CN106048540A - Preparation method of titanium-zirconium metal nitride composite hard film with continuous component change - Google Patents

Abstract

A method for preparing a titanium-zirconium metal nitride composite hard film with a continuously changing composition relates to a method for preparing a metal film. The method includes the determination of deposition technology, determination of arc source target material, determination of arc source number, Selection and pretreatment of the substrate, determination of the pre-baking process, determination of the pre-bombardment cleaning process, determination of the preparation process of the titanium-zirconium alloy transition layer, determination of the deposition time, control of the partial pressure of the reaction gas corresponding to the deposition time, and The determination of the arc source target arc current corresponding to the deposition time, the determination of the negative bias voltage of the substrate corresponding to the deposition time, the control of the temperature of the coating chamber, and the rotary coating of the workpiece rack; the product of the present invention has high adhesion and good stability, which is beneficial to The invention improves the wear life of the titanium-zirconium nitride composite hard film, and is suitable for application in the industrial field.

Description

Preparation method of titanium-zirconium metal nitride composite hard film with continuously changing composition

technical field

The invention relates to a method for preparing a metal nitride composite hard film, in particular to a method for preparing a metal nitride composite hard film with a continuously changing composition by using a multi-arc ion plating technology, such as a titanium-zirconium metal nitride composite film with a continuously changing composition. Method for preparing hard film.

Background technique

Multi-arc ion plating is a physical vapor deposition technology with multiple cathode arc evaporation sources that can evaporate simultaneously. It has the remarkable characteristics of fast deposition speed, dense film structure, strong adhesion, and good uniformity. This technology is applicable to the preparation of various hard reaction films, and has been successfully applied in the preparation of nitride hard reaction films.

For titanium-based nitride hard reaction films with single-layer, double-layer and gradient composition changes, there are generally the following disadvantages: 1. Obvious interfaces with compositional differences are prone to appear in the film structure, resulting in film composition 2. It is easy to have a contradiction between the hardness of the film layer and the adhesion of the film layer, that is, it is difficult to satisfy the hardness and adhesion force at the same time; 3. It is easy to generate a large internal stress in the film layer, which affects the hard reaction film. The thermal shock performance will affect the use effect and service life.

Contents of the invention

The purpose of the present invention is to provide a method for preparing a titanium-zirconium metal nitride composite hard film whose composition changes continuously. Due to the internal stress caused by the large compositional change at the composition difference interface, it can ensure the simultaneous realization of high adhesion, high hardness and high thermal shock, and has good stability.

Technical scheme of the present invention is:

The preparation method of the titanium-zirconium metal nitride composite hard film whose composition changes continuously comprises:

1. Determination of deposition technology: Determine multi-arc ion plating as a preparation technology for titanium-zirconium nitride composite hard film with continuously changing composition.

2. Determination of the arc source target: determine the combination of equal quantities of titanium and zirconium targets with a purity of 99.99% as the coated arc source target, or a titanium-zirconium alloy target as the arc source target, and the Ti/Zr atomic ratio of the titanium-zirconium alloy target =(45-50)/(55-50).

3. Determination of the number of arc sources: Determine the number of multi-arc ion plating arc sources to be used according to the uniformity requirements of the film layer and the temperature limit of the metal substrate to be coated, that is, to ensure the uniformity of the film layer, at least two Arc sources with different heights and different orientations and arranged at 90 degrees start arcing at the same time, and at the same time, it is necessary to ensure that the temperature of the coating chamber does not exceed the allowable temperature of the substrate during the entire process of the metal substrate to be coated in the coating chamber.

4. Selection and pretreatment of the metal substrate to be coated: select high-speed steel or hard alloy as the metal substrate to be coated, and use metal detergent to perform conventional degreasing and decontamination treatment before putting it into the coating chamber for coating. The surface is polished, and finally ultrasonically cleaned with acetone and ethanol respectively, dried with a hair dryer for later use, and then placed on the workpiece rack in the coating room.

