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CN105161425A - Semiconductor stacked packaging method - Google Patents

Semiconductor stacked packaging method Download PDF

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Publication number
CN105161425A
CN105161425A CN201510461036.4A CN201510461036A CN105161425A CN 105161425 A CN105161425 A CN 105161425A CN 201510461036 A CN201510461036 A CN 201510461036A CN 105161425 A CN105161425 A CN 105161425A
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package
opening
metal plate
plastic
chip
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石磊
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Nantong Fujitsu Microelectronics Co Ltd
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Nantong Fujitsu Microelectronics Co Ltd
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    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/04Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
    • H01L21/48Manufacture or treatment of parts, e.g. containers, prior to assembly of the devices, using processes not provided for in a single one of the groups H01L21/18 - H01L21/326 or H10D48/04 - H10D48/07
    • H01L21/4814Conductive parts
    • H01L21/4821Flat leads, e.g. lead frames with or without insulating supports
    • H01L21/4825Connection or disconnection of other leads to or from flat leads, e.g. wires, bumps, other flat leads
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    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/02Bonding areas; Manufacturing methods related thereto
    • H01L2224/04Structure, shape, material or disposition of the bonding areas prior to the connecting process
    • H01L2224/04105Bonding areas formed on an encapsulation of the semiconductor or solid-state body, e.g. bonding areas on chip-scale packages
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    • H01L2224/10Bump connectors; Manufacturing methods related thereto
    • H01L2224/12Structure, shape, material or disposition of the bump connectors prior to the connecting process
    • H01L2224/12105Bump connectors formed on an encapsulation of the semiconductor or solid-state body, e.g. bumps on chip-scale packages
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    • H01L2224/42Wire connectors; Manufacturing methods related thereto
    • H01L2224/47Structure, shape, material or disposition of the wire connectors after the connecting process
    • H01L2224/48Structure, shape, material or disposition of the wire connectors after the connecting process of an individual wire connector
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    • H01L2224/4809Loop shape
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    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
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    • H01L2224/42Wire connectors; Manufacturing methods related thereto
    • H01L2224/47Structure, shape, material or disposition of the wire connectors after the connecting process
    • H01L2224/48Structure, shape, material or disposition of the wire connectors after the connecting process of an individual wire connector
    • H01L2224/481Disposition
    • H01L2224/48151Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive
    • H01L2224/48221Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked
    • H01L2224/48225Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked the item being non-metallic, e.g. insulating substrate with or without metallisation
    • H01L2224/48227Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked the item being non-metallic, e.g. insulating substrate with or without metallisation connecting the wire to a bond pad of the item
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    • H01L2224/42Wire connectors; Manufacturing methods related thereto
    • H01L2224/47Structure, shape, material or disposition of the wire connectors after the connecting process
    • H01L2224/48Structure, shape, material or disposition of the wire connectors after the connecting process of an individual wire connector
    • H01L2224/481Disposition
    • H01L2224/48151Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive
    • H01L2224/48221Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked
    • H01L2224/48245Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked the item being metallic
    • H01L2224/48247Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked the item being metallic connecting the wire to a bond pad of the item
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    • H01L2224/732Location after the connecting process
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    • H01L2224/73265Layer and wire connectors
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    • H01L2225/03All the devices being of a type provided for in the same main group of the same subclass of class H10, e.g. assemblies of rectifier diodes
    • H01L2225/10All the devices being of a type provided for in the same main group of the same subclass of class H10, e.g. assemblies of rectifier diodes the devices having separate containers
    • H01L2225/1005All the devices being of a type provided for in the same main group of the same subclass of class H10, e.g. assemblies of rectifier diodes the devices having separate containers the devices being integrated devices of class H10
    • H01L2225/1011All the devices being of a type provided for in the same main group of the same subclass of class H10, e.g. assemblies of rectifier diodes the devices having separate containers the devices being integrated devices of class H10 the containers being in a stacked arrangement
    • H01L2225/1017All the devices being of a type provided for in the same main group of the same subclass of class H10, e.g. assemblies of rectifier diodes the devices having separate containers the devices being integrated devices of class H10 the containers being in a stacked arrangement the lowermost container comprising a device support
    • H01L2225/1035All the devices being of a type provided for in the same main group of the same subclass of class H10, e.g. assemblies of rectifier diodes the devices having separate containers the devices being integrated devices of class H10 the containers being in a stacked arrangement the lowermost container comprising a device support the device being entirely enclosed by the support, e.g. high-density interconnect [HDI]
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
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    • H01L2225/00Details relating to assemblies covered by the group H01L25/00 but not provided for in its subgroups
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    • H01L2225/10All the devices being of a type provided for in the same main group of the same subclass of class H10, e.g. assemblies of rectifier diodes the devices having separate containers
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    • H01L2225/1011All the devices being of a type provided for in the same main group of the same subclass of class H10, e.g. assemblies of rectifier diodes the devices having separate containers the devices being integrated devices of class H10 the containers being in a stacked arrangement
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    • H01L2924/15Details of package parts other than the semiconductor or other solid state devices to be connected
    • H01L2924/151Die mounting substrate
    • H01L2924/153Connection portion
    • H01L2924/1531Connection portion the connection portion being formed only on the surface of the substrate opposite to the die mounting surface
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    • H01L2924/1815Shape
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  • Engineering & Computer Science (AREA)
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Abstract

