CN109090135A - Exogenous Silicon cold-resistance agent and the preparation method and application thereof - Google Patents
Exogenous Silicon cold-resistance agent and the preparation method and application thereof Download PDFInfo
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- CN109090135A CN109090135A CN201810959672.3A CN201810959672A CN109090135A CN 109090135 A CN109090135 A CN 109090135A CN 201810959672 A CN201810959672 A CN 201810959672A CN 109090135 A CN109090135 A CN 109090135A
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- resistance agent
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- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 title claims abstract description 91
- 229910052710 silicon Inorganic materials 0.000 title claims abstract description 91
- 239000010703 silicon Substances 0.000 title claims abstract description 91
- 239000003795 chemical substances by application Substances 0.000 title claims abstract description 82
- 238000002360 preparation method Methods 0.000 title claims abstract description 17
- 241000026010 Dendrobium candidum Species 0.000 claims abstract description 52
- IXVMHGVQKLDRKH-YEJCTVDLSA-N (22s,23s)-epibrassinolide Chemical compound C1OC(=O)[C@H]2C[C@H](O)[C@H](O)C[C@]2(C)[C@H]2CC[C@]3(C)[C@@H]([C@H](C)[C@H](O)[C@@H](O)[C@H](C)C(C)C)CC[C@H]3[C@@H]21 IXVMHGVQKLDRKH-YEJCTVDLSA-N 0.000 claims abstract description 19
- IXVMHGVQKLDRKH-VRESXRICSA-N Brassinolide Natural products O=C1OC[C@@H]2[C@@H]3[C@@](C)([C@H]([C@@H]([C@@H](O)[C@H](O)[C@H](C(C)C)C)C)CC3)CC[C@@H]2[C@]2(C)[C@@H]1C[C@H](O)[C@H](O)C2 IXVMHGVQKLDRKH-VRESXRICSA-N 0.000 claims abstract description 19
- ONIBWKKTOPOVIA-UHFFFAOYSA-N Proline Natural products OC(=O)C1CCCN1 ONIBWKKTOPOVIA-UHFFFAOYSA-N 0.000 claims abstract description 16
- JTEDVYBZBROSJT-UHFFFAOYSA-N indole-3-butyric acid Chemical compound C1=CC=C2C(CCCC(=O)O)=CNC2=C1 JTEDVYBZBROSJT-UHFFFAOYSA-N 0.000 claims abstract description 13
- CZMRCDWAGMRECN-UGDNZRGBSA-N Sucrose Chemical compound O[C@H]1[C@H](O)[C@@H](CO)O[C@@]1(CO)O[C@@H]1[C@H](O)[C@@H](O)[C@H](O)[C@@H](CO)O1 CZMRCDWAGMRECN-UGDNZRGBSA-N 0.000 claims abstract description 10
- 229930006000 Sucrose Natural products 0.000 claims abstract description 10
- 239000005720 sucrose Substances 0.000 claims abstract description 10
- 239000002994 raw material Substances 0.000 claims abstract description 6
- ZLMJMSJWJFRBEC-UHFFFAOYSA-N Potassium Chemical compound [K] ZLMJMSJWJFRBEC-UHFFFAOYSA-N 0.000 claims abstract description 5
- 239000011591 potassium Substances 0.000 claims abstract description 5
- 229910052700 potassium Inorganic materials 0.000 claims abstract description 5
- NBIIXXVUZAFLBC-UHFFFAOYSA-L Phosphate ion(2-) Chemical compound OP([O-])([O-])=O NBIIXXVUZAFLBC-UHFFFAOYSA-L 0.000 claims abstract description 4
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 claims description 37
- 239000000243 solution Substances 0.000 claims description 31
- ONIBWKKTOPOVIA-BYPYZUCNSA-N L-Proline Chemical compound OC(=O)[C@@H]1CCCN1 ONIBWKKTOPOVIA-BYPYZUCNSA-N 0.000 claims description 13
- 239000011259 mixed solution Substances 0.000 claims description 12
- 238000003756 stirring Methods 0.000 claims description 11
- 239000012530 fluid Substances 0.000 claims description 9
- PJNZPQUBCPKICU-UHFFFAOYSA-N phosphoric acid;potassium Chemical compound [K].OP(O)(O)=O PJNZPQUBCPKICU-UHFFFAOYSA-N 0.000 claims description 7
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 claims description 4
- 229910000402 monopotassium phosphate Inorganic materials 0.000 claims description 4
- 235000019796 monopotassium phosphate Nutrition 0.000 claims description 4
- 238000002156 mixing Methods 0.000 claims description 3
- 239000007864 aqueous solution Substances 0.000 claims description 2
- QGZKDVFQNNGYKY-UHFFFAOYSA-N Ammonia Chemical compound N QGZKDVFQNNGYKY-UHFFFAOYSA-N 0.000 claims 2
- NBIIXXVUZAFLBC-UHFFFAOYSA-N Phosphoric acid Chemical compound OP(O)(O)=O NBIIXXVUZAFLBC-UHFFFAOYSA-N 0.000 claims 2
- 239000002253 acid Substances 0.000 claims 1
- 229910000147 aluminium phosphate Inorganic materials 0.000 claims 1
- 229910021529 ammonia Inorganic materials 0.000 claims 1
- 235000015177 dried meat Nutrition 0.000 claims 1
- 238000002834 transmittance Methods 0.000 claims 1
- 230000000694 effects Effects 0.000 abstract description 8
- 230000006378 damage Effects 0.000 abstract description 5
- 239000003317 industrial substance Substances 0.000 abstract description 2
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 27
- 239000012153 distilled water Substances 0.000 description 16
- 241000196324 Embryophyta Species 0.000 description 15
- 235000019441 ethanol Nutrition 0.000 description 15
- ATNHDLDRLWWWCB-AENOIHSZSA-M chlorophyll a Chemical compound C1([C@@H](C(=O)OC)C(=O)C2=C3C)=C2N2C3=CC(C(CC)=C3C)=[N+]4C3=CC3=C(C=C)C(C)=C5N3[Mg-2]42[N+]2=C1[C@@H](CCC(=O)OC\C=C(/C)CCC[C@H](C)CCC[C@H](C)CCCC(C)C)[C@H](C)C2=C5 ATNHDLDRLWWWCB-AENOIHSZSA-M 0.000 description 14
- 229930002875 chlorophyll Natural products 0.000 description 13
- 235000019804 chlorophyll Nutrition 0.000 description 13