5. Determination of the pre-baking process: refers to the heating and baking process carried out before the ion bombardment process in order to obtain the titanium-zirconium nitride composite hard film with continuously changing composition. The vacuum degree in the coating chamber reaches 3×10 ^-2 Pa At this time, start the baking current. In order to avoid the accumulation of thermal stress, use a small current to bake, and keep the workpiece frame carrying the substrate rotating at a constant speed. The time it takes for the temperature of the coating chamber to reach 200°C is not less than 20 minutes.

6. Determination of the pre-bombardment cleaning process: refers to the ion bombardment process before coating the titanium-zirconium alloy transition layer in order to obtain the titanium-zirconium nitride composite hard film with continuously changing composition. When the vacuum degree of the back and bottom of the coating chamber reaches 8.0× 10 ^-3 Pa, when the pre-baking temperature reaches 200°C, fill in argon gas to make the pressure of the coating chamber reach 2.2×10 ^-1 Pa-2.8×10 ^-1 Pa, turn on each arc source, according to the size of the arc source target, Keeping the arc current stable at a current value between 50-80 amperes, the ion bombardment was carried out for 15 minutes, and the bombardment bias was gradually increased from 350 volts to 400 volts.

7. Determination of the preparation process of the titanium-zirconium alloy transition layer: the argon pressure in the coating chamber is kept at 2.2×10 ^-1 Pa-2.8×10 ^-1 Pa, and an equal number of titanium targets and zirconium targets, or titanium The arc current of the zirconium alloy target is set at a certain current value between 50-80 amperes, the negative bias voltage of the substrate is set to -200 volts, the arc start time is 10 minutes, and then the argon pressure is adjusted to 2.8´10 ^-1 Pa , to prepare for the deposition of titanium-zirconium nitride composite hard film with continuously changing composition.

8. Determination of deposition time: refers to the deposition time determined to obtain a titanium-zirconium nitride composite hard film with continuously changing composition. Deposition time, and then divide the entire deposition time into 3:1, wherein the first half of the deposition is 3/4 of the total deposition time, and the second half of the deposition is 1/4 of the total deposition time.

9. The control of the partial pressure of the reaction gas corresponding to the deposition time: refers to the control process of the partial pressure of the reaction gas nitrogen determined in order to obtain the titanium-zirconium nitride composite hard film with continuously changing composition. , to ensure that the partial pressure of nitrogen increases at a uniform rate, and at the same time reduce the partial pressure of argon through flow adjustment accordingly, so that the total pressure of the two remains constant at 2.8×10 ^-1 Pa during the deposition process. At the end of this stage, nitrogen The partial pressure reaches 2.8×10 ^-1 Pa, the argon partial pressure drops to 0 Pa, and then the nitrogen pressure is kept at 2.8×10 ^-1 Pa, and the second half of the deposition is carried out until the deposition is completed.

10. Determination of the arc source target arc current corresponding to the deposition time: refers to the current selection of the arc source target determined to obtain the titanium-zirconium nitride composite hard film with continuously changing composition. During the first half of the deposition, keep the current used The target arc current of the arc source is consistent with step 6 of the aforementioned method. In the second half of the deposition, the arc source target arc current is adjusted, and the arc current of each arc source target is increased by 2-3 amperes until the end of the deposition process.

11. Determination of the substrate negative bias voltage corresponding to the deposition time: refers to the selection of the substrate negative bias voltage determined to obtain a titanium-zirconium nitride composite hard film with continuously changing composition. In the first half of the deposition period, the substrate negative bias voltage Select -180--200 volts, and in the second half of the deposition, the negative bias voltage of the substrate is selected at -120--130 volts.

12. Temperature control of the coating chamber: refers to the temperature limit of the coating chamber determined to obtain the titanium-zirconium nitride composite hard film with continuously changing composition. For the high-speed steel substrate, the temperature of the coating chamber cannot exceed 380 degrees Celsius; for the cemented carbide substrate, The temperature of the coating chamber cannot exceed 420 degrees Celsius.

