CN100397558C - Method and apparatus for providing a substrate to a processing tool - Google Patents
Method and apparatus for providing a substrate to a processing tool Download PDFInfo
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- CN100397558C CN100397558C CNB03823887XA CN03823887A CN100397558C CN 100397558 C CN100397558 C CN 100397558C CN B03823887X A CNB03823887X A CN B03823887XA CN 03823887 A CN03823887 A CN 03823887A CN 100397558 C CN100397558 C CN 100397558C
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/677—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations
- H01L21/67739—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations into and out of processing chamber
- H01L21/67748—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations into and out of processing chamber horizontal transfer of a single workpiece
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/677—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations
- H01L21/67763—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations the wafers being stored in a carrier, involving loading and unloading
- H01L21/67769—Storage means
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/677—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations
- H01L21/67763—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations the wafers being stored in a carrier, involving loading and unloading
- H01L21/67775—Docking arrangements
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Abstract
Description
本申请要求2002年8月31日提交的第60/407336号美国临时申请的优先权,其全部内容合并于此以供参考。This application claims priority to US Provisional Application No. 60/407336, filed August 31, 2002, the entire contents of which are hereby incorporated by reference.
技术领域 technical field
本发明一般涉及衬底加工,特别是涉及向处理工具提供衬底的方法和设备。相关申请的相互引用The present invention relates generally to substrate processing, and more particularly to methods and apparatus for providing substrates to processing tools. Cross-references to related applications
本申请涉及下列普通转让的、共同待决的美国专利申请,每个申请的全部内容合并于此以供参考:This application is related to the following commonly assigned, co-pending U.S. patent applications, each of which is hereby incorporated by reference in its entirety:
2002年8月31日提交的、题为“System For Transporting WaferCarriers”(律师编号6900/L)的第60/407451号美国临时专利申请;U.S. Provisional Patent Application No. 60/407,451, filed August 31, 2002, entitled "System For Transporting WaferCarriers" (Attorney No. 6900/L);
2002年8月31日提交的、题为“Method and Apparatus for UsingWafer Carrier Movement to Actuate Wafer Carrier Door Opening/Closing”(律师编号6976/L)的第60/407339号美国临时专利申请;U.S. Provisional Patent Application No. 60/407,339, entitled "Method and Apparatus for Using Wafer Carrier Movement to Actuate Wafer Carrier Door Opening/Closing" (Attorney No. 6976/L), filed August 31, 2002;
2002年8月31日提交的、题为“Method and Apparatus for UnloadingWafer Carrier from Wafer Carrier Transport Systems”(律师编号7024/L)的第60/407474号美国临时专利申请;U.S. Provisional Patent Application No. 60/407,474, entitled "Method and Apparatus for Unloading Wafer Carrier from Wafer Carrier Transport Systems" (Attorney No. 7024/L), filed August 31, 2002;
2002年8月31日提交的、题为“End Effector Having Mechanism ForReorienting A Wafer Carrier Between Vertical And HorizontalOrientations”(律师编号7097/L)的第60/407452号美国临时专利申请;U.S. Provisional Patent Application No. 60/407,452, entitled "End Effector Having Mechanism For Reorienting A Wafer Carrier Between Vertical And Horizontal Orientations" (Attorney No. 7097/L), filed August 31, 2002;
2002年8月31日提交的、题为“Wafer Loading Station with DockingGrippers at Docking Station”(律师编号7099/L)的第60/407337号美国临时专利申请;U.S. Provisional Patent Application No. 60/407,337, entitled "Wafer Loading Station with DockingGrippers at Docking Station" (Attorney No. 7099/L), filed August 31, 2002;
2002年8月31日提交的、题为“Wafer Carrier having Door Latchingand Wafer Clamping Mechanism”(律师编号7156/L)的第60/407340号美国临时专利申请;U.S. Provisional Patent Application No. 60/407340, entitled "Wafer Carrier having Door Latching and Wafer Clamping Mechanism" (Attorney No. 7156/L), filed August 31, 2002;
2003年1月27日提交的、题为“Method and Apparatus forTransporting Wafer Carriers”(律师编号7163/L)的第60/443087号美国临时专利申请;U.S. Provisional Patent Application No. 60/443,087, entitled "Method and Apparatus for Transporting Wafer Carriers" (Attorney No. 7163/L), filed January 27, 2003;
2002年8月31日提交的、题为“Wafer Carrier Handler That UnloadsWafer Carriers Directly From a Moving Conveyor”(律师编号7676/L1)的第60/407463号美国专利申请;U.S. Patent Application No. 60/407,463, entitled "Wafer Carrier Handler That Unloads Wafer Carriers Directly From a Moving Conveyor" (Attorney No. 7676/L1), filed August 31, 2002;
2003年1月27日提交的、题为“Wafer Carrier Handler That UnloadsWafer Carriers Directly From a Moving Conveyor”(律师编号7676/L2)第60/443004号美国专利申请;U.S. Patent Application No. 60/443004, entitled "Wafer Carrier Handler That Unloads Wafer Carriers Directly From a Moving Conveyor" (Attorney No. 7676/L2), filed January 27, 2003;
2003年1月27日提交的、题为“Overhead Transfer Flange andSupport for Suspending Wafer Carrier”(律师编号8092/L)第60/443153号美国临时专利申请;U.S. Provisional Patent Application No. 60/443,153, filed January 27, 2003, and entitled "Overhead Transfer Flange and Support for Suspending Wafer Carrier" (Attorney No. 8092/L);
2003年1月27日提交的、题为“System and Methods For TransferringWafer Carriers Between Processing Tools”(律师编号8201/L)的第60/443001号美国临时专利申请;以及U.S. Provisional Patent Application No. 60/443,001, entitled "System and Methods For Transferring Wafer Carriers Between Processing Tools," (Attorney No. 8201/L), filed January 27, 2003; and
2003年1月27日提交的、题为“Apparatus and Method for Storingand Loading Wafer Carriers”(律师编号8202/L)的第60/443115号美国临时专利申请。U.S. Provisional Patent Application No. 60/443,115, entitled "Apparatus and Method for Storing and Loading Wafer Carriers" (Attorney No. 8202/L), filed January 27, 2003.
