CA1246008A - Electrode with nickel substrate and coating of nickel and platinum group metal compounds - Google Patents
Electrode with nickel substrate and coating of nickel and platinum group metal compoundsInfo
- Publication number
- CA1246008A CA1246008A CA000455237A CA455237A CA1246008A CA 1246008 A CA1246008 A CA 1246008A CA 000455237 A CA000455237 A CA 000455237A CA 455237 A CA455237 A CA 455237A CA 1246008 A CA1246008 A CA 1246008A
- Authority
- CA
- Canada
- Prior art keywords
- substrate
- coating
- nickel
- metal oxide
- metal
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- 239000000758 substrate Substances 0.000 title claims abstract description 84
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 title claims description 92
- 238000000576 coating method Methods 0.000 title claims description 84
- 239000011248 coating agent Substances 0.000 title claims description 71
- 229910052759 nickel Inorganic materials 0.000 title claims description 44
- -1 platinum group metal compounds Chemical class 0.000 title claims description 31
- 229910044991 metal oxide Inorganic materials 0.000 claims abstract description 65
- 150000004706 metal oxides Chemical class 0.000 claims abstract description 50
- 238000000034 method Methods 0.000 claims abstract description 46
- 150000001875 compounds Chemical class 0.000 claims abstract description 14
- 239000002243 precursor Substances 0.000 claims abstract description 14
- 239000000203 mixture Substances 0.000 claims abstract description 13
- 239000012702 metal oxide precursor Substances 0.000 claims abstract description 11
- 238000005530 etching Methods 0.000 claims abstract description 8
- 239000003039 volatile agent Substances 0.000 claims abstract description 5
- 229910052751 metal Inorganic materials 0.000 claims description 82
- 239000002184 metal Substances 0.000 claims description 82
- HEMHJVSKTPXQMS-UHFFFAOYSA-M Sodium hydroxide Chemical compound [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 claims description 37
- BASFCYQUMIYNBI-UHFFFAOYSA-N platinum Chemical group [Pt] BASFCYQUMIYNBI-UHFFFAOYSA-N 0.000 claims description 22
- 239000000243 solution Substances 0.000 claims description 20
- 239000012528 membrane Substances 0.000 claims description 19
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 claims description 15
- 238000010438 heat treatment Methods 0.000 claims description 15
- MCMNRKCIXSYSNV-UHFFFAOYSA-N Zirconium dioxide Chemical group O=[Zr]=O MCMNRKCIXSYSNV-UHFFFAOYSA-N 0.000 claims description 14
- 239000001257 hydrogen Substances 0.000 claims description 14
- 229910052739 hydrogen Inorganic materials 0.000 claims description 14
- 239000003607 modifier Substances 0.000 claims description 14
- 239000003513 alkali Substances 0.000 claims description 12
- 239000000460 chlorine Substances 0.000 claims description 12
- 239000008241 heterogeneous mixture Substances 0.000 claims description 10
- 229910000480 nickel oxide Inorganic materials 0.000 claims description 10
- GNRSAWUEBMWBQH-UHFFFAOYSA-N oxonickel Chemical compound [Ni]=O GNRSAWUEBMWBQH-UHFFFAOYSA-N 0.000 claims description 10
- WOCIAKWEIIZHES-UHFFFAOYSA-N ruthenium(iv) oxide Chemical compound O=[Ru]=O WOCIAKWEIIZHES-UHFFFAOYSA-N 0.000 claims description 10
- 229910052801 chlorine Inorganic materials 0.000 claims description 9
- 238000005868 electrolysis reaction Methods 0.000 claims description 9
- OAKJQQAXSVQMHS-UHFFFAOYSA-N Hydrazine Chemical compound NN OAKJQQAXSVQMHS-UHFFFAOYSA-N 0.000 claims description 8
- FAPWRFPIFSIZLT-UHFFFAOYSA-M Sodium chloride Chemical compound [Na+].[Cl-] FAPWRFPIFSIZLT-UHFFFAOYSA-M 0.000 claims description 8
- 229910052697 platinum Inorganic materials 0.000 claims description 8
- 229910052707 ruthenium Inorganic materials 0.000 claims description 8
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical group Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 claims description 7
- 239000000126 substance Substances 0.000 claims description 7
- 229910045601 alloy Inorganic materials 0.000 claims description 6
- 239000000956 alloy Substances 0.000 claims description 6
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 claims description 6
- 229910052741 iridium Inorganic materials 0.000 claims description 6
- 239000001301 oxygen Substances 0.000 claims description 6
- 229910052760 oxygen Inorganic materials 0.000