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CN105366633A - Method for manufacturing metal grid based on electrostatic spinning method - Google Patents

Method for manufacturing metal grid based on electrostatic spinning method Download PDF

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Publication number
CN105366633A
CN105366633A CN201510678971.6A CN201510678971A CN105366633A CN 105366633 A CN105366633 A CN 105366633A CN 201510678971 A CN201510678971 A CN 201510678971A CN 105366633 A CN105366633 A CN 105366633A
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CN
China
Prior art keywords
electrostatic spinning
metal
polymer fiber
fiber silk
metal grill
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
CN201510678971.6A
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Chinese (zh)
Inventor
王振中
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Xiamen Biange New Material Science & Technology Co Ltd
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Xiamen Biange New Material Science & Technology Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Xiamen Biange New Material Science & Technology Co Ltd filed Critical Xiamen Biange New Material Science & Technology Co Ltd
Priority to CN201510678971.6A priority Critical patent/CN105366633A/en
Publication of CN105366633A publication Critical patent/CN105366633A/en
Pending legal-status Critical Current

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Classifications

    • BPERFORMING OPERATIONS; TRANSPORTING
    • B81MICROSTRUCTURAL TECHNOLOGY
    • B81CPROCESSES OR APPARATUS SPECIALLY ADAPTED FOR THE MANUFACTURE OR TREATMENT OF MICROSTRUCTURAL DEVICES OR SYSTEMS
    • B81C1/00Manufacture or treatment of devices or systems in or on a substrate
    • B81C1/00436Shaping materials, i.e. techniques for structuring the substrate or the layers on the substrate
    • B81C1/00555Achieving a desired geometry, i.e. controlling etch rates, anisotropy or selectivity
    • DTEXTILES; PAPER
    • D04BRAIDING; LACE-MAKING; KNITTING; TRIMMINGS; NON-WOVEN FABRICS
    • D04HMAKING TEXTILE FABRICS, e.g. FROM FIBRES OR FILAMENTARY MATERIAL; FABRICS MADE BY SUCH PROCESSES OR APPARATUS, e.g. FELTS, NON-WOVEN FABRICS; COTTON-WOOL; WADDING ; NON-WOVEN FABRICS FROM STAPLE FIBRES, FILAMENTS OR YARNS, BONDED WITH AT LEAST ONE WEB-LIKE MATERIAL DURING THEIR CONSOLIDATION
    • D04H1/00Non-woven fabrics formed wholly or mainly of staple fibres or like relatively short fibres
    • D04H1/70Non-woven fabrics formed wholly or mainly of staple fibres or like relatively short fibres characterised by the method of forming fleeces or layers, e.g. reorientation of fibres
    • D04H1/72Non-woven fabrics formed wholly or mainly of staple fibres or like relatively short fibres characterised by the method of forming fleeces or layers, e.g. reorientation of fibres the fibres being randomly arranged
    • D04H1/728Non-woven fabrics formed wholly or mainly of staple fibres or like relatively short fibres characterised by the method of forming fleeces or layers, e.g. reorientation of fibres the fibres being randomly arranged by electro-spinning

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  • Engineering & Computer Science (AREA)
  • Textile Engineering (AREA)
  • Physics & Mathematics (AREA)
  • Geometry (AREA)
  • Manufacturing & Machinery (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Chemical Or Physical Treatment Of Fibers (AREA)
  • Nonwoven Fabrics (AREA)

Abstract

The invention discloses a method for manufacturing a metal grid based on an electrostatic spinning method. The method comprises the following steps: 1), forming a metal thin film on a base plate; 2), performing the electrostatic spinning method on a polymer solution to form randomly and uniformly distributed polymer fibers on a surface of the metal thin film, wherein the polymer fibers are mutually in cross connection to form a random grid; 3), etching the metal thin film, which is not coated by the polymer fibers, and removing the polymer fibers, thereby obtaining randomly and uniformly distributed metal wires on the base plate, wherein the metal wires are mutually in cross connection to form a random metal grid. According to the method for manufacturing the metal grid based on the electrostatic spinning method, the polymer fibers obtained by utilizing the electrostatic spinning method are taken as a mask, the difficulty of manufacturing a micro-structural image on a large-size mask plate is overcome, the imaging of a micron-level random network is achieved, and exposure and development steps in the traditional photoetching technique are saved; furthermore, the process is simple, and reel-to-reel large-area volume production is facilitated.