- 230000004083 survival effect Effects 0.000 description 13
- 239000000463 material Substances 0.000 description 12
- 238000000034 method Methods 0.000 description 10
- 239000007788 liquid Substances 0.000 description 9
- 239000007921 spray Substances 0.000 description 8
- 229910003243 Na2SiO3·9H2O Inorganic materials 0.000 description 6
- 238000005259 measurement Methods 0.000 description 5
- 238000012545 processing Methods 0.000 description 5
- 238000012360 testing method Methods 0.000 description 5
- 238000005507 spraying Methods 0.000 description 4
- 239000004115 Sodium Silicate Substances 0.000 description 3
- 239000003814 drug Substances 0.000 description 3
- 238000010438 heat treatment Methods 0.000 description 3
- 238000003760 magnetic stirring Methods 0.000 description 3
- 238000011160 research Methods 0.000 description 3
- 235000019795 sodium metasilicate Nutrition 0.000 description 3
- 229910052911 sodium silicate Inorganic materials 0.000 description 3
- NTHWMYGWWRZVTN-UHFFFAOYSA-N sodium silicate Chemical compound [Na+].[Na+].[O-][Si]([O-])=O NTHWMYGWWRZVTN-UHFFFAOYSA-N 0.000 description 3
- 239000006228 supernatant Substances 0.000 description 3
- 210000001519 tissue Anatomy 0.000 description 3
- 238000005303 weighing Methods 0.000 description 3
- 241001523681 Dendrobium Species 0.000 description 2
- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 description 2
- 208000027418 Wounds and injury Diseases 0.000 description 2
- 238000010521 absorption reaction Methods 0.000 description 2
- 238000004364 calculation method Methods 0.000 description 2
- 201000010099 disease Diseases 0.000 description 2
- 208000037265 diseases, disorders, signs and symptoms Diseases 0.000 description 2
- 238000005516 engineering process Methods 0.000 description 2
- -1 i.e. Inorganic materials 0.000 description 2
- 208000014674 injury Diseases 0.000 description 2
- 230000031700 light absorption Effects 0.000 description 2
- 150000002632 lipids Chemical class 0.000 description 2
- 210000000056 organ Anatomy 0.000 description 2
- 238000005502 peroxidation Methods 0.000 description 2
- 230000037039 plant physiology Effects 0.000 description 2
- 239000000047 product Substances 0.000 description 2
- 241000282452 Ailuropoda melanoleuca Species 0.000 description 1
- 206010002660 Anoxia Diseases 0.000 description 1
- 241000976983 Anoxia Species 0.000 description 1
- RYAHJFGVOCZDEI-UFFNCVEVSA-N Dendrobine Chemical compound C([C@H]1CC[C@@H]2[C@@]31C)N(C)[C@@H]3[C@H]1[C@@H](C(C)C)[C@@H]2C(=O)O1 RYAHJFGVOCZDEI-UFFNCVEVSA-N 0.000 description 1
- 240000004638 Dendrobium nobile Species 0.000 description 1
- 241000380130 Ehrharta erecta Species 0.000 description 1
- 206010021143 Hypoxia Diseases 0.000 description 1
- WSMYVTOQOOLQHP-UHFFFAOYSA-N Malondialdehyde Chemical compound O=CCC=O WSMYVTOQOOLQHP-UHFFFAOYSA-N 0.000 description 1
- 206010028980 Neoplasm Diseases 0.000 description 1
- 241000607479 Yersinia pestis Species 0.000 description 1
- 238000002835 absorbance Methods 0.000 description 1
- 150000001299 aldehydes Chemical class 0.000 description 1
- 150000001413 amino acids Chemical class 0.000 description 1
- 238000004458 analytical method Methods 0.000 description 1
- 230000007953 anoxia Effects 0.000 description 1
- 230000003712 anti-aging effect Effects 0.000 description 1
- 230000005540 biological transmission Effects 0.000 description 1
- 238000009835 boiling Methods 0.000 description 1
- 210000000170 cell membrane Anatomy 0.000 description 1
- 229930002868 chlorophyll a Natural products 0.000 description 1
- 229930002869 chlorophyll b Natural products 0.000 description 1
- NSMUHPMZFPKNMZ-VBYMZDBQSA-M chlorophyll b Chemical compound C1([C@@H](C(=O)OC)C(=O)C2=C3C)=C2N2C3=CC(C(CC)=C3C=O)=[N+]4C3=CC3=C(C=C)C(C)=C5N3[Mg-2]42[N+]2=C1[C@@H](CCC(=O)OC\C=C(/C)CCC[C@H](C)CCC[C@H](C)CCCC(C)C)[C@H](C)C2=C5 NSMUHPMZFPKNMZ-VBYMZDBQSA-M 0.000 description 1
- 210000003763 chloroplast Anatomy 0.000 description 1
- 230000001143 conditioned effect Effects 0.000 description 1
- 238000001816 cooling Methods 0.000 description 1
- 238000012258 culturing Methods 0.000 description 1
- RYAHJFGVOCZDEI-CZKZLRAZSA-N dendrobine Natural products O=C1O[C@@H]2[C@H](C(C)C)[C@H]1[C@H]1[C@@]3(C)[C@@H]2N(C)C[C@H]3CC1 RYAHJFGVOCZDEI-CZKZLRAZSA-N 0.000 description 1
- 206010012601 diabetes mellitus Diseases 0.000 description 1
- 238000009826 distribution Methods 0.000 description 1
- TXJKGGXEPKWTFB-UHFFFAOYSA-N ethanol 4-(1H-indol-2-yl)butanoic acid Chemical compound C(C)O.N1C(=CC2=CC=CC=C12)CCCC(=O)O TXJKGGXEPKWTFB-UHFFFAOYSA-N 0.000 description 1
- 150000004676 glycans Chemical class 0.000 description 1
- 238000000227 grinding Methods 0.000 description 1
- 229910052742 iron Inorganic materials 0.000 description 1
- 230000003859 lipid peroxidation Effects 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 239000012528 membrane Substances 0.000 description 1
- 230000029553 photosynthesis Effects 0.000 description 1
- 238000010672 photosynthesis Methods 0.000 description 1
