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CN107316819A - Chip package and chip packaging process - Google Patents

Chip package and chip packaging process Download PDF

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Publication number
CN107316819A
CN107316819A CN201610471869.3A CN201610471869A CN107316819A CN 107316819 A CN107316819 A CN 107316819A CN 201610471869 A CN201610471869 A CN 201610471869A CN 107316819 A CN107316819 A CN 107316819A
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Prior art keywords
chip
carrier plate
line carrier
conductive
packing colloid
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陈宪章
黄东鸿
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Chipmos Technologies Inc
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Chipmos Technologies Inc
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    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L24/00Arrangements for connecting or disconnecting semiconductor or solid-state bodies; Methods or apparatus related thereto
    • H01L24/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L24/10Bump connectors ; Manufacturing methods related thereto
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/04Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
    • H01L21/50Assembly of semiconductor devices using processes or apparatus not provided for in a single one of the groups H01L21/18 - H01L21/326 or H10D48/04 - H10D48/07 e.g. sealing of a cap to a base of a container
    • H01L21/56Encapsulations, e.g. encapsulation layers, coatings
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L23/00Details of semiconductor or other solid state devices
    • H01L23/28Encapsulations, e.g. encapsulating layers, coatings, e.g. for protection
    • H01L23/31Encapsulations, e.g. encapsulating layers, coatings, e.g. for protection characterised by the arrangement or shape
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L23/00Details of semiconductor or other solid state devices
    • H01L23/28Encapsulations, e.g. encapsulating layers, coatings, e.g. for protection
    • H01L23/31Encapsulations, e.g. encapsulating layers, coatings, e.g. for protection characterised by the arrangement or shape
    • H01L23/3107Encapsulations, e.g. encapsulating layers, coatings, e.g. for protection characterised by the arrangement or shape the device being completely enclosed
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L23/00Details of semiconductor or other solid state devices
    • H01L23/48Arrangements for conducting electric current to or from the solid state body in operation, e.g. leads, terminal arrangements ; Selection of materials therefor
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L23/00Details of semiconductor or other solid state devices
    • H01L23/48Arrangements for conducting electric current to or from the solid state body in operation, e.g. leads, terminal arrangements ; Selection of materials therefor
    • H01L23/488Arrangements for conducting electric current to or from the solid state body in operation, e.g. leads, terminal arrangements ; Selection of materials therefor consisting of soldered or bonded constructions
    • H01L23/498Leads, i.e. metallisations or lead-frames on insulating substrates, e.g. chip carriers
    • H01L23/49811Additional leads joined to the metallisation on the insulating substrate, e.g. pins, bumps, wires, flat leads
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L23/00Details of semiconductor or other solid state devices
    • H01L23/52Arrangements for conducting electric current within the device in operation from one component to another, i.e. interconnections, e.g. wires, lead frames
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L24/00Arrangements for connecting or disconnecting semiconductor or solid-state bodies; Methods or apparatus related thereto
    • H01L24/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L24/10Bump connectors ; Manufacturing methods related thereto
    • H01L24/11Manufacturing methods
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/10Bump connectors; Manufacturing methods related thereto
    • H01L2224/12Structure, shape, material or disposition of the bump connectors prior to the connecting process
    • H01L2224/12105Bump connectors formed on an encapsulation of the semiconductor or solid-state body, e.g. bumps on chip-scale packages
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/42Wire connectors; Manufacturing methods related thereto
    • H01L2224/47Structure, shape, material or disposition of the wire connectors after the connecting process
    • H01L2224/48Structure, shape, material or disposition of the wire connectors after the connecting process of an individual wire connector
    • H01L2224/4805Shape
    • H01L2224/4809Loop shape
    • H01L2224/48091Arched
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/42Wire connectors; Manufacturing methods related thereto
    • H01L2224/47Structure, shape, material or disposition of the wire connectors after the connecting process
    • H01L2224/48Structure, shape, material or disposition of the wire connectors after the connecting process of an individual wire connector
    • H01L2224/481Disposition
    • H01L2224/48151Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive
    • H01L2224/48221Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked
    • H01L2224/48225Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked the item being non-metallic, e.g. insulating substrate with or without metallisation
    • H01L2224/48227Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked the item being non-metallic, e.g. insulating substrate with or without metallisation connecting the wire to a bond pad of the item
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/42Wire connectors; Manufacturing methods related thereto
    • H01L2224/47Structure, shape, material or disposition of the wire connectors after the connecting process
    • H01L2224/48Structure, shape, material or disposition of the wire connectors after the connecting process of an individual wire connector
    • H01L2224/481Disposition
    • H01L2224/48151Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive
    • H01L2224/48221Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked
    • H01L2224/48225Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked the item being non-metallic, e.g. insulating substrate with or without metallisation
    • H01L2224/48227Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked the item being non-metallic, e.g. insulating substrate with or without metallisation connecting the wire to a bond pad of the item
    • H01L2224/48228Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked the item being non-metallic, e.g. insulating substrate with or without metallisation connecting the wire to a bond pad of the item the bond pad being disposed in a recess of the surface of the item
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/15Details of package parts other than the semiconductor or other solid state devices to be connected
    • H01L2924/151Die mounting substrate
    • H01L2924/153Connection portion
    • H01L2924/1531Connection portion the connection portion being formed only on the surface of the substrate opposite to the die mounting surface
    • H01L2924/15311Connection portion the connection portion being formed only on the surface of the substrate opposite to the die mounting surface being a ball array, e.g. BGA
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/30Technical effects
    • H01L2924/301Electrical effects
    • H01L2924/3025Electromagnetic shielding

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  • Engineering & Computer Science (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Encapsulation Of And Coatings For Semiconductor Or Solid State Devices (AREA)
  • Structures Or Materials For Encapsulating Or Coating Semiconductor Devices Or Solid State Devices (AREA)

Abstract

The invention provides a chip packaging body and a chip packaging process, which comprises the following steps: the circuit board comprises a circuit carrier plate with a conductive column, a chip, a packaging colloid, a conductive layer and a plurality of external terminals. The packaging colloid is arranged on the circuit carrier plate and covers the chip and the conductive columns. The top surfaces of the conductive posts are exposed outside the packaging adhesive and are arranged on the circuit carrier plate. The chip is disposed on the circuit carrier, and the circuit carrier is electrically connected to the chip through at least one bonding wire. The external terminal is located on the circuit carrier plate, is located on the different side of the circuit carrier plate with the chip, and is electrically connected with the chip through the circuit carrier plate. The packaging colloid is provided with a conductive layer, and the conductive layer is connected with the top surface of the conductive column, so that the conductive layer is electrically connected with the circuit carrier plate and the chip through the conductive column. In summary, the technical solution of the present invention can improve the packaging yield of the chip packaging process.

