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CN101855303A - Coating composition for antireflection, antireflection film and method for producing same - Google Patents

Coating composition for antireflection, antireflection film and method for producing same Download PDF

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CN101855303A
CN101855303A CN200880116007A CN200880116007A CN101855303A CN 101855303 A CN101855303 A CN 101855303A CN 200880116007 A CN200880116007 A CN 200880116007A CN 200880116007 A CN200880116007 A CN 200880116007A CN 101855303 A CN101855303 A CN 101855303A
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antireflection
coating
coating composition
refractive
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CN101855303B (en
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尹汉植
金惠珉
金芙敬
张影来
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Abstract

本发明提供了一种用于减反射的涂料组合物,其包含折射率为1.2~1.45的低折射材料、折射率为1.46~2的高折射树脂,其中,两种材料间的表面能差异为5mN/m以上;一种使用所述用于减反射的涂料组合物制备的减反射膜;和一种制备所述减反射膜的方法。根据本发明,使用一种组合物通过一步涂覆法能够制备具有优异的耐磨性和减反射特性的减反射膜,从而可以降低制备成本。

Figure 200880116007

This invention provides a coating composition for antireflection, comprising a low-refractive material with a refractive index of 1.2–1.45 and a high-refractive resin with a refractive index of 1.46–2, wherein the surface energy difference between the two materials is greater than 5 mN/m; an antireflection film prepared using the aforementioned coating composition; and a method for preparing the aforementioned antireflection film. According to this invention, an antireflection film with excellent abrasion resistance and antireflection properties can be prepared using a single composition via a one-step coating method, thereby reducing manufacturing costs.

Figure 200880116007

Description

用于减反射的涂料组合物、减反射膜和制备该减反射膜的方法 Coating composition for antireflection, antireflection film and method for producing same

技术领域technical field

本发明涉及一种用于减反射的涂料组合物、采用该用于减反射的涂料组合物制备的减反射膜以及制备该减反射膜的方法。更具体而言,本发明涉及一种用于减反射的涂料组合物,其中尽管使用含有折射率彼此不同的树脂的一种涂料组合物通过一步涂覆法来形成单层涂层,但在该单层涂层也出现了相分离,从而同时提供减反射特性和耐磨性;采用该用于减反射的涂料组合物制备的减反射膜;以及制备该减反射膜的方法。The invention relates to a coating composition for antireflection, an antireflection film prepared by using the coating composition for antireflection and a method for preparing the antireflection film. More specifically, the present invention relates to a coating composition for antireflection in which although a single-layer coating is formed by a one-step coating method using a coating composition containing resins having different refractive indices from each other, in the A single-layer coating also exhibits phase separation to simultaneously provide anti-reflection properties and abrasion resistance; an anti-reflection film prepared using the coating composition for anti-reflection; and a method for preparing the anti-reflection film.

本申请要求在韩国知识产权局于2007年11月13日提交的韩国专利申请No.10-2007-0115348和No.10-2007-0115329、于2007年11月14日提交的韩国专利申请No.10-2007-0115967以及于2008年4月18日提交韩国专利申请No.10-2008-0035891的优先权,将上述申请的公开内容以参考的方式完整并入本申请。This application claims Korean Patent Application No. 10-2007-0115348 and No. 10-2007-0115329 filed on November 13, 2007 at the Korean Intellectual Property Office, Korean Patent Application No. 10-2007-0115967 and the priority of Korean Patent Application No. 10-2008-0035891 filed on Apr. 18, 2008, the disclosure of which is hereby incorporated by reference in its entirety.

背景技术Background technique

在显示器的表面上进行表面处理的一个目的是通过提高显示器的耐磨性和减少来自外部光源发出光的反射而提高图像对比度。减少外部光的反射可以通过两种方法实现。一种方法是通过在表面上使用凸凹形状引起漫反射,而另一种方法是通过使用多层涂覆设计(multi-coating design)引起相消干涉。One purpose of surface treatments on the surface of a display is to improve image contrast by increasing the wear resistance of the display and reducing reflections of light emitted from external light sources. Reducing the reflection of external light can be achieved in two ways. One method is to induce diffuse reflection by using convex and concave shapes on the surface, and the other is to induce destructive interference by using a multi-coating design.

在相关领域已经广泛使用在表面上采用凸凹形状的防眩光涂层(anti-glarecoating)。然而,存在的问题在于由于漫反射使高分辨率显示器中的分辨率劣化以及使图像的清晰度劣化。为了解决上述的问题,日本专利申请公布第11-138712号已经披露了光扩散膜,其中,光在使用具有与粘合剂不同的折射率的有机填料制备的膜中被扩散。然而,因为其具有亮度和对比度劣化的问题,该光扩散膜需要改进。Anti-glare coatings employing concavo-convex shapes on the surface have been widely used in the related art. However, there are problems in deteriorating resolution in high-resolution displays and degrading sharpness of images due to diffuse reflection. In order to solve the above-mentioned problems, Japanese Patent Application Publication No. 11-138712 has disclosed a light diffusion film in which light is diffused in a film prepared using an organic filler having a different refractive index from that of a binder. However, this light-diffusing film requires improvement because it has problems of deterioration of brightness and contrast.

在日本专利申请公布第02-234101号和第06-18704号中已经披露通过多层涂覆设计引起反射光的相消干涉的方法。根据该方法,可以得到减反射特性而不使图像失真。在这种情况下,各层的反射光应该具有相位差,从而使得反射光相消干涉,并且反射光的波形应该具有振幅从而在相消干涉过程中使得反射率可以为最小的反射率。例如,当相对于设置在基板上的单层减反射涂层的入射角为0°时,可以得到如下表达式。Methods of causing destructive interference of reflected light by multilayer coating design have been disclosed in Japanese Patent Application Publication Nos. 02-234101 and 06-18704. According to this method, antireflection characteristics can be obtained without distorting images. In this case, the reflected light of each layer should have a phase difference so that the reflected light interferes destructively, and the waveform of the reflected light should have an amplitude so that the reflectance can be the minimum reflectance during the destructive interference process. For example, when the incident angle with respect to the single-layer anti-reflection coating provided on the substrate is 0°, the following expression can be obtained.

[数学式1][mathematical formula 1]

nons=n1 2 n o n s = n 1 2

2n1d1=(m+1/2)λ(m=0、1、2、3...)2n 1 d 1 =(m+1/2)λ(m=0, 1, 2, 3...)

(no:空气的折射率;ns:基板的折射率;n1:膜的折射率;d1:膜的厚度;λ:入射光的波长)(n o : Refractive index of air; n s : Refractive index of substrate; n 1 : Refractive index of film; d 1 : Thickness of film; λ: Wavelength of incident light)

通常,如果减反射涂层的折射率小于基板的折射率,则减反射是有效的。然而,考虑到涂层的耐磨性,优选地,减反射涂层折射率为基板折射率的1.3至1.5倍。在这种情况下,反射率小于3%。然而,当减反射涂层形成在塑料膜上时,是不可能符合显示器的耐磨性的要求。基于这个原因,需要将几个微米的硬涂层设置在减反射涂层的下面。也就是说,应用相消干涉的减反射涂层包括用于增强耐磨性的硬涂层和形成在该硬涂层上的1至4层减反射涂层。因此,所述多层涂覆法获得了减反射特性而没有使图像失真。然而,仍然存在的问题是由于多层涂覆提高了制备成本。Generally, antireflection is effective if the refractive index of the antireflection coating is less than that of the substrate. However, considering the abrasion resistance of the coating, preferably, the refractive index of the anti-reflection coating is 1.3 to 1.5 times the refractive index of the substrate. In this case, the reflectance is less than 3%. However, when the anti-reflection coating is formed on a plastic film, it is impossible to meet the wear resistance requirements of the display. For this reason, it is necessary to place a few micrometers of hard coating underneath the anti-reflection coating. That is, the antireflection coating applying destructive interference includes a hard coat layer for enhancing abrasion resistance and 1 to 4 layers of antireflection coating layers formed on the hard coat layer. Therefore, the multilayer coating method obtains antireflection characteristics without image distortion. However, there still remains a problem of increased manufacturing cost due to multi-layer coating.

近年来,已经有人提出了通过单层涂覆设计使得反射光相消干涉的方法。在日本专利申请公布第07-168006号中已经披露了如下的方法。根据该方法,将分散在液体中的超微细粒子涂覆在基板上,并使球状的微细粒子暴露于表面上使得在空气(界面)与粒子之间逐渐产生折射率的差异。因此,可以得到减反射特性。然而,由于所述超微细粒子的形状和粒度应该均匀,并且这些粒子应该均匀地分散在基板上,所以通过常用的涂覆方法难以实施这种方法。而且,由于为了在所述膜的表面上得到球形的形状,粘合剂的用量应该与预先确定的用量相等或少于预先确定的用量,所以该方法得到的耐磨性非常差。此外,由于涂层的厚度应该也比微细粒子的直径小,所以难以获得耐磨性。In recent years, methods have been proposed to make reflected light destructively interfere by designing single-layer coatings. The following method has been disclosed in Japanese Patent Application Publication No. 07-168006. According to this method, ultrafine particles dispersed in a liquid are coated on a substrate, and spherical fine particles are exposed on the surface so that a difference in refractive index is gradually generated between air (interface) and the particles. Therefore, antireflection characteristics can be obtained. However, since the shape and particle size of the ultrafine particles should be uniform, and the particles should be uniformly dispersed on the substrate, it is difficult to implement this method by the usual coating method. Also, since the amount of adhesive should be equal to or less than the predetermined amount in order to obtain a spherical shape on the surface of the film, this method results in very poor abrasion resistance. In addition, since the thickness of the coating should also be smaller than the diameter of the fine particles, it is difficult to obtain abrasion resistance.

发明内容Contents of the invention

技术问题technical problem

为了解决上述问题,本发明的目的是提供一种用于减反射的涂料组合物,其中尽管使用一种涂料组合物通过一步涂覆法来形成涂层,但在该涂层中出现了相分离以同时提供减反射特性和耐磨性,从而提高工艺效率和降低生产成本;采用该用于减反射的涂料组合物制备的减反射膜;以及制备该减反射膜的方法。In order to solve the above-mentioned problems, an object of the present invention is to provide a coating composition for antireflection in which phase separation occurs in the coating although a coating composition is used to form a coating by a one-step coating method The anti-reflection property and abrasion resistance are provided at the same time, thereby improving process efficiency and reducing production cost; an anti-reflection film prepared by using the anti-reflection coating composition; and a method for preparing the anti-reflection film.

技术方案Technical solutions

为了实现上述目的,本发明提供了一种用于减反射的涂料组合物,其包含折射率为1.2至1.45的低折射材料和折射率为1.46至2的高折射树脂,其中两种材料间的表面能差异为5mN/m以上。In order to achieve the above object, the present invention provides a coating composition for antireflection, which comprises a low refractive material with a refractive index of 1.2 to 1.45 and a high refractive resin with a refractive index of 1.46 to 2, wherein the The difference in surface energy is 5 mN/m or more.

此外,本发明提供了一种制备减反射膜的方法,其包括下列步骤:In addition, the present invention provides a method for preparing an anti-reflection film, which includes the following steps:

a)制备用于减反射的涂料组合物,该组合物包含折射率为1.2至1.45的低折射材料和折射率为1.46至2的高折射树脂,其中两种材料间的表面能差异为5mN/m以上;a) prepare a coating composition for antireflection, the composition comprises a low refractive material with a refractive index of 1.2 to 1.45 and a high refractive resin with a refractive index of 1.46 to 2, wherein the difference in surface energy between the two materials is 5mN/ more than m;

b)将所述涂料组合物涂覆在基板上以形成涂层;b) applying the coating composition to a substrate to form a coating;

c)干燥所述涂层以使所述低折射材料和高折射材料相分离;以及c) drying the coating to phase separate the low and high refractive materials; and

d)固化干燥的涂层。d) Curing the dried coating.

所述用于减反射的涂料组合物可进一步包含氟化化合物或纳米粒子分散液以利于所述低折射材料和高折射材料的相分离。The coating composition for anti-reflection may further include a fluorinated compound or a nanoparticle dispersion to facilitate phase separation of the low-refraction material and the high-refraction material.

此外,本发明提供一种包括单层涂层的减反射膜,该单层涂层包含折射率为1.2至1.45的低折射材料和折射率为1.46至2的高折射树脂,其中两种材料间的表面能差异为5mN/m以上并且所述低折射材料和高折射材料在厚度方向上具有浓度梯度。In addition, the present invention provides an antireflection film comprising a single-layer coating comprising a low-refractive material having a refractive index of 1.2 to 1.45 and a high-refractive resin having a refractive index of 1.46 to 2, wherein the difference between the two materials is The surface energy difference is more than 5mN/m and the low refractive material and the high refractive material have a concentration gradient in the thickness direction.

