CN106681108A - Target image alignment device and exposure machine with same - Google Patents
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Abstract
Description
技术领域technical field
本发明涉及一种标靶影像对位装置及具有该装置的曝光机,该曝光机用于对基板进行曝光,该标靶影像对位装置用于在该基板进行曝光之前,检测基板与底片是否正确对位。The invention relates to a target image alignment device and an exposure machine with the device. The exposure machine is used for exposing a substrate, and the target image alignment device is used for detecting whether the substrate and the film are Correct alignment.
背景技术Background technique
请参照图1及图2,其示为现有的双面曝光机的示意图,该双面曝光机具有一标靶影像对位装置100、两个曝光框单元200A,200B及一曝光装置300,该两个曝光框单元200A,200B交替地往返移载于一对位位置与一曝光位置,各该曝光框单元200A,200B先于该对位位置上进行对位程序,以确保各该曝光框单元200A,200B中的底片与基板正确对准后,再输送至该曝光位置,该曝光装置300设置于该曝光位置上方,用于对各该曝光框单元200A,200B曝光。Please refer to FIG. 1 and FIG. 2, which are schematic diagrams of an existing double-sided exposure machine, which has a target image alignment device 100, two exposure frame units 200A, 200B and an exposure device 300, The two exposure frame units 200A, 200B alternately move back and forth between a pair of alignment positions and an exposure position, and each exposure frame unit 200A, 200B performs an alignment process on the alignment position to ensure that each exposure frame After the film in the unit 200A, 200B is correctly aligned with the substrate, it is transported to the exposure position, and the exposure device 300 is arranged above the exposure position for exposing each of the exposure frame units 200A, 200B.
现有的双面曝光机可具有一个或多个标靶对位装置,该标靶影像对位装置100设置于该双面曝光机上并位于该对位位置的正上方,其包括一CCD摄影机110、一光源模块120及一升降模块130,该CCD摄影机110的镜头正对该对位位置以供对该对位位置上的曝光框单元200A或200B取像,该光源模块120设置于该升降模块130底端。The existing double-sided exposure machine can have one or more target alignment devices, and the target image alignment device 100 is arranged on the double-sided exposure machine and is located directly above the alignment position, which includes a CCD camera 110 1. A light source module 120 and a lifting module 130, the lens of the CCD camera 110 is facing the alignment position for taking images of the exposure frame unit 200A or 200B on the alignment position, the light source module 120 is arranged on the lifting module 130 bottom end.
如图1所示,当需更换底片或取放基板时,必须将各该曝光框单元200A,200B的上框体向上掀起,此时,该升降模块130为一收起状态,使该光源模块120远离该对位位置一段距离,以供各该曝光框单元200A,200B的上框体有空间能向上掀起;如图2所示,在对位程序中,该升降模块130通过马达及皮带轮驱动而下降,使该光源模块120接近该对位位置上的曝光框单元200A或200B,以提供该CCD摄影机110取像时需要的照明亮度。As shown in Figure 1, when it is necessary to replace the negative film or take and place the substrate, the upper frames of the exposure frame units 200A, 200B must be lifted upwards. At this time, the lifting module 130 is in a retracted state, so that the light source module 120 is a certain distance away from the alignment position, so that the upper frames of the exposure frame units 200A and 200B have space to lift up; as shown in Figure 2, in the alignment procedure, the lifting module 130 is driven by a motor and a pulley and lower to make the light source module 120 close to the exposure frame unit 200A or 200B at the alignment position, so as to provide the illumination brightness required by the CCD camera 110 when taking images.
