CN100581309C - 有机电致发光元件及其制造方法 - Google Patents
有机电致发光元件及其制造方法 Download PDFInfo
- Publication number
- CN100581309C CN100581309C CN200480042888A CN200480042888A CN100581309C CN 100581309 C CN100581309 C CN 100581309C CN 200480042888 A CN200480042888 A CN 200480042888A CN 200480042888 A CN200480042888 A CN 200480042888A CN 100581309 C CN100581309 C CN 100581309C
- Authority
- CN
- China
- Prior art keywords
- layer
- organic
- metallic element
- laminate structure
- organic electroluminescent
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
- 238000004519 manufacturing process Methods 0.000 title claims description 21
- 238000005401 electroluminescence Methods 0.000 title 1
- 229910052751 metal Inorganic materials 0.000 claims abstract description 41
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 claims abstract description 23
- 239000001301 oxygen Substances 0.000 claims abstract description 23
- 229910052760 oxygen Inorganic materials 0.000 claims abstract description 23
- 239000000758 substrate Substances 0.000 claims description 32
- 239000012528 membrane Substances 0.000 claims description 26
- 238000000034 method Methods 0.000 claims description 24
- 230000027756 respiratory electron transport chain Effects 0.000 claims description 17
- 230000005540 biological transmission Effects 0.000 claims description 16
- 238000009825 accumulation Methods 0.000 claims description 10
- 239000003651 drinking water Substances 0.000 claims description 7
- 235000020188 drinking water Nutrition 0.000 claims description 7
- 239000002994 raw material Substances 0.000 claims description 6
- 230000018044 dehydration Effects 0.000 claims description 3
- 238000006297 dehydration reaction Methods 0.000 claims description 3
- 239000011261 inert gas Substances 0.000 claims description 2
- 238000007599 discharging Methods 0.000 claims 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 abstract description 13
- 239000002184 metal Substances 0.000 abstract description 6
- 230000005525 hole transport Effects 0.000 abstract description 3
- 230000001747 exhibiting effect Effects 0.000 abstract 1
- 230000009257 reactivity Effects 0.000 abstract 1
- 239000010410 layer Substances 0.000 description 83
- 230000000052 comparative effect Effects 0.000 description 11
- 239000012535 impurity Substances 0.000 description 11
- 239000000126 substance Substances 0.000 description 10
- 238000010276 construction Methods 0.000 description 9
- 238000009472 formulation Methods 0.000 description 9
- 238000002347 injection Methods 0.000 description 9
- 239000007924 injection Substances 0.000 description 9
- 239000000203 mixture Substances 0.000 description 9
- 238000001771 vacuum deposition Methods 0.000 description 9
- 238000010438 heat treatment Methods 0.000 description 7
- 239000004615 ingredient Substances 0.000 description 7
- IBHBKWKFFTZAHE-UHFFFAOYSA-N n-[4-[4-(n-naphthalen-1-ylanilino)phenyl]phenyl]-n-phenylnaphthalen-1-amine Chemical compound C1=CC=CC=C1N(C=1C2=CC=CC=C2C=CC=1)C1=CC=C(C=2C=CC(=CC=2)N(C=2C=CC=CC=2)C=2C3=CC=CC=C3C=CC=2)C=C1 IBHBKWKFFTZAHE-UHFFFAOYSA-N 0.000 description 7
- 230000000903 blocking effect Effects 0.000 description 6
- 238000001704 evaporation Methods 0.000 description 6
- 230000008020 evaporation Effects 0.000 description 6
- TVIVIEFSHFOWTE-UHFFFAOYSA-K tri(quinolin-8-yloxy)alumane Chemical compound [Al+3].C1=CN=C2C([O-])=CC=CC2=C1.C1=CN=C2C([O-])=CC=CC2=C1.C1=CN=C2C([O-])=CC=CC2=C1 TVIVIEFSHFOWTE-UHFFFAOYSA-K 0.000 description 6
- 229910052804 chromium Inorganic materials 0.000 description 5
- 238000005516 engineering process Methods 0.000 description 5
- 239000012044 organic layer Substances 0.000 description 5
- 230000008569 process Effects 0.000 description 5
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 4
- 230000007850 degeneration Effects 0.000 description 4