此外,本发明提供了一种偏光片,其包括a)偏光膜,和b)施加在所述偏光膜的至少一面的根据本发明的减反射膜。Furthermore, the present invention provides a polarizer comprising a) a polarizing film, and b) an antireflection film according to the present invention applied to at least one side of the polarizing film.

另外,本发明提供了一种显示器件,其包括所述减反射膜或所述偏光片。In addition, the present invention provides a display device comprising the anti-reflection film or the polarizer.

有益效果Beneficial effect

通过使用上述用于减反射的涂料组合物和制备所述减反射膜的方法,本发明能够提供包括具有优异的减反射特性和耐磨性的减反射层的减反射膜,其中,所述减反射层由单层涂层构成。由于根据本发明的减反射膜具有优异的耐磨性和低折射特性并且能够通过一步涂覆法制备,因此可以提高加工效率并减少生产成本。By using the above-mentioned coating composition for antireflection and the method for producing the antireflection film, the present invention can provide an antireflection film including an antireflection layer having excellent antireflection characteristics and abrasion resistance, wherein the antireflection The reflective layer consists of a single layer coating. Since the antireflection film according to the present invention has excellent abrasion resistance and low refraction characteristics and can be prepared by a one-step coating method, processing efficiency can be improved and production cost can be reduced.

附图说明Description of drawings

图1为显示根据实施例1的减反射膜的横截面视图的透射电子显微镜图像。FIG. 1 is a transmission electron microscope image showing a cross-sectional view of an antireflection film according to Example 1. Referring to FIG.

具体实施方式Detailed ways

在下文中,将详细描述本发明。Hereinafter, the present invention will be described in detail.

根据本发明的用于减反射的涂料组合物的特征在于,其包含折射率为1.2至1.45的低折射材料和折射率为1.46至2的高折射树脂,并且两种材料间的表面能差异为5mN/m以上。由于使用用于减反射的涂料组合物而在低折射材料和高折射材料间出现表面能差异,因此在涂覆、干燥和固化工艺中可以出现相分离。因此,即使使用一种组合物实施一步涂覆法,也能够提供优异的减反射特性和耐磨性。The coating composition for antireflection according to the present invention is characterized in that it comprises a low-refractive material with a refractive index of 1.2 to 1.45 and a high-refractive resin with a refractive index of 1.46 to 2, and the difference in surface energy between the two materials is More than 5mN/m. Phase separation may occur during the coating, drying, and curing processes due to surface energy differences between low and high refractive materials using the coating composition for antireflection. Therefore, even if a one-step coating method is performed using one composition, excellent antireflection characteristics and abrasion resistance can be provided.

在本发明中,在通过固化材料来制备的固化产品中测量表面能。In the present invention, the surface energy is measured in a cured product prepared by curing the material.

在涂覆步骤完成后,由于低折射材料和高折射材料间的表面能差异,所述低折射材料逐渐移向涂层的上部,而所述高折射材料位于涂层的下部。为了在干燥和固化步骤中使相分离最大化并固定相分离的位置,优选的是所述低折射材料为在室温下是柔软的并根据温度逐渐固化的热固性材料。此外,所述低折射材料优选具有25mN/m以下,并且更优选5mN/m至25mN/m的表面能。After the coating step is completed, due to the difference in surface energy between the low-refractive material and the high-refractive material, the low-refractive material gradually moves toward the upper portion of the coating, while the high-refractive material is located at the lower portion of the coating. In order to maximize phase separation and fix the position of phase separation in the drying and curing steps, it is preferable that the low-refractive material is a thermosetting material that is soft at room temperature and gradually solidifies according to temperature. In addition, the low-refractive material preferably has a surface energy of 25 mN/m or less, and more preferably 5 mN/m to 25 mN/m.

在本发明中,优选的是,基于100重量份的总涂料组合物,所述低折射材料的含量为5至80重量份,而所述高折射材料的含量为10至90重量份。In the present invention, preferably, based on 100 parts by weight of the total coating composition, the content of the low refractive material is 5 to 80 parts by weight, and the content of the high refractive material is 10 to 90 parts by weight.

所述低折射-热固性材料为折射率在1.2至1.45范围内的热固性材料。例如,可引起溶胶-凝胶反应的烷氧基硅烷反应物、氨基甲酸酯反应基化合物、脲反应基化合物、酯化反应物等可被用作所述低折射-热固性树脂。The low refraction-thermosetting material is a thermosetting material with a refractive index in the range of 1.2 to 1.45. For example, an alkoxysilane reactant, a urethane reactive compound, a urea reactive compound, an esterification reactant, etc. which may cause a sol-gel reaction may be used as the low refraction-thermosetting resin.

所述烷氧基硅烷反应物为反应低聚物,该反应低聚物通过在水和催化剂条件下进行烷氧基硅烷、氟化烷氧基硅烷、基于硅烷的有机取代基的水解和缩合经溶胶-凝胶反应来制备。所述溶胶-凝胶反应可采用本领域常用的任何方法。在0至150℃的反应温度下进行包括烷氧基硅烷、氟化烷氧基硅烷、催化剂、水和有机溶剂的溶胶-凝胶反应1至70小时。在这种情况下,当使用聚苯乙烯作为参照材料通过GPC(凝胶渗透色谱法)测量时,所述反应低聚物烷氧基硅烷的平均分子量优选为1,000至200,000。在涂覆后在等于或高于室温的温度下进行缩合反应,以使如上所述制备的烷氧基硅烷反应物形成具有交联结构的网。The alkoxysilane reactants are reactive oligomers that are processed by hydrolysis and condensation of alkoxysilanes, fluorinated alkoxysilanes, silane-based organic substituents under water and catalyst conditions. prepared by sol-gel reaction. The sol-gel reaction can adopt any method commonly used in the art. The sol-gel reaction including alkoxysilane, fluorinated alkoxysilane, catalyst, water, and organic solvent is performed at a reaction temperature of 0 to 150° C. for 1 to 70 hours. In this case, the reactive oligomer alkoxysilane preferably has an average molecular weight of 1,000 to 200,000 when measured by GPC (Gel Permeation Chromatography) using polystyrene as a reference material. The condensation reaction is performed at a temperature equal to or higher than room temperature after coating, so that the alkoxysilane reactant prepared as described above forms a network having a crosslinked structure.

所述烷氧基硅烷能够赋予最外面的薄膜需要的水平的强度。具体而言,所述烷氧基硅烷可采用四烷氧基硅烷或三烷氧基硅烷。同时,所述烷氧基硅烷优选为选自四甲氧基硅烷、四乙氧基硅烷、四异丙氧基硅烷、甲基三甲氧基硅烷、甲基三乙氧基硅烷、环氧丙氧基丙基三甲氧基硅烷和环氧丙氧基丙基三乙氧基硅烷中的至少一种,但不限于此。The alkoxysilane is capable of imparting the required level of strength to the outermost film. Specifically, the alkoxysilane may be tetraalkoxysilane or trialkoxysilane. Meanwhile, the alkoxysilane is preferably selected from tetramethoxysilane, tetraethoxysilane, tetraisopropoxysilane, methyltrimethoxysilane, methyltriethoxysilane, glycidoxy At least one of propyltrimethoxysilane and glycidoxypropyltriethoxysilane, but not limited thereto.

基于100重量份的所述烷氧基硅烷反应物,基本单体烷氧基硅烷的含量优选为5至50重量份。如果含量小于5重量份,则难以获得优异的耐磨性。如果含量大于50重量份,则难以实现烷氧基硅烷反应物的低折射特性和从高折射材料的相分离。The content of the basic monomeric alkoxysilane is preferably 5 to 50 parts by weight based on 100 parts by weight of the alkoxysilane reactant. If the content is less than 5 parts by weight, it is difficult to obtain excellent abrasion resistance. If the content is more than 50 parts by weight, it may be difficult to achieve low refractive characteristics of the alkoxysilane reactant and phase separation from the high refractive material.

所述氟化烷氧基硅烷降低了折射率和涂覆薄膜的表面张力以利于从高折射材料的相分离。所述氟化烷氧基硅烷优选为具有1.3至1.4的低折射率和10至15mN/m的低表面张力的低折射材料。所述氟化烷氧基硅烷优选为选自十三氟辛基三乙氧基硅烷、十七氟癸基三甲氧基硅烷和十七氟癸基三异丙氧基硅烷中的一种或多种,但不限于此。The fluorinated alkoxysilanes lower the refractive index and surface tension of the coated film to facilitate phase separation from highly refractive materials. The fluorinated alkoxysilane is preferably a low refractive material having a low refractive index of 1.3 to 1.4 and a low surface tension of 10 to 15 mN/m. The fluorinated alkoxysilane is preferably one or more selected from tridecafluorooctyltriethoxysilane, heptadecafluorodecyltrimethoxysilane and heptadecafluorodecyltriisopropoxysilane species, but not limited to this.

为了使烷氧基硅烷反应物具有1.2至1.45的折射率并有利于从高折射材料的相分离,基于100重量份的所述烷氧基硅烷反应物,所述氟化烷氧基硅烷的含量优选为10至70重量份。如果含量小于10重量份,则难以实现低折射特性和从高折射材料的相分离。如果含量大于70重量份,则难以确保溶液的稳定和抗划伤性。In order to make the alkoxysilane reactant have a refractive index of 1.2 to 1.45 and facilitate phase separation from high refractive materials, based on 100 parts by weight of the alkoxysilane reactant, the content of the fluorinated alkoxysilane Preferably it is 10 to 70 parts by weight. If the content is less than 10 parts by weight, it may be difficult to achieve low-refractive properties and phase separation from high-refractive materials. If the content is more than 70 parts by weight, it may be difficult to ensure solution stability and scratch resistance.

所述基于硅烷的有机取代基可以与烷氧基硅烷化学结合,与所述高折射材料形成双键以提高低折射材料和高折射材料的相容性,并且在相分离后提高烷氧基硅烷和高折射材料的粘附性。因此,只要其具有上述功能,就可使用任何化合物而没有限制。所述基于硅烷的有机取代基优选为选自乙烯基三甲氧基硅烷、乙烯基三(β-甲氧基乙氧基)硅烷、乙烯基三乙氧基硅烷、乙烯基三正丙氧基硅烷、乙烯基三正戊氧基硅烷、乙烯基甲基二甲氧基硅烷、联苯基乙氧基乙烯基硅烷、乙烯基三异丙氧基硅烷、二乙烯基二(β-甲氧基乙氧基)硅烷、二乙烯基二甲氧基硅烷、二乙烯基二乙氧基硅烷、二乙烯基二正丙氧基硅烷、二乙烯基二(异丙氧基)硅烷、二乙烯基二正戊氧基硅烷、3-丙烯酰氧基丙基三甲氧基硅烷、3-甲基丙烯酰氧基丙基三甲氧基硅烷、γ-甲基丙烯酰氧基丙基甲基二乙氧基硅烷、γ-甲基丙烯酰氧基丙基甲基二乙氧基硅烷中的一种或多种,但不限于此。The silane-based organic substituent can be chemically combined with the alkoxysilane, form a double bond with the high-refractive material to improve the compatibility of the low-refractive material and the high-refractive material, and enhance the alkoxysilane after phase separation. and adhesion to high refractive materials. Therefore, any compound can be used without limitation as long as it has the above-mentioned function. The silane-based organic substituent is preferably selected from vinyltrimethoxysilane, vinyltris(β-methoxyethoxy)silane, vinyltriethoxysilane, vinyltri-n-propoxysilane , vinyltri-n-pentoxysilane, vinylmethyldimethoxysilane, biphenylethoxyvinylsilane, vinyltriisopropoxysilane, divinylbis(β-methoxyethyl oxy)silane, divinyldimethoxysilane, divinyldiethoxysilane, divinyldi-n-propoxysilane, divinylbis(isopropoxy)silane, divinyldi-n- Pentyloxysilane, 3-Acryloxypropyltrimethoxysilane, 3-Methacryloxypropyltrimethoxysilane, γ-Methacryloxypropylmethyldiethoxysilane , one or more of γ-methacryloxypropylmethyldiethoxysilane, but not limited thereto.