13. Rotary coating of the workpiece rack: the workpiece rack is kept during the whole process of slow heating and baking in the coating chamber, ion bombardment of the substrate, coating of titanium-zirconium alloy transition layer, and deposition of titanium-zirconium nitride composite hard film with continuously changing composition. Rotate at a speed of 6 rpm.

According to the preparation method of the titanium-zirconium nitride composite hard film with continuously changing composition proposed by the present invention, the above-mentioned titanium-zirconium nitride composite hard film with continuously changing composition can be obtained, and the composite hard film can ensure that the composition of the film layer varies from The quasi-linear continuous change from the metal substrate to the surface of the film layer, especially ensures the quasi-linear continuous increase of the content of N element from the metal substrate to the surface of the film layer, and no composition difference interface is formed in the film layer, thus ensuring high adhesion and high hardness Simultaneous realization of high thermal shock resistance reduces the internal stress of the film layer and has good stability.

Compared with the prior art, the present invention determines the preparation technology of multi-arc ion plating as a titanium-zirconium nitride composite hard film whose composition changes continuously, determines the composition, quantity and arrangement orientation of the target material, and determines the thickness of the metal substrate to be coated. Selection and pretreatment process, pre-bombardment cleaning process, preparation process of titanium-zirconium alloy transition layer, deposition time, reaction gas partial pressure, arc source target arc current, substrate negative bias and coating chamber temperature ensure that the film composition is from metal The quasi-linear continuous change from the substrate to the surface of the film layer reduces the internal stress caused by the composition difference interface formed by the large composition change in the film layer, thus ensuring the simultaneous realization of high adhesion, high hardness and high thermal shock resistance. And it has good stability, which is more conducive to improving the wear life of the titanium-zirconium nitride composite hard film, and is more suitable for application in the industrial field.

detailed description

Example 1

A titanium-zirconium nitride composite hard film with continuously changing composition is prepared on commercial high-speed steel W18Cr4V, and the method is as follows:

1. Determination of deposition technology: Determine multi-arc ion plating as a preparation technology for titanium-zirconium nitride composite hard film with continuously changing composition.

2. Determination of the arc source target: Determine the combination of equal quantities of titanium and zirconium targets with a purity of 99.99% as the coated arc source target.

3. Determination of the number of arc sources: Determine the number of multi-arc ion plating arc sources to be used according to the uniformity requirements of the film layer and the temperature limit of the metal substrate to be coated, that is, to ensure the uniformity of the film layer, select 2 titanium The target and 2 zirconium targets are used as the arc source, and each pair of targets, that is, 1 titanium target and 1 zirconium target, are located at different heights and different orientations and arranged at 90 degrees to start arcs at the same time, while ensuring that the metal to be coated During the whole process of the substrate in the coating chamber, the temperature of the coating chamber shall not exceed the allowable temperature of the substrate.

4. Selection and pretreatment of the metal substrate to be coated: before the high-speed steel W18Cr4V substrate to be coated is placed in the coating chamber for coating, it is routinely degreased, decontaminated, and surface-polished with metal detergent, and finally cleaned with Ultrasonic cleaning with acetone and ethanol, drying with a hair dryer for later use, and then placing it on the workpiece rack in the coating room.

5. Determination of the pre-baking process: refers to the heating and baking process carried out before the ion bombardment process in order to obtain the titanium-zirconium nitride composite hard film with continuously changing composition. The vacuum degree in the coating chamber reaches 3×10 ^-2 Pa , start the baking current, in order to avoid thermal stress accumulation, adopt small electric current to bake, and keep the work frame that carries substrate to rotate at a constant speed, the time used for coating room temperature to reach 200 ℃ is 23 minutes.

