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CN109037398A - A kind of preparation method of caesium tin iodine film and photovoltaic device based on it - Google Patents

A kind of preparation method of caesium tin iodine film and photovoltaic device based on it Download PDF

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CN109037398A
CN109037398A CN201810830311.9A CN201810830311A CN109037398A CN 109037398 A CN109037398 A CN 109037398A CN 201810830311 A CN201810830311 A CN 201810830311A CN 109037398 A CN109037398 A CN 109037398A
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CN109037398B (en
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罗派峰
周宇罡
张烨威
赵翼冉
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Hefei University of Technology
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    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10FINORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
    • H10F71/00Manufacture or treatment of devices covered by this subclass
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10FINORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
    • H10F10/00Individual photovoltaic cells, e.g. solar cells
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10FINORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
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    • Y02E10/50Photovoltaic [PV] energy
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
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Abstract

本发明公开了一种铯锡碘薄膜的制备方法及基于其的光伏器件,该薄膜是以SnI4与CsAc为原料制得Cs2SnI6粉末后,再经喷涂工艺沉积在目标基底上获得。本发明所得Cs2SnI6薄膜均一致密,以其作为光吸收层制作光伏器件,工艺简单、无污染,原材料丰富、廉价,特别适合制备大批量、低成本太阳能电池,因而有利于推动无机钙钛矿太阳能电池的发展与应用。

The invention discloses a preparation method of a cesium tin iodine thin film and a photovoltaic device based on the same. The thin film is obtained by preparing Cs2SnI6 powder from SnI4 and CsAc as raw materials, and depositing it on a target substrate through a spraying process. The obtained Cs 2 SnI 6 thin film of the present invention is uniform and dense, and it is used as a light-absorbing layer to make photovoltaic devices. The process is simple, pollution-free, and the raw materials are abundant and cheap. Development and application of mining solar cells.

Description

一种铯锡碘薄膜的制备方法及基于其的光伏器件A kind of preparation method of cesium tin iodine film and photovoltaic device based on it

技术领域technical field

本发明涉及一种Cs2SnI6薄膜的制备方法及基于其的光伏器件,属于薄膜太阳能电池光伏器件的制备工艺领域。The invention relates to a preparation method of a Cs 2 SnI 6 thin film and a photovoltaic device based thereon, and belongs to the field of preparation technology of thin film solar battery photovoltaic devices.

背景技术Background technique

钙钛矿电池是以钙钛矿薄膜材料为光吸收层的新型太阳能电池,一般可表示为AMX3,其中A代表阳离子,常见为甲胺(MA)、甲眯(FA)及铯(Cs)等。近几年来,有机-无机杂化钙钛矿太阳能电池由于其优异的光电特性而引起光伏界的广泛关注,但其面临着一个严峻的问题,即热稳定性不好,这导致其不能够应用于实际生产中。有机-无机杂化钙钛矿太阳能电池的热稳定差主要是由有机基团受热易分解、空气中易吸潮等引起,因此采用更为稳定的无机离子Cs取代有机基团可望解决钙钛矿电池的稳定性问题。Perovskite cell is a new type of solar cell with perovskite thin film material as the light absorption layer, generally expressed as AMX 3 , where A represents a cation, commonly methylamine (MA), methylamine (FA) and cesium (Cs) Wait. In recent years, organic-inorganic hybrid perovskite solar cells have attracted widespread attention in the photovoltaic industry due to their excellent photoelectric properties, but they are facing a serious problem, that is, poor thermal stability, which makes them unusable. in actual production. The poor thermal stability of organic-inorganic hybrid perovskite solar cells is mainly caused by the fact that organic groups are easily decomposed by heat and absorb moisture in the air. Therefore, replacing organic groups with more stable inorganic ions Cs is expected to solve the problem of perovskite solar cells. The stability of mining batteries.