本发明提供一种半导体叠层封装方法,包括A:制作上封装体,B:制作封装有芯片的中层封装体,C:将上、中、下封装体叠层封装,步骤B包括:S101:提供金属板;S102:对金属板的正面半蚀刻形成第一开口;S103:将待装载的芯片加装在第一开口内并打线;S104:用塑封底填料将芯片固定和封装于金属板上;S105:对金属板的背面进行半蚀刻形成第二开口;S106:在第二开口的区域内填充塑封底填料;S107:形成焊球。本发明提供的封装方法,对金属板进行改进形成QFN框架,利用两侧L形金属片作为中层封装体的电极,从而实现堆叠的芯片在一个封装体中上下导通;节省封装空间,有利于多层塑封体堆叠时实现芯片封装的微型化,提高芯片封装的集成度。

The present invention provides a semiconductor stack packaging method, including A: making an upper package, B: making a middle package packaged with a chip, C: stacking and packaging the upper, middle and lower packages, step B includes: S101: Provide the metal plate; S102: Half-etch the front side of the metal plate to form the first opening; S103: Install the chip to be loaded in the first opening and make wires; S104: Fix and package the chip on the metal plate with plastic underfill above; S105: half-etching the back of the metal plate to form a second opening; S106: filling the area of the second opening with plastic underfill; S107: forming solder balls. In the packaging method provided by the invention, the metal plate is improved to form a QFN frame, and the L-shaped metal sheets on both sides are used as the electrodes of the middle package, so as to realize the up and down conduction of the stacked chips in one package; save the package space, which is beneficial When the multi-layer plastic package is stacked, the miniaturization of the chip package is realized, and the integration degree of the chip package is improved.

Description

半导体叠层封装方法Semiconductor Stack Packaging Method

技术领域technical field

本发明涉及一种半导体封装方法,尤其涉及一种半导体叠层封装方法。The invention relates to a semiconductor packaging method, in particular to a semiconductor stack packaging method.

背景技术Background technique

随着半导体制造技术以及立体封装技术的不断发展,电子器件和电子产品对多功能化和微型化的要求越来越高,同时要求芯片的封装尺寸不断减小。为了实现芯片封装的微型化,提高芯片封装的集成度,叠层芯片封装(stackeddiepackage)技术逐渐成为技术发展的主流。With the continuous development of semiconductor manufacturing technology and three-dimensional packaging technology, electronic devices and electronic products have higher and higher requirements for multi-function and miniaturization, and at the same time, the package size of chips is required to be continuously reduced. In order to realize the miniaturization of chip packaging and improve the integration of chip packaging, stacked die package (stacked die package) technology has gradually become the mainstream of technological development.

叠层芯片封装技术,又称三维封装技术,具体是在同一个封装体内堆叠至少两个芯片的封装技术。叠层芯片封装技术能够实现半导体器件的大容量、多功能、小尺寸、低成本等技术需求,因此叠层芯片技术近年来得到了蓬勃发展。以使用叠层封装技术的存储器为例,相较于没有使用叠层技术的存储器,采用叠层封装技术的存储器能够拥有两倍以上的存储容量。此外,使用叠层封装技术更可以有效地利用芯片的面积,多应用于大存储空间的U盘、SD卡等方面。Stacked chip packaging technology, also known as three-dimensional packaging technology, is specifically a packaging technology that stacks at least two chips in the same package. Stacked chip packaging technology can meet the technical requirements of semiconductor devices such as large capacity, multi-function, small size, and low cost. Therefore, stacked chip technology has developed vigorously in recent years. Taking the memory using the stacked packaging technology as an example, compared with the memory without using the stacked packaging technology, the memory using the stacked packaging technology can have more than twice the storage capacity. In addition, the use of stacked packaging technology can more effectively use the area of the chip, and it is mostly used in U disks and SD cards with large storage spaces.

叠层芯片封装技术能够通过多种技术手段来实现,例如打线工艺、硅通孔(throughsiliconvia,简称TSV)技术、或者塑封通孔(throughmoldingvia,简称TMV)技术。The stacked chip packaging technology can be realized through various technical means, such as a wire bonding process, a through silicon via (TSV for short) technology, or a through molding via (TMV for short) technology.

例如,硅通孔(TSV)技术,就是在芯片上形成通孔,在通孔侧壁形成金属层再填充导电物质形成通孔效果实现上下连接。该工艺成本高,良品率低,直接在硅片上开口易对芯片造成损伤或是令整片晶元强度减低导致破片等问题,实现难度较大。For example, through-silicon via (TSV) technology is to form a through hole on the chip, form a metal layer on the side wall of the through hole, and then fill it with conductive material to form a through hole effect to realize the upper and lower connection. The cost of this process is high, and the yield rate is low. Direct openings on the silicon wafer can easily cause damage to the chip or reduce the strength of the entire wafer, resulting in fragments. It is difficult to realize.