为了使各该曝光框单元200A,200B的上框体能向上掀起的空间足够,因此该光源模块120必须通过该升降模块130驱动足够的升降行程,然而,该光学模块120在升降的过程中容易产生晃动及不稳,导致对于精确度有不利的影响,再者,每次在对位程序中,需等待该光学模块120下降至定点后,才能进行取像,因而造成对位时间长的缺点,更降低了生产效率。另一方面,该标靶影像对位装置100设置于该对位位置的正上方,故该双面曝光机具有不小的设备高度,占用了不少的厂房空间且不利搬运。In order to make enough space for the upper frames of each of the exposure frame units 200A, 200B to lift upward, the light source module 120 must be driven by the lifting module 130 for a sufficient lifting stroke. However, the optical module 120 is easy to produce Shaking and instability lead to adverse effects on accuracy. Moreover, each time in the alignment process, it is necessary to wait for the optical module 120 to drop to a fixed point before taking an image, thus causing the disadvantage of long alignment time. It further reduces production efficiency. On the other hand, the target image alignment device 100 is installed directly above the alignment position, so the double-side exposure machine has a high equipment height, takes up a lot of factory space and is unfavorable for transportation.
发明内容Contents of the invention
为改善现有双面曝光机所存在的光学检测精确度不佳、对为过程时间长、生产效率低及设备占空间等缺点,本发明提出了一种标靶影像对位装置及具有该装置的曝光机。In order to improve the shortcomings of existing double-sided exposure machines such as poor optical detection accuracy, long alignment process time, low production efficiency, and equipment space occupation, the present invention proposes a target image alignment device and a device with the device. exposure machine.
为达上述目的及其他目的,本发明公开了一种标靶影像对位装置,应用于曝光机以供进行基板与底片的标靶间的对位程序,该曝光机包含承载基板与底片的两个曝光框单元,该两个曝光框单元沿第一方向交替地往返移载于对位位置与曝光位置,该标靶影像对位装置包含二维移载单元及光学检测单元,该二维移载单元包括第一滑轨、第一滑座、第二滑轨及第二滑座,该第一滑轨用于设置于该曝光机上且位于该对位位置的邻侧,并以其滑动方向平行于该第一方向的方式配置;该第一滑座可移动地设置于该第一滑轨上以被驱动滑动;该第二滑轨与该第一滑座结合并以其滑动方向平行于第二方向且延伸至该对位位置上方的方式配置,该第二方向垂直该第一方向;该第二滑座可移动地设置于该第二滑轨上以被驱动滑动;该光学检测单元设置于该第二滑座上,该光学检测单元具有光源组及摄影机,在对位程序期间,该光学检测单元与该第二滑座之间的相对位置为固定。In order to achieve the above and other purposes, the present invention discloses a target image alignment device, which is applied to an exposure machine for the alignment process between the target of the substrate and the film. The exposure machine includes two parts for carrying the substrate and the film An exposure frame unit, the two exposure frame units are alternately reciprocally transferred to the alignment position and the exposure position along the first direction, the target image alignment device includes a two-dimensional transfer unit and an optical detection unit, the two-dimensional shift The loading unit includes a first sliding rail, a first sliding seat, a second sliding rail and a second sliding seat. The first sliding rail is used to be arranged on the exposure machine and is located on the adjacent side of the alignment position, and its sliding direction Parallel to the first direction; the first sliding seat is movably arranged on the first sliding rail to be driven to slide; the second sliding rail is combined with the first sliding seat and its sliding direction is parallel to The second direction is arranged in a manner extending above the alignment position, and the second direction is perpendicular to the first direction; the second sliding seat is movably arranged on the second slide rail to be driven to slide; the optical detection unit Installed on the second sliding seat, the optical detection unit has a light source group and a camera. During the alignment process, the relative position between the optical detection unit and the second sliding seat is fixed.
上述的标靶影像对位装置,其中进一步包含顶升单元,该顶升单元用于设置于该曝光机的该对位位置的下方,以供抬升位于该对位位置的曝光框单元,而使各该曝光框单元与该光学检测单元之间相距有默认距离。The above-mentioned target image alignment device further includes a jacking unit, the jacking unit is used to be arranged below the alignment position of the exposure machine, so as to lift the exposure frame unit at the alignment position, so that There is a default distance between each exposure frame unit and the optical detection unit.