近年来新型无机钙钛矿材料CsMX3(M=Pb,Sn;X=I,Br)由于具有优异的光电性能和良好的热稳定性而引起研究者的广泛关注,并可望解决传统有机钙钛矿电池的稳定性瓶颈问题。立方相的Cs2SnI6是CsSnI3钙钛矿结构的氧化态,由于CsSnI3钙钛矿材料二价Sn在空气中遇氧气易氧化成四价Sn无法暴露在空气中使用,限制了该材料的进一步应用。而Cs2SnI6材料具有较高的载流子浓度和迁移率,在空气中可以稳定存在。且相比于传统的Pb钙钛矿材料,Sn材料具有无毒、绿色环保无污染、价格便宜等优势。因此,开发Cs2SnI6薄膜材料的低成本、工艺简单、稳定性好的制备技术就显得尤为重要。In recent years, the new inorganic perovskite material CsMX 3 (M=Pb, Sn; X=I, Br) has attracted extensive attention of researchers due to its excellent photoelectric performance and good thermal stability, and is expected to solve the problem of traditional organic calcium The stability bottleneck of titanium battery. The Cs 2 SnI 6 in the cubic phase is the oxidation state of the CsSnI 3 perovskite structure. Since the divalent Sn of the CsSnI 3 perovskite material is easily oxidized to tetravalent Sn in the air, it cannot be exposed to the air, which limits the use of this material. further application. However, Cs 2 SnI 6 material has higher carrier concentration and mobility, and can exist stably in air. Moreover, compared with traditional Pb perovskite materials, Sn materials have the advantages of non-toxicity, environmental protection, pollution-free, and cheap price. Therefore, it is particularly important to develop the preparation technology of Cs 2 SnI 6 thin film materials with low cost, simple process and good stability.

传统的Cs2SnI6的合成方法是通过复杂高温合成法,在氩气气氛下通过在三口烧瓶中加入HI、H3PO2与SnI2,在120℃下油浴下首先合成HSnI3,然后加入CsI形成黄色结晶,用丙酮溶解,置于氩气环境中保持20-24h,获得Cs2SnI6,最后再用无水乙醇洗涤过滤获得可用的Cs2SnI6粉末样品。该方法复杂耗时,且对工艺要求较高。The traditional synthesis method of Cs 2 SnI 6 is a complex high-temperature synthesis method. In an argon atmosphere, HI, H 3 PO 2 and SnI 2 are added to a three-necked flask, and HSnI 3 is first synthesized in an oil bath at 120°C, and then Add CsI to form a yellow crystal, dissolve it with acetone, place it in an argon atmosphere for 20-24 hours to obtain Cs 2 SnI 6 , and finally wash and filter with absolute ethanol to obtain a usable Cs 2 SnI 6 powder sample. This method is complex and time-consuming, and requires high technology.

发明内容Contents of the invention

为避免上述现有技术所存在的不足之处,本发明公开了一种铯锡碘薄膜的制备方法及基于其的光伏器件。In order to avoid the disadvantages of the above-mentioned prior art, the invention discloses a preparation method of a cesium tin iodide thin film and a photovoltaic device based on it.

本发明为实现发明目的,采用如下技术方案:The present invention adopts following technical scheme for realizing the purpose of the invention:

本发明首先公开了一种铯锡碘薄膜的制备方法,其特点在于:首先将SnI4与CsAc溶于乙醇中,持续搅拌,所得反应液经离心分离、真空干燥,获得Cs2SnI6粉末;然后将所述Cs2SnI6粉末溶解在DMF溶液中,通过喷涂工艺沉积在目标基底上,即获得Cs2SnI6薄膜。具体包括如下步骤:The invention firstly discloses a preparation method of cesium tin iodine thin film, which is characterized in that: firstly dissolving SnI 4 and CsAc in ethanol, stirring continuously, the obtained reaction solution is centrifuged and vacuum dried to obtain Cs 2 SnI 6 powder; Then the Cs 2 SnI 6 powder is dissolved in a DMF solution, and deposited on the target substrate through a spraying process, that is, a Cs 2 SnI 6 film is obtained. Specifically include the following steps:

(1)取1mmol CsAc溶于1-5mL无水乙醇中,再加入1mmol的SnI4粉末,持续搅拌1-3h,对反应液进行离心分离后,所得黑色沉淀60℃真空干燥4-8h,获得Cs2SnI6粉末;(1) Dissolve 1mmol CsAc in 1-5mL of absolute ethanol, add 1mmol of SnI4 powder, continue to stir for 1-3h, centrifuge the reaction solution, and dry the black precipitate at 60°C for 4-8h in vacuum to obtain Cs 2 SnI 6 powder;

(2)将所述Cs2SnI6粉末溶解在DMF中,室温搅拌2h,获得250mg/mL Cs2SnI6溶液;(2) Dissolving the Cs 2 SnI 6 powder in DMF and stirring at room temperature for 2 h to obtain a 250 mg/mL Cs 2 SnI 6 solution;

(3)将目标基底预热至120-140℃,将所述Cs2SnI6溶液加入到喷枪内,然后在目标基底上均匀喷涂20s,形成均一致密的薄膜,最后再恒温下退火5-15min,即得Cs2SnI6薄膜。(3) Preheat the target substrate to 120-140°C, add the Cs 2 SnI 6 solution into the spray gun, and then spray evenly on the target substrate for 20 seconds to form a uniform and dense film, and finally anneal at constant temperature for 5-15 minutes , That is Cs 2 SnI 6 film.

本发明还公开一种基于铯锡碘薄膜的光伏器件,如图1所示,其是在FTO导电玻璃表面依次沉积有作为电子传输层的致密层TiO2、作为光吸收层的Cs2SnI6薄膜、作为空穴传输层的Sprio-OMeTAD薄膜(HTM)、和正负电极(Ag)。The present invention also discloses a photovoltaic device based on cesium tin-iodide thin film, as shown in Figure 1, it is sequentially deposited on the surface of FTO conductive glass with a dense layer TiO 2 as an electron transport layer and Cs 2 SnI 6 as a light absorption layer Thin film, Sprio-OMeTAD thin film (HTM) as hole transport layer, and positive and negative electrodes (Ag).

上述光伏器件的制备方法,包括如下步骤:The preparation method of above-mentioned photovoltaic device, comprises the steps:

(1)为防止测试电池时将薄膜夹穿导致电池短路,将FTO导电玻璃表面部分刻蚀,具体是:将FTO导电玻璃表面分为沉积区和非沉积区,在所述沉积区的局部均匀平铺上锌粉,然后将2M的HCl滴在锌粉上,刻蚀5min;(1) In order to prevent the short circuit of the battery caused by the pinching of the film when testing the battery, the surface of the FTO conductive glass is partially etched, specifically: the surface of the FTO conductive glass is divided into a deposition area and a non-deposition area, and the local uniformity in the deposition area Spread zinc powder on the surface, then drop 2M HCl on the zinc powder and etch for 5 minutes;

将刻蚀后的FTO导电玻璃清洗、吹干(将刻蚀后的FTO导电玻璃依次用肥皂水、丙酮、乙醇超声清洗20min,然后用N2吹干,再使用紫外-臭氧清洗机清洗20min),得到洁净的FTO导电玻璃。Clean and dry the etched FTO conductive glass (clean the etched FTO conductive glass sequentially with soapy water, acetone, and ethanol for 20 minutes, then blow dry with N2 , and then use a UV-ozone cleaning machine to clean for 20 minutes) , get clean FTO conductive glass.

(2)在FTO导电玻璃表面的沉积区沉积致密层TiO2作为电子传输层;( 2 ) Deposit dense layer TiO in the deposition area of FTO conductive glass surface as electron transport layer;

(3)以上述的制备方法在所述电子传输层上形成Cs2SnI6薄膜,作为光吸收层;(3) Forming a Cs 2 SnI 6 thin film on the electron transport layer by the above-mentioned preparation method as the light absorption layer;

(4)在所述Cs2SnI6薄膜上制备Sprio-OMeTAD薄膜作为空穴传输层。(4) Preparing a Sprio-OMeTAD thin film on the Cs 2 SnI 6 thin film as a hole transport layer.