背景技术 Background technique
半导体器件制造于衬底(例如硅衬底、玻璃片或类似物)上,其通常被称为晶片,用于计算机、监视器等中。这些器件经由一系列制造步骤形成,例如薄膜沉积、氧化、蚀刻、抛光以及热处理和光刻处理。虽然可在一个加工设备上完成多个制造步骤,但是至少对于某些制造步骤,通常必须在不同的处理工具之间传输衬底。Semiconductor devices are fabricated on substrates (such as silicon substrates, sheets of glass, or the like), commonly referred to as wafers, used in computers, monitors, and the like. These devices are formed through a series of fabrication steps such as thin film deposition, oxidation, etching, polishing, and thermal and photolithographic treatments. While multiple fabrication steps can be accomplished on one processing tool, at least for some fabrication steps it is often necessary to transfer the substrate between different processing tools.
衬底通常储存在承载器中,用以在处理工具和其它位置之间运输。为确保处理工具不空转,工具应得到未加工衬底的几乎连续的供应。因此,装载和储存设备通常位于每个处理工具的附近。这些装载和储存设备一般包括一个或多个系泊台(docking station)(在系泊台处,衬底承载器被打开、将各个衬底从承载器取出并传送到某个处理工具),还包括多个位于系泊台之上的储存架、一个用于在装载和储存设备处接收承载器的生产装载位置、以及一个适于在生产装载位置、系泊台和多个储存架之间传送承载器的自动机械。自动机械可包括一个连接于支撑结构的末端执行器。特别地,支撑结构包括一个垂直导轨和一个水平导轨,对导轨进行设置以使末端执行器可在系泊台、多个储存架和生产装载位置之间水平和垂直移动。Substrates are typically stored in carriers for transport between processing tools and other locations. To ensure that the processing tool does not idle, the tool should have an almost continuous supply of raw substrates. Therefore, loading and storage equipment is usually located in the vicinity of each processing tool. These loading and storage facilities typically include one or more docking stations (where substrate carriers are opened, individual substrates are removed from the carriers and transferred to a processing tool), and Consists of multiple storage racks located above the mooring dock, a production loading location for receiving carriers at the loading and storage facility, and a production loading location for transfer between the production loading location, the mooring dock and the storage racks Automatic machinery for the carrier. The robot may include an end effector attached to a support structure. In particular, the support structure includes a vertical rail and a horizontal rail configured to allow horizontal and vertical movement of the end effector between the mooring dock, multiple storage racks, and production loading positions.
装载和储存设备可被设计成模块化的(例如,具有多个安装于机架上的部件,该机架典型地在单个处理工具的前面延伸)或可被设计成非模块化的(例如,具有多个独立安装的部件,且典型地具有在多个处理工具的前面延伸的水平和/或垂直导轨)。Loading and storage equipment may be designed to be modular (e.g., having multiple components mounted on a rack that typically extends in front of a single processing tool) or may be designed to be non-modular (e.g., have multiple independently mounted components and typically have horizontal and/or vertical rails extending in front of multiple processing tools).
在生产装载位置处接收到承载器后,自动机械可将承载器从生产装载位置移至某个储存架。其后,承载器可被从储存架移至系泊台。在将衬底从承载器取出、加工又回到承载器中之后,自动机械可将承载器从系泊台移至某个储存架。随后,自动机械可将承载器从储存架移至生产装载位置。衬底承载器在储存架、生产装载位置和系泊台之间移来移去,可使自动机械负担沉重,且可延长承载器中的衬底在工厂中处于未加工状态的时间周期。因此,人们希望衬底承载器的转运更加高效。After receiving the carrier at the production loading location, the robot may move the carrier from the production loading location to a storage rack. Thereafter, the carrier can be moved from the storage rack to the mooring dock. After the substrate has been removed from the carrier, processed and returned to the carrier, the robot may move the carrier from the dock to a storage rack. Robots can then move the carriers from storage racks to production loading positions. The movement of substrate carriers between storage racks, production loading locations, and mooring docks can tax robotic machinery and can extend the period of time that substrates in the carriers are in a raw state in the factory. Therefore, it is desirable to make the transfer of substrate carriers more efficient.
发明内容 Contents of the invention
在本发明的第一方面中,提供了一种向处理工具提供衬底的第一方法。第一方法包括以下步骤:(1)提供多个装载端口,每个装载端口均一个具有适于打开衬底承载器的机构;(2)提供一个生产交换位置,当衬底承载器在运动中且由衬底承载器传送装置传送时,在该位置处与该衬底承载器传送装置交换这些衬底承载器;(3)提供一个承载器装卸装置,其具有一个适于接触衬底承载器的末端执行器,该承载器装卸装置适于在生产交换位置与多个装载端口之间传送衬底承载器;且(4)在生产交换位置处,从衬底承载器传送装置中接收第一批衬底承载器。对于第一批衬底承载器中的每一个,该方法进一步包括以下步骤:(1)将衬底承载器从生产交换位置直接传送到多个装载端口中一个相应的装载端口;(2)在相应的装载端口处系泊(docking)并打开衬底承载器;(3)在相应装载端口处脱泊(undocking)并关闭衬底承载器;(4)将衬底承载器从相应装载端口直接传送到生产交换位置;且(5)将衬底承载器送回衬底承载器传送装置。In a first aspect of the invention there is provided a first method of providing a substrate to a processing tool. The first method comprises the steps of: (1) providing a plurality of loadports, each having a mechanism adapted to open the substrate carrier; (2) providing a production exchange location, when the substrate carrier is in motion and when transferred by the substrate carrier transfer device, the substrate carriers are exchanged with the substrate carrier transfer device at the position; (3) providing a carrier handling device having a device adapted to contact the substrate carrier an end effector adapted to transfer a substrate carrier between a production exchange location and a plurality of load ports; and (4) at the production exchange location, receiving a first Batch substrate carrier. For each of the first batch of substrate carriers, the method further includes the steps of: (1) transferring the substrate carrier from the production exchange location directly to a corresponding one of the plurality of load ports; Docking and opening the substrate carrier at the corresponding load port; (3) undocking and closing the substrate carrier at the corresponding load port; (4) directly removing the substrate carrier from the corresponding load port transporting to a production exchange location; and (5) returning the substrate carrier to the substrate carrier transport.