Description

A kind of method preparing metal grill based on method of electrostatic spinning
Technical field
The present invention relates to technical field prepared by metal grill, be related specifically to a kind of method preparing metal grill based on method of electrostatic spinning.
Background technology
Along with fast development and the maturation of electronic technology, and people pursue ultimate attainmentization that electronic equipment is lighter and thinner, produce at a high speed in the urgent need to micro-processing technology and the micron-sized device of high frequency, and microstructure graph is turned to very important one in micro-processing technology and also more and more comes into one's own.In prior art, microstructure graph technology mainly comprises phase difference Enhanced Imaging technology, stamping technique and photoetching technique, and wherein photoetching technique is the process technology of the most common metal thin-film pattern.Micro-structural photolithography patterning metallic film mainly adopts the method for e-book photoetching, refer to and deposit layer of metal film on substrate, photoresist is coated with again on metallic film, utilize pattern mask plate mask, use through scanning focused electron beam irradiation, electron beam can will change the chemical property of the photoresist of exposure area, and then by development, etch away the photoresist outside exposure area or exposure area and the metal under covering thereof, thus obtain patterned metallic film.In order to obtain the metallic pattern of micro-dimension on substrate, need to obtain the photoresist micro-structural little with dimension of picture deviation, this just requires that the size of mask plate need be little with photoresist micro-structural deviation, and such guarantee etching transmits the precision of the figure obtained.
In prior art, in order to make the microstructure graph of micron dimension, be mostly that utilization increases substantially the resolution ratio of photoetching technique and uses the mask plate with micron dimension figure to obtain at present.But due to the restriction of diffraction limit, make the resolution ratio improving photoetching technique very complicated, and cost of investment is high.Need to reach micron dimension in the making of large scale mask plate figure simultaneously, complex manufacturing technology and make yield low.For solving the problem, patent 03123573.5 discloses a kind of metal mask plate, by substrate add the identical chromium of upper surface or lower surface or upper and lower surface figure and gold or copper or silver or aluminum metal thin layer figure form, penetrate by illumination and there is the very short plasma wave of Micropicture structural metal mask plate generation wavelength, through micron figure hole and seam propagation property, general wavelength or long wavelength light is made to carry out photoetching through micron metal mask.Although this invention overcomes the problem of the complexity of the micron dimension graphic making technique of existing mask plate, simultaneously again due to the restriction by diffraction limit, can not be passed by general wavelength or long wavelength light, the shortcoming of photoetching cannot be carried out.But the preparation of the mask plate described in this invention needs to form the thin metal layer with the Micropicture structure of micron dimension at substrate surface, and form this technique of thin metal layer with the Micropicture structure of micron dimension at substrate surface and still need by using the mask plate with micron dimension figure to obtain, this is from the difficulty not solving and make micron order figure at large scale mask plate of speaking at all.
Summary of the invention
The object of the present invention is to provide and a kind ofly eliminate the step of the exposure imaging in conventional lithographic techniques based on the method for electrostatic silk legal system for metal grill, technique is more succinct, is conducive to volume to volume large area volume production.
For this reason, the present invention is by the following technical solutions:
Prepare a method for metal grill based on method of electrostatic spinning, comprise the steps:
1) layer of metal film is formed on a substrate;
2) polymer solution is formed random equally distributed polymer fiber silk by method of electrostatic spinning on metal film surfaces, described polymer fiber silk is interlaced is connected to form random grid;