又如,塑封通孔(TMV)技术是指在塑封层开口,即塑封后使用激光等方法打通塑封层,填充导电物质,但该工艺在塑封层开口深度方面以及打通塑封层的孔边缘绝缘层方面不易控制。As another example, through-molding via (TMV) technology refers to the opening of the plastic sealing layer, that is, the use of lasers and other methods to open the plastic sealing layer after plastic sealing, and to fill the conductive material. Difficult to control.

其余的就是一些先预制可导通材质如凹型架构,进行打磨、打线等工艺用于连接。The rest are some prefabricated conductive materials such as concave structures, which are used for connection through grinding and wire bonding.

上述工艺在堆叠芯片的过程中,通过孔内填充介电质形成电极较难,特别是在多个塑封体连接形成整个封装体的过程中,通过传统工艺方法中间的塑封体不易实现上下封装体的导通,从而实现芯片在一个封装体上下导通的难度较大,且成本较高。In the process of stacking chips in the above process, it is difficult to form electrodes by filling the dielectric in the hole, especially in the process of connecting multiple plastic packages to form the entire package, it is not easy to realize the upper and lower packages through the plastic package in the middle of the traditional process. conduction, so that it is difficult and costly to realize the conduction of the chip up and down in a package.

发明内容Contents of the invention

在下文中给出关于本发明的简要概述,以便提供关于本发明的某些方面的基本理解。应当理解,这个概述并不是关于本发明的穷举性概述。它并不是意图确定本发明的关键或重要部分,也不是意图限定本发明的范围。其目的仅仅是以简化的形式给出某些概念,以此作为稍后论述的更详细描述的前序。A brief overview of the invention is given below in order to provide a basic understanding of some aspects of the invention. It should be understood that this summary is not an exhaustive overview of the invention. It is not intended to identify key or critical parts of the invention nor to delineate the scope of the invention. Its purpose is merely to present some concepts in a simplified form as a prelude to the more detailed description that is discussed later.

本发明的目的是提供一种半导体叠层封装方法,解决现有封装工艺(例如TSV、TMV等工艺)中形成电极较难,特别是在多个塑封体连接形成封装体的过程中,通过中间的塑封体不易实现上下封装体的导通,从而不易实现芯片在一个封装体上下导通的问题。The object of the present invention is to provide a semiconductor stack packaging method to solve the difficulty in forming electrodes in the existing packaging technology (such as TSV, TMV, etc.), especially in the process of connecting multiple plastic packages to form a package. It is not easy to realize the conduction of the upper and lower packages of the plastic package, so it is not easy to realize the problem of the conduction of the chip in the upper and lower packages.

本发明提供了一种半导体叠层封装方法,包括:The invention provides a semiconductor stack packaging method, comprising:

A:制作上封装体,A: Make the upper package,

B:制作封装有芯片的中层封装体,B: Make the middle package with the chip packaged,

C:将所述上封装体、所述中层封装体和所述下封装体叠层封装,C: laminating and encapsulating the upper package, the middle package and the lower package,

其中,步骤B包括:Wherein, step B includes:

S101:提供制备上述中层封装体的金属板;S101: providing a metal plate for preparing the above-mentioned intermediate package;

S102:对所述金属板的正面半蚀刻形成第一开口,所述第一开口的深度大于待装载的芯片的厚度;S102: half-etching the front side of the metal plate to form a first opening, the depth of the first opening is greater than the thickness of the chip to be loaded;

S103:将上述待装载的芯片加装在所述第一开口内并在所述第一开口内进行打线;S103: Install the above-mentioned chip to be loaded in the first opening and perform wire bonding in the first opening;

S104:用塑封底填料将芯片固定和封装于所述金属板上形成塑封填料层;S104: Fixing and packaging the chip on the metal plate with plastic underfill to form a plastic underfill layer;

S105:对所述金属板的背面进行半蚀刻至塑封填料层,形成第二开口;S105: half-etching the back of the metal plate to the plastic packing layer to form a second opening;

S106:在所述第二开口的区域内填充塑封底填料,形成塑封体;S106: filling the area of the second opening with a plastic underfill to form a plastic package;

S107:在上述塑封体的正面边缘或者背面边缘处形成焊球。S107: Form solder balls on the front edge or the back edge of the plastic package.