在本发明的第二方面中,提供了一种传送衬底承载器的第二方法。第二方法包括以下步骤:(1)在位于衬底装载台附近的衬底承载器传送机(conveyor)上传送衬底承载器,衬底装载台包括适于将衬底承载器传送到处理工具的装载端口的衬底承载器装卸装置;(2)当衬底承载器在运转中且由衬底承载器传送机传送时,使用衬底装载台的衬底承载器装卸装置的末端执行器来使衬底承载器脱离衬底承载器传送机;(3)将衬底承载器从衬底承载器传送机直接传送到装载端口;(4)在装载端口系泊和打开衬底承载器;(5)在装载端口脱泊和关闭衬底承载器;且(6)将衬底承载器直接送回衬底承载器传送机。In a second aspect of the invention, a second method of transporting a substrate carrier is provided. The second method includes the steps of: (1) conveying the substrate carrier on a substrate carrier conveyor located adjacent to the substrate loading station, the substrate loading station comprising a substrate suitable for conveying the substrate carrier to the processing tool (2) when the substrate carrier is in operation and conveyed by the substrate carrier conveyor, use the end effector of the substrate carrier handler of the substrate loading station to disengaging the substrate carrier from the substrate carrier conveyor; (3) transferring the substrate carrier from the substrate carrier conveyor directly to the loadport; (4) mooring and unlocking the substrate carrier at the loadport; ( 5) undocking and closing the substrate carrier at the load port; and (6) returning the substrate carrier directly to the substrate carrier conveyor.
在本发明的第三方面中,提供了一种将衬底承载器传送到衬底装载台的第三方法。第三方法包括在位于衬底装载台附近的衬底承载器传送机上传送衬底承载器。衬底装载台包括适于将衬底承载器传送到处理工具的第一装载端口的衬底承载器装卸装置,衬底承载器装卸装置包括:(1)垂直导轨;(2)与垂直导轨连接的水平导轨;和(3)适于支撑衬底承载器且适于相对于垂直导轨垂直移动和相对于水平导轨水平移动的末端执行器。In a third aspect of the invention, a third method of transferring a substrate carrier to a substrate load station is provided. A third method includes transferring the substrate carrier on a substrate carrier conveyor located adjacent to the substrate loading station. The substrate loading station includes a substrate carrier handling device adapted to transfer the substrate carrier to the first load port of the processing tool, the substrate carrier handling device includes: (1) a vertical rail; (2) connected to the vertical rail and (3) an end effector adapted to support the substrate carrier and to move vertically relative to the vertical rail and horizontally relative to the horizontal rail.
第三方法进一步包括:(1)使用衬底装载台的衬底承载器装卸装置的末端执行器来使衬底承载器脱离衬底承载器传送机;(2)将衬底承载器从衬底承载器传送机直接传送到第一装载端口;(3)在第一装载端口系泊和打开衬底承载器;(4)在第一装载端口脱泊和关闭衬底承载器;和(5)将衬底承载器直接送回衬底承载器传送机。提供了许多其它方面,如根据发明的这些和其它方面的系统和设备一般。所发明方法可通过使用具有适于接触和传输单个衬底的末端执行器的衬底装卸装置来类似地提供单个衬底(例如,那些不在衬底承载器上或中的衬底)的交换、传输和放置。The third method further includes: (1) disengaging the substrate carrier from the substrate carrier conveyor using an end effector of a substrate carrier handler of the substrate loading station; (2) removing the substrate carrier from the substrate The carrier conveyor transfers directly to the first loadport; (3) mooring and opening the substrate carrier at the first loadport; (4) unmooring and closing the substrate carrier at the first loadport; and (5) Return the substrate carrier directly to the substrate carrier conveyor. Many other aspects are provided, as are systems and devices according to these and other aspects of the invention. The inventive method can similarly provide for the exchange of individual substrates (e.g., those not on or in a substrate carrier) by using a substrate handler with an end effector adapted to contact and transport individual substrates, Transmission and placement.
根据所发明的方法和设备,将提供给处理工具的衬底/衬底承载器直接从生产交换位置传送到装载端口。将提供给处理工具的衬底/衬底承载器“直接”从生产交换位置传送到装载端口指的是传送过程中装卸装置没有将衬底/衬底承载器放置在除装载端口以外的其它支撑位置。According to the inventive method and apparatus, the substrate/substrate carrier provided to the processing tool is transferred directly from the production exchange location to the load port. Transfer of a substrate/substrate carrier provided to a processing tool "directly" from a production exchange location to a load port means that the transfer is done without the handling device placing the substrate/substrate carrier on a support other than the load port Location.
所发明的方法和设备提供了合理和高效的衬底和/或衬底承载器进出处理工具装载端口的运输。因此,可减少传送和加工衬底所需的总时间,也可减少衬底半制品(work-in-process)所需的成本和资金总额,且可减轻衬底承载器处理自动机械的负担。The inventive method and apparatus provide for rational and efficient transport of substrates and/or substrate carriers into and out of process tool load ports. Thus, the overall time required to transfer and process the substrate can be reduced, as well as the cost and capital required for the substrate work-in-process, and the burden on the substrate carrier handling robot can be reduced.
根据下面对示例性实施例的详细描述、所附的权利要求以及附图,本发明的更多特征和优点将变得更加明显。Further features and advantages of the present invention will become more apparent from the following detailed description of exemplary embodiments, the appended claims and the accompanying drawings.