- 239000000049 pigment Substances 0.000 description 1
- 239000004033 plastic Substances 0.000 description 1
- 206010036067 polydipsia Diseases 0.000 description 1
- 229920001282 polysaccharide Polymers 0.000 description 1
- 239000005017 polysaccharide Substances 0.000 description 1
- 238000004382 potting Methods 0.000 description 1
- 239000003755 preservative agent Substances 0.000 description 1
- 230000002335 preservative effect Effects 0.000 description 1
- 229940105575 proline 500 mg Drugs 0.000 description 1
- 230000004044 response Effects 0.000 description 1
- 230000000391 smoking effect Effects 0.000 description 1
- 239000000758 substrate Substances 0.000 description 1
- 208000024891 symptom Diseases 0.000 description 1
Classifications
-
- A—HUMAN NECESSITIES
- A01—AGRICULTURE; FORESTRY; ANIMAL HUSBANDRY; HUNTING; TRAPPING; FISHING
- A01N—PRESERVATION OF BODIES OF HUMANS OR ANIMALS OR PLANTS OR PARTS THEREOF; BIOCIDES, e.g. AS DISINFECTANTS, AS PESTICIDES OR AS HERBICIDES; PEST REPELLANTS OR ATTRACTANTS; PLANT GROWTH REGULATORS
- A01N59/00—Biocides, pest repellants or attractants, or plant growth regulators containing elements or inorganic compounds
-
- A—HUMAN NECESSITIES
- A01—AGRICULTURE; FORESTRY; ANIMAL HUSBANDRY; HUNTING; TRAPPING; FISHING
- A01N—PRESERVATION OF BODIES OF HUMANS OR ANIMALS OR PLANTS OR PARTS THEREOF; BIOCIDES, e.g. AS DISINFECTANTS, AS PESTICIDES OR AS HERBICIDES; PEST REPELLANTS OR ATTRACTANTS; PLANT GROWTH REGULATORS
- A01N43/00—Biocides, pest repellants or attractants, or plant growth regulators containing heterocyclic compounds
- A01N43/02—Biocides, pest repellants or attractants, or plant growth regulators containing heterocyclic compounds having rings with one or more oxygen or sulfur atoms as the only ring hetero atoms
- A01N43/04—Biocides, pest repellants or attractants, or plant growth regulators containing heterocyclic compounds having rings with one or more oxygen or sulfur atoms as the only ring hetero atoms with one hetero atom
- A01N43/14—Biocides, pest repellants or attractants, or plant growth regulators containing heterocyclic compounds having rings with one or more oxygen or sulfur atoms as the only ring hetero atoms with one hetero atom six-membered rings
- A01N43/16—Biocides, pest repellants or attractants, or plant growth regulators containing heterocyclic compounds having rings with one or more oxygen or sulfur atoms as the only ring hetero atoms with one hetero atom six-membered rings with oxygen as the ring hetero atom
-
- A—HUMAN NECESSITIES
- A01—AGRICULTURE; FORESTRY; ANIMAL HUSBANDRY; HUNTING; TRAPPING; FISHING
- A01N—PRESERVATION OF BODIES OF HUMANS OR ANIMALS OR PLANTS OR PARTS THEREOF; BIOCIDES, e.g. AS DISINFECTANTS, AS PESTICIDES OR AS HERBICIDES; PEST REPELLANTS OR ATTRACTANTS; PLANT GROWTH REGULATORS
- A01N43/00—Biocides, pest repellants or attractants, or plant growth regulators containing heterocyclic compounds
- A01N43/02—Biocides, pest repellants or attractants, or plant growth regulators containing heterocyclic compounds having rings with one or more oxygen or sulfur atoms as the only ring hetero atoms
- A01N43/04—Biocides, pest repellants or attractants, or plant growth regulators containing heterocyclic compounds having rings with one or more oxygen or sulfur atoms as the only ring hetero atoms with one hetero atom
- A01N43/22—Biocides, pest repellants or attractants, or plant growth regulators containing heterocyclic compounds having rings with one or more oxygen or sulfur atoms as the only ring hetero atoms with one hetero atom rings with more than six members
-
- A—HUMAN NECESSITIES
- A01—AGRICULTURE; FORESTRY; ANIMAL HUSBANDRY; HUNTING; TRAPPING; FISHING
- A01N—PRESERVATION OF BODIES OF HUMANS OR ANIMALS OR PLANTS OR PARTS THEREOF; BIOCIDES, e.g. AS DISINFECTANTS, AS PESTICIDES OR AS HERBICIDES; PEST REPELLANTS OR ATTRACTANTS; PLANT GROWTH REGULATORS
- A01N43/00—Biocides, pest repellants or attractants, or plant growth regulators containing heterocyclic compounds
- A01N43/34—Biocides, pest repellants or attractants, or plant growth regulators containing heterocyclic compounds having rings with one nitrogen atom as the only ring hetero atom
- A01N43/36—Biocides, pest repellants or attractants, or plant growth regulators containing heterocyclic compounds having rings with one nitrogen atom as the only ring hetero atom five-membered rings
-
- A—HUMAN NECESSITIES
- A01—AGRICULTURE; FORESTRY; ANIMAL HUSBANDRY; HUNTING; TRAPPING; FISHING
- A01N—PRESERVATION OF BODIES OF HUMANS OR ANIMALS OR PLANTS OR PARTS THEREOF; BIOCIDES, e.g. AS DISINFECTANTS, AS PESTICIDES OR AS HERBICIDES; PEST REPELLANTS OR ATTRACTANTS; PLANT GROWTH REGULATORS
- A01N43/00—Biocides, pest repellants or attractants, or plant growth regulators containing heterocyclic compounds
- A01N43/34—Biocides, pest repellants or attractants, or plant growth regulators containing heterocyclic compounds having rings with one nitrogen atom as the only ring hetero atom