本发明提供的一种半导体叠层封装方法,对金属板进行改进形成四边扁平无引脚(QFN)框架,利用边缘的金属凸起作为中层封装体的电极,实现中层封装体与上封装体、下封装体的连通,从而实现堆叠的芯片在一个封装体中实现上下导通;利用QFN框架形式形成的中层封装体节省封装空间,有利于实现多层堆叠时封装的微型化,提高芯片封装的集成度。The invention provides a semiconductor stack packaging method. The metal plate is improved to form a four-sided flat no-lead (QFN) frame, and the metal protrusion on the edge is used as the electrode of the middle package to realize the connection between the middle package and the upper package. The lower package is connected, so that the stacked chips can be connected up and down in one package; the middle package formed in the form of a QFN frame saves packaging space, which is conducive to realizing the miniaturization of the package when stacking multiple layers, and improving the reliability of the chip package. Integration.

附图说明Description of drawings

为了更清楚地说明本发明实施例或现有技术中的技术方案,下面将对实施例或现有技术描述中所需要使用的附图作简单地介绍,显而易见地,下面描述中的附图仅仅是本发明的一些实施例,对于本领域普通技术人员来讲,在不付出创造性劳动的前提下,还可以根据这些附图获得其他的附图。In order to more clearly illustrate the technical solutions in the embodiments of the present invention or the prior art, the following will briefly introduce the drawings that need to be used in the description of the embodiments or the prior art. Obviously, the accompanying drawings in the following description are only These are some embodiments of the present invention. Those skilled in the art can also obtain other drawings based on these drawings without creative work.

图1为本发明制作封装有芯片的中层封装体的流程图;Fig. 1 is the flow chart that the present invention makes the middle package body that is packaged with chip;

图2-图7为本发明制作封装有芯片的中层封装体的过程示意图;Fig. 2-Fig. 7 is the schematic diagram of the process of making the intermediate package with chip packaged in the present invention;

图8位本发明叠层封装结构示意图。Fig. 8 is a schematic diagram of the stacked package structure of the present invention.

附图标记:Reference signs:

1-金属板2-第一开口3-芯片1-metal plate 2-first opening 3-chip

4-塑封填料层5-第二开口6-金属层4-plastic packing layer 5-second opening 6-metal layer

7-金属片8-下封装体9-上封装体7-metal sheet 8-lower package 9-upper package

具体实施方式Detailed ways

为使本发明实施例的目的、技术方案和优点更加清楚,下面将结合本发明实施例中的附图,对本发明实施例中的技术方案进行清楚、完整地描述,显然,所描述的实施例是本发明一部分实施例,而不是全部的实施例。在本发明的一个附图或一种实施方式中描述的元素和特征可以与一个或更多个其它附图或实施方式中示出的元素和特征相结合。应当注意,为了清楚的目的,附图和说明中省略了与本发明无关的、本领域普通技术人员已知的部件和处理的表示和描述。基于本发明中的实施例,本领域普通技术人员在没有付出创造性劳动的前提下所获得的所有其他实施例,都属于本发明保护的范围。In order to make the purpose, technical solutions and advantages of the embodiments of the present invention clearer, the technical solutions in the embodiments of the present invention will be clearly and completely described below in conjunction with the drawings in the embodiments of the present invention. Obviously, the described embodiments It is a part of embodiments of the present invention, but not all embodiments. Elements and features described in one drawing or one embodiment of the present invention may be combined with elements and features shown in one or more other drawings or embodiments. It should be noted that representation and description of components and processes that are not related to the present invention and known to those of ordinary skill in the art are omitted from the drawings and descriptions for the purpose of clarity. Based on the embodiments of the present invention, all other embodiments obtained by persons of ordinary skill in the art without making creative efforts belong to the protection scope of the present invention.

本发明提供一种半导体叠层封装方法,包括:The invention provides a semiconductor stack packaging method, comprising:

A:制作上封装体,A: Make the upper package,

B:制作封装有芯片的中层封装体,B: Make the middle package with the chip packaged,

C:将所述上封装体、所述中层封装体和所述下封装体叠层封装,C: laminating and encapsulating the upper package, the middle package and the lower package,

其中,如图1所示为制作封装有芯片的中层封装体的步骤B包括:Wherein, as shown in Figure 1, the step B of making the middle package body packaged with chips includes:

S101:提供制备上述中层封装体的金属板;S101: providing a metal plate for preparing the above-mentioned intermediate package;

S102:对所述金属板的正面半蚀刻形成第一开口,所述第一开口的深度大于待装载的芯片的厚度;S102: half-etching the front side of the metal plate to form a first opening, the depth of the first opening is greater than the thickness of the chip to be loaded;

S103:将上述待装载的芯片加装在所述第一开口内并在所述第一开口内进行打线;S103: Install the above-mentioned chip to be loaded in the first opening and perform wire bonding in the first opening;

S104:用塑封底填料将芯片固定和封装于所述金属板上形成塑封填料层;S104: Fixing and packaging the chip on the metal plate with plastic underfill to form a plastic underfill layer;

S105:对所述金属板的背面进行半蚀刻至塑封填料层,形成第二开口;S105: half-etching the back of the metal plate to the plastic packing layer to form a second opening;

S106:在所述第二开口的区域内填充塑封底填料,形成塑封体;S106: filling the area of the second opening with a plastic underfill to form a plastic package;

S107:在上述塑封体的正面边缘或者背面边缘处形成焊球。S107: Form solder balls on the front edge or the back edge of the plastic package.