上述的标靶影像对位装置,其中进一步包含高度微调座,该高度微调座设置于该第二滑座上并承载该摄影机,用于调整该摄影机相对于位在该对位位置上的曝光框单元的位置。The above-mentioned target image alignment device, which further includes a height fine-adjustment seat, the height fine-adjustment seat is arranged on the second sliding seat and carries the camera, and is used to adjust the camera relative to the exposure frame at the alignment position The location of the unit.
上述的标靶影像对位装置,其中该光学检测单元具有雷射模块,用于对准该摄影机的视野范围内发射激光束。In the above-mentioned target image aligning device, the optical detection unit has a laser module for aligning and emitting a laser beam within the field of view of the camera.
为达上述目的及其他目的,本发明还公开了一种曝光机包含两个曝光框单元、上述的标靶影像对位装置及曝光装置,该两个曝光框单元沿第一方向交替地往返移载于对位位置与曝光位置;该曝光装置设置于该曝光位置上方,用于对各该曝光框单元曝光。To achieve the above and other objectives, the present invention also discloses an exposure machine comprising two exposure frame units, the above-mentioned target image alignment device and exposure device, the two exposure frame units alternately move back and forth along the first direction It is carried in the alignment position and the exposure position; the exposure device is arranged above the exposure position, and is used for exposing each exposure frame unit.
据此,相较于现有技术,上述的标把影像对位装置及曝光机,在结构配置上,该光学检测单元与位于该对位位置的曝光框单元较为靠近,因此可提高检测的精准度且可采用定倍率的镜头,此外,由于该光学检测单元于对位程序中与该第二滑座相对固定,即该光学检测单元于对位程序前、中、后的过程中均无需升降作动,因此减少了移载过程中的晃动而增进了精准度。Accordingly, compared with the prior art, in terms of structural configuration, the optical detection unit is closer to the exposure frame unit located at the alignment position, so the accuracy of detection can be improved. In addition, since the optical detection unit is relatively fixed to the second sliding seat during the alignment process, the optical detection unit does not need to be raised and lowered during the alignment process before, during, and after movement, thus reducing the shaking during the transfer process and improving accuracy.
附图说明Description of drawings
图1为现有的双面曝光机的侧面示意图;Fig. 1 is the side schematic diagram of existing double-sided exposure machine;
图2为现有的双面曝光机中光源模块下降接近对位位置的示意图;FIG. 2 is a schematic diagram of a light source module descending close to an alignment position in an existing double-sided exposure machine;
图3为本发明实施例的曝光机的侧视示意图;3 is a schematic side view of an exposure machine according to an embodiment of the present invention;
图4为本发明实施例的标把影像对位装置的俯视示意图;4 is a schematic top view of a marker image alignment device according to an embodiment of the present invention;
图5为本发明实施例的标把影像对位装置的侧视示意图;Fig. 5 is a schematic side view of a marker image alignment device according to an embodiment of the present invention;
图6为本发明实施例的标把影像对位装置的正面示意图;6 is a schematic front view of a marker image alignment device according to an embodiment of the present invention;
图7为本发明实施例的曝光机中对位程序开始的状态示意图;FIG. 7 is a schematic diagram of the start of the alignment program in the exposure machine according to the embodiment of the present invention;
图8为本发明实施例的曝光机中对位程序进行中的状态示意图;FIG. 8 is a schematic diagram of the state of the alignment program in the exposure machine according to the embodiment of the present invention;
图9为本发明实施例的曝光机中曝光框单元打开的状态示意图;9 is a schematic diagram of an open state of the exposure frame unit in the exposure machine according to the embodiment of the present invention;
图10为本发明实施例的标把影像对位装置中光学检测单元的示意图。FIG. 10 is a schematic diagram of an optical detection unit in a marker image alignment device according to an embodiment of the present invention.
