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CN101609238B - Pixel array substrate with color filter array and display panel - Google Patents

Pixel array substrate with color filter array and display panel Download PDF

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CN101609238B
CN101609238B CN2009101576332A CN200910157633A CN101609238B CN 101609238 B CN101609238 B CN 101609238B CN 2009101576332 A CN2009101576332 A CN 2009101576332A CN 200910157633 A CN200910157633 A CN 200910157633A CN 101609238 B CN101609238 B CN 101609238B
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color filter
light
area
substrate
pixel
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CN101609238A (en
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曾庆安
侯鸿龙
李佳育
黄彦衡
陈宗凯
陈介伟
林以尊
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AUO Corp
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AU Optronics Corp
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Abstract

The invention provides a pixel array substrate with a color filter array and a display panel. The substrate is provided with a plurality of pixel areas and a shading area. The active element array is positioned on the substrate. The color filter array is arranged on the substrate. The color filter array comprises a light shielding pattern layer and a plurality of color filter patterns, wherein the light shielding pattern layer is positioned in the light shielding area. The color filter patterns are respectively positioned in the pixel areas and extend from the pixel areas to the shading areas, wherein the color filter patterns extending from the adjacent pixel areas form a laminated structure in the shading areas. The pixel electrode layer is electrically connected with the active element array. Therefore, the pixel array substrate with the color filter array has the advantages of meeting both the process requirements and the optical density of the product.

Description

具有彩色滤光阵列的像素阵列基板以及显示面板Pixel array substrate with color filter array and display panel

技术领域 technical field

本发明是有关于一种基板以及显示装置面板,且特别是有关于一种具有彩色滤光阵列的像素阵列基板以及显示面板。The present invention relates to a substrate and a display device panel, and in particular to a pixel array substrate with a color filter array and a display panel.

背景技术 Background technique

液晶显示器具有高画质、体积小、重量轻、低电压驱动、低消耗功率及应用范围广等优点,因此其已取代阴极射线管(cathode ray tube,CRT)成为新一代显示器的主流。传统的液晶显示面板是由一彩色滤光基板(color filter)、一薄膜晶体管阵列基板(thin film transistor array substrate,TFT array substrate)以及一配置于此两基板间的液晶层(liquid crystal layer)所构成。然而,此种液晶显示面板在进行彩色滤光基板与薄膜晶体管阵列基板接合时容易有对位误差(misalignment)。Liquid crystal display has the advantages of high image quality, small size, light weight, low voltage drive, low power consumption and wide application range, so it has replaced cathode ray tube (cathode ray tube, CRT) to become the mainstream of the new generation of display. A traditional liquid crystal display panel is composed of a color filter substrate (color filter), a thin film transistor array substrate (thin film transistor array substrate, TFT array substrate), and a liquid crystal layer (liquid crystal layer) arranged between the two substrates. constitute. However, this liquid crystal display panel is prone to misalignment when the color filter substrate and the thin film transistor array substrate are bonded.

为了改善上述问题,已知技术提出了一种由一具有彩色滤光层的薄膜晶体管阵列基板(color filter on array substrate,COA substrate)、一对向基板、多个间隙物以及一液晶层所组成的液晶显示面板。间隙物与液晶层配置于具有彩色滤光层的薄膜晶体管阵列基板与对向基板之间,且间隙物可用以维持具有彩色滤光层的薄膜晶体管阵列基板与对向基板之间的间隙。在此种液晶显示面板中,由于彩色滤光层是直接形成于薄膜晶体管阵列基板上,因此不会产生组立上的对位误差。In order to improve the above problems, the known technology proposes a thin film transistor array substrate (color filter on array substrate, COA substrate) with a color filter layer, a pair of substrates, a plurality of spacers and a liquid crystal layer. LCD display panel. The spacer and the liquid crystal layer are disposed between the TFT array substrate with the color filter layer and the opposite substrate, and the spacer can be used to maintain the gap between the TFT array substrate with the color filter layer and the opposite substrate. In such a liquid crystal display panel, since the color filter layer is directly formed on the thin film transistor array substrate, there will be no alignment error in assembly.

值得注意的是,在此种液晶显示面板的制造过程中,基于工艺上对位精度的考量,黑色矩阵材料层需使用稍具透光度的材料,以使得工艺机台在进行黑色矩阵材料层的图案化工艺前,位于其底下膜层的对位标记(alignmentmark)仍可通过稍具透光度的黑色矩阵材料层而被机台所抓取,藉此可确保不同膜层之间的对位精度。然而,当黑色矩阵材料层基于前述考量而选用稍具透光度的材料时。图案化后的黑色矩阵往往无法达到完全遮光的效果,导致液晶显示面板的对比度下降而影响显示品质。It is worth noting that in the manufacturing process of this kind of liquid crystal display panel, based on the consideration of alignment accuracy in the process, the black matrix material layer needs to use a slightly transparent material, so that the process machine can process the black matrix material layer. Before the patterning process, the alignment mark located on the underlying film layer can still be grasped by the machine through the slightly transparent black matrix material layer, so as to ensure the alignment between different film layers precision. However, when the black matrix material layer selects a material with a little light transmittance based on the foregoing considerations. The patterned black matrix often cannot achieve a complete light-shielding effect, resulting in a decrease in the contrast of the liquid crystal display panel and affecting the display quality.

