[go: up one dir, main page]

CN106371157A - Neutral light baffle for space environment - Google Patents

Neutral light baffle for space environment Download PDF

Info

Publication number
CN106371157A
CN106371157A CN201610779588.4A CN201610779588A CN106371157A CN 106371157 A CN106371157 A CN 106371157A CN 201610779588 A CN201610779588 A CN 201610779588A CN 106371157 A CN106371157 A CN 106371157A
Authority
CN
China
Prior art keywords
glass
light
neutral light
nickel
thin film
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
CN201610779588.4A
Other languages
Chinese (zh)
Inventor
李林
许旻
赵印中
吴春华
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Lanzhou Institute of Physics of CAST
Original Assignee
Lanzhou Institute of Physics of CAST
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Lanzhou Institute of Physics of CAST filed Critical Lanzhou Institute of Physics of CAST
Priority to CN201610779588.4A priority Critical patent/CN106371157A/en
Publication of CN106371157A publication Critical patent/CN106371157A/en
Pending legal-status Critical Current

Links

Classifications

    • GPHYSICS
    • G02OPTICS
    • G02BOPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B1/00Optical elements characterised by the material of which they are made; Optical coatings for optical elements
    • G02B1/10Optical coatings produced by application to, or surface treatment of, optical elements

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Surface Treatment Of Glass (AREA)

Abstract

本发明提出了一种可用于空间环境的中性挡光片,属于薄膜技术领域。该挡光片由玻璃基底与镍基高温合金薄膜构成,所述的玻璃基底为具有抗辐照性能的光学玻璃;其中镍基高温合金薄膜镀附于玻璃基底上。该挡光片可实现较大波长范围内的透光率调节,且制备方法简单、可靠性好、成本低;其透过率不会随温度、辐照等环境条件而变化,具有优异的抗空间辐照性能,可用于空间环境下需要对光线强度进行中性衰减的场合。

The invention provides a neutral light-blocking sheet that can be used in a space environment, and belongs to the technical field of thin films. The light-shielding sheet is composed of a glass substrate and a nickel-based superalloy thin film, the glass substrate is optical glass with radiation resistance; wherein the nickel-based superalloy thin film is plated on the glass substrate. The light blocking sheet can realize the adjustment of the light transmittance in a large wavelength range, and the preparation method is simple, the reliability is good, and the cost is low; the transmittance will not change with environmental conditions such as temperature and radiation, and has excellent resistance The space radiation performance can be used in occasions that require neutral attenuation of light intensity in a space environment.

Description

一种可用于空间环境的中性挡光片A neutral light barrier that can be used in space environments

技术领域technical field

本发明涉及一种可用于空间环境的中性挡光片,属于薄膜技术领域。The invention relates to a neutral light-blocking sheet that can be used in a space environment, and belongs to the technical field of thin films.

背景技术Background technique

中性挡光片的作用是对通过它的光线强度进行衰减,这种衰减是中性衰减(非波长选择性衰减),也就是对各种不同波长的光线的减弱能力是等同的(不同波长所对应的透光率的变化值是相同的)。中性挡光片在地面常规环境主要使用在摄影领域,主要作用是控制进光量、防止相机过度曝光等。随着空间技术的发展,中性挡光片将应用于空间技术,在空间环境下,要求中性挡光片透光率不随温度、辐照等环境条件而发生变化。The function of the neutral light blocking film is to attenuate the light intensity passing through it. This attenuation is neutral attenuation (non-wavelength selective attenuation), that is, the attenuation ability of light of various wavelengths is equal (different wavelengths The corresponding changes in light transmittance are the same). Neutral light blocking film is mainly used in the field of photography in the conventional environment on the ground. Its main function is to control the amount of light entering and prevent the camera from overexposure. With the development of space technology, neutral light barriers will be applied to space technology. In the space environment, the light transmittance of neutral light barriers is required not to change with environmental conditions such as temperature and radiation.

发明内容Contents of the invention

有鉴于此,本发明的目的在于提供一种可用于空间环境的中性挡光片,这种中性挡光片结构简单且能够满足空间环境下的使用要求。In view of this, the purpose of the present invention is to provide a neutral light-blocking sheet that can be used in a space environment. This neutral light-blocking sheet has a simple structure and can meet the use requirements in a space environment.