(5)在所述FTO导电玻璃表面的非沉积区蒸镀Ag电极作为负电极,在所述空穴传输层上蒸镀Ag电极作为正电极,负电极与电子传输层、光吸收层及空穴传输层不接触,即得基于Cs2SnI6薄膜的钙钛矿光伏器件。(5) vapor-deposit Ag electrode on the non-deposition area of described FTO conductive glass surface as negative electrode, vapor-deposit Ag electrode on described hole transport layer as positive electrode, negative electrode and electron transport layer, light-absorbing layer and spacer The hole transport layer is not in contact, and a perovskite photovoltaic device based on the Cs 2 SnI 6 thin film is obtained.

与已有技术相比,本发明的有益效果体现在:Compared with the prior art, the beneficial effects of the present invention are reflected in:

1、本发明Cs2SnI6薄膜的制备方法工艺简单、无污染,原材料丰富、廉价,特别适合制备大批量、低成本太阳能电池,因而有利于推动无机钙钛矿太阳能电池的发展与应用。1. The preparation method of the Cs 2 SnI 6 thin film of the present invention has simple process, no pollution, abundant and cheap raw materials, and is especially suitable for the preparation of large-volume, low-cost solar cells, which is conducive to promoting the development and application of inorganic perovskite solar cells.

2、本发明所制得的Cs2SnI6薄膜均一致密,暴露在空气中稳定且不易相变。2. The Cs 2 SnI 6 thin film prepared by the present invention is uniform and dense, stable and difficult to phase change when exposed to air.

3、本发明采用Cs2SnI6变形钙钛矿结构作为光吸收层材料制备钙钛矿太阳能薄膜电池,与常用的有机无机杂化钙钛矿太阳电池相比,可有效避免当前太阳能电池制备的繁琐手套箱操作及昂贵真空蒸发设备投入,在普通大气环境下即可实现高质量、稳定钙钛矿光吸收层薄膜的低成本制备。3. The present invention adopts the Cs 2 SnI 6 deformed perovskite structure as the light-absorbing layer material to prepare perovskite solar thin film cells. Compared with commonly used organic-inorganic hybrid perovskite solar cells, it can effectively avoid the current solar cell preparation. The tedious glove box operation and the investment of expensive vacuum evaporation equipment can realize the low-cost preparation of high-quality and stable perovskite light-absorbing layer films in ordinary atmospheric environments.

4、本发明的Cs2SnI6薄膜材料相比于传统的Pb钙钛矿材料,具有无毒、绿色环保无污染、价格便宜等优势,更适合用作室外应用的太阳能电池,更有利于工业化推广。4. Compared with the traditional Pb perovskite material, the Cs 2 SnI 6 thin film material of the present invention has the advantages of non-toxicity, environmental protection, pollution-free, and cheap price, and is more suitable for use as solar cells for outdoor applications, and is more conducive to industrialization promote.

附图说明Description of drawings

图1为基于铯锡碘薄膜的钙钛矿太阳能电池的结构示意图;Fig. 1 is the structural representation of the perovskite solar cell based on cesium tin iodine film;

图2为Cs2SnI6薄膜的喷涂方法示意图;Fig. 2 is the schematic diagram of the spraying method of Cs 2 SnI 6 film;

图3为实施例1中Cs2SnI6薄膜的X射线衍射(XRD)图;Fig. 3 is the X-ray diffraction (XRD) pattern of Cs2SnI6 thin film in embodiment 1 ;

图4为实施例1中Cs2SnI6薄膜的扫描电子显微镜照片(SEM);Fig. 4 is the scanning electron micrograph (SEM) of Cs 2 SnI 6 thin films in embodiment 1;

图5为实施例1中基于Cs2SnI6薄膜的钙钛矿太阳能电池的电流密度-电压(J-V)特性曲线;Fig. 5 is the current density-voltage (JV) characteristic curve of the perovskite solar cell based on Cs 2 SnI 6 thin films in embodiment 1;

