CN100405167C - Color filter substrate and manufacturing method thereof - Google Patents

Abstract

The present invention discloses a color filter substrate and a manufacturing method thereof, wherein the color filter substrate comprises a substrate, a plurality of color filter patterns, a black matrix layer, a plurality of spacers, a plurality of protruding structures and a common electrode. The color filter patterns are arranged on the substrate. The black matrix layer is arranged on the substrate and is located between the color filter patterns. The spacers are arranged on the black matrix layer and are connected to the black matrix layer. The protruding structures are arranged on the color filter patterns, and the materials of the black matrix layer, the spacers and the protruding structures are the same. The common electrode covers the color filter patterns, the black matrix layer, the protruding structures and the spacers. Based on the above, the present invention has the advantage of low manufacturing cost.

Description

Color filter substrate and manufacturing method thereof

technical field

The invention relates to a filter device and its manufacturing method, and in particular to a color filter substrate and its manufacturing method.

Background technique

Due to the increasing demand for displays, the industry is fully committed to the development of related displays. Among them, the cathode ray tube (cathode ray tube, CRT) has been monopolizing the display market for many years because of its excellent display quality and technological maturity. However, due to the rise of the concept of green environmental protection recently, based on the characteristics of large energy consumption and large radiation generated by cathode ray tubes, and the limited space for flattening their products, cathode ray tubes cannot meet the market demand for light, thin, short , small, beautiful and low power consumption market demand. Therefore, thin film transistor liquid crystal displays (thin film transistor liquid crystal displays, TFT-LCDs), which have superior characteristics such as high image quality, good space utilization efficiency, low power consumption, and no radiation, have gradually become the mainstream of the market. Among them, the color filter substrate is one of the important components of the liquid crystal display.

FIG. 1A to FIG. 1G are flowcharts illustrating a conventional manufacturing process of a color filter substrate. Please refer to FIG. 1A first. Firstly, the known manufacturing method of a color filter substrate is to use a first mask (not shown) to define a black matrix layer (black matrix) 12 on a substrate 11 . Next, as shown in FIG. 1B to FIG. 1D , a second mask (not shown), a third mask (not shown) and a fourth mask (not shown) are used in sequence to form the substrate 10 A plurality of red filter patterns 13a, a plurality of green filter patterns 13b and a plurality of blue filter patterns 13c are defined above, and these red filter patterns 13a, green filter patterns 13b and blue filter patterns 13c form a Color filter layer 13. After that, as shown in FIG. 1E , an overcoat layer 14 is first formed on the black matrix layer 11 and the color filter layer 13 , and then a common electrode 15 is formed on the overcoat layer 14 . Next, as shown in FIG. 1F , a fifth mask (not shown) is used to define and form a plurality of protrusion structures (protrusion) 16 on the common electrode 15 above the color filter layer 13 . Then, as shown in FIG. 1G , a sixth mask (not shown) is used to define a plurality of photo spacers 17 on the common electrode 15 above the black matrix layer 12 . Then, as shown in FIG. 1H , an alignment film layer 18 is formed on the common electrode 15 , the protrusion structure 16 and the spacer 17 . After completing the above process, a color filter substrate 10 can be manufactured.

It is worth noting that the known manufacturing method of the color filter substrate 10 uses a six-mask process. In order to reduce the manufacturing time and cost of the color filter substrate 10 , the manufacturing process must be changed to adopt a manufacturing method with fewer masks. That is, if the manufacturing time and cost of the conventional color filter substrate 10 are to be reduced, there is still considerable room for improvement in the manufacturing method of the conventional color filter substrate 10 .

Contents of the invention

The technical problem to be solved by the present invention is to provide a color filter substrate with low manufacturing cost.

Another technical problem to be solved by the present invention is to provide a color filter substrate with fewer manufacturing steps.

Another technical problem to be solved by the present invention is to provide a method for manufacturing a color filter substrate, which can manufacture the color filter substrate at a relatively low cost.

Another technical problem to be solved by the present invention is to provide a method for manufacturing a color filter substrate, which can manufacture a color filter substrate with fewer steps.

