CN1069134C - Gas sensor for detecting nitrogen dioxide and its prodn technology - Google Patents
Gas sensor for detecting nitrogen dioxide and its prodn technology Download PDFInfo
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- CN1069134C CN1069134C CN 96102646 CN96102646A CN1069134C CN 1069134 C CN1069134 C CN 1069134C CN 96102646 CN96102646 CN 96102646 CN 96102646 A CN96102646 A CN 96102646A CN 1069134 C CN1069134 C CN 1069134C
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- 238000005516 engineering process Methods 0.000 title abstract description 3
- 239000007789 gas Substances 0.000 title description 46
- JCXJVPUVTGWSNB-UHFFFAOYSA-N nitrogen dioxide Inorganic materials O=[N]=O JCXJVPUVTGWSNB-UHFFFAOYSA-N 0.000 title description 8
- MGWGWNFMUOTEHG-UHFFFAOYSA-N 4-(3,5-dimethylphenyl)-1,3-thiazol-2-amine Chemical compound CC1=CC(C)=CC(C=2N=C(N)SC=2)=C1 MGWGWNFMUOTEHG-UHFFFAOYSA-N 0.000 title description 2
- 230000005669 field effect Effects 0.000 claims abstract description 40
- 238000000034 method Methods 0.000 claims abstract description 11
- 238000004519 manufacturing process Methods 0.000 claims abstract description 9
- 239000007788 liquid Substances 0.000 claims abstract description 6
- -1 cobalt porphyrin quaternary ammonium Salt Chemical class 0.000 claims description 8
- RBTKNAXYKSUFRK-UHFFFAOYSA-N heliogen blue Chemical compound [Cu].[N-]1C2=C(C=CC=C3)C3=C1N=C([N-]1)C3=CC=CC=C3C1=NC([N-]1)=C(C=CC=C3)C3=C1N=C([N-]1)C3=CC=CC=C3C1=N2 RBTKNAXYKSUFRK-UHFFFAOYSA-N 0.000 claims description 7
- 239000002994 raw material Substances 0.000 claims description 7
- 238000007796 conventional method Methods 0.000 claims description 4
- 239000000969 carrier Substances 0.000 claims description 3
- 238000005520 cutting process Methods 0.000 claims description 3
- 238000007667 floating Methods 0.000 claims description 3
- 239000000758 substrate Substances 0.000 claims description 3
- 239000003960 organic solvent Substances 0.000 claims description 2
- 238000002360 preparation method Methods 0.000 claims description 2
- 238000003466 welding Methods 0.000 claims description 2
- UCKMPCXJQFINFW-UHFFFAOYSA-N Sulphide Chemical compound [S-2] UCKMPCXJQFINFW-UHFFFAOYSA-N 0.000 claims 1
- 238000001035 drying Methods 0.000 claims 1
- 239000000725 suspension Substances 0.000 claims 1
- 230000035945 sensitivity Effects 0.000 abstract description 7
- 238000012769 bulk production Methods 0.000 abstract 1
- 238000005034 decoration Methods 0.000 abstract 1
- VVOPUZNLRVJDJQ-UHFFFAOYSA-N phthalocyanine copper Chemical compound [Cu].C12=CC=CC=C2C(N=C2NC(C3=CC=CC=C32)=N2)=NC1=NC([C]1C=CC=CC1=1)=NC=1N=C1[C]3C=CC=CC3=C2N1 VVOPUZNLRVJDJQ-UHFFFAOYSA-N 0.000 abstract 1
- 239000000463 material Substances 0.000 description 6
- QGZKDVFQNNGYKY-UHFFFAOYSA-N Ammonia Chemical compound N QGZKDVFQNNGYKY-UHFFFAOYSA-N 0.000 description 4
- 238000001514 detection method Methods 0.000 description 4
- 229910006404 SnO 2 Inorganic materials 0.000 description 3
- 229910052751 metal Inorganic materials 0.000 description 3
- 239000002184 metal Substances 0.000 description 3
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 description 2
- 229910021529 ammonia Inorganic materials 0.000 description 2
- 229910010293 ceramic material Inorganic materials 0.000 description 2
- 238000010586 diagram Methods 0.000 description 2
- 239000001257 hydrogen Substances 0.000 description 2
- 229910052739 hydrogen Inorganic materials 0.000 description 2
- 238000011084 recovery Methods 0.000 description 2
- 239000004065 semiconductor Substances 0.000 description 2
- XOLBLPGZBRYERU-UHFFFAOYSA-N tin dioxide Chemical compound O=[Sn]=O XOLBLPGZBRYERU-UHFFFAOYSA-N 0.000 description 2
- 229910052723 transition metal Inorganic materials 0.000 description 2
- 150000003624 transition metals Chemical class 0.000 description 2
- ZAMOUSCENKQFHK-UHFFFAOYSA-N Chlorine atom Chemical compound [Cl] ZAMOUSCENKQFHK-UHFFFAOYSA-N 0.000 description 1
- 239000000460 chlorine Substances 0.000 description 1
- 229910052801 chlorine Inorganic materials 0.000 description 1
- 238000009826 distribution Methods 0.000 description 1
- 230000005684 electric field Effects 0.000 description 1
- 230000010354 integration Effects 0.000 description 1
- 239000012528 membrane Substances 0.000 description 1
- 230000003068 static effect Effects 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 1
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Abstract
Description
本发明属一种气体传感器,特别涉及一种有机单分子膜修饰的悬栅场效应型气体传感器及其制作工艺。The invention belongs to a gas sensor, in particular to a suspended grid field-effect gas sensor modified by an organic monomolecular film and a manufacturing process thereof.
