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CN107313036A - A kind of method for carrying out chemical plating molybdenum in capacitance touch screen surfaces - Google Patents

A kind of method for carrying out chemical plating molybdenum in capacitance touch screen surfaces Download PDF

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Publication number
CN107313036A
CN107313036A CN201710462184.7A CN201710462184A CN107313036A CN 107313036 A CN107313036 A CN 107313036A CN 201710462184 A CN201710462184 A CN 201710462184A CN 107313036 A CN107313036 A CN 107313036A
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CN
China
Prior art keywords
chemical plating
glass
ito
touch screen
plating molybdenum
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
CN201710462184.7A
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Chinese (zh)
Inventor
白航空
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hefei Huike Precision Mould Co Ltd
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Hefei Huike Precision Mould Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hefei Huike Precision Mould Co Ltd filed Critical Hefei Huike Precision Mould Co Ltd
Priority to CN201710462184.7A priority Critical patent/CN107313036A/en
Publication of CN107313036A publication Critical patent/CN107313036A/en
Pending legal-status Critical Current

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Classifications

    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C18/00Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
    • C23C18/16Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by reduction or substitution, e.g. electroless plating
    • C23C18/52Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by reduction or substitution, e.g. electroless plating using reducing agents for coating with metallic material not provided for in a single one of groups C23C18/32 - C23C18/50
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C18/00Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
    • C23C18/16Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by reduction or substitution, e.g. electroless plating
    • C23C18/18Pretreatment of the material to be coated
    • C23C18/1851Pretreatment of the material to be coated of surfaces of non-metallic or semiconducting in organic material
    • C23C18/1872Pretreatment of the material to be coated of surfaces of non-metallic or semiconducting in organic material by chemical pretreatment
    • C23C18/1886Multistep pretreatment
    • C23C18/1889Multistep pretreatment with use of metal first
    • GPHYSICS
    • G06COMPUTING OR CALCULATING; COUNTING
    • G06FELECTRIC DIGITAL DATA PROCESSING
    • G06F3/00Input arrangements for transferring data to be processed into a form capable of being handled by the computer; Output arrangements for transferring data from processing unit to output unit, e.g. interface arrangements
    • G06F3/01Input arrangements or combined input and output arrangements for interaction between user and computer
    • G06F3/03Arrangements for converting the position or the displacement of a member into a coded form
    • G06F3/041Digitisers, e.g. for touch screens or touch pads, characterised by the transducing means
    • G06F3/044Digitisers, e.g. for touch screens or touch pads, characterised by the transducing means by capacitive means
    • GPHYSICS
    • G06COMPUTING OR CALCULATING; COUNTING
    • G06FELECTRIC DIGITAL DATA PROCESSING
    • G06F2203/00Indexing scheme relating to G06F3/00 - G06F3/048
    • G06F2203/041Indexing scheme relating to G06F3/041 - G06F3/045
    • G06F2203/04103Manufacturing, i.e. details related to manufacturing processes specially suited for touch sensitive devices

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  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Theoretical Computer Science (AREA)
  • General Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • General Engineering & Computer Science (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Human Computer Interaction (AREA)
  • Chemically Coating (AREA)

Abstract

The invention discloses a kind of method for carrying out chemical plating molybdenum in capacitance touch screen surfaces, comprise the following steps:(1) after carrying out ITO sputters on the surface of capacitive touch screen glass substrate, two-sided ito glass is become, ito glass is put into 1mol/L alkalies and carries out impregnation process, temperature is 50 DEG C, time is 2 4min, and hot water and each 2min of cold water wash are then used respectively;(2) above-mentioned ito glass is put into 5mol/L hydrochloric acid and be etched, the time is 3 5min, then washing rinsing 2 times, every time 2 3min;(3) the ito thin film glass after etching processing is placed in activator and carries out activation process, the time is 2 4min, then washing 2 times, every time 6 min;(4) ito glass for obtaining activation process carries out reduction treatment, and the ito thin film glass after reduction then is put into progress chemical plating molybdenum in chemical plating fluid, and the ito glass after chemical plating molybdenum is placed in 120 150 DEG C of oven for baking 30min.