发明内容 Contents of the invention

本发明提供一种具有彩色滤光阵列的像素阵列基板,其可以在制作过程中提高对位精确度,进而提升良率以及降低成本。The invention provides a pixel array substrate with a color filter array, which can improve the alignment accuracy in the manufacturing process, thereby improving the yield rate and reducing the cost.

本发明提供一种显示面板,其在制作过程中具有优异的对位精确度而制作出高对比度的产品。The present invention provides a display panel, which has excellent alignment accuracy in the manufacturing process to produce high-contrast products.

本发明提供一种具有彩色滤光阵列的像素阵列基板,其包括基板、主动元件阵列、彩色滤光阵列以及像素电极层。基板上具有多个像素区及一遮光区。主动元件阵列位于基板上。彩色滤光阵列设置于基板上,其中彩色滤光阵列包括遮光图案层以及多个彩色滤光图案。遮光图案层位于遮光区。多个彩色滤光图案分别位于像素区中并且自像素区延伸至遮光区,其中自相邻的像素区延伸出的彩色滤光图案于遮光区中构成一迭层结构。像素电极层与主动元件阵列电连接。The invention provides a pixel array substrate with a color filter array, which includes a substrate, an active element array, a color filter array and a pixel electrode layer. There are multiple pixel regions and a light shielding region on the substrate. The active element array is located on the substrate. The color filter array is disposed on the substrate, wherein the color filter array includes a light-shielding pattern layer and a plurality of color filter patterns. The light-shielding pattern layer is located in the light-shielding area. A plurality of color filter patterns are respectively located in the pixel area and extend from the pixel area to the light-shielding area, wherein the color filter patterns extending from adjacent pixel areas form a laminated structure in the light-shielding area. The pixel electrode layer is electrically connected with the active element array.

本发明另提出一种显示面板,其包括具有彩色滤光阵列的像素阵列基板、对向基板以及显示介质。具有彩色滤光阵列的像素阵列基板包括基板、主动元件阵列、彩色滤光阵列以及像素电极层。基板上具有多个像素区以及一遮光区。主动元件阵列位于基板上。彩色滤光阵列设置于基板上,其中彩色滤光阵列包括遮光图案层以及多个彩色滤光图案。遮光图案层位于遮光区。多个彩色滤光图案分别位于像素区中并且自像素区延伸至遮光区,其中自相邻的像素区延伸出的彩色滤光图案于遮光区中构成一迭层结构。像素电极层与主动元件阵列电连接。对向基板位于具有彩色滤光阵列的像素阵列基板的对向侧。显示介质位于具有彩色滤光阵列的像素阵列基板以及对向基板之间。The present invention further provides a display panel, which includes a pixel array substrate with a color filter array, an opposite substrate, and a display medium. A pixel array substrate with a color filter array includes a substrate, an active element array, a color filter array and a pixel electrode layer. There are multiple pixel regions and a light shielding region on the substrate. The active element array is located on the substrate. The color filter array is disposed on the substrate, wherein the color filter array includes a light-shielding pattern layer and a plurality of color filter patterns. The light-shielding pattern layer is located in the light-shielding area. A plurality of color filter patterns are respectively located in the pixel area and extend from the pixel area to the light-shielding area, wherein the color filter patterns extending from adjacent pixel areas form a laminated structure in the light-shielding area. The pixel electrode layer is electrically connected with the active element array. The opposite substrate is located on the opposite side of the pixel array substrate with the color filter array. The display medium is located between the pixel array substrate with the color filter array and the opposite substrate.

本发明的有益效果在于,根据本发明提供的技术方案,在遮光图案层的制作过程中可以选用光学密度稍低的材料进行制作,以提高工艺中膜层间的对位精确度。另一方面,在遮光区的遮光图案层的对应位置上,利用自相邻的像素区延伸出的彩色滤光图案于遮光区中构成一迭层结构,可以辅助遮光区中遮光图案层的遮光效果,提高产品的对比度。The beneficial effect of the present invention is that, according to the technical solution provided by the present invention, materials with a slightly lower optical density can be selected for production during the production process of the light-shielding pattern layer, so as to improve the alignment accuracy between film layers in the process. On the other hand, at the corresponding position of the light-shielding pattern layer in the light-shielding area, a laminated structure is formed in the light-shielding area by using color filter patterns extending from adjacent pixel areas, which can assist the light-shielding of the light-shielding pattern layer in the light-shielding area The effect is to increase the contrast of the product.

