Transfer printing film structure and manufacturing method thereof, and three-dimensional transfer printing product and manufacturing method thereof
Technical Field
The present invention relates to a transfer film structure and a method for manufacturing the same, and a transfer product and a method for manufacturing the same, and more particularly, to a transfer film structure including a light shielding layer and a method for manufacturing the same, and a three-dimensional transfer product and a method for manufacturing the same.
Background
In order to enhance the aesthetic feeling of the appearance of the article, various transfer printing films having various transfer printing patterns and capable of being attached to the surface of an article exist, for example, the transfer printing films can be attached to the housings of electronic products such as mobile phones or notebook computers. However, most of the transfer films have patterns that are only planar transfer patterns, and not three-dimensional transfer patterns with three-dimensional touch.
The transfer printing film structure is manufactured by providing a release agent layer, arranging a soft coating on the release agent layer, arranging an ink layer on the soft coating opposite to the release agent layer, arranging an adhesive layer on the ink layer opposite to the soft coating, and finally manufacturing the transfer printing film structure. After the transfer printing film structure is fixed on the surface of an object through the adhesive layer and the release agent layer is removed, a three-dimensional transfer printing pattern is formed on the surface of the object.
However, after the release agent layer is removed, the release agent often remains on the three-dimensional transfer pattern, and the release agent cannot be completely removed, which affects the beauty of the three-dimensional transfer pattern. Therefore, how to solve the disadvantages of the conventional transfer film structure caused by the release agent is the objective of the present research.
Disclosure of Invention
The first objective of the invention is to provide a transfer film structure. The transfer printing film structure can not leave release agent on the three-dimensional transfer printing pattern formed on the surface of an object.
The transfer printing film structure comprises an elastic thin film substrate layer, a template layer, a first shading layer, a second shading layer, a filling layer, a dark reaction layer, a first pattern layer and a fixing layer.
The template layer is formed on the elastic film substrate layer in a first pattern and is formed of a coating.
The first shading layer is formed on the elastic film base material layer in a second pattern which is complementary to the first pattern and is formed by ultraviolet light absorption ink, and the first shading layer and the template layer are located on the same plane.
The second light-shielding layer is formed on the stencil layer in the first pattern and is formed of an ultraviolet light-absorbing ink.
The filling layer is formed on the second shading layer in the first pattern and is formed by transparent ink.
The dark reaction layer is formed on the filling layer in the first pattern.
The first pattern layer is formed on the first shading layer in the second pattern and is formed by oil-soluble paint, and the first pattern layer is contacted with the second shading layer, the filling layer and the dark reaction layer.
The fixed layer is disposed on the dark reaction layer and the first pattern layer.
The second objective of the present invention is to provide a method for manufacturing the transfer film structure.
The manufacturing method of the transfer printing film structure comprises the following steps:
step (a): forming a template layer formed by coating on an elastic film base material layer in a first pattern;
step (b): forming a first shading layer formed by ultraviolet light absorption ink on the elastic film base material layer by using a second pattern which is complementary to the first pattern, wherein the first shading layer and the template layer are positioned on the same plane;
step (c): forming a second light shielding layer formed by ultraviolet light absorbing ink on the template layer in the first pattern;
step (d): forming a first pattern sub-layer formed by oil-soluble paint on the first shading layer in the second pattern, wherein the first pattern sub-layer and the second shading layer are on the same plane;
a step (e): forming a filling layer formed by transparent ink on the second shading layer in the first pattern;
step (f): forming a second pattern sub-layer formed by oil-soluble paint on the first pattern sub-layer in a second pattern, wherein the second pattern sub-layer and the filling layer are positioned on the same plane;
step (g): forming a dark reaction layer on the filling layer in the first pattern;
a step (h): forming a third pattern sublayer formed by oil-soluble paint on the second pattern sublayer in the second pattern, wherein the third pattern sublayer and the dark reaction layer are positioned on the same plane, and the first pattern sublayer, the second pattern sublayer and the third pattern sublayer jointly define a first pattern layer; and
step (i): forming a fixing layer on the dark reaction layer and the third pattern sub-layer to obtain the transfer printing film structure.