- A01N43/36—Biocides, pest repellants or attractants, or plant growth regulators containing heterocyclic compounds having rings with one nitrogen atom as the only ring hetero atom five-membered rings
- A01N43/38—Biocides, pest repellants or attractants, or plant growth regulators containing heterocyclic compounds having rings with one nitrogen atom as the only ring hetero atom five-membered rings condensed with carbocyclic rings
-
- A—HUMAN NECESSITIES
- A01—AGRICULTURE; FORESTRY; ANIMAL HUSBANDRY; HUNTING; TRAPPING; FISHING
- A01N—PRESERVATION OF BODIES OF HUMANS OR ANIMALS OR PLANTS OR PARTS THEREOF; BIOCIDES, e.g. AS DISINFECTANTS, AS PESTICIDES OR AS HERBICIDES; PEST REPELLANTS OR ATTRACTANTS; PLANT GROWTH REGULATORS
- A01N59/00—Biocides, pest repellants or attractants, or plant growth regulators containing elements or inorganic compounds
- A01N59/26—Phosphorus; Compounds thereof
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- Dentistry (AREA)
- General Health & Medical Sciences (AREA)
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Abstract
The present invention provides a kind of Exogenous Silicon cold-resistance agent, raw material components and concentration including following parts by weight are as follows: 0.5~1.0mmol/L of external source silicon concentration, 0.05~0.15mg/L of brassinosteroid concentration, 150~250mg/L of concentration of proline, 100~300mg/L of biphosphate potassium concn, indolebutyric acid 10~20mg/L of concentration, 10~15g/L of sucrose concentration.Exogenous Silicon cold-resistance agent provided by the invention has good cold-resistant effect to dendrobium candidum, meanwhile, the preparation method of the cold-resistance agent is simple and effective, is not required to add any industrial chemicals, it is without causing harm to be applied to dendrobium candidum.
Description
Technical field
The present invention relates to cold-resistance agent and the preparation method and application thereof more particularly to a kind of Exogenous Silicon cold-resistance agent and its preparation sides
Method and application.
Background technique
Dendrobium candidum is the traditional rare traditional Chinese medicine in China, and it is perennial grass that dendrobium candidum, which is a kind of rare Chinese medicine,
This plant, stem are grown thickly, cylindrical type, 10~30 centimetres high, thick 3~8 millimeters, civil, are known as " giant panda " of medicine circle.Iron sheet
Dry product claims Tiepi Fengdou after dendrobium nobile processing, and effective component is mainly dendrobium polysaccharide, dendrobine and total amino acid etc..People can be improved
Body immunocompetence enhances memory, tonifying five zang organs consumptive disease, and anti-aging inhibits tumour, improves diabetic symptom, anti anoxia, to putting
It treats and night life, excessive drinking and smoking person has remarkable result.
Low temperature inhibits surviving and growing for dendrobium candidum seedling, is the principal element for influencing its existence and distribution.In the Changjiang river
Delta Area dendrobium candidum winter is difficult to survive in outdoor cropping, is the conserving culture in greenhouse.The item once greenhouse heats
Part shortcoming, dendrobium candidum just easily receive injury from low temperature.The effective way for alleviating low temperature stress is found, is current officinal dendrobium stem plantation
One of urgent problem to be solved in production.Research in terms of dendrobium candidum is more, focuses mostly in tissue culture, cultivation, medicinal etc.
Aspect；For adding allogene -- the report that Exogenous Silicon cold-resistance agent improves dendrobium candidum winter resistance is very few.
This research sprays dendrobium candidum seedling of the Exogenous Silicon cold-resistance agent after low temperature stress, inquires into added with Exogenous Silicon and its
Can he cooperate with the cold-resistance agent of component that the injury from low temperature of dendrobium candidum be effectively relieved, improve its winter resistance, to be dendrobium candidum
It is promoted and applied on a large scale in China and outdoor overwintering cultivation provides reference frame.
Summary of the invention
Goal of the invention: the first object of the present invention is to provide a kind of dendrobium candidum survival rate and growth quality of effectively improving
Exogenous Silicon cold-resistance agent；The second object of the present invention is to provide the preparation method of the cold-resistance agent；The third object of the present invention is to provide
The application method of the cold-resistance agent.
Technical solution: the present invention provides a kind of Exogenous Silicon cold-resistance agent, the raw material components including following concentration: external source silicon concentration
0.5~1.0mmol/L, brassinosteroid 0.05~0.15mg/L of concentration, 150~250mg/L of concentration of proline, potassium dihydrogen phosphate
100~300mg/L of concentration, indolebutyric acid 10~20mg/L of concentration, 10~15g/L of sucrose concentration.