附图说明 Description of drawings

图1为本发明一实施例的一种具有彩色滤光阵列的像素阵列基板的局部剖面示意图。FIG. 1 is a schematic partial cross-sectional view of a pixel array substrate with a color filter array according to an embodiment of the present invention.

图2A至图2C分别为本发明一实施例中迭层结构的不同型态的剖面示意图。2A to 2C are respectively schematic cross-sectional views of different types of laminated structures in an embodiment of the present invention.

图3为本发明一实施例的一种具有彩色滤光阵列的像素阵列基板的局部剖面示意图。FIG. 3 is a schematic partial cross-sectional view of a pixel array substrate with a color filter array according to an embodiment of the present invention.

图4为本发明一实施例的一种具有彩色滤光阵列的像素阵列基板的局部剖面示意图。FIG. 4 is a schematic partial cross-sectional view of a pixel array substrate with a color filter array according to an embodiment of the present invention.

图5为本发明一实施例的一种具有彩色滤光阵列的像素阵列基板的局部剖面示意图。FIG. 5 is a schematic partial cross-sectional view of a pixel array substrate with a color filter array according to an embodiment of the present invention.

图6为本发明一实施例的一种显示面板的局部剖面示意图。FIG. 6 is a schematic partial cross-sectional view of a display panel according to an embodiment of the present invention.

附图标号Reference number

200、300、400、500、600:具有彩色滤光阵列的像素阵列基板200, 300, 400, 500, 600: Pixel array substrate with color filter array

210:基板210: Substrate

212:像素区212: pixel area

214:遮光区214: shading area

220:主动元件阵列220: active element array

222:主动元件222: Active components

230:彩色滤光阵列230: color filter array

232:遮光图案层232: Shading pattern layer

234:彩色滤光图案234: color filter pattern

234B:蓝色滤光图案234B: Blue filter pattern

234G:绿色滤光图案234G: Green filter pattern

234R:红色滤光图案234R: Red filter pattern

240:像素电极层240: pixel electrode layer

250、250A、250B、250C:迭层结构250, 250A, 250B, 250C: laminated structure

720:对向基板720: opposite substrate

710:显示介质710: display media

722:共通电极722: common electrode

具体实施方式 Detailed ways

为让本发明的上述特征和优点能更明显易懂,下文特举实施例,并配合所附附图作详细说明如下。In order to make the above-mentioned features and advantages of the present invention more comprehensible, the following specific embodiments are described in detail together with the accompanying drawings.

图1为本发明一实施例的一种具有彩色滤光阵列的像素阵列基板的局部剖面示意图。请参照图1,本实施例的具有彩色滤光阵列的像素阵列基板200包括基板210、主动元件阵列220、彩色滤光阵列230以及像素电极层240。具体而言,基板210上具有多个像素区212及一遮光区214。特别是,遮光区214围绕在各像素区212的周围。主动元件阵列220位于基板210上。彩色滤光阵列230设置于基板210上,其中彩色滤光阵列230包括位于遮光区214的遮光图案层232以及多个彩色滤光图案234,这些彩色滤光图案234分别位于像素区212中并且自像素区212延伸至遮光区214,其中自相邻的像素区212延伸出的彩色滤光图案234于遮光区214中构成一迭层结构250。像素电极层240与主动元件阵列220电连接基板210上的像素区212。更详细而言,主动元件阵列220中具有阵列排列的多个主动元件222,且每一主动元件222对应地设置于每一像素区212中,并且像素电极层240具有多个像素电极242,对应地设置于每一像素区212中并与对应的主动元件222电连接。FIG. 1 is a schematic partial cross-sectional view of a pixel array substrate with a color filter array according to an embodiment of the present invention. Referring to FIG. 1 , the pixel array substrate 200 with a color filter array in this embodiment includes a substrate 210 , an active device array 220 , a color filter array 230 and a pixel electrode layer 240 . Specifically, the substrate 210 has a plurality of pixel regions 212 and a light shielding region 214 . In particular, the light shielding area 214 surrounds each pixel area 212 . The active device array 220 is located on the substrate 210 . The color filter array 230 is disposed on the substrate 210, wherein the color filter array 230 includes a light-shielding pattern layer 232 located in the light-shielding area 214 and a plurality of color filter patterns 234, and these color filter patterns 234 are respectively located in the pixel area 212 and automatically The pixel area 212 extends to the light-shielding area 214 , wherein the color filter patterns 234 extending from adjacent pixel areas 212 form a stacked structure 250 in the light-shielding area 214 . The pixel electrode layer 240 is electrically connected to the pixel region 212 on the substrate 210 with the active device array 220 . In more detail, the active element array 220 has a plurality of active elements 222 arranged in an array, and each active element 222 is correspondingly disposed in each pixel region 212, and the pixel electrode layer 240 has a plurality of pixel electrodes 242, corresponding to ground is disposed in each pixel region 212 and electrically connected to the corresponding active device 222 .