【符号说明】【Symbol Description】
1 标靶影像对位装置1 Target image alignment device
2 曝光框单元2 exposure frame unit
3 曝光框单元3 exposure frame unit
4 曝光装置4 Exposure device
10 二维移载单元10 Two-dimensional transfer unit
11 第一滑轨11 First rail
12 第一滑座12 first slider
13 第二滑轨13 Second rail
14 第二滑座14 Second carriage
20 光学检测单元20 Optical detection unit
21 光源组21 light source group
22 摄影机22 cameras
23 雷射模块23 laser module
30 顶升单元30 jacking unit
40 高度微调座40 height fine adjustment seat
41 旋钮41 knob
100 标靶影像对位装置100 target image alignment device
110 CCD摄影机110 CCD cameras
120 光源模块120 light source module
130 升降模块130 lift module
200A 曝光框单元200A exposure frame unit
200B 曝光框单元200B exposure frame unit
300 曝光装置300 exposure device
具体实施方式detailed description
为充分了解本发明的目的、特征和功效,现通过下述具体的实施例,并配合附图,对本发明做进一步详细说明,说明如下:In order to fully understand the purpose, features and effects of the present invention, now through the following specific embodiments, and in conjunction with the accompanying drawings, the present invention will be further described in detail, as follows:
以下揭露的实施例当中,各组件前的冠词“一”可为“一个以上”,而非限制各组件于实施时的数量。In the embodiments disclosed below, the article "a" before each component may be "more than one", rather than limiting the quantity of each component during implementation.
参照图3,本发明实施例揭示包含标靶影像对位装置1的曝光机,该曝光机包含两个曝光框单元2,3、一标靶影像对位装置1及一曝光装置4。Referring to FIG. 3 , an embodiment of the present invention discloses an exposure machine including a target image alignment device 1 . The exposure machine includes two exposure frame units 2 , 3 , a target image alignment device 1 and an exposure device 4 .
该标靶影像对位装置1用于进行基板与底片(图中未示)的标靶间的对位程序,该曝光机包含承载基板与底片的两个曝光框单元2,3,该两个曝光框单元2,3沿一第一方向交替地往返移载于一对位位置与一曝光位置,各该曝光框单元于该对位位置上进行对位程序,以检测底片与基板间是否对准,其利用光学检测单元检测底片与基板上的标靶影像是否相迭合,若底片与基板上的标靶影像为相迭合,代表底片与基板为对准;在确定当前位于该对位位置上的曝光框单元中的底片与基板为对准之后,该曝光框单元被输送至该曝光位置,该曝光装置4设置于该曝光位置上方,用于对各该曝光框单元2,3曝光。The target image alignment device 1 is used to carry out the alignment process between the targets of the substrate and the film (not shown in the figure), the exposure machine includes two exposure frame units 2, 3 for carrying the substrate and the film, the two The exposure frame units 2 and 3 are alternately reciprocated and loaded at the alignment position and an exposure position along a first direction, and each exposure frame unit performs an alignment procedure at the alignment position to detect whether the film and the substrate are aligned. It uses the optical detection unit to detect whether the target image on the film and the substrate is superimposed. If the film and the target image on the substrate are superimposed, it means that the film and the substrate are aligned; After the negative in the exposure frame unit on the position is aligned with the substrate, the exposure frame unit is transported to the exposure position, and the exposure device 4 is arranged above the exposure position for exposing each of the exposure frame units 2, 3 .
在图3当中,该曝光框单元2位于该对位位置,该曝光框单元3位于该曝光位置。该曝光机上在该对位位置至该曝光位置的两侧设置输送轨道(图中未示),各该曝光框单元2,3通过输送轨道沿该第一方向交替地往返移载于该对位位置与该曝光位置。In FIG. 3 , the exposure frame unit 2 is located at the alignment position, and the exposure frame unit 3 is located at the exposure position. The exposure machine is provided with transport rails (not shown) on both sides from the alignment position to the exposure position, and each exposure frame unit 2, 3 is alternately reciprocated and loaded on the alignment position along the first direction through the transport rails. position and the exposure position.
