CN1016185B - Copper-chromium iron vacuum contact material - Google Patents
Copper-chromium iron vacuum contact materialInfo
- Publication number
- CN1016185B CN1016185B CN 90108738 CN90108738A CN1016185B CN 1016185 B CN1016185 B CN 1016185B CN 90108738 CN90108738 CN 90108738 CN 90108738 A CN90108738 A CN 90108738A CN 1016185 B CN1016185 B CN 1016185B
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- Prior art keywords
- copper
- chromium
- contact material
- alloy
- iron
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- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
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- 239000000463 material Substances 0.000 title claims abstract description 37
- WHTMVEKFWMRAJC-UHFFFAOYSA-N [Cu].[Cr].[Fe] Chemical compound [Cu].[Cr].[Fe] WHTMVEKFWMRAJC-UHFFFAOYSA-N 0.000 title abstract description 9
- 239000000203 mixture Substances 0.000 claims description 10
- 239000000126 substance Substances 0.000 claims description 8
- GXDVEXJTVGRLNW-UHFFFAOYSA-N [Cr].[Cu] Chemical compound [Cr].[Cu] GXDVEXJTVGRLNW-UHFFFAOYSA-N 0.000 abstract description 14
- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 abstract description 11
- 238000003466 welding Methods 0.000 abstract description 11
- 229910045601 alloy Inorganic materials 0.000 abstract description 10
- 239000000956 alloy Substances 0.000 abstract description 10
- 238000005245 sintering Methods 0.000 abstract description 9
- 238000000034 method Methods 0.000 abstract description 8
- 229910000599 Cr alloy Inorganic materials 0.000 abstract description 6
- 239000000788 chromium alloy Substances 0.000 abstract description 6
- 238000007731 hot pressing Methods 0.000 abstract description 5
- 238000001764 infiltration Methods 0.000 abstract description 5
- 230000008595 infiltration Effects 0.000 abstract description 5
- 229910052742 iron Inorganic materials 0.000 abstract description 5
- 239000011812 mixed powder Substances 0.000 abstract description 5
- 229910052751 metal Inorganic materials 0.000 abstract description 3
- 229910000640 Fe alloy Inorganic materials 0.000 abstract description 2
- 239000010970 precious metal Substances 0.000 abstract 1
- VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical group [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 description 15
- 229910052804 chromium Inorganic materials 0.000 description 13
- 239000011651 chromium Substances 0.000 description 13
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 9
- 229910052802 copper Inorganic materials 0.000 description 8
- 239000010949 copper Substances 0.000 description 8
- 238000004519 manufacturing process Methods 0.000 description 5
- QAAXRTPGRLVPFH-UHFFFAOYSA-N [Bi].[Cu] Chemical compound [Bi].[Cu] QAAXRTPGRLVPFH-UHFFFAOYSA-N 0.000 description 3
- 230000007797 corrosion Effects 0.000 description 3
- 238000005260 corrosion Methods 0.000 description 3
- 238000002844 melting Methods 0.000 description 3
- 230000008018 melting Effects 0.000 description 3
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 2
- 229910002056 binary alloy Inorganic materials 0.000 description 2
- SBYXRAKIOMOBFF-UHFFFAOYSA-N copper tungsten Chemical compound [Cu].[W] SBYXRAKIOMOBFF-UHFFFAOYSA-N 0.000 description 2
- 239000007789 gas Substances 0.000 description 2
- 239000002184 metal Substances 0.000 description 2
- 229910052758 niobium Inorganic materials 0.000 description 2
- 239000010955 niobium Substances 0.000 description 2
- GUCVJGMIXFAOAE-UHFFFAOYSA-N niobium atom Chemical compound [Nb] GUCVJGMIXFAOAE-UHFFFAOYSA-N 0.000 description 2
- 229910052715 tantalum Inorganic materials 0.000 description 2