Wherein, above-mentioned indolebutyric acid alias is IBA.
Wherein, the brassinosteroid concentration is 0.05~0.10mg/L, and concentration of proline is 150~200mg/L.
The preparation method of the Exogenous Silicon cold-resistance agent, comprising the following steps: in potassium dihydrogen phosphate, sucrose and indolebutyric acid
In mixed solution, the mixed solution of brassinosteroid and proline is added, PRIMARY STIRRING uniformly forms just miscible fluid afterwards；It is mixed just
Exogenous Silicon is added in solution, secondary stirs to get the Exogenous Silicon cold-resistance agent.
Preferably, the PRIMARY STIRRING temperature is 25~30 DEG C, and mixing time is 2~3 hours；The secondary whipping temp
It is 28-35 DEG C, the time is 3-5 hours.
Preferably, the PRIMARY STIRRING and secondary stirring are to add water constant volume, then be stirred.
Further, the mixed solution of the biphosphate potassium concn and indolebutyric acid be indolebutyric acid ethanol solution with
The mixed solution of the aqueous solution of potassium dihydrogen phosphate and sucrose.
Preferably, the mixed solution of the brassinosteroid and proline is the ethanol solution and proline of brassinosteroid
Ethanol solution mixed solution.
Application of the above-mentioned Exogenous Silicon cold-resistance agent in dendrobium candidum cold-resistant: the application concentration of the Exogenous Silicon cold-resistance agent is
0.5~1.5mmol/L.
Application of the above-mentioned Exogenous Silicon cold-resistance agent in dendrobium candidum cold-resistant: the application concentration of the Exogenous Silicon cold-resistance agent is
0.7~1.0mmol/L.
Application of the above-mentioned Exogenous Silicon cold-resistance agent in dendrobium candidum cold-resistant: the Exogenous Silicon cold-resistance agent controls light transmission when applying
Rate is 60~80%.
Application of the above-mentioned Exogenous Silicon cold-resistance agent in dendrobium candidum cold-resistant: the Exogenous Silicon cold-resistance agent controls temperature when applying
At 15~20 DEG C；Humidity is controlled 70~80%.
The utility model has the advantages that Exogenous Silicon cold-resistance agent provided by the invention, has good cold-resistant effect Exogenous Silicon to dendrobium candidum
0.5~1.0mmol/L of external source silicon concentration in cold-resistance agent, brassinosteroid 0.05~0.15mg/L of concentration, concentration of proline 150~
When 250mg/L, the good cold-resistant effect to dendrobium candidum can achieve；Especially, when brassinosteroid concentration is 0.05
~0.10mg/L, when concentration of proline is 150~200mg/L, cold-resistant effect of the Exogenous Silicon cold-resistance agent of the present invention to dendrobium candidum
It is the most excellent.Meanwhile the preparation method of the cold-resistance agent is simple and effective, is not required to add any industrial chemicals, is applied to dendrobium candidum
It is without causing harm.Especially, 0.7~1.0mmolL is used when application-1Dosage, cold-resistant effect is best, and will not
Vegetation is damaged.
Specific embodiment
It is described further below for technical solution of the present invention.
The invention will be further described below.Following embodiment is only used for clearly illustrating technical side of the invention
Case, and not intended to limit the protection scope of the present invention.
Embodiment 1
The indolebutyric acid for weighing 20mg is dissolved in a small amount of 95% ethyl alcohol, and distilled water 50ml is added after being completely dissolved；Weigh phosphoric acid
Potassium dihydrogen 200 and sucrose 20g are dissolved in 200ml distilled water, are stirred well to and are completely dissolved；Both the above solution is mixed, 25
It is stirred at DEG C 1 hour and auxiliary material solution is made to uniform proportion.It weighs brassinosteroid 0.1mg and is dissolved in a small amount of 95% ethyl alcohol
In, distilled water 50ml is added after being completely dissolved；It weighs proline 3 00mg to be dissolved in a small amount of 95% ethyl alcohol, after being completely dissolved plus distill
Water 50ml；The above solution is mixed, this mixed liquor is poured into auxiliary material solution, is settled to 500ml with distilled water,
Miscible fluid at the beginning of being made to uniform proportion is sufficiently stirred at 25 DEG C 2 hours.Exogenous Silicon uses analytically pure nine water sodium metasilicate, i.e.,
Na2SiO3·9H2O weighs Na2SiO3·9H2O 28.4mg is soluble in water, is placed in the heating of magnetic stirring apparatus top, and temperature is set as
35 DEG C, stirring is completely dissolved up to Exogenous Silicon, is settled to 500ml with distilled water.By miscible fluid at the beginning of 500ml and 500ml Exogenous Silicon
Solution mixes, and 3 hours are sufficiently stirred at 28 DEG C to uniform proportion, pH value is adjusted to 5.8, this solution is that Exogenous Silicon cold-resistance agent is molten
Liquid.