In addition, a third object of the present invention is to provide a three-dimensional transfer product without leaving release agent on the three-dimensional transfer pattern.
The three-dimensional transfer product comprises an object, a fixing layer, a dark reaction layer, a third pattern sublayer, a filling layer, a second pattern sublayer and a first pattern sublayer.
The fixing layer is adhered on the surface of the object.
The dark reaction layer is disposed on the fixed layer in a first pattern.
The third pattern sub-layer is arranged on the fixed layer in a second pattern which is complementary to the first pattern and is formed by oil-soluble paint, and the third pattern sub-layer and the dark reaction layer are arranged on the same plane.
The filling layer is covered on the dark reaction layer in the first pattern and is formed by transparent ink.
The second pattern sub-layer is covered on the third pattern sub-layer by the second pattern and is formed by oil-soluble paint, and the second pattern sub-layer and the filling layer are positioned on the same plane.
The first pattern sublayer is covered on the second pattern sublayer by the second pattern and is formed by oil-soluble paint, and the first pattern sublayer, the second pattern sublayer and the third pattern sublayer jointly define a first pattern layer.
The fourth object of the present invention is to provide a method for producing the three-dimensional transfer product.
The method for manufacturing the three-dimensional transfer printing product comprises all the steps of the manufacturing method of the transfer printing film structure and the following steps:
step (j): attaching the fixing layer of the transfer printing film structure to an object surface;
step (k): irradiating with ultraviolet light from the elastic film base material layer toward the fixing layer after the step (j);
step (l): after the step (k), removing the first light-shielding layer, the second light-shielding layer, the template layer and the elastic thin film substrate layer from the filling layer and the first pattern layer; and
step (m): after the step (l), irradiating the first pattern layer, the filling layer, the dark reaction layer and the fixing layer with ultraviolet light to obtain the three-dimensional transfer product.
The fifth object of the present invention is to provide another method for producing the aforementioned three-dimensional transfer product.
The method for manufacturing the three-dimensional transfer product comprises the steps (a) to (h) of manufacturing the transfer film structure and the following steps:
step (h 1): forming a second pattern layer formed by oil-soluble paint on the dark reaction layer and the third pattern sublayer;
step (i): forming a fixing layer above the second pattern layer to obtain the transfer printing film structure;
step (j): attaching the fixing layer of the transfer printing film structure to an object surface;
step (k): irradiating with ultraviolet light from the elastic film base material layer toward the fixing layer after the step (j);
step (l): after the step (k), removing the first light-shielding layer, the second light-shielding layer, the template layer and the elastic thin film substrate layer from the filling layer and the first pattern layer; and
step (m): after the step (l), irradiating the first pattern layer, the second pattern layer, the filling layer, the dark reaction layer and the fixing layer with ultraviolet light to obtain the three-dimensional transfer product.
The invention has the following effects: the transfer printing film structure of the invention can enable the first shading layer, the second shading layer, the template layer and the elastic thin film base material layer to be easily removed from the filling layer and the first pattern layer only by irradiating ultraviolet light after being pasted on the surface of an object through the arrangement of the first shading layer and the second shading layer, and is different from the prior art that the release agent layer is removed after the existing transfer printing film structure is pasted on the surface of an object. Therefore, the transfer film structure of the invention does not leave release agent on the three-dimensional transfer pattern formed on the surface of the object (i.e. on the filling layer and the first pattern layer).
The present invention will be described in detail below:
[ transfer film Structure ]
Preferably, the material of the elastic film substrate layer is polyvinyl alcohol, nylon, polymethylpentene, polyethylene terephthalate, polybutylene terephthalate, polyvinylpyrrolidone, polyethylene, polypropylene or a combination thereof.
Preferably, the material of the dark reaction layer is a cationic resin, a thiol resin, or a combination thereof.