The technical solution of the present invention is: a color filter substrate, which includes a substrate, a plurality of color filter patterns, a black matrix layer, a plurality of spacers, a plurality of protruding structures and a common electrode . Wherein the color filter pattern is configured on the substrate. The black matrix layer is configured on the substrate and located between the color filter patterns. The spacer is arranged on the black matrix layer and connected with the black matrix layer. The protruding structure is arranged on the color filter pattern, and the materials of the black matrix layer, the spacer and the protruding structure are the same. The common electrode covers the color filter pattern, the black matrix layer, the protrusion structure and the spacer.

In the color filter substrate according to an embodiment of the present invention, the substrate has a plurality of sub-pixel regions, and each color filter pattern is configured in one of the sub-pixels.

The color filter substrate according to an embodiment of the present invention further includes an alignment film layer, and the alignment film layer is disposed on the common electrode.

In the color filter substrate according to an embodiment of the present invention, the color filter patterns include at least one red filter pattern, at least one green filter pattern and at least one blue filter pattern.

The present invention further provides a color filter substrate, which includes a substrate, a plurality of color filter patterns, a common electrode, a black matrix layer, a plurality of spacers and a plurality of protrusion structures. Wherein, the color filter pattern is configured on the substrate. The common electrode covers the color filter pattern and the substrate. The black matrix layer is disposed on the common electrode and located between the color filter patterns. The spacer is arranged on the black matrix layer and connected with the black matrix layer. The protruding structure is disposed on the common electrode above the color filter pattern, and the materials of the black matrix layer, the spacer and the protruding structure are the same.

In the color filter substrate according to an embodiment of the present invention, there are a plurality of sub-pixel regions on the substrate, and each color filter pattern is configured in one of the sub-pixel regions.

According to an embodiment of the present invention, the color filter substrate further includes an alignment film layer covering the common electrode, the black matrix layer, the protrusion structure and the spacers.

In the color filter substrate according to an embodiment of the present invention, the color filter patterns include at least one red filter pattern, at least one green filter pattern and at least one blue filter pattern.

The present invention further proposes a method for manufacturing a color filter substrate, and the method for manufacturing the color filter substrate includes the following steps. First, a substrate is provided. Multiple color filter patterns are formed on the substrate. Next, a light-shielding material layer is formed on the substrate to cover the substrate and the color filter pattern. Then, the light-shielding material layer is patterned to simultaneously define a black matrix layer, a plurality of protruding structures and a plurality of spacers. A common electrode is formed on the substrate to cover the color filter pattern, the black matrix layer, the protruding structure and the spacer. The spacer is arranged on the black matrix layer and formed integrally with the black matrix layer.

According to the method for manufacturing a color filter substrate according to an embodiment of the present invention, the method for patterning the light-shielding material layer includes the following steps. First, a mask is set on the light-shielding material layer, and the mask has a light-transmitting area, a non-light-transmitting area and a semi-light-transmitting area. Then, an exposure process and a development process are performed to pattern the light-shielding material layer to form a black matrix layer, protrusion structures and spacers.

According to the method for manufacturing a color filter substrate according to an embodiment of the present invention, the method for forming a color filter pattern includes the following steps. Firstly, a red filter material layer is formed on the substrate. The red filter material layer is patterned to form at least one red filter pattern on the substrate. Next, a green filter material layer is formed on the substrate. The green filter material layer is patterned to form at least one green filter pattern on the substrate. Then, a blue filter material layer is formed on the substrate. The blue filter material layer is patterned to form at least one blue filter pattern on the substrate.

The present invention also proposes another manufacturing method of the color filter substrate. The manufacturing method of the color filter substrate includes the following steps. First, a substrate is provided. Multiple color filter patterns are formed on the substrate. Next, a common electrode is formed on the substrate to cover the substrate and the color filter pattern. A light-shielding material layer is formed on the common electrode. Then, the light-shielding material layer is patterned to simultaneously define a black matrix layer, a plurality of protruding structures and a plurality of spacers, and the plurality of spacers are arranged on the black matrix layer and formed integrally with the black matrix layer.