Description

A kind of method for carrying out chemical plating molybdenum in capacitance touch screen surfaces
Technical field
The present invention relates to display screen technology field, and in particular to a kind of to carry out chemical plating molybdenum in capacitance touch screen surfaces Method.
Background technology
Touch screen technology is divided into resistance-type, surface capacitance type, projected capacitive, surface acoustic wave type and infrared-type, wherein, Capacitive touch screen is widely used in mobile device and consumption electronic product.Touch screen technology facilitates behaviour of the people to computer Use, be a kind of extremely promising interactive input technology, thus by the most attention of various countries, and put into substantial amounts of Human and material resources are researched and developed to it, and novel touch screen is continued to bring out.
Tin-doped indium oxide (Indium Tin Oxide, abbreviation ITO) film is a kind of semi-conducting material, with excellent light Electrical characteristics and electric conductivity, are widely used in terms of touch screen technology.Enter in capacitive touch screen glass baseplate surface After row ITO sputters, two-sided ito glass is become, the ITO wires by its four sides edge are not needed in the ito film of the same face Connection, in order to reduce control chip input impedance limitation, must just reduce the ITO resistance at edge, and in ITO communication conductive wire overlyings Lid layer of metal nickel dam is used to substantially reduce its resistance.
The content of the invention
The present invention is intended to provide a kind of method for carrying out chemical plating molybdenum in capacitance touch screen surfaces.
The present invention provides following technical scheme:
A kind of method for carrying out chemical plating molybdenum in capacitance touch screen surfaces, it is characterised in that comprise the following steps:
(1) after carrying out ITO sputters on the surface of capacitive touch screen glass substrate, two-sided ito glass is become, will Ito glass, which is put into 1mol/L alkalies, carries out impregnation process, and temperature is 50 DEG C, and the time is 2-4min, then respectively with heat Water and each 2min of cold water wash;
(2) above-mentioned ito glass is put into 5mol/L hydrochloric acid and be etched, the time is 3-5min, is then washed Rinsing 2 times, each 2-3min;
(3) the ito thin film glass after etching processing is placed in activator and carries out activation process, the time is 2-4min, so Wash 2 times afterwards, each 6-min;
(4) ito glass for obtaining activation process carries out reduction treatment, is then put into the ito thin film glass after reduction Chemical plating molybdenum is carried out in chemical plating fluid, the ito glass after chemical plating molybdenum is placed in 120-150 DEG C of oven for baking 30min, institute Stating chemical plating fluid includes following component:MoSO4·6H2O 23g/L、Mo(CH3COO)2 6g/L、NaH2PO2·H2O 18g/L、 Hydroxy acid sodium 20g/L, succinic acid 12g/L, deionized water.
Step (1) the neutral and alkali liquid includes following component:20g/L NaHCO3,16g/L KOH, 20g/L's Na3PO4 and 4g/L APES, deionized water.
By mass percentage, its composition is specifically included the plating molybdenum diaphragm:42-54% vinyl acetate resin derives Thing, 18-20% fatty acid ester, 10-20% epoxy fat, 3-5% polymeric flame-retardant agent, 4-6% thixotropic agent, 1-3% The defrother of organic pigment, 5-8%.
Activator is prepared as follows in the step (3):PdCl2, deionized water and concentrated hydrochloric acid are mixed, 50 Heated at DEG C, obtain H2PdCl4 solution;Diethylenetriamines is added into the H2PdCl4 solution, 4h is kept at 50 DEG C, It is evaporated off obtaining palladium compound after solvent;The palladium compound is dissolved in obtained in 1-METHYLPYRROLIDONE palladium compound NMP it is molten Liquid, then the nmp solution of the palladium compound is mixed, activated with diethylene glycol monoethyl ether, diglycidyl ether butane Agent.
Chemical plating molybdenum is specially that ito glass is placed in into metallic stabilizer is that lead, pH 4-5, temperature are in the step (4) 50-100 DEG C, epithelium stress for ± 0 without chemical plating molybdenum is carried out in sodium plating bath, afterwards by the two-sided ITO glass of chemical plating molybdenum Glass is placed in progress chemical plating molybdenum in pH 3-5, the cyanide plating bath of 80 DEG C of temperature after two minutes wash.