Embodiment 2
The preparation and application of Exogenous Silicon cold-resistance agent
The indolebutyric acid for weighing 40mg is dissolved in a small amount of 95% ethyl alcohol, and distilled water 50ml is added after being completely dissolved；Weigh phosphoric acid
Potassium dihydrogen 600mg and sucrose 30g are dissolved in 200ml distilled water, are stirred well to and are completely dissolved；Both the above solution is mixed,
It is stirred at 28 DEG C 2 hours and auxiliary material solution is made to uniform proportion.It weighs brassinosteroid 0.3mg and is dissolved in a small amount of 95% ethyl alcohol
In, distilled water 50ml is added after being completely dissolved；It weighs proline 500mg to be dissolved in a small amount of 95% ethyl alcohol, after being completely dissolved plus distill
Water 50ml；The above solution is mixed, this mixed liquor is poured into auxiliary material solution, is settled to 500ml with distilled water,
Miscible fluid at the beginning of being made to uniform proportion is sufficiently stirred at 0 DEG C 3 hours.Exogenous Silicon uses analytically pure nine water sodium metasilicate, i.e.,
Na2SiO3·9H2O weighs Na2SiO3·9H2O 56.8mg is soluble in water, is placed in the heating of magnetic stirring apparatus top, and temperature is set as
35 DEG C, stirring is completely dissolved up to Exogenous Silicon, is settled to 500ml with distilled water.By miscible fluid at the beginning of 500ml and 500ml Exogenous Silicon
Solution mixes, and 5 hours are sufficiently stirred at 35 DEG C to uniform proportion, pH value is adjusted to 6.5, this solution is that Exogenous Silicon cold-resistance agent is molten
Liquid.
Embodiment 3
The preparation and application of Exogenous Silicon cold-resistance agent
The indolebutyric acid for weighing 30mg is dissolved in a small amount of 95% ethyl alcohol, and distilled water 50ml is added after being completely dissolved；Weigh phosphoric acid
Potassium dihydrogen 400mg and sucrose 25g are dissolved in 200ml distilled water, are stirred well to and are completely dissolved；Both the above solution is mixed,
It is stirred at 27 DEG C 1.5 hours and auxiliary material solution is made to uniform proportion.It weighs brassinosteroid 0.2mg and is dissolved in a small amount of 95% second
In alcohol, distilled water 50ml is added after being completely dissolved；It weighs proline-4 00mg to be dissolved in a small amount of 95% ethyl alcohol, after being completely dissolved plus steam
Distilled water 50ml；The above solution is mixed, this mixed liquor is poured into auxiliary material solution, is settled to distilled water
500ml is sufficiently stirred at 28 DEG C 2.5 hours and just miscible fluid is made to uniform proportion.Exogenous Silicon uses analytically pure nine water
Sodium metasilicate, i.e. Na2SiO3·9H2O weighs Na2SiO3·9H2O 30.0mg is soluble in water, is placed in the heating of magnetic stirring apparatus top,
Temperature is set as 35 DEG C, and stirring is completely dissolved up to Exogenous Silicon, is settled to 500ml with distilled water.By miscible fluid at the beginning of 500ml with
500ml Exogenous Silicon solution mixes, and 4 hours are sufficiently stirred at 30 DEG C to uniform proportion, pH value is adjusted to 6.0, this solution is outer
Source silicon cold-resistant agent solution.
Embodiment 4
The concentration of Exogenous Silicon cold-resistance agent primary raw material component selects
It is respectively 0.5,1.0,1.5mmol/L that external source silicon concentration, which is arranged,；Brassinosteroid concentration is respectively 0.05,0.10,
0.15mg/L；Concentration of proline is respectively 150,200,250mg/L；Conditions and method of other preparations and application are and embodiment
3 is identical, as table 1 designs orthogonal test.
Influence of the 1 primary raw material component various concentration of table to Exogenous Silicon cold-resistance agent performance
As known from Table 1, external source 0.5~1.0mmol/L of silicon concentration in Exogenous Silicon cold-resistance agent, brassinosteroid concentration 0.05~
When 0.15mg/L, 150~250mg/L of concentration of proline, the good cold-resistant effect to dendrobium candidum can achieve；Especially
, when brassinosteroid concentration is 0.05~0.10mg/L, and concentration of proline is 150~200mg/L, Exogenous Silicon of the present invention is anti-
Cold agent is the most excellent to the cold-resistant effect of dendrobium candidum.
Embodiment 5
The application conditions and effect of Exogenous Silicon cold-resistance agent
The preparation of material to be tested
Using the candidum tissue culturing seedling of bottle outlet cultivation 1 year as material to be tested, material to be tested is cultivated in Jiangsu agricultural occupation skill
In the garden art institute Nong Bo.Time is in December, 2017 to 2 months 2018, and outdoor minimum temperature is -6~6 DEG C during this period, most
High-temperature is 7~14 DEG C.Test uses potting mode, and by growing way, consistent, no disease and pests harm dendrobium candidum seedling is from greenhouse cultivation
It digs out, is transplanted into equipped in dendrobium candidum dedicated substrate plastic tub alms bowl, 6 plants of every basin on bed.It is placed in greenhouse and normally cultivates 15 days,
It is placed in outdoor low temperature stress and carries out the processing of Exogenous Silicon cold-resistance agent after 10 days.The cold-resistance agent applied is according to identical in embodiment 3
Cold-resistance agent prepared by raw material, material concentration and preparation method and condition.
The blank control i.e. CK group, 0.5mmolL only sprayed water is arranged in Exogenous Silicon cold-resistance agent-1Group, 0.7mmolL-1Group,
1.0mmol·L-1Group, 1.3mmolL-1Group, 1.5mmolL-1Group, 2mmolL-17 concentration processing groups of group, concentration are
Molar concentration, every group of 25 basins, every basin use the dendrobium candidum cold-resistance agent of same concentrations to handle 1 time, and Exogenous Silicon cold-resistance agent is with blade face
The form of sprinkling applies, spray to blade it is completely wet subject to, be placed on renewal cultivation in greenhouse, it is above according to embodiment
Cultural method and cold-resistance agent method of administration are applied in 3.