6. Determination of the pre-bombardment cleaning process: refers to the ion bombardment process before coating the titanium-zirconium alloy transition layer in order to obtain the titanium-zirconium nitride composite hard film with continuously changing composition. When the vacuum degree of the back and bottom of the coating chamber reaches 8.0× 10 ^-3 Pa, when the pre-baking temperature reaches 200°C, fill in argon gas to make the pressure of the coating chamber reach 2.5×10 ^-1 Pa, turn on each arc source, keep the arc current stable at 58 amperes, carry out ion bombardment for 15 minutes, and bombard The bias voltage was gradually increased from 350 volts to 400 volts.

7. Determination of the preparation process of the titanium-zirconium alloy transition layer: the argon pressure in the coating chamber is kept at 2.5×10 ^-1 Pa, the arc currents of the two titanium targets and the two zirconium targets are both set at 58 amperes, and the substrate is negatively biased The pressure was -200 volts, the arcing time was 10 minutes, and then the argon pressure was adjusted to 2.8×10 ^-1 Pa to prepare for the deposition of a titanium-zirconium nitride composite hard film with continuously changing composition.

8. Determination of deposition time: refers to the deposition time determined to obtain a titanium-zirconium nitride composite hard film with continuously changing composition. The deposition time was 80 minutes, and then the entire deposition time was divided into two parts, wherein the first half of the deposition was determined to be 60 minutes, and the second half of the deposition was determined to be 20 minutes.

9. The control of the partial pressure of the reaction gas corresponding to the deposition time: refers to the control process of the partial pressure of the reaction gas nitrogen determined in order to obtain a titanium-zirconium nitride composite hard film with a continuously changing composition. During the first half of the deposition, the flow rate is adjusted. Ensure that the partial pressure of nitrogen increases at a uniform rate, and at the same time reduce the partial pressure of argon through flow adjustment accordingly, so that the total pressure of the two remains constant at 2.8×10 ^-1 Pa during the deposition process. At the end of this stage, the nitrogen partial pressure The pressure reaches 2.8×10 ^-1 Pa, the argon partial pressure drops to 0 Pa, and then the nitrogen pressure is kept at 2.8×10 ^-1 Pa, and the second half of the deposition is carried out until the end of the deposition.

10. Determination of the arc source target current corresponding to the deposition time: refers to the current selection of the arc source target determined to obtain a titanium-zirconium nitride composite hard film with a continuously changing composition. During the first half of the deposition, keep the used The arc current of the arc source target is consistent with the aforementioned method step 6, and the arc current of each arc source target is stable at 58 amperes. In the second half of the deposition, the arc current of the arc source target is adjusted, and the arc current of each arc source target increases to 60 amps until the end of the deposition process.

11. Determination of the substrate negative bias voltage corresponding to the deposition time: refers to the selection of the substrate negative bias voltage determined to obtain a titanium-zirconium nitride composite hard film with continuously changing composition. In the first half of the deposition period, the substrate negative bias voltage Choose -180 volts, and choose -120 volts for the substrate negative bias during the second half of the deposition.

12. Control of the temperature of the coating chamber: refers to the temperature limit of the coating chamber determined to obtain the titanium-zirconium nitride composite hard film with continuously changing composition. In this embodiment, the maximum temperature of the coating chamber is 310 degrees Celsius.

13. Rotary coating of the workpiece rack: the workpiece rack is kept during the whole process of slow heating and baking in the coating chamber, ion bombardment of the substrate, coating of titanium-zirconium alloy transition layer, and deposition of titanium-zirconium nitride composite hard film with continuously changing composition. Rotate at a speed of 6 rpm.

The titanium-zirconium nitride composite hard film with continuously changing composition prepared by the above method is measured. The thickness of the film layer is 2.5 microns. , the N element content in the film layer increases quasi-linearly and continuously from the high-speed steel substrate to the surface of the film layer, and there is no composition difference interface in the film layer, which ensures the simultaneous realization of high adhesion, high hardness and high thermal shock resistance.