本发明的目的由以下技术方案实现:The purpose of the present invention is achieved by the following technical solutions:

一种可用于空间环境的中性挡光片,所述中性挡光片由玻璃基底和镍基高温合金薄膜构成;所述的玻璃基底为具有抗辐照性能的光学玻璃;其中镍基高温合金薄膜镀附于玻璃基底上。A neutral light-shielding sheet that can be used in a space environment, the neutral light-shielding sheet is composed of a glass substrate and a nickel-based superalloy thin film; the glass substrate is optical glass with radiation resistance; wherein the nickel-based high-temperature The alloy thin film is deposited on the glass substrate.

优选的,玻璃基底为熔石英玻璃或抗辐照玻璃。Preferably, the glass substrate is fused silica glass or radiation-resistant glass.

本发明所述的一种可用于空间环境的中性挡光片可通过下述方法制备,具体步骤为:A kind of neutral light-blocking film that can be used in space environment according to the present invention can be prepared by following method, concrete steps are:

第一步,采用离子源对玻璃基底表面进行清洗;In the first step, an ion source is used to clean the surface of the glass substrate;

第二步,在玻璃基底表面镀制镍基高温合金薄膜。In the second step, a nickel-based superalloy film is plated on the surface of the glass substrate.

所述的镍基高温合金薄膜镀制方法为常规薄膜制备方法,优选磁控溅射法。The nickel-based superalloy thin film plating method is a conventional thin film preparation method, preferably magnetron sputtering.

所述的中性挡光片,其镍基高温合金薄膜的厚度不同,所对应的透光率不同,可通过制备不同厚度的镍基高温合金薄膜得到不同透光率的中性挡光片。The neutral light-blocking sheet has different thicknesses of the nickel-based superalloy thin films, and the corresponding light transmittance is different. Neutral light-blocking sheets with different light transmittances can be obtained by preparing nickel-based superalloy thin films with different thicknesses.

有益效果Beneficial effect

本发明所述的一种可用于空间环境的中性挡光片,该挡光片可实现较大波长范围内的透光率调节,且制备方法简单、可靠性好、成本低。其透过率不会随温度、辐照等环境条件而变化,具有优异的抗空间辐照性能(包括抗紫外辐照、抗带电粒子辐照以及抗原子氧等),能满足空间环境的使用要求,可应用于卫星相关部件。The neutral light-blocking sheet that can be used in a space environment according to the invention can realize the adjustment of light transmittance in a relatively large wavelength range, and has a simple preparation method, good reliability and low cost. Its transmittance will not change with environmental conditions such as temperature and radiation, and has excellent resistance to space radiation (including resistance to ultraviolet radiation, resistance to charged particle radiation, and anti-atomic oxygen, etc.), which can meet the needs of space environments. Requirements, can be applied to satellite related components.

附图说明Description of drawings

图1为本发明所述中性挡光片的结构示意图。FIG. 1 is a schematic structural view of the neutral light-blocking sheet of the present invention.

1-镍基高温合金薄膜,2-玻璃基底。1-Nickel-based superalloy thin film, 2-Glass substrate.

具体实施方式detailed description

以下结合实例具体实例对本发明作进一步描述,但本发明不局限于下述实例。The present invention will be further described below in conjunction with the specific example of example, but the present invention is not limited to following example.

实施例1Example 1

一种可用于空间环境的中性挡光片,其结构为玻璃基底2和镍基高温合金薄膜1。玻璃基底2为熔石英玻璃,厚度为1mm;镍基高温合金薄膜1为牌号GH3030的镍基高温合金材料,厚度为5nm,镍基高温合金薄膜1镀附于玻璃基底2上面。A neutral light-shielding sheet that can be used in a space environment has a structure of a glass substrate 2 and a nickel-based superalloy thin film 1 . The glass substrate 2 is fused silica glass with a thickness of 1 mm; the nickel-based superalloy film 1 is a nickel-based superalloy material of the brand GH3030 with a thickness of 5 nm, and the nickel-based superalloy film 1 is plated on the glass substrate 2 .

所述一种可用于空间环境的中性挡光片的制备方法如下:The preparation method of a kind of neutral light-shielding film that can be used in space environment is as follows:

第一步,采用离子源对熔石英玻璃表面进行清洗10min,The first step is to use an ion source to clean the surface of the fused silica glass for 10 minutes,

第二步,在熔石英玻璃表面采用直流磁控溅射法镀制镍基高温合金薄膜1,靶材为GH3030镍基高温合金,溅射功率为50W,工作气体为Ar气,气体流量为20sccm,溅射压强为0.5Pa,靶基距为7cm,基底不加热,溅射时间为1min。In the second step, nickel-based superalloy film 1 is plated on the surface of fused silica glass by DC magnetron sputtering, the target material is GH3030 nickel-based superalloy, the sputtering power is 50W, the working gas is Ar gas, and the gas flow rate is 20 sccm , the sputtering pressure is 0.5Pa, the target-base distance is 7cm, the substrate is not heated, and the sputtering time is 1min.

