CA2348653A1 - Matrice cathodique creuse pour generation de plasma - Google Patents
Matrice cathodique creuse pour generation de plasma Download PDFInfo
- Publication number
- CA2348653A1 CA2348653A1 CA002348653A CA2348653A CA2348653A1 CA 2348653 A1 CA2348653 A1 CA 2348653A1 CA 002348653 A CA002348653 A CA 002348653A CA 2348653 A CA2348653 A CA 2348653A CA 2348653 A1 CA2348653 A1 CA 2348653A1
- Authority
- CA
- Canada
- Prior art keywords
- plasma
- cells
- cathode assembly
- substrate
- generating apparatus
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Abandoned
Links
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- 238000000034 method Methods 0.000 claims description 39
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- 229920001577 copolymer Polymers 0.000 claims description 8
- 229930195733 hydrocarbon Natural products 0.000 claims description 8
- 150000002430 hydrocarbons Chemical class 0.000 claims description 8
- -1 polyethylene terephthalate Polymers 0.000 claims description 7
- 238000004806 packaging method and process Methods 0.000 claims description 6
- UFWIBTONFRDIAS-UHFFFAOYSA-N Naphthalene Chemical compound C1=CC=CC2=CC=CC=C21 UFWIBTONFRDIAS-UHFFFAOYSA-N 0.000 claims description 4
- WERYXYBDKMZEQL-UHFFFAOYSA-N butane-1,4-diol Chemical group OCCCCO WERYXYBDKMZEQL-UHFFFAOYSA-N 0.000 claims description 4
- WGCNASOHLSPBMP-UHFFFAOYSA-N hydroxyacetaldehyde Natural products OCC=O WGCNASOHLSPBMP-UHFFFAOYSA-N 0.000 claims description 4
- 238000002360 preparation method Methods 0.000 claims description 4
- YPFDHNVEDLHUCE-UHFFFAOYSA-N propane-1,3-diol Chemical group OCCCO YPFDHNVEDLHUCE-UHFFFAOYSA-N 0.000 claims description 4
- 230000001788 irregular Effects 0.000 claims description 3
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- 229920001721 polyimide Polymers 0.000 claims description 3
- 238000007789 sealing Methods 0.000 claims description 3
- LLLVZDVNHNWSDS-UHFFFAOYSA-N 4-methylidene-3,5-dioxabicyclo[5.2.2]undeca-1(9),7,10-triene-2,6-dione Chemical compound C1(C2=CC=C(C(=O)OC(=C)O1)C=C2)=O LLLVZDVNHNWSDS-UHFFFAOYSA-N 0.000 claims description 2
- 239000002202 Polyethylene glycol Substances 0.000 claims description 2
- 239000002253 acid Substances 0.000 claims description 2
- TVIDDXQYHWJXFK-UHFFFAOYSA-N dodecanedioic acid Chemical group OC(=O)CCCCCCCCCCC(O)=O TVIDDXQYHWJXFK-UHFFFAOYSA-N 0.000 claims description 2
- 229920001519 homopolymer Polymers 0.000 claims description 2
- 229920001223 polyethylene glycol Polymers 0.000 claims description 2
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- 238000010926 purge Methods 0.000 claims description 2
- MTHSVFCYNBDYFN-UHFFFAOYSA-N diethylene glycol Chemical group OCCOCCO MTHSVFCYNBDYFN-UHFFFAOYSA-N 0.000 claims 3
- 239000004642 Polyimide Substances 0.000 claims 1
- 125000003827 glycol group Chemical group 0.000 claims 1
- 239000010408 film Substances 0.000 abstract description 14
- 239000002245 particle Substances 0.000 abstract description 6
- 239000000835 fiber Substances 0.000 abstract description 4
- 210000002381 plasma Anatomy 0.000 description 83
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- QGZKDVFQNNGYKY-UHFFFAOYSA-N Ammonia Chemical compound N QGZKDVFQNNGYKY-UHFFFAOYSA-N 0.000 description 10
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- 229910052802 copper Inorganic materials 0.000 description 7
- 230000004888 barrier function Effects 0.000 description 6
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- 229910021529 ammonia Inorganic materials 0.000 description 5
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 5