附图说明 Description of drawings
图1是处理工具及相关的衬底承载器装载和储存设备的传统布置的俯视图;Figure 1 is a top view of a conventional arrangement of a processing tool and associated substrate carrier loading and storage equipment;
图2是图1的传统装载和储存设备的主视图;Figure 2 is a front view of the conventional loading and storage device of Figure 1;
图3A和图3B是根据本发明而提供的衬底承载器装载设备的两个示例性实施例的主视图;3A and 3B are front views of two exemplary embodiments of substrate carrier loading apparatus provided in accordance with the present invention;
图4是一个示意性的俯视图,说明了图3A和图3B所示的装载端口列的印迹(footprint);Figure 4 is a schematic top view illustrating the footprint of the load port columns shown in Figures 3A and 3B;
图5是一个示意性侧视图,说明了衬底装卸装置正靠近图3A或图3B所示的装载端口;Figure 5 is a schematic side view illustrating the substrate handler approaching the loadport shown in Figure 3A or Figure 3B;
图6是一个流程图,说明了操作图3A和图3B中所发明的衬底承载器装载设备及相关处理工具的方法。Figure 6 is a flowchart illustrating a method of operating the inventive substrate carrier loading apparatus and associated processing tools of Figures 3A and 3B.
具体实施方式 Detailed ways
相关术语related terms
在本文中,术语“系泊”是指衬底或衬底承载器进入到用于交换衬底的端口(例如净室壁中的端口)的动作。类似地,“脱泊”指的是衬底或衬底承载器离开用于交换衬底的端口(例如净室壁中的端口)的动作。In this context, the term "mooring" refers to the act of entering a substrate or substrate carrier into a port for exchanging substrates, eg a port in a clean room wall. Similarly, "undocking" refers to the action of a substrate or substrate carrier leaving a port for exchanging substrates, such as a port in a clean room wall.
“生产交换位置”包括在将衬底或衬底承载器从衬底或衬底承载器传送装置移走或者将衬底或衬底承载器放置到衬底或衬底承载器传送装置上的过程中一个装置处理衬底或衬底承载器的空间中的所有点。"Production exchange position" includes the process of removing a substrate or substrate carrier from or placing a substrate or substrate carrier on a substrate or substrate carrier conveyor One device handles all points in the space of a substrate or substrate carrier.
“衬底或衬底承载器传送装置”包括传送机、自动导向运载工具(AVG)或其它将衬底或衬底承载器传送到处理工具装载位置或者将衬底或衬底承载器从处理工具装载位置运走的装置。"Substrate or substrate carrier transfer device" includes a conveyor, automated guided vehicle (AVG), or other device that transfers a substrate or substrate carrier to or from a processing tool load location. Devices transported away from the loading position.
“处理工具”包括一个或多个处理腔以及一个或多个用来装载和卸载处理腔的衬底装卸装置。衬底装卸装置可以或不可以被封闭在其本身所具有的腔中,例如生产接口腔或传送腔。处理腔可完成衬底的真空的、常压的或其它处理,例如包括物理气相沉积(PVD)、化学气相沉积(CVD)、蚀刻、计量(metrology)、清洁、抛光等。A "processing tool" includes one or more processing chambers and one or more substrate handlers for loading and unloading the processing chambers. The substrate handler may or may not be enclosed in its own cavity, such as a production interface cavity or a transfer cavity. The processing chamber can perform vacuum, atmospheric or other processing of the substrate, including, for example, physical vapor deposition (PVD), chemical vapor deposition (CVD), etching, metrology, cleaning, polishing, and the like.
“装载端口”包括一个位置,衬底或衬底承载器被放置在该处,以便将衬底传送到处理工具和/或从处理工具中运走。A "loadport" includes a location at which a substrate or substrate carrier is placed for transfer to and/or removal of a substrate from a processing tool.
系统描述System specification
图1是一个俯视图,示出了一个用于储存承载器的、位于传统处理工具113附近的、传统模块化装载和储存设备111。图2是模块化装载和储存设备111的主视图。首先参考图1,所示的前端自动机械腔115(或生产接口)位于装载和储存设备111与处理工具113之间。如图1所示,装载和储存设备111位于净室壁117的第一侧面附近,前端自动机械腔115位于净室壁117的第二侧面附近。前端自动机械腔115包括一个自动机械119,其可沿导轨(未示出)水平移动以将衬底从装载和储存设备111中取出,并将其传送到处理工具113的装载锁定(loadlock)腔121。装载和储存设备111包括一对装载台123(在该实例中,装载台可进行系泊移动,因此被称为系泊台)和多个位于系泊台123之上(例如在一个高于系泊台的高度)的储存架201(在图2中最佳显示出),衬底承载器被放置在系泊台处以便于取出衬底。储存架201被安装在支撑机架203上。衬底承载器处理自动机械205也被安装在支撑机架203上。自动机械205包括垂直导轨207,而一个末端执行器209被安装在该垂直导轨上以作垂直运动。垂直导轨207被安装以沿水平导轨211作水平运动。用来接收衬底承载器的生产装载位置213位于系泊台123之间。FIG. 1 is a top view showing a conventional modular loading and
依靠垂直导轨207和水平导轨211,衬底承载器处理自动机械205的末端执行器209能够在生产装载位置213、储存架201和系泊台123之间移动衬底承载器。然而,如前所述,衬底承载器从生产装载位置213到储存架201、然后到系泊台213、并回到生产装载位置213(可能经过储存架201)的来回移动可导致向处理工具113提供衬底会消耗大量时间,从而增加了在制品的量。By means of
图3A是根据本发明而提供的示例性衬底装载台的示意性主视图。参考数字301通常代表所发明的衬底装载台。装载台301包括多个装载端口303。每个装载端口303优选具有系泊机构(未示出),例如一个机动夹具或平台,该机动夹具或平台适于支撑衬底承载器,并适于将衬底承载器移到传送衬底的开口或从该开口移走。在图3A所示的特定实施例中,装载端口303被安排成各有三个装载端口的两组305、307。因此,图3A中共有六个装载端口303。也可使用其它数量和/或结构的装载端口。组307与组305的侧面相邻且与其相隔一段间隔。每个装载端口303可包括用来打开已系泊到装载端口303的衬底承载器的机构,该机构通常由参考数字309表示。在本发明的一个实施例中,装载端口303适于接收单衬底承载器。术语“单衬底承载器”是指其形状和尺寸在同一时间只能接收一个衬底的衬底承载器。通常,装载端口303可接收任何类型的衬底承载器(例如,单衬底承载器、多衬底承载器、正面开口衬底承载器、正面开口标准容器(unified pod)或它们的组合等)。图3A说明了衬底承载器311已系泊到两个装载端口303。Figure 3A is a schematic front view of an exemplary substrate loading station provided in accordance with the present invention.