得到镍基高温合金薄膜1厚度为5nm的一种可用于空间环境的中性挡光片。A neutral light-shielding sheet that can be used in a space environment with a nickel-based superalloy thin film 1 having a thickness of 5 nm is obtained.

使用PerkinElmer Lanbda-900分光光度计对所述一种可用于空间环境的中性挡光片进行测量,在波长为550nm时光的透光率85%。A PerkinElmer Lanbda-900 spectrophotometer is used to measure the neutral light-blocking film that can be used in the space environment, and the light transmittance at a wavelength of 550 nm is 85%.

实施例2Example 2

一种可用于空间环境的中性挡光片,其结构为玻璃基底2和镍基高温合金薄膜1。玻璃基底2为抗辐照玻璃,厚度为0.1mm;镍基高温合金薄膜1为牌号GH3044的镍基高温合金材料,厚度为30nm,镍基高温合金薄膜1镀附于玻璃基底2上面。A neutral light-shielding sheet that can be used in a space environment has a structure of a glass substrate 2 and a nickel-based superalloy thin film 1 . The glass substrate 2 is radiation-resistant glass with a thickness of 0.1 mm; the nickel-based superalloy film 1 is a nickel-based superalloy material of the brand GH3044, with a thickness of 30 nm, and the nickel-based superalloy film 1 is plated on the glass substrate 2 .

所述一种可用于空间环境的中性挡光片的制备方法如下:The preparation method of a kind of neutral light-shielding film that can be used in space environment is as follows:

第一步,采用离子源对抗辐照玻璃表面进行清洗10min;The first step is to use an ion source to clean the anti-irradiation glass surface for 10 minutes;

第二步,在抗辐照玻璃表面采用射频磁控溅射法镀制镍基高温合金薄膜1,靶材为GH3044镍基高温合金,溅射功率为100W,工作气体为Ar气,气体流量为20sccm,溅射压强为0.2Pa,靶基距为6cm,基底不加热,溅射时间为3min。得到镍基高温合金薄膜1厚度为30nm的一种可用于空间环境的中性挡光片。In the second step, a nickel-based superalloy thin film 1 is plated on the surface of the radiation-resistant glass by radio frequency magnetron sputtering, the target material is GH3044 nickel-based superalloy, the sputtering power is 100W, the working gas is Ar gas, and the gas flow rate is 20sccm, the sputtering pressure is 0.2Pa, the target base distance is 6cm, the substrate is not heated, and the sputtering time is 3min. A neutral light-shielding sheet that can be used in a space environment with a nickel-based superalloy thin film 1 having a thickness of 30 nm is obtained.

使用PerkinElmer Lanbda-900分光光度计对所述一种可用于空间环境的中性挡光片进行测量,在波长为775nm时光的透光率60%。A PerkinElmer Lanbda-900 spectrophotometer is used to measure the neutral light-blocking sheet that can be used in a space environment, and the light transmittance at a wavelength of 775 nm is 60%.

本发明包括但不限于以上实施例,凡是在本发明精神的原则之下进行的任何等同替换或局部改进,都将视为在本发明的保护范围之内。The present invention includes but is not limited to the above embodiments, and any equivalent replacement or partial improvement under the principle of the spirit of the present invention will be considered within the protection scope of the present invention.

Claims (4)

1. a kind of neutral light barrier that can be used for spatial environmentss it is characterised in that: described neutrality light barrier by substrate of glass (2) and Nickel base superalloy thin film (1) is constituted;Described substrate of glass (2) is the optical glass with anti-radiation performance, wherein Ni-based High temperature alloy thin film (1) plating invests in substrate of glass (2).
2. a kind of neutral light barrier that can be used for spatial environmentss according to claim 1 it is characterised in that: substrate of glass (2) material is fused quartz glass or Flouride-resistani acid phesphatase glass.
3. a kind of preparation method of the neutral light barrier that can be used for spatial environmentss of the present invention it is characterised in that: step is:
Using ion source, glass basic surface is carried out;
It is coated with nickel base superalloy thin film in glass basic surface.
4. a kind of neutral light barrier that can be used for spatial environmentss according to claim 3 preparation method it is characterised in that: Described nickel base superalloy thin-film-coating method is magnetron sputtering method.
CN201610779588.4A 2016-08-30 2016-08-30 Neutral light baffle for space environment Pending CN106371157A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
CN201610779588.4A CN106371157A (en) 2016-08-30 2016-08-30 Neutral light baffle for space environment

