CA2763870A1 - Dispositif a plasma pour le traitement de grandes surfaces de tissu - Google Patents
Dispositif a plasma pour le traitement de grandes surfaces de tissu Download PDFInfo
- Publication number
- CA2763870A1 CA2763870A1 CA2763870A CA2763870A CA2763870A1 CA 2763870 A1 CA2763870 A1 CA 2763870A1 CA 2763870 A CA2763870 A CA 2763870A CA 2763870 A CA2763870 A CA 2763870A CA 2763870 A1 CA2763870 A1 CA 2763870A1
- Authority
- CA
- Canada
- Prior art keywords
- electrode
- plasma
- plasma device
- electrodes
- dielectric
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Abandoned
Links
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- 125000006850 spacer group Chemical group 0.000 claims abstract description 87
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- 239000011248 coating agent Substances 0.000 claims description 48
- 229910052751 metal Inorganic materials 0.000 claims description 19
- 239000002184 metal Substances 0.000 claims description 19
- 239000011148 porous material Substances 0.000 claims description 17
- 239000003989 dielectric material Substances 0.000 claims description 14
- 238000003780 insertion Methods 0.000 claims description 6
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- 125000000524 functional group Chemical group 0.000 description 6
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- PMHQVHHXPFUNSP-UHFFFAOYSA-M copper(1+);methylsulfanylmethane;bromide Chemical compound Br[Cu].CSC PMHQVHHXPFUNSP-UHFFFAOYSA-M 0.000 description 4
- 230000005281 excited state Effects 0.000 description 4
- 150000004767 nitrides Chemical class 0.000 description 4
- TWNQGVIAIRXVLR-UHFFFAOYSA-N oxo(oxoalumanyloxy)alumane Chemical compound O=[Al]O[Al]=O TWNQGVIAIRXVLR-UHFFFAOYSA-N 0.000 description 4
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- 238000000231 atomic layer deposition Methods 0.000 description 3
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- 238000011144 upstream manufacturing Methods 0.000 description 3
- CURLTUGMZLYLDI-UHFFFAOYSA-N Carbon dioxide Chemical compound O=C=O CURLTUGMZLYLDI-UHFFFAOYSA-N 0.000 description 2
- RTZKZFJDLAIYFH-UHFFFAOYSA-N Diethyl ether Chemical compound CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 description 2
- XPDWGBQVDMORPB-UHFFFAOYSA-N Fluoroform Chemical compound FC(F)F XPDWGBQVDMORPB-UHFFFAOYSA-N 0.000 description 2
- KFZMGEQAYNKOFK-UHFFFAOYSA-N Isopropanol Chemical compound CC(C)O KFZMGEQAYNKOFK-UHFFFAOYSA-N 0.000 description 2
- 241000920340 Pion Species 0.000 description 2
- KWYUFKZDYYNOTN-UHFFFAOYSA-M Potassium hydroxide Chemical compound [OH-].[K+] KWYUFKZDYYNOTN-UHFFFAOYSA-M 0.000 description 2
- 229910001069 Ti alloy Inorganic materials 0.000 description 2
- NRTOMJZYCJJWKI-UHFFFAOYSA-N Titanium nitride Chemical compound [Ti]#N NRTOMJZYCJJWKI-UHFFFAOYSA-N 0.000 description 2
- 150000001336 alkenes Chemical class 0.000 description 2
- 150000001350 alkyl halides Chemical class 0.000 description 2
- 229910052782 aluminium Inorganic materials 0.000 description 2
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 2
- 150000001412 amines Chemical class 0.000 description 2
- 229910052786 argon Inorganic materials 0.000 description 2
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- 239000003054 catalyst Substances 0.000 description 2
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- 150000001875 compounds Chemical class 0.000 description 2
- 238000009792 diffusion process Methods 0.000 description 2
- RWRIWBAIICGTTQ-UHFFFAOYSA-N difluoromethane Chemical compound FCF RWRIWBAIICGTTQ-UHFFFAOYSA-N 0.000 description 2
- 230000005684 electric field Effects 0.000 description 2
- 239000012634 fragment Substances 0.000 description 2
- 125000004435 hydrogen atom Chemical class [H]* 0.000 description 2
- 239000004615 ingredient Substances 0.000 description 2
- 239000012212 insulator Substances 0.000 description 2