Description

芯片封装体及芯片封装制程Chip package and chip packaging process

技术领域technical field

本发明是有关于一种芯片封装体及芯片封装制程,且特别是有关于一种具有导电柱的芯片封装体及芯片封装制程。The present invention relates to a chip package and a chip package process, and in particular to a chip package with conductive pillars and a chip package process.

背景技术Background technique

在半导体产业中,积体电路(Integrated Circuits,IC)的生产,主要分为三个阶段:晶圆(wafer)的制造、积体电路的制作以及芯片的封装(Package)等。其中,芯片系经由晶圆制作、电路设计、光罩制作、电路制作以及切割晶圆等步骤而完成,而每一颗由晶圆切割所形成的芯片,在经由芯片上的接点与外部信号电性连接后,可再以封装胶体材料将芯片包覆,其封装的目的在于防止芯片受到湿气、热量、噪声的影响,并提供芯片与外部电路之间电性连接的媒介,如此即完成积体电路的生产。In the semiconductor industry, the production of integrated circuits (Integrated Circuits, IC) is mainly divided into three stages: the manufacture of wafers, the manufacture of integrated circuits, and the packaging of chips. Among them, the chip is completed through the steps of wafer fabrication, circuit design, photomask fabrication, circuit fabrication, and wafer cutting. After the electrical connection, the chip can be covered with encapsulation colloid material. The purpose of the encapsulation is to prevent the chip from being affected by moisture, heat, and noise, and to provide a medium for electrical connection between the chip and the external circuit, thus completing the integrated circuit. Production of body circuits.

在通讯元件的制造过程中,在以封装胶体将通讯芯片包覆之后,须进一步制作外部天线,此外部天线的制作包括形成外部天线本身以及连接于外部天线与通讯芯片之间的接触导体。一般而言,前述的接触导体通常是在封装胶体制作完成之后以激光钻孔搭配导电材料的填入进行制作。In the manufacturing process of communication components, after the communication chip is coated with encapsulant, the external antenna must be further fabricated. The production of the external antenna includes forming the external antenna itself and the contact conductor connected between the external antenna and the communication chip. Generally speaking, the above-mentioned contact conductor is usually fabricated by laser drilling and filling of conductive material after the encapsulant is fabricated.

然而,因为封装胶体过厚且激光的能量不易控制,所以以激光钻孔方式于封装胶体中形成接触开口面临了制程裕度(process window)不足的问题。因此,外部天线与通讯芯片之间的电性连接有可能会出现开路或电气特性不佳等问题,进而导致通讯元件的封装良率无法有效被提升。因此,如何进一步提升通讯元件的封装良率,实已成目前亟欲解决的课题。However, since the encapsulant is too thick and the energy of the laser is difficult to control, forming contact openings in the encapsulant by laser drilling faces the problem of insufficient process window. Therefore, problems such as open circuits or poor electrical characteristics may occur in the electrical connection between the external antenna and the communication chip, which leads to the failure to effectively improve the packaging yield of the communication components. Therefore, how to further improve the packaging yield of communication components has become an urgent problem to be solved.

发明内容Contents of the invention

本发明提供多种芯片封装体以及多种芯片封装制程。The invention provides various chip packaging bodies and various chip packaging processes.

本发明提供一种芯片封装制程,其包括下列步骤。提供线路载板,此线路载板上具有导电柱。将芯片置于线路载板上,其中芯片通过至少一焊线与线路载板电性连接。在线路载板上形成封装胶体,以包覆芯片及导电柱。移除部分的封装胶体,以暴露出导电柱的顶面。在封装胶体上形成与导电柱顶面连接的导电层,此导电层通过线路载板与芯片电性连接。在线路载板上形成多个外部端子,此外部端子与芯片在线路载板的不同侧的,且外部端子通过线路载板与芯片电性连接。The invention provides a chip packaging process, which includes the following steps. A circuit carrier is provided with conductive posts. The chip is placed on the circuit carrier, wherein the chip is electrically connected to the circuit carrier through at least one bonding wire. An encapsulant is formed on the circuit carrier to cover the chip and the conductive column. Part of the encapsulant is removed to expose the top surface of the conductive pillar. A conductive layer connected to the top surface of the conductive column is formed on the encapsulant, and the conductive layer is electrically connected to the chip through the circuit carrier. A plurality of external terminals are formed on the circuit carrier, the external terminals and the chip are on different sides of the circuit carrier, and the external terminals are electrically connected to the chip through the circuit carrier.

本发明提供一种芯片封装体,其包括线路载板、芯片、封装胶体、导电层以及多个外部端子。线路载板具有导电柱。芯片配置在线路载板上,并且通过至少一焊线与线路载板电性连接。封装胶体配置在线路载板上,其中封装胶体包覆芯片及导电柱,且导电柱的顶面暴露于封装胶体外。导电层配置在封装胶体上以与导电柱的顶面连接,其中导电层通过线路载板与芯片电性连接。外部端子与芯片位于线路载板的不同侧,且外部端子通过线路载板与芯片电性连接。The invention provides a chip packaging body, which includes a circuit carrier, a chip, packaging glue, a conductive layer and a plurality of external terminals. The circuit carrier has conductive pillars. The chip is arranged on the circuit carrier and is electrically connected with the circuit carrier through at least one bonding wire. The packaging colloid is arranged on the circuit carrier, wherein the packaging colloid covers the chip and the conductive column, and the top surface of the conductive column is exposed outside the packaging colloid. The conductive layer is disposed on the encapsulant to be connected to the top surface of the conductive pillar, wherein the conductive layer is electrically connected to the chip through the circuit carrier. The external terminals and the chip are located on different sides of the circuit carrier, and the external terminals are electrically connected to the chip through the circuit carrier.

