CN107601912A - A kind of efficient etching solution of TFT LCD displays base plate glass - Google Patents
A kind of efficient etching solution of TFT LCD displays base plate glass Download PDFInfo
- Publication number
- CN107601912A CN107601912A CN201710847589.2A CN201710847589A CN107601912A CN 107601912 A CN107601912 A CN 107601912A CN 201710847589 A CN201710847589 A CN 201710847589A CN 107601912 A CN107601912 A CN 107601912A
- Authority
- CN
- China
- Prior art keywords
- etching solution
- tft
- lcd display
- glass
- display screen
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 238000005530 etching Methods 0.000 title claims abstract description 35
- 239000005357 flat glass Substances 0.000 title abstract 2
- 239000011521 glass Substances 0.000 claims abstract description 28
- 239000000758 substrate Substances 0.000 claims abstract description 27
- KRHYYFGTRYWZRS-UHFFFAOYSA-N Fluorane Chemical compound F KRHYYFGTRYWZRS-UHFFFAOYSA-N 0.000 claims abstract description 14
- 239000002904 solvent Substances 0.000 claims abstract description 11
- 239000004094 surface-active agent Substances 0.000 claims abstract description 11
- GRYLNZFGIOXLOG-UHFFFAOYSA-N Nitric acid Chemical compound O[N+]([O-])=O GRYLNZFGIOXLOG-UHFFFAOYSA-N 0.000 claims abstract description 6
- 229910019142 PO4 Inorganic materials 0.000 claims abstract description 6
- 102000004160 Phosphoric Monoester Hydrolases Human genes 0.000 claims abstract description 6
- 108090000608 Phosphoric Monoester Hydrolases Proteins 0.000 claims abstract description 6
- 229910017604 nitric acid Inorganic materials 0.000 claims abstract description 6
- NBIIXXVUZAFLBC-UHFFFAOYSA-K phosphate Chemical compound [O-]P([O-])([O-])=O NBIIXXVUZAFLBC-UHFFFAOYSA-K 0.000 claims abstract description 6
- 239000010452 phosphate Substances 0.000 claims abstract description 6
- KMUONIBRACKNSN-UHFFFAOYSA-N potassium dichromate Chemical compound [K+].[K+].[O-][Cr](=O)(=O)O[Cr]([O-])(=O)=O KMUONIBRACKNSN-UHFFFAOYSA-N 0.000 claims abstract description 6
- 239000002994 raw material Substances 0.000 claims abstract description 6
- QAOWNCQODCNURD-UHFFFAOYSA-N sulfuric acid Substances OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 claims abstract description 6
- 239000000203 mixture Substances 0.000 claims description 16
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 claims description 10
- PUZPDOWCWNUUKD-UHFFFAOYSA-M sodium fluoride Chemical compound [F-].[Na+] PUZPDOWCWNUUKD-UHFFFAOYSA-M 0.000 claims description 10
- 229920003171 Poly (ethylene oxide) Polymers 0.000 claims description 5
- 125000005037 alkyl phenyl group Chemical group 0.000 claims description 5
- 239000008367 deionised water Substances 0.000 claims description 5
- 229910021641 deionized water Inorganic materials 0.000 claims description 5
- RTZKZFJDLAIYFH-UHFFFAOYSA-N ether Substances CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 claims description 5
- 235000019580 granularity Nutrition 0.000 claims description 5
- -1 polyoxyethylene Polymers 0.000 claims description 5
- 235000013024 sodium fluoride Nutrition 0.000 claims description 5
- 239000011775 sodium fluoride Substances 0.000 claims description 5
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Chemical compound O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims description 5
- 239000012535 impurity Substances 0.000 abstract description 4
- 229910052751 metal Inorganic materials 0.000 abstract description 4
- 239000002184 metal Substances 0.000 abstract description 4
- 238000003475 lamination Methods 0.000 abstract description 2
- 229920002120 photoresistant polymer Polymers 0.000 abstract description 2
- 238000012797 qualification Methods 0.000 abstract description 2
- 238000000034 method Methods 0.000 description 7
- 238000005516 engineering process Methods 0.000 description 3
- BPQQTUXANYXVAA-UHFFFAOYSA-N Orthosilicate Chemical compound [O-][Si]([O-])([O-])[O-] BPQQTUXANYXVAA-UHFFFAOYSA-N 0.000 description 1
- 230000009286 beneficial effect Effects 0.000 description 1