进一步而言,在本实施例中,遮光图案层232例如是位于主动元件阵列220与彩色滤光图案234之间。并且,具有彩色滤光阵列的像素阵列基板200的制造流程包括下列步骤。首先,于基板210上形成主动元件阵列220,并于主动元件阵列220的特定膜层的特定位置上制作对位标记。之后,于主动元件阵列220上全面地形成一遮光材料层,并经由一图案化工艺而制作出遮光图案层232,例如黑色矩阵。值得注意的是,在上述的遮光图案层232的图案化工艺中,先经由曝光机台通过遮光材料层撷取位于其底层的对位标记后进行一曝光工艺,接着再进行一显影工艺以图案化所述遮光材料层而形成黑色矩阵。在本实施例中,遮光材料层可以选用光学密度值稍低的材料,以增加机台对对位标记的辨识率。Furthermore, in this embodiment, the light-shielding pattern layer 232 is, for example, located between the active device array 220 and the color filter pattern 234 . Moreover, the manufacturing process of the pixel array substrate 200 with the color filter array includes the following steps. Firstly, the active device array 220 is formed on the substrate 210 , and an alignment mark is made on a specific position of a specific film layer of the active device array 220 . Afterwards, a light-shielding material layer is completely formed on the active device array 220, and a light-shielding pattern layer 232, such as a black matrix, is produced through a patterning process. It should be noted that, in the above-mentioned patterning process of the light-shielding pattern layer 232, the alignment mark located at the bottom layer is picked up through the light-shielding material layer through the exposure machine first, and then an exposure process is performed, and then a development process is performed to form the pattern. Thinning the light-shielding material layer to form a black matrix. In this embodiment, the light-shielding material layer may be made of a material with a slightly lower optical density value, so as to increase the recognition rate of the alignment mark by the machine.

详言之,遮光图案层232的光学密度值(optical density)例如介于0.6~3.4。藉此,当机台撷取位于遮光材料层的底层的对位标记时,可以较轻易且较有效率地辨别出较为清晰的对位标记,避免上下膜层间因对位偏移所导致的开口率降低等不良问题。因此,本实施例的具有彩色滤光阵列的像素阵列基板200在制作过程中可以提高工艺的对位精确度、节省工艺时间,并且在遮光材料层的选择上可以选用较易获取的光学密度值稍低的材料,如此将有助于节省材料成本。In detail, the optical density of the light-shielding pattern layer 232 is, for example, between 0.6˜3.4. In this way, when the machine picks up the alignment mark located on the bottom layer of the light-shielding material layer, it can easily and efficiently identify the clearer alignment mark, avoiding the misalignment between the upper and lower film layers caused by the alignment deviation. Unfavorable problems such as lower aperture ratio. Therefore, the pixel array substrate 200 with a color filter array in this embodiment can improve the alignment accuracy of the process and save process time during the manufacturing process, and can choose an optical density value that is easier to obtain in the selection of the light-shielding material layer Slightly lower material, so it will help to save material cost.

另一方面,本实施例的具有彩色滤光阵列的像素阵列基板200在遮光区214中具有由彩色滤光图案234构成的迭层结构250,由于此迭层结构250对于光线亦可提供遮光的效果。如此一来,彩色滤光图案234构成的迭层结构250提供遮光区214可以进一步加强遮光图案层232的遮光效果,确实阻断光线通过遮光区214。详言之,迭层结构250的光学密度值(optical density)例如介于0.6~1.2。并且在本实施例中,遮光图案层232与迭层结构250的重迭区域的光学密度值例如介于1.8~4.0,光学密度值越高,代表遮光效果越好。因此,本实施例的具有彩色滤光阵列的像素阵列基板200在制作完成后,在遮光区214仍可维持一定程度的遮光效果,如此将有助于提升产品的对比度。On the other hand, the pixel array substrate 200 with a color filter array in this embodiment has a laminated structure 250 composed of color filter patterns 234 in the light-shielding area 214, because the laminated structure 250 can also provide light shielding for light Effect. In this way, the light-shielding area 214 provided by the laminated structure 250 formed by the color filter pattern 234 can further enhance the light-shielding effect of the light-shielding pattern layer 232 , and indeed block light from passing through the light-shielding area 214 . In detail, the optical density of the laminated structure 250 is, for example, between 0.6˜1.2. And in this embodiment, the optical density value of the overlapped area of the light-shielding pattern layer 232 and the laminated structure 250 is, for example, 1.8-4.0, and the higher the optical density value, the better the light-shielding effect. Therefore, after the fabrication of the pixel array substrate 200 with the color filter array in this embodiment is completed, a certain degree of light-shielding effect can still be maintained in the light-shielding region 214 , which will help to improve the contrast of the product.