Preferably, the template layer is fixed on the elastic film substrate layer.
Preferably, the transfer film structure of the present invention further comprises a second pattern layer formed of an oil-soluble paint and disposed between the dark reaction layer, the first pattern layer and the fixing layer.
Preferably, the transfer film structure of the present invention further comprises a release film attached on the fixing layer.
[ method for producing transfer film Structure ]
Preferably, the method for manufacturing a transfer film structure of the present invention further comprises a step (h1) after the step (h), wherein the step (h1) is to form a second pattern layer formed of an oil-soluble paint on the dark reaction layer and the third pattern sub-layer, and the step (i) is to form the fixing layer on the second pattern layer.
[ three-dimensional transfer product ]
Preferably, the three-dimensional transfer product of the present invention further comprises a second pattern layer formed of an oil-soluble paint and disposed between the dark reaction layer, the first pattern layer and the fixing layer.
Drawings
Other features and effects of the present invention will be apparent from the embodiments with reference to the accompanying drawings, in which:
FIG. 1 is a schematic sectional view illustrating step (a) of the process of example 1;
FIG. 2 is a schematic sectional view illustrating step (b) of the process of example 1;
FIG. 3 is a schematic sectional view illustrating step (c) of the process of example 1;
FIG. 4 is a schematic sectional view illustrating step (d) of the manufacturing method of example 1;
FIG. 5 is a schematic sectional view illustrating step (e) of the process of example 1;
FIG. 6 is a schematic sectional view illustrating step (f) of the manufacturing method of example 1;
FIG. 7 is a schematic sectional view illustrating step (g) of the process of example 1;
FIG. 8 is a schematic sectional view illustrating step (h) of the production method of example 1;
fig. 9 is a schematic cross-sectional view illustrating step (i) of the manufacturing method of example 1 and the transfer film structure obtained from example 1;
FIG. 10 is a schematic cross-sectional view illustrating a transfer film structure obtained in example 2;
fig. 11 is a schematic cross-sectional view illustrating the transfer film structure obtained by the manufacturing method of example 1 attached to the surface of an object through the fixing layer thereof;
fig. 12 is a schematic sectional view illustrating step (m) of the production method of application example 1 and a three-dimensional transfer product obtained by application example 1;
fig. 13 is a schematic cross-sectional view illustrating the transfer film structure obtained by the manufacturing method of example 2 attached to the surface of an object through the fixing layer thereof; and
fig. 14 is a schematic sectional view illustrating step (m) of the production method of application example 2 and a three-dimensional transfer product obtained by application example 2.
Detailed Description
Before the present invention is described in detail, it should be noted that in the following description, like elements are represented by like reference numerals.
< example 1>
Preparation of transfer film Structure (comprising a Pattern layer)
The method for manufacturing the transfer film structure of this embodiment 1 includes the following steps:
step (a): referring to fig. 1, a template layer 2 formed of HA-Clear coating (manufactured by yokoku corporation) is formed on an elastic film substrate layer 1 in a first pattern 20, wherein the elastic film substrate layer 1 is formed by co-extruding a polyvinyl alcohol sublayer and two nylon sublayers respectively located at opposite sides of the polyvinyl alcohol sublayer.
Step (b): referring to fig. 2, a first light shielding layer 3 formed of an ultraviolet light absorbing INK (UV-AB INK; manufactured by mercy chemical inc.) is formed on the elastic film substrate layer 1 in a second pattern 30 complementary to the first pattern 20, and the first light shielding layer 3 is positioned on the same plane as the template layer 2.
Step (c): referring to fig. 3, a second light shielding layer 4 formed of ultraviolet light absorbing INK (UV-AB INK) is formed on the template layer 2 in the first pattern 20.
Step (d): referring to FIG. 4, a first pattern sub-layer 71 formed of an oil-soluble paint (HA-K, HA-C, HA-M or HA-Y; manufactured by Darlowski chemical Co., Ltd.) is formed on the first light-shielding layer 3 in the second pattern 30, and the first pattern sub-layer 71 is located on the same plane as the second light-shielding layer 4.