为了保持所述烷氧基硅烷反应物在涂料溶液中的相容性和稳定性,基于100重量份的烷氧基硅烷反应物,所述基于硅烷的有机取代基的含量优选为0至50重量份。如果含量大于50重量份,则难以实现低折射特性和从高折射材料的相分离。此外,如果不向其中加入基于硅烷的有机取代基,所述低折射材料对高折射材料的相容性不足,因此涂料溶液可能没有混合均匀。In order to maintain the compatibility and stability of the alkoxysilane reactant in the coating solution, based on 100 parts by weight of the alkoxysilane reactant, the content of the silane-based organic substituent is preferably 0 to 50 wt. share. If the content is more than 50 parts by weight, it may be difficult to achieve low refractive characteristics and phase separation from high refractive materials. In addition, if the silane-based organic substituent is not added thereto, the low-refractive material has insufficient compatibility with the high-refractive material, and thus the coating solution may not be uniformly mixed.

在所述溶胶-凝胶反应中使用的催化剂为控制溶胶-凝胶反应时间所需的成分。该催化剂优选为如硝酸、盐酸、硫酸和乙酸的酸,并且更优选锆或铟的盐酸盐、硝酸盐、硫酸盐或乙酸盐,但不限于此。与此相关,基于100重量份的所述烷氧基硅烷反应物,所述催化剂的用量优选为0.1至10重量份。The catalyst used in the sol-gel reaction is a component necessary to control the sol-gel reaction time. The catalyst is preferably an acid such as nitric acid, hydrochloric acid, sulfuric acid, and acetic acid, and more preferably hydrochloride, nitrate, sulfate, or acetate of zirconium or indium, but is not limited thereto. In connection with this, the catalyst is preferably used in an amount of 0.1 to 10 parts by weight based on 100 parts by weight of the alkoxysilane reactant.

在所述溶胶-凝胶反应中使用的水是水解和缩合所需的,并且基于100重量份的所述烷氧基硅烷反应物,其用量为5至50重量份。Water used in the sol-gel reaction is required for hydrolysis and condensation, and is used in an amount of 5 to 50 parts by weight based on 100 parts by weight of the alkoxysilane reactant.

在所述溶胶-凝胶反应中使用的有机溶剂是控制水解缩合物的分子量的成分。有机溶剂优选为选自醇、溶纤剂和酮中的一种溶剂或混合溶剂。与此相关,基于100重量份的所述烷氧基硅烷反应物,所述有机溶剂的含量优选为0.1至50重量份。The organic solvent used in the sol-gel reaction is a component that controls the molecular weight of the hydrolysis condensate. The organic solvent is preferably a solvent or a mixed solvent selected from alcohols, cellosolves, and ketones. In connection with this, the content of the organic solvent is preferably 0.1 to 50 parts by weight based on 100 parts by weight of the alkoxysilane reactant.

同时,所述氨基甲酸酯反应基化合物可以通过醇和异氰酸酯化合物间的反应来制备,同时使用金属催化剂。如果将包含金属催化剂、具有两个以上官能团的多官能异氰酸酯和具有两个以上官能团的多官能醇的溶液保持在等于或高于室温的温度下,就可以形成包含氨基甲酸酯反应基的网状结构。在这种情况下,可将氟基引入醇或异氰酸酯中以实现低折射特性并促使从高折射材料的相分离。Meanwhile, the urethane reactive group compound may be prepared through a reaction between an alcohol and an isocyanate compound while using a metal catalyst. If a solution containing a metal catalyst, a polyfunctional isocyanate having two or more functional groups, and a polyfunctional alcohol having two or more functional groups is kept at a temperature equal to or higher than room temperature, a network containing a carbamate reactive group can be formed shape structure. In this case, a fluorine group may be introduced into alcohol or isocyanate to achieve low-refractive properties and promote phase separation from high-refractive materials.

所述含氟的多官能醇的实例可包括1H,1H,4H,4H-全氟-1,4-丁二醇、Examples of the fluorine-containing polyfunctional alcohol may include 1H, 1H, 4H, 4H-perfluoro-1,4-butanediol,

1H,1H,5H,5H-全氟-1,5-戊二醇、1H, 1H, 5H, 5H-perfluoro-1,5-pentanediol,

1H,1H,6H,6H-全氟-1,6-己二醇、1H, 1H, 6H, 6H-perfluoro-1,6-hexanediol,

1H,1H,8H,8H-全氟-1,8-辛二醇、1H, 1H, 8H, 8H-perfluoro-1,8-octanediol,

1H,1H,9H,9H-全氟-1,9-壬二醇、1H, 1H, 9H, 9H-perfluoro-1,9-nonanediol,

1H,1H,10H,10H-全氟-1,10-癸二醇、1H, 1H, 10H, 10H-perfluoro-1,10-decanediol,

1H,1H,12H,12H-全氟-1,12-十二烷二醇、氟化三乙二醇和氟化四乙二醇,但不限于此。1H, 1H, 12H, 12H-perfluoro-1,12-dodecanediol, fluorinated triethylene glycol, and fluorinated tetraethylene glycol, but not limited thereto.

优选使用脂肪族异氰酸酯、脂环异氰酸酯、芳香族异氰酸酯或杂环异氰酸酯作为用于制备所述氨基甲酸酯反应基化合物的异氰酸酯成分。具体而言,优选使用二异氰酸酯,例如1,6-己二异氰酸酯、1,3,3-三甲基己二异氰酸酯、异佛尔酮二异氰酸酯、甲苯-2,6-二异氰酸酯和4,4′-二环己烷二异氰酸酯;或者三个以上官能团的异氰酸酯,例如由DIC公司制备的DN950和DN980(商品名)作为异氰酸酯成分。Preference is given to using aliphatic isocyanates, cycloaliphatic isocyanates, aromatic isocyanates or heterocyclic isocyanates as isocyanate constituents for the preparation of the urethane-reactive compound. In particular, diisocyanates such as 1,6-hexamethylene diisocyanate, 1,3,3-trimethylhexamethylene diisocyanate, isophorone diisocyanate, toluene-2,6-diisocyanate and 4,4 '-dicyclohexane diisocyanate; or isocyanate with three or more functional groups, such as DN950 and DN980 (trade name) manufactured by DIC Corporation as the isocyanate component.

在本发明中,可以使用催化剂来制备所述氨基甲酸酯反应基化合物。路易斯酸或路易斯碱可以用作催化剂。所述催化剂的具体实例可以包括辛酸锡、二乙酸二丁锡、二月桂酸二丁锡、硫醇二丁锡(dibutyltin mercaptide)、马来酸氢二丁锡(dibutyltin dimaleate)和氢氧化二甲锡和三乙胺,但并不限于此。In the present invention, a catalyst may be used to prepare the carbamate reactive group compound. Lewis acids or Lewis bases can be used as catalysts. Specific examples of the catalyst may include tin octoate, dibutyltin diacetate, dibutyltin dilaurate, dibutyltin mercaptide, dibutyltin dimaleate, and dimethyl hydroxide Tin and triethylamine, but not limited thereto.

优选设定用于制备所述氨基甲酸酯反应基化合物的异氰酸酯和多官能醇的含量,以使官能团NCO基团与OH基团的摩尔比(NCO/OH)优选为0.5至2,并且更优选为0.75至1.1。如果官能团之间的摩尔比小于0.5或者大于2,则未反应的官能团会增加。因此,可能存在所述膜的强度降低的问题。The content of isocyanate and polyfunctional alcohol used to prepare the urethane-reactive compound is preferably set such that the molar ratio (NCO/OH) of functional groups NCO groups to OH groups is preferably 0.5 to 2, and more preferably Preferably it is 0.75 to 1.1. If the molar ratio between functional groups is less than 0.5 or greater than 2, unreacted functional groups may increase. Therefore, there may be a problem that the strength of the film decreases.

通过胺与异氰酸酯之间的反应可以制备所述脲反应基化合物。可以使用异氰酸酯来制备所述脲反应基化合物,该异氰酸酯与用于制备氨基甲酸酯反应基化合物的异氰酸酯相同。具有两个以上官能团的全氟胺可被用作所述胺。如有必要,可以在本发明中使用催化剂。路易斯酸或者路易斯碱可被用作催化剂。所述催化剂的具体的实例包括辛酸锡、二乙酸二丁锡、二月桂酸二丁锡、硫醇二丁锡、马来酸氢二丁锡、氢氧化二甲锡和三乙胺,但不限于此。The urea-reactive compound may be prepared by a reaction between an amine and an isocyanate. The urea-reactive compound may be prepared using an isocyanate, which is the same isocyanate used to prepare the urethane-reactive compound. Perfluoroamines having two or more functional groups can be used as the amine. A catalyst can be used in the present invention, if necessary. Lewis acids or Lewis bases can be used as catalysts. Specific examples of the catalyst include tin octoate, dibutyltin diacetate, dibutyltin dilaurate, dibutyltin mercaptide, dibutyltin hydrogen maleate, dimethyltin hydroxide, and triethylamine, but not limited to this.

通过酸与醇之间的脱水和缩合反应可以得到酯化反应物。如果也将酯化反应物混合于涂料溶液中,则可以形成具有交联结构的膜。优选地,将具有两个以上官能团的含氟酸用作所述酸。其具体的实例可以包括全氟琥珀酸、全氟戊二酸、全氟己二酸、全氟辛二酸、全氟壬二酸、全氟癸二酸和全氟月桂酸。优选地,将多官能醇用作所述醇。所述所官能醇的具体实例包括1,4-丁二醇、1,2-丁二醇、1,5-戊二醇、2,4-戊二醇、1,4-环己二醇、1,6-己二醇、2,5-己二醇、2,4-庚二醇、季戊四醇和三羟甲基丙烷,但不限于此。例如硫酸的酸催化剂或者例如四丁氧基钛(tetrabutoxytitan)的烷氧基钛(alkoxytitan)可以用于酯化反应中。然而,用于酯化反应中的材料并不限于上述材料。Esterification reactants can be obtained through dehydration and condensation reactions between acids and alcohols. If the esterification reactant is also mixed in the coating solution, a film having a crosslinked structure can be formed. Preferably, a fluorine-containing acid having two or more functional groups is used as the acid. Specific examples thereof may include perfluorosuccinic acid, perfluoroglutaric acid, perfluoroadipic acid, perfluorosuberic acid, perfluoroazelaic acid, perfluorosebacic acid and perfluorolauric acid. Preferably, polyfunctional alcohols are used as the alcohols. Specific examples of the functional alcohol include 1,4-butanediol, 1,2-butanediol, 1,5-pentanediol, 2,4-pentanediol, 1,4-cyclohexanediol, 1,6-hexanediol, 2,5-hexanediol, 2,4-heptanediol, pentaerythritol, and trimethylolpropane, but not limited thereto. An acid catalyst such as sulfuric acid or an alkoxytitan such as tetrabutoxytitan may be used in the esterification reaction. However, materials used in the esterification reaction are not limited to the above-mentioned materials.

所述高折射材料为具有1.45至2的折射率的树脂,该折射率相对高于所述低折射材料的折射率,并且所述高折射材料和低折射材料的固化产品间的表面能差异为5mN/m以上。优选的是,所述高折射材料的固化产品的表面能比所述低折射材料的表面能高5mN/m以上。The high-refractive material is a resin having a refractive index of 1.45 to 2, which is relatively higher than that of the low-refractive material, and the difference in surface energy between cured products of the high-refractive material and the low-refractive material is More than 5mN/m. Preferably, the surface energy of the cured product of the high-refractive material is higher than that of the low-refractive material by more than 5 mN/m.

所述高折射材料优选为高折射紫外线固化树脂。用于高折射紫外线固化树脂的材料可包含丙烯酸酯树脂、光敏引发剂和溶剂,如有必要,还包含表面活性剂。所述丙烯酸酯树脂的实例可包括丙烯酸酯单体、氨基甲酸酯丙烯酸酯低聚物、环氧丙烯酸酯低聚物和酯丙烯酸酯低聚物。紫外线固化树脂可含有取代基,例如硫、氯和金属,或者芳香族材料以获得高折射率。其实例可包括二季戊四醇六丙烯酸酯、季戊四醇三/四丙烯酸酯、三亚甲基丙烷三丙烯酸酯、二丙烯酸乙二醇酯、9,9-双(4-(2-丙烯酰氧基乙氧基苯基)氟(折射率:1.62)、双(4-甲基丙烯酰氧基苯硫基)硫化物(折射率:1.689)和双(4-乙烯基苯硫基)硫化物(折射率:1.695)。可使用上述一种化合物或两种以上化合物的混合物。The high refraction material is preferably a high refraction ultraviolet curable resin. Materials for high-refractive UV-curable resins may contain acrylate resins, photoinitiators, solvents, and, if necessary, surfactants. Examples of the acrylate resin may include acrylate monomers, urethane acrylate oligomers, epoxy acrylate oligomers, and ester acrylate oligomers. UV curable resins can contain substituents such as sulfur, chlorine, and metals, or aromatic materials to achieve high refractive index. Examples thereof may include dipentaerythritol hexaacrylate, pentaerythritol tri/tetraacrylate, trimethylene propane triacrylate, ethylene glycol diacrylate, 9,9-bis(4-(2-acryloyloxyethoxy Phenyl)fluorine (refractive index: 1.62), bis(4-methacryloxyphenylthio)sulfide (refractive index: 1.689) and bis(4-vinylphenylthio)sulfide (refractive index: 1.695).One compound or a mixture of two or more of the above compounds can be used.