在一个实施例中,每个装载端口303皆适于在衬底承载器系泊(例如,承载器移动到净室壁的端口)的同时打开衬底承载器311。此打开可通过例如凸轮和从动件结构来完成。此类型的装载端口在前文所并入的共同待决的2002年8月31日提交的、题为“Method and Apparatusfor Using Wafer Carrier Movement to Actuate Wafer Carrier DoorOpening/Closing”(律师编号6976/L)的第60/407339号美国专利申请中公开。或者,可使用传统的开门装置(例如,在系泊后打开承载器的传统开门装置)。此类装置通常所使用的门接收装置将承载器门解锁并将门从承载器移开以允许取出衬底。In one embodiment, each
衬底承载器传送装置,例如传送机(由313示意表示的)被设计成用来将衬底承载器传送到所发明的衬底装载台301并将衬底承载器从所发明衬底装载台301中移走。衬底承载器交换装置315与所发明的衬底装载台301相关且位于传送机313附近,并且适于从传送机313中接收衬底承载器并适于将衬底承载器传送到传送机313。因此,可发现,衬底承载器交换装置315限定了生产交换位置317,并在该生产交换位置与传送机313交换衬底承载器。衬底承载器交换装置315可以是,例如,在前文并入的2002年8月31日提交的、题为“System ForTransporting Wafer Carriers”(律师编号6900/L)的第60/407451号美国专利申请中所示的类型,该专利申请公开了一种旋转平台,该旋转平台的旋转可使衬底承载器与上方的生产传送系统接触并连接或分离。A substrate carrier transfer device, such as a conveyor (schematically indicated by 313 ), is designed to transfer substrate carriers to the inventive
作为另一种选择,衬底承载器交换装置315可以是在共同待决的第09/755394号美国专利申请(律师编号5092)中所公开的类型,该专利申请公开了一种提升部件,提升部件直线向上伸出以使衬底承载器与上方的生产传送系统接触并连接或分离(且该专利申请全部内容合并于此以供参考)。作为又一种选择,衬底承载器交换装置315可以是在前文并入的2002年8月31日提交的、题为“Method and Apparatusfor Unloading Wafer Carrier from Wafer Carrier TransportSystems”(律师编号7024/L)的第60/407474号美国专利申请中所公开的类型,该专利申请公开了一种旋转臂,该旋转臂的旋转可使衬底承载器与上方的生产传送系统接触并连接或者分离。在另一种选择中,可以省去衬底承载器交换装置,且衬底装卸装置可与衬底传送装置313在生产交换位置(例如,在所发明的装载台和衬底传送装置之间的用来交换衬底的任何位置)交换衬底承载器。该方法被详细描述于共同待决的2002年8月31日提交的、第60/407463号美国专利申请(律师编号7676/L)和2003年1月27日提交的第60/443004号美国专利申请(律师编号7676/L2)中。Alternatively, the
衬底承载器交换装置315可被设计成,例如,当传送机(或在其上传送的承载器)在运转中时将衬底承载器从传送机313移走,以及当传送机(或一个沿其移动的衬底承载器运送器)在运转中时将衬底承载器传送到传送机313。因此,其实际上可以在半导体制造设施运转时保持传送机313的连续运转,因此改善了衬底在制造设施中的传送,减少每个特定衬底穿过制造设施所需的时间量,从而减少了在任意给定时间内半制品形式的衬底总数。The
所发明的装载台301进一步包括承载器装卸装置319。承载器装卸装置319包括一个适于接触衬底承载器311的末端执行器321。例如,末端执行器321可适于从底部支撑衬底承载器311,或从顶部夹住衬底承载器311等。The
末端执行器321适于沿垂直导轨323进行垂直移动。而垂直导轨323又适于沿水平导轨325进行水平移动。因此,末端执行器321可在生产交换位置317和所有装载端口303之间移动。也应理解的是,末端执行器321可在装载端口303列305、307之间的空间327中作垂直移动。在一种选择中,可按图3B所示重新定位垂直导轨和水平导轨,这样末端执行器321可适于沿水平导轨325作水平移动,而水平导轨325可沿垂直导轨323作垂直移动。虽然未在图3A或图3B中示出,但所发明装载台可包括一个或多个用来储存衬底和/或衬底承载器的储存架。The
图4是一个示意性俯视图,说明了所发明的装载台301的布局特征。在图4中,参考数字117代表净室壁。参考数字401代表装载端口303的列305的印迹。参考数字403表示装载端口303的列307的印迹。可以理解的是,零件的“印迹”是零件在设施底面上的投影。参考数字405表示印迹401和403之间的区域。所发明的装载台的一个工具“封套(envelope)”应理解为指的是印迹401和403外加印迹401和403之间的区域405。参考数字407表示由列401和403定义的工具封套。FIG. 4 is a schematic top view illustrating the layout features of the
承载器装卸装置319可以运行,这样其只在装载端口列305、307的印迹401、403定义的封套内移动衬底承载器311。控制器C控制承载器装卸装置319的操作且已被程序化,这样,承载器装卸装置按照参考流程图图6详细描述的根据本发明而运行,。The
再参考图3A和图3B,可观察到,生产交换位置317所处的高度大于每个装载端口303的高度。也可观察到,生产交换位置317和装载端口303的列305具有基本相同的印迹。然而,也可考虑所发明装载台301的其它布置。例如,生产交换位置317可位于装载端口303的高度或以下。生产交换位置317的印迹也可与装载端口303的列307的印迹403(图4)相一致。作为另一种选择,生产交换位置317的印迹可与装载端口303的列305、307的印迹401、403中任一个均不一致。Referring again to FIGS. 3A and 3B , it can be observed that the
图5是一个示意性的侧视图,说明了与传统处理工具113和所发明装的装载台301(图3A和图3B)的成列的装载端口303相关的衬底装卸装置。参考图5,参考数字501表示根据本发明所提供的衬底装卸装置。所发明的衬底装卸装置501可有选择地位于较低的位置(由参考数字503表示),其可在该位置上水平移动靠近到装载端口303列中最低的一个。所发明的衬底装卸装置501可有选择地位于较高的位置(由参考数字505表示),可在该位置上水平移动靠近到装载端口303列中最高的一个。可以理解的是,所发明的衬底装卸装置501也可有选择地位于所示位置503和505之间的任何中间位置(未在图5中特别标识),例如,所发明衬底装卸装置501可位于一个位置,其在该位置上可水平移动靠近成列的装载端口303中一个中间的端口。FIG. 5 is a schematic side view illustrating the substrate handling apparatus associated with the
在本文中,当衬底装卸装置延伸到装载端口区域中(例如,为了传送衬底)时,衬底装卸装置被说成是“靠近”装载端口。Herein, a substrate handler is said to be "near" a loadport when the substrate handler extends into the region of the loadport (eg, to transfer a substrate).