A step (e): referring to fig. 5, a filling layer 5 formed of a transparent ink (UV-HClear; manufactured by merchantry chemical industries, ltd.) is formed on the second light-shielding layer 4 in the first pattern 20.
Step (f): referring to fig. 6, a second pattern sub-layer 72 formed of an oil-soluble paint (HA-K, HA-C, HA-M or HA-Y) is formed on the first pattern sub-layer 71 in the second pattern 30, and the second pattern sub-layer 72 is positioned on the same plane as the filling layer 5.
Step (g): referring to fig. 7, a dark reaction layer 6 formed of INK (UV-SH INK; manufactured by sovereign chemical inc.) is formed on the filling layer 5 in the first pattern 20.
A step (h): referring to fig. 8, a third pattern sub-layer 73 formed of an oil-soluble coating (HA-K, HA-C, HA-M or HA-Y) is formed on the second pattern sub-layer 72 in the second pattern 30, the third pattern sub-layer 73 is positioned on the same plane as the dark reaction layer 6, and the first pattern sub-layer 71, the second pattern sub-layer 72 and the third pattern sub-layer 73 together define a first pattern layer 7.
Step (i): referring to fig. 9, a fixing layer 8 formed by HAB adhesive is formed on the dark reaction layer 6 and the third pattern sub-layer 73 to obtain the transfer film structure 100.
It should be noted that the order of forming the filling layer 5 and the second pattern sub-layer 72 is not particularly limited, and in the method of the present embodiment, the second pattern sub-layer 72 may be formed first [ step (f) ] and then the filling layer 5 may be formed [ step (e) ]. In addition, the order of forming the dark reaction layer 6 and the third pattern sublayer 73 is also not particularly limited, and in the method of the present embodiment, the third pattern sublayer 73 may be formed first (step (h)) and then the dark reaction layer 6 may be formed (step (g)).
Transfer film structure obtained in example 1
Referring to fig. 9, the transfer film structure 100 obtained in embodiment 1 includes an elastic thin film substrate layer 1, a template layer 2, a first light shielding layer 3, a second light shielding layer 4, a filling layer 5, a dark reaction layer 6, a first pattern layer 7, and a fixing layer 8.
The template layer 2 is formed in a first pattern 20 and is secured to the elastic film substrate layer 1 and is formed of HA-Clear coating.
The first light shielding layer 3 is formed on the elastic film substrate layer 1 in a second pattern 30 complementary to the first pattern 20 and is formed by ultraviolet light absorbing INK (UV-AB INK), and the first light shielding layer 3 and the stencil layer 2 are located on the same plane.
The second light-shielding layer 4 is formed on the stencil layer 2 in the first pattern 20 and is formed of ultraviolet light-absorbing ink (UV-ABINK).
The filling layer 5 is formed on the second light-shielding layer 4 in the first pattern 20 and is formed of a transparent ink (UV-H Clear).
The dark reaction layer 6 is formed of INK (UV-SH INK) and is formed on the filling layer 5 in the first pattern 20.
The first patterning layer 7 is formed in the second pattern 30 on the first light-shielding layer 3 and is formed of an oil-soluble paint (HA-K, HA-C, HA-M or HA-Y). The first pattern layer 7 includes a first pattern sub-layer 71, a second pattern sub-layer 72 and a third pattern sub-layer 73, and the first pattern layer 7 contacts with the second light-shielding layer 4, the filling layer 5 and the dark reaction layer 6 and is spaced from the elastic film substrate layer 1.
The fixing layer 8 is disposed on the dark reaction layer 6 and the first pattern layer 7 and is formed of HAB back glue.