3) etch away not by the metallic film that polymer fiber silk covers, then remove polymer fiber silk, substrate obtains random equally distributed metal filament, wherein metal filament is interlaced is connected to form random metal grill.
Preferably, the condition of described electrostatic spinning is electrostatic field voltage 10-25kv, spinning speed 0.5-1.5ml/h, receiving range 10-25cm.
Preferably, described polymer solution is polyester, polyamide, polyvinyl alcohol, polyacrylonitrile or polyimide solution, and its concentration is 0.1-0.5g/ml.
Preferably, the diameter of described polymer fiber silk is 5-20 μm.
Preferably, the live width of described metal filament is 1-5 μm.
Preferably, described substrate is PET, PET, PC, PEN, PP, PS or PMMA.
Preferably, the material of described metallic film is Cu, Ag, Al, Ti or Ni, and its thickness is 10nm-1000nm.
The present invention adopts above technical scheme, utilize method of electrostatic spinning obtain on metallic film micron-sized polymer fiber silk as mask, overcome the difficulty making microstructure graph on large scale mask plate, achieve the graphical of micron-sized random grid, and eliminate the step of the exposure imaging in conventional lithographic techniques, make technique more succinct, be conducive to volume to volume large area volume production.
Accompanying drawing explanation
Fig. 1 the present invention is based on the flow chart of steps that method of electrostatic spinning prepares the method for metal grill.
Fig. 2 the present invention is based on the Structure and Process schematic diagram that method of electrostatic spinning prepares the method for metal grill.
Detailed description of the invention
In order to make object of the present invention, feature and advantage more clear, below in conjunction with drawings and Examples, explanation is specifically made to the specific embodiment of the present invention, in the following description, set forth a lot of concrete details so that understand the present invention fully, but the present invention can implement in other modes being much different from description.Therefore, the present invention is not by the restriction of the concrete enforcement of following discloses.
Prepare a method for metal grill based on method of electrostatic spinning, as shown in Figure 1 and Figure 2, comprise the steps:
1) on a substrate 1, layer of metal film 2 is formed;
2) polymer solution is formed random equally distributed polymer fiber silk 3 by method of electrostatic spinning on metal film surfaces, described polymer fiber silk 3 is interlaced is connected to form random grid;
3) etch away the metallic film 2 do not covered by polymer fiber silk 3, then remove polymer fiber silk 3, obtain random equally distributed metal filament 4 on substrate 1, wherein metal filament 4 is interlaced is connected to form random metal grill.
Wherein, the condition of described electrostatic spinning is electrostatic field voltage 10-20kv, spinning speed 0.5-1.5ml/h, receiving range 10-20cm.
Wherein, described polymer solution is polyester, polyamide, polyvinyl alcohol, polyacrylonitrile or polyimide solution, and its concentration is 0.1-0.5g/ml.
Wherein, the diameter of described polymer fiber silk is 5-25 μm.
Wherein, the live width of described metal filament is 1-5 μm.
Wherein, described substrate is PET, PET, PC, PEN, PP, PS or PMMA.
Wherein, the material of described metallic film is Cu, Ag, Al, Ti or Ni, and its thickness is 10nm-1000nm.
The diameter of the polymer fiber filament that method of electrostatic spinning obtains be mainly subject to static electric field voltage, the impact of spinning speed, receiving range and polymer solution concentration.Be mainly: 1) static electric field voltage is larger, spinning speed is less, and jet can be made to obtain larger acceleration, and its fiber formed has larger tensile stress, causes there is higher tensile strain rate, is conducive to obtained thinner fiber; 2) polymer drop is after capillary exit ejection, and in atmosphere along with solvent volatilization, polymer condense is solidified into fiber, is finally received by metallic film.With distance increase between the two, the polymer fiber filament diameter obtained diminishes; 3) polymer solution concentration is higher, and viscosity is larger, and surface tension is larger, and after leaving nozzle, drop breakup ability increases with surface tension and weakens.Usually, when other conditions constant, along with concentration increases, fibre diameter increases.So the present invention is by controlling the condition of electrostatic spinning and the concentration of polymer solution, reach the diameter of the polymer fiber silk controlling to obtain on metallic film, thus control the live width of the metal grill metal filament finally obtained.