Example 2

To prepare a titanium-zirconium nitride composite hard film with continuously changing composition on the cemented carbide YT15 substrate, the method is as follows:

1. Determination of deposition technology: Determine multi-arc ion plating as a preparation technology for titanium-zirconium nitride composite hard film with continuously changing composition.

2. Determination of the arc source target: determine the titanium-zirconium alloy target as the arc source target, and the Ti/Zr atomic ratio of the titanium-zirconium alloy target is 45.5/54.5.

3. Determination of the number of arc sources: Determine the number of multi-arc ion plating arc sources to be used according to the uniformity requirements of the film layer and the temperature limit of the substrate to be coated, that is, to ensure the uniformity of the film layer, select 4 titanium zirconium The alloy target is used as the arc source, and each pair of targets is located at different heights and different orientations and arranged at 90 degrees to start the arc at the same time. At the same time, it is necessary to ensure that the temperature of the coating chamber does not exceed the allowable temperature of the substrate during the entire process of the metal substrate to be coated in the coating chamber. temperature.

4. Selection and pretreatment of the metal substrate to be coated: Before the hard alloy YT15 substrate to be coated is placed in the coating chamber for coating, it is routinely degreased, decontaminated, and surface polished with a metal detergent, and finally Ultrasonic cleaning with acetone and ethanol, drying with a hair dryer for later use, and then placing it on the workpiece rack in the coating room.

5. Determination of the pre-baking process: refers to the heating and baking process carried out before the ion bombardment process in order to obtain the titanium-zirconium nitride composite hard film with continuously changing composition. The vacuum degree in the coating chamber reaches 3×10 ^-2 Pa At this time, start the baking current. In order to avoid the accumulation of thermal stress, use a small current to bake, and keep the workpiece frame carrying the substrate rotating at a constant speed. The time it takes for the temperature of the coating chamber to reach 200°C is 25 minutes.

6. Determination of the pre-bombardment cleaning process: refers to the ion bombardment process before coating the titanium-zirconium alloy transition layer in order to obtain the titanium-zirconium nitride composite hard film with continuously changing composition. When the vacuum degree of the back and bottom of the coating chamber reaches 8.0× 10 ^-3 Pa, when the pre-baking temperature reaches 200°C, fill in argon gas to make the pressure of the coating chamber reach 2.5×10 ^-1 Pa, turn on each arc source, and keep the arc current stable at 60 amperes according to the size of the arc source target , ion bombardment was performed for 15 minutes, and the bombardment bias was gradually increased from 350 V to 400 V.

7. Determination of the preparation process of the titanium-zirconium alloy transition layer: the argon pressure in the coating chamber is kept at 2.5×10 ^-1 Pa, the arc currents of the four titanium-zirconium alloy targets are all set at 60 amperes, and the negative bias of the substrate is - 200 volts, the arcing time is 10 minutes, and then the argon pressure is adjusted to 2.8×10 ^-1 Pa to prepare for the deposition of a titanium-zirconium nitride composite hard film with continuously changing composition.

8. Determination of deposition time: refers to the deposition time determined to obtain a titanium-zirconium nitride composite hard film with continuously changing composition. The deposition time is 80 minutes, and then the whole deposition time is divided into two parts, wherein the first half of the deposition is 60 minutes, and the second half of the deposition is 20 minutes.

9. The control of the partial pressure of the reaction gas corresponding to the deposition time: refers to the control process of the partial pressure of the reaction gas nitrogen determined in order to obtain a titanium-zirconium nitride composite hard film with a continuously changing composition. During the first half of the deposition, the flow rate is adjusted. Ensure that the partial pressure of nitrogen increases at a uniform rate, and at the same time reduce the partial pressure of argon through flow adjustment accordingly, so that the total pressure of the two remains constant at 2.8×10 ^-1 Pa during the deposition process. At the end of this stage, the nitrogen partial pressure The pressure reaches 2.8×10 ^-1 Pa, the argon partial pressure drops to 0 Pa, and then the nitrogen pressure is kept at 2.8×10 ^-1 Pa, and the second half of the deposition is carried out until the end of the deposition.