悬栅场效应(SGFET)型气体传感器是一种用气敏材料修饰于场效应晶体管的栅区,利用气敏材料吸附某一种气体后形成的电荷分布变化来改变栅区半导体的表面势,从而引起场效应晶体管栅电压的变化,导致检测的漏电流改变的一种气体传感器。Suspended gate field effect (SGFET) type gas sensor is a kind of gas sensor modified on the gate area of field effect transistor with gas sensitive material, and the surface potential of the semiconductor in the gate area is changed by the change of charge distribution formed after the gas sensitive material absorbs a certain gas. A gas sensor that causes a change in the gate voltage of the field effect transistor, resulting in a change in the detected leakage current.
与本发明最为接近的现有技术为一篇文献所公开,文献题目是“识别H2和NH3的悬栅场效应晶体管(Recognition of the Hydrogenand Ammonia by Modified Gate Metallijation of the Suspended-gate FET),载《Sensorsand Actuators》1990,(B1):21。所制得的气体传感器是在传统的n沟增强型场效应晶体管上完成的,除了栅区无金属层和栅电极外,其它结构与场效应晶体管一致,然后使气敏材料SnO2只沉积在场效应晶体管的栅区。我们称栅区位置不蒸镀金属层,且不引出栅电极的场效应晶体管为悬栅场效应晶体管。现有技术的悬栅场效应型的气体传感器结构由图1给出。在P型Si衬底上两处扩散一定浓度的n型载流子,形成漏源区域,在n区各引出源电极s和漏电极D,即AL电极,构成悬栅场效应晶体管。在两个n区之间的栅区表面沉积有SnO2层。制作这种气体传感器的工艺过程大致为,首先利用常规的制作半导体器件的方法制作增强型悬栅场效应晶体管管芯的芯片,划界切割。所述的划界切割就是在芯片上按管芯位置划界,分割一个个管芯,但又不使管芯分离,各个管芯仍连在一起,芯片仍为一个整体,以便沉积气敏材料。然后,使用特殊的工艺技术同时在各管芯栅区表面蒸镀气敏性的过渡金属或陶瓷材料(如SnO2)。最后,将芯片分割成单个的管芯,每个管芯都引出源电极S和漏电极D。The prior art closest to the present invention is disclosed by a document titled "Recognition of the Hydrogen and Ammonia by Modified Gate Metallijation of the Suspended-gate FET", "Sensors and Actuators" 1990, (B1): 21. The gas sensor is completed on the traditional n-channel enhancement type field effect transistor, except that there is no metal layer and gate electrode in the gate area, other structures and field effect Transistor is consistent, then make gas-sensitive material SnO 2 only be deposited in the gate area of field effect transistor. We claim that the gate area position does not vapor-deposit metal layer, and the field effect transistor that does not draw gate electrode is suspended gate field effect transistor. The gas sensor structure of the suspended gate field effect type is shown in Figure 1. A certain concentration of n-type carriers is diffused in two places on the P-type Si substrate to form a drain-source region, and the source electrode s and the drain electrode are respectively drawn out in the n-region D, i.e. the AL electrode, constitutes a suspended gate field-effect transistor. SnO2 layers are deposited on the surface of the gate region between the two n regions. The process of making this gas sensor is roughly, at first utilizing the conventional method of making a semiconductor device Make the chip of enhanced suspended gate field effect transistor tube core, demarcate cutting.Described demarcation cutting is exactly to demarcate by tube core position on the chip, divide tube core one by one, but do not make tube core separate again, each tube core The cores are still connected together, and the chip is still a whole, so that gas-sensitive materials can be deposited. Then, a gas-sensitive transition metal or ceramic material (such as SnO 2 ) is vapor-deposited on the surface of each die gate area at the same time using a special process technology. Finally, the chip is divided into individual dies, each of which leads to a source electrode S and a drain electrode D.