可以理解的是,在所发明的衬底装卸装置501将衬底(未示出)从一个已系泊到某个成列装载端口303的衬底承载器311(图3A或3B,未在图5中示出)中移走之后,其可将衬底提供给处理工具113,或更明确地,提供给处理工具113的装载锁定腔121(如图1所示,其并未在图5中单独示出)。It will be appreciated that the inventive substrate handler 501 transfers a substrate (not shown) from a substrate carrier 311 (FIG. 3A or 3B, not shown in FIG. 5), it may provide the substrate to the
图6是一个流程图,说明了根据本发明设计的衬底装载台的操作,例如所发明的图3A或图3B的衬底装载台301。控制器C可被连接到衬底装载台,并可有效完成一个或多个图6的处理步骤。FIG. 6 is a flowchart illustrating the operation of a substrate loader designed in accordance with the present invention, such as the
根据图6中第一个步骤601,衬底承载器311在生产交换位置317被接收。例如,在图3A或3B的示例性衬底装载台301中,承载器交换装置315将衬底承载器311从传送机313(例如,通过末端执行器321)移走。这可在例如传送机313处于运转中时发生。According to a
图6中步骤601之后是步骤603。在步骤603,承载器装卸装置319将衬底承载器311从生产交换位置317传送到一个或多个装载端口303。根据本发明,衬底承载器311被直接从生产交换位置317传送到装载端口303中的一个。就是说,在将衬底承载器311从生产交换位置317移走之后,而且在将衬底承载器311放置在装载端口303中的一个之前,承载器装卸装置319不会将衬底承载器311放置在除装载端口303中的一个之外的任何承载器支撑位置上。Step 603 is followed by
图6中,步骤603之后是步骤605。在步骤605,衬底承载器311在装载端口303中的一个处(衬底承载器311已被承载器装卸装置319放置于此处)被系泊和打开。如前所述,改造装载端口303可适于使衬底承载器311的系泊和打开同时发生。In FIG. 6 ,
图6中,步骤605之后是步骤607。在步骤607,衬底装卸装置501将衬底从衬底承载器311中取出,此时衬底承载器311已被系泊在一个装载端口303处并且已被其打开。然后,衬底装卸装置501将所取出的衬底由提供给处理工具113,而衬底处理(步骤609)发生在处理工具113内。In FIG. 6 ,
当完成了处理工具113中的衬底处理后,衬底装卸装置501将衬底送回衬底承载器311(步骤611),此时衬底承载器311在一个装载端口303处已被系泊并且已被打开。然后,所处理的衬底已被插入其中的衬底承载器311被关闭并与装载端口303脱泊(步骤613)。衬底承载器303的脱泊和关闭可同时发生。图6中,步骤613之后是步骤615。在步骤615,承载器装卸装置319将衬底承载器311从装载端口303传送到生产交换位置317。根据本发明的一个方面,可将衬底承载器311从装载端口303直接传送到生产交换位置317。就是说,在将衬底承载器311从装载端口303移走之后和在将其放置在生产交换位置317之前,可将衬底承载器311从装载端口303传送到生产交换位置317,而不会将其放置在任何承载器支撑位置。When substrate processing in the
图6中,步骤615之后是步骤617。在步骤617,承载器交换装置315将衬底承载器311送回到传送机313。在本发明的一个实施例中,这可在传送机313运转时完成。需要说明的是,在传送单个衬底的系统中或者在并不需要系泊衬底的系统中,可省略系泊和/或打开衬底承载器的步骤。因此,步骤605和613是可选的。可以理解的是,所发明的方法可以执行于各个独立衬底而不是衬底承载器。为了避免重复,本文未包括在承载器传送装置和处理工具间传送独立衬底(而不是衬底承载器)的额外附图。In FIG. 6 ,
本发明的方法和设备是有优势的,因为衬底承载器的进出装载端口的传输效率较高,因此可以减少衬底在半导体制造设施中总的传输时间。而这又可以转化为较少的半制品、较低的资本费用以及较少的每衬底制造成本。The method and apparatus of the present invention are advantageous because the transfer efficiency of the substrate carrier to and from the load port is high, thereby reducing the overall transfer time of the substrate in the semiconductor fabrication facility. This in turn translates into fewer work in progress, lower capital expense, and lower manufacturing cost per substrate.