请参照图4至图6,该标靶影像对位装置1包含一二维移载单元10及一光学检测单元20,该二维移载单元10包括一第一滑轨11、一第一滑座12、一第二滑轨13及一第二滑座14,该第一滑轨11用于设置于该曝光机上且位于该对位位置的邻侧,并以其滑动方向平行于该第一方向的方式配置;该第一滑座12可移动地设置于该第一滑轨11上以被驱动滑动,如图5所示;该第二滑轨13与该第一滑座12结合并以其滑动方向平行于一第二方向且延伸至该对位位置上方的方式配置,该第二方向垂直该第一方向;该第二滑座14可移动地设置于该第二滑轨13上以被驱动滑动,如图6所示;该光学检测单元20设置于该第二滑座14上,该光学检测单元20具有一光源组21及一摄影机22,在对位程序期间,该光学检测单元20与该第二滑座14之间的相对位置为固定。4 to 6, the target image alignment device 1 includes a two-dimensional transfer unit 10 and an optical detection unit 20, the two-dimensional transfer unit 10 includes a first slide rail 11, a first slide Seat 12, a second sliding rail 13 and a second sliding seat 14, the first sliding rail 11 is used to be arranged on the exposure machine and is located on the adjacent side of the alignment position, and its sliding direction is parallel to the first direction; the first sliding seat 12 is movably arranged on the first sliding rail 11 to be driven to slide, as shown in Figure 5; the second sliding rail 13 is combined with the first sliding seat 12 and Its sliding direction is parallel to a second direction and extends to the way above the alignment position, the second direction is perpendicular to the first direction; the second sliding seat 14 is movably arranged on the second sliding rail 13 to Driven to slide, as shown in Figure 6; the optical detection unit 20 is arranged on the second sliding seat 14, the optical detection unit 20 has a light source group 21 and a camera 22, during the alignment procedure, the optical detection unit The relative position between 20 and the second sliding seat 14 is fixed.
图4至6中示例该标靶影像对位装置1配置有两条第一滑轨11、四个第一滑座12、四条第二滑轨13及四个第二滑座14,两条第一滑轨11分别配置于该对位位置的相对两侧,图4显示该标靶影像对位装置1的俯视示意图,图5显示该标靶影像对位装置1的侧面示意图,图6显示该标靶影像对位装置1的正面示意图,各第一滑轨11上配置两个第一滑座12,而每一个第一滑座12上均配置有一条第二滑轨13及一个第二滑座14,并于每一个第二滑座14上装载有一光学检测单元20,是故,总共为四个的光学检测单元20对应于默认的基板与底片上的四个标靶位置。然而,前述的第一滑轨11、第一滑座12、第二滑轨13、第二滑座14及光学检测单元等组件的数量仅作为示例说明,本发明的范围并不限于本实施例与图式,其可依实际应用时,基板与底片上的标靶设计、设备机台的规格等因素进行变化。4 to 6 illustrate that the target image alignment device 1 is equipped with two first slide rails 11, four first slide seats 12, four second slide rails 13 and four second slide seats 14, and two first slide rails 13 and four second slide seats 14. A slide rail 11 is respectively arranged on opposite sides of the alignment position. FIG. 4 shows a schematic top view of the target image alignment device 1. FIG. 5 shows a side schematic view of the target image alignment device 1. FIG. 6 shows the target image alignment device 1. The front schematic diagram of the target image alignment device 1, two first sliding seats 12 are arranged on each first sliding rail 11, and each first sliding seat 12 is equipped with a second sliding rail 13 and a second sliding seat seat 14, and an optical detection unit 20 is mounted on each second sliding seat 14, therefore, a total of four optical detection units 20 correspond to four target positions on the default substrate and film. However, the numbers of components such as the first slide rail 11, the first slide seat 12, the second slide rail 13, the second slide seat 14 and the optical detection unit mentioned above are only for illustration, and the scope of the present invention is not limited to this embodiment It can be changed according to factors such as the actual application, the target design on the substrate and negative film, and the specifications of the equipment.