在本发明的一实施例中,移除部分的封装胶体的方法包括研磨。In an embodiment of the invention, the method for removing part of the encapsulant includes grinding.

在本发明的一实施例中,形成导电层的方法包括电镀。In an embodiment of the invention, the method for forming the conductive layer includes electroplating.

在本发明的一实施例中,导电柱与芯片位于线路载板的同侧,且导电柱的高度大于芯片的厚度。In an embodiment of the present invention, the conductive pillar and the chip are located on the same side of the circuit carrier, and the height of the conductive pillar is greater than the thickness of the chip.

本发明提供另一种芯片封装制程,其包括下列步骤。提供线路载板,此线路载板上具有导电柱。将芯片置于线路载板,其中芯片通过至少一焊线与线路载板电性连接。在线路载板上形成封装胶体,以包覆芯片及导电柱。移除部分的封装胶体,以在封装胶体内形成开口,且此开口暴露出导电柱的顶面。在开口中填入接触导体。在封装胶体上形成与接触导体顶面连接的导电层,此导电层通过接触导体及线路载板与芯片电性连接。The present invention provides another chip packaging process, which includes the following steps. A circuit carrier is provided with conductive posts. The chip is placed on the circuit carrier, wherein the chip is electrically connected to the circuit carrier through at least one bonding wire. An encapsulant is formed on the circuit carrier to cover the chip and the conductive column. Part of the encapsulant is removed to form an opening in the encapsulant, and the opening exposes the top surface of the conductive pillar. Fill the opening with a contact conductor. A conductive layer connected to the top surface of the contact conductor is formed on the encapsulant, and the conductive layer is electrically connected to the chip through the contact conductor and the circuit carrier.

本发明提供另一种芯片封装体,其包括线路载板、接触导体、芯片、封装胶体、导电层以及多个外部端子。线路载板具有导电柱。接触导体配置在导电柱上。芯片配置在线路载板上,并且与线路载板电性连接。封装胶体配置在线路载板上,其中封装胶体包覆芯片、导电柱及接触导体,且接触导体的顶面暴露在封装胶体外。导电层配置在封装胶体上以与接触导体的顶面连接,其中导电层通过接触导体及线路载板与芯片电性连接。外部端子与芯片位于线路载板的不同侧,且外部端子通过线路载板与芯片电性连接。The invention provides another chip package, which includes a circuit carrier, a contact conductor, a chip, an encapsulant, a conductive layer and a plurality of external terminals. The circuit carrier has conductive pillars. The contact conductor is arranged on the conductive column. The chip is configured on the circuit carrier and electrically connected with the circuit carrier. The packaging colloid is arranged on the circuit carrier, wherein the packaging colloid covers the chip, the conductive column and the contact conductor, and the top surface of the contact conductor is exposed outside the packaging colloid. The conductive layer is disposed on the encapsulant to be connected to the top surface of the contact conductor, wherein the conductive layer is electrically connected to the chip through the contact conductor and the circuit carrier. The external terminals and the chip are located on different sides of the circuit carrier, and the external terminals are electrically connected to the chip through the circuit carrier.

在本发明的另一实施例中,移除部分的封装胶体以在封装胶体内形成开口的方法包括激光钻孔。In another embodiment of the present invention, the method for removing part of the encapsulant to form an opening in the encapsulant includes laser drilling.

在本发明的另一实施例中,形成导电层的方法包括电镀。In another embodiment of the present invention, the method of forming the conductive layer includes electroplating.

在本发明的另一实施例中,还包括于线路载板上形成多个外部端子,其中外部端子与芯片位于线路载板的不同侧,且外部端子通过线路载板与芯片电性连接。In another embodiment of the present invention, a plurality of external terminals are formed on the circuit carrier, wherein the external terminals and the chip are located on different sides of the circuit carrier, and the external terminals are electrically connected to the chip through the circuit carrier.

在本发明的另一实施例中,导电柱、接触导体与芯片位于线路载板的同侧。In another embodiment of the present invention, the conductive post, the contact conductor and the chip are located on the same side of the circuit carrier.

基于上述,本发明上述实施例在形成封装胶体之前先在线路载板上形成导电柱,此制程顺序可以提升芯片封装制程的封装良率。此外,由于导电柱的制作早于封装胶体的形成,因此封装胶体的厚度不会影响到导电柱的制作良率。Based on the above, the above embodiments of the present invention form the conductive pillars on the circuit carrier before forming the encapsulant. This process sequence can improve the encapsulation yield of the chip encapsulation process. In addition, since the fabrication of the conductive pillars is earlier than the formation of the encapsulant, the thickness of the encapsulant will not affect the yield of the conductive pillars.

为让本发明的上述特征和优点能更明显易懂,下文特举实施例,并配合附图作详细说明如下。In order to make the above-mentioned features and advantages of the present invention more comprehensible, the following specific embodiments are described in detail with reference to the accompanying drawings.

附图说明Description of drawings

图1A至图1D是依照本发明第一实施例的一种芯片封装体的制造流程示意图;1A to 1D are schematic diagrams of the manufacturing process of a chip package according to the first embodiment of the present invention;

图1D是依照本发明第一实施例的芯片封装体的剖面示意图;1D is a schematic cross-sectional view of a chip package according to the first embodiment of the present invention;

图2A至图2D是依照本发明第二实施例的一种芯片封装体的制造流程示意图;2A to 2D are schematic diagrams of the manufacturing process of a chip package according to the second embodiment of the present invention;

图2D是依照本发明第二实施例的芯片封装体的剖面示意图。2D is a schematic cross-sectional view of a chip package according to a second embodiment of the present invention.