It should be noted that the transfer film structure 100 of the present embodiment may further include a deposition layer (not shown) disposed between the dark reaction layer 6, the first pattern layer 7 and the fixing layer 8 and having a metal texture according to a user's requirement. In addition, the transfer film structure 100 of the present embodiment may also include a release film (not shown) attached on the fixing layer 8 according to a user's requirement, and when the transfer film structure 100 of the present embodiment is to be used to generate a three-dimensional transfer pattern on an object, the release film needs to be removed from the fixing layer 8.
< example 2>
Preparation of transfer film Structure (comprising two Pattern layers)
Referring to fig. 10, the manufacturing method of the transfer film structure 100 of the embodiment 2 is similar to that of the embodiment 1, and the difference is that the manufacturing method of the embodiment further includes a step (h1) of forming a second pattern layer 9 on the third pattern sub-layer 73 and the dark reaction layer 6 after the step (h), the second pattern layer 9 is formed by an oil-soluble paint (HA-K, HA-C, HA-M or HA-Y), and the step (i) is to form the fixed layer 8 on the second pattern layer 9.
Example 2 transfer film Structure
Referring to fig. 10, the transfer film structure 100 obtained in embodiment 2 is similar to the transfer film structure obtained in embodiment 1, and the difference is that the transfer film structure 100 of embodiment 2 further includes a second pattern layer 9 disposed between the dark reaction layer 6, the first pattern layer 7 and the fixing layer 8, and the second pattern layer 9 is spaced apart from the elastic film substrate layer 1.
It should be particularly noted that, referring to fig. 9 and fig. 10, in either embodiment 1 or embodiment 2, a surface of the first light-shielding layer 3 of the transfer film structure 100 contacting the first pattern layer 7 may be designed to have a smooth structure (e.g., a bright surface) or a rough structure (e.g., a matte surface), or may also have both a smooth structure and a rough structure, and when a surface of the first light-shielding layer 3 contacting the first pattern layer 7 is a rough structure, a surface of the first pattern layer 7 contacting the first light-shielding layer 3 may also be a rough structure.
< application example 1>
Preparation of three-dimensional transfer articles (from the transfer film construction obtained in example 1)
The method for producing a three-dimensional transfer product according to application example 1 includes, in addition to all the steps of the method for producing a transfer film structure according to embodiment 1, the following steps:
step (j): referring to fig. 11, the fixing layer 8 of the transfer film structure 100 is attached to a surface of an object 40.
Step (k): after the step (j), ultraviolet light is irradiated from the elastic film substrate layer 1 toward the fixing layer 8, so that the first light shielding layer 3 and the second light shielding layer 4 can be peeled from the filling layer 5 and the first pattern layer 7.
Step (l): after the step (k), the first light-shielding layer 3, the second light-shielding layer 4, the template layer 2 and the elastic thin film substrate layer 1 are removed from the filling layer 5 and the first pattern layer 7.
Step (m): referring to fig. 12, after the step (l), ultraviolet light is used to irradiate the first pattern layer 7, the filling layer 5, the dark reaction layer 6 and the fixing layer 8, so that the three-dimensional transfer product 200 with a three-dimensional transfer pattern is obtained after the first pattern layer 7, the filling layer 5, the dark reaction layer 6 and the fixing layer 8 are cured.
It should be noted that the dark reaction layer 6 is continuously cured after the uv light is removed, so as to follow the filling layer 5, the first pattern layer 7 and the fixing layer 8.
Three-dimensional transfer product obtained in application example 1
Referring to fig. 12, the three-dimensional transfer product 200 obtained by applying example 1 includes an object 40, a fixing layer 8, a dark reaction layer 6, a filling layer 5, a third pattern sub-layer 73, a second pattern sub-layer 72, and a first pattern sub-layer 71.
The fixing layer 8 is formed by HAB back glue and is adhered on the surface of the object 40.
The dark reaction layer 6 is formed of INK (UV-SH INK) and is positioned on the fixed layer 8 in a first pattern 20.