Embodiment one
Prepare a method for metal grill based on method of electrostatic spinning, as shown in Figure 1 and Figure 2, comprise the steps:
1) on a substrate 1, layer of metal film 2 is formed;
2) polymer solution is formed random equally distributed polymer fiber silk 3 by method of electrostatic spinning on metal film surfaces, described polymer fiber silk 3 is interlaced is connected to form random grid; Wherein, the condition of described electrostatic spinning is electrostatic field voltage 10kv, spinning speed 1.5ml/h, receiving range 10cm; Described polymer solution is polyester, polyamide, polyvinyl alcohol, polyacrylonitrile or polyimide solution, and its concentration is 1.5g/ml; The diameter of the polymer fiber silk obtained is 25 μm.
3) etch away the metallic film 2 do not covered by polymer fiber silk 3, then remove polymer fiber silk 3, obtain random equally distributed metal filament 4 on substrate 1, wherein metal filament 4 is interlaced is connected to form random metal grill.Wherein, the live width of described metal filament is 5 μm.
Wherein, described substrate is PET, PET, PC, PEN, PP, PS or PMMA.
Wherein, the material of described metallic film is Cu, Ag, Al, Ti or Ni, and its thickness is 10nm-1000nm.
Embodiment two
Prepare a method for metal grill based on method of electrostatic spinning, as shown in Figure 1 and Figure 2, comprise the steps:
1) on a substrate 1, layer of metal film 2 is formed;
2) polymer solution is formed random equally distributed polymer fiber silk 3 by method of electrostatic spinning on metal film surfaces, described polymer fiber silk 3 is interlaced is connected to form random grid; Wherein, the condition of described electrostatic spinning is electrostatic field voltage 15kv, spinning speed 1.0ml/h, receiving range 15cm; Described polymer solution is polyester, polyamide, polyvinyl alcohol, polyacrylonitrile or polyimide solution, and its concentration is 1.0g/ml; The diameter of the polymer fiber silk obtained is 15 μm.
3) etch away the metallic film 2 do not covered by polymer fiber silk 3, then remove polymer fiber silk 3, obtain random equally distributed metal filament 4 on substrate 1, wherein metal filament 4 is interlaced is connected to form random metal grill.Wherein, the live width of described metal filament is 3 μm.
Wherein, described substrate is PET, PET, PC, PEN, PP, PS or PMMA.
Wherein, the material of described metallic film is Cu, Ag, Al, Ti or Ni, and its thickness is 10nm-1000nm.
Embodiment three
Prepare a method for metal grill based on method of electrostatic spinning, as shown in Figure 1 and Figure 2, comprise the steps:
1) on a substrate 1, layer of metal film 2 is formed;
2) polymer solution is formed random equally distributed polymer fiber silk 3 by method of electrostatic spinning on metal film surfaces, described polymer fiber silk 3 is interlaced is connected to form random grid; Wherein, the condition of described electrostatic spinning is electrostatic field voltage 20kv, spinning speed 0.5ml/h, receiving range 20cm; Described polymer solution is polyester, polyamide, polyvinyl alcohol, polyacrylonitrile or polyimide solution, and its concentration is 0.5g/ml; The diameter of the polymer fiber silk obtained is 5 μm.
3) etch away the metallic film 2 do not covered by polymer fiber silk 3, then remove polymer fiber silk 3, obtain random equally distributed metal filament 4 on substrate 1, wherein metal filament 4 is interlaced is connected to form random metal grill.Wherein, the live width of described metal filament is 1 μm.
Wherein, described substrate is PET, PET, PC, PEN, PP, PS or PMMA.
Wherein, the material of described metallic film is Cu, Ag, Al, Ti or Ni, and its thickness is 10nm-1000nm.
The foregoing is only preferred embodiment of the present invention, not in order to limit the present invention, all any amendments done within the spirit and principles in the present invention, equivalent replacement and improvement etc., all should be included within protection scope of the present invention.