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
CN201610779588.4A CN106371157A (en) 2016-08-30 2016-08-30 Neutral light baffle for space environment

Publications (1)

Publication Number Publication Date
CN106371157A true CN106371157A (en) 2017-02-01

Family

ID=57899030

Family Applications (1)

Application Number Title Priority Date Filing Date
CN201610779588.4A Pending CN106371157A (en) 2016-08-30 2016-08-30 Neutral light baffle for space environment

Country Status (1)

Country Link
CN (1) CN106371157A (en)

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN1469179A (en) * 2003-06-19 2004-01-21 武汉光迅科技有限责任公司 Prepn process and device of continuously variable light attenuating plate
US20070211359A1 (en) * 2003-08-15 2007-09-13 Meade Instruments Corp. Neutral white-light filter device
CN101446667A (en) * 2008-12-24 2009-06-03 武汉光迅科技股份有限公司 Method for producing high power varying optical attenuator

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN1469179A (en) * 2003-06-19 2004-01-21 武汉光迅科技有限责任公司 Prepn process and device of continuously variable light attenuating plate
US20070211359A1 (en) * 2003-08-15 2007-09-13 Meade Instruments Corp. Neutral white-light filter device
CN101446667A (en) * 2008-12-24 2009-06-03 武汉光迅科技股份有限公司 Method for producing high power varying optical attenuator

Similar Documents

Publication Publication Date Title
CN105093852B (en) Ultraviolet photolithographic machine exposure system accurate deielectric-coating speculum and its plating method
CN102736400B (en) Dustproof pellicle film, manufacturing method thereof, and dustproof pellicle component with pellicle film attached
CN108169832B (en) 2.75-2.95-micrometer-sized medium-wave-transmitting infrared filter and preparation method thereof
CN103376642B (en) Photomask blank and manufacture method thereof
CN104505561B (en) A kind of multiband terahertz filter and preparation method thereof
CN111801618A (en) Mask blank, phase shift mask, and manufacturing method of semiconductor device
CN106443840A (en) Ultraviolet-transmission heat-insulation film for ultraviolet curing
CN116056437A (en) Design and preparation method of a random structure metal grid electromagnetic shielding film
CN104570166A (en) South Pole infrared telescope sealing window capable of preventing and removing frost and manufacturing method thereof
CN104090322A (en) Terahertz optical window integrated with infrared radiation resisting structure and manufacturing method
CN104297817B (en) A kind of have laser high reflectance, the film system of infrared light high-transmission rate and preparation method
CN105301896B (en) Photoetching method based on metal glass film phase-change material
CN103245992A (en) 1.55 mu m-1.75 mu m transmissive short-wave infrared optical filter and preparation method
CN206990837U (en) Optics regulates and controls electromagnetic shielding glass
CN106371157A (en) Neutral light baffle for space environment
CN104297820A (en) Multilayer film improving extreme ultraviolet spectral purity and oxidation resistance
CN104749663A (en) Multilayer film with extreme-ultraviolet spectral purity and resistance to irradiation damage
CN103698829A (en) Combined multilayer dielectric film cut-off filter device
CN107219546A (en) A kind of flat response multiple filter and preparation method thereof
CN204903941U (en) Ultraviolet photoetching machine exposure system is with accurate deielectric -coating speculum
CN101694287A (en) Device for filtering infrared light and visible light in near ultraviolet radiation appliance
CN104354365B (en) Infrared waveband diaphragm composite membrane and preparation method as well as composite material
TW201610482A (en) Structure of ultraviolet polarization component and manufacturing method thereof
CN104297819A (en) Preparation method for low stress deep ultraviolet multilayer film
CN107329278A (en) Bore hole 3D gratings and preparation method

Legal Events

Date Code Title Description
C06 Publication
PB01 Publication
SE01 Entry into force of request for substantive examination
SE01 Entry into force of request for substantive examination
WD01 Invention patent application deemed withdrawn after publication

Application publication date: 20170201

WD01 Invention patent application deemed withdrawn after publication