前面的描述只公开了本发明的示例性实施例;对于本领域技术人员而言,落入本发明范围之内的上述方法和设备的各种修改是显而易见的。例如,上文结合图3A或3B所述的承载器装卸装置包括一条可沿单条水平导轨作水平移动的垂直导轨。另一方面,可以考虑使用其中将一条垂直导轨可滑动地安装于两条平行水平导轨之间的承载器装卸装置类型。作为另一种选择,可以使用在其中将一条水平导轨可滑动地安装于一条或多条垂直导轨上的承载器装卸装置类型。当然,也可使用其它类型的承载器装卸装置,包括那些不使用直线型导轨的承载器装卸装置。The foregoing description discloses only exemplary embodiments of the invention; various modifications of the above-described methods and apparatus which fall within the scope of the invention will become apparent to those skilled in the art. For example, the carrier handling apparatus described above with reference to Figures 3A or 3B includes a vertical rail that moves horizontally along a single horizontal rail. On the other hand, a carrier handling device of the type in which a vertical rail is slidably mounted between two parallel horizontal rails may be considered. Alternatively, a type of carrier handler in which a horizontal rail is slidably mounted to one or more vertical rails may be used. Of course, other types of carrier handling devices may be used, including those that do not use linear guides.
除了使用图3A和图3B所示的两个三装载端口列之外,也可考虑使用其它结构的装载端口。例如,每列装载端口可以只有两个装载端口,或者每列装载端口可以有四个或更多的装载端口。也不需要每个装载端口列提供数目相等的装载端口。作为另一种选择,可以只提供一列装载端口,或者可以提供三列或更多列的装载端口。还需注意的是,虽然每个成列的装载端口都被示为占有相同的印迹,但是也可使用印迹部分重叠或不重叠的其它结构。在某些实施例中,可使用单个装载端口,或使用两个或更多个水平相邻的装载端口。In addition to using two columns of three loadports as shown in FIGS. 3A and 3B , other configurations of loadports are also contemplated. For example, there may be only two load ports per column, or there may be four or more load ports per column. It is also not required that each loadport column provide an equal number of loadports. Alternatively, only one column of load ports may be provided, or three or more columns of load ports may be provided. Note also that while each column of loadports is shown occupying the same footprint, other configurations with partially overlapping or non-overlapping footprints may be used. In certain embodiments, a single loadport may be used, or two or more horizontally adjacent loadports may be used.
注意,图5所示的单个衬底装卸装置被设计成服务于一个装载端口列中的所有装载端口。作为可能的选择,可分别提供相应的衬底装卸装置来服务于每个装载端口。也可考虑使用单个衬底装卸装置来服务于一个以上装载端口列的全部装载端口。还可进一步考虑为每列装载端口分别提供相应的衬底装卸装置。Note that the single substrate handler shown in Figure 5 is designed to service all loadports in a loadport column. As a possible option, a respective substrate handler may be provided to service each loadport respectively. It is also contemplated to use a single substrate handler to service all loadports of more than one loadport column. It can further be considered to provide corresponding substrate handling devices for each column of load ports.
除了传送机313之外,可使用衬底承载器传送装置将衬底承载器送到生产交换位置或将衬底承载器从生产交换位置运走。如果将传送机用作衬底承载器传送装置,那么当半导体制造设施运转时,可任选地使传送机连续运转。In addition to the
虽然只说明了一个与所发明的装载台相关的生产交换位置,但是可考虑提供两个或更多的与所发明的衬底装载台相关的生产交换位置。例如,第一生产交换位置可被用来引入衬底承载器,而第二生产交换位置可被用来输出衬底承载器。也可考虑使用一个以上的衬底承载器传送装置来服务于一个所发明的衬底装载台。Although only one production exchange position is illustrated in relation to the inventive load station, it is contemplated that two or more production exchange positions may be provided in relation to the inventive substrate load station. For example, a first production exchange location may be used to bring in substrate carriers, while a second production exchange location may be used to output substrate carriers. It is also contemplated to use more than one substrate carrier transport to service one inventive substrate loading station.
优选地,本发明可被用于一个其机架上连接有垂直和水平导轨的衬底装载台中。在此方式中,优选的衬底装载台是模块化的,并且可被快速安装和校准。如果衬底装载台包括一个或多个储存架,那么每个储存架均可被安装在机架上。通过将衬底承载器装卸装置以及单个或多个储存架安装到机架上,衬底承载器装卸装置和储存架相互之间具有预定的位置。这进一步简化了安装和校准,是使用模块化衬底装载台的另一个优点。类似地,其它机构(例如所示的用来将衬底承载器装载到上方的生产传送系统和/或将衬底承载器从上方的生产传送系统卸载的机构)可被方便地安装在机架上。示例性的专用机构可包括旋转平台或旋转臂等,如在前面并入的2002年8月31日提交的第60/407451号美国专利申请和2002年8月31日提交的第60/407474号美国专利申请(律师编号6900和7024)中所述的。Preferably, the present invention is used in a substrate loading station having vertical and horizontal rails attached to the frame. In this manner, the preferred substrate loading station is modular and can be quickly installed and calibrated. If the substrate loading station includes one or more storage racks, each storage rack may be mounted on the rack. By mounting the substrate carrier handler and the single or multiple storage racks on the frame, the substrate carrier handler and the storage racks have a predetermined position relative to each other. This further simplifies setup and alignment and is another advantage of using a modular substrate loader. Similarly, other mechanisms, such as those shown for loading substrate carriers onto and/or unloading substrate carriers from an overhead production conveyor system, may be conveniently mounted on the rack superior. Exemplary dedicated mechanisms may include rotating platforms or arms, etc., as previously incorporated U.S. Patent Application Nos. 60/407451, filed August 31, 2002 and 60/407474, filed August 31, 2002 described in U.S. Patent Applications (Attorney Nos. 6900 and 7024).
一方面,机架可被安装在挣室壁上或某个腔(例如,生产接口腔)的前壁上的预定安装位置(例如,一个预先钻好的螺栓孔等)上。优选地,壁也具有用来安装系泊夹具或系泊平台的预定安装位置。此外,壁可具有用来安装衬底承载器打开机构的预定安装位置。当机架、系泊机构、和衬底承载器打开机构均被安装在同一平面的预定位置时,不但它们之间的相对位置已被预先确定,而且衬底装载台的安装和校准也被简化。In one aspect, the frame can be mounted at a predetermined mounting location (eg, a pre-drilled bolt hole, etc.) on the chamber wall or on the front wall of a cavity (eg, a production interface cavity). Preferably, the wall also has predetermined mounting locations for mounting mooring fixtures or mooring platforms. Furthermore, the wall may have predetermined mounting locations for mounting the substrate carrier opening mechanism. When the frame, mooring mechanism, and substrate carrier opening mechanism are all mounted at predetermined positions on the same plane, not only their relative positions are predetermined, but also the installation and alignment of the substrate loading station is simplified .