Claims (7)

1. prepare a method for metal grill based on method of electrostatic spinning, it is characterized in that, comprise the steps:
1) layer of metal film is formed on a substrate;
2) polymer solution is formed random equally distributed polymer fiber silk by method of electrostatic spinning on metal film surfaces, described polymer fiber silk is interlaced is connected to form random grid;
3) etch away not by the metallic film that polymer fiber silk covers, then remove polymer fiber silk, substrate obtains random equally distributed metal filament, wherein metal filament is interlaced is connected to form random metal grill.
2. a kind of method preparing metal grill based on method of electrostatic spinning according to claim 1, is characterized in that, the condition of described electrostatic spinning is electrostatic field voltage 10-25kv, spinning speed 0.5-1.5ml/h, receiving range 10-25cm.
3. a kind of method preparing metal grill based on method of electrostatic spinning according to claim 1, is characterized in that, described polymer solution is polyester, polyamide, polyvinyl alcohol, polyacrylonitrile or polyimide solution, and its concentration is 0.1-0.5g/ml.
4. a kind of method preparing metal grill based on method of electrostatic spinning according to claim 1.It is characterized in that, the diameter of described polymer fiber silk is 5-20 μm.
5. a kind of method preparing metal grill based on method of electrostatic spinning according to claim 1.It is characterized in that, the live width of described metal filament is 1-5 μm.
6. a kind of method preparing metal grill based on method of electrostatic spinning according to claim 1, is characterized in that, described substrate is PET, PET, PC, PEN, PP, PS or PMMA.
7. a kind of method preparing metal grill based on method of electrostatic spinning according to claim 1, is characterized in that, the material of described metallic film is Cu, Ag, Al, Ti or Ni, and its thickness is 10nm-1000nm.
CN201510678971.6A 2015-10-19 2015-10-19 Method for manufacturing metal grid based on electrostatic spinning method Pending CN105366633A (en)

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Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN108465383A (en) * 2017-02-23 2018-08-31 塞法尔股份公司 Protectiveness ventilation part and the method for preparing protectiveness ventilation part
CN112281302A (en) * 2020-10-20 2021-01-29 西安工程大学 Mask method electrostatic spinning integrated copper conductive film layer and preparation method thereof

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN104681645A (en) * 2015-01-23 2015-06-03 华南师范大学 Method for preparing composite transparent conductive electrode based on metal grid and metal nano-wire
CN104750311A (en) * 2015-03-16 2015-07-01 深圳市宇顺电子股份有限公司 Manufacturing method of metal mesh conducting film, metal mesh conducting film and touch panel
CN104966588A (en) * 2015-07-04 2015-10-07 厦门变格新材料科技有限公司 Method of preparing nano-level metal grid transparent conductive film

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN104681645A (en) * 2015-01-23 2015-06-03 华南师范大学 Method for preparing composite transparent conductive electrode based on metal grid and metal nano-wire
CN104750311A (en) * 2015-03-16 2015-07-01 深圳市宇顺电子股份有限公司 Manufacturing method of metal mesh conducting film, metal mesh conducting film and touch panel
CN104966588A (en) * 2015-07-04 2015-10-07 厦门变格新材料科技有限公司 Method of preparing nano-level metal grid transparent conductive film

Non-Patent Citations (1)

* Cited by examiner, † Cited by third party
Title
TIANDA HE 等: "A Tough and High-Performance Transparent Electrode from a Scalable and Transfer-Free Method", 《ACSNANO》 *

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN108465383A (en) * 2017-02-23 2018-08-31 塞法尔股份公司 Protectiveness ventilation part and the method for preparing protectiveness ventilation part
CN108465383B (en) * 2017-02-23 2022-04-08 塞法尔股份公司 Protective vent and method of making a protective vent
CN112281302A (en) * 2020-10-20 2021-01-29 西安工程大学 Mask method electrostatic spinning integrated copper conductive film layer and preparation method thereof
CN112281302B (en) * 2020-10-20 2022-09-09 西安工程大学 A kind of mask method electrospinning integrated copper conductive film layer and preparation method thereof

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Application publication date: 20160302