图6为实施例2中基于Cs2SnI6薄膜的钙钛矿太阳能电池的电流密度-电压(J-V)特性曲线;Fig. 6 is the current density-voltage (JV) characteristic curve of the perovskite solar cell based on Cs 2 SnI 6 thin films in embodiment 2;

图7为实施例3中基于Cs2SnI6薄膜的钙钛矿太阳能电池的电流密度-电压(J-V)特性曲线。7 is the current density-voltage (JV) characteristic curve of the perovskite solar cell based on the Cs 2 SnI 6 thin film in Example 3. FIG.

具体实施方式Detailed ways

为使本发明的上述目的、特征和优点能够更加明显易懂,下面结合实施例对本发明的具体实施方式做详细的说明。以下内容仅仅是对本发明的构思所作的举例和说明,所属本技术领域的技术人员对所描述的具体实施例做各种各样的修改或补充或采用类似的方式替代,只要不偏离发明的构思或者超越本权利要求书所定义的范围,均应属于本发明的保护范围。In order to make the above objects, features and advantages of the present invention more obvious and comprehensible, specific implementations of the present invention will be described in detail below in conjunction with examples. The following content is only an example and description of the concept of the present invention. Those skilled in the art make various modifications or supplements to the described specific embodiments or replace them in similar ways, as long as they do not deviate from the concept of the invention Or beyond the scope defined in the claims, all should belong to the protection scope of the present invention.

实施例1Example 1

本实施例按如下步骤制备Cs2SnI6薄膜及基于其的太阳能电池:In this example, a Cs 2 SnI 6 thin film and a solar cell based on it are prepared according to the following steps:

(1)取1mmol CsAc溶于2mL无水乙醇中,再加入1mmol的SnI4粉末,持续搅拌2h,对反应液进行离心分离后,所得黑色沉淀60℃真空干燥6h,获得黑色的Cs2SnI6粉末;(1) Dissolve 1 mmol of CsAc in 2 mL of absolute ethanol, then add 1 mmol of SnI 4 powder, continue to stir for 2 hours, centrifuge the reaction solution, and dry the black precipitate at 60°C for 6 hours in vacuum to obtain black Cs 2 SnI 6 powder;

(2)将FTO导电玻璃切割成20×15mm的小块,将其分为15mm宽度与5mm宽度的两部分,分别作为沉积区与非沉积区。然后将沉积区远离非沉积区的5mm宽度作为刻蚀区。在非刻蚀区的部分贴住胶带,漏出刻蚀区。将锌粉均匀平铺在刻蚀区,将2M的HCl溶液滴在铺好的锌粉上,刻蚀5min。(2) Cut the FTO conductive glass into a small piece of 20×15mm, and divide it into two parts with a width of 15mm and a width of 5mm, which are respectively used as a deposition area and a non-deposition area. Then the 5 mm width of the deposition area away from the non-deposition area was used as an etching area. Stick the tape on the part of the non-etched area, and leak out the etched area. Spread zinc powder evenly on the etching area, drop 2M HCl solution on the laid zinc powder, and etch for 5 minutes.

将刻蚀后的FTO导电玻璃依次用肥皂水、丙酮、乙醇超声清洗20min,然后用N2吹干,再使用紫外-臭氧清洗机清洗20min,得到洁净的FTO导电玻璃。The etched FTO conductive glass was ultrasonically cleaned with soapy water, acetone, and ethanol for 20 minutes, then dried with N2 , and then cleaned with a UV-ozone cleaner for 20 minutes to obtain a clean FTO conductive glass.