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- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 4
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- 239000004020 conductor Substances 0.000 description 3
- 238000003851 corona treatment Methods 0.000 description 3
- 230000000694 effects Effects 0.000 description 3
- 239000000203 mixture Substances 0.000 description 3
- 229910001220 stainless steel Inorganic materials 0.000 description 3
- 239000010935 stainless steel Substances 0.000 description 3
- 229920001169 thermoplastic Polymers 0.000 description 3
- 238000000427 thin-film deposition Methods 0.000 description 3
- 229920002799 BoPET Polymers 0.000 description 2
- KAKZBPTYRLMSJV-UHFFFAOYSA-N Butadiene Chemical compound C=CC=C KAKZBPTYRLMSJV-UHFFFAOYSA-N 0.000 description 2
- CURLTUGMZLYLDI-UHFFFAOYSA-N Carbon dioxide Chemical compound O=C=O CURLTUGMZLYLDI-UHFFFAOYSA-N 0.000 description 2
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 2
- GQPLMRYTRLFLPF-UHFFFAOYSA-N Nitrous Oxide Chemical compound [O-][N+]#N GQPLMRYTRLFLPF-UHFFFAOYSA-N 0.000 description 2
- HSFWRNGVRCDJHI-UHFFFAOYSA-N alpha-acetylene Natural products C#C HSFWRNGVRCDJHI-UHFFFAOYSA-N 0.000 description 2
- 230000004075 alteration Effects 0.000 description 2
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- 239000011248 coating agent Substances 0.000 description 2
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- 229910052751 metal Inorganic materials 0.000 description 2
- 239000002184 metal Substances 0.000 description 2
- VNWKTOKETHGBQD-UHFFFAOYSA-N methane Chemical compound C VNWKTOKETHGBQD-UHFFFAOYSA-N 0.000 description 2
- 229910052757 nitrogen Inorganic materials 0.000 description 2
- BASFCYQUMIYNBI-UHFFFAOYSA-N platinum Chemical compound [Pt] BASFCYQUMIYNBI-UHFFFAOYSA-N 0.000 description 2
- 229920001707 polybutylene terephthalate Polymers 0.000 description 2
- 238000012545 processing Methods 0.000 description 2
- 239000000126 substance Substances 0.000 description 2
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- 239000004416 thermosoftening plastic Substances 0.000 description 2
- 231100000331 toxic Toxicity 0.000 description 2
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- VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 description 1
- VGGSQFUCUMXWEO-UHFFFAOYSA-N Ethene Chemical compound C=C VGGSQFUCUMXWEO-UHFFFAOYSA-N 0.000 description 1
- 239000005977 Ethylene Substances 0.000 description 1
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 description 1
- ZOKXTWBITQBERF-UHFFFAOYSA-N Molybdenum Chemical compound [Mo] ZOKXTWBITQBERF-UHFFFAOYSA-N 0.000 description 1
- CBENFWSGALASAD-UHFFFAOYSA-N Ozone Chemical compound [O-][O+]=O CBENFWSGALASAD-UHFFFAOYSA-N 0.000 description 1
- 239000004952 Polyamide Substances 0.000 description 1
- ATJFFYVFTNAWJD-UHFFFAOYSA-N Tin Chemical compound [Sn] ATJFFYVFTNAWJD-UHFFFAOYSA-N 0.000 description 1
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 description 1
- QCWXUUIWCKQGHC-UHFFFAOYSA-N Zirconium Chemical compound [Zr] QCWXUUIWCKQGHC-UHFFFAOYSA-N 0.000 description 1
- 238000002679 ablation Methods 0.000 description 1
- OJXKMYHYASRMAN-UHFFFAOYSA-N acetylene;argon Chemical compound [Ar].C#C OJXKMYHYASRMAN-UHFFFAOYSA-N 0.000 description 1
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- 229910045601 alloy Inorganic materials 0.000 description 1
- 229910052782 aluminium Inorganic materials 0.000 description 1
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 1
- 238000003491 array Methods 0.000 description 1
- 238000010923 batch production Methods 0.000 description 1