Compared with prior art, the beneficial effects of the invention are as follows:The present invention is activated by activator, it is to avoid in change Learn and be not required to be coated with conductive materials at plating molybdenum between electrode and electrode in plating molybdenum step, so as to ensure that with good plating molybdenum effect Really;It is to be resistant to the diaphragm that strong acid, high temperature resistant, molybdenum particle can not adhere to by plating molybdenum diaphragm, conduction can be completely eliminated in it The presence in area, so that ito glass instream factor is substantially increased, simultaneously because in the absence of conduction region, therefore plate the use of molybdenum liquid Amount reduction so that cost is reduced.
Embodiment
Below in conjunction with the embodiment of the present invention, the technical scheme in the embodiment of the present invention is clearly and completely described, Obviously, described embodiment is only a part of embodiment of the invention, rather than whole embodiments.Based in the present invention Embodiment, the every other embodiment that those of ordinary skill in the art are obtained under the premise of creative work is not made, all Belong to the scope of protection of the invention.
A kind of method for carrying out chemical plating molybdenum in capacitance touch screen surfaces of embodiment, it is characterised in that including following step Suddenly:
(1) after carrying out ITO sputters on the surface of capacitive touch screen glass substrate, two-sided ito glass is become, will Ito glass, which is put into 1mol/L alkalies, carries out impregnation process, and temperature is 50 DEG C, and the time is 2-4min, then respectively with heat Water and each 2min of cold water wash;
(2) above-mentioned ito glass is put into 5mol/L hydrochloric acid and be etched, the time is 3-5min, is then washed Rinsing 2 times, each 2-3min;
(3) the ito thin film glass after etching processing is placed in activator and carries out activation process, the time is 2-4min, so Wash 2 times afterwards, each 6-min;
(4) ito glass for obtaining activation process carries out reduction treatment, is then put into the ito thin film glass after reduction Chemical plating molybdenum is carried out in chemical plating fluid, the ito glass after chemical plating molybdenum is placed in 120-150 DEG C of oven for baking 30min, institute Stating chemical plating fluid includes following component:MoSO4·6H2O 23g/L、Mo(CH3COO)2 6g/L、NaH2PO2·H2O 18g/L、 Hydroxy acid sodium 20g/L, succinic acid 12g/L, deionized water.
Step (1) the neutral and alkali liquid includes following component:20g/L NaHCO3,16g/L KOH, 20g/L's Na3PO4 and 4g/L APES, deionized water.
By mass percentage, its composition is specifically included the plating molybdenum diaphragm:42-54% vinyl acetate resin derives Thing, 18-20% fatty acid ester, 10-20% epoxy fat, 3-5% polymeric flame-retardant agent, 4-6% thixotropic agent, 1-3% The defrother of organic pigment, 5-8%.
Activator is prepared as follows in the step (3):PdCl2, deionized water and concentrated hydrochloric acid are mixed, 50 Heated at DEG C, obtain H2PdCl4 solution;Diethylenetriamines is added into the H2PdCl4 solution, 4h is kept at 50 DEG C, It is evaporated off obtaining palladium compound after solvent;The palladium compound is dissolved in obtained in 1-METHYLPYRROLIDONE palladium compound NMP it is molten Liquid, then the nmp solution of the palladium compound is mixed, activated with diethylene glycol monoethyl ether, diglycidyl ether butane Agent.
Chemical plating molybdenum is specially that ito glass is placed in into metallic stabilizer is that lead, pH 4-5, temperature are in the step (4) 50-100 DEG C, epithelium stress for ± 0 without chemical plating molybdenum is carried out in sodium plating bath, afterwards by the two-sided ITO glass of chemical plating molybdenum Glass is placed in progress chemical plating molybdenum in pH 3-5, the cyanide plating bath of 80 DEG C of temperature after two minutes wash.
It is obvious to a person skilled in the art that the invention is not restricted to the details of the one exemplary embodiment, Er Qie In the case of without departing substantially from spirit or essential attributes of the invention, the present invention can be realized in other specific forms.Therefore, no matter From the point of view of which point, embodiment all should be regarded as exemplary, and be nonrestrictive, the scope of the present invention is by appended power Profit is required rather than the explanation is limited, it is intended that all in the implication and scope of the equivalency of claim by falling Change is included in the present invention.Although not each moreover, it will be appreciated that the present specification is described in terms of embodiments Embodiment is only comprising an independent technical scheme, and this narrating mode of specification is only this area for clarity Technical staff should be using specification as an entirety, and the technical solutions in the various embodiments may also be suitably combined, forms this Art personnel may be appreciated other embodiment.