附图标记说明:Explanation of reference signs:

200、200’:芯片封装体;200, 200': chip package;

210:线路载板;210: circuit carrier board;

210a:第一表面;210a: first surface;

210b:第二表面;210b: second surface;

S1、S2:表面;S1, S2: surface;

212a:第一接垫;212a: first pad;

212b:第二接垫;212b: second pad;

214a:第一防焊层;214a: the first solder mask layer;

214b:第二防焊层;214b: the second solder mask layer;

C:导体;C: conductor;

216:外部端子;216: external terminal;

220、220’:导电柱;220, 220': conductive column;

H、H’:高度;H, H': height;

220a:顶面;220a: top surface;

230:芯片;230: chip;

240:焊线;240: welding wire;

250、250’、251:封装胶体;250, 250', 251: encapsulation colloid;

252:接触开口;252: contact opening;

T1、T2、T3:厚度;T1, T2, T3: thickness;

260:接触导体;260: contact conductor;

260a:顶面;260a: top surface;

270:导电层。270: Conductive layer.

具体实施方式detailed description

图1A至图1D是依照本发明第一实施例的一种芯片封装体的制造流程示意图。首先,请参照图1A,提供已形成有导电柱220的线路载板210,其中线路载板210具有第一表面210a以及第二表面210b,且导电柱220位于线路载板210的第一表面210a上。具体而言,线路载板210包括核心层212、导体C、第一接垫212a、第二接垫212b、第一防焊层214a以及第二防焊层214b,其中核心层212为硬质或可挠性的介电材料,第一接垫212a与第二接垫212b分别位于核心层212的二相对表面S1、S2上,且第一接垫212a分别与通过嵌于核心层212中的导体C与对应的第二接垫212b电性连接。第一防焊层214a与第二防焊层214b分别覆盖在核心层212的二相对表面S1、S2上,并暴露出第一接垫212a与第二接垫212b。在一实施例中,导电柱220位于线路载板210的核心层212的表面S1上,且导电柱220例如是嵌于第一防焊层214a中。然而,本发明不限定导电柱220必须嵌于第一防焊层214a中。换言之,在其他实施例中,导电柱220可以是配置在线路载板210(即第一防焊层214a)的第一表面210a上。或者,导电柱220除了可嵌于第一防焊层214a中,还可进一步嵌于或延伸至核心层212中。1A to 1D are schematic diagrams of a manufacturing process of a chip package according to a first embodiment of the present invention. First, please refer to FIG. 1A , there is provided a circuit carrier 210 formed with conductive pillars 220, wherein the circuit carrier 210 has a first surface 210a and a second surface 210b, and the conductive pillars 220 are located on the first surface 210a of the circuit carrier 210. superior. Specifically, the circuit carrier 210 includes a core layer 212, a conductor C, a first pad 212a, a second pad 212b, a first solder resist layer 214a and a second solder resist layer 214b, wherein the core layer 212 is hard or Flexible dielectric material, the first pad 212a and the second pad 212b are respectively located on two opposite surfaces S1, S2 of the core layer 212, and the first pad 212a is respectively connected to the conductor embedded in the core layer 212 C is electrically connected to the corresponding second pad 212b. The first solder mask layer 214a and the second solder mask layer 214b respectively cover two opposite surfaces S1 and S2 of the core layer 212 and expose the first pad 212a and the second pad 212b. In one embodiment, the conductive column 220 is located on the surface S1 of the core layer 212 of the circuit carrier 210 , and the conductive column 220 is embedded in the first solder resist layer 214 a, for example. However, the present invention does not limit that the conductive pillar 220 must be embedded in the first solder resist layer 214a. In other words, in other embodiments, the conductive pillar 220 may be disposed on the first surface 210a of the circuit carrier 210 (ie, the first solder resist layer 214a). Alternatively, in addition to being embedded in the first solder resist layer 214a, the conductive pillar 220 can be further embedded or extended into the core layer 212 .

在本实施例中,线路载板210例如是具有单层线路的印刷电路板或具有多层线路的印刷电路板。前述的线路载板210可为硬质线路载板或可挠性线路载板。第一接垫212a及第二接垫212b的材料例如是铜、镍、金、锡或上述的组合,第一防焊层214a以及第二防焊层214b的材料例如是环氧树酯或其他防焊材质,而导电柱220的材料例如是铜或铜合金。In this embodiment, the circuit carrier 210 is, for example, a printed circuit board with single-layer circuits or a printed circuit board with multi-layer circuits. The aforementioned circuit carrier 210 can be a rigid circuit carrier or a flexible circuit carrier. The material of the first pad 212a and the second pad 212b is, for example, copper, nickel, gold, tin or a combination thereof, and the material of the first solder resist layer 214a and the second solder resist layer 214b is, for example, epoxy resin or other The solder resist material, and the material of the conductive pillar 220 is, for example, copper or copper alloy.

接着,请参考图1B,将芯片230置于线路载板210的第一表面210a上,以使芯片230与导电柱220位于线路载板210的同一侧,接着,通过至少一焊线240使芯片230与线路载板210上的第一接垫212a电性连接。Next, please refer to FIG. 1B, the chip 230 is placed on the first surface 210a of the circuit carrier 210, so that the chip 230 and the conductive column 220 are located on the same side of the circuit carrier 210, and then, the chip is connected by at least one bonding wire 240. 230 is electrically connected to the first pad 212 a on the circuit carrier 210 .