- 235000013405 beer Nutrition 0.000 description 1
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- 239000001569 carbon dioxide Substances 0.000 description 1
- 229910002092 carbon dioxide Inorganic materials 0.000 description 1
- 235000012174 carbonated soft drink Nutrition 0.000 description 1
- 230000001413 cellular effect Effects 0.000 description 1
- 239000000919 ceramic Substances 0.000 description 1
- 238000007385 chemical modification Methods 0.000 description 1
- 239000013626 chemical specie Substances 0.000 description 1
- 229910052804 chromium Inorganic materials 0.000 description 1
- 239000011651 chromium Substances 0.000 description 1
- 238000004140 cleaning Methods 0.000 description 1
- 150000001875 compounds Chemical class 0.000 description 1
- 238000011109 contamination Methods 0.000 description 1
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- 238000005520 cutting process Methods 0.000 description 1
- 230000001419 dependent effect Effects 0.000 description 1
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- 238000009792 diffusion process Methods 0.000 description 1
- 230000005611 electricity Effects 0.000 description 1
- UHPJWJRERDJHOJ-UHFFFAOYSA-N ethene;naphthalene-1-carboxylic acid Chemical compound C=C.C1=CC=C2C(C(=O)O)=CC=CC2=C1 UHPJWJRERDJHOJ-UHFFFAOYSA-N 0.000 description 1
- 125000000524 functional group Chemical group 0.000 description 1
- 150000004820 halides Chemical class 0.000 description 1
- 150000008282 halocarbons Chemical class 0.000 description 1
- 231100001261 hazardous Toxicity 0.000 description 1
- 239000001307 helium Substances 0.000 description 1
- 229910052734 helium Inorganic materials 0.000 description 1
- SWQJXJOGLNCZEY-UHFFFAOYSA-N helium atom Chemical compound [He] SWQJXJOGLNCZEY-UHFFFAOYSA-N 0.000 description 1
- 239000001257 hydrogen Substances 0.000 description 1
- 229910052739 hydrogen Inorganic materials 0.000 description 1
- 230000003993 interaction Effects 0.000 description 1
- 150000002500 ions Chemical class 0.000 description 1
- 230000000873 masking effect Effects 0.000 description 1
- 239000012528 membrane Substances 0.000 description 1
- 239000010445 mica Substances 0.000 description 1
- 229910052618 mica group Inorganic materials 0.000 description 1
- 229910052750 molybdenum Inorganic materials 0.000 description 1
- 239000011733 molybdenum Substances 0.000 description 1
- 230000007935 neutral effect Effects 0.000 description 1
- 229910052759 nickel Inorganic materials 0.000 description 1
- 239000001272 nitrous oxide Substances 0.000 description 1
- 230000003534 oscillatory effect Effects 0.000 description 1
- 230000000704 physical effect Effects 0.000 description 1
- 238000002294 plasma sputter deposition Methods 0.000 description 1
- 229910052697 platinum Inorganic materials 0.000 description 1
- 229920003223 poly(pyromellitimide-1,4-diphenyl ether) Polymers 0.000 description 1
- 229920002647 polyamide Polymers 0.000 description 1
- 229920000515 polycarbonate Polymers 0.000 description 1
- 239000004417 polycarbonate Substances 0.000 description 1
- 239000011112 polyethylene naphthalate Substances 0.000 description 1
- 229920006254 polymer film Polymers 0.000 description 1
- 229920000098 polyolefin Polymers 0.000 description 1
- 239000000843 powder Substances 0.000 description 1
- 239000000047 product Substances 0.000 description 1
- 238000010791 quenching Methods 0.000 description 1
- 150000003254 radicals Chemical class 0.000 description 1
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- 238000013341 scale-up Methods 0.000 description 1