上述步骤提供了一种制作封装有芯片的中层封装体的方法,如图2所示,实施步骤S101,提供制备上述中层封装体的金属板1。The above steps provide a method for manufacturing a mid-level package packaged with a chip. As shown in FIG. 2 , step S101 is implemented to provide a metal plate 1 for preparing the above-mentioned mid-level package.

可选的,为方便后续在金属板1上形成电极,金属板1材料为具有高导电和高熔点的金属材料,如铜。在本实施例中,铜板的厚度需大于待装载芯片的厚度但也不需要太高,节省材料的同时还得便于接下来在金属板上下表面形成开口以及加装芯片。Optionally, for the convenience of subsequently forming electrodes on the metal plate 1 , the material of the metal plate 1 is a metal material with high conductivity and high melting point, such as copper. In this embodiment, the thickness of the copper plate needs to be greater than the thickness of the chip to be loaded but not too high, so as to save material and facilitate the subsequent formation of openings on the upper and lower surfaces of the metal plate and the addition of chips.

如图3-图4所示,接着实施S102-S103:对上述金属板的正面半蚀刻形成第一开口2,第一开口2的深度大于待装载的芯片的厚度;As shown in Figures 3-4, S102-S103 is then implemented: half-etching the front side of the metal plate to form a first opening 2, the depth of the first opening 2 is greater than the thickness of the chip to be loaded;

将上述待装载的芯片3加装在上述第一开口2内并在第一开口2内进行打线,形成如图3所示的结构。The chip 3 to be loaded is installed in the first opening 2 and wire-bonded in the first opening 2 to form a structure as shown in FIG. 3 .

进一步地,步骤S102中对所述金属板的正面半蚀刻形成第一开口具体包括:Further, in step S102, forming the first opening by half-etching the front side of the metal plate specifically includes:

在金属板的正面贴膜,进行曝光显影;Paste film on the front of the metal plate for exposure and development;

对曝光显影的部位进行蚀刻形成第一开口,还在金属板1正面的两侧边缘形成凸起,如图3所示的两侧高出的部分即为凸起;Etching the exposed and developed parts to form a first opening, and forming protrusions on both sides of the front side of the metal plate 1, the raised parts on both sides as shown in Figure 3 are protrusions;

去除上述曝光显影后剩余的膜,经过上述处理上述金属板呈凹形结构。The remaining film after the above-mentioned exposure and development is removed, and the above-mentioned metal plate has a concave structure after the above-mentioned treatment.

接着进行步骤S104,用塑封底填料将上述芯片3固定和封装于上述金属板上形成塑封填料层4,如图5所示。Then proceed to step S104 , fixing and packaging the above-mentioned chip 3 on the above-mentioned metal plate with a plastic underfill to form a plastic-fill layer 4 , as shown in FIG. 5 .

可选的,步骤S104塑封填料层4的高度与上述凸起平齐,且芯片3以塑封底填料固定于上述金属板上并且包封在图5所示的塑封体内部。芯片的封装采用模塑底部填充技术,将芯片和所述金属凸点都包在塑封体内部。Optionally, in step S104 , the height of the plastic packing layer 4 is equal to the protrusion, and the chip 3 is fixed on the metal plate with the plastic underfill and encapsulated inside the plastic package shown in FIG. 5 . The packaging of the chip adopts the molding bottom filling technology, and the chip and the metal bumps are wrapped inside the plastic package.

上述用于模塑底部填充技术的胶为一种化学胶,主要成分可为环氧树脂,将芯片与上述凹形结构的金属板的空隙填满,并且包裹所述芯片,对填充胶进行加热固化,即可达到加固的目的,有保证了焊接工艺的电气安全性。The above-mentioned glue used for molding underfill technology is a kind of chemical glue, and its main component can be epoxy resin, which fills the gap between the chip and the metal plate with the above-mentioned concave structure, wraps the chip, and heats the filling glue Curing can achieve the purpose of reinforcement, which ensures the electrical safety of the welding process.

然后实施步骤S105,对上述金属板的背面进行半蚀刻至塑封填料层4,形成第二开口5,如图6所示。Step S105 is then implemented to half-etch the backside of the metal plate to the plastic packing layer 4 to form a second opening 5 , as shown in FIG. 6 .

可选的,步骤S105中对金属板的背面进行半蚀刻至所述塑封填料4层,形成第二开口具体包括:Optionally, in step S105, half-etching the back of the metal plate to the 4th layer of the plastic packing, forming the second opening specifically includes:

在上述金属板的背面贴膜,进行曝光显影;Stick a film on the back of the above metal plate for exposure and development;

对曝光显影的部位进行蚀刻,形成第二开口,所述第二开口将上述金属板分隔成形成多个相互隔离的金属板;Etching the exposed and developed parts to form a second opening, the second opening separates the metal plate into a plurality of mutually isolated metal plates;

去除上述曝光显影后剩余的膜。The film remaining after the above-mentioned exposure and development is removed.