基于100重量份的所述高折射材料,所述丙烯酸酯树脂的含量优选为10至80重量份。如果含量小于10重量份,会出现涂膜的抗划伤性和耐磨性下降的问题,并且涂料溶液的粘度明显下降而不能转移到涂覆机器和基板上。如果含量大于80重量份,则由于涂料溶液的高粘度而难以实现从低折射材料的相分离,并且存在涂膜的平整度和涂覆性能下降的问题。Based on 100 parts by weight of the high refraction material, the content of the acrylate resin is preferably 10 to 80 parts by weight. If the content is less than 10 parts by weight, there may be a problem that the scratch resistance and abrasion resistance of the coating film are lowered, and the viscosity of the coating solution is significantly lowered to prevent transfer to coating machines and substrates. If the content is more than 80 parts by weight, it is difficult to achieve phase separation from the low-refractive material due to the high viscosity of the coating solution, and there is a problem that the flatness of the coating film and the coating performance decrease.

所述光敏引发剂优选为通过UV可降解的化合物,其实例可包括1-羟基环己基苯基甲酮、苄基二甲基缩酮、羟基二甲基苯乙酮、苯偶姻、苯偶姻甲醚、苯偶姻乙醚、苯偶姻异丙醚和苯偶姻丁醚。The photoinitiator is preferably a compound degradable by UV, examples of which may include 1-hydroxycyclohexyl phenyl ketone, benzyl dimethyl ketal, hydroxy dimethyl acetophenone, benzoin, benzoin benzoin methyl ether, benzoin ethyl ether, benzoin isopropyl ether and benzoin butyl ether.

基于100重量份的所述高折射材料,优选使用1至20重量份的量的光敏引发剂。如果含量小于1重量份,可能不会出现合适的固化。如果含量大于20重量份,涂膜的抗划伤性和耐磨性可能会下降。The photoinitiator is preferably used in an amount of 1 to 20 parts by weight based on 100 parts by weight of the high refractive material. If the content is less than 1 part by weight, proper curing may not occur. If the content is more than 20 parts by weight, the scratch resistance and abrasion resistance of the coating film may decrease.

所述溶剂的实例可包括醇、乙酸酯、酮、芳香族溶剂等。该溶剂的具体实例可包括甲醇、乙醇、异丙醇、丁醇、2-甲氧基乙醇、2-乙氧基乙醇、2-丁氧基乙醇、2-异丙氧基乙醇、乙酸甲酯、乙酸乙酯、乙酸丁酯、甲乙酮、甲基异丁基酮、环己烷、环己酮、甲苯、二甲苯和苯,但不限于此。Examples of the solvent may include alcohols, acetates, ketones, aromatic solvents, and the like. Specific examples of the solvent may include methanol, ethanol, isopropanol, butanol, 2-methoxyethanol, 2-ethoxyethanol, 2-butoxyethanol, 2-isopropoxyethanol, methyl acetate , ethyl acetate, butyl acetate, methyl ethyl ketone, methyl isobutyl ketone, cyclohexane, cyclohexanone, toluene, xylene and benzene, but not limited thereto.

基于100重量份的所述高折射材料,所述溶剂的优选用量为10至90重量份。如果含量小于10重量份,则由于涂料溶液的高粘度而难以实现从所述低折射材料的相分离,并且存在涂膜的平整度可能下降的问题。如果含量大于90重量份,会存在涂膜的抗划伤性和耐磨性可能下降并且涂料溶液的粘度可能明显下降而不能转移到涂覆机器和基板上的问题。The solvent is preferably used in an amount of 10 to 90 parts by weight based on 100 parts by weight of the high refractive material. If the content is less than 10 parts by weight, it is difficult to achieve phase separation from the low-refractive material due to the high viscosity of the coating solution, and there is a problem that the flatness of the coating film may decrease. If the content is more than 90 parts by weight, there are problems that the scratch resistance and abrasion resistance of the coating film may decrease and the viscosity of the coating solution may significantly decrease to prevent transfer to coating machines and substrates.

所述高折射紫外线固化树脂可进一步包含表面活性剂。所述表面活性剂的实例可包括均化剂或润湿剂,具体而言是氟化合物或聚硅氧烷化合物,但不限于此。The high refraction ultraviolet curable resin may further contain a surfactant. Examples of the surfactant may include leveling agents or wetting agents, specifically, fluorine compounds or silicone compounds, but are not limited thereto.

基于100重量份的所述高折射材料,所述表面活性剂的优选用量为5重量份。如果含量大于5重量份,则难以实现从所述低折射材料的相分离,并且存在对基板的粘附性、涂膜的抗划伤性和耐磨性可能下降的问题。基于100重量份的所述高折射材料,优选加入0.05以上重量份的量的所述表面活性剂,以获得其足够的作用。Based on 100 parts by weight of the high refraction material, the preferred amount of the surfactant is 5 parts by weight. If the content is more than 5 parts by weight, it is difficult to achieve phase separation from the low-refractive material, and there is a problem that adhesion to a substrate, scratch resistance and abrasion resistance of a coating film may decrease. Based on 100 parts by weight of the high refractive material, the surfactant is preferably added in an amount of 0.05 parts by weight or more in order to obtain a sufficient effect thereof.

在完成干燥和固化工艺后,上述低折射材料和高折射材料的固化产品的折射率差异优选为0.01以上。在这种情况下,所述单层涂层功能性地形成了由两个以上的层构成的GRIN(梯度折射率)结构,从而获得减反射作用。与此相关,当固化的低折射材料具有25mN/m以下的表面能,且低折射材料和高折射材料间的表面能差异为5mN/m以上时,会有效地出现相分离。After the drying and curing process is completed, the difference in refractive index of the cured products of the above-mentioned low-refractive material and high-refractive material is preferably 0.01 or more. In this case, the monolayer coating functionally forms a GRIN (Gradient Refractive Index) structure consisting of two or more layers, thereby obtaining an antireflection effect. In relation to this, when the cured low-refractive material has a surface energy of 25 mN/m or less, and the difference in surface energy between the low-refractive material and the high-refractive material is 5 mN/m or more, phase separation effectively occurs.

根据本发明用于减反射的涂料组合物可进一步包含氟化化合物和纳米粒子分散液中的至少一种以利于低折射材料和高折射材料的相分离。The coating composition for anti-reflection according to the present invention may further include at least one of a fluorinated compound and a nanoparticle dispersion to facilitate phase separation of the low-refractive material and the high-refractive material.

优选的是氟化化合物的折射率为1.5以下,分子量小于低折射材料,且表面能在高折射材料和低折射材料的表面能之间。基于100重量份的总涂料组合物,所述氟化化合物优选的含量为0.05至72重量份。It is preferred that the fluorinated compound has a refractive index of 1.5 or less, a molecular weight smaller than that of the low-refractive material, and a surface energy between those of the high-refractive material and the low-refractive material. The preferred content of the fluorinated compound is 0.05 to 72 parts by weight based on 100 parts by weight of the total coating composition.

所述氟化化合物为低折射-热固性树脂,如氟化烷氧基硅烷、氟化醇、氟化异氰酸酯、氟化胺和含氟的具有两个以上官能团的酸,并且优选为选自示例的氟化化合物;进一步含有C1-C6直链或支链烃基作为取代基的一种或多种氟化丙烯酸酯(其由下面的通式1至5表示);如含氟的均化剂、分散剂、表面改性剂、润湿剂、消泡剂和增容剂的多种氟化添加剂以及氟化溶剂中的一种或多种材料。The fluorinated compound is a low-refractive-thermosetting resin such as fluorinated alkoxysilane, fluorinated alcohol, fluorinated isocyanate, fluorinated amine, and fluorine-containing acid having two or more functional groups, and is preferably selected from the exemplified Fluorinated compounds; one or more fluorinated acrylates (which are represented by the following general formulas 1 to 5) further containing C 1 -C 6 linear or branched hydrocarbon groups as substituents; such as fluorine-containing leveling agents , dispersants, surface modifiers, wetting agents, defoamers and compatibilizers, a variety of fluorinated additives and one or more materials in fluorinated solvents.

[通式1][Formula 1]

Figure GPA00001137545200091
Figure GPA00001137545200091

其中,R1为-H或C1-C6烃基,a为0至4的整数,以及b为1至3的整数。所述C1-C6烃基优选为甲基(-CH3)。Wherein, R 1 is -H or C 1 -C 6 hydrocarbon group, a is an integer from 0 to 4, and b is an integer from 1 to 3. The C 1 -C 6 hydrocarbon group is preferably methyl (—CH 3 ).

[通式2][Formula 2]

Figure GPA00001137545200092
Figure GPA00001137545200092

其中,c为1至10的整数。Wherein, c is an integer from 1 to 10.

[通式3][Formula 3]

Figure GPA00001137545200101
Figure GPA00001137545200101

其中,d为1至9的整数。Wherein, d is an integer from 1 to 9.

[通式4][Formula 4]

Figure GPA00001137545200102
Figure GPA00001137545200102

其中,e为1至5的整数。Wherein, e is an integer from 1 to 5.

[通式5][Formula 5]

Figure GPA00001137545200103
Figure GPA00001137545200103

其中,f为4至10的整数。Wherein, f is an integer from 4 to 10.

优选在保持涂膜的低折射特性、涂膜的强度和对显示基板的粘附性的范围内使用所述氟化化合物,具体而言,基于100重量份的所述低折射材料,其量为1至90重量份。It is preferable to use the fluorinated compound within the range of maintaining the low-refractive properties of the coating film, the strength of the coating film, and the adhesion to the display substrate, specifically, based on 100 parts by weight of the low-refractive material, the amount is 1 to 90 parts by weight.

优选的是,所述纳米粒子分散液含有平均粒度为1,000nm以下,优选1至200nm,并且更优选2至100nm的纳米粒子,以获得无可见光散射或漫射的透明膜。所述纳米粒子分散液优选具有1.45以下的折射率。所述纳米粒子分散液可进一步包含增强分散的螯合剂、氟化丙烯酸酯、溶剂等。基于100重量份的总涂料组合物,所述纳米粒子分散液的优选含量为2至27重量份。It is preferable that the nanoparticle dispersion liquid contains nanoparticles with an average particle size of 1,000 nm or less, preferably 1 to 200 nm, and more preferably 2 to 100 nm, to obtain a transparent film without visible light scattering or diffusion. The nanoparticle dispersion preferably has a refractive index of 1.45 or less. The nanoparticle dispersion may further include a dispersion-enhancing chelating agent, fluorinated acrylate, solvent, and the like. The preferred content of the nanoparticle dispersion is 2 to 27 parts by weight based on 100 parts by weight of the total coating composition.

所述纳米粒子可为金属氟化物、其他有机/无机中空和多孔粒子。具体而言,金属氟化物为平均粒度为10至100nm的粒子,并且包括选自NaF、LiF、AlF3、Na5Al3F14、Na3AlF6、MgF2、NaMgF3和YF3中的一种或多种。The nanoparticles can be metal fluorides, other organic/inorganic hollow and porous particles. Specifically, the metal fluoride is a particle having an average particle size of 10 to 100 nm, and includes a metal selected from NaF, LiF, AlF 3 , Na 5 Al 3 F 14 , Na 3 AlF 6 , MgF 2 , NaMgF 3 , and YF 3 one or more.

优选在保持涂膜的低折射特性、涂膜的强度和对显示基板的粘附性的范围内使用所述纳米粒子。基于100重量份的所述纳米粒子分散液,所述纳米粒子的优选含量为5重量份至70重量份。The nanoparticles are preferably used within the range of maintaining the low refractive properties of the coating film, the strength of the coating film, and the adhesiveness to the display substrate. Based on 100 parts by weight of the nanoparticle dispersion, the preferred content of the nanoparticles is 5 to 70 parts by weight.