- GUVRBAGPIYLISA-UHFFFAOYSA-N tantalum atom Chemical compound [Ta] GUVRBAGPIYLISA-UHFFFAOYSA-N 0.000 description 2
- 229910000604 Ferrochrome Inorganic materials 0.000 description 1
- 229910001182 Mo alloy Inorganic materials 0.000 description 1
- ZOKXTWBITQBERF-UHFFFAOYSA-N Molybdenum Chemical compound [Mo] ZOKXTWBITQBERF-UHFFFAOYSA-N 0.000 description 1
- XRCFPDSYKVZVGI-UHFFFAOYSA-N [Mo].[Cr].[Cu] Chemical compound [Mo].[Cr].[Cu] XRCFPDSYKVZVGI-UHFFFAOYSA-N 0.000 description 1
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 1
- 230000009286 beneficial effect Effects 0.000 description 1
- 229910052797 bismuth Inorganic materials 0.000 description 1
- JCXGWMGPZLAOME-UHFFFAOYSA-N bismuth atom Chemical compound [Bi] JCXGWMGPZLAOME-UHFFFAOYSA-N 0.000 description 1
- UPHIPHFJVNKLMR-UHFFFAOYSA-N chromium iron Chemical compound [Cr].[Fe] UPHIPHFJVNKLMR-UHFFFAOYSA-N 0.000 description 1
- 230000000052 comparative effect Effects 0.000 description 1
- 238000000280 densification Methods 0.000 description 1
- 230000004927 fusion Effects 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- 238000009413 insulation Methods 0.000 description 1
- 238000003754 machining Methods 0.000 description 1
- 150000002739 metals Chemical class 0.000 description 1
- 229910052750 molybdenum Inorganic materials 0.000 description 1
- 239000011733 molybdenum Substances 0.000 description 1
- 229910052757 nitrogen Inorganic materials 0.000 description 1
- 229910052760 oxygen Inorganic materials 0.000 description 1
- 239000001301 oxygen Substances 0.000 description 1
- 239000002985 plastic film Substances 0.000 description 1
- 229920006255 plastic film Polymers 0.000 description 1
- 239000000843 powder Substances 0.000 description 1
- 229910002058 ternary alloy Inorganic materials 0.000 description 1
- WFKWXMTUELFFGS-UHFFFAOYSA-N tungsten Chemical compound [W] WFKWXMTUELFFGS-UHFFFAOYSA-N 0.000 description 1
- 229910052721 tungsten Inorganic materials 0.000 description 1
- 239000010937 tungsten Substances 0.000 description 1
Images
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- Contacts (AREA)
- High-Tension Arc-Extinguishing Switches Without Spraying Means (AREA)
Abstract
本发明系铜铬基合金。主要适用于真空断路器触头材料。其特征是在铜-铬合金基础上加铁，形成铜-铬-铁合金。它采用混粉烧结热压法或熔渗法制成触头材料。不仅具有高的机械强度、低的熔焊倾向和低的截流值，而且分断电流大，分断电压高，可以制备更高电压和更高电流等级的真空断路器。同时，由于合金中不含贵重金属元素，故成本低。The present invention is a copper-chromium-based alloy. It is mainly suitable for vacuum circuit breaker contact materials. It is characterized in that iron is added on the basis of copper-chromium alloy to form copper-chromium-iron alloy. It adopts mixed powder sintering hot pressing method or infiltration method to make contact material. It not only has high mechanical strength, low welding tendency and low cut-off value, but also has large breaking current and high breaking voltage, and can prepare vacuum circuit breakers with higher voltage and higher current levels. At the same time, since the alloy does not contain precious metal elements, the cost is low.
Description
本发明属于铜-铬基合金。主要适用于真空断器路的触头材料。The invention belongs to copper-chromium base alloy. Mainly suitable for contact material of vacuum breaker circuit.
真空断路器由于它的一系列优点而日益被广泛地应用于各工业部门，已成为目前中、高开关电器的主要发展方向。它要求触头材料具有高的绝缘强度、大的开断能力、小的电腐蚀，高的机械强度、低的熔焊倾向、低的截流值和能维持空真空下的可靠操作等。Due to its series of advantages, vacuum circuit breakers are increasingly widely used in various industrial sectors, and have become the main development direction of medium and high-level switching appliances. It requires the contact material to have high dielectric strength, large breaking capacity, small electrical corrosion, high mechanical strength, low welding tendency, low cut-off value and reliable operation under vacuum.