这种SnO2-SGFET结构的气体传感器由于不加栅偏压而功耗低,变化信号便于检测,器件易于实现集成化,而且一致性较好。但是,由于气敏性过渡金属或陶瓷材料一般需要在高的温度下才具有较强的吸附气体的能力,故在常温下该传感器灵敏度较低;由于过渡金属或陶瓷气敏材料对多种气体均敏感,故选择性较差造成检测不准确;由于采用增强型场效应晶体管,一般要在较高的气体浓度下才能引起明显的漏电流变化,因而不利检测低浓度的气体。而其制作工艺中只在栅区表面沉积(蒸镀)气敏材料,因而制作比较麻烦、困难。The gas sensor with the SnO 2 -SGFET structure has low power consumption because no gate bias is applied, the change signal is easy to detect, the device is easy to realize integration, and the consistency is good. However, because gas-sensitive transition metals or ceramic materials generally need to have a strong ability to adsorb gases at high temperatures, the sensitivity of the sensor is low at room temperature; Both are sensitive, so poor selectivity leads to inaccurate detection; due to the use of enhanced field effect transistors, it is generally necessary to cause significant leakage current changes at higher gas concentrations, which is not conducive to the detection of low-concentration gases. However, in the manufacturing process, only the gas-sensitive material is deposited (evaporated) on the surface of the gate area, so the manufacturing is cumbersome and difficult.
本发明设计了一种用有机单分子膜修饰的悬栅场效应型气体传感器,有机单分子膜修饰于整个管芯,而达到气体传感器常温下工作,灵敏度较高、选择性好、可以检测较低浓度的气体,且工艺较简单的目的。The invention designs a suspended grid field-effect gas sensor modified with organic monomolecular film. The organic monomolecular film is modified on the whole tube core, so that the gas sensor can work at normal temperature, has high sensitivity, good selectivity, and can detect more Low concentration of gas, and the purpose of simpler process.
本发明的有机单分子膜修饰的场效应型气体传感器,有机单分子膜(亦称LB膜)采用钴卟啉季胺盐及其衍生物或硫化酞菁铜及其衍生物为原料制备的有机单分子膜,这两种原料LB膜修饰于场效应晶体管制得的气体传感器用于检测NO2气体。该气体传感器可称为LB-SGFET结构的气体传感器。The field-effect gas sensor modified by the organic monomolecular film of the present invention, the organic monomolecular film (also known as LB film) adopts cobalt porphyrin quaternary ammonium salt and its derivatives or sulfurized copper phthalocyanine and its derivatives as raw materials. Monomolecular film, these two kinds of raw materials LB film modified in field effect transistor fabricated gas sensor for detecting NO2 gas. The gas sensor can be called a gas sensor with LB-SGFET structure.
本发明的具体结构参见图2。在栅区无金属层和栅电极的场效应晶体管(即悬栅场效应晶体管)的栅区表面拉制有钴卟啉季胺盐或硫化酞菁铜或它们的衍生物的有机单分子膜。图2中悬栅场效应晶体管即在P型Si衬底上扩散有两个n型载流子的n区,在包括栅区在内的整个表面附有有机单分子膜,两个n区分别引出源电极S和漏电极D。The specific structure of the present invention is referred to Fig. 2. On the surface of the gate area of the field effect transistor without metal layer and gate electrode (that is, the suspended gate field effect transistor), an organic monomolecular film of cobalt porphyrin quaternary ammonium salt or sulfurized copper phthalocyanine or their derivatives is drawn. In Figure 2, the suspended gate field effect transistor is the n-region with two n-type carriers diffused on the P-type Si substrate, and an organic monomolecular film is attached to the entire surface including the gate region. The two n-regions are respectively The source electrode S and the drain electrode D are drawn out.