如图1B所示,前述的导电柱220、芯片230及焊线240皆位于线路载板210的同一侧。在一实施例中,芯片230配置在防焊层214a的表面上。在完成芯片230与线路载板210的接合之后,芯片230会通过线路载板210内之导体C与导电柱220电性连接。As shown in FIG. 1B , the aforementioned conductive pillars 220 , chips 230 and bonding wires 240 are all located on the same side of the circuit carrier 210 . In one embodiment, the chip 230 is disposed on the surface of the solder resist layer 214a. After the chip 230 is bonded to the circuit carrier 210 , the chip 230 is electrically connected to the conductive column 220 through the conductor C in the circuit carrier 210 .

在完成芯片230与线路载板210的接合之后,接着,于线路载板210上形成封装胶体250,以包覆导电柱220及芯片230。具体而言,前述的封装胶体250除了包覆导电柱220及芯片230之外,可进一步包覆焊线240以及被防焊层214a所暴露的第一接垫212a。在本实施例中,芯片230例如通讯芯片,焊线240例如金线,而封装胶体250例如是以射出成型(mold injection)的方式制作,且芯片230的厚度及焊线240弧高决定了所欲形成的封装胶体250的厚度T1。此处,封装胶体250的厚度T1足以覆盖住导电柱220的顶面220a。After the bonding of the chip 230 and the circuit carrier 210 is completed, then, an encapsulant 250 is formed on the circuit carrier 210 to cover the conductive pillar 220 and the chip 230 . Specifically, in addition to covering the conductive pillars 220 and the chip 230 , the aforementioned encapsulant 250 may further cover the bonding wires 240 and the first pads 212 a exposed by the solder resist layer 214 a. In this embodiment, the chip 230 is such as a communication chip, the bonding wire 240 is such as a gold wire, and the encapsulant 250 is made by injection molding (mold injection), and the thickness of the chip 230 and the arc height of the bonding wire 240 determine the The thickness T1 of the encapsulant 250 to be formed. Here, the thickness T1 of the encapsulant 250 is sufficient to cover the top surface 220 a of the conductive pillar 220 .

在完成封装胶体250的制作之后,本实施例可于线路载板210的第二表面210b上形成外部端子216,其中外部端子216与被防焊层214b所暴露出的第二接垫212b电性连接。举例而言,外部端子216可为焊球、凸块等,且芯片230可通过焊线240、第一接垫212a、导体C、第二接垫212b以及外部端子216与外部元件电性连接。After the encapsulant 250 is manufactured, in this embodiment, the external terminal 216 can be formed on the second surface 210b of the circuit carrier 210, wherein the external terminal 216 is electrically connected to the second pad 212b exposed by the solder resist layer 214b. connect. For example, the external terminals 216 can be solder balls, bumps, etc., and the chip 230 can be electrically connected to external components through the bonding wires 240 , the first pads 212 a , the conductor C, the second pads 212 b and the external terminals 216 .

然后,请参考图1C,移除部分的封装胶体250,直到导电柱220的顶面220a被暴露。在本实施例中,封装胶体250可通过研磨制程、蚀刻制程或其他制程进行薄化,以形成封装胶体250’。值得注意的是,当厚度为T1的封装胶体250被薄化而成为封装胶体250’时,封装胶体250’的厚度为T2。。Then, referring to FIG. 1C , part of the encapsulant 250 is removed until the top surface 220 a of the conductive pillar 220 is exposed. In this embodiment, the encapsulant 250 can be thinned by grinding process, etching process or other processes to form the encapsulant 250'. It should be noted that when the encapsulant 250 with the thickness T1 is thinned to become the encapsulant 250', the thickness of the encapsulant 250' is T2. .

请参考图1D,在形成封装胶体250’之后,接着于封装胶体250’上形成一导电层270,此导电层270与导电柱220的顶面220a连接,使导电层270通过导电柱220、线路载板210与芯片230电性连接。此外,在本实施例中,形成导电层270的方法例如是电镀、溅镀或其他适当的成膜制程,导电层270的材料例如是金属。在本实施例中,导电层270可作为天线层。Please refer to FIG. 1D, after forming the encapsulant 250', a conductive layer 270 is then formed on the encapsulant 250', the conductive layer 270 is connected to the top surface 220a of the conductive pillar 220, so that the conductive layer 270 passes through the conductive pillar 220, the circuit The carrier board 210 is electrically connected to the chip 230 . In addition, in this embodiment, the method of forming the conductive layer 270 is, for example, electroplating, sputtering or other suitable film-forming processes, and the material of the conductive layer 270 is, for example, metal. In this embodiment, the conductive layer 270 may serve as an antenna layer.

在本实施例中,如图1C与图1D所示,由于导电柱220可预先行制作并设置在线路载板210上,因此本实施例可精准地控制导电柱220的顶面220a的平整度,以使顶面220a与薄化后的封装胶体250’的顶面切齐(实质上共平面),进而使得后续形成的导电层270能够顺利地与导电柱220的顶面220a电性连接。在导电柱220的顶面220a的平整度获得良好控制的情况下,导电层270与导电柱220的顶面220a会形成良好的欧姆接触,使得整体的封装信赖性获得提升。In this embodiment, as shown in FIG. 1C and FIG. 1D , since the conductive pillar 220 can be prefabricated and arranged on the circuit carrier 210 , the flatness of the top surface 220 a of the conductive pillar 220 can be accurately controlled in this embodiment. , so that the top surface 220a is aligned (substantially coplanar) with the top surface of the thinned encapsulant 250 ′, so that the subsequently formed conductive layer 270 can be electrically connected to the top surface 220a of the conductive pillar 220 smoothly. When the flatness of the top surface 220a of the conductive pillar 220 is well controlled, the conductive layer 270 and the top surface 220a of the conductive pillar 220 will form a good ohmic contact, so that the overall packaging reliability is improved.