可选的,上述第一开口2的面积大于所述第二开口5的面积,且所述第二开口5位于所述第一开口2对应的金属板的区域内。Optionally, the area of the first opening 2 is larger than the area of the second opening 5 , and the second opening 5 is located in the area of the metal plate corresponding to the first opening 2 .

可选的,上述多个相互隔离的金属板包括一金属层6以及对称设置在金属层6两侧的L型金属片7,所述金属片7包括上述凸起;芯片3连接在金属层6上。Optionally, the plurality of mutually isolated metal plates include a metal layer 6 and L-shaped metal sheets 7 symmetrically arranged on both sides of the metal layer 6, and the metal sheet 7 includes the above-mentioned protrusions; the chip 3 is connected to the metal layer 6 superior.

继续实施步骤S106,在所述第二开口5的区域内填充塑封底填料,形成如图7所示的结构,当然也可以在第二开口内填充绝缘胶,形成塑封体,以进一步提高封装强度。Continue to implement step S106, fill the area of the second opening 5 with plastic underfill to form the structure shown in Figure 7, of course, you can also fill the second opening with insulating glue to form a plastic package to further improve the packaging strength .

最后,实施步骤S107,在上述塑封体的正面边缘或者背面边缘处形成焊球。本方案中,焊球即设置在L型金属片的正面或者背面,通过第一开口、第二开口形成的与金属层分隔的L型金属片7即为中层封装体的电极。Finally, step S107 is implemented to form solder balls on the front edge or the back edge of the plastic package. In this solution, the solder balls are arranged on the front or back of the L-shaped metal sheet, and the L-shaped metal sheet 7 separated from the metal layer through the first opening and the second opening is the electrode of the middle package.

经过上述步骤,封装有芯片的中层封装体制作完成,接着进行步骤C:需要将上封装体和所述下封装体与中层封装体对接,再进行回流焊接以形成如图8所示的半导体叠层封装结构。如图8所示,本发明中上封装体9的基板底面为金属板,以作为上封装体的导电连接部位;所述下封装体8下表面用于连接的部位为金属凸点,例如铜柱,以作为下封装体的导电连接部位。After the above steps, the mid-level package with the chip packaged is completed, and then step C: it is necessary to connect the upper package and the lower package with the mid-level package, and then perform reflow soldering to form a semiconductor stack as shown in Figure 8. Layer encapsulation structure. As shown in Figure 8, the bottom surface of the substrate of the upper package body 9 in the present invention is a metal plate to serve as the conductive connection part of the upper package body; The pillars are used as the conductive connection parts of the lower package body.

可选的,步骤S107中在图7所示的塑封体两侧的金属片的下表面形成焊球,上述中层封装体通过在金属片7下表面的形成焊球与下封装体8的导电连接部位对接,再进行回流焊接;上述中层封装体通过两侧的金属片的上表面与基板上设置有焊球的上封装体9对接,再进行回流焊接,最终形成如图8所示的半导体叠层封装结构。Optionally, in step S107, solder balls are formed on the lower surfaces of the metal sheets on both sides of the plastic package shown in FIG. The above-mentioned middle package body is connected with the upper package body 9 with solder balls on the substrate through the upper surface of the metal sheets on both sides, and then reflow soldering is performed to finally form a semiconductor stack as shown in Figure 8. Layer encapsulation structure.

又或者在步骤S107中在图7所示的塑封体两侧的金属片的上表面形成焊球,上述中层封装体通过金属片7与上表面设置有焊球的下封装体8对接,再进行回流焊接;上述中层封装体通过在金属片7的上表面形成的焊球与上封装体9导电连接部位对接,再进行回流焊接,最终形成如图8所示的半导体叠层封装结构。Alternatively, in step S107, solder balls are formed on the upper surfaces of the metal sheets on both sides of the plastic package shown in FIG. Reflow soldering: the above-mentioned middle package body is connected to the conductive connection part of the upper package body 9 through solder balls formed on the upper surface of the metal sheet 7, and then reflow soldering is performed to finally form a semiconductor stacked package structure as shown in FIG. 8 .

图8为本发明叠层封装结构示意图,通过改进金属板形成QFN框架,利用两侧的金属片7作为中层封装体的电极,实现上封装体9和下封装体8的电互连,叠层封装的多个芯片在整个封装体中实现上下导通;并且封装结构简单,节省封装空间,有利于实现多层塑封体堆叠时芯片封装的微型化,提高芯片封装的集成度。Figure 8 is a schematic diagram of the stacked package structure of the present invention. The QFN frame is formed by improving the metal plate, and the metal sheets 7 on both sides are used as the electrodes of the middle package to realize the electrical interconnection between the upper package 9 and the lower package 8. A plurality of packaged chips realize up-and-down conduction in the entire package body; and the package structure is simple, which saves package space, is conducive to realizing miniaturization of chip packages when stacking multilayer plastic packages, and improves the integration degree of chip packages.