图2A至图2C分别为本发明一实施例中迭层结构的不同型态的剖面示意图。请参照图2A,彩色滤光图案234例如是由红色滤光图案234R、绿色滤光图案234G以及蓝色滤光图案234B所构成,且在本实施例中,迭层结构250A是由绿色滤光图案234G与红色滤光图案234R所构成。请接着参照图2B,在本实施例中,迭层结构250B是由绿色滤光图案234G与蓝色滤光图案234B所构成。请再参照图2C,在本实施例中,迭层结构250C是由蓝色滤光图案234B与红色滤光图案234R所构成。表1为遮光图案层232在使用上述不同型态的迭层结构250A、250B、250C前后的光学密度值实测值整理表,其中受测的遮光图案层232与各彩色滤光图案234的厚度分别为1微米(μm)。2A to 2C are respectively schematic cross-sectional views of different types of laminated structures in an embodiment of the present invention. Please refer to FIG. 2A, the color filter pattern 234 is composed of a red filter pattern 234R, a green filter pattern 234G and a blue filter pattern 234B, for example, and in this embodiment, the laminated structure 250A is made of a green filter pattern The pattern 234G is composed of the red filter pattern 234R. Please refer to FIG. 2B . In this embodiment, the laminated structure 250B is composed of a green filter pattern 234G and a blue filter pattern 234B. Please refer to FIG. 2C again. In this embodiment, the laminated structure 250C is composed of a blue filter pattern 234B and a red filter pattern 234R. Table 1 is a list of measured optical density values of the light-shielding pattern layer 232 before and after using the above-mentioned different types of laminated structures 250A, 250B, and 250C. It is 1 micron (μm).

表1Table 1

  光学密度值 Optical density value   遮光图案层232 shading pattern layer 232   遮光图案层232+迭层结构250A Light-shielding pattern layer 232+laminate structure 250A   遮光图案层232 shading pattern layer 232   遮光图案层232+迭层结构250B shading pattern layer 232+ laminated structure 250B   遮光图案层232 shading pattern layer 232   遮光图案层232+迭层结构250C shading pattern layer 232+ laminated structure 250C   1 1   1.843 1.843   2.627 2.627   1.864 1.864   2.490 2.490   1.824 1.824   3.032 3.032   2 2   1.820 1.820   2.620 2.620   1.855 1.855   2.491 2.491   1.811 1.811   3.020 3.020   3 3   1.806 1.806   2.621 2.621   1.854 1.854   2.500 2.500   1.839 1.839   3.006 3.006   4 4   1.819 1.819   2.633 2.633   1.859 1.859   2.475 2.475   1.813 1.813   2.994 2.994   5 5   1.823 1.823   2.623 2.623   1.862 1.862   2.475 2.475   1.863 1.863   3.030 3.030   平均 average   1.822 1.822   2.625 2.625   1.859 1.859   2.486 2.486   1.830 1.830   3.016 3.016

如表1所示,通过适当选用遮光图案层232本身的光学密度值可以提高制作流程中的对位精度并降低对位偏移所导致的开口率降低等不良问题,进而使工艺享有较高的工艺余裕度(process margin)。另一方面,利用将不同颜色的彩色滤光图案234分别自像素区212延伸至遮光区214构成迭层结构250,可大幅提升遮光区214的光学密度值,换言之,本发明的迭层结构250有助于提升遮光区214的遮光效果,而获得高对比度的产品。如表1所示,在本实施例中,迭层结构250A、250B、250C均能有效地提升遮光效果。其中,又以由蓝色滤光图案234B与红色滤光图案234R所构成的迭层结构250C所能达到的遮光效果为较佳。As shown in Table 1, by properly selecting the optical density value of the light-shielding pattern layer 232 itself, the alignment accuracy in the production process can be improved and adverse problems such as lower aperture ratio caused by alignment offset can be reduced, thereby enabling the process to enjoy a higher Process margin. On the other hand, by extending the color filter patterns 234 of different colors from the pixel area 212 to the light-shielding area 214 to form a laminated structure 250, the optical density value of the light-shielding area 214 can be greatly improved. In other words, the laminated structure 250 of the present invention It is helpful to improve the shading effect of the shading area 214 to obtain a high-contrast product. As shown in Table 1, in this embodiment, the laminated structures 250A, 250B, and 250C can effectively improve the light-shielding effect. Among them, the light-shielding effect achieved by the laminated structure 250C composed of the blue filter pattern 234B and the red filter pattern 234R is better.