所述增强分散的螯合剂是用于使高折射材料和低折射材料与纳米粒子间具有相容性、从而使纳米粒子不易结块并且还防止涂膜起雾的液体成分。如果需要,可以加入所述增强分散的螯合剂。所述增强分散的螯合剂优选采用选自Mg(CF3COO)2、Na(CF3COO)、K(CF3COO)、Ca(CF3COO)2、Mg(CF2COCHCOCF3)2、Na(CF2COCHCOCF3)、Zr(AcAc)、Zn(AcAC)、Ti(AcAc)和Al(AcAc)中的一种或多种材料,其中AcAc为乙酰基丙酮。The dispersion-enhancing chelating agent is a liquid component for making the high-refractive material and the low-refractive material compatible with the nanoparticles, so that the nanoparticles are not easy to agglomerate and also prevent fogging of the coating film. Such dispersion enhancing chelating agents may be added if desired. The chelating agent for enhancing dispersion is preferably selected from Mg(CF 3 COO) 2 , Na(CF 3 COO), K(CF 3 COO), Ca(CF 3 COO) 2 , Mg(CF 2 COCHCOCF 3 ) 2 , One or more materials selected from Na(CF 2 COCHCOCF 3 ), Zr(AcAc), Zn(AcAC), Ti(AcAc) and Al(AcAc), wherein AcAc is acetylacetone.

此外,所述溶剂可优选为DAA、AcAc和溶纤剂,但不限于此。In addition, the solvent may preferably be DAA, AcAc, and Cellosolve, but is not limited thereto.

优选在保持纳米粒子的分散性、涂膜的强度和对显示基板的粘附性的范围内使用所述增强分散的螯合剂。具体而言,基于100重量份的所述纳米粒子分散液,所述增强分散的螯合剂的优选用量为10至80重量份。The dispersion-enhancing chelating agent is preferably used within a range of maintaining dispersibility of nanoparticles, strength of a coating film, and adhesion to a display substrate. Specifically, based on 100 parts by weight of the nanoparticle dispersion, the preferred amount of the dispersion-enhancing chelating agent is 10 to 80 parts by weight.

所述氟化丙烯酸酯用于使高折射材料和低折射材料具有相容性并通过化学结合使膜具有一定的强度,其可为选自由通式1至5表示的并进一步含有C1-C6烃基作为取代基的化合物中的一种或多种材料。基于100重量份的所述纳米粒子分散液,所述氟化丙烯酸酯的优选用量为80重量份以下。The fluorinated acrylate is used to make the high-refraction material and the low-refraction material compatible and to make the film have a certain strength through chemical combination, which can be selected from those represented by general formulas 1 to 5 and further contain C 1 -C One or more materials in compounds with 6 hydrocarbon groups as substituents. Based on 100 parts by weight of the nanoparticle dispersion, the preferred amount of the fluorinated acrylate is 80 parts by weight or less.

用于所述纳米粒子分散液的溶剂的实例可包括醇、乙酸酯、酮或芳香族溶剂,具体而言为甲醇、乙醇、异丙醇、丁醇、2-甲氧基乙醇、2-乙氧基乙醇、2-丁氧基乙醇、2-异丙氧基乙醇、乙酸甲酯、乙酸乙酯、乙酸丁酯、甲乙酮、甲基异丁基酮、环己烷、环己酮、甲苯、二甲苯、苯等。基于100重量份的所述纳米粒子分散液,所述溶剂的优选用量为10至90重量份。Examples of solvents for the nanoparticle dispersion may include alcohols, acetates, ketones or aromatic solvents, specifically methanol, ethanol, isopropanol, butanol, 2-methoxyethanol, 2- Ethoxyethanol, 2-butoxyethanol, 2-isopropoxyethanol, methyl acetate, ethyl acetate, butyl acetate, methyl ethyl ketone, methyl isobutyl ketone, cyclohexane, cyclohexanone, toluene , xylene, benzene, etc. The solvent is preferably used in an amount of 10 to 90 parts by weight based on 100 parts by weight of the nanoparticle dispersion.

本发明提供了一种采用上述用于减反射的涂料组合物来制备的减反射膜,以及制备该减反射膜的方法。The present invention provides an anti-reflection film prepared by using the above coating composition for anti-reflection, and a method for preparing the anti-reflection film.

制备根据本发明的制备减反射膜的方法包括下列步骤:Preparation The method for preparing an anti-reflection film according to the present invention comprises the following steps:

a)制备上述用于减反射的涂料组合物;a) preparing the above-mentioned coating composition for antireflection;

b)将所述涂料组合物涂覆在基板上以形成涂层;b) applying the coating composition to a substrate to form a coating;

c)干燥所述涂层以使低折射材料和高折射材料相分离;以及c) drying the coating to phase separate the low and high refractive materials; and

d)固化干燥的涂层。d) Curing the dried coating.

在步骤b)中,所述基板可为玻璃、塑料片和膜,且其厚度没有限制。塑料膜的实例可包括三醋酸纤维素膜、降冰片烯环烯烃聚合物膜、聚酯膜、聚甲基丙烯酸酯膜和聚碳酸酯膜,但不限于此。In step b), the substrate may be glass, plastic sheet or film, and its thickness is not limited. Examples of plastic films may include cellulose triacetate films, norbornene cycloolefin polymer films, polyester films, polymethacrylate films, and polycarbonate films, but are not limited thereto.

在步骤b)中,涂覆所述涂料组合物的方法可采用如棒涂法、两辊或三辊逆向涂覆法、凹版涂覆法、模压涂覆法(die coating)、微凹版涂覆法和连续涂覆法(comma coating)的多种方法,可根据基板和涂料溶液的液相或流变学性质来选择涂覆方法而没有任何限制。In step b), the method of coating the coating composition can be such as rod coating, two-roll or three-roll reverse coating, gravure coating, die coating, micro gravure coating Various methods of coating method and continuous coating method (comma coating), the coating method can be selected according to the liquid phase or rheological properties of the substrate and coating solution without any restrictions.

并不特别限制涂层的厚度,但优选为0.5至30μm,并在涂覆工艺后进行用于干燥溶剂的干燥工艺。在干燥工艺后,如果涂层的厚度小于0.5μm,则不能充分改进耐磨性。如果涂层的厚度大于30μm,则难以实现低折射材料和高折射材料的相分离,从而不能获得所需的折射特性。The thickness of the coating is not particularly limited, but is preferably 0.5 to 30 μm, and a drying process for drying the solvent is performed after the coating process. After the drying process, if the thickness of the coating layer is less than 0.5 μm, the abrasion resistance cannot be sufficiently improved. If the thickness of the coating layer is greater than 30 μm, it is difficult to achieve phase separation of the low-refractive material and the high-refractive material, so that desired refractive characteristics cannot be obtained.

在步骤c)中,可在40至150℃的温度下进行干燥工艺0.1至30分钟从而从涂料组合物中除去有机溶剂并逐渐固化涂层上部的低折射材料。如果温度低于40℃,则不能完全除去有机溶剂而使UV固化时的固化程度下降。如果温度高于150℃,可能会在低折射材料定位在涂层上部之前就发生固化。In step c), a drying process may be performed at a temperature of 40 to 150° C. for 0.1 to 30 minutes to remove the organic solvent from the coating composition and gradually cure the low-refractive material on the upper portion of the coating. If the temperature is lower than 40° C., the organic solvent cannot be completely removed and the degree of curing during UV curing decreases. If the temperature is above 150°C, curing may occur before the low refractive material is positioned on top of the coating.

在步骤d)中,根据所用树脂的类型可通过UV或加热来进行固化工艺。当同时使用热固性和UV固化树脂时,首先进行UV固化工艺,接着进行热固化工艺。In step d), a curing process may be performed by UV or heating according to the type of resin used. When both thermosetting and UV curing resins are used, the UV curing process is performed first, followed by the thermal curing process.

可在0.01至2J/cm2的UV辐照剂量下进行UV固化工艺1至600秒以使涂层具有足够的耐磨性。如果UV辐照剂量不在上述范围内,则涂层上保留了未固化的树脂,因此表面变粘而不能确保耐磨性。如果UV辐照剂量超过上述范围,则UV固化树脂的数量增加太多,因此可能在热固化步骤中妨碍热固性树脂的固化。The UV curing process may be performed at a UV radiation dose of 0.01 to 2 J/cm 2 for 1 to 600 seconds to make the coating have sufficient abrasion resistance. If the UV irradiation dose is not within the above range, uncured resin remains on the coating, so the surface becomes sticky and abrasion resistance cannot be ensured. If the UV radiation dose exceeds the above range, the amount of the UV curable resin increases too much, thus possibly hindering the curing of the thermosetting resin in the heat curing step.

可在20至200℃下进行热固化1至72小时。如果温度小于20℃,则固化率太低而不能减少固化时间。如果温度大于200℃,则涂覆基板的稳定性会存在问题。固化工艺优选进行1至72小时,并且为了使涂层的抗划伤性最大化,热固性树脂应被充分固化。Thermal curing may be performed at 20 to 200° C. for 1 to 72 hours. If the temperature is less than 20°C, the curing rate is too low to reduce the curing time. If the temperature is greater than 200°C, there may be problems with the stability of the coated substrate. The curing process is preferably carried out for 1 to 72 hours, and in order to maximize the scratch resistance of the coating, the thermosetting resin should be fully cured.

使用上述用于减反射的涂料组合物制备的根据本发明的减反射膜包括单层涂层,该单层涂层包含折射率为1.2至1.45的低折射树脂和折射率为1.46至2的高折射材料,优选进一步包含氟化化合物和纳米粒子分散液中的至少一种,其中两种材料间的表面能差异为5mN/m以上,并且低折射材料和高折射材料已经在厚度方向上具有了浓度梯度。所述减反射膜可进一步包括施加在涂层一个面上的基板。The antireflection film according to the present invention prepared using the above coating composition for antireflection includes a single-layer coating comprising a low-refractive resin with a refractive index of 1.2 to 1.45 and a high-refractive resin with a refractive index of 1.46 to 2. The refractive material preferably further comprises at least one of a fluorinated compound and a nanoparticle dispersion, wherein the difference in surface energy between the two materials is more than 5mN/m, and the low-refractive material and the high-refractive material already have a thickness in the thickness direction Concentration gradient. The anti-reflection film may further include a substrate applied on one side of the coating.

在减反射膜内,基于低折射材料的总重量,包含在从涂层面向空气的表面起在厚度方向相当于50%的区域内的低折射材料优选为70%以上,更优选85%以上,并且最优选95%以上。根据本发明的减反射膜的反射率为小于3%,从而显现出优异的减反射作用。In the antireflection film, based on the total weight of the low-refractive material, the low-refractive material contained in the area corresponding to 50% in the thickness direction from the surface of the coating facing the air is preferably 70% or more, more preferably 85% or more, And most preferably 95% or more. The reflectance of the anti-reflection film according to the present invention is less than 3%, thereby exhibiting an excellent anti-reflection effect.

此外,本发明提供了一种包括根据本发明的上述减反射膜的偏光片。具体而言,根据本发明的偏光片包括a)偏光膜,和b)施加在所述偏光膜的至少一面上的根据本发明的减反射膜。在偏光膜和减反射膜之间可以设置保护膜。此外,实际上可将在制备减反射膜的过程中用于形成单层涂层的基板用作保护膜。偏光膜和减反射膜可通过粘合剂彼此结合。可使用本领域已知的偏光膜。Furthermore, the present invention provides a polarizer including the above-mentioned antireflection film according to the present invention. Specifically, the polarizer according to the present invention comprises a) a polarizing film, and b) an antireflection film according to the present invention applied on at least one side of the polarizing film. A protective film may be provided between the polarizing film and the antireflection film. In addition, the substrate used to form the single-layer coating in the process of producing the antireflection film can actually be used as a protective film. The polarizing film and the antireflection film may be bonded to each other by an adhesive. Polarizing films known in the art can be used.

本发明提供了一种显示器件,其包括减反射膜或偏光片。所述显示器件可为液晶显示器或等离子体显示器。除了设置有根据本发明的减反射膜这一情况外,根据本发明的显示器件可具有本领域已知的结构。例如,在根据本发明的显示器件中,可将减反射膜设置在显示面板朝向观众的最外面的表面上或设置在其朝向背光源的最外面的表面上。此外,根据本发明的显示器件可包括显示面板、设置在该面板的至少一个面上的偏光膜和设置在偏光膜朝向面板一侧的相对侧的减反射膜。The invention provides a display device, which includes an anti-reflection film or a polarizer. The display device may be a liquid crystal display or a plasma display. The display device according to the present invention may have a structure known in the art except for the case where the antireflection film according to the present invention is provided. For example, in the display device according to the present invention, the anti-reflection film may be provided on the outermost surface of the display panel facing the viewer or on its outermost surface facing the backlight. In addition, a display device according to the present invention may include a display panel, a polarizing film provided on at least one face of the panel, and an anti-reflection film provided on an opposite side of the polarizing film toward a side of the panel.