10. Determination of the arc source target current corresponding to the deposition time: refers to the current selection of the arc source target determined to obtain a titanium-zirconium nitride composite hard film with a continuously changing composition. During the first half of the deposition, keep the used The arc source target current is consistent with step 6 of the aforementioned method. The arc current of each arc source target is stabilized at 60 amperes. In the second half of the deposition, the arc source target arc current is adjusted, and the arc current of each arc source target is increased to 62 amps. Ampere until the end of the deposition process.

11. Determination of the substrate negative bias voltage corresponding to the deposition time: refers to the selection of the substrate negative bias voltage determined to obtain a titanium-zirconium nitride composite hard film with continuously changing composition. In the first half of the deposition period, the substrate negative bias voltage Choose -200 volts, and choose -130 volts for the substrate negative bias during the second half of the deposition.

12. Control of the temperature of the coating chamber: refers to the temperature limit of the coating chamber determined to obtain the titanium-zirconium nitride composite hard film with continuously changing composition. In this embodiment, the maximum temperature of the coating chamber is 345 degrees Celsius.

13. Rotary coating of the workpiece rack: the workpiece rack is kept during the whole process of slow heating and baking in the coating chamber, ion bombardment of the substrate, coating of titanium-zirconium alloy transition layer, and deposition of titanium-zirconium nitride composite hard film with continuously changing composition. Rotate at a speed of 6 rpm.

The titanium-zirconium nitride composite hard film with continuously changing composition prepared by the above-mentioned method is measured. The thickness of the film layer is 2.6 microns. Change, the N element content in the film layer increases quasi-linearly and continuously from the cemented carbide substrate to the surface of the film layer, and there is no composition difference interface in the film layer, which ensures the simultaneous realization of high adhesion, high hardness and high thermal shock.

Claims (1)

1. the preparation method of composition continually varying titanium zirconium metal nitride composite ganoine film, it is characterised in that described method bag Include procedure below:

1) determination of deposition technique: determine the multi-arc ion coating system as composition continually varying titanium zirconium nitride composite ganoine film Standby technology；

2) determination of arc source target: determine purity be 99.99% titanium target and zirconium target equal amount combine as plated film arc source Target, or titanium-zirconium alloy target is as arc source target, the Ti/Zr atomic ratio of titanium-zirconium alloy target=(45-50)/(55-50)；

3) determination of arc source number: require according to membrane uniformity and the temperature limiting of metallic matrix to be coated determines and to make Multi-arc ion coating arc source number, i.e. for ensure membrane uniformity, at least select two differing heights different azimuth and become 90 The arc source simultaneously starting the arc of degree configuration, and to ensure simultaneously metallic matrix to be coated coating chamber whole during, plated film room temperature The temperature that degree allows less than matrix；

4) selection of metallic matrix to be coated and pre-treatment: select high-speed steel or hard alloy as metallic matrix to be coated, Before putting into coating chamber and carrying out plated film, routine is deoiled, decontamination processes and carries out surface finish to use metal detergent to carry out it Processing, carry out ultrasonic waves for cleaning with acetone and ethanol the most respectively, hair dryer dries up with standby, is subsequently placed in the workpiece of coating chamber On frame；

5) determination of pre-firing processes: refer to as acquisition composition continually varying titanium zirconium nitride composite ganoine film in ion bom bardment Technique starts the heated baking technique carried out before, reaches 3 × 10 in coating chamber vacuum^-2During handkerchief, start baking electric current, for Avoiding thermal stress to gather, use small area analysis to toast, and keep the work rest uniform rotation of bearing substrate, coating chamber temperature reaches Time used by 200 ° of C is not less than 20 minutes；