经过上述制程后即可大致上完成本实施例的芯片封装体200的制作。上述的芯片封装体200包括线路载板210、导电柱220、芯片230、焊线240、封装胶体250’、导电层270及外部端子216。线路载板210具有第一表面210a以及第二表面210b,且导电柱220、芯片230、焊线240、封装胶体250’及导电层270位于线路载板210的第一表面210a上,外部端子216位于线路载板210的第二表面210b上。在一实施例中,线路载板210包括核心层212、导体C、第一接垫212a、第二接垫212b、第一防焊层214a以及第二防焊层214b,第一接垫212a与第二接垫212b分别位于核心层212的二相对表面S1、S2上,且第一接垫212a分别与通过嵌于核心层212中的导体C与对应的第二接垫212b电性连接。芯片230通过至少一焊线240与被防焊层214a所暴露出的第一接垫212a电性连接。外部端子216与被防焊层214b所暴露出的第二接垫212b电性连接。因此,芯片230通过至少一焊线240、第一接垫212a、导体C、第二接垫212b以及外部端子216与外部元件电性连接。封装胶体250’配置于线路载板上,除了包覆芯片230及导电柱220,可进一步包覆焊线240以及被防焊层214a所暴露的第一接垫212a,并使导电柱220暴露出导电柱220的顶面220a。导电层270配置于封装胶体250’上,使导电层270接触导电柱220的顶面220a,且通过导电柱220、线路载板210与芯片230电性连接。After the above process, the fabrication of the chip package 200 of this embodiment can be substantially completed. The aforementioned chip package 200 includes a circuit carrier 210 , conductive pillars 220 , chips 230 , bonding wires 240 , encapsulant 250 ′, conductive layer 270 and external terminals 216 . The circuit carrier 210 has a first surface 210a and a second surface 210b, and the conductive column 220, the chip 230, the bonding wire 240, the encapsulant 250' and the conductive layer 270 are located on the first surface 210a of the circuit carrier 210, and the external terminal 216 Located on the second surface 210b of the circuit carrier 210 . In one embodiment, the circuit carrier 210 includes a core layer 212, a conductor C, a first pad 212a, a second pad 212b, a first solder resist layer 214a and a second solder resist layer 214b, the first pad 212a and the second solder resist layer 214b. The second pads 212b are respectively located on two opposite surfaces S1 , S2 of the core layer 212 , and the first pads 212a are respectively electrically connected to the corresponding second pads 212b through the conductor C embedded in the core layer 212 . The chip 230 is electrically connected to the first pad 212a exposed by the solder resist layer 214a through at least one bonding wire 240 . The external terminal 216 is electrically connected to the second pad 212b exposed by the solder mask layer 214b. Therefore, the chip 230 is electrically connected to external components through at least one bonding wire 240 , the first pad 212 a , the conductor C, the second pad 212 b and the external terminal 216 . The encapsulant 250' is disposed on the circuit carrier. In addition to covering the chip 230 and the conductive column 220, it can further cover the bonding wire 240 and the first pad 212a exposed by the solder mask layer 214a, and expose the conductive column 220. The top surface 220 a of the conductive pillar 220 . The conductive layer 270 is disposed on the encapsulant 250', so that the conductive layer 270 contacts the top surface 220a of the conductive pillar 220, and is electrically connected to the chip 230 through the conductive pillar 220 and the circuit carrier 210.

以下将以不同的实施例来说明芯片封装体的制造流程。在此必须说明的是,下述实施例延用前述实施例的元件标号与部分内容,其中采用相同的标号来表示相同或近似的元件,并且省略了相同技术内容的说明。关于省略部分的说明可以参考前述实施例,下述实施例不再重述。The manufacturing process of the chip package will be described below with different embodiments. It must be noted here that the following embodiments continue to use the component numbers and part of the content of the previous embodiments, wherein the same numbers are used to denote the same or similar components, and descriptions of the same technical content are omitted. For the description of omitted parts, reference may be made to the aforementioned embodiments, and the following embodiments will not be repeated.

图2A至图2D是依照本发明第二实施例的一种芯片封装体的制造流程示意图。首先,请参照图1A、图1B、图2A以及图2B,本实施例中具有导电柱220’的线路载板210与图1A及图1B中所示出的具有导电柱220的线路载板210相似,二者之间不同之处在于:本实施例(图2A及图2B)中形成于线路载板210上的导电柱220’较导电柱220(图1A与图1B)为短。2A to 2D are schematic diagrams of a manufacturing process of a chip package according to a second embodiment of the present invention. First, please refer to FIG. 1A, FIG. 1B, FIG. 2A and FIG. 2B, the circuit carrier 210 with conductive columns 220' in this embodiment is the same as the circuit carrier 210 with conductive columns 220 shown in FIG. 1A and FIG. 1B Similar, the difference between the two is: the conductive pillar 220 ′ formed on the circuit carrier 210 in this embodiment ( FIGS. 2A and 2B ) is shorter than the conductive pillar 220 ( FIGS. 1A and 1B ).

然后,请参考图2C,在完成封装胶体251的制作之后,在封装胶体251中形成接触开口252,此接触开口252暴露出导电柱220’的顶面220a。接着,在接触开口252中填入接触导体260,此处,接触导体260与导电柱220’电性连接。本实施例可通过蚀刻、研磨钻孔、激光钻孔或其他制程于封装胶体251中形成接触开口252。此外,接触导体260的材料例如是锡膏、银浆、或其他融点低于导电柱220’材料的导电物质。Then, please refer to FIG. 2C , after the encapsulant 251 is fabricated, a contact opening 252 is formed in the encapsulant 251, and the contact opening 252 exposes the top surface 220a of the conductive pillar 220'. Next, a contact conductor 260 is filled in the contact opening 252, where the contact conductor 260 is electrically connected to the conductive column 220'. In this embodiment, the contact opening 252 can be formed in the encapsulant 251 by etching, grinding drilling, laser drilling or other processes. In addition, the material of the contact conductor 260 is, for example, solder paste, silver paste, or other conductive substances whose melting point is lower than the material of the conductive pillar 220'.