According to the method for manufacturing a color filter substrate according to an embodiment of the present invention, the method for patterning the light-shielding material layer includes the following steps. First, a mask is set on the light-shielding material layer, and the mask has a light-transmitting area, a non-light-transmitting area and a semi-light-transmitting area. An exposure process and a development process are performed to pattern the light-shielding material layer to form a black matrix layer, protruding structures and spacers.

According to the method for manufacturing a color filter substrate according to an embodiment of the present invention, the method for forming a color filter pattern includes the following steps. Firstly, a red filter material layer is formed on the substrate. The red filter material layer is patterned to form at least one red filter pattern on the substrate. Next, a green filter material layer is formed on the substrate. The green filter material layer is patterned to form at least one green filter pattern on the substrate. Then, a blue filter material layer is formed on the substrate. The blue filter material layer is patterned to form at least one blue filter pattern on the substrate.

Based on the above, the color filter substrate and the manufacturing method thereof proposed by the present invention adopt a process with fewer masks, so the color filter substrate can be manufactured in a shorter time and with less consumable materials. If the color filter substrate is fabricated by the above manufacturing method, the production cost of the color filter substrate can be greatly reduced.

Description of drawings

1A to FIG. 1H are flowcharts illustrating a conventional manufacturing process of a color filter substrate.

FIG. 2 is a schematic structural diagram of a color filter substrate according to a first embodiment of the present invention.

3A to 3L are flow charts of the manufacturing method of the color filter substrate according to the first embodiment of the present invention.

FIG. 4 is a schematic structural diagram of a color filter substrate according to a second embodiment of the present invention.

5A to 5D are flowcharts of a method for manufacturing a color filter substrate according to a second embodiment of the present invention.

Description of main component symbols:

10: Color filter substrate 11, 110: Substrate

12, 130, 230: black matrix layer 13: color filter layer

13a, 120a: Red filter pattern 13b, 120b: Green filter pattern

13c, 120c: Blue filter pattern 14: Protective layer

15, 160, 210: common electrode 16, 150: protruding structure

17, 140: Spacer 18, 170: Alignment film layer

100: Color filter substrate 110a: Sub-pixel area

120: Color filter pattern 120d: Red filter material layer

120e: Green filter material layer 120f: Blue filter material layer

130a, 230a: shading material layer R1: first zone

R2: the second district R3: the third district

R4: the fourth area

Detailed ways

In order to make the above-mentioned technical solutions, features and advantages of the present invention more comprehensible, specific embodiments are specifically cited below, and detailed descriptions are as follows with reference to the accompanying drawings.

first embodiment

FIG. 2 is a schematic structural diagram of a color filter substrate according to a first embodiment of the present invention. Referring to FIG. 2 , the color filter substrate 100 includes a substrate 110 , a plurality of color filter patterns 120 , a black matrix layer 130 , a plurality of spacers 140 , a plurality of protruding structures 150 and a common electrode 160 . Wherein, the color filter pattern 120 is disposed on the substrate 110 . The black matrix layer 130 is disposed on the substrate 110 and located between the color filter patterns 120 . The spacer 140 is disposed on the black matrix layer 130 and connected with the black matrix layer 130 . The protruding structure 150 is disposed on the color filter pattern 120 , and the materials of the black matrix layer 130 , the spacer 140 and the protruding structure 150 are the same. The common electrode 160 covers the color filter pattern 120 , the black matrix layer 130 , the protrusion structure 150 and the spacer 140 .

In this embodiment, the substrate 110 has a plurality of sub-pixel regions 110a, and each color filter pattern 120 is disposed in one of the sub-pixel regions 110a. More specifically, the color filter patterns 120 include at least one red filter pattern 120a, at least one green filter pattern 120b, and at least one blue filter pattern 120c. In addition, the color filter substrate 100 further includes an alignment film layer 170 disposed on the common electrode 160 .