(3)在FTO导电玻璃表面的沉积区沉积致密层TiO2作为电子传输层:首先取1g75%双(乙酰丙酮基)二异丙基钛酸酯异丙醇溶液(wt%)加入到10.3g正丁醇中形成0.15mol/L的TiO2前驱液,取2~3滴上述溶液滴加到干净的FTO导电玻璃表面非刻蚀区,2000rpm旋涂40s后取下基片,135℃干燥10min,然后500℃烧结30min;待烧结结束后,将基片使用40mmol/L TiCl4水溶液70℃处理30min,并再次用500℃烧结30min,即得到致密层TiO2(FTO/c-TiO2)。(3) Deposit dense layer TiO in the deposition area on the FTO conductive glass surface as electron transport layer: first get 1g75% two (acetylacetonate) diisopropyl titanate isopropanol solution (wt %) and add to 10.3g Form a 0.15mol/L TiO 2 precursor solution in n-butanol, take 2-3 drops of the above solution and add it dropwise to the non-etching area of the clean FTO conductive glass surface, spin coat at 2000rpm for 40s, remove the substrate, and dry at 135°C for 10min , and then sintered at 500°C for 30min; after sintering, the substrate was treated with 40mmol/L TiCl 4 aqueous solution at 70°C for 30min, and then sintered at 500°C for 30min to obtain a dense layer of TiO 2 (FTO/c-TiO2).

(3)将Cs2SnI6粉末溶解在DMF中,室温搅拌2h,获得250mg/mL Cs2SnI6溶液;(3) Dissolve Cs 2 SnI 6 powder in DMF, stir at room temperature for 2 h to obtain 250 mg/mL Cs 2 SnI 6 solution;

将步骤(2)所获得FTO/c-TiO2基片预热至130℃,将Cs2SnI6溶液加入到喷枪内,然后在基片上均匀喷涂20s,形成均一致密的薄膜,最后再在130℃下退火10min,即得Cs2SnI6薄膜。Preheat the FTO/c-TiO 2 substrate obtained in step (2) to 130°C, add the Cs 2 SnI 6 solution into the spray gun, and then spray evenly on the substrate for 20s to form a uniform and dense film. Cs 2 SnI 6 thin film was obtained by annealing at ℃ for 10 min.

(4)在Cs2SnI6薄膜上制备Sprio-OMeTAD薄膜作为空穴传输层:取72.3mg2,2’,7,7’,-[N,N-二(4-甲氧基苯基)氨基]-9,9’-螺二芴溶于1mL氯苯中,并加入17.5μL浓度为0.52g/mL的双三氟甲烷磺酰亚胺锂的乙腈溶液和28.8μL 4-叔丁基吡啶,即得Sprio-OMeTAD薄膜旋涂液;在所述Cs2SnI6薄膜上旋涂Sprio-OMeTAD旋涂液,旋涂速度为4000rpm、旋涂时间为30s,即得空穴传输层。(4) Prepare Sprio-OMeTAD film on Cs 2 SnI 6 film as hole transport layer: take 72.3 mg of 2,2',7,7',-[N,N-bis(4-methoxyphenyl)amino ]-9,9'-spirobifluorene was dissolved in 1 mL of chlorobenzene, and 17.5 μL of 0.52 g/mL lithium bistrifluoromethanesulfonimide in acetonitrile and 28.8 μL of 4-tert-butylpyridine were added, The Sprio-OMeTAD thin film spin-coating liquid was obtained; the Sprio-OMeTAD spin-coating liquid was spin-coated on the Cs 2 SnI 6 thin film at a spin-coating speed of 4000 rpm and a spin-coating time of 30 s to obtain a hole transport layer.

(5)在FTO导电玻璃表面的非沉积区蒸镀Ag电极作为负电极,在空穴传输层上蒸镀Ag电极作为正电极,正负电极厚度~70nm,即得基于Cs2SnI6薄膜的钙钛矿光伏器件。(5) Evaporate an Ag electrode on the non - deposition area of the FTO conductive glass surface as the negative electrode, and vapor-deposit the Ag electrode on the hole transport layer as the positive electrode. Perovskite photovoltaic devices.