目前使用的真空触头材料有铜-钨、铜-铋及铜-铬等。铜-钨触头具有高的绝缘强度、小的电腐蚀和好的机械性能，但当开断大电流时，由于钨的高的热电子发射作用而产生开断失败。因此只能用于小于10KA的较小开断电流的场合（特开昭55-78429）。铜-铋触头具有好的抗熔焊能力和高的导电性能，但由于铋的低熔点和高的挥发性，铜-铋触头的绝缘强度较低，电腐蚀大，不宜用于电压较高、电流较大的真空断路器。铜-铬合金是目前用得最多的真空断路器触头材料，它具有比较好的综合性能，能够满足大部分真空断路器的使用要求。但目前使用的铜-铬真空触头仍存在抗熔焊性能较差、截流值较高和材料的相对密度较低等缺点。The vacuum contact materials currently used include copper-tungsten, copper-bismuth and copper-chromium. Copper-tungsten contacts have high dielectric strength, small electrical corrosion and good mechanical properties, but when breaking a large current, breaking failure occurs due to the high thermal electron emission of tungsten. Therefore, it can only be used in occasions with a small breaking current of less than 10KA (Japanese Patent Laid-Open No. 55-78429). Copper-bismuth contacts have good welding resistance and high electrical conductivity, but due to the low melting point and high volatility of bismuth, the copper-bismuth contacts have low insulation strength and high electrical corrosion, so they are not suitable for use in high-voltage applications. High, high current vacuum circuit breaker. Copper-chromium alloy is currently the most widely used contact material for vacuum circuit breakers. It has relatively good comprehensive performance and can meet the requirements of most vacuum circuit breakers. However, the currently used copper-chromium vacuum contacts still have disadvantages such as poor anti-welding performance, high interception value and low relative density of materials.
中国发明专利申请公开说明书CN85108080A提供了另一种真空触头材料，它是在铜铬钼合金中加入铌或钽，可以提高其分断特性和耐电压特性。它的耐电压性能为铜-铬触头的1.2-1.5倍，分断电压为7.2KV和12.5KV。但这种触头的分断电压仍不能满足更高电压的分断要求;另外，钼、铌、钽均为价格昂贵的稀有金属，故该触头材料成本高。Chinese Invention Patent Application Publication No. CN85108080A provides another vacuum contact material, which adds niobium or tantalum to copper-chromium-molybdenum alloy, which can improve its breaking characteristics and withstand voltage characteristics. Its withstand voltage performance is 1.2-1.5 times that of copper-chromium contacts, and its breaking voltage is 7.2KV and 12.5KV. However, the breaking voltage of this contact still cannot meet the breaking requirements of higher voltages; in addition, molybdenum, niobium, and tantalum are all expensive rare metals, so the cost of the contact material is high.
本发明的目的在于提供一种新的真空断路器触头材料，该触头材料不仅绝缘强度和机械强度高，熔焊倾向小和截流值低，而且分断电流大，分断电压更高，能用于更高电压等级的真空断路器。The object of the present invention is to provide a new contact material for a vacuum circuit breaker. The contact material not only has high dielectric strength and mechanical strength, but also has a small welding tendency and a low interception value, and has a large breaking current and a higher breaking voltage. Vacuum circuit breakers at higher voltage levels.
针对上述目的，本发明提供了一种铜-铬-铁系的新触头材料，在铜铬合金基础上加铁。In view of the above purpose, the present invention provides a new contact material of copper-chromium-iron system, in which iron is added on the basis of copper-chromium alloy.