Based on the above, the substrate 110 is, for example, a glass substrate, a quartz substrate, or a substrate of other suitable materials. The material of the color filter patterns 120 (the red filter pattern 120 a , the green filter pattern 120 b and the blue filter pattern 120 c ) is, for example, resin or other suitable materials. The materials of the black matrix layer 130 , the spacers 140 and the protruding structures 150 are, for example, black photosensitive resin or other suitable materials. The material of the common electrode 160 is, for example, indium tin oxide (ITO), indium zinc oxide (IZO) or other suitable materials. The material of the alignment film layer 170 is, for example, polyacetyl resin (polyimide resin, PI) or other suitable materials. The manufacturing method of the color filter substrate 100 will be described in detail below.

3A to 3J are flow charts of the manufacturing method of the color filter substrate according to the first embodiment of the present invention. Please refer to FIG. 3A first, the manufacturing method of the color filter substrate is to firstly provide a substrate 110 .

Then, a color filter pattern 120 is formed on the substrate 110 to form a structure as shown in FIG. 3G . Wherein, the substrate 110 has a plurality of sub-pixel regions 110a. The color filter patterns 120 in these sub-pixel regions 110a include a red filter pattern 120a, a green filter pattern 120b, and a blue filter pattern 120c, and the detailed description of forming the color filter pattern 120 is shown in FIG. 3B to FIG. 3G Show.

First, as shown in FIG. 3B , a red filter material layer 120 d is first formed on the substrate 110 , and the method of forming the red filter material layer 120 d is, for example, spin coating or other suitable methods.

Next, a first mask M1 is used to pattern the red filter material layer 120d to form a red filter pattern 120a in the sub-pixel region 110a on the substrate 110, as shown in FIG. 3C. Wherein, if the red filter pattern 120a is a photosensitive material, the method of patterning the red filter material layer 120d is, for example, using a first mask M1 to directly perform an exposure process (exposure process) and a development process on the red filter material layer 120d. (develop process). If the red filter pattern 120a is not a photosensitive material, a photoresist layer (not shown) must first be formed on the red filter material layer 120d, and the photoresist layer is exposed and exposed by using a first mask M1. developing process to form a patterned photoresist layer (not shown). Next, using the patterned photoresist layer as a mask, the red filter material layer 120d is etched, and then the patterned photoresist layer is stripped to form the red filter pattern 120a.

As shown in FIG. 3D, then, a green filter material layer 120e is formed on the substrate 110, and a second mask M2 is used to pattern the green filter material layer 120e to form the green filter material layer 120e on the substrate 110 as shown in FIG. 3E At least one green filter pattern 120b. Since the formation and patterning method of the green filter material layer 120e is similar to that of the red filter material layer 120d, details will not be repeated here.

As shown in FIG. 3F, a blue filter material layer 120f is formed on the substrate 110, and a third mask M3 is used to pattern the blue filter material layer 120f to form the blue filter material layer 120f on the substrate 110 as shown in FIG. 3G. at least one blue filter pattern 120c. Similarly, the formation and patterning methods of the blue filter material layer 120f are the same or similar to those described above.

Referring to FIG. 3H , next, a light-shielding material layer 130 a is formed on the substrate 110 to cover the substrate 110 and the color filter pattern 120 . The method of forming the light-shielding material layer 130a is, for example, spin coating or other suitable methods. It should be particularly noted that the light-shielding material layer 130a is a photosensitive material.

Referring to FIG. 3I to FIG. 3J , then, the light-shielding material layer 130 a is patterned to simultaneously define a black matrix layer 130 , a plurality of spacers 140 and a plurality of protruding structures 150 . Wherein, as shown in FIG. 3I, the method for patterning the light-shielding material layer 130a is to set a mask M4 on the light-shielding material layer 130a, and the mask M4 has a first region R1, a second region R2, and a third region. R3 and a fourth region R4. Wherein, the third region R3 is a non-transparent region, the second region R2 and the fourth region R4 are semi-transparent regions, and the first region R1 is a region formed by combining the transparent region and the semi-transparent region. Then, as shown in FIG. 3J , an exposure process and a development process are performed to pattern the light-shielding material layer 130 a to form the black matrix layer 130 , spacers 140 and protruding structures 150 .