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- 239000002904 solvent Substances 0.000 description 1
- 238000004544 sputter deposition Methods 0.000 description 1
- 239000002344 surface layer Substances 0.000 description 1
- KKEYFWRCBNTPAC-UHFFFAOYSA-L terephthalate(2-) Chemical compound [O-]C(=O)C1=CC=C(C([O-])=O)C=C1 KKEYFWRCBNTPAC-UHFFFAOYSA-L 0.000 description 1
- 238000012360 testing method Methods 0.000 description 1
- 229910052719 titanium Inorganic materials 0.000 description 1
- 239000010936 titanium Substances 0.000 description 1
- 238000012546 transfer Methods 0.000 description 1
- WFKWXMTUELFFGS-UHFFFAOYSA-N tungsten Chemical compound [W] WFKWXMTUELFFGS-UHFFFAOYSA-N 0.000 description 1
- 229910052721 tungsten Inorganic materials 0.000 description 1
- 239000010937 tungsten Substances 0.000 description 1
- 239000002699 waste material Substances 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Chemical compound O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 1
- 238000003466 welding Methods 0.000 description 1
- 229910052726 zirconium Inorganic materials 0.000 description 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J17/00—Gas-filled discharge tubes with solid cathode
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/32431—Constructional details of the reactor
- H01J37/32532—Electrodes
- H01J37/32596—Hollow cathodes
Landscapes
- Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- Plasma & Fusion (AREA)
- Chemical & Material Sciences (AREA)
- Analytical Chemistry (AREA)
- Treatments Of Macromolecular Shaped Articles (AREA)
- Physical Or Chemical Processes And Apparatus (AREA)
- Plasma Technology (AREA)
- Chemical Vapour Deposition (AREA)
Abstract
La présente invention concerne un ensemble cathodique destiné à la création d'un plasma de décharge. Cette cathode est constituée d'une pluralité de cellules creuses de génération de plasma électroconductrices. Ces cellules qui sont disposées en matrice, sont électriquement connectées les unes aux autres. Le plasma produit permet de modifier les propriétés de surface de substrats tels que films, fibres, particules et autres articles.
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US11111698P | 1998-12-07 | 1998-12-07 | |
| US60/111,116 | 1998-12-07 | ||
| PCT/US1999/028841 WO2000034979A1 (fr) | 1998-12-07 | 1999-12-06 | Matrice cathodique creuse pour generation de plasma |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CA2348653A1 true CA2348653A1 (fr) | 2000-06-15 |
Family
ID=22336697
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CA002348653A Abandoned CA2348653A1 (fr) | 1998-12-07 | 1999-12-06 | Matrice cathodique creuse pour generation de plasma |
Country Status (8)
| Country | Link |
|---|---|
| EP (1) | EP1141996A1 (fr) |
| JP (1) | JP2002532828A (fr) |
| KR (1) | KR20010101137A (fr) |
| CN (1) | CN1331836A (fr) |
| AU (1) | AU1842200A (fr) |
| CA (1) | CA2348653A1 (fr) |
| TW (1) | TW470995B (fr) |
| WO (1) | WO2000034979A1 (fr) |
Families Citing this family (18)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE10120405B4 (de) * | 2001-04-25 | 2008-08-21 | Je Plasmaconsult Gmbh | Vorrichtung zur Erzeugung eines Niedertemperatur-Plasmas |
| KR20040022639A (ko) * | 2002-09-09 | 2004-03-16 | 주식회사 네오바이오텍 | 탄소계 물질 박막 형성방법 |
| DE10256663B3 (de) * | 2002-12-04 | 2005-10-13 | Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. | Gasentladungslampe für EUV-Strahlung |
| SE529056C2 (sv) | 2005-07-08 | 2007-04-17 | Plasma Surgical Invest Ltd | Plasmaalstrande anordning, plasmakirurgisk anordning och användning av en plasmakirurgisk anordning |