同时,本方案提出的叠层封装为上、中、下三个封装体的连接,当然根据实际的需要,叠层封装的封装体个数可以根据实际情况决定,可以在上封装体与下封装体之间叠层封装更多的芯片封装层,增加叠层封装的结构,形成三层芯片封装或者更多层的芯片封装。At the same time, the stacked package proposed in this solution is the connection of the upper, middle and lower packages. Of course, according to actual needs, the number of packages in the stacked package can be determined according to the actual situation, and the upper package and the lower package can be connected. More chip packaging layers are stacked and packaged between bodies, and the structure of the stacked package is increased to form a three-layer chip package or a chip package with more layers.

在本发明上述各实施例中,实施例的序号和/或先后顺序仅仅便于描述,不代表实施例的优劣。对各个实施例的描述都各有侧重,某个实施例中没有详述的部分,可以参见其他实施例的相关描述。In the above-mentioned embodiments of the present invention, the serial numbers and/or sequences of the embodiments are only for convenience of description, and do not represent the advantages and disadvantages of the embodiments. The description of each embodiment has its own emphases, and for the part that is not described in detail in a certain embodiment, refer to the relevant descriptions of other embodiments.

本领域普通技术人员可以理解:实现上述方法实施例的全部或部分步骤可以通过程序指令相关的硬件来完成,前述的程序可以存储于一计算机可读取存储介质中,该程序在执行时,执行包括上述方法实施例的步骤;而前述的存储介质包括:只读存储器(Read-OnlyMemory,简称ROM)、随机存取存储器(RandomAccessMemory,简称RAM)、磁碟或者光盘等各种可以存储程序代码的介质。Those of ordinary skill in the art can understand that all or part of the steps for realizing the above-mentioned method embodiments can be completed by hardware related to program instructions, and the aforementioned program can be stored in a computer-readable storage medium. When the program is executed, the Including the steps of the above-mentioned method embodiment; and the aforementioned storage medium includes: read-only memory (Read-OnlyMemory, ROM for short), random access memory (RandomAccessMemory, RAM for short), magnetic disk or optical disk, etc., which can store program codes medium.

在本发明的装置和方法等实施例中,显然,各部件或各步骤是可以分解、组合和/或分解后重新组合的。这些分解和/或重新组合应视为本发明的等效方案。同时,在上面对本发明具体实施例的描述中,针对一种实施方式描述和/或示出的特征可以以相同或类似的方式在一个或更多个其它实施方式中使用,与其它实施方式中的特征相组合,或替代其它实施方式中的特征。In the embodiments of the device and method of the present invention, obviously, each component or each step can be decomposed, combined and/or recombined after decomposing. These decompositions and/or recombinations should be considered equivalents of the present invention. Meanwhile, in the above descriptions of specific embodiments of the present invention, features described and/or shown for one embodiment can be used in one or more other embodiments in the same or similar manner, and combination of features, or replace features in other embodiments.

应该强调,术语“包括/包含”在本文使用时指特征、要素、步骤或组件的存在,但并不排除一个或更多个其它特征、要素、步骤或组件的存在或附加。It should be emphasized that the term "comprising/comprising" when used herein refers to the presence of a feature, element, step or component, but does not exclude the presence or addition of one or more other features, elements, steps or components.

最后应说明的是:虽然以上已经详细说明了本发明及其优点,但是应当理解在不超出由所附的权利要求所限定的本发明的精神和范围的情况下可以进行各种改变、替代和变换。而且,本发明的范围不仅限于说明书所描述的过程、设备、手段、方法和步骤的具体实施例。本领域内的普通技术人员从本发明的公开内容将容易理解,根据本发明可以使用执行与在此所述的相应实施例基本相同的功能或者获得与其基本相同的结果的、现有和将来要被开发的过程、设备、手段、方法或者步骤。因此,所附的权利要求旨在在它们的范围内包括这样的过程、设备、手段、方法或者步骤。Finally, it should be noted that although the present invention and its advantages have been described in detail above, it should be understood that various changes, substitutions and modifications can be made without departing from the spirit and scope of the present invention defined by the appended claims. transform. Moreover, the scope of the present invention is not limited to the specific embodiments of the procedures, devices, means, methods and steps described in the specification. Those of ordinary skill in the art will readily appreciate from the disclosure of the present invention that existing and future devices that perform substantially the same function or obtain substantially the same results as the corresponding embodiments described herein can be used in accordance with the present invention. The developed process, device, means, method or steps. Accordingly, the appended claims are intended to include within their scope such processes, means, means, methods or steps.