- 230000000670 limiting effect Effects 0.000 description 2
- 150000004706 metal oxides Chemical class 0.000 description 2
- 239000002086 nanomaterial Substances 0.000 description 2
- 239000006199 nebulizer Substances 0.000 description 2
- 229910052757 nitrogen Inorganic materials 0.000 description 2
- 230000037361 pathway Effects 0.000 description 2
- 238000004544 sputter deposition Methods 0.000 description 2
- 238000003860 storage Methods 0.000 description 2
- 230000002123 temporal effect Effects 0.000 description 2
- VZGDMQKNWNREIO-UHFFFAOYSA-N tetrachloromethane Chemical compound ClC(Cl)(Cl)Cl VZGDMQKNWNREIO-UHFFFAOYSA-N 0.000 description 2
- 239000010936 titanium Substances 0.000 description 2
- 229910052719 titanium Inorganic materials 0.000 description 2
- OGIDPMRJRNCKJF-UHFFFAOYSA-N titanium oxide Inorganic materials [Ti]=O OGIDPMRJRNCKJF-UHFFFAOYSA-N 0.000 description 2
- XTVRPSBYSGATQQ-UHFFFAOYSA-N 1,2-dinitrosodioxidane Chemical compound O=NOON=O XTVRPSBYSGATQQ-UHFFFAOYSA-N 0.000 description 1
- 241000894006 Bacteria Species 0.000 description 1
- 239000004342 Benzoyl peroxide Substances 0.000 description 1
- OMPJBNCRMGITSC-UHFFFAOYSA-N Benzoylperoxide Chemical group C=1C=CC=CC=1C(=O)OOC(=O)C1=CC=CC=C1 OMPJBNCRMGITSC-UHFFFAOYSA-N 0.000 description 1
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 1
- 239000004593 Epoxy Substances 0.000 description 1
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 description 1
- FYYHWMGAXLPEAU-UHFFFAOYSA-N Magnesium Chemical compound [Mg] FYYHWMGAXLPEAU-UHFFFAOYSA-N 0.000 description 1
- 229910002651 NO3 Inorganic materials 0.000 description 1
- NHNBFGGVMKEFGY-UHFFFAOYSA-N Nitrate Chemical compound [O-][N+]([O-])=O NHNBFGGVMKEFGY-UHFFFAOYSA-N 0.000 description 1
- IOVCWXUNBOPUCH-UHFFFAOYSA-M Nitrite anion Chemical compound [O-]N=O IOVCWXUNBOPUCH-UHFFFAOYSA-M 0.000 description 1
- 239000004809 Teflon Substances 0.000 description 1
- 229920006362 Teflon® Polymers 0.000 description 1
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 description 1
- 239000000011 acetone peroxide Substances 0.000 description 1
- 235000019401 acetone peroxide Nutrition 0.000 description 1
- 230000009471 action Effects 0.000 description 1
- 150000001266 acyl halides Chemical class 0.000 description 1
- 150000001298 alcohols Chemical class 0.000 description 1
- 150000001299 aldehydes Chemical class 0.000 description 1
- 150000001335 aliphatic alkanes Chemical class 0.000 description 1
- 125000000217 alkyl group Chemical group 0.000 description 1
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- 150000001408 amides Chemical class 0.000 description 1
- 238000002048 anodisation reaction Methods 0.000 description 1
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- 235000019400 benzoyl peroxide Nutrition 0.000 description 1
- 238000005513 bias potential Methods 0.000 description 1
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- 125000000484 butyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- 239000001569 carbon dioxide Substances 0.000 description 1
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- 230000003197 catalytic effect Effects 0.000 description 1
- 230000008859 change Effects 0.000 description 1
- 238000005229 chemical vapour deposition Methods 0.000 description 1
- 238000013270 controlled release Methods 0.000 description 1
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- 229910001873 dinitrogen Inorganic materials 0.000 description 1
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- 238000005538 encapsulation Methods 0.000 description 1
- 150000002148 esters Chemical class 0.000 description 1
- 238000005530 etching Methods 0.000 description 1
- 125000001495 ethyl group Chemical group [H]C([H])([H])C([H])([H])* 0.000 description 1
- 230000008020 evaporation Effects 0.000 description 1
- 238000001704 evaporation Methods 0.000 description 1