The statistics of plant survival condition
Dendrobium candidum routine observation vegetation growth state during renewal cultivation in greenhouse, counts each processing after one month
Dendrobium candidum n plant survival rate.Survival rate (%)=100/ plant total strain number of survival plant number *
The measurement of chlorophyll content
Measurement of the measuring method referring to the chloroplast pigment content in " plant physiology and biochemistry experimental principle and technology ".Acquisition
The leaf of falling 1-3 is cleaned, is shredded, and is weighed 0.1g or so and is placed in test tube, and 95% ethyl alcohol 20ml is added, is sealed with preservative film, dark is put
It sets to take out afterwards for 24 hours and shake up.Using 95% ethyl alcohol as blank, light absorption value is measured at wavelength 665nm and 649nm.Calculation formula: Ye Lv
Plain concentration=6.63A665+18.08A649；A665 refers to chlorophyll a maximum absorption band wavelength value in 95% ethyl alcohol；A649
Refer to chlorophyll b maximum absorption band wavelength value in 95% ethyl alcohol；Chlorophyll content (g/gFW)=C*V*/M*1000.C
For chlorophyll concentration (mg/L)；V is extracting liquid volume (ml)；M is sample quality (g)；1000 be to indicate 1L=1000ml.
The measurement of mda content
Survey of the measuring method referring to mda content in the plant tissue in " plant physiology and biochemistry experimental principle and technology "
It is fixed.The fresh and tender stem for acquiring 1-2cm long at the top of plant, cleans, shreds, and weighs 0.25g or so, 5%TCA 5ml is added, after grinding
Gained homogenate is centrifuged 10min at 3000r/min, and supernatant is sample extracting solution, measures its volume (V).Take supernatant 2ml
(V1) in test tube, add 0.67%TBA 2ml, boil 30min after mixing on boiling water bath, be centrifuged primary, supernatant after cooling again
Liquid is prepare liquid (its volume is denoted as V2).Measure light absorption value of the prepare liquid at 450nm, 532nm and 600nm.Calculation formula: C
(μm ol/L)=6.45* (A532-A600) -0.56*A450；450nm, 532nm that wherein A450, A532, A600 are respectively represented,
With the absorbance value under 600nm wavelength.Sample MDA content (μm ol/gFW)=C*V2*V/M*V1*1000.C is in prepare liquid
The concentration (μm ol/L) of MDA；V is extracting solution total volume (ml)；V1 is the sample extracting solution volume (ml) being added in prepare liquid；V2
For prepare liquid total volume.
Test result and analysis
Influence of the Exogenous Silicon cold-resistance agent to dendrobium candidum survival rate under low temperature stress such as table 2 shows.
Table 2 sprays influence of the Exogenous Silicon cold-resistance agent to dendrobium candidum survival rate under low temperature stress
| Number | Survival rate (%) |
| Blank control | 32.4 |
| 0.5mmol·L-1 | 64.3 |
| 0.7mmol·L-1 | 89.4 |
| 1.0mmol·L-1 | 92.0 |
| 1.3mmol·L-1 | 68.0 |
| 1.5mmol·L-1 | 66.8 |
| 2.0mmol·L-1 | 44.0 |
As known from Table 2, dendrobium candidum sprays Exogenous Silicon cold-resistance agent after low temperature stress, and survival rate is compared with the control
Variation.Wherein, 0.7mmolL-1And 1.0mmolL-1Under Exogenous Silicon cold-resistance agent concentration, dendrobium candidum survival rate highest, respectively
It is extremely significant to be higher than control and 2.0mmolL for 89.4% and 92.0%-1Group；And 0.5mmolL-1、1.3mmol·L-1With
1.5mmol·L-1The survival rate of dendrobium candidum is higher under the Exogenous Silicon cold-resistance agent concentration of group, with control group and 2.0mmolL-1
Group is more significant compared to difference.Above data shows: it is anti-to spray certain density Exogenous Silicon after low temperature stress for dendrobium candidum
Cold agent can be such that plant survival rate significantly improves, but the concentration of Exogenous Silicon cold-resistance agent is not that the higher the better, with 0.5~
1.5mmol·L-1It is advisable, with 0.7~1.0mmolL-1It is optimal.
Embodiment 6
The measurement of chlorophyll content
Prepare material to be tested and control group and experimental group according to the identical method and condition of embodiment 5.Exogenous Silicon cold-resistant
Influence of the agent to dendrobium candidum chlorophyll content under low temperature stress is as shown in table 3.
Table 3 sprays influence of the Exogenous Silicon cold-resistance agent to dendrobium candidum chlorophyll content under low temperature stress
From table 3 it can be seen that throughout in reason group, 0.5mmolL-1、1.3mmol·L-1And 1.5mmolL-1It is outer
The chlorophyll content of its dendrobium candidum of source silicon cold-resistance agent concentration is higher, is significantly higher than control group and 2.0mmolL-1Group；
0.7mmol·L-1And 1.0mmolL-1Dendrobium candidum chlorophyll content is high under Exogenous Silicon cold-resistance agent concentration, is significantly higher than
Control group and 2.0mmolL-1Group.Above data shows: dendrobium candidum sprays certain density external source after low temperature stress
Silicon cold-resistance agent can be such that chlorophyll content of plant significantly improves, but the concentration of Exogenous Silicon cold-resistance agent is not that the higher the better, is originally ground
Studying carefully middle spraying concentration is 0.5~1.5mmolL-1Exogenous Silicon cold-resistance agent can significantly improve the chlorophyll content of dendrobium candidum,
Improve its winter resistance, wherein and with 0.7~1.0mmolL-1For optimum range.Chlorophyll content reflects to a certain extent
The photosynthesis characteristics and upgrowth situation of dendrobium candidum, chlorophyll content is higher, and its growth of explanation is better, and more all right bright its of growth resists
It is cold higher.