Claims (10)

1.一种半导体叠层封装方法,包括:1. A semiconductor stack packaging method, comprising: A:制作上封装体,A: Make the upper package, B:制作封装有芯片的中层封装体,B: Make the middle package with the chip packaged, C:将所述上封装体、所述中层封装体和所述下封装体叠层封装,C: laminating and encapsulating the upper package, the middle package and the lower package, 其特征在于,所述步骤B包括:It is characterized in that said step B includes: S101:提供制备上述中层封装体的金属板;S101: providing a metal plate for preparing the above-mentioned intermediate package; S102:对所述金属板的正面半蚀刻形成第一开口,所述第一开口的深度大于待装载的芯片的厚度;S102: half-etching the front side of the metal plate to form a first opening, the depth of the first opening is greater than the thickness of the chip to be loaded; S103:将上述待装载的芯片加装在所述第一开口内并在所述第一开口内进行打线;S103: Install the above-mentioned chip to be loaded in the first opening and perform wire bonding in the first opening; S104:用塑封底填料将芯片固定和封装于所述金属板上形成塑封填料层;S104: Fixing and packaging the chip on the metal plate with plastic underfill to form a plastic underfill layer; S105:对所述金属板的背面进行半蚀刻至塑封填料层,形成第二开口;S105: half-etching the back of the metal plate to the plastic packing layer to form a second opening; S106:在所述第二开口的区域内填充塑封底填料,形成塑封体;S106: filling the area of the second opening with a plastic underfill to form a plastic package; S107:在上述塑封体的正面边缘或者背面边缘处形成焊球。S107: Form solder balls on the front edge or the back edge of the plastic package. 2.根据权利要求1所述的方法,其特征在于,所述步骤C包括:上述中层封装体通过焊球与所述上封装体和所述下封装体的导电连接部位对接,再进行回流焊接形成半导体叠层结构。2. The method according to claim 1, wherein the step C comprises: the above-mentioned middle package body is connected to the conductive connection parts of the upper package body and the lower package body through solder balls, and then reflow soldering is performed A semiconductor stack structure is formed. 3.根据权利要求1所述的方法,其特征在于,步骤S101所述金属板为铜板。3. The method according to claim 1, wherein the metal plate in step S101 is a copper plate. 4.根据权利要求1所述的方法,其特征在于,步骤S102:对所述金属板的正面半蚀刻形成第一开口具体为:4. The method according to claim 1, wherein step S102: half-etching the front side of the metal plate to form the first opening is specifically: 在所述金属板的正面贴膜,进行曝光显影;Sticking a film on the front side of the metal plate for exposure and development; 对曝光显影的部位进行蚀刻形成第一开口,还在所述金属板正面的两侧边缘形成凸起;Etching the exposed and developed part to form a first opening, and forming protrusions on both sides of the front side of the metal plate; 去除上述曝光显影后剩余的膜。The film remaining after the above-mentioned exposure and development is removed. 5.根据权利要求4所述的方法,其特征在于,步骤S104所述塑封体中塑封填料层的高度与所述凸起平齐,所述芯片以塑封底填料固定于所述金属板上并且包封在所述塑封体内部。5. The method according to claim 4, wherein the height of the plastic packing layer in the plastic package in step S104 is flush with the protrusion, the chip is fixed on the metal plate with the plastic bottom packing and encapsulated inside the plastic package. 6.根据权利要求4所述的方法,其特征在于,步骤S105:对所述金属板的背面进行半蚀刻至所述塑封填料层,形成第二开口,具体为:6. The method according to claim 4, characterized in that, step S105: half-etching the back of the metal plate to the plastic packing layer to form a second opening, specifically: 在所述金属板的背面贴膜,进行曝光显影;Sticking a film on the back side of the metal plate for exposure and development; 对曝光显影的部位进行蚀刻,形成第二开口,所述第二开口将上述金属板分隔成形成多个相互隔离的金属板;Etching the exposed and developed parts to form a second opening, the second opening separates the metal plate into a plurality of mutually isolated metal plates; 去除上述曝光显影后剩余的膜。The film remaining after the above-mentioned exposure and development is removed. 7.根据权利要求6所述的方法,其特征在于,所述第一开口的面积大于所述第二开口的面积,且所述第二开口位于所述第一开口对应的金属板的区域内。7. The method according to claim 6, wherein the area of the first opening is larger than the area of the second opening, and the second opening is located in the area of the metal plate corresponding to the first opening . 8.根据权利要求7所述的方法,其特征在于,所述多个相互隔离的金属板包括一金属层以及对称设置在所述金属层两侧的L型金属片,所述芯片连接在所述金属层上;8. The method according to claim 7, wherein the plurality of mutually isolated metal plates comprise a metal layer and L-shaped metal sheets symmetrically arranged on both sides of the metal layer, and the chip is connected to the on the metal layer; 所述金属片包括上述凸起。The metal sheet includes the above-mentioned protrusions. 9.根据权利要求8所述的方法,步骤S107中所述焊球设置在所述L型金属片的正面或者背面。9. The method according to claim 8, wherein in step S107, the solder balls are arranged on the front or back of the L-shaped metal sheet. 10.根据权利要求1-9任一所述的方法,其特征在于,在所述上封装体与所述下封装体之间设置一个或多个中层封装体。10. The method according to any one of claims 1-9, characterized in that one or more intermediate packages are disposed between the upper package and the lower package.
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