图1为基于铯锡碘薄膜的钙钛矿太阳能电池的结构示意图;图2为Cs2SnI6薄膜喷涂方法示意图;图3为本实施例所制得的Cs2SnI6薄膜的X射线衍射(XRD)图;图4为本实施例所制得的Cs2SnI6薄膜的扫描电子显微镜照片。可以看出,本实施例所得薄膜均一致密。Fig. 1 is the structural representation of the perovskite solar cell based on cesium tin iodine thin film; Fig. 2 is Cs 2 SnI The schematic diagram of thin film spraying method ; Fig. 3 is the X-ray diffraction ( XRD) figure; FIG. 4 is a scanning electron micrograph of the Cs 2 SnI 6 thin film prepared in this embodiment. It can be seen that the film obtained in this example is uniform and dense.

对本实施例所制作的钙钛矿光伏器件进行性能测试:测试温度为25℃;相对湿度为30%;光源的光谱辐照度为100mW/m2,并具有标准的AM1.5太阳光谱辐照度分布。经测试,电池的电流密度-电压(J-V)特性曲线如图5所示。Perform a performance test on the perovskite photovoltaic device produced in this example: the test temperature is 25°C; the relative humidity is 30%; the spectral irradiance of the light source is 100mW/m 2 , and has a standard AM1.5 solar spectral irradiance degree distribution. After testing, the current density-voltage (JV) characteristic curve of the battery is shown in FIG. 5 .

实施例2Example 2

本实施例按实施例1相同的方法制作Cs2SnI6薄膜及基于其的太阳能电池,区别仅在于步骤(3)中的退火温度为120℃。经测试,本实施例所制作的薄膜均一致密,相应太阳能电池的J-V特性曲线如图6所示。In this embodiment, the Cs 2 SnI 6 thin film and the solar cell based on it are fabricated according to the same method as in the embodiment 1, except that the annealing temperature in step (3) is 120° C. After testing, the film produced in this embodiment is uniform and dense, and the JV characteristic curve of the corresponding solar cell is shown in FIG. 6 .

实施例3Example 3

本实施例按实施例1相同的方法制作Cs2SnI6薄膜及基于其的太阳能电池,区别仅在于步骤(3)中的退火温度为140℃。经测试,本实施例所制作的薄膜均一致密,相应太阳能电池的J-V特性曲线如图7所示。In this embodiment, the Cs 2 SnI 6 thin film and the solar cell based on it are fabricated by the same method as in the embodiment 1, except that the annealing temperature in step (3) is 140° C. After testing, the film produced in this embodiment is uniform and dense, and the JV characteristic curve of the corresponding solar cell is shown in FIG. 7 .

以上仅为本发明的示例性实施例而已,并不用以限制本发明,凡在本发明的精神和原则之内所作的任何修改、等同替换和改进等,均应包含在本发明的保护范围之内。The above are only exemplary embodiments of the present invention, and are not intended to limit the present invention. Any modifications, equivalent replacements and improvements made within the spirit and principles of the present invention should be included in the protection scope of the present invention Inside.

Claims (4)