在本实施例中,如图2B与图2C所示,由于导电柱220’可预先制作并设置于线路载板210上,因此本实施例在形成封装胶体251中的接触开口252时,将可有效减少封装胶体251中接触开孔252的深宽比(aspect ratio),使得制程时间缩短,进而增加产能。In this embodiment, as shown in FIG. 2B and FIG. 2C , since the conductive posts 220 ′ can be prefabricated and arranged on the circuit carrier 210 , when forming the contact opening 252 in the encapsulant 251 in this embodiment, it will be possible to Effectively reducing the aspect ratio of the contact opening 252 in the encapsulant 251 shortens the process time and increases the throughput.

请参考图2D,在填入接触导体260后,接着于封装胶体251上形成导电层270,以使导电层270通过接触导体260、导电柱220以及线路载板210而与芯片230电性连接。Please refer to FIG. 2D , after filling the contact conductor 260 , a conductive layer 270 is then formed on the encapsulant 251 , so that the conductive layer 270 is electrically connected to the chip 230 through the contact conductor 260 , the conductive pillar 220 and the circuit carrier 210 .

在本实施例中,如图2C与图2D所示,前述的接触导体260于填入开口后,接触导体260会有顶面260a,其中顶面260a不会被封装胶体251所包覆,进而使得后续形成的导电层270能够顺利地与接触导体260的顶面260a电性连接。In this embodiment, as shown in FIG. 2C and FIG. 2D, after the aforementioned contact conductor 260 is filled into the opening, the contact conductor 260 will have a top surface 260a, wherein the top surface 260a will not be covered by the encapsulant 251, and then This enables the subsequently formed conductive layer 270 to be electrically connected to the top surface 260 a of the contact conductor 260 smoothly.

经过上述制程后即可大致上完成本实施例的芯片封装体200’的制作。上述的芯片封装体200’包括线路载板210、导电柱220、芯片230、焊线240、封装胶体251、接触导体260、导电层270及外部端子216。线路载板210具有第一表面210a以及第二表面210b,且导电柱220、芯片230、焊线240、封装胶体251、接触导体260及导电层270位于线路载板210的第一表面210a上,外部端子216位于线路载板210的第二表面210b上。在一实施例中,线路载板210包括核心层212、导体C、第一接垫212a、第二接垫212b、第一防焊层214a以及第二防焊层214b,第一接垫212a与第二接垫212b分别位于核心层212的二相对表面S1、S2上,且第一接垫212a分别与通过嵌于核心层212中的导体C与对应的第二接垫212b电性连接。芯片230通过至少一焊线240与被防焊层214a所暴露出的第一接垫212a电性连接。外部端子216与被防焊层214b所暴露出的第二接垫212b电性连接。因此,芯片230通过至少一焊线240、第一接垫212a、导体C、第二接垫212b以及外部端子216与外部元件电性连接。封装胶体251配置于线路载板210上,除了包覆芯片230、接触导体260及导电柱220,可进一步包覆焊线240以及被防焊层214a所暴露的第一接垫212a,并使接触导体260暴露出接触导体260的顶面260a。导电层270配置在封装胶体251上,使导电层270接触接触导体260,且通过导电柱220、线路载板210与芯片230电性连接。After the above-mentioned manufacturing process, the fabrication of the chip package 200' of this embodiment can be substantially completed. The above-mentioned chip package 200′ includes a circuit carrier 210, a conductive column 220, a chip 230, a bonding wire 240, an encapsulant 251, a contact conductor 260, a conductive layer 270 and an external terminal 216. The circuit carrier 210 has a first surface 210a and a second surface 210b, and the conductive pillar 220, the chip 230, the bonding wire 240, the encapsulant 251, the contact conductor 260 and the conductive layer 270 are located on the first surface 210a of the circuit carrier 210, The external terminals 216 are located on the second surface 210 b of the circuit carrier 210 . In one embodiment, the circuit carrier 210 includes a core layer 212, a conductor C, a first pad 212a, a second pad 212b, a first solder resist layer 214a and a second solder resist layer 214b, the first pad 212a and the second solder resist layer 214b. The second pads 212b are respectively located on two opposite surfaces S1 , S2 of the core layer 212 , and the first pads 212a are respectively electrically connected to the corresponding second pads 212b through the conductor C embedded in the core layer 212 . The chip 230 is electrically connected to the first pad 212a exposed by the solder resist layer 214a through at least one bonding wire 240 . The external terminal 216 is electrically connected to the second pad 212b exposed by the solder mask layer 214b. Therefore, the chip 230 is electrically connected to external components through at least one bonding wire 240 , the first pad 212 a , the conductor C, the second pad 212 b and the external terminal 216 . The encapsulant 251 is disposed on the circuit carrier 210. In addition to covering the chip 230, the contact conductor 260 and the conductive column 220, it can further cover the bonding wire 240 and the first pad 212a exposed by the solder mask layer 214a, and make the contact The conductor 260 exposes a top surface 260a that contacts the conductor 260 . The conductive layer 270 is disposed on the encapsulant 251 , so that the conductive layer 270 contacts the conductor 260 , and is electrically connected to the chip 230 through the conductive pillar 220 and the circuit carrier 210 .

综上所述,本发明上述实施例在形成封装胶体之前先于线路载板上形成导电柱,此制程顺序可以提升芯片封装制程的封装良率。此外,由于导电柱的制作早于封装胶体的形成,因此封装胶体的厚度不会影响到导电柱的制作良率。To sum up, in the above embodiments of the present invention, the conductive pillars are formed on the circuit carrier before forming the encapsulant. This process sequence can improve the encapsulation yield of the chip encapsulation process. In addition, since the fabrication of the conductive pillars is earlier than the formation of the encapsulant, the thickness of the encapsulant will not affect the yield of the conductive pillars.