- 239000003638 chemical reducing agent Substances 0.000 description 1
- 238000000227 grinding Methods 0.000 description 1
- 239000007788 liquid Substances 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 238000000053 physical method Methods 0.000 description 1
- 238000005498 polishing Methods 0.000 description 1
- 239000000843 powder Substances 0.000 description 1
- 238000002360 preparation method Methods 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
Landscapes
- Surface Treatment Of Glass (AREA)
- Weting (AREA)
Abstract
The invention discloses a kind of efficient etching solution of TFT LCD displays base plate glass, the etching solution comprises the following raw materials by weight percent：Phosphatase 11 4 18%, fluorochemical 16 20%, nitric acid 9 14%, hydrofluoric acid 11 13%, potassium bichromate 16 20%, the concentrated sulfuric acid 7 15%, phosphate 6 10%, surfactant 8 10%, remaining be solvent.The etching solution of the present invention can fully contact with glass substrate and equably infiltrate into photoresist bottom, and basically identical to the etch-rate of different metal, stable reaction, the substrate surface after etching is clean and tidy, noresidue, lamination between no metal, and remaining lines are smooth；TFT LCD displays are dissolved with etching solution after glass substrate thinning to the precipitated impurities for being attached to glass baseplate surface simultaneously, glass baseplate surface impurity can effectively be removed, product qualification rate and yield can be improved, while control offer that can be to thickness of glass substrate is effectively ensured.
Description
Technical field
The present invention relates to TFT-LCD technical field, and in particular to a kind of TFT-LCD display screen substrates glass high-efficiency etching
Liquid.
Background technology
, it is necessary to use glass substrate in the preparation process of TFT-LCD display screens.Due to glass substrate production technology
Limitation, the glass substrate produced is thicker.In order to further mitigate the weight of display device, manufacturer more and more adopts
With glass substrate to be carried out to thinned method, therewith glass substrate be etched into for it is important the problem of.Usually used thinned side
Method has two kinds, and one kind is physical method, i.e., is polished grinding using polishing powder, and time length is thinned in this method, and precision is bad
Control, product yield are low；Another method is the chemical method for etching using etching solution, and this method thinned time is short, and equipment is thrown
Enter small, product yield height, and the simple cost of composition of reducer is low, has been increasingly becoming the mainstream technology side of thinning glass substrate
Method.The etching solution of prior art is very fast to the etch-rate of substrate, and etch quantity is not easily controlled, it is impossible to well to substrate thickness
It is controlled, what is had can not effectively dissolve silicate, and some meetings produce stronger ionization, generate excessive hydrofluoric acid, meeting
Etch-rate is caused to be difficult to control, etching solution can produce a large amount of bubbles sometimes, reduce etch-rate.
The content of the invention
The present invention is intended to provide a kind of TFT-LCD display screen substrates glass high-efficiency etching solution.
The present invention provides following technical scheme：
A kind of TFT-LCD display screen substrates glass high-efficiency etching solution, the etching solution by following percentage by weight raw material
Composition：Phosphatase 11 4-18%, fluorochemical 16-20%, nitric acid 9-14%, hydrofluoric acid 11-13%, potassium bichromate 16-20%,
Concentrated sulfuric acid 7-15%, phosphate 6-10%, surfactant 8-10%, remaining be solvent.
The fluorochemical is the mixture of calcirm-fluoride and sodium fluoride.
The surfactant is polyoxyethylene alkyl phenyl ether.
The solvent is the mixture of deionized water and ethanol.