| SE529053C2 (sv) | 2005-07-08 | 2007-04-17 | Plasma Surgical Invest Ltd | Plasmaalstrande anordning, plasmakirurgisk anordning och användning av en plasmakirurgisk anordning |
| SE529058C2 (sv) | 2005-07-08 | 2007-04-17 | Plasma Surgical Invest Ltd | Plasmaalstrande anordning, plasmakirurgisk anordning, användning av en plasmakirurgisk anordning och förfarande för att bilda ett plasma |
| JP4984285B2 (ja) * | 2007-01-23 | 2012-07-25 | 独立行政法人産業技術総合研究所 | 高密度プラズマ処理装置 |
| US8742282B2 (en) * | 2007-04-16 | 2014-06-03 | General Electric Company | Ablative plasma gun |
| EP2557902B1 (fr) * | 2007-08-06 | 2016-11-23 | Plasma Surgical Investments Limited | Ensemble cathodique et procédé de génération de plasma pulsé |
| US8735766B2 (en) | 2007-08-06 | 2014-05-27 | Plasma Surgical Investments Limited | Cathode assembly and method for pulsed plasma generation |
| US8613742B2 (en) | 2010-01-29 | 2013-12-24 | Plasma Surgical Investments Limited | Methods of sealing vessels using plasma |
| US9089319B2 (en) | 2010-07-22 | 2015-07-28 | Plasma Surgical Investments Limited | Volumetrically oscillating plasma flows |
| JP5702968B2 (ja) | 2010-08-11 | 2015-04-15 | 東京エレクトロン株式会社 | プラズマ処理装置及びプラズマ制御方法 |
| DE102012201956A1 (de) * | 2012-02-09 | 2013-08-14 | Krones Ag | Hohlkathoden-Gaslanze für die Innenbeschichtung von Behältern |
| KR101506305B1 (ko) * | 2012-12-17 | 2015-03-26 | 한국생산기술연구원 | 중공관 단위체로 구성된 음극을 포함하는 질화처리용 플라즈마 장치 및 그를 이용한 플라즈마 질화처리 방법 |
| CN103730320B (zh) * | 2013-12-23 | 2016-09-28 | 苏州市奥普斯等离子体科技有限公司 | 一种微空心阴极等离子体处理装置 |
| US20160093477A1 (en) * | 2014-09-25 | 2016-03-31 | Apple Inc. | Durable 3d geometry conformal anti-reflection coating |
| CA3191050A1 (fr) | 2020-08-28 | 2022-03-03 | Nikolay Suslov | Systemes, procedes et dispositifs pour generer un flux de plasma etendu principalement radialement |
Family Cites Families (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4637853A (en) * | 1985-07-29 | 1987-01-20 | International Business Machines Corporation | Hollow cathode enhanced plasma for high rate reactive ion etching and deposition |
| JPS644481A (en) * | 1987-06-24 | 1989-01-09 | Minoru Sugawara | Parallel-plate discharge electrode |
| JPH0266941A (ja) * | 1988-08-31 | 1990-03-07 | Nec Corp | エッチング装置 |
| SE503260C2 (sv) * | 1992-06-15 | 1996-04-29 | Akerlund & Rausing Ab | Förfarande för framställning av en barriärfilm medelst plasmabehandling |
| EP0634778A1 (fr) * | 1993-07-12 | 1995-01-18 | The Boc Group, Inc. | Réseau de cathodes creuser |
| DE19755902C1 (de) * | 1997-12-08 | 1999-05-12 | Fraunhofer Ges Forschung | Verfahren und Vorrichtung zum Vergüten von Oberflächen |
-
1999
- 1999-12-06 EP EP99961943A patent/EP1141996A1/fr not_active Withdrawn
- 1999-12-06 WO PCT/US1999/028841 patent/WO2000034979A1/fr not_active Ceased
- 1999-12-06 JP JP2000587353A patent/JP2002532828A/ja active Pending
- 1999-12-06 CA CA002348653A patent/CA2348653A1/fr not_active Abandoned
- 1999-12-06 CN CN99814158A patent/CN1331836A/zh active Pending
- 1999-12-06 AU AU18422/00A patent/AU1842200A/en not_active Abandoned
- 1999-12-06 KR KR1020017007066A patent/KR20010101137A/ko not_active Withdrawn
- 1999-12-07 TW TW088121388A patent/TW470995B/zh not_active IP Right Cessation
Also Published As
| Publication number | Publication date |
|---|---|
| JP2002532828A (ja) | 2002-10-02 |
| TW470995B (en) | 2002-01-01 |
| CN1331836A (zh) | 2002-01-16 |
| AU1842200A (en) | 2000-06-26 |
| KR20010101137A (ko) | 2001-11-14 |
| WO2000034979A1 (fr) | 2000-06-15 |
| EP1141996A1 (fr) | 2001-10-10 |
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