图3为本发明一实施例的一种具有彩色滤光阵列的像素阵列基板的局部剖面示意图。请参照图3,本实施例的具有彩色滤光阵列的像素阵列基板300与前述实施例的具有彩色滤光阵列的像素阵列基板200类似,惟,本实施例的具有彩色滤光阵列的像素阵列基板300还可以更包括一另一彩色滤光图案310,堆迭于遮光区214的迭层结构250上。换句话说,堆迭于迭层结构250上的另一彩色滤光图案310的材质有别于构成迭层结构250的彩色滤光薄膜的材质。举例来说,选用蓝色滤光图案234B堆迭于由绿色滤光图案234G与红色滤光图案234R所构成的迭层结构250A上,选用红色滤光图案234R堆迭于由绿色滤光图案234G与蓝色滤光图案234B所构成的迭层结构250B,或者选用红色滤光图案234R堆迭于由蓝色滤光图案234B与红色滤光图案234R所构成的迭层结构250C上。由于不同颜色的彩色滤光图案234的滤光波长不同,通过上述的堆迭结构,不但可大幅地提升遮光区214的遮光效果,并且上述工艺与原有工艺相同,仅需对原有掩膜进行局部修改,并不会额外增加掩膜工艺。FIG. 3 is a schematic partial cross-sectional view of a pixel array substrate with a color filter array according to an embodiment of the present invention. Please refer to FIG. 3 , the pixel array substrate 300 with color filter array of this embodiment is similar to the pixel array substrate 200 with color filter array of the previous embodiment, but the pixel array with color filter array of this embodiment The substrate 300 may further include another color filter pattern 310 stacked on the stacked structure 250 of the light-shielding area 214 . In other words, the material of another color filter pattern 310 stacked on the laminated structure 250 is different from the material of the color filter film constituting the laminated structure 250 . For example, the blue filter pattern 234B is selected to be stacked on the laminated structure 250A formed by the green filter pattern 234G and the red filter pattern 234R, and the red filter pattern 234R is selected to be stacked on the green filter pattern 234G. The stacked structure 250B formed with the blue filter pattern 234B, or the red filter pattern 234R is selected to be stacked on the stacked structure 250C formed with the blue filter pattern 234B and the red filter pattern 234R. Since the filter wavelengths of the color filter patterns 234 of different colors are different, the above-mentioned stacking structure can not only greatly improve the light-shielding effect of the light-shielding area 214, but also the above-mentioned process is the same as the original process, only need to modify the original mask Partial modification will not increase the mask process.

当然,本发明并不限定迭层结构与遮光图案、主动阵列基板以及像素电极层之间的相对位置,迭层结构的位置及尺寸大小并不局限,举例而言,基板210更具有周边电路区(未绘示)以及扇出区(未绘示),所述周边电路区大体围绕所述像素区以及所述遮光区并邻近于所述基板的一侧边,所述扇出区与所述周边电路相连,彩色滤光图案234更于所述周边电路区或所述扇出区构成另一迭层结构(未绘示)。以下再列举几种本发明的具有彩色滤光阵列的像素阵列基板的实施型态,但不用以限定本发明。Of course, the present invention does not limit the relative positions between the laminated structure and the light-shielding pattern, the active array substrate, and the pixel electrode layer, and the position and size of the laminated structure are not limited. For example, the substrate 210 further has a peripheral circuit area (not shown) and a fan-out area (not shown), the peripheral circuit area generally surrounds the pixel area and the light-shielding area and is adjacent to one side of the substrate, the fan-out area and the The peripheral circuits are connected, and the color filter pattern 234 further forms another stacked structure (not shown) in the peripheral circuit area or the fan-out area. Several implementations of the pixel array substrate with the color filter array of the present invention are enumerated below, but the present invention is not limited thereto.

图4为本发明一实施例的一种具有彩色滤光阵列的像素阵列基板的局部剖面示意图。请参照图4,在本实施例的具有彩色滤光阵列的像素阵列基板400中,遮光图案层232位于像素电极层240上,换言之,在本实施例中,由彩色滤光图案234所构成的迭层结构250是位于遮光图案层232以及主动元件阵列220之间。如此,亦同样可以达到在工艺中提高对位精准度而在产品中提高对比度的效果。其余构件于前述实施例类似,不再赘述。FIG. 4 is a schematic partial cross-sectional view of a pixel array substrate with a color filter array according to an embodiment of the present invention. Please refer to FIG. 4 , in the pixel array substrate 400 with a color filter array in this embodiment, the light-shielding pattern layer 232 is located on the pixel electrode layer 240 , in other words, in this embodiment, the color filter pattern 234 constitutes The laminated structure 250 is located between the light-shielding pattern layer 232 and the active device array 220 . In this way, the effect of improving the alignment accuracy in the process and improving the contrast in the product can also be achieved. The rest of the components are similar to those of the foregoing embodiments and will not be repeated here.