It should be noted that since the light penetration intensities of the first region R1 , the second region R2 , the third region R3 and the fourth region R4 are all different, the photosensitive depths of the regions of the light-shielding material layer 130 a are different. After the developing process, the remaining part of the light-shielding material layer (not shown) forms the black matrix layer 130 , the spacers 140 and the protruding structures 150 .

Referring to FIG. 3K , afterward, a common electrode 160 is formed on the substrate 110 to cover the color filter pattern 120 , the black matrix layer 130 , the spacers 140 and the protruding structure 150 . The method of forming the common electrode 160 is, for example, sputtering (sputter) or other suitable methods.

Please refer to FIG. 3L , and then, an alignment film layer 170 is formed on the common electrode 160 . The method for forming the alignment film layer 170 is, for example, offset printing or other suitable methods. After completing the above steps, the color filter substrate 100 can be completed.

It is worth mentioning that the black matrix, the spacers and the protruding structures in the manufacturing method of the color filter substrate 100 of this embodiment are formed by using one mask. Compared with the conventional technology that needs to use three masks for black matrix, spacer and protruding structure, the manufacturing method of color filter substrate 100 proposed in this embodiment can take shorter time and less consumables The color filter substrate 100 is fabricated. In other words, the manufacturing steps of the color filter substrate 100 are less and the manufacturing cost is lower.

It should be noted that, in the color filter substrate 100 of this embodiment, although the color filter substrate 100 includes an alignment film layer 170 , it is not limited to have the alignment film layer 170 . In other embodiments, whether the color filter substrate (not shown) includes an alignment film layer (not shown) depends on whether the alignment film layer is formed during the manufacturing method of the color filter substrate.

second embodiment

FIG. 4 is a schematic structural diagram of a color filter substrate according to a second embodiment of the present invention. Referring to FIG. 4 , the color filter substrate 200 is similar to the color filter substrate 100 of the first embodiment, except that the common electrode 210 covers the color filter pattern 120 and the substrate 110 . In addition, the black matrix layer 230 is disposed on the common electrode 210 and between the color filter patterns 120 , and the protrusion structure 150 is disposed on the common electrode 210 above the color filter patterns 120 . Wherein, the materials of the black matrix layer 230 and the common electrode 210 are the same as those of the black matrix layer 130 and the common electrode 160 in the first embodiment.

The manufacturing method of the above color filter substrate 200 is similar to the manufacturing method of the color filter substrate 100 . 5A to 5D are flowcharts of a manufacturing method of the color filter substrate 200 according to the second embodiment of the present invention.

Please refer to FIG. 5A first, the manufacturing method of the color filter substrate 200 is to firstly provide a substrate 110 . The substrate 110 has a plurality of sub-pixel regions 110a. Then, a red filter pattern 120 a , a green filter pattern 120 b , and a blue filter pattern 120 c are formed in the sub-pixel regions 110 a on the substrate 110 by the method described above, that is, the color filter pattern 120 is formed. Since the method of forming the color filter pattern 120 in the sub-pixel region 110a on the substrate 110 is the same as that described in the first embodiment, it will not be repeated here.

Referring to FIG. 5B , afterward, a common electrode 210 is formed on the substrate 110 to cover the substrate 110 and the color filter pattern 120 . The method of forming the common electrode 210 is, for example, sputtering (sputter) or other suitable methods. Afterwards, a light-shielding material layer 230 a is formed on the substrate 110 to cover the common electrode 210 . The method of forming the light-shielding material layer 230 a is, for example, spin coating or other suitable methods, and the light-shielding material layer 230 a is a photosensitive material.

Referring to FIG. 5C , then, the mask M4 is used to pattern the light-shielding material layer 230 a to simultaneously define a black matrix layer 230 , a plurality of spacers 140 and a plurality of protruding structures 150 . Wherein, the method of patterning the light-shielding material layer 230a is the same as that described in the first embodiment.

Please refer to FIG. 5D , and then, an alignment film layer 170 is formed on the common electrode 210 , the black matrix layer 130 , the spacer 140 and the protruding structure 150 . The method of forming the alignment film layer 170 is the same as that described in the first embodiment. After completing the above steps, the color filter substrate 200 can be completed.

