CN108169997B - 光学补偿膜、掩膜版以及曝光机 - Google Patents
光学补偿膜、掩膜版以及曝光机 Download PDFInfo
- Publication number
- CN108169997B CN108169997B CN201711435037.7A CN201711435037A CN108169997B CN 108169997 B CN108169997 B CN 108169997B CN 201711435037 A CN201711435037 A CN 201711435037A CN 108169997 B CN108169997 B CN 108169997B
- Authority
- CN
- China
- Prior art keywords
- optical compensation
- compensation film
- region
- film
- light
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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Classifications
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
- G03F7/70983—Optical system protection, e.g. pellicles or removable covers for protection of mask
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
- G03F1/38—Masks having auxiliary features, e.g. special coatings or marks for alignment or testing; Preparation thereof
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70058—Mask illumination systems
- G03F7/7015—Details of optical elements
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70216—Mask projection systems
- G03F7/70275—Multiple projection paths, e.g. array of projection systems, microlens projection systems or tandem projection systems
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70216—Mask projection systems
- G03F7/70308—Optical correction elements, filters or phase plates for manipulating imaging light, e.g. intensity, wavelength, polarisation, phase or image shift
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
- B29D—PRODUCING PARTICULAR ARTICLES FROM PLASTICS OR FROM SUBSTANCES IN A PLASTIC STATE
- B29D11/00—Producing optical elements, e.g. lenses or prisms
- B29D11/0074—Production of other optical elements not provided for in B29D11/00009- B29D11/0073
- B29D11/00788—Producing optical films
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Health & Medical Sciences (AREA)
- Engineering & Computer Science (AREA)
- Environmental & Geological Engineering (AREA)
- Epidemiology (AREA)
- Public Health (AREA)
- Polarising Elements (AREA)
- Optical Elements Other Than Lenses (AREA)
- Laminated Bodies (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
Abstract
Description
Claims (10)
Priority Applications (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201711435037.7A CN108169997B (zh) | 2017-12-26 | 2017-12-26 | 光学补偿膜、掩膜版以及曝光机 |
| US16/340,149 US10795256B2 (en) | 2017-12-26 | 2018-12-26 | Optical compensation film, photomask, and exposure apparatus |
| PCT/CN2018/123805 WO2019129031A1 (zh) | 2017-12-26 | 2018-12-26 | 光学补偿膜、掩膜版以及曝光机 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201711435037.7A CN108169997B (zh) | 2017-12-26 | 2017-12-26 | 光学补偿膜、掩膜版以及曝光机 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| CN108169997A CN108169997A (zh) | 2018-06-15 |
| CN108169997B true CN108169997B (zh) | 2020-12-22 |
Family
ID=62521490
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201711435037.7A Active CN108169997B (zh) | 2017-12-26 | 2017-12-26 | 光学补偿膜、掩膜版以及曝光机 |
Country Status (3)
| Country | Link |
|---|---|
| US (1) | US10795256B2 (zh) |
| CN (1) | CN108169997B (zh) |
| WO (1) | WO2019129031A1 (zh) |
Families Citing this family (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| KR102866527B1 (ko) * | 2020-11-26 | 2025-10-01 | 삼성전자주식회사 | 극자외선 발생 장치와 이의 제조 방법, 및 극자외선 시스템 |
| CN114236972B (zh) * | 2021-12-13 | 2023-06-27 | Tcl华星光电技术有限公司 | 显示面板及其制备方法、显示装置 |
Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN101075039A (zh) * | 2006-05-15 | 2007-11-21 | 株式会社日立显示器 | 液晶显示装置 |
Family Cites Families (25)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4793694A (en) * | 1986-04-23 | 1988-12-27 | Quantronix Corporation | Method and apparatus for laser beam homogenization |
| US6443579B1 (en) * | 2001-05-02 | 2002-09-03 | Kenneth Myers | Field-of-view controlling arrangements |
| EP2402797A3 (en) * | 2001-12-14 | 2012-08-08 | QUALCOMM MEMS Technologies, Inc. | Uniform illumination system |
| CA2478641A1 (en) * | 2002-03-08 | 2003-09-18 | Nippon Electric Glass Co., Ltd. | Prism and method of producing the same |
| US20050280894A1 (en) * | 2004-04-02 | 2005-12-22 | David Hartkop | Apparatus for creating a scanning-column backlight in a scanning aperture display device |