Embodiment 7
The measurement of mda content
Prepare material to be tested and control group and experimental group according to the identical method and condition of embodiment 5.Exogenous Silicon cold-resistant
Influence of the agent to dendrobium candidum mda content under low temperature stress is as shown in table 4
Table 4 sprays influence of the Exogenous Silicon cold-resistance agent to dendrobium candidum mda content under low temperature stress
From table 4, it can be seen that in 6 concentration processing groups, 0.5mmolL-1、1.3mmol·L-1And 1.5mmolL-1
Exogenous Silicon cold-resistance agent concentration under dendrobium candidum mda content it is lower, three groups of differences are not significant, but be substantially less than compare
And 2.0mmolL-1Group；Control group and 2.0mmolL-1Dendrobium candidum mda content is equal under group Exogenous Silicon cold-resistance agent concentration
It is higher, and the difference between the two is not significant.0.7mmol·L-1And 1.0mmolL-1Dendrobium candidum the third two under Exogenous Silicon cold-resistance agent concentration
Aldehyde is extremely low, substantially less than control group and 2.0mmolL-1Group.Experimental data shows: dendrobium candidum passes through low temperature stress
Afterwards, spraying certain density Exogenous Silicon cold-resistance agent can be such that plant mda content significantly reduces, but Exogenous Silicon cold-resistance agent is dense
Degree is not that the higher the better, and it is optional concentration that spraying concentration, which is 0.5~1.5mmol/L, in this research, and under this concentration, Exogenous Silicon is anti-
The mda content of dendrobium candidum can be significantly reduced in cold agent, improves its winter resistance, wherein with 0.7~1.0mmolL-1For most
Good range of choice, under this concentration range, dendrobium candidum cold performance is optimal.
Plant organ tends to occur peroxidation of membrane lipids under the conditions of Chilling stress, and malonaldehyde is one of its product, leads to
Lipid peroxidation index is often utilized it as, indicates cell membrane lipid extent of peroxidation and plant to the strong of Chilling stress conditioned response
Weak, content height is inversely proportional with plant cold resistance power.Mda content is lower, shows that plant cold resistance is stronger.
Conclusion: three survival rate, chlorophyll content and mda content indexs are comprehensively considered, it can be said that dendrobium candidum passes through
After low temperature stress, spraying concentration is that the Exogenous Silicon cold-resistance agent of 0.5~1.5mmol/L can significantly improve the cold-resistant of dendrobium candidum
Property, wherein with 0.7~1.0mmolL-1For optimum range.
Claims (10)
1. a kind of Exogenous Silicon cold-resistance agent, which is characterized in that the raw material components including following concentration: external source silicon concentration 0.5~
1.0mmol/L, brassinosteroid 0.05~0.15mg/L of concentration, 150~250mg/L of concentration of proline, biphosphate potassium concn
100~300mg/L, indolebutyric acid 10~20mg/L of concentration, 10~15g/L of sucrose concentration.
2. Exogenous Silicon cold-resistance agent according to claim 1, it is characterised in that: the brassinosteroid concentration be 0.05~
0.10mg/L, concentration of proline are 150~200mg/L.
3. the preparation method of Exogenous Silicon cold-resistance agent as claimed in claim 1 or 2, which comprises the following steps: in phosphoric acid
In the mixed solution of potassium dihydrogen, sucrose and indolebutyric acid, the mixed solution of brassinosteroid and proline is added, PRIMARY STIRRING is equal
Just miscible fluid is formed after even；Exogenous Silicon is added in first miscible fluid, secondary stirs to get the Exogenous Silicon cold-resistance agent.
4. the preparation method of Exogenous Silicon cold-resistance agent according to claim 3, it is characterised in that: the PRIMARY STIRRING temperature is 25
~30 DEG C, mixing time is 2~3 hours；The secondary whipping temp is 28~35 DEG C, and the time is 3~5 hours.
5. the preparation method of Exogenous Silicon cold-resistance agent according to claim 3, it is characterised in that: the biphosphate potassium concn and
The mixed solution of indolebutyric acid is the mixed solution of the ethanol solution and potassium dihydrogen phosphate and the aqueous solution of sucrose of indolebutyric acid.
6. the preparation method of Exogenous Silicon cold-resistance agent according to claim 3, it is characterised in that: the brassinosteroid and dried meat ammonia
The mixed solution of acid is the mixed solution of the ethanol solution of brassinosteroid and the ethanol solution of proline.
7. application of the Exogenous Silicon cold-resistance agent as claimed in claim 1 or 2 in dendrobium candidum cold-resistant, it is characterised in that: described outer
The application concentration of source silicon cold-resistance agent is 0.5~1.5mmol/L.
8. application of the Exogenous Silicon cold-resistance agent in dendrobium candidum cold-resistant according to claim 7, it is characterised in that: the external source
The application concentration of silicon cold-resistance agent is 0.7~1.0mmol/L.
9. application of the Exogenous Silicon cold-resistance agent in dendrobium candidum cold-resistant according to claim 7, it is characterised in that: the external source
Control light transmittance is 60~80% when silicon cold-resistance agent is applied.
10. application of the Exogenous Silicon cold-resistance agent in dendrobium candidum cold-resistant according to claim 7, it is characterised in that: described outer
Temperature is controlled when source silicon cold-resistance agent is applied at 15~20 DEG C；Humidity is controlled 70~80%.
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| CN110973155A (en) * | 2019-12-19 | 2020-04-10 | 青岛农业大学 | Cold-proof agent for wheat late spring coldness |
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| CN1090970A (en) * | 1993-02-17 | 1994-08-24 | 陕西师范大学 | plant cryoprotectant |
| WO2009077471A3 (en) * | 2007-12-19 | 2010-02-25 | Basf Se | Azolylmethyloxiranes, use thereof and agents containing the same |
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| Publication number | Priority date | Publication date | Assignee | Title |
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| CN110973155A (en) * | 2019-12-19 | 2020-04-10 | 青岛农业大学 | Cold-proof agent for wheat late spring coldness |
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