铜作为基本的合金组元，提供了好的导电导热性能及其它基本性能，满足触头材料可通过足够大的电流能力。另一个主要组元是铬，它具有较铜高得多的熔点和强度，并少量溶解铜，提高触头材料的机械强度、高温性能、抗电弧能力和耐电压性能;同时，铬与氧、氮等气体元素具有高的化学亲和力，使之作为触头材料，在真空开关管内具有吸气和保持高真空度的重要作用。第三个组元为铁，它的熔点高于铜低于铬，因此，在同样的烧结或熔渗温度下，它较铬更易扩散溶解于铜，并与铬形成铁铬合金，这样，分别提高了铜相和铬相的硬度和强度，进一步提高触头材料的机械强度、抗电弧能力和耐电压性能;而且，铁还同时与铬及铜形成合金，使触头材料无论在烧结或熔渗时提高合金的致密化程度，得到高密度的材料，同时，由于铁与铜及铬形成了较硬和较脆的合金，当真空开关分断时，降低了所需的分断力，即改进了触头材料的抗熔焊性能;此外，根据触头材料截流值的规律，三元合金的截流值低于二元合金的截流值，故本发明铜-铬-铁触头材料的截流值较铜-铬等触头材料进一步降低。Copper, as a basic alloy component, provides good electrical and thermal conductivity and other basic properties to meet the ability of the contact material to pass a large enough current. Another main component is chromium, which has a much higher melting point and strength than copper, and dissolves copper in a small amount to improve the mechanical strength, high temperature performance, arc resistance and voltage resistance of the contact material; at the same time, chromium and oxygen, Nitrogen and other gas elements have a high chemical affinity, so that as a contact material, they play an important role in getting gas and maintaining high vacuum in the vacuum switch tube. The third component is iron, whose melting point is higher than that of copper and lower than that of chromium. Therefore, at the same sintering or infiltration temperature, it is easier to diffuse and dissolve in copper than chromium, and forms an iron-chromium alloy with chromium. In this way, respectively The hardness and strength of the copper phase and the chromium phase are improved, and the mechanical strength, arc resistance and voltage resistance of the contact material are further improved; moreover, iron also forms an alloy with chromium and copper at the same time, so that the contact material can be sintered or melted Infiltration increases the densification of the alloy to obtain a high-density material. At the same time, because iron, copper and chromium form a harder and brittle alloy, when the vacuum switch is broken, the required breaking force is reduced, that is, improved. The welding resistance of the contact material; in addition, according to the law of the cut-off value of the contact material, the cut-off value of the ternary alloy is lower than that of the binary alloy, so the cut-off value of the copper-chromium-iron contact material of the present invention is lower than that of the binary alloy. Contact materials such as copper-chromium are further reduced.
综上所述，本发明真空触头材料的具体化学成分（重量%）为Cu47-72%，Cr25-51%，Fe2-6%。To sum up, the specific chemical composition (weight %) of the vacuum contact material of the present invention is Cu47-72%, Cr25-51%, Fe2-6%.
本发明所述的真空触头材料采用混粉烧结热压法或熔渗法制成。混粉烧结热压法是将铜粉、铬粉、铁粉或铬铁合金粉按设计成分范围进行配料，然后在混合器中充分混合均匀，并在金属模或塑料膜中压型，所压制的坯料放进烧结炉中烧结，烧结温度为900-1200℃，时间1-3小时，烧结后的坯料在适当加热情况下进行热压或热锻，由此制成相对密度超过99%理论密度的真空触头材料，经机加工后制成真空触头。The vacuum contact material of the present invention is made by mixed powder sintering hot pressing method or infiltration method. The mixed powder sintering hot pressing method is to mix copper powder, chromium powder, iron powder or ferrochrome alloy powder according to the design composition range, then fully mix them in a mixer, and press them in a metal mold or plastic film. The billet is put into a sintering furnace for sintering, the sintering temperature is 900-1200°C, and the time is 1-3 hours. The sintered billet is hot-pressed or hot-forged under appropriate heating conditions, thereby making a relative density exceeding 99% of the theoretical density. Vacuum contact material, made into vacuum contacts after machining.
根据上述化学成分范围和生产方法所制成的真空触头材料，其密度为7.8-8.3g/cm3，相对密度达99.2-99.6%，硬度HB可达140，所制成的触头，其分断电流可达40KA，分断电压可达36KV。According to the above chemical composition range and production method, the vacuum contact material has a density of 7.8-8.3g/cm 3 , a relative density of 99.2-99.6%, and a hardness of HB of 140. The breaking current can reach 40KA, and the breaking voltage can reach 36KV.
与现有技术相比，本发明具有如下优点：Compared with prior art, the present invention has following advantage:
1.相对密度高，可达99.6%，有利于提高材料 的机械性能和电性能等。1. The relative density is high, up to 99.6%, which is beneficial to improve the material mechanical and electrical properties, etc.
2.机械强度高，硬度HB可达140。2. High mechanical strength, hardness HB can reach 140.
