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CL2007002991A1 - METHOD FOR PRODUCING ELECTROLYTIC COPPER IN THE FORM OF A DAMAGED SHEET THAT INCLUDES DRIVING THE ELECTROLYING CURRENT THROUGH A WINDOW OF A PROTECTIVE PLATE LOCATED IN THE SURROUNDINGS OF A CATHEDGE OF THOSE MODE THE CONCENTRATION OF CORRECTION - Google Patents

METHOD FOR PRODUCING ELECTROLYTIC COPPER IN THE FORM OF A DAMAGED SHEET THAT INCLUDES DRIVING THE ELECTROLYING CURRENT THROUGH A WINDOW OF A PROTECTIVE PLATE LOCATED IN THE SURROUNDINGS OF A CATHEDGE OF THOSE MODE THE CONCENTRATION OF CORRECTION

Info

Publication number
CL2007002991A1
CL2007002991A1 CL200702991A CL2007002991A CL2007002991A1 CL 2007002991 A1 CL2007002991 A1 CL 2007002991A1 CL 200702991 A CL200702991 A CL 200702991A CL 2007002991 A CL2007002991 A CL 2007002991A CL 2007002991 A1 CL2007002991 A1 CL 2007002991A1
Authority
CL
Chile
Prior art keywords
electrolying
cathedge
surroundings
correction
window
Prior art date
Application number
CL200702991A
Other languages
Spanish (es)
Inventor
Tsuchiya Hiroo
Original Assignee
Nippon Mining Co
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nippon Mining Co filed Critical Nippon Mining Co
Publication of CL2007002991A1 publication Critical patent/CL2007002991A1/en

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25C—PROCESSES FOR THE ELECTROLYTIC PRODUCTION, RECOVERY OR REFINING OF METALS; APPARATUS THEREFOR
    • C25C1/00—Electrolytic production, recovery or refining of metals by electrolysis of solutions
    • C25C1/12—Electrolytic production, recovery or refining of metals by electrolysis of solutions of copper
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25C—PROCESSES FOR THE ELECTROLYTIC PRODUCTION, RECOVERY OR REFINING OF METALS; APPARATUS THEREFOR
    • C25C7/00—Constructional parts, or assemblies thereof, of cells; Servicing or operating of cells
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25C—PROCESSES FOR THE ELECTROLYTIC PRODUCTION, RECOVERY OR REFINING OF METALS; APPARATUS THEREFOR
    • C25C7/00—Constructional parts, or assemblies thereof, of cells; Servicing or operating of cells
    • C25C7/04—Diaphragms; Spacing elements

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Electrochemistry (AREA)
  • Materials Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Electrolytic Production Of Metals (AREA)
CL200702991A 2006-12-26 2007-10-18 METHOD FOR PRODUCING ELECTROLYTIC COPPER IN THE FORM OF A DAMAGED SHEET THAT INCLUDES DRIVING THE ELECTROLYING CURRENT THROUGH A WINDOW OF A PROTECTIVE PLATE LOCATED IN THE SURROUNDINGS OF A CATHEDGE OF THOSE MODE THE CONCENTRATION OF CORRECTION CL2007002991A1 (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2006349103 2006-12-26

Publications (1)

Publication Number Publication Date
CL2007002991A1 true CL2007002991A1 (en) 2008-07-04

Family

ID=39541307

Family Applications (1)

Application Number Title Priority Date Filing Date
CL200702991A CL2007002991A1 (en) 2006-12-26 2007-10-18 METHOD FOR PRODUCING ELECTROLYTIC COPPER IN THE FORM OF A DAMAGED SHEET THAT INCLUDES DRIVING THE ELECTROLYING CURRENT THROUGH A WINDOW OF A PROTECTIVE PLATE LOCATED IN THE SURROUNDINGS OF A CATHEDGE OF THOSE MODE THE CONCENTRATION OF CORRECTION

Country Status (4)

Country Link
US (1) US20080149494A1 (en)
AU (1) AU2007202071A1 (en)
CA (1) CA2592199C (en)
CL (1) CL2007002991A1 (en)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20130153437A1 (en) * 2011-12-20 2013-06-20 Freeport-Mcmoran Corporation Cathode assembly including a barrier, system including the assembly and method for using same
TWI705159B (en) * 2015-09-30 2020-09-21 日商三菱綜合材料股份有限公司 Additive for high-purity copper electrolytic refining, method of producing high-purity copper, and high-purity electrolytic copper
WO2017147388A1 (en) 2016-02-25 2017-08-31 Calera Corporation On-line monitoring of process/system
WO2018156480A1 (en) * 2017-02-24 2018-08-30 Calera Corporation Monitoring condition of electrochemical cells

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5863410A (en) * 1997-06-23 1999-01-26 Circuit Foil Usa, Inc. Process for the manufacture of high quality very low profile copper foil and copper foil produced thereby
LU90532B1 (en) * 2000-02-24 2001-08-27 Circuit Foil Luxembourg Trading Sarl Comosite copper foil and manufacturing method thereof
US20050072683A1 (en) * 2003-04-03 2005-04-07 Ebara Corporation Copper plating bath and plating method
AU2003902048A0 (en) * 2003-04-29 2003-05-15 M.I.M. Holdings Limited Method & apparatus for cathode plate production

Also Published As

Publication number Publication date
US20080149494A1 (en) 2008-06-26
CA2592199C (en) 2010-07-06
CA2592199A1 (en) 2008-06-26
AU2007202071A1 (en) 2008-07-10

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