最佳实施方式best practice

在下文中,为了更好理解本发明提供了优选的实施例。然而,这些实施例仅为了示例的目的,而非意欲通过这些实施例来限制本发明。Hereinafter, preferred examples are provided for better understanding of the present invention. However, these examples are for illustrative purposes only, and the present invention is not intended to be limited by these examples.

实施例Example

制备实施例Preparation Example

低折射-热固性材料(材料A)的制备Preparation of low refraction-thermosetting material (Material A)

均匀地混合15.3重量份的DN 980(由DIC公司生产)(其中异氰酸酯官能团的平均数为3)、14重量份的含氟的双官能醇1H,1H,12H,12H-全氟-1,12-十二烷二醇、作为金属催化剂的0.7重量份的二月桂酸二丁锡以及作为溶剂的各35重量份的双丙酮醇(DAA)和甲乙酮(MEK)来制备低折射-热固性溶液。Evenly mix 15.3 parts by weight of DN 980 (produced by DIC Corporation) (wherein the average number of isocyanate functional groups is 3), 14 parts by weight of fluorine-containing difunctional alcohol 1H, 1H, 12H, 12H-perfluoro-1,12 - Dodecanediol, 0.7 parts by weight of dibutyltin dilaurate as a metal catalyst, and 35 parts by weight each of diacetone alcohol (DAA) and methyl ethyl ketone (MEK) as a solvent to prepare a low-refractive-thermosetting solution.

低折射-热固性材料(材料B)的制备Preparation of Low Refractive-Thermoset Material (Material B)

将10重量份的四乙氧基硅烷、30重量份的十七氟癸基三甲氧基硅烷、20重量份的甲基丙烯酰基三甲氧基硅烷、10重量份的水、0.5重量份的盐酸、40重量份的乙醇和40重量份的2-丁醇的混合物在室温下进行溶胶-凝胶反应12小时来制备低折射-热固性溶液。10 parts by weight of tetraethoxysilane, 30 parts by weight of heptadecafluorodecyltrimethoxysilane, 20 parts by weight of methacryl trimethoxysilane, 10 parts by weight of water, 0.5 parts by weight of hydrochloric acid, A mixture of 40 parts by weight of ethanol and 40 parts by weight of 2-butanol was subjected to a sol-gel reaction at room temperature for 12 hours to prepare a low-refractive-thermosetting solution.

低折射-热固性材料(材料C)的制备Preparation of Low Refractive-Thermoset Material (Material C)

将25重量份的氟代烷基甲氧基硅烷、20重量份的四乙氧基硅烷、7重量份的3-甲基丙烯酰氧基丙基三甲氧基硅烷、7.5重量份的水、0.5重量份的硝酸、20重量份的甲醇和20重量份的2-丁醇的混合物在室温下进行溶胶-凝胶反应24小时来制备低折射-热固性溶液。25 parts by weight of fluoroalkylmethoxysilane, 20 parts by weight of tetraethoxysilane, 7 parts by weight of 3-methacryloxypropyl trimethoxysilane, 7.5 parts by weight of water, 0.5 parts by weight A mixture of parts by weight of nitric acid, 20 parts by weight of methanol, and 20 parts by weight of 2-butanol was subjected to a sol-gel reaction at room temperature for 24 hours to prepare a low-refractive-thermosetting solution.

低折射-热固性材料(材料D)的制备Preparation of Low Refractive-Thermoset Material (Material D)

将15重量份的氟代烷基甲氧基硅烷、25重量份的四乙氧基硅烷、12重量份的3-甲基丙烯酰氧基三甲氧基硅烷、7.5重量份的水、0.5重量份的硝酸、20重量份的甲醇和20重量份的2-丁醇的混合物在室温下进行溶胶-凝胶反应24小时来制备低折射-热固性溶液。15 parts by weight of fluoroalkylmethoxysilane, 25 parts by weight of tetraethoxysilane, 12 parts by weight of 3-methacryloxytrimethoxysilane, 7.5 parts by weight of water, 0.5 parts by weight A mixture of nitric acid, 20 parts by weight of methanol and 20 parts by weight of 2-butanol was subjected to a sol-gel reaction at room temperature for 24 hours to prepare a low-refractive-thermosetting solution.

高折射-UV固化材料(材料E)的制备Preparation of High Refractive-UV Curable Material (Material E)

均匀地混合28重量份的二季戊四醇六丙烯酸酯(DPHA)(作为用于提高涂膜强度的多官能丙烯酸酯)、2重量份的作为UV引发剂的Darocur 1173以及各35重量份的作为溶剂的双丙酮醇(DAA)和甲乙酮(MEK)来制备高折射-UV固化溶液。Evenly mix 28 parts by weight of dipentaerythritol hexaacrylate (DPHA) (as a multifunctional acrylate for improving the strength of the coating film), 2 parts by weight of Darocur 1173 as a UV initiator, and 35 parts by weight of each of Darocur 1173 as a solvent. Diacetone alcohol (DAA) and methyl ethyl ketone (MEK) were used to prepare high refraction-UV curing solutions.

高折射-UV固化材料(材料F)的制备Preparation of High Refractive-UV Curable Material (Material F)

均匀地混合30重量份的二季戊四醇六丙烯酸酯(DPHA)(作为用于提高涂膜的强度的多官能丙烯酸酯)、1重量份的作为UV引发剂的Darocur 1173、20重量份的乙醇、29重量份的正丁醇和20重量份的作为溶剂的乙酰丙酮(AcAc)来制备高折射-UV固化溶液。Evenly mix 30 parts by weight of dipentaerythritol hexaacrylate (DPHA) (as a multifunctional acrylate for improving the strength of the coating film), 1 part by weight of Darocur 1173 as a UV initiator, 20 parts by weight of ethanol, 29 The high refraction-UV curing solution was prepared with n-butanol in parts by weight and acetylacetone (AcAc) in 20 parts by weight as a solvent.

低折射-热固性材料(材料G)的制备Preparation of Low Refractive-Thermoset Material (Material G)

将5重量份的氟代烷基乙氧基硅烷、37重量份的四甲氧基硅烷、10重量份的乙烯基三甲氧基硅烷、7.5重量份的水、0.5重量份的硝酸和40重量份的甲醇的混合物在室温下进行溶胶-凝胶反应24小时来制备低折射-热固性溶液。5 parts by weight of fluoroalkylethoxysilane, 37 parts by weight of tetramethoxysilane, 10 parts by weight of vinyltrimethoxysilane, 7.5 parts by weight of water, 0.5 parts by weight of nitric acid and 40 parts by weight of A mixture of methanol was subjected to a sol-gel reaction at room temperature for 24 hours to prepare a low-refractive-thermosetting solution.

高折射-UV固化材料(材料H)的制备Preparation of High Refractive-UV Curable Material (Material H)

均匀地混合20重量份的季戊四醇三/四丙烯酸酯(作为用于提高涂膜强度的多官能丙烯酸酯)、10重量份的三亚甲基丙烷三丙烯酸酯、1重量份的作为UV引发剂的Darocur 1173、作为表面活性剂的5重量份的BYK 333和4重量份的BYK371以及作为溶剂的20重量份的乙醇、20重量份的正丁醇和20重量份的甲乙酮(MEK)来制备高折射-UV固化溶液。Evenly mix 20 parts by weight of pentaerythritol tri/tetraacrylate (as a multifunctional acrylate for improving the strength of the coating film), 10 parts by weight of trimethylene propane triacrylate, and 1 part by weight of Darocur as a UV initiator. 1173, as the BYK 333 of 5 parts by weight of surfactant and the BYK371 of 4 parts by weight and the ethanol of 20 parts by weight as solvent, the n-butanol of 20 parts by weight and the methyl ethyl ketone (MEK) of 20 parts by weight to prepare high refraction-UV Solidification solution.

实施例1Example 1

均匀地混合30重量份的低折射-热固性材料A和70重量份的高折射-UV固化材料E来制备用于减反射的涂料组合物。30 parts by weight of low refraction-thermosetting material A and 70 parts by weight of high refraction-UV curable material E were uniformly mixed to prepare a coating composition for antireflection.

使用线棒(wire bar)(No.5)将制得的组合物涂覆在厚度为80μm的三醋酸纤维素膜上。在60℃烘箱内干燥该膜2分钟,并通过辐照1J/cm2剂量的UV来固化,接着在120℃烘箱内热固化1天。最终的涂层厚度为1μm,并在透射电子显微镜下观察横截面,其显示在图1中。The prepared composition was coated on a cellulose triacetate film having a thickness of 80 μm using a wire bar (No. 5). The film was dried in a 60°C oven for 2 minutes and cured by irradiating a dose of 1 J/cm 2 of UV, followed by thermal curing in a 120°C oven for 1 day. The final coating thickness was 1 μm, and the cross-section was observed under a transmission electron microscope, which is shown in Figure 1.

参照图1,发现在基板上以层结构分别形成了高折射材料层和低折射材料层。与单层结构相比,当由具有不同折射率的材料形成层结构时,能够获得更有效的反射率。Referring to FIG. 1 , it is found that a high refraction material layer and a low refraction material layer are respectively formed in a layer structure on a substrate. When a layered structure is formed of materials having different refractive indices, more effective reflectance can be obtained compared to a single-layered structure.

实施例2Example 2

除了用材料B代替材料A作为低折射-热固性材料外,以与实施例1中相同的方法制备膜。A film was prepared in the same manner as in Example 1 except that Material B was used instead of Material A as the low-refractive-thermosetting material.

实施例3Example 3

均匀地混合25重量份的低折射-热固性材料C和75重量份的高折射-UV固化材料F来制备相容的混合溶液,生成涂料组合物。25 parts by weight of the low-refraction-thermosetting material C and 75 parts by weight of the high-refraction-UV-curable material F were uniformly mixed to prepare a compatible mixed solution, resulting in a coating composition.

使用线棒(No.5)将制得的涂料组合物涂覆在厚度为80μm的三醋酸纤维素膜上。在120℃烘箱内干燥该膜2分钟,并通过辐照200mJ/cm2剂量的UV来固化,接着在120℃烘箱内热固化1天。最终的涂层厚度为1μm。The prepared coating composition was coated on a cellulose triacetate film having a thickness of 80 μm using a wire bar (No. 5). The film was dried in a 120°C oven for 2 minutes, and cured by irradiating a dose of 200 mJ/cm 2 of UV, followed by thermal curing in a 120°C oven for 1 day. The final coating thickness is 1 μm.

实施例4Example 4

均匀地混合30重量份的低折射-热固性材料A和70重量份的高折射-UV固化材料F来制备相容的涂料组合物。使用该组合物以与实施例3中相同的方式制备涂膜。A compatible coating composition was prepared by uniformly mixing 30 parts by weight of low-refraction-thermosetting material A and 70 parts by weight of high-refraction-UV-curable material F. A coating film was prepared in the same manner as in Example 3 using this composition.

实施例5Example 5

均匀地混合20重量份的低折射-热固性材料C、75重量份的高折射-UV固化材料F和5重量份的作为氟化化合物的丙烯酸三氟乙酯来制备相容的用于减反射的涂料组合物。使用该组合物以与实施例3中相同的方式制备涂膜。Uniformly mixed 20 parts by weight of low refraction-thermosetting material C, 75 parts by weight of high refraction-UV curable material F and 5 parts by weight of trifluoroethyl acrylate as a fluorinated compound to prepare compatible antireflection coating composition. A coating film was prepared in the same manner as in Example 3 using this composition.

实施例6Example 6

均匀地混合25重量份的低折射-热固性材料A、70重量份的高折射-UV固化材料F和5重量份的作为氟化化合物的丙烯酸三氟乙酯来制备相容的用于减反射的涂料组合物。使用该组合物以与实施例3中相同的方式制备涂膜。Uniformly mixed 25 parts by weight of low refraction-thermosetting material A, 70 parts by weight of high refraction-UV curable material F and 5 parts by weight of trifluoroethyl acrylate as a fluorinated compound to prepare compatible antireflection coating composition. A coating film was prepared in the same manner as in Example 3 using this composition.

实施例7Example 7

均匀地混合25重量份的低折射-热固性材料D、70重量份的高折射-UV固化材料F和5重量份的作为氟化化合物的丙烯酸三氟乙酯来制备相容的用于减反射的涂料组合物。使用该组合物以与实施例3中相同的方式制备涂膜。Uniformly mixed 25 parts by weight of low refraction-thermosetting material D, 70 parts by weight of high refraction-UV curable material F and 5 parts by weight of trifluoroethyl acrylate as a fluorinated compound to prepare compatible antireflection coating composition. A coating film was prepared in the same manner as in Example 3 using this composition.