6) determination of pre-Bombardment and cleaning technique: refer to as acquisition composition continually varying titanium zirconium nitride composite ganoine film at plating The ion bom bardment technique carried out before titanium-zirconium alloy transition zone, when coating chamber back end vacuum reaches 8.0 × 10^-3Handkerchief, prebake conditions Temperature reaches to be filled with argon during 200 ° of C, makes coating chamber pressure reach 2.2 × 10^-1Handkerchief ~ 2.8 × 10^-1Handkerchief, opens each arc Source, according to arc source target size size, keeps stable certain current value between 50-80 ampere of arc current, carries out ion and bang Hitting 15 minutes, bombardment bias progressively increases to 400 volts from 350 volts；

7) determination of the preparation technology of titanium-zirconium alloy transition zone: the ar pressure in coating chamber is maintained at 2.2 × 10^-1Handkerchief- 2.8×10^-1Handkerchief, the titanium target that equal amount is combined and zirconium target, or, the arc current of titanium-zirconium alloy target is placed in 50-80 ampere Between certain current value, substrate negative voltage is set to-200 volts, and arcing time is 10 minutes, then regulation ar pressure reach 2.8×10^-1Handkerchief, is ready for the deposition of composition continually varying titanium zirconium nitride composite ganoine film；

8) determination of sedimentation time: when referring to the deposition determined for obtaining composition continually varying titanium zirconium nitride composite ganoine film Between, the number according to the multi-arc ion coating arc source used and the thickness requirement to film layer determine whole sedimentation time, then will Whole sedimentation time is divided into 3:1, and the first half section time wherein deposited is the 3/4 of total sedimentation time, and the latter half of deposition is The 1/4 of total sedimentation time；

9) control of corresponding with sedimentation time reacting gas dividing potential drop: refer to as obtaining composition continually varying titanium zirconium nitride compound Hard films and the reacting gas nitrogen partial pressure that determines controls process, in the first half section time of deposition, pass through Flow-rate adjustment, it is ensured that nitrogen Edema caused by disorder of QI pressure uniform speed increase, and reduce partial pressure of ar gas accordingly by Flow-rate adjustment simultaneously so that in deposition process, the two is total Pressure remains 2.8 × 10^-1Handkerchief is constant, and at the end of this stage, nitrogen partial pressure reaches 2.8 × 10^-1Handkerchief, partial pressure of ar gas drops Being 0 handkerchief, then keeping nitrogen pressure is 2.8 × 10^-1Handkerchief, carries out the deposition of latter half, until deposition terminates；

10) determination of corresponding with sedimentation time arc source target arc current: refer to as obtaining composition continually varying titanium zirconium nitride multiple The electric current of the arc source target closing hard films and determine selects, and in the first half section time of deposition, keeps the arc source target arc current used Consistent with aforesaid method step 6, at the latter half of deposition, adjust arc source target arc current, the arc current of each arc source target Increase by 2 ~ 3 amperes, until deposition process terminates；

11) determination of the substrate negative voltage corresponding with sedimentation time: refer to as obtaining composition continually varying titanium zirconium nitride compound Hard films and the selection of substrate negative voltage that determines, in the first half section time of deposition, substrate negative voltage selects at-180--200 Volt, at the latter half of deposition, substrate negative voltage selects to lie prostrate at-120--130；

12) control of coating chamber temperature: refer to the plating determined for obtaining composition continually varying titanium zirconium nitride composite ganoine film Film room temperature limits, and for high speed steel substrate, coating chamber temperature not can exceed that 380 degrees Celsius；For hard alloy substrate, plated film Room temperature not can exceed that 420 degrees Celsius；

13) work rest rotary plating: be slowly heated baking at coating chamber, matrix is carried out ion bom bardment, plating titanium-zirconium alloy mistake Cross layer, composition continually varying titanium zirconium nitride composite ganoine film deposition whole during be always maintained at work rest rotate, turn Speed is 6 revs/min.