已通过结合单衬底承载器说明了本发明。然而,也可考虑将本发明应用于保持一个以上衬底的多个衬底承载器,或将本发明应用于独立衬底的传送(不借助于承载器来进行传送)。显而易见的是,所发明的设备可与此处所示的示例性实施例存在较大不同。然而,任何根据图6方法操作的设备(无论是否执行系泊和打开操作,而且无论是否使用衬底承载器(例如,独立衬底系统))皆落入本发明的范围之内。The invention has been described in connection with a single substrate carrier. However, it is also conceivable to apply the invention to multiple substrate carriers holding more than one substrate, or to the transfer of individual substrates without the aid of carriers. It is obvious that the inventive device can differ considerably from the exemplary embodiments shown here. However, any apparatus that operates according to the method of FIG. 6, whether or not performing mooring and unwrapping operations, and whether or not using a substrate carrier (eg, a stand-alone substrate system) falls within the scope of the present invention.
因此,虽然本发明是通过结合其优选实施例而公开的,但应该清楚的是,其它实施例应该落入本发明的精神和范围内,如本发明的权利要求所定义的。Therefore, while the invention has been disclosed in conjunction with preferred embodiments thereof, it should be clear that other embodiments are within the spirit and scope of the invention, as defined by the appended claims.
Claims (20)
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US40733602P | 2002-08-31 | 2002-08-31 | |
| US60/407,336 | 2002-08-31 |
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| CN100397558C true CN100397558C (en) | 2008-06-25 |
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| CNB03823887XA Expired - Fee Related CN100397558C (en) | 2002-08-31 | 2003-08-28 | Method and apparatus for providing a substrate to a processing tool |
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| KR (1) | KR101058597B1 (en) |
| CN (1) | CN100397558C (en) |
| AU (1) | AU2003265798A1 (en) |
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| CN101366111B (en) * | 2006-02-01 | 2010-06-09 | 奥林巴斯株式会社 | Substrate exchange device, substrate processing device, and substrate inspection device |
| GB2469112A (en) | 2009-04-03 | 2010-10-06 | Mapper Lithography Ip Bv | Wafer support using controlled capillary liquid layer to hold and release wafer |
| KR101586984B1 (en) * | 2009-02-22 | 2016-01-20 | 마퍼 리쏘그라피 아이피 비.브이. | Preparation unit for lithograpahy machine |
| TWI514089B (en) | 2011-04-28 | 2015-12-21 | Mapper Lithography Ip Bv | Apparatus for transferring a substrate in a lithography system |
| CN104907288A (en) * | 2014-03-13 | 2015-09-16 | 东莞高伟光学电子有限公司 | Cleaning equipment and process for cleaning electronic components |
| CN106166717B (en) * | 2016-09-23 | 2018-07-13 | 江西洪都航空工业集团有限责任公司 | A kind of auxiliary support apparatus on flexible assemble production line |
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| US5382127A (en) * | 1992-08-04 | 1995-01-17 | International Business Machines Corporation | Pressurized interface apparatus for transferring a semiconductor wafer between a pressurized sealable transportable container and a processing equipment |
| US5603777A (en) * | 1994-06-27 | 1997-02-18 | Dainippon Screen Mfg. Co., Ltd. | Substrate surface treating apparatus and substrate surface treating method |
| JPH10256346A (en) * | 1997-03-13 | 1998-09-25 | Tokyo Electron Ltd | Cassette transferring mechanism and semiconductor manufacturing apparatus |
| US20020090282A1 (en) * | 2001-01-05 | 2002-07-11 | Applied Materials, Inc. | Actuatable loadport system |
| US6439822B1 (en) * | 1998-09-22 | 2002-08-27 | Tokyo Electron Limited | Substrate processing apparatus and substrate processing method |
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| JP2905857B2 (en) * | 1989-08-11 | 1999-06-14 | 東京エレクトロン株式会社 | Vertical processing equipment |
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2003
- 2003-08-28 WO PCT/US2003/026918 patent/WO2004021411A2/en not_active Ceased
- 2003-08-28 AU AU2003265798A patent/AU2003265798A1/en not_active Abandoned
- 2003-08-28 CN CNB03823887XA patent/CN100397558C/en not_active Expired - Fee Related
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| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5382127A (en) * | 1992-08-04 | 1995-01-17 | International Business Machines Corporation | Pressurized interface apparatus for transferring a semiconductor wafer between a pressurized sealable transportable container and a processing equipment |
| US5603777A (en) * | 1994-06-27 | 1997-02-18 | Dainippon Screen Mfg. Co., Ltd. | Substrate surface treating apparatus and substrate surface treating method |
| JPH10256346A (en) * | 1997-03-13 | 1998-09-25 | Tokyo Electron Ltd | Cassette transferring mechanism and semiconductor manufacturing apparatus |
| US6439822B1 (en) * | 1998-09-22 | 2002-08-27 | Tokyo Electron Limited | Substrate processing apparatus and substrate processing method |
| US20020090282A1 (en) * | 2001-01-05 | 2002-07-11 | Applied Materials, Inc. | Actuatable loadport system |
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| TW200408041A (en) | 2004-05-16 |
| KR20050057012A (en) | 2005-06-16 |
| WO2004021411A2 (en) | 2004-03-11 |
| WO2004021411A3 (en) | 2004-04-15 |
| TWI355708B (en) | 2012-01-01 |
| CN1689140A (en) | 2005-10-26 |
| KR101058597B1 (en) | 2011-08-22 |
| AU2003265798A1 (en) | 2004-03-19 |
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