实施例8Example 8

均匀地混合22重量份的低折射-热固性材料C、70重量份的高折射-UV固化材料F和8重量份的作为氟化化合物的十三氟辛基三乙氧基硅烷来制备相容的用于减反射的涂料组合物。使用该组合物以与实施例3中相同的方式制备涂膜。Uniformly mixed 22 parts by weight of low-refraction-thermosetting material C, 70 parts by weight of high-refraction-UV curing material F and 8 parts by weight of tridecafluorooctyltriethoxysilane as a fluorinated compound to prepare a compatible Coating compositions for antireflection. A coating film was prepared in the same manner as in Example 3 using this composition.

实施例9Example 9

均匀地混合26重量份的低折射-热固性材料C、70重量份的高折射-UV固化材料F和4重量份的作为氟化化合物的Fluorad FC4430(3M)来制备相容的用于减反射的涂料组合物。使用该组合物以与实施例3中相同的方式制备涂膜。Uniformly mix 26 parts by weight of low-refraction-thermosetting material C, 70 parts by weight of high-refraction-UV curing material F and 4 parts by weight of Fluorad FC4430 (3M) as a fluorinated compound to prepare compatible antireflection coating composition. A coating film was prepared in the same manner as in Example 3 using this composition.

实施例10Example 10

均匀地混合50重量份的10%MgF2-分散液、30重量份的三氟乙酸镁和20重量份的甲乙酮(MEK)来制备金属氟化物-分散液。A metal fluoride-dispersion was prepared by uniformly mixing 50 parts by weight of 10% MgF 2 -dispersion, 30 parts by weight of magnesium trifluoroacetate, and 20 parts by weight of methyl ethyl ketone (MEK).

均匀地混合8重量份的低折射-热固性材料C、75重量份的高折射UV固化材料F和17重量份的所述金属氟化物-分散液来制备相容的用于减反射的涂料组合物。使用该组合物以与实施例3中相同的方式制备涂膜。Uniformly mix 8 parts by weight of low-refraction-thermosetting material C, 75 parts by weight of high-refraction UV-curable material F and 17 parts by weight of the metal fluoride-dispersion liquid to prepare a compatible coating composition for antireflection . A coating film was prepared in the same manner as in Example 3 using this composition.

实施例11Example 11

除了用材料A代替材料C作为低折射-热固性材料外,以与实施例10中相同的方法制备涂料溶液和涂膜。A coating solution and a coating film were prepared in the same manner as in Example 10, except that Material A was used instead of Material C as the low-refractive-thermosetting material.

实施例12Example 12

均匀地混合25重量份的低折射-热固性材料D、70重量份的高折射-UV固化材料F和5重量份的在实施例10中制备的金属氟化物-分散液来制备相容的用于减反射的涂料组合物。使用该组合物以与实施例3中相同的方式制备涂膜。Uniformly mix 25 parts by weight of the low refraction-thermosetting material D, 70 parts by weight of the high refraction-UV curable material F and 5 parts by weight of the metal fluoride-dispersion liquid prepared in Example 10 to prepare a compatible Antireflection coating composition. A coating film was prepared in the same manner as in Example 3 using this composition.

实施例13Example 13

均匀地混合10重量份的平均粒度为30至40nm的NaMgF3和90重量份的异丙醇(IPA)来制备金属氟化物-分散液。除了使用该金属氟化物-分散液外,以与实施例10中相同的方式制备涂料溶液和涂膜。10 parts by weight of NaMgF 3 having an average particle size of 30 to 40 nm and 90 parts by weight of isopropyl alcohol (IPA) were uniformly mixed to prepare a metal fluoride-dispersion liquid. A coating solution and a coating film were prepared in the same manner as in Example 10 except for using this metal fluoride-dispersion liquid.

实施例14Example 14

均匀地混合10重量份的平均粒度为20nm且空隙率为20%的中孔二氧化硅和90重量份的甲醇来制备纳米粒子分散液。除了使用该纳米粒子分散液外,以与实施例10中相同的方式制备涂料溶液和涂膜。A nanoparticle dispersion liquid was prepared by uniformly mixing 10 parts by weight of mesoporous silica having an average particle size of 20 nm and a porosity of 20% and 90 parts by weight of methanol. A coating solution and a coating film were prepared in the same manner as in Example 10 except for using this nanoparticle dispersion.

对比实施例1Comparative Example 1

仅使用高折射-UV固化材料E作为用于形成涂层的材料,并使用线棒(No.5)将其涂覆在厚度为80μm的三醋酸纤维素膜上。在60℃烘箱内干燥该膜2分钟,并通过辐照1J/cm2剂量的UV固化来制备涂膜。涂膜的厚度为约1μm。Only the high refraction-UV curing material E was used as a material for forming a coating layer, and it was coated on a triacetate cellulose film having a thickness of 80 μm using a wire bar (No. 5). The film was dried in an oven at 60° C. for 2 minutes, and cured by irradiating a dose of 1 J/cm 2 of UV to prepare a coating film. The thickness of the coating film was about 1 μm.

对比实施例2Comparative Example 2

仅使用低折射-热固性材料A作为用于形成涂层的材料,并使用线棒(No.5)将其涂覆在厚度为80μm的三醋酸纤维素膜上。在120℃烘箱内热固化该膜1天来制备涂膜。涂膜的厚度为约1μm。Only the low-refraction-thermosetting material A was used as a material for forming the coating layer, and it was coated on a triacetate cellulose film having a thickness of 80 μm using a wire bar (No. 5). The film was thermally cured in an oven at 120° C. for 1 day to prepare a coating film. The thickness of the coating film was about 1 μm.

对比实施例3Comparative Example 3

仅使用低折射-热固性材料B作为用于形成涂层的材料,并使用线棒(No.5)将其涂覆在厚度为80μm的三醋酸纤维素膜上。在120℃烘箱内热固化该膜1天来制备涂膜。涂膜的厚度为约1μm。Only the low-refractive-thermosetting material B was used as a material for forming the coating layer, and it was coated on a triacetate cellulose film having a thickness of 80 μm using a wire bar (No. 5). The film was thermally cured in an oven at 120° C. for 1 day to prepare a coating film. The thickness of the coating film was about 1 μm.

对比实施例4Comparative Example 4

仅使用高折射-UV固化材料F作为用于形成涂层的材料,并使用线棒(No.5)将其涂覆在厚度为80μm的三醋酸纤维素膜上。在120℃烘箱内干燥该膜2分钟,通过辐照200mJ/cm2剂量的UV固化,并置于120℃烘箱内1天。涂膜的厚度为约1μm。Only the high refraction-UV curing material F was used as a material for forming a coating layer, and it was coated on a triacetate cellulose film having a thickness of 80 μm using a wire bar (No. 5). The film was dried in an oven at 120°C for 2 minutes, cured by irradiating UV with a dose of 200 mJ/cm 2 , and placed in an oven at 120°C for 1 day. The thickness of the coating film was about 1 μm.

对比实施例5Comparative Example 5

均匀地混合25重量份的低折射-热固性材料G、70重量份的高折射-UV固化材料H和5重量份的作为氟化化合物的丙烯酸三氟乙酯来制备相容的用于减反射的涂料组合物。以与实施例3中相同的方式使用该组合物来制备涂膜。Uniformly mixed 25 parts by weight of low-refraction-thermosetting material G, 70 parts by weight of high-refraction-UV curing material H and 5 parts by weight of trifluoroethyl acrylate as a fluorinated compound to prepare compatible antireflection coating composition. This composition was used in the same manner as in Example 3 to prepare a coating film.

对比实施例6Comparative Example 6

均匀地混合25重量份的低折射-热固性材料G、70重量份的高折射-UV固化材料H和5重量份的在实施例10中制备的金属氟化物-分散液来制备相容的用于减反射的涂料组合物。以与实施例3中相同的方式使用该组合物来制备涂膜。Uniformly mix 25 parts by weight of the low-refraction-thermosetting material G, 70 parts by weight of the high-refraction-UV curing material H and 5 parts by weight of the metal fluoride-dispersion prepared in Example 10 to prepare a compatible Antireflection coating composition. This composition was used in the same manner as in Example 3 to prepare a coating film.

试验实施例Test Example

将在制备实施例中制备的低折射材料和高折射材料用于制备固化产品,并测量其折射率和表面能,将其显示在表1中。用各种材料来制备固化产品的方法如下所述。使用线棒(No.5)将低折射-热固性材料涂覆在厚度为80μm的三醋酸纤维素膜上,并置于120℃烘箱内1天。除了将其在60℃烘箱内干燥2分钟并通过200mJ/cm2的剂量辐照UV固化外,以与低折射材料相同的方式涂覆高折射-UV固化材料。采用棱镜耦合器(Sairon Technology)来测量折射率,并采用滴形分析系统(Drop shape analysis system)DSA100(KRUSS)来测量表面能,并以水和二碘甲烷(CH2I2)作为标样。The low-refractive materials and high-refractive materials prepared in Preparation Examples were used to prepare cured products, and their refractive indices and surface energies were measured, which are shown in Table 1. Methods for preparing cured products from various materials are described below. The low-refraction-thermosetting material was coated on a cellulose triacetate film with a thickness of 80 μm using a wire rod (No. 5), and placed in an oven at 120° C. for 1 day. The high-refractive-UV-curable material was coated in the same manner as the low-refractive material, except that it was dried in an oven at 60°C for 2 minutes and irradiated with a UV-cured dose of 200 mJ/ cm2 . A prism coupler (Sairon Technology) was used to measure the refractive index, and a drop shape analysis system (Drop shape analysis system) DSA100 (KRUSS) was used to measure the surface energy, and water and diiodomethane (CH 2 I 2 ) were used as standard samples .

[表1][Table 1]

Figure GPA00001137545200181
Figure GPA00001137545200181

由实施例和对比实施例的方法制备的涂膜的厚度为1μm。如下所述,评测在实施例和对比实施例中制备的减反射膜的耐磨性以及包括反射率、透明度和雾度的光学特性:The coating films prepared by the methods of Examples and Comparative Examples had a thickness of 1 μm. The anti-reflection films prepared in Examples and Comparative Examples were evaluated for abrasion resistance and optical characteristics including reflectance, transparency, and haze as follows:

1)抗划伤性的评测1) Evaluation of scratch resistance

用钢丝绒(#0000)在1kg的载荷下各种涂膜10次,然后评测出现的刮伤。Each coating film was tested 10 times with steel wool (#0000) under a load of 1 kg, and then the occurrence of scratches was evaluated.

2)反射率的评测2) Evaluation of reflectivity

用黑色处理涂膜的背侧,然后使用Solid Spec.3700分光光度计(Shimadzu)测量反射率以测定取决于最小反射率的减反射性能。The back side of the coating film was treated with black, and then the reflectance was measured using a Solid Spec. 3700 spectrophotometer (Shimadzu) to determine the antireflection performance depending on the minimum reflectance.

3)透明度和雾度的评测3) Evaluation of transparency and haze

使用HR-100(Murakami,日本)来评测涂膜的透明度和雾度。Transparency and haze of the coating films were evaluated using HR-100 (Murakami, Japan).

反射率、透明度和雾度的评测结果显示在下表2和3中。The evaluation results of reflectance, transparency and haze are shown in Tables 2 and 3 below.

[表2][Table 2]

Figure GPA00001137545200191
Figure GPA00001137545200191

[表3][table 3]

Figure GPA00001137545200192
Figure GPA00001137545200192

如表2和3所示,在实施例1至14中制备的涂膜显现出了良好的抗划伤性从而具有优异的耐磨性,并显现出优异的光学特性(包括反射率、透明度和雾度)。同时,与实施例的那些涂膜相比,在对比实施例1和4至6中制备的涂膜显现出了较差的光学特性(包括透明度和雾度)。由于在对比实施例2和3中制备的涂膜显现除了较差的抗划伤性,所以需要另外的硬涂覆工艺。因此,出现加工效率降低的问题。As shown in Tables 2 and 3, the coating films prepared in Examples 1 to 14 exhibited good scratch resistance to have excellent abrasion resistance, and exhibited excellent optical properties (including reflectivity, transparency and haze). Meanwhile, the coating films prepared in Comparative Examples 1 and 4 to 6 exhibited inferior optical characteristics (including transparency and haze) compared with those of Examples. Since the coating films prepared in Comparative Examples 2 and 3 exhibited poor scratch resistance, an additional hard coating process was required. Therefore, there arises a problem that processing efficiency decreases.

根据实施例和对比实施例,根据本发明的减反射膜能够通过一步涂覆法来制备,从而提高了加工效率并降低了生产成本,并实现了优异的减反射特性和耐磨性。According to Examples and Comparative Examples, the antireflection film according to the present invention can be prepared by a one-step coating method, thereby improving processing efficiency and reducing production cost, and achieving excellent antireflection characteristics and abrasion resistance.