3.分断电流大，可达40KA，分断电压高，可达36KV，因而可制成更高电压和更高电流等级的真空断路器。3. The breaking current is large, up to 40KA, and the breaking voltage is high, up to 36KV, so it can be made into a vacuum circuit breaker with higher voltage and higher current level.
4.合金的熔焊倾向小，截流值低。4. The fusion welding tendency of the alloy is small, and the cut-off value is low.
5.合金成分中，没有贵重元素，因而成本低。5. There are no precious elements in the alloy composition, so the cost is low.
下面结合附图和实施例对本发明进一步说明。The present invention will be further described below in conjunction with the accompanying drawings and embodiments.
附图1为本发明铜-铬-铁触头材料与比较的铜-铬触头材料在相应铬含量下的绝缘强度（冲击耐电压强度）。图中，横座标为铬含量（重量%）。纵座标为冲击电压值（KV），1为铜-铬-铁合金，2为铜-铬合金。由图看出，在相同的含铬量下，铜-铬-铁触头材料的冲击电压值比铜-铬合金高得多。
附图2为本发明铜-铬-铁触头材料与比较的铜-铬触头材料在相应铬含量下的熔焊强度，图中，横座标为铬含量（重量%），纵座标为熔焊强度（KN），3为铜-铬-铁触头材料，4为铜-铬触头材料。由图看出，在同-铬含量下前者的熔焊强度比后者低得多，即前者的熔焊倾向小。
实施例Example
根据本发明所提供的化学成分范围和生产方法制备了5批真空触头材料。其具体化学成分、生产方法和性能指标分别如表1、表2所示。Five batches of vacuum contact materials were prepared according to the chemical composition range and production method provided by the present invention. Its specific chemical composition, production method and performance indicators are shown in Table 1 and Table 2, respectively.
表1 实施例的化学成分（重量%）及生产方法Chemical composition (weight %) and production method of table 1 embodiment
批量 化学成分（重量%）Batch chemical composition (wt%)
Cu Cr Fe 生产方法Cu Cr Fe production method
1 72 26 2 混粉烧结热压法1 72 26 2 Mixed powder sintering hot pressing method
2 48 47 5 ″2 48 47 5 ″
3 65 32 3 ″3 65 32 3 ″
4 47 47 6 熔渗法4 47 47 6 Infiltration method
5 56 40 4 混粉烧结热压法5 56 40 4 Mixed powder sintering hot pressing method
表2 实施例的性能指标Table 2 The performance indicators of the embodiment
批号 密度 硬度 导电率 实际使用开电压Batch No. Density Hardness Conductivity Actual Voltage
g/Cm3相对% HB m/Ωmm2KVg/Cm 3 Relative % HB m/Ωmm 2 KV
1 8.28 99.2 79 25.6 27.51 8.28 99.2 79 25.6 27.5
2 7.92 99.6 131 12.2 352 7.92 99.6 131 12.2 35
3 8.17 99.3 98 21.4 27.53 8.17 99.3 98 21.4 27.5
4 7.88 99.2 136 11.9 354 7.88 99.2 136 11.9 35
5 8.02 99.3 107 15.3 355 8.02 99.3 107 15.3 35
Claims (1)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
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| CN 90108738 CN1016185B (en) | 1990-11-03 | 1990-11-03 | Copper-chromium iron vacuum contact material |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN 90108738 CN1016185B (en) | 1990-11-03 | 1990-11-03 | Copper-chromium iron vacuum contact material |
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| CN1050223A CN1050223A (en) | 1991-03-27 |
| CN1016185B true CN1016185B (en) | 1992-04-08 |
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| CN100355924C (en) * | 2003-09-05 | 2007-12-19 | 上海材料研究所 | Tungsten copper functional composite material and its preparation technology |
| AT11814U1 (en) * | 2010-08-03 | 2011-05-15 | Plansee Powertech Ag | METHOD FOR THE POWDER METALLURGIC MANUFACTURE OF A CU-CR MATERIAL |
| US9875869B2 (en) * | 2014-10-13 | 2018-01-23 | Eaton Corporation | Composite arc shields for vacuum interrupters and methods for forming same |
| CN109351977B (en) * | 2018-10-18 | 2020-03-31 | 西安交通大学 | Preparation method of iron core-containing copper-chromium contact material |
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1990
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