1.一种铯锡碘薄膜的制备方法,其特征在于:首先将SnI4与CsAc溶于乙醇中,持续搅拌,所得反应液经离心分离、真空干燥,获得Cs2SnI6粉末;然后将所述Cs2SnI6粉末溶解在DMF溶液中,通过喷涂工艺沉积在目标基底上,即获得Cs2SnI6薄膜。1. a kind of preparation method of cesium tin iodine thin film is characterized in that: at first SnI 4 and CsAc are dissolved in ethanol, keep stirring, gained reaction solution is through centrifugation, vacuum drying, obtains Cs 2 SnI 6 powder; The above Cs 2 SnI 6 powder is dissolved in a DMF solution, and deposited on a target substrate by a spraying process to obtain a Cs 2 SnI 6 thin film. 2.根据权利要求1所述的制备方法,其特征在于,具体包括如下步骤:2. preparation method according to claim 1, is characterized in that, specifically comprises the steps: (1)取1mmol CsAc溶于1-5mL无水乙醇中,再加入1mmol的SnI4粉末,持续搅拌1-3h,对反应液进行离心分离后,所得黑色沉淀60℃真空干燥4-8h,获得Cs2SnI6粉末;(1) Dissolve 1mmol CsAc in 1-5mL of absolute ethanol, add 1mmol of SnI4 powder, continue to stir for 1-3h, centrifuge the reaction solution, and dry the black precipitate at 60°C for 4-8h in vacuum to obtain Cs 2 SnI 6 powder; (2)将所述Cs2SnI6粉末溶解在DMF中,室温搅拌2h,获得250mg/mL的Cs2SnI6溶液;(2) Dissolving the Cs 2 SnI 6 powder in DMF and stirring at room temperature for 2 h to obtain a 250 mg/mL Cs 2 SnI 6 solution; (3)将目标基底预热至120-140℃,将所述Cs2SnI6溶液加入到喷枪内,然后在目标基底上均匀喷涂20s,形成均一致密的薄膜,最后再恒温下退火5-15min,即得Cs2SnI6薄膜。(3) Preheat the target substrate to 120-140°C, add the Cs 2 SnI 6 solution into the spray gun, and then spray evenly on the target substrate for 20 seconds to form a uniform and dense film, and finally anneal at constant temperature for 5-15 minutes , That is Cs 2 SnI 6 film. 3.一种基于铯锡碘薄膜的光伏器件,其特征在于:所述光伏器件是在FTO导电玻璃表面依次沉积有作为电子传输层的致密层TiO2、作为光吸收层的以权利要求1~2中任意一项所述制备方法所制得的Cs2SnI6薄膜、作为空穴传输层的Sprio-OMeTAD薄膜、和正负电极。3. a photovoltaic device based on cesium tin iodine thin film, it is characterized in that: described photovoltaic device is deposited with the dense layer TiO 2 as electron transport layer successively on FTO conductive glass surface, as light absorbing layer with claim 1~ The Cs 2 SnI 6 film prepared by any one of the preparation methods in 2, the Sprio-OMeTAD film as the hole transport layer, and the positive and negative electrodes. 4.一种权利要求3所述光伏器件的制备方法,其特征在于,包括如下步骤:4. a preparation method of the photovoltaic device described in claim 3, is characterized in that, comprises the steps: (1)将FTO导电玻璃表面分为沉积区和非沉积区,在所述沉积区的局部均匀平铺上锌粉,然后将2M的HCl滴在锌粉上,刻蚀5min;将刻蚀后的FTO导电玻璃清洗、吹干;(1) The surface of the FTO conductive glass is divided into a deposition area and a non-deposition area, and zinc powder is evenly spread on the local area of the deposition area, then 2M HCl is dripped on the zinc powder, and etched for 5min; FTO conductive glass cleaning and drying; (2)在FTO导电玻璃表面的沉积区沉积致密层TiO2作为电子传输层;( 2 ) Deposit dense layer TiO in the deposition area of FTO conductive glass surface as electron transport layer; (3)以权利要求1或2中任意一项所述制备方法在所述电子传输层上形成Cs2SnI6薄膜,作为光吸收层;(3) forming a Cs 2 SnI 6 thin film on the electron transport layer with the preparation method described in any one of claim 1 or 2, as the light absorbing layer; (4)在所述Cs2SnI6薄膜上制备Sprio-OMeTAD薄膜作为空穴传输层;(4) preparing a Sprio-OMeTAD film on the Cs 2 SnI 6 film as a hole transport layer; (5)在所述FTO导电玻璃表面的非沉积区蒸镀Ag电极作为负电极,在所述空穴传输层上蒸镀Ag电极作为正电极,即得基于Cs2SnI6薄膜的钙钛矿光伏器件。(5) Evaporate an Ag electrode on the non-deposition area on the surface of the FTO conductive glass as a negative electrode, and vapor-deposit an Ag electrode on the hole transport layer as a positive electrode to obtain a perovskite based on Cs 2 SnI 6 thin films Photovoltaic devices.
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