- 230000000694 effects Effects 0.000 description 4
- 239000011521 glass Substances 0.000 description 4
- KFZMGEQAYNKOFK-UHFFFAOYSA-N Isopropanol Chemical compound CC(C)O KFZMGEQAYNKOFK-UHFFFAOYSA-N 0.000 description 3
- 230000009849 deactivation Effects 0.000 description 3
- 238000004020 luminiscence type Methods 0.000 description 3
- 239000000463 material Substances 0.000 description 3
- 239000011368 organic material Substances 0.000 description 3
- IXHWGNYCZPISET-UHFFFAOYSA-N 2-[4-(dicyanomethylidene)-2,3,5,6-tetrafluorocyclohexa-2,5-dien-1-ylidene]propanedinitrile Chemical compound FC1=C(F)C(=C(C#N)C#N)C(F)=C(F)C1=C(C#N)C#N IXHWGNYCZPISET-UHFFFAOYSA-N 0.000 description 2
- CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Chemical compound CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 description 2
- CBENFWSGALASAD-UHFFFAOYSA-N Ozone Chemical compound [O-][O+]=O CBENFWSGALASAD-UHFFFAOYSA-N 0.000 description 2
- 230000002411 adverse Effects 0.000 description 2
- 230000015572 biosynthetic process Effects 0.000 description 2
- UFVXQDWNSAGPHN-UHFFFAOYSA-K bis[(2-methylquinolin-8-yl)oxy]-(4-phenylphenoxy)alumane Chemical compound [Al+3].C1=CC=C([O-])C2=NC(C)=CC=C21.C1=CC=C([O-])C2=NC(C)=CC=C21.C1=CC([O-])=CC=C1C1=CC=CC=C1 UFVXQDWNSAGPHN-UHFFFAOYSA-K 0.000 description 2
- 230000008859 change Effects 0.000 description 2
- 238000001035 drying Methods 0.000 description 2
- 230000007246 mechanism Effects 0.000 description 2
- 229910052757 nitrogen Inorganic materials 0.000 description 2
- 239000002245 particle Substances 0.000 description 2
- 239000000049 pigment Substances 0.000 description 2
- QRVQUBKLRBKFCG-UHFFFAOYSA-N 1-phenylpyrene Chemical compound C1=CC=CC=C1C1=CC=C(C=C2)C3=C4C2=CC=CC4=CC=C13 QRVQUBKLRBKFCG-UHFFFAOYSA-N 0.000 description 1
- XSUNFLLNZQIJJG-UHFFFAOYSA-N 2-n-naphthalen-2-yl-1-n,1-n,2-n-triphenylbenzene-1,2-diamine Chemical compound C1=CC=CC=C1N(C=1C(=CC=CC=1)N(C=1C=CC=CC=1)C=1C=C2C=CC=CC2=CC=1)C1=CC=CC=C1 XSUNFLLNZQIJJG-UHFFFAOYSA-N 0.000 description 1
- HXWWMGJBPGRWRS-CMDGGOBGSA-N 4- -2-tert-butyl-6- -4h-pyran Chemical compound O1C(C(C)(C)C)=CC(=C(C#N)C#N)C=C1\C=C\C1=CC(C(CCN2CCC3(C)C)(C)C)=C2C3=C1 HXWWMGJBPGRWRS-CMDGGOBGSA-N 0.000 description 1
- 229910052774 Proactinium Inorganic materials 0.000 description 1
- 229910006404 SnO 2 Inorganic materials 0.000 description 1
- 238000004458 analytical method Methods 0.000 description 1
- 235000010290 biphenyl Nutrition 0.000 description 1
- 239000004305 biphenyl Substances 0.000 description 1
- 239000000969 carrier Substances 0.000 description 1
- 238000004140 cleaning Methods 0.000 description 1
- 238000000151 deposition Methods 0.000 description 1
- 230000008021 deposition Effects 0.000 description 1
- SWXVUIWOUIDPGS-UHFFFAOYSA-N diacetone alcohol Natural products CC(=O)CC(C)(C)O SWXVUIWOUIDPGS-UHFFFAOYSA-N 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 238000009826 distribution Methods 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-M hydroxide Chemical compound [OH-] XLYOFNOQVPJJNP-UHFFFAOYSA-M 0.000 description 1
- 238000012423 maintenance Methods 0.000 description 1
- 230000008018 melting Effects 0.000 description 1
- 238000002844 melting Methods 0.000 description 1
- 150000002739 metals Chemical class 0.000 description 1
- ZUOUZKKEUPVFJK-UHFFFAOYSA-N phenylbenzene Natural products C1=CC=CC=C1C1=CC=CC=C1 ZUOUZKKEUPVFJK-UHFFFAOYSA-N 0.000 description 1
- 238000009832 plasma treatment Methods 0.000 description 1
- 238000012545 processing Methods 0.000 description 1
- 230000009467 reduction Effects 0.000 description 1
- 239000003870 refractory metal Substances 0.000 description 1
- 230000004044 response Effects 0.000 description 1
- 230000000630 rising effect Effects 0.000 description 1
- 229910052721 tungsten Inorganic materials 0.000 description 1
- 238000009281 ultraviolet germicidal irradiation Methods 0.000 description 1
- 238000007738 vacuum evaporation Methods 0.000 description 1
- 238000012795 verification Methods 0.000 description 1
Images
Classifications
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K71/00—Manufacture or treatment specially adapted for the organic devices covered by this subclass
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K50/00—Organic light-emitting devices
- H10K50/80—Constructional details
- H10K50/84—Passivation; Containers; Encapsulations
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K50/00—Organic light-emitting devices
- H10K50/80—Constructional details
- H10K50/84—Passivation; Containers; Encapsulations
- H10K50/846—Passivation; Containers; Encapsulations comprising getter material or desiccants
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K59/00—Integrated devices, or assemblies of multiple devices, comprising at least one organic light-emitting element covered by group H10K50/00
- H10K59/80—Constructional details
- H10K59/87—Passivation; Containers; Encapsulations
- H10K59/874—Passivation; Containers; Encapsulations including getter material or desiccant
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K59/00—Integrated devices, or assemblies of multiple devices, comprising at least one organic light-emitting element covered by group H10K50/00
- H10K59/80—Constructional details
- H10K59/87—Passivation; Containers; Encapsulations
- H10K59/871—Self-supporting sealing arrangements
- H10K59/872—Containers
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K85/00—Organic materials used in the body or electrodes of devices covered by this subclass
- H10K85/30—Coordination compounds
- H10K85/321—Metal complexes comprising a group IIIA element, e.g. Tris (8-hydroxyquinoline) gallium [Gaq3]
- H10K85/324—Metal complexes comprising a group IIIA element, e.g. Tris (8-hydroxyquinoline) gallium [Gaq3] comprising aluminium, e.g. Alq3
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K85/00—Organic materials used in the body or electrodes of devices covered by this subclass
- H10K85/60—Organic compounds having low molecular weight
- H10K85/611—Charge transfer complexes
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K85/00—Organic materials used in the body or electrodes of devices covered by this subclass
- H10K85/60—Organic compounds having low molecular weight
- H10K85/615—Polycyclic condensed aromatic hydrocarbons, e.g. anthracene
- H10K85/622—Polycyclic condensed aromatic hydrocarbons, e.g. anthracene containing four rings, e.g. pyrene
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K85/00—Organic materials used in the body or electrodes of devices covered by this subclass
- H10K85/60—Organic compounds having low molecular weight
- H10K85/631—Amine compounds having at least two aryl rest on at least one amine-nitrogen atom, e.g. triphenylamine
- H10K85/633—Amine compounds having at least two aryl rest on at least one amine-nitrogen atom, e.g. triphenylamine comprising polycyclic condensed aromatic hydrocarbons as substituents on the nitrogen atom
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K85/00—Organic materials used in the body or electrodes of devices covered by this subclass
- H10K85/60—Organic compounds having low molecular weight
- H10K85/649—Aromatic compounds comprising a hetero atom
- H10K85/657—Polycyclic condensed heteroaromatic hydrocarbons
Landscapes
- Engineering & Computer Science (AREA)
- Manufacturing & Machinery (AREA)
- Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Electroluminescent Light Sources (AREA)
Abstract
Description
Claims (11)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| PCT/JP2004/006047 WO2005107329A1 (ja) | 2004-04-27 | 2004-04-27 | 有機el素子およびその製造方法 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| CN1977567A CN1977567A (zh) | 2007-06-06 |
| CN100581309C true CN100581309C (zh) | 2010-01-13 |
Family
ID=35242077
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN200480042888A Expired - Fee Related CN100581309C (zh) | 2004-04-27 | 2004-04-27 | 有机电致发光元件及其制造方法 |
Country Status (4)
| Country | Link |
|---|---|
| US (2) | US7737632B2 (zh) |
| JP (1) | JP5193465B2 (zh) |
| CN (1) | CN100581309C (zh) |
| WO (1) | WO2005107329A1 (zh) |
Families Citing this family (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP4730133B2 (ja) * | 2006-02-28 | 2011-07-20 | セイコーエプソン株式会社 | 有機el装置および電子機器 |
| US8586968B2 (en) * | 2006-03-14 | 2013-11-19 | Lg Chem, Ltd. | Organic light emitting diode having high efficiency and process for fabricating the same |
| JP5678455B2 (ja) * | 2010-03-30 | 2015-03-04 | 凸版印刷株式会社 | 有機el素子の製造方法及び有機elパネルの製造方法 |
Family Cites Families (18)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP3407750B2 (ja) * | 1992-09-30 | 2003-05-19 | ソニー株式会社 | 電子ビーム蒸着装置 |
| JPH07138739A (ja) * | 1993-11-11 | 1995-05-30 | Sony Corp | 真空蒸着装置 |
| JPH08120442A (ja) * | 1994-10-19 | 1996-05-14 | Oki Electric Ind Co Ltd | 真空蒸着方法および真空蒸着装置 |
| JPH09256142A (ja) | 1996-03-15 | 1997-09-30 | Sony Corp | 成膜装置 |
| JPH10270171A (ja) | 1997-01-27 | 1998-10-09 | Junji Kido | 有機エレクトロルミネッセント素子 |
| JP3640512B2 (ja) | 1997-09-24 | 2005-04-20 | 出光興産株式会社 | 蒸着方法および有機エレクトロルミネッセンス素子の製造方法 |
| GB9805476D0 (en) * | 1998-03-13 | 1998-05-13 | Cambridge Display Tech Ltd | Electroluminescent devices |
| JP4718670B2 (ja) | 1999-09-24 | 2011-07-06 | 株式会社半導体エネルギー研究所 | El表示装置 |
| JP4827294B2 (ja) * | 1999-11-29 | 2011-11-30 | 株式会社半導体エネルギー研究所 | 成膜装置及び発光装置の作製方法 |
| JP4364380B2 (ja) * | 1999-12-28 | 2009-11-18 | 株式会社半導体エネルギー研究所 | 薄膜作製装置及び薄膜作製方法 |
| JP3977011B2 (ja) * | 2000-12-25 | 2007-09-19 | 三星エスディアイ株式会社 | 有機エレクトロルミネッセンス素子 |
| JP4294305B2 (ja) | 2001-12-12 | 2009-07-08 | 株式会社半導体エネルギー研究所 | 成膜装置および成膜方法 |
| JP2003347051A (ja) * | 2002-05-28 | 2003-12-05 | Matsushita Electric Works Ltd | 有機電界発光素子 |
| US20040040504A1 (en) * | 2002-08-01 | 2004-03-04 | Semiconductor Energy Laboratory Co., Ltd. | Manufacturing apparatus |
| JP2004071506A (ja) * | 2002-08-09 | 2004-03-04 | Toshiba Corp | 有機el表示装置の製造方法及び製造システム |
| JP2004127627A (ja) | 2002-09-30 | 2004-04-22 | Semiconductor Energy Lab Co Ltd | 表示装置 |
| JP4527935B2 (ja) | 2002-10-01 | 2010-08-18 | 大日本印刷株式会社 | 有機エレクトロルミネッセント画像表示装置 |
| US8057856B2 (en) * | 2004-03-15 | 2011-11-15 | Ifire Ip Corporation | Method for gettering oxygen and water during vacuum deposition of sulfide films |
-
2004
- 2004-04-27 CN CN200480042888A patent/CN100581309C/zh not_active Expired - Fee Related
- 2004-04-27 WO PCT/JP2004/006047 patent/WO2005107329A1/ja not_active Ceased
- 2004-04-27 JP JP2006512679A patent/JP5193465B2/ja not_active Expired - Fee Related
- 2004-04-27 US US11/587,692 patent/US7737632B2/en not_active Expired - Fee Related
-
2010
- 2010-04-30 US US12/771,127 patent/US20100216269A1/en not_active Abandoned
Non-Patent Citations (1)
| Title |
|---|
| 特开平10-270171A 1998.10.09 |
Also Published As
| Publication number | Publication date |
|---|---|
| US7737632B2 (en) | 2010-06-15 |
| US20100216269A1 (en) | 2010-08-26 |
| JP5193465B2 (ja) | 2013-05-08 |
| CN1977567A (zh) | 2007-06-06 |
| WO2005107329A1 (ja) | 2005-11-10 |
| US20070231597A1 (en) | 2007-10-04 |
| JPWO2005107329A1 (ja) | 2008-03-21 |
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Effective date of registration: 20070511 Address after: Tokyo, Japan Applicant after: FUJIFILM Corp. Address before: Tokyo, Japan Applicant before: Fujifilm Corp. |
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Effective date of registration: 20130206 Address after: Dublin, Ireland Patentee after: UDC Ireland Ltd. Address before: Tokyo, Japan Patentee before: FUJIFILM Corp. |
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| CF01 | Termination of patent right due to non-payment of annual fee |
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