- 238000002309 gasification Methods 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- 150000004820 halides Chemical class 0.000 description 1
- 230000035876 healing Effects 0.000 description 1
- 125000002887 hydroxy group Chemical group [H]O* 0.000 description 1
- 238000002513 implantation Methods 0.000 description 1
- 238000011065 in-situ storage Methods 0.000 description 1
- 230000000977 initiatory effect Effects 0.000 description 1
- 230000005596 ionic collisions Effects 0.000 description 1
- IQPQWNKOIGAROB-UHFFFAOYSA-N isocyanate Chemical compound [N-]=C=O IQPQWNKOIGAROB-UHFFFAOYSA-N 0.000 description 1
- 239000012948 isocyanate Substances 0.000 description 1
- 150000002513 isocyanates Chemical class 0.000 description 1
- 150000002576 ketones Chemical class 0.000 description 1
- 230000002147 killing effect Effects 0.000 description 1
- 229910052743 krypton Inorganic materials 0.000 description 1
- DNNSSWSSYDEUBZ-UHFFFAOYSA-N krypton atom Chemical compound [Kr] DNNSSWSSYDEUBZ-UHFFFAOYSA-N 0.000 description 1
- 229910052749 magnesium Inorganic materials 0.000 description 1
- 239000011777 magnesium Substances 0.000 description 1
- 230000007246 mechanism Effects 0.000 description 1
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 description 1
- 210000003205 muscle Anatomy 0.000 description 1
- 229910052754 neon Inorganic materials 0.000 description 1
- GKAOGPIIYCISHV-UHFFFAOYSA-N neon atom Chemical compound [Ne] GKAOGPIIYCISHV-UHFFFAOYSA-N 0.000 description 1
- 150000002825 nitriles Chemical class 0.000 description 1
- 125000000449 nitro group Chemical group [O-][N+](*)=O 0.000 description 1
- 210000000056 organ Anatomy 0.000 description 1
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- 238000013032 photocatalytic reaction Methods 0.000 description 1
- 238000006552 photochemical reaction Methods 0.000 description 1
- 238000009832 plasma treatment Methods 0.000 description 1
- 239000011241 protective layer Substances 0.000 description 1
- 230000005855 radiation Effects 0.000 description 1
- 229910052704 radon Inorganic materials 0.000 description 1
- SYUHGPGVQRZVTB-UHFFFAOYSA-N radon atom Chemical compound [Rn] SYUHGPGVQRZVTB-UHFFFAOYSA-N 0.000 description 1
- 239000000376 reactant Substances 0.000 description 1
- 230000004044 response Effects 0.000 description 1
- 230000007017 scission Effects 0.000 description 1
- 230000004936 stimulating effect Effects 0.000 description 1
- 239000000758 substrate Substances 0.000 description 1
- 239000002344 surface layer Substances 0.000 description 1
- TXEYQDLBPFQVAA-UHFFFAOYSA-N tetrafluoromethane Chemical compound FC(F)(F)F TXEYQDLBPFQVAA-UHFFFAOYSA-N 0.000 description 1
- 239000006200 vaporizer Substances 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 1
- 229910052724 xenon Inorganic materials 0.000 description 1
- FHNFHKCVQCLJFQ-UHFFFAOYSA-N xenon atom Chemical compound [Xe] FHNFHKCVQCLJFQ-UHFFFAOYSA-N 0.000 description 1
Landscapes
- Physical Or Chemical Processes And Apparatus (AREA)
- Plasma Technology (AREA)
Abstract
L'invention concerne un dispositif à plasma qui comprend des électrodes intérieure et extérieure. L'électrode intérieure présente une forme tubulaire sensiblement cylindrique et comporte une ouverture définie à travers celle-ci. L'électrode intérieure comporte une partie proximale. L'électrode extérieure présente une forme tubulaire sensiblement cylindrique et est placée coaxialement autour de la partie proximale de l'électrode intérieure. Un espaceur diélectrique comprenant une forme sensiblement toroïdale est placé entre l'électrode intérieure et l'électrode extérieure. Les électrodes intérieure et extérieure sont conçues pour être couplées à une source de milieu ionisable destinée à leur fournir un milieu ionisable. Les électrodes intérieure et extérieure sont conçues pour être couplées à une source d'alimentation destinée à enflammer le milieu ionisable dans le dispositif à plasma pour former un effluent de plasma.