图5为本发明一实施例的一种具有彩色滤光阵列的像素阵列基板的局部剖面示意图。请参照图5,在本实施例的具有彩色滤光阵列的像素阵列基板500中,遮光图案层232位于像素电极层240与彩色滤光阵列220之间。如此,亦同样可以达到在工艺中提高对位精准度而在产品中提高对比度的效果。其余构件于前述实施例类似,不再赘述。FIG. 5 is a schematic partial cross-sectional view of a pixel array substrate with a color filter array according to an embodiment of the present invention. Referring to FIG. 5 , in the pixel array substrate 500 with a color filter array in this embodiment, the light-shielding pattern layer 232 is located between the pixel electrode layer 240 and the color filter array 220 . In this way, the effect of improving the alignment accuracy in the process and improving the contrast in the product can also be achieved. The rest of the components are similar to those of the foregoing embodiments and will not be repeated here.

图6为本发明一实施例的一种显示面板的局部剖面示意图。请参照图6,在实际的应用层面上,显示面板700包括上述具有彩色滤光阵列的像素阵列基板600、对向基板720以及显示介质710,其中具有彩色滤光阵列的像素阵列基板600可以如前述实施例中的任一型态,如具有彩色滤光阵列的像素阵列基板200、300、400、500,相同构件以相同符号表示,于此不再赘述。此外,对向基板720位于具有彩色滤光阵列的像素阵列基板600的对向侧,在本实施例中,对向基板720具有一面向具有彩色滤光阵列的像素阵列基板600的共通电极722。显示介质710位于具有彩色滤光阵列的像素阵列基板600以及对向基板720之间,其中显示介质710通过共通电极722与像素电极层240之间的电压差而呈现不同的显示效果。FIG. 6 is a schematic partial cross-sectional view of a display panel according to an embodiment of the present invention. Please refer to FIG. 6 , on the practical application level, the display panel 700 includes the above-mentioned pixel array substrate 600 with a color filter array, a counter substrate 720 and a display medium 710, wherein the pixel array substrate 600 with a color filter array can be as follows In any of the aforementioned embodiments, such as the pixel array substrates 200 , 300 , 400 , and 500 with color filter arrays, the same components are represented by the same symbols, which will not be repeated here. In addition, the opposite substrate 720 is located on the opposite side of the pixel array substrate 600 with color filter array. In this embodiment, the opposite substrate 720 has a common electrode 722 facing the pixel array substrate 600 with color filter array. The display medium 710 is located between the pixel array substrate 600 having a color filter array and the opposite substrate 720 , wherein the display medium 710 presents different display effects through the voltage difference between the common electrode 722 and the pixel electrode layer 240 .

如同前述,在本实施例中,通过在具有彩色滤光阵列的像素阵列基板600的遮光区214设置迭层结构250,在提升工艺的对位精准度时,可以一并加强遮光图案层的遮光效果,以提高显示面板700的对比度。As mentioned above, in this embodiment, by setting the laminated structure 250 in the light-shielding area 214 of the pixel array substrate 600 with the color filter array, the light-shielding of the light-shielding pattern layer can be enhanced while improving the alignment accuracy of the process. effect to improve the contrast of the display panel 700 .

虽然本发明已以较佳实施例揭露如上,然其并非用以限定本发明,任何具有本发明所属技术领域的技术人员,在不脱离本发明的精神和范围内,当可作些许的更动与润饰,因此本发明的保护范围当以权利要求所界定范围为准。Although the present invention has been disclosed above with preferred embodiments, it is not intended to limit the present invention. Any person skilled in the technical field of the present invention may make some changes without departing from the spirit and scope of the present invention. and modification, so the protection scope of the present invention should be determined by the scope defined in the claims.

Claims (4)