It is no more than 100 more than 0.4 μm per 1000Kg granularities in the etching solution.
Compared with prior art, the beneficial effects of the invention are as follows：The etching solution of the present invention can be contacted fully with glass substrate
And photoresist bottom is equably infiltrated into, and, stable reaction basically identical to the etch-rate of different metal, the substrate table after etching
Face is clean and tidy, noresidue, lamination between no metal, and remaining lines are smooth；TFT-LCD display screens etching solution is in glass base simultaneously
The precipitated impurities for being attached to glass baseplate surface are dissolved after plate thinning, can effectively remove glass baseplate surface impurity,
Product qualification rate and yield can be improved, while control offer that can be to thickness of glass substrate is effectively ensured.
Embodiment
Below in conjunction with the embodiment of the present invention, the technical scheme in the embodiment of the present invention is clearly and completely described,
Obviously, described embodiment is only part of the embodiment of the present invention, rather than whole embodiments.Based in the present invention
Embodiment, the every other embodiment that those of ordinary skill in the art are obtained under the premise of creative work is not made, all
Belong to the scope of protection of the invention.
A kind of TFT-LCD display screen substrates glass high-efficiency etching solution of embodiment 1, the etching solution is by following percentage by weight
Raw material composition：Phosphatase 11 4%, fluorochemical 16%, nitric acid 9%, hydrofluoric acid 11%, potassium bichromate 16%, the concentrated sulfuric acid 7%,
Phosphate 6%, surfactant 8%, remaining be solvent.
The fluorochemical is the mixture of calcirm-fluoride and sodium fluoride.
The surfactant is polyoxyethylene alkyl phenyl ether.
The solvent is the mixture of deionized water and ethanol.
It is no more than 100 more than 0.4 μm per 1000Kg granularities in the etching solution.
A kind of TFT-LCD display screen substrates glass high-efficiency etching solution of embodiment 2, the etching solution is by following percentage by weight
Raw material composition：Phosphatase 11 8%, fluorochemical 20%, nitric acid 14%, hydrofluoric acid 13%, potassium bichromate 20%, the concentrated sulfuric acid
15%th, phosphate 10%, surfactant 10%, remaining be solvent.
The fluorochemical is the mixture of calcirm-fluoride and sodium fluoride.
The surfactant is polyoxyethylene alkyl phenyl ether.
The solvent is the mixture of deionized water and ethanol.
It is no more than 100 more than 0.4 μm per 1000Kg granularities in the etching solution.
A kind of TFT-LCD display screen substrates glass high-efficiency etching solution of embodiment 3, the etching solution is by following percentage by weight
Raw material composition：Phosphatase 11 6%, fluorochemical 18%, nitric acid 13%, hydrofluoric acid 12%, potassium bichromate 18%, the concentrated sulfuric acid
12%th, phosphate 8%, surfactant 9%, remaining be solvent.
The fluorochemical is the mixture of calcirm-fluoride and sodium fluoride.
The surfactant is polyoxyethylene alkyl phenyl ether.
The solvent is the mixture of deionized water and ethanol.
It is no more than 100 more than 0.4 μm per 1000Kg granularities in the etching solution.
It is obvious to a person skilled in the art that the invention is not restricted to the details of the one exemplary embodiment, Er Qie
In the case of without departing substantially from spirit or essential attributes of the invention, the present invention can be realized in other specific forms.Therefore, no matter
From the point of view of which point, embodiment all should be regarded as exemplary, and be nonrestrictive, the scope of the present invention is by appended power
Profit requires rather than the explanation limits, it is intended that all in the implication and scope of the equivalency of claim by falling
Change is included in the present invention.Moreover, it will be appreciated that although the present specification is described in terms of embodiments, not each
Embodiment only includes an independent technical scheme, and this narrating mode of specification is only this area for clarity
Technical staff should be using specification as an entirety, and the technical solutions in the various embodiments may also be suitably combined, forms this
The other embodiment that art personnel are appreciated that.