The third pattern sub-layer 73 is positioned on the fixed layer 8 in a second pattern 30 complementary to the first pattern 20 and is formed of an oil-soluble paint (HA-K, HA-C, HA-M or HA-Y), and the third pattern sub-layer 73 is positioned on the same plane as the dark reaction layer 6. Of course, when the surface of the object 40 is curved, the term "plane" refers to a plane that corresponds to the curvature of the surface of the object 40.
The filling layer 5 is covered on the dark reaction layer 6 in the first pattern 20 and is formed of a transparent ink (UV-H Clear).
The second pattern sub-layer 72 is covered on the third pattern sub-layer 73 in the second pattern 30 and is formed of an oil-soluble paint (HA-K, HA-C, HA-M or HA-Y), and the second pattern sub-layer 72 is located on the same plane as the filling layer 5.
The first pattern sublayer 71 is covered on the second pattern sublayer 72 in the second pattern 30 and is formed of an oil-soluble paint (HA-K, HA-C, HA-M or HA-Y), and the first pattern sublayer 71, the second pattern sublayer 72 and the third pattern sublayer 73 together define a first pattern layer 7. The first pattern sublayer 71 is arranged to form a three-dimensional transfer pattern with three-dimensional touch on the surface of the object 40.
< application example 2>
Preparation of three-dimensional transfer articles (from the transfer film construction obtained in example 2)
The method for producing a three-dimensional transfer product according to application example 2 includes, in addition to all the steps of the method for producing a transfer film structure according to embodiment 2, the following steps:
step (j): referring to fig. 13, the fixing layer 8 of the transfer film structure 100 is attached to a surface of an object 40.
Step (k): after the step (j), ultraviolet light is irradiated from the elastic film substrate layer 1 toward the fixing layer 8, so that the first light shielding layer 3 and the second light shielding layer 4 can be peeled from the filling layer 5 and the first pattern layer 7.
Step (l): after the step (k), the first light-shielding layer 3, the second light-shielding layer 4, the template layer 2 and the elastic thin film substrate layer 1 are removed from the filling layer 5 and the first pattern layer 7.
Step (m): referring to fig. 14, after the step (l), ultraviolet light is used to irradiate the first pattern layer 7, the second pattern layer 9, the filling layer 5, the dark reaction layer 6 and the fixing layer 8, so that the three-dimensional transfer product 200 is obtained after the first pattern layer 7, the second pattern layer 9, the filling layer 5, the dark reaction layer 6 and the fixing layer 8 are cured.
It should be noted that the dark reaction layer 6 is continuously cured after the uv light is removed, so as to follow the filling layer 5, the first pattern layer 7 and the second pattern layer 9.
Three-dimensional transfer product obtained in application example 2
Referring to fig. 14, the three-dimensional transfer product 200 obtained in application example 2 is similar to the three-dimensional transfer product obtained in application example 1, except that the three-dimensional transfer product 200 obtained in application example 2 further includes a second pattern layer 9 formed of an oil-soluble paint (HA-K, HA-C, HA-M or HA-Y) between the dark reaction layer 6, the first pattern layer 7 and the anchor layer 8. The second pattern layer 9 enables the three-dimensional transfer printing pattern formed on the surface of the object 40 to present another pattern different from the first pattern layer 7 besides the pattern of the first pattern layer 7.
In summary, the first light-shielding layer 3 and the second light-shielding layer 4 are disposed in the transfer film structure 100 of the present invention, so that after the transfer film structure is attached to the surface of an object 40, only ultraviolet light needs to be irradiated to easily remove the first light-shielding layer 3, the second light-shielding layer 4, the template layer 2, and the elastic thin-film substrate layer 1 from the filling layer 5 and the first pattern layer 7. Therefore, the transfer film structure 100 of the present invention does not leave release agent on the three-dimensional transfer pattern formed on the surface of the article 40 (i.e. on the filling layer 5 and the first pattern layer 7), so that the object of the present invention can be achieved.
The above description is only an example of the present invention, and the scope of the present invention should not be limited thereby, and all the simple equivalent changes and modifications made according to the claims and the contents of the specification should be included in the scope covered by the present invention.