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| USPCT/US2009/045708 | 2009-05-29 | ||
| PCT/US2009/045708 WO2009146432A1 (fr) | 2008-05-30 | 2009-05-29 | Dispositif de source chimique à base de plasma et procédé d'utilisation de celle-ci |
| PCT/US2009/005399 WO2010138105A1 (fr) | 2008-05-30 | 2009-09-30 | Dispositif à plasma pour le traitement de grandes surfaces de tissu |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CA2763870A1 true CA2763870A1 (fr) | 2010-12-02 |
Family
ID=45444998
Family Applications (4)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CA2763868A Abandoned CA2763868A1 (fr) | 2009-05-29 | 2009-09-30 | Matieres de surface d'electrode et structures pour plasmachimie |
| CA2763866A Abandoned CA2763866A1 (fr) | 2009-05-29 | 2009-09-30 | Configuration d'electrode a plasma pour former une couche de gaine d'electrons |
| CA2763870A Abandoned CA2763870A1 (fr) | 2009-05-29 | 2009-09-30 | Dispositif a plasma pour le traitement de grandes surfaces de tissu |
| CA2763869A Abandoned CA2763869A1 (fr) | 2009-05-29 | 2009-09-30 | Systemes et procedes d'application de plasma |
Family Applications Before (2)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CA2763868A Abandoned CA2763868A1 (fr) | 2009-05-29 | 2009-09-30 | Matieres de surface d'electrode et structures pour plasmachimie |
| CA2763866A Abandoned CA2763866A1 (fr) | 2009-05-29 | 2009-09-30 | Configuration d'electrode a plasma pour former une couche de gaine d'electrons |
Family Applications After (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CA2763869A Abandoned CA2763869A1 (fr) | 2009-05-29 | 2009-09-30 | Systemes et procedes d'application de plasma |
Country Status (2)
| Country | Link |
|---|---|
| AU (4) | AU2009347180B2 (fr) |
| CA (4) | CA2763868A1 (fr) |
Family Cites Families (10)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5697882A (en) * | 1992-01-07 | 1997-12-16 | Arthrocare Corporation | System and method for electrosurgical cutting and ablation |
| US5961772A (en) * | 1997-01-23 | 1999-10-05 | The Regents Of The University Of California | Atmospheric-pressure plasma jet |
| US6224447B1 (en) * | 1998-06-22 | 2001-05-01 | Micron Technology, Inc. | Electrode structures, display devices containing the same, and methods for making the same |
| US6723091B2 (en) * | 2000-02-22 | 2004-04-20 | Gyrus Medical Limited | Tissue resurfacing |
| US7011790B2 (en) * | 2001-05-07 | 2006-03-14 | Regents Of The University Of Minnesota | Non-thermal disinfection of biological fluids using non-thermal plasma |
| US20050118350A1 (en) * | 2002-03-28 | 2005-06-02 | Pavel Koulik | Atmospheric plasma surface treatment method and device for same |
| TWI264313B (en) * | 2002-08-07 | 2006-10-21 | Access Business Group Int Llc | Nonthermal plasma air treatment system |
| KR100530765B1 (ko) * | 2002-10-04 | 2005-11-23 | 이규왕 | 나노 다공성 유전체를 이용한 플라즈마 발생장치 |
| EP3454627B1 (fr) * | 2006-02-17 | 2023-12-13 | Hypertherm, Inc. | Ensemble pour une torche à plasma d'arc à démarrage par contact |
| US7589473B2 (en) * | 2007-08-06 | 2009-09-15 | Plasma Surgical Investments, Ltd. | Pulsed plasma device and method for generating pulsed plasma |
-
2009
- 2009-09-30 CA CA2763868A patent/CA2763868A1/fr not_active Abandoned
- 2009-09-30 AU AU2009347180A patent/AU2009347180B2/en not_active Ceased
- 2009-09-30 AU AU2009347177A patent/AU2009347177B2/en not_active Ceased
- 2009-09-30 AU AU2009347179A patent/AU2009347179B2/en not_active Ceased
- 2009-09-30 AU AU2009347178A patent/AU2009347178B2/en not_active Ceased
- 2009-09-30 CA CA2763866A patent/CA2763866A1/fr not_active Abandoned
- 2009-09-30 CA CA2763870A patent/CA2763870A1/fr not_active Abandoned
- 2009-09-30 CA CA2763869A patent/CA2763869A1/fr not_active Abandoned
Also Published As
| Publication number | Publication date |
|---|---|
| CA2763868A1 (fr) | 2010-12-02 |
| AU2009347180A1 (en) | 2012-01-12 |
| AU2009347180B2 (en) | 2014-01-09 |
| AU2009347178A1 (en) | 2012-01-12 |
| AU2009347179B2 (en) | 2014-02-06 |
| AU2009347177B2 (en) | 2014-01-09 |
| AU2009347177A1 (en) | 2012-01-12 |
| CA2763866A1 (fr) | 2010-12-02 |
| AU2009347179A1 (en) | 2012-01-12 |
| AU2009347178B2 (en) | 2013-10-24 |
| CA2763869A1 (fr) | 2010-12-02 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| EEER | Examination request |
Effective date: 20140910 |
|
| FZDE | Discontinued |
Effective date: 20160930 |
|
| FZDE | Discontinued |
Effective date: 20160930 |