| JP5352956B2 (ja) * | 2006-02-14 | 2013-11-27 | セイコーエプソン株式会社 | 液晶装置、液晶装置の製造方法、プロジェクタ及び電子機器 |
| US7529048B2 (en) * | 2006-03-03 | 2009-05-05 | Ching-Bin Lin | Optical film having multi-story prisms and manufacturing process thereof |
| JPWO2007145246A1 (ja) * | 2006-06-14 | 2009-11-05 | 日立化成工業株式会社 | 樹脂組成物、およびこれを用いてなる積層型光学部材 |
| US7835079B2 (en) * | 2007-03-06 | 2010-11-16 | Ostendo Technologies, Inc. | Micro-structure based screen system for use in rear projection array display systems |
| JP2008249896A (ja) | 2007-03-29 | 2008-10-16 | Fujifilm Corp | 偏光板用保護フィルム、偏光板、及び液晶表示装置 |
| US20080259268A1 (en) | 2007-04-12 | 2008-10-23 | Fujifilm Corporation | Process of producing substrate for liquid crystal display device |
| JP5111150B2 (ja) * | 2007-04-12 | 2012-12-26 | 富士フイルム株式会社 | 液晶表示装置用基板の製造方法 |
| US8210689B2 (en) * | 2007-12-31 | 2012-07-03 | 3M Innovative Properties Company | Projection system |
| JP5106130B2 (ja) * | 2008-01-08 | 2012-12-26 | 住友重機械工業株式会社 | レーザビーム照射方法およびレーザビーム照射装置 |
| US8558961B2 (en) * | 2008-04-22 | 2013-10-15 | Samsung Display Co., Ltd. | Display device and lenticular sheet of the display device |
| KR101593515B1 (ko) * | 2009-04-21 | 2016-02-29 | 삼성디스플레이 주식회사 | 입체영상 표시 장치 |
| US20120039078A1 (en) * | 2009-04-28 | 2012-02-16 | Sharp Kabushiki Kaisha | Lighting device and displaying device |
| EP2487196B1 (en) * | 2009-10-09 | 2018-01-17 | Ube Industries, Ltd. | Process for the production of a colored polyimide molded article |
| KR101681143B1 (ko) * | 2010-07-19 | 2016-12-02 | 삼성디스플레이 주식회사 | 노광 장치 및 이를 이용한 노광 방법 |
| JP2014142366A (ja) * | 2011-05-13 | 2014-08-07 | Sharp Corp | 光拡散部材およびその製造方法、表示装置 |
| JP2013242538A (ja) * | 2012-04-26 | 2013-12-05 | Panasonic Corp | 液晶光学素子及びそれを備えた画像表示装置 |
| CN104536258B (zh) * | 2014-12-23 | 2019-12-10 | 厦门天马微电子有限公司 | 一种掩膜板、曝光装置、制作光敏树脂图案的方法及基板 |
| CN105629354A (zh) * | 2016-01-04 | 2016-06-01 | 京东方科技集团股份有限公司 | 防窥膜及其制造方法和显示装置 |
| KR102455050B1 (ko) * | 2016-03-09 | 2022-10-17 | 삼성디스플레이 주식회사 | 표시 장치 및 휴대용 단말기 |
| TWI676067B (zh) * | 2018-05-15 | 2019-11-01 | 友達光電股份有限公司 | 具環境光補償設計的顯示裝置 |
-
2017
- 2017-12-26 CN CN201711435037.7A patent/CN108169997B/zh active Active
-
2018
- 2018-12-26 US US16/340,149 patent/US10795256B2/en not_active Expired - Fee Related
- 2018-12-26 WO PCT/CN2018/123805 patent/WO2019129031A1/zh not_active Ceased
Patent Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN101075039A (zh) * | 2006-05-15 | 2007-11-21 | 株式会社日立显示器 | 液晶显示装置 |
Also Published As
| Publication number | Publication date |
|---|---|
| WO2019129031A1 (zh) | 2019-07-04 |
| US20200142295A1 (en) | 2020-05-07 |
| CN108169997A (zh) | 2018-06-15 |
| US10795256B2 (en) | 2020-10-06 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| PB01 | Publication | ||
| PB01 | Publication | ||
| SE01 | Entry into force of request for substantive examination | ||
| SE01 | Entry into force of request for substantive examination | ||
| GR01 | Patent grant | ||
| GR01 | Patent grant | ||
| TR01 | Transfer of patent right | ||
| TR01 | Transfer of patent right |
Effective date of registration: 20250421 Address after: No. 36, Weier Second Road, Wanchun Street, Economic and Technological Development Zone, Wuhu City, Anhui Province 241100 Patentee after: Wuhu Zhongpu Intelligent Equipment Co.,Ltd. Country or region after: China Address before: Building C5, biological city, NO.666, Gaoxin Avenue, Donghu Development Zone, Wuhan City, Hubei Province Patentee before: WUHAN CHINA STAR OPTOELECTRONICS TECHNOLOGY Co.,Ltd. Country or region before: China |
|
| TR01 | Transfer of patent right | ||
| TR01 | Transfer of patent right |
Effective date of registration: 20250625 Address after: Room 606, 6th Floor, Building D and E, Commercial Center, Renmin Road Central Street, Taocheng District, Hengshui City, Hebei Province 053099 Patentee after: Hengshui Hengyin Enterprise Management Co.,Ltd. Country or region after: China Address before: No. 36, Weier Second Road, Wanchun Street, Economic and Technological Development Zone, Wuhu City, Anhui Province 241100 Patentee before: Wuhu Zhongpu Intelligent Equipment Co.,Ltd. Country or region before: China |