Claims (5)

1. a kind of method for carrying out chemical plating molybdenum in capacitance touch screen surfaces, it is characterised in that comprise the following steps:
(1) after carrying out ITO sputters on the surface of capacitive touch screen glass substrate, two-sided ito glass is become, by ITO glass Glass, which is put into 1mol/L alkalies, carries out impregnation process, and temperature is 50 DEG C, and the time is 2-4min, hot water is then used respectively and cold Water cleans each 2min;
(2) above-mentioned ito glass is put into 5mol/L hydrochloric acid and be etched, the time is 3-5min, then washing rinsing 2 It is secondary, each 2-3min;
(3) the ito thin film glass after etching processing is placed in activator and carries out activation process, the time is 2-4min, Ran Houshui Wash 2 times, each 6-min;
(4) ito glass for obtaining activation process carries out reduction treatment, and the ito thin film glass after reduction then is put into chemistry Chemical plating molybdenum is carried out in plating solution, the ito glass after chemical plating molybdenum is placed in 120-150 DEG C of oven for baking 30min, describedization Learning plating solution includes following component:MoSO46H2O 23g/L, Mo (CH3COO) 2 6g/L, NaH2PO2H2O 18g/L, hydroxyl Sodium acetate 20g/L, succinic acid 12g/L, deionized water.
2. a kind of method for carrying out chemical plating molybdenum in capacitance touch screen surfaces according to claim 1, it is characterised in that: Step (1) the neutral and alkali liquid includes following component:20g/L NaHCO3,16g/L KOH, 20g/L Na3PO4 and 4g/L APES, deionized water.
3. a kind of method for carrying out chemical plating molybdenum in capacitance touch screen surfaces according to claim 1, it is characterised in that: By mass percentage, its composition is specifically included the plating molybdenum diaphragm:42-54% vinyl acetate resin derivative, 18-20% Fatty acid ester, 10-20% epoxy fat, 3-5% polymeric flame-retardant agent, 4-6% thixotropic agent, 1-3% organic pigment, 5- 8% defrother.
4. a kind of method for carrying out chemical plating molybdenum in capacitance touch screen surfaces according to claim 1, it is characterised in that: Activator is prepared as follows in the step (3):PdCl2, deionized water and concentrated hydrochloric acid are mixed, added at 50 DEG C Heat, obtains H2PdCl4 solution;Diethylenetriamines is added into the H2PdCl4 solution, 4h is kept at 50 DEG C, is evaporated off molten Palladium compound is obtained after agent;The palladium compound is dissolved in the nmp solution that palladium compound is obtained in 1-METHYLPYRROLIDONE, then The nmp solution of the palladium compound is mixed with diethylene glycol monoethyl ether, diglycidyl ether butane, activator is obtained.
5. a kind of method for carrying out chemical plating molybdenum in capacitance touch screen surfaces according to claim 1, it is characterised in that: In the step (4) chemical plating molybdenum be specially by ito glass be placed in metallic stabilizer be lead, pH 4-5, temperature be 50-100 DEG C, The two-sided ito glass of chemical plating molybdenum, without chemical plating molybdenum is carried out in sodium plating bath, is passed through two points by epithelium stress afterwards for ± 0 After clock washing, progress chemical plating molybdenum in pH 3-5, the cyanide plating bath of 80 DEG C of temperature is placed in.
CN201710462184.7A 2017-06-19 2017-06-19 A kind of method for carrying out chemical plating molybdenum in capacitance touch screen surfaces Pending CN107313036A (en)

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CN201710462184.7A CN107313036A (en) 2017-06-19 2017-06-19 A kind of method for carrying out chemical plating molybdenum in capacitance touch screen surfaces

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CN201710462184.7A CN107313036A (en) 2017-06-19 2017-06-19 A kind of method for carrying out chemical plating molybdenum in capacitance touch screen surfaces

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Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN108539055A (en) * 2018-04-19 2018-09-14 信利半导体有限公司 A kind of production method and OLED products of OLED products

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN101845625A (en) * 2010-06-01 2010-09-29 无锡阿尔法电子科技有限公司 Method for chemically plating gold on surface of capacitive touch screen
CN104445997A (en) * 2014-09-09 2015-03-25 福建省飞阳光电有限公司 Method for performing chemical nickel plating on surface of capacitive touch screen

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN101845625A (en) * 2010-06-01 2010-09-29 无锡阿尔法电子科技有限公司 Method for chemically plating gold on surface of capacitive touch screen
CN104445997A (en) * 2014-09-09 2015-03-25 福建省飞阳光电有限公司 Method for performing chemical nickel plating on surface of capacitive touch screen

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN108539055A (en) * 2018-04-19 2018-09-14 信利半导体有限公司 A kind of production method and OLED products of OLED products
CN108539055B (en) * 2018-04-19 2019-10-08 信利半导体有限公司 A kind of production method and OLED product of OLED product

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Application publication date: 20171103