参照优选的实施方式已经描述了本发明,尽管在本申请中采用了具体的术语,但本发明的范围并不局限于这些具体的实施方式,而应在随附权利要求的基础上理解该范围。The present invention has been described with reference to preferred embodiments, and although specific terminology has been used in this application, the scope of the present invention is not limited to these specific embodiments, but should be understood on the basis of the appended claims .

Claims (22)

1.一种用于减反射的涂料组合物,其包含折射率为1.2至1.45的低折射材料和折射率为1.46至2的高折射树脂,其中,两种材料间的表面能差异为5mN/m以上。1. A coating composition for antireflection, comprising a low-refractive material with a refractive index of 1.2 to 1.45 and a high-refractive resin with a refractive index of 1.46 to 2, wherein the surface energy difference between the two materials is 5mN/ more than m. 2.根据权利要求1所述的用于减反射的涂料组合物,其中,所述低折射材料的表面能为25mN/m以下。2. The coating composition for antireflection according to claim 1, wherein the surface energy of the low refractive material is 25 mN/m or less. 3.根据权利要求1所述的用于减反射的涂料组合物,其中,所述低折射材料为热固性树脂而所述高折射材料为UV固化树脂。3. The coating composition for antireflection according to claim 1, wherein the low refractive material is a thermosetting resin and the high refractive material is a UV curable resin. 4.根据权利要求3所述的用于减反射的涂料组合物,其中,所述低折射材料包含选自引起溶胶-凝胶反应的烷氧基硅烷反应物、氨基甲酸酯反应基化合物、脲反应基化合物和酯化反应物中的一种或多种。4. The coating composition for antireflection according to claim 3, wherein the low refractive material comprises an alkoxysilane reactant, a carbamate reactive group compound, One or more of urea-reactive compound and esterification reactant. 5.根据权利要求3所述的用于减反射的涂料组合物,其中,所述高折射材料包含丙烯酸酯树脂、光敏引发剂和溶剂。5. The coating composition for antireflection according to claim 3, wherein the high refractive material comprises an acrylate resin, a photoinitiator and a solvent. 6.根据权利要求1所述的用于减反射的涂料组合物,其中,基于100重量份的总的所述涂料组合物,所述高折射材料的含量为10至90重量份而所述低折射材料的含量为5至80重量份。6. The coating composition for antireflection according to claim 1, wherein, based on 100 parts by weight of the total coating composition, the content of the high refractive material is 10 to 90 parts by weight and the low The content of the refraction material is 5 to 80 parts by weight. 7.根据权利要求1所述的用于减反射的涂料组合物,其中,所述低折射材料和高折射材料的固化产品的折射率的差异为0.01以上。7. The coating composition for antireflection according to claim 1, wherein a difference in refractive index of cured products of the low-refractive material and the high-refractive material is 0.01 or more. 8.根据权利要求1所述的用于减反射的涂料组合物,其中,所述用于减反射的涂料组合物进一步包含氟化化合物和纳米粒子分散液中的至少一种。8. The coating composition for antireflection according to claim 1, wherein the coating composition for antireflection further comprises at least one of a fluorinated compound and a nanoparticle dispersion. 9.根据权利要求8所述的用于减反射的涂料组合物,其中,所述氟化化合物的折射率为1.5以下,其分子量比所述低折射材料的分子量小,并且表面能在高折射材料和低折射材料的表面能之间。9. The coating composition for antireflection according to claim 8, wherein the refractive index of the fluorinated compound is 1.5 or less, its molecular weight is smaller than that of the low refractive material, and its surface energy is at a high refractive index. Between the surface energy of the material and the low refractive material. 10.根据权利要求8所述的用于减反射的涂料组合物,其中,所述纳米粒子分散液包含平均粒度为1,000nm以下的纳米粒子。10. The coating composition for antireflection according to claim 8, wherein the nanoparticle dispersion liquid contains nanoparticles having an average particle size of 1,000 nm or less. 11.根据权利要求8所述的用于减反射的涂料组合物,其中,所述纳米粒子分散液的折射率为1.45以下。11. The coating composition for antireflection according to claim 8, wherein the nanoparticle dispersion has a refractive index of 1.45 or less. 12.根据权利要求10所述的用于减反射的涂料组合物,其中,所述纳米粒子分散液进一步包含增强分散的螯合剂、氟化丙烯酸酯和溶剂。12. The coating composition for antireflection according to claim 10, wherein the nanoparticle dispersion liquid further comprises a dispersion-enhancing chelating agent, a fluorinated acrylate, and a solvent. 13.根据权利要求10所述的用于减反射的涂料组合物,其中,所述纳米粒子为金属氟化物或者为有机/无机中空或多孔的粒子。13. The coating composition for antireflection according to claim 10, wherein the nanoparticles are metal fluorides or organic/inorganic hollow or porous particles. 14.一种制备减反射膜的方法,其包括下面的步骤:14. A method for preparing an antireflection film, comprising the steps of: a)制备根据权利要求1至13中任一项所述的用于减反射的涂料组合物;a) preparing the coating composition for antireflection according to any one of claims 1 to 13; b)将所述涂料组合物涂覆在基板上以形成涂层;b) applying the coating composition to a substrate to form a coating; c)干燥所述涂层以使低折射材料和高折射材料相分离;以及c) drying the coating to phase separate the low and high refractive materials; and d)固化干燥的涂层。d) Curing the dried coating. 15.根据权利要求14所述的制备减反射膜的方法,其中,在步骤b)中,干燥的涂层的厚度为1至30μm。15. The method for preparing an anti-reflection film according to claim 14, wherein, in step b), the thickness of the dried coating is 1 to 30 μm. 16.根据权利要求14所述的制备减反射膜的方法,其中,所述低折射材料为热固性树脂而所述高折射材料为UV固化树脂,并且步骤d)包括以下步骤:d1)以0.1至2J/cm2的剂量通过辐照UV 1至600秒来固化所述高折射-UV固化树脂;和d2)在20至200℃的温度下固化所述低折射-热固性树脂1至72小时。16. The method for preparing an anti-reflection film according to claim 14, wherein, the low refractive material is a thermosetting resin and the high refractive material is a UV curable resin, and step d) comprises the following steps: d1) in the range of 0.1 to Curing the high refraction-UV curable resin by irradiating UV for 1 to 600 seconds at a dose of 2 J/cm 2 ; and d2) curing the low refraction-thermosetting resin at a temperature of 20 to 200° C. for 1 to 72 hours. 17.一种减反射膜,其采用根据权利要求1至13中任一项所述的用于减反射的涂料组合物来制备,其中,所述减反射膜包括单层涂层,在该单层涂层中所述低折射材料和高折射材料在厚度方向上具有浓度梯度。17. An antireflection film, which is prepared using the coating composition for antireflection according to any one of claims 1 to 13, wherein the antireflection film comprises a single-layer coating, in which The low-refractive material and the high-refractive material in the layer coating have concentration gradients in the thickness direction. 18.根据权利要求17所述的减反射膜,其中,所述减反射膜通过包括下列步骤的方法制备:a)制备用于减反射的涂料组合物,其含有折射率为1.2至1.45的低折射树脂和折射率为1.46至2的高折射材料,并且两种材料间的表面能差异为5mN/m以上;18. The antireflection film according to claim 17, wherein the antireflection film is prepared by a method comprising the steps of: a) preparing a coating composition for antireflection, which contains a low Refractive resins and high-refractive materials with a refractive index of 1.46 to 2, and the difference in surface energy between the two materials is more than 5mN/m; b)将所述涂料组合物涂覆在基板上以形成涂层;b) applying the coating composition to a substrate to form a coating; c)干燥所述涂层以使所述低折射材料和高折射材料相分离;以及c) drying the coating to phase separate the low and high refractive materials; and d)固化干燥的涂层。d) Curing the dried coating. 19.根据权利要求17所述的减反射膜,其中,基于所述低折射材料的总重量,在从所述单层涂层面向空气的表面起在厚度方向相当于50%的区域内包含的低折射材料为70%以上。19. The antireflection film according to claim 17, wherein, based on the total weight of the low-refractive material, contained in an area corresponding to 50% in the thickness direction from the air-facing surface of the single-layer coating The low refractive material is more than 70%. 20.根据权利要求17所述的减反射膜,其中,反射率低于3%。20. The antireflection film according to claim 17, wherein the reflectance is lower than 3%. 21.一种偏光片,其包括:a)偏光膜;和b)权利要求17的减反射膜。21. A polarizer comprising: a) a polarizing film; and b) the antireflection film of claim 17. 22.一种显示器件,其包括根据权利要求17所述的减反射膜。22. A display device comprising the antireflection film according to claim 17.
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Cited By (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN102061111A (en) * 2010-10-27 2011-05-18 中山市旌旗纳米材料科技有限公司 Self-cleaning ceramic nano-glass anti-reflection paint manufacturing method and its anti-reflection film manufacturing method
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CN107652718A (en) * 2017-09-27 2018-02-02 广东星弛光电科技有限公司 A kind of antireflective coating liquid and preparation method thereof
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US10627547B2 (en) 2016-03-09 2020-04-21 Lg Chem, Ltd. Anti-reflective film
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Families Citing this family (17)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR101144932B1 (en) * 2009-09-04 2012-05-11 위더스케미칼 주식회사 Composition for hard coating and method of preparing the same and hard coating film produced by using the same
DE102010012841A1 (en) * 2010-03-25 2011-09-29 Schott Ag Method for applying an antireflection coating and glass with an antireflection coating
KR101092573B1 (en) * 2010-04-06 2011-12-13 주식회사 엘지화학 Composition for antireflective coating, antireflective film and method for producing same
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JP5810504B2 (en) * 2010-10-18 2015-11-11 Jnc株式会社 Laminated body and method for producing the same
EP2749607B1 (en) 2011-08-26 2019-04-17 LG Chem, Ltd. Composition for anti-glare coating and anti-glare film manufactured by using same
EP2784131B1 (en) 2011-11-25 2017-03-01 LG Chem, Ltd. Resin blend and pellet
KR101470468B1 (en) 2013-03-15 2014-12-08 주식회사 엘지화학 Plastic film
KR102118369B1 (en) * 2015-07-29 2020-06-03 주식회사 엘지화학 The compositions using conductive film
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WO2022249730A1 (en) * 2021-05-26 2022-12-01 ステラケミファ株式会社 Liquid dispersion of fluoride particles, composition for forming optical film, and optical film

Family Cites Families (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CA2162451A1 (en) * 1994-12-22 1996-06-23 John P. Murphy Anti-reflective clarifier film for eyeglasses
KR100642708B1 (en) * 1999-03-31 2006-11-10 다이셀 가가꾸 고교 가부시끼가이샤 Light Scattering Sheet, Light Scattering Composite Sheet, and Liquid Crystal Display Device
KR100768176B1 (en) * 2001-02-07 2007-10-17 삼성에스디아이 주식회사 Functional thin film with optical and electrical properties
WO2003027189A1 (en) * 2001-09-04 2003-04-03 Dai Nippon Printing Co., Ltd. Coating composition, coating formed therefrom, anti-reflection coating, anti-reflection film, and image display device
US20060074172A1 (en) * 2002-09-19 2006-04-06 Optimax Technology Corporation Antiglare and antireflection coatings of surface active nanoparticles
JP2004143202A (en) * 2002-10-22 2004-05-20 Toyo Ink Mfg Co Ltd Active energy ray-curable composition, method for forming cured film using the same, cured product thereof, and antireflective body
EP1418448A1 (en) * 2002-11-06 2004-05-12 Koninklijke DSM N.V. Preparation of a mechanically durable single layer coating with anti-reflective properties
JP4393232B2 (en) * 2004-03-09 2010-01-06 富士フイルム株式会社 Method for producing antireflection film
US7264872B2 (en) * 2004-12-30 2007-09-04 3M Innovative Properties Company Durable high index nanocomposites for AR coatings
US20060147614A1 (en) * 2004-12-30 2006-07-06 3M Innovative Properties Company Transferable antireflection material for use on optical display
US7323514B2 (en) * 2004-12-30 2008-01-29 3M Innovative Properties Company Low refractive index fluoropolymer coating compositions for use in antireflective polymer films
JP5075333B2 (en) * 2005-11-11 2012-11-21 富士フイルム株式会社 Optical film, polarizing plate, and image display device
KR20070075937A (en) 2006-01-17 2007-07-24 도레이새한 주식회사 Antireflection film
JP5049628B2 (en) * 2006-03-30 2012-10-17 富士フイルム株式会社 Coating composition, optical film, polarizing plate, image display device, and method for producing optical film

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