carried on the roller. The roller shaft is driven to rotate to drive the roller to roll, so that the roller drives the substrate to move, the structure is simple, the transmission is reliable, and the control is easy.
与现有技术相比,由于本发明在所述喷淋支架上放置所述喷管,并在所述喷管装置上设置多个呈针孔状的所述喷嘴,所述喷嘴能将所述处理液喷出,使处理液呈雾状落到所述基板上,通过利用直线驱动器驱动所述喷淋支架,使所述喷淋支架沿与所述基板输送方向轴向垂直的方向来回运动,从而使喷淋更加均匀,整个喷淋装置结构简单,操控方便,适合于对半导体基板进行清洗、显影、刻蚀及脱膜等工艺。Compared with the prior art, because the present invention places the spray pipe on the spray bracket, and sets a plurality of pinhole-shaped nozzles on the spray pipe device, the nozzles can The treatment liquid is sprayed out so that the treatment liquid falls on the substrate in the form of mist, and the spray support is driven back and forth in a direction perpendicular to the conveying direction of the substrate by using a linear driver to drive the spray support, Therefore, the spraying is more uniform, and the whole spraying device has a simple structure and is easy to operate, and is suitable for cleaning, developing, etching and stripping the semiconductor substrate.
附图说明Description of drawings
图1是本发明喷淋装置的结构示意图。Fig. 1 is a schematic structural view of the spraying device of the present invention.
具体实施方式Detailed ways
如图1所示,本发明喷淋装置100包括机架(图中未示)、直线驱动器(图中未示)、喷淋支架1、水平输送装置2及若干喷管3,所述水平输送装置2包括旋转马达(图中未示)及若干滚轮轴21,所述滚轮轴21上套接有滚轮22,所述滚轮轴21均匀的安装于所述机架上且位于同一平面,所述旋转马达驱动所述滚轮轴21转动,所述基板200承载于所述滚轮22上,所述水平输送装置2带动所述基板200在水平方向传输。所述喷淋支架1活动连接于所述机架上并位于所述基板200的上方,包括喷管承载框11、支撑轴12及传动轴13,所述喷管3固定于所述喷管承载框11上,所述传动轴13呈水平设置且一端与所述喷管承载框11固定连接,所述传动轴13的另一端与所述直线驱动器连接,所述支撑轴12呈水平设置且一端固定于所述机架上,所述支撑轴12的另一端呈滑动的连接于所述机架上。所述直线驱动器驱动所述喷淋支架1在水平方向作直线往复运动,所述喷淋支架1的运动方向垂直于所述基板200的传输方向,所述喷管3呈平行且均匀分布地安装于所述喷淋支架1上,所述喷管3开设有与处理液连通的处理液进入口31,所述处理液进入口31开设于所述喷管3的中部且竖直向上,所述喷管3朝向所述基板200的一侧设有若干呈针孔状的喷嘴32,所述喷嘴32均匀分布于所述喷管3上且竖直向下。As shown in Figure 1, the
综合上述,下面对所述喷淋装置100的工作原理进行详细描述,如下:Based on the above, the working principle of the
工作时,所述基板200放置于所述水平输送装置2上,然后驱动所述水平输送装置2运动,所述滚轮轴21转动带动所述滚轮22转动,所述滚轮22带动所述基板200,使所述基板200缓慢地在所述喷管3的下方移动,此时,将具有一定压力的处理液从所述处理液进入口31注入所述喷管3内,并通过所述喷嘴32喷出,由于所述喷嘴32为针孔喷嘴,喷出的处理液呈雾状并落到所述基板200上,同时,直线驱动器直线驱动所述传动轴13,所述传动轴13带动所述喷淋支架1,所述喷淋支架1在与所述基板200输送方向轴向垂直的方向来回运动,从而对所述基板200均匀地进行喷淋。When working, the
由于本发明在所述喷淋支架1上放置多个所述喷管3,并在所述喷管3上设置多个呈针孔状的所述喷嘴32,所述喷嘴32能将所述处理液喷出,使处理液呈雾状落到所述基板200上,通过所述传动轴13及所述支撑轴12利用直线驱动器驱动所述喷淋支架1,使所述喷淋支架1沿与所述基板200输送方向轴向垂直的方向来回运动,不但提高喷淋效率而且使喷淋更加均匀,整个喷淋装置100结构简单,操控方便,适合于对半导体基板进行清洗、显影、刻蚀及脱膜等工艺。Since the present invention places a plurality of
本发明喷淋装置100所涉及到的所述机架及所述直线驱动器的工作原理均为本领域普通技术人员所熟知,在此不再做详细的说明。The working principles of the frame and the linear driver involved in the
以上所揭露的仅为本发明的较佳实例而已,当然不能以此来限定本发明之权利范围,因此依本发明申请专利范围所作的等同变化,仍属于本发明所涵盖的范围。The above disclosures are only preferred examples of the present invention, and of course cannot be used to limit the scope of rights of the present invention. Therefore, equivalent changes made according to the patent scope of the present invention still fall within the scope of the present invention.
Claims (6)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN 201010568156 CN102107162A (en) | 2010-12-01 | 2010-12-01 | sprinkler |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN 201010568156 CN102107162A (en) | 2010-12-01 | 2010-12-01 | sprinkler |
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| Publication Number | Publication Date |
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| CN102107162A true CN102107162A (en) | 2011-06-29 |
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Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN103042004A (en) * | 2013-01-15 | 2013-04-17 | 东莞市盛威光电科技有限公司 | A cleaning mechanism for a touch screen etching and demoulding production line |
| CN104051311A (en) * | 2014-07-08 | 2014-09-17 | 深圳市华星光电技术有限公司 | Base plate conveying device and strong acid or strong base etching process suitable for wet process |
| CN109225713A (en) * | 2017-04-28 | 2019-01-18 | 均豪精密工业股份有限公司 | platform type spraying device |
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| CN201930863U (en) * | 2010-12-01 | 2011-08-17 | 东莞宏威数码机械有限公司 | Substrate shower |
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2010
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| US6390106B1 (en) * | 1999-10-29 | 2002-05-21 | Au Optronics Corp. | Multidirectional liquid sprayer used in a wet process |
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| Publication number | Priority date | Publication date | Assignee | Title |
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| CN103042004A (en) * | 2013-01-15 | 2013-04-17 | 东莞市盛威光电科技有限公司 | A cleaning mechanism for a touch screen etching and demoulding production line |
| CN104051311A (en) * | 2014-07-08 | 2014-09-17 | 深圳市华星光电技术有限公司 | Base plate conveying device and strong acid or strong base etching process suitable for wet process |
| WO2016004666A1 (en) * | 2014-07-08 | 2016-01-14 | 深圳市华星光电技术有限公司 | Substrate conveying device and strong acid or base etching process applicable for wet process |
| CN109225713A (en) * | 2017-04-28 | 2019-01-18 | 均豪精密工业股份有限公司 | platform type spraying device |
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