1.一种具有彩色滤光阵列的像素阵列基板,其特征在于,所述像素阵列基板包括: 1. A pixel array substrate with a color filter array, characterized in that, the pixel array substrate comprises: 一基板,所述基板上具有多个像素区以及一遮光区; a substrate with a plurality of pixel regions and a light-shielding region on the substrate; 一主动元件阵列,位于所述基板上; an active element array located on the substrate; 一彩色滤光阵列,设置于所述基板上,其中所述彩色滤光阵列包括: A color filter array disposed on the substrate, wherein the color filter array includes: 一遮光图案层,位于所述遮光区;所述遮光图案层的光学密度值介于0.6~3.4;以及 A light-shielding pattern layer located in the light-shielding area; the optical density of the light-shielding pattern layer is between 0.6 and 3.4; and 多个彩色滤光图案,分别位于所述像素区中并且自所述像素区延伸至所述遮光区,其中自相邻的像素区延伸出的所述彩色滤光图案于所述遮光区中构成一迭层结构,所述遮光图案层与所述迭层结构的重迭区域的光学密度值介于1.8~4.0之间;所述基板更具有一周边电路区以及一扇出区,所述周边电路区大体围绕所述像素区以及所述遮光区并邻近于所述基板的一侧边,所述扇出区与所述周边电路区相连,其中所述多个彩色滤光图案更于所述周边电路区或所述扇出区构成另一迭层结构;以及 A plurality of color filter patterns are respectively located in the pixel area and extend from the pixel area to the light-shielding area, wherein the color filter patterns extending from adjacent pixel areas are formed in the light-shielding area A laminated structure, the optical density value of the overlapping area between the light-shielding pattern layer and the laminated structure is between 1.8 and 4.0; the substrate further has a peripheral circuit area and a fan-out area, and the peripheral The circuit area generally surrounds the pixel area and the light-shielding area and is adjacent to one side of the substrate, the fan-out area is connected to the peripheral circuit area, wherein the plurality of color filter patterns are further than the The peripheral circuit area or the fan-out area constitutes another stack structure; and 一像素电极层,与所述主动元件阵列电连接; a pixel electrode layer electrically connected to the active element array; 另一彩色滤光图案,堆迭于所述遮光区的所述迭层结构上,所述另一彩色滤光图案的材质有别于构成所述迭层结构的彩色滤光图案的材质。 Another color filter pattern is stacked on the laminated structure in the light-shielding area, and the material of the another color filter pattern is different from the material of the color filter pattern constituting the laminated structure. 2.如权利要求1所述的具有彩色滤光阵列的像素阵列基板,其特征在于,所述遮光图案层位于所述主动元件阵列与所述彩色滤光图案之间、所述彩色滤光图案与所述像素电极层之间或是所述像素电极层上。 2. The pixel array substrate with a color filter array according to claim 1, wherein the light-shielding pattern layer is located between the active element array and the color filter pattern, and the color filter pattern Between and the pixel electrode layer or on the pixel electrode layer. 3.一种显示面板,其特征在于,所述显示面板包括: 3. A display panel, characterized in that the display panel comprises: 一具有彩色滤光阵列的像素阵列基板,包括: A pixel array substrate with a color filter array, including: 一基板,所述基板上具有多个像素区以及一遮光区; a substrate with a plurality of pixel regions and a light-shielding region on the substrate; 一主动元件阵列,位于所述基板上;  An array of active elements located on the substrate; 一彩色滤光阵列,设置于所述基板上,其中所述彩色滤光阵列包括: A color filter array disposed on the substrate, wherein the color filter array includes: 一遮光图案层,位于所述遮光区;所述遮光图案层的光学密度值介于0.6~3.4;以及 A light-shielding pattern layer located in the light-shielding area; the optical density of the light-shielding pattern layer is between 0.6 and 3.4; and 多个彩色滤光图案,分别位于所述像素区中并且自所述像素区延伸至所述遮光区,其中自相邻的像素区延伸出的所述彩色滤光图案于所述遮光区中构成一迭层结构,所述遮光图案层与所述迭层结构的重迭区域的光学密度值介于1.8~4.0之间;所述基板更具有一周边电路区以及一扇出区,所述周边电路区大体围绕所述像素区以及所述遮光区并邻近于所述基板的一侧边,所述扇出区与所述周边电路区相连,其中所述多个彩色滤光图案更于所述周边电路区或所述扇出区构成另一迭层结构;以及 A plurality of color filter patterns are respectively located in the pixel area and extend from the pixel area to the light-shielding area, wherein the color filter patterns extending from adjacent pixel areas are formed in the light-shielding area A laminated structure, the optical density value of the overlapping area between the light-shielding pattern layer and the laminated structure is between 1.8 and 4.0; the substrate further has a peripheral circuit area and a fan-out area, and the peripheral The circuit area generally surrounds the pixel area and the light-shielding area and is adjacent to one side of the substrate, the fan-out area is connected to the peripheral circuit area, wherein the plurality of color filter patterns are further than the The peripheral circuit area or the fan-out area constitutes another stack structure; and 一像素电极层,与所述主动元件阵列电连接; a pixel electrode layer electrically connected to the active element array; 另一彩色滤光图案,堆迭于所述遮光区的所述迭层结构上,所述另一彩色滤光图案的材质有别于构成所述迭层结构的彩色滤光图案的材质; Another color filter pattern is stacked on the layered structure in the light-shielding area, and the material of the another color filter pattern is different from the material of the color filter pattern constituting the layered structure; 一对向基板,位于所述具有彩色滤光阵列的像素阵列基板的对向侧;以及 a pair of facing substrates, located on the opposite side of the pixel array substrate with the color filter array; and 一显示介质,位于所述具有彩色滤光阵列的像素阵列基板以及所述对向基板之间。 A display medium is located between the pixel array substrate with the color filter array and the opposite substrate. 4.如权利要求3所述的显示面板,其特征在于,所述遮光图案层位于所述主动元件阵列与所述彩色滤光图案之间、所述彩色滤光图案与所述像素电极层之间或是所述像素电极层上。  4. The display panel according to claim 3, wherein the light-shielding pattern layer is located between the active device array and the color filter pattern, between the color filter pattern and the pixel electrode layer occasionally or on the pixel electrode layer. the
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