当开始对位程序时,如图7所示,各该第一滑座12被驱动而于该第一滑轨11上沿该第一方向滑动,各该第一滑座12上的第二滑轨13一起移动;如图8所示,各该第一滑座12于该第一方向上接近标靶位置,再如图6所示地,各该第二滑座14被驱动沿该第二方向滑动,以使各该光学检测单元20与对应的标靶位置对位。When starting the alignment program, as shown in Figure 7, each of the first sliding seats 12 is driven to slide along the first direction on the first slide rail 11, and the second sliding seat on each of the first sliding seats 12 Rail 13 moves together; As shown in Figure 8, each of the first slides 12 approaches the target position in the first direction, and as shown in Figure 6, each of the second slides 14 is driven along the second slide in a direction so that each of the optical detection units 20 is aligned with the corresponding target position.
如图9所示,各该曝光框单元2欲打开以供取出曝光后的基板并放入待曝光的基板、或更换底片之前,各该第一滑座12被驱动沿该第一方向并朝向该曝光位置的方向移动,使该第一滑座12连同该第二滑轨13、该第三滑座14与该光学检测单元20停滞于该对位位置后侧,而空出了该对位位置正上方的空间,以使该曝光框单元2的上框体可向上掀起。As shown in FIG. 9 , each of the exposure frame units 2 is intended to be opened for taking out the exposed substrate and putting the substrate to be exposed, or before replacing the film, each of the first sliding seats 12 is driven along the first direction and toward The direction of the exposure position moves, so that the first slide 12 together with the second slide rail 13, the third slide 14 and the optical detection unit 20 stagnate at the rear side of the alignment position, leaving the alignment The space directly above the position, so that the upper frame body of the exposure frame unit 2 can be lifted upwards.
据此,本实施例的标把影像对位装置1,在对位程序中,该光学检测单元20通过该二维移载单元10沿该第一方向移动并再沿该第二方向移动,使该光学检测单元20移动至默认的标靶位置的正上方,在整个对位程序中,该光学检测单元20与该第二滑座14之间的相对位置为固定,故可解决习知技术中因光源组件下降靠近曝光框单元过程中会晃动,而降低对位精准度的问题,且可减少对位时间,进而提高效率及产能。Accordingly, in the alignment procedure of the marker image alignment device 1 of this embodiment, the optical detection unit 20 moves along the first direction through the two-dimensional transfer unit 10 and then moves along the second direction, so that The optical detection unit 20 moves to directly above the default target position, and the relative position between the optical detection unit 20 and the second sliding seat 14 is fixed during the entire alignment process, so it can solve the problems in the prior art. Because the light source component will shake when it is lowered close to the exposure frame unit, it will reduce the problem of alignment accuracy, and can reduce the alignment time, thereby improving efficiency and production capacity.
在本实施例中,该标把影像对位装置1包含一顶升单元30,该顶升单元30用于设置于该曝光机的该对位位置的下方,以供抬升位于该对位位置的曝光框单元2,而使各该曝光框单元2,3与该光学检测单元20之间相距一默认距离,是以,在对位程序时,该二曝光框单元2,3移动至该对位位置后可位于相同高度的位置,即该二曝光框单元2,3二者与该光学检测单元20的距离为相同,因此,本实施例的光学检测装置20中的摄影机22可采用倍率固定的镜头,而无需为了因应不同高度的曝光框单元而采用倍率可调的镜头,因此省去了调整倍率的时间,进而可增进效率。In this embodiment, the marker image alignment device 1 includes a jacking unit 30, which is used to be arranged below the alignment position of the exposure machine, for lifting the image at the alignment position. Expose the frame unit 2, so that each of the exposure frame units 2, 3 and the optical detection unit 20 is at a default distance, so that during the alignment procedure, the two exposure frame units 2, 3 move to the alignment Can be located at the position of the same height after the position, that is, the distance between the two exposure frame units 2 and 3 and the optical detection unit 20 is the same, therefore, the camera 22 in the optical detection device 20 of the present embodiment can adopt a fixed magnification The lens does not need to use a lens with adjustable magnification in response to the exposure frame units of different heights, so the time for adjusting the magnification is saved, and the efficiency can be improved.