制备有机单分子膜的原料最好是四对二甲胺基钴卟啉季胺盐或其衍生物或四-4-(2,4-二特戊基苯硫基)酞菁铜或其衍生物。它们对NO2气体更为敏感,因而可以提高气体传感器的灵敏度和选择性。The raw material for preparing organic monomolecular film is preferably four-p-dimethylaminocobalt porphyrin quaternary ammonium salt or its derivatives or tetra-4-(2,4-di-t-pentylphenylthio) copper phthalocyanine or its derivatives things. They are more sensitive to NO2 gas and thus can improve the sensitivity and selectivity of gas sensors.
制备的气体传感器上有机单分子膜的厚度应当合适。对NO2气体的传感器,LB膜厚度可为6~60nm,最好为15~45nm。用前述的钴卟啉季胺盐、硫化酞菁铜或它们的衍生物制备LB膜时,控制悬栅场效应晶体管上的层数大约为4~40层,可以做到LB膜总厚度为6~60nm。层数过少不利于获得较高的灵敏度,层数过多不利于快速的响应和稳定性。The thickness of the organic monomolecular film on the prepared gas sensor should be appropriate. For the sensor of NO 2 gas, the thickness of LB film can be 6-60nm, preferably 15-45nm. When preparing the LB film with the aforementioned cobalt porphyrin quaternary ammonium salt, sulfurized copper phthalocyanine or their derivatives, the number of layers on the suspended gate field effect transistor is controlled to be about 4 to 40 layers, and the total thickness of the LB film can be 6 ~60nm. Too few layers are not conducive to obtaining higher sensitivity, and too many layers are not conducive to fast response and stability.
这种LB膜修饰的场效应型气体传感器可以采用增强型悬栅场效应晶体管,也可以采用耗尽型悬栅场效应晶体管。它们检测的的范围有所不同,耗尽型的可以检测更低浓度的NO2气体,即具有较高的灵敏度;增强型的具有较好的稳定性。实际检测中可以根据不同环境使用这两种气体传感器。The LB film-modified field-effect gas sensor can use either an enhancement-type suspended-gate field-effect transistor or a depletion-type suspended-gate field-effect transistor. Their detection ranges are different. The depletion type can detect lower concentration of NO 2 gas, that is, it has higher sensitivity; the enhanced type has better stability. These two gas sensors can be used according to different environments in actual detection.
本发明的LB膜修饰的悬栅场效应型气体传感器是这样制作的:The suspended grid field-effect type gas sensor modified by LB film of the present invention is made like this:
首先,按常规的制作方法制作悬栅场效应晶体管的管芯芯片,用划片机按单个管芯进行划界切割,对芯片进行亲水处理;按常规制作方法制备钴卟啉季胺盐或其衍生物或硫化酞菁铜或其衍生物的有机单分子膜,之后,First, make the tube core chip of the suspended gate field effect transistor according to the conventional production method, use a dicing machine to demarcate and cut the single tube core, and carry out hydrophilic treatment to the chip; prepare cobalt porphyrin quaternary ammonium salt or Its derivatives or organic monomolecular film of sulfurized copper phthalocyanine or its derivatives, after that,
A.将芯片放在漂有有机单分子膜的液体中,在(20±2)℃条件下,将有机单分子膜拉制到芯片的栅区表面上;A. Place the chip in a liquid with an organic monomolecular film floating on it, and pull the organic monomolecular film onto the surface of the gate area of the chip under the condition of (20±2)°C;
B.将芯片置于10-2Torr的真空度下干燥,再放进漂有有机单分子膜的液体中,拉制第二层有机单分子膜;B. Dry the chip under a vacuum of 10 -2 Torr, then put it into the liquid with organic monomolecular film floating, and pull the second layer of organic monomolecular film;
C.按上述A、B的过程反复,使芯片上栅区表面的多层有机单分子膜的厚度达到6~60nm,再干燥。C. The process of A and B above is repeated until the thickness of the multi-layer organic monomolecular film on the surface of the gate region on the chip reaches 6-60 nm, and then dried.