最后应说明的是:以上各实施例仅用以说明本发明的技术方案,而非对其限制;尽管参照前述各实施例对本发明进行了详细的说明,本领域的普通技术人员应当理解:其依然可以对前述各实施例所记载的技术方案进行修改,或者对其中部分或者全部技术特征进行等同替换;而这些修改或者替换,并不使相应技术方案的本质脱离本发明各实施例技术方案的范围。Finally, it should be noted that: the above embodiments are only used to illustrate the technical solutions of the present invention, rather than limiting them; although the present invention has been described in detail with reference to the foregoing embodiments, those of ordinary skill in the art should understand that: It is still possible to modify the technical solutions described in the foregoing embodiments, or perform equivalent replacements for some or all of the technical features; and these modifications or replacements do not make the essence of the corresponding technical solutions deviate from the technical solutions of the various embodiments of the present invention. scope.

Claims (11)

1. a kind of chip encapsulating manufacturing procedure, including:
There is provided has conductive pole on line carrier plate, the line carrier plate;
Chip is placed in line carrier plate, and the chip is passed through an at least bonding wire and line carrier plate electricity Property connection;
Packing colloid is formed on the line carrier plate to coat the chip and the conductive pole;
The packing colloid of part is removed to expose the top surface of the conductive pole;And
The conductive layer being connected with the top surface of the conductive pole, wherein institute are formed on the packing colloid Conductive layer is stated to be electrically connected with by the line carrier plate and the chip;
Multiple outside terminals are formed on the line carrier plate, wherein the multiple outside terminal and the core Piece is located at the not homonymy of the line carrier plate, and the multiple outside terminal passes through the line carrier plate and institute State chip electric connection.
2. chip encapsulating manufacturing procedure according to claim 1, wherein removing the packing colloid of part Method include grinding.
3. chip encapsulating manufacturing procedure according to claim 1, wherein forming the method bag of the conductive layer Include plating.
4. a kind of chip packing-body, including:
Line carrier plate, the line carrier plate has conductive pole;
Chip, is configured on the line carrier plate, and passes through an at least bonding wire and line carrier plate electricity Property connection;
Packing colloid, is configured on the line carrier plate, wherein the packing colloid coat the chip and The conductive pole, and the conductive pole top surface outside the packing colloid;
Conductive layer, configuration is connected on the packing colloid with the top surface with the conductive pole, wherein The conductive layer is electrically connected with by the line carrier plate and the chip;And
Multiple outside terminals, wherein the multiple outside terminal is located at the line carrier plate with the chip Not homonymy, and the multiple outside terminal passes through the line carrier plate and chip electric connection.
5. chip packing-body according to claim 4, wherein the conductive pole is located at the chip The homonymy of the line carrier plate, and thickness of the height more than the chip of the conductive pole.
6. a kind of chip encapsulating manufacturing procedure, including:
There is provided has conductive pole on line carrier plate, the line carrier plate;
Chip is placed in line carrier plate, and the chip is passed through an at least bonding wire and line carrier plate electricity Property connection;
Packing colloid is formed on the line carrier plate to coat the chip and the conductive pole;
The packing colloid of part is removed with forming opening in the packing colloid, wherein the opening Expose the top surface of the conductive pole;
Contact conductor is inserted in said opening;And
The conductive layer with the top surface connection for contacting conductor is formed on the packing colloid, wherein described Conductive layer is electrically connected with by the contact conductor and the line carrier plate with the chip.
7. chip encapsulating manufacturing procedure according to claim 6, wherein removing the packing colloid of part Include laser drill in the method that the opening is formed in the packing colloid.
8. chip encapsulating manufacturing procedure according to claim 6, wherein forming the method bag of the conductive layer Include plating.
9. chip encapsulating manufacturing procedure according to claim 6, is additionally included on the line carrier plate and is formed Multiple outside terminals, wherein the multiple outside terminal is located at the difference of the line carrier plate with the chip Side, and the multiple outside terminal passes through the line carrier plate and chip electric connection.
10. a kind of chip packing-body, including:
Line carrier plate, the line carrier plate has conductive pole;
Conductor is contacted, is configured on the conductive pole;
Chip, is configured on the line carrier plate, and is electrically connected with the line carrier plate;
Packing colloid, is configured on the line carrier plate, wherein the packing colloid cladding chip, The conductive pole and the contact conductor, and the top surface for contacting conductor is outside packing colloid;
Conductive layer, is configured to be connected with the top surface for contacting conductor on the packing colloid, its Described in conductive layer pass through the contact conductor and the line carrier plate and the chip are electrically connected with;And
Multiple outside terminals, wherein the multiple outside terminal is located at the line carrier plate with the chip Not homonymy, and the multiple outside terminal passes through the line carrier plate and chip electric connection.
11. chip packing-body according to claim 10, wherein the conductive pole, the contact are led Body is located at the homonymy of the line carrier plate with the chip.
CN201610471869.3A 2016-04-27 2016-06-24 Chip package and chip packaging process Pending CN107316819A (en)

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TW105113070 2016-04-27

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Cited By (1)

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CN103632988A (en) * 2012-08-28 2014-03-12 宏启胜精密电子(秦皇岛)有限公司 Stacked encapsulation structure and manufacturing method thereof
CN104011858A (en) * 2011-10-17 2014-08-27 英闻萨斯有限公司 Package-on-package assembly with wire bond vias
CN104037166A (en) * 2013-03-07 2014-09-10 日月光半导体制造股份有限公司 Semiconductor package including antenna layer and manufacturing method thereof

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CN104011858A (en) * 2011-10-17 2014-08-27 英闻萨斯有限公司 Package-on-package assembly with wire bond vias
CN103632988A (en) * 2012-08-28 2014-03-12 宏启胜精密电子(秦皇岛)有限公司 Stacked encapsulation structure and manufacturing method thereof
CN104037166A (en) * 2013-03-07 2014-09-10 日月光半导体制造股份有限公司 Semiconductor package including antenna layer and manufacturing method thereof

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Publication number Priority date Publication date Assignee Title
TWI763056B (en) * 2020-06-10 2022-05-01 大陸商訊芯電子科技(中山)有限公司 Semiconductor devices and methods for manufacturing the semiconductor devices

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