Claims (5)
1. a kind of TFT-LCD display screen substrates glass high-efficiency etching solution, it is characterised in that the etching solution is by following weight percent
The raw material composition of ratio：Phosphatase 11 4-18%, fluorochemical 16-20%, nitric acid 9-14%, hydrofluoric acid 11-13%, potassium bichromate
16-20%, concentrated sulfuric acid 7-15%, phosphate 6-10%, surfactant 8-10%, remaining be solvent.
A kind of 2. TFT-LCD display screen substrates glass high-efficiency etching solution according to claim 1, it is characterised in that：It is described
Fluorochemical is the mixture of calcirm-fluoride and sodium fluoride.
A kind of 3. TFT-LCD display screen substrates glass high-efficiency etching solution according to claim 1, it is characterised in that：It is described
Surfactant is polyoxyethylene alkyl phenyl ether.
A kind of 4. TFT-LCD display screen substrates glass high-efficiency etching solution according to claim 1, it is characterised in that：It is described
Solvent is the mixture of deionized water and ethanol.
A kind of 5. TFT-LCD display screen substrates glass high-efficiency etching solution according to claim 1, it is characterised in that：It is described
It is no more than 100 more than 0.4 μm per 1000Kg granularities in etching solution.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201710847589.2A CN107601912A (en) | 2017-09-19 | 2017-09-19 | A kind of efficient etching solution of TFT LCD displays base plate glass |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201710847589.2A CN107601912A (en) | 2017-09-19 | 2017-09-19 | A kind of efficient etching solution of TFT LCD displays base plate glass |
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| Publication Number | Publication Date |
|---|---|
| CN107601912A true CN107601912A (en) | 2018-01-19 |
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| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201710847589.2A Pending CN107601912A (en) | 2017-09-19 | 2017-09-19 | A kind of efficient etching solution of TFT LCD displays base plate glass |
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Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN108585530A (en) * | 2018-04-20 | 2018-09-28 | 广东红日星实业有限公司 | A kind of glass etching liquid and preparation method thereof |
Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN103903976A (en) * | 2012-12-26 | 2014-07-02 | 东友精细化工有限公司 | Etching composition used for preparing film transistor channel and channel manufacturing method |
| CN104445971A (en) * | 2014-11-24 | 2015-03-25 | 京东方科技集团股份有限公司 | Etching solution |
| CN105176533A (en) * | 2015-09-25 | 2015-12-23 | 江阴润玛电子材料股份有限公司 | ITO-Ag-ITO etching liquid for AM-OLED display screen and preparation method |
-
2017
- 2017-09-19 CN CN201710847589.2A patent/CN107601912A/en active Pending
Patent Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN103903976A (en) * | 2012-12-26 | 2014-07-02 | 东友精细化工有限公司 | Etching composition used for preparing film transistor channel and channel manufacturing method |
| CN104445971A (en) * | 2014-11-24 | 2015-03-25 | 京东方科技集团股份有限公司 | Etching solution |
| CN105176533A (en) * | 2015-09-25 | 2015-12-23 | 江阴润玛电子材料股份有限公司 | ITO-Ag-ITO etching liquid for AM-OLED display screen and preparation method |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN108585530A (en) * | 2018-04-20 | 2018-09-28 | 广东红日星实业有限公司 | A kind of glass etching liquid and preparation method thereof |
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| TA01 | Transfer of patent application right |
Effective date of registration: 20210114 Address after: 410000 No. 101, building B2, phase III, Changsha E center, south of Kangtian road and east of Xiangtai Road, Liuyang economic and Technological Development Zone, Changsha City, Hunan Province Applicant after: Changsha Huike Jinyang New display device Co., Ltd Address before: 230000 northeast corner of the intersection of Jiudingshan road and Kuihe Road, Xinzhan District, Hefei City, Anhui Province Applicant before: HEFEI HUIKE JINYANG TECHNOLOGY Co.,Ltd. |
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Application publication date: 20180119 |