最后,将芯片分割成单个的管芯,用静电压焊方法,在悬栅场效应晶体管的漏源区域(两个n区)形成AL引线。Finally, the chip is divided into individual dies, and an AL lead is formed in the drain-source region (two n-regions) of the suspended gate field effect transistor by means of static pressure welding.
前述的按常规方法制备有机单分子膜,即是现有的制备LB膜的方法。一般是将原料的微粉(如钴卟啉季胺盐)溶于有机熔剂如氯坊中,用点滴方式滴在液体表面上,比如滴在水面上,再推制成膜。The aforementioned preparation of organic monomolecular films by conventional methods is the existing method for preparing LB films. Generally, the micropowder of the raw material (such as cobalt porphyrin quaternary ammonium salt) is dissolved in an organic solvent such as chlorine, and dripped on the liquid surface, such as dripping on the water surface, and then pushed to form a film.
本发明的LB-SGFET结构的气体传感器由于LB膜的有序性,其吸附气体分子并与之交换电子后,膜内形成偶极层,从而在栅区产生附加电场,引起漏电流的变化。正由于LB膜的有序性,使气体传感器有高灵敏度;特别是采用耗尽型场效应管时,在较低的气体浓度引起的非常小的栅电压变化,也会从漏电流变化中反应出来,使检测的气体浓度达到PPb级。由于本发明的特有的制备LB膜的材料又吸附NO2气体分子并与之交换电子,从而具有极高的选择性。由于LB膜的超薄特性,对气体的响应与恢复迅速,因而LB膜的气体传感器具有快速响应和快速恢复的特点。由于LB膜直接拉制在悬栅场效应晶体管的芯片上,不需选择性地沉积在栅区,使工艺变得简单,器件的制作也可实现集成化,具有良好的一致性,因而便于大批量生产。Due to the orderliness of the LB-SGFET structure gas sensor of the present invention, after it absorbs gas molecules and exchanges electrons with them, a dipole layer is formed in the film, thereby generating an additional electric field in the gate region, causing changes in leakage current. Due to the order of the LB film, the gas sensor has high sensitivity; especially when the depletion type field effect transistor is used, the very small gate voltage change caused by the lower gas concentration will also be reflected from the leakage current change out, so that the detected gas concentration reaches the PPb level. Since the special material for preparing the LB membrane of the present invention absorbs NO2 gas molecules and exchanges electrons with them, it has extremely high selectivity. Due to the ultra-thin characteristics of the LB film, the response and recovery to the gas are rapid, so the gas sensor of the LB film has the characteristics of fast response and fast recovery. Since the LB film is directly drawn on the chip of the suspended gate field effect transistor, it does not need to be selectively deposited on the gate area, which simplifies the process, and the fabrication of the device can also be integrated with good consistency, so it is convenient for large-scale Mass production.
附图说明:Description of drawings:
图1是识别氢气和氨气的悬栅场效应晶体管结构示意图。Fig. 1 is a schematic diagram of the structure of a suspended gate field effect transistor for recognizing hydrogen and ammonia.
图2是本发明的检测二氧化氮的气体传感器结构示意图。Fig. 2 is a structural schematic diagram of the gas sensor for detecting nitrogen dioxide of the present invention.
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| CN1325921C (en) * | 2005-05-27 | 2007-07-11 | 东南大学 | Anti-radiation electric field microsensor |
| CN1330968C (en) * | 2005-05-27 | 2007-08-08 | 东南大学 | Micro electric field sensor based on P-type metal-oxide transistor structure |
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| KR20040073500A (en) * | 2001-12-20 | 2004-08-19 | 마코토 유아사 | Electrode for active oxygen species and sensor using the electrode |
| DE102004013678A1 (en) * | 2004-03-18 | 2005-10-20 | Micronas Gmbh | Device for detecting a gas or gas mixture |
| DE102004019604A1 (en) * | 2004-04-22 | 2005-11-17 | Siemens Ag | Method for minimizing cross sensitivities in FET based gas sensors |
| CN102221569B (en) * | 2011-03-25 | 2013-06-05 | 中国科学院长春应用化学研究所 | Gas sensor with gas-sensitive layer adopting weak epitaxial organic semiconductor film |
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| CN1325921C (en) * | 2005-05-27 | 2007-07-11 | 东南大学 | Anti-radiation electric field microsensor |
| CN1330968C (en) * | 2005-05-27 | 2007-08-08 | 东南大学 | Micro electric field sensor based on P-type metal-oxide transistor structure |
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