此外,该光学检测单元20可具有一雷射模块23,当一开始欲定位标靶位置时,调整该雷射模块23用于对准该摄影机22的视野范围内发射激光束,以根据激光束指向位置来确认底片上的标靶位置,进而辅助确立该摄影机22能清楚取得标靶影像的位置,来作为该光学检测模块20的默认定位。据此,藉由该雷射模块23的设置,可使该光学检测单元20的默认定位更加易于操作。In addition, the optical detection unit 20 can have a laser module 23. When the target position is to be located at the beginning, the laser module 23 is adjusted to emit a laser beam in the field of view of the camera 22, so as to Point to the position to confirm the target position on the film, and then help to establish the position where the camera 22 can clearly obtain the target image as the default position of the optical detection module 20 . Accordingly, with the arrangement of the laser module 23, the default position of the optical detection unit 20 can be easier to operate.
参照图10,该标把影像对位装置1进一步包含一高度微调座40,该高度微调座40设置于该第二滑座14上并承载该摄影机22,用于调整该摄影机22相对于位在该对位位置上的曝光框单元的距离(即高度),以用于微调校正。该高度微调座40具有一旋钮41,以供旋转该旋钮41来升降该摄影机22。Referring to FIG. 10 , the image alignment device 1 further includes a height fine-adjustment seat 40, which is arranged on the second sliding seat 14 and carries the camera 22 for adjusting the camera 22 relative to the The distance (that is, the height) of the exposure frame unit at the alignment position is used for fine-tuning and correction. The height fine-tuning base 40 has a knob 41 for rotating the knob 41 to raise and lower the camera 22 .
本实施例中,较佳地是,在同一批待曝光基板的制程中,该光学检测单元20的光源组21与摄影机22相对于位在该对位位置上的曝光框单元的距离(即高度)只需一开始进行调整或校正,在对位程序中该光学检测单元20的光源组21与摄影机22任一者相对于位在该对位位置上的曝光框单元的距离(即高度)为固定而不会升降作动。In this embodiment, preferably, in the process of the same batch of substrates to be exposed, the distance between the light source group 21 and the camera 22 of the optical detection unit 20 relative to the exposure frame unit at the alignment position (that is, the height ) only needs to be adjusted or corrected at the beginning. In the alignment procedure, the distance (ie height) between the light source group 21 and the camera 22 of the optical detection unit 20 relative to the exposure frame unit at the alignment position is Fixed without lifting action.
据此,相较于现有技术,本实施例的标把影像对位装置及曝光机,在结构配置上,该光学检测单元与位于该对位位置的曝光框单元较为靠近,因此可提高检测的精准度且可采用定倍率的镜头,此外,由于该光学检测单元在对位程序中与该第二滑座相对固定,即该光学检测单元于对位程序前、中、后的过程中均无需升降作动,因此减少了移载过程中的晃动而增进了精准度。Accordingly, compared with the prior art, in terms of structural configuration, the optical detection unit is relatively close to the exposure frame unit at the alignment position in the image alignment device and exposure machine of this embodiment, so the detection can be improved. The accuracy and fixed magnification lens can be used. In addition, since the optical detection unit is relatively fixed with the second sliding seat in the alignment procedure, that is, the optical detection unit is uniform in the process of alignment before, during and after the alignment procedure. There is no need for lifting action, so the shaking during the transfer process is reduced and the accuracy is improved.
本发明在上文中已通过较佳实施例揭露,然而熟习本领域技术人员应理解的是,该实施例仅用于描绘本发明,而不应解读为限制本发明的范围。应注意的是,凡是与该实施例等效的变化与置换,均应设为涵盖于本发明的范畴内。因此,本发明的保护范围应当以权利要求书所界定的范围为准。The present invention has been disclosed above through preferred embodiments, but those skilled in the art should understand that the embodiments are only used to describe the present invention, and should not be construed as limiting the scope of the present invention. It should be noted that all changes and substitutions equivalent to this embodiment should be included within the scope of the present invention. Therefore, the protection scope of the present invention should be determined by the scope defined in the claims.
Claims (5)
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