Similar to the first embodiment, the black matrix, spacers and protrusion structures in the manufacturing method of the color filter substrate 200 of this embodiment are formed by using one mask. Therefore, the manufacturing method of the color filter substrate 200 proposed in this embodiment can also manufacture the color filter substrate 200 in a shorter time and with less consumable materials. In other words, the manufacturing steps of the color filter substrate 200 are less and the manufacturing cost is lower.

It should be noted that although the color filter substrate 200 of this embodiment also includes an alignment film layer 170 , it is not limited to have the alignment film layer 170 .

To sum up, the manufacturing method of the color filter substrate proposed by the present invention adopts a process with fewer masks, so the color filter substrate can be manufactured in a shorter time and with less consumable materials. If the color filter substrate is produced by the above-mentioned manufacturing method of the color filter substrate, the production time and cost of the color filter substrate can be greatly reduced.

Although the present invention has been disclosed with specific embodiments, it is not intended to limit the present invention. Any person skilled in the art can make replacements of equivalent components without departing from the concept and scope of the present invention, or replace them according to the present invention. The equivalent changes and modifications made in the scope of patent protection should still fall within the scope of this patent.

Claims (6)

1. the manufacture method of a colored optical filtering substrates comprises:

One substrate is provided;

On this substrate, form a plurality of color filter patterns;

On this substrate, form a light-shielding material layers, to cover this substrate and this color filter patterns;

This light-shielding material layers of patterning, to define black matrix layer, a plurality of projective structure and an a plurality of sept simultaneously, wherein, a plurality of septs are disposed on this black matrix layer, and integrally formed with this black matrix layer; And

On this substrate, form and use electrode altogether, to cover this color filter patterns, this black matrix layer, this projective structure and this sept.

2. the manufacture method of colored optical filtering substrates as claimed in claim 1 is characterized in that, the method for this light-shielding material layers of patterning comprises:

One mask is set on this light-shielding material layers, and this mask has a photic zone, a non-photic zone and a semi-opaque region; And

Carry out an exposure technology and a developing process, with this light-shielding material layers of patterning, should black matrix layer, this projective structure and this sept and form.

3. the manufacture method of colored optical filtering substrates as claimed in claim 1 is characterized in that, the method that forms this color filter patterns comprises:

On this substrate, form a red filter layer;

Patterning should redness filter layer, to form at least one red filter pattern on this substrate;

On this substrate, form a green filter layer;

Patterning should green filter layer, to form at least one green filter pattern on this substrate;

On this substrate, form a blue filter layer; And

Patterning should blueness filter layer, to form at least one blue filter pattern on this substrate.

4. the manufacture method of a colored optical filtering substrates comprises:

One substrate is provided;

On this substrate, form a plurality of color filter patterns;

On this substrate, form and use electrode altogether, to cover this substrate and this color filter patterns;

On this common electrode, form a light-shielding material layers; And

This light-shielding material layers of patterning, to define black matrix layer, a plurality of projective structure and an a plurality of sept simultaneously, wherein, a plurality of septs are disposed on this black matrix layer, and integrally formed with this black matrix layer.

5. the manufacture method of colored optical filtering substrates as claimed in claim 4 is characterized in that, the method for this light-shielding material layers of patterning comprises:

One mask is set on this light-shielding material layers, and this mask has a photic zone, a non-photic zone and a semi-opaque region; And

Carry out an exposure technology and a developing process, with this light-shielding material layers of patterning, should black matrix layer, this projective structure and this sept and form.

6. the manufacture method of colored optical filtering substrates as claimed in claim 4 is characterized in that, the method that forms this color filter patterns comprises:

On this substrate, form a red filter layer;

Patterning should redness filter layer, to form at least one red filter pattern on this substrate;

On this substrate, form a green filter layer;

Patterning should green filter layer, to form at least one green filter pattern on this substrate;

On this substrate, form a blue filter layer; And

Patterning should blueness filter layer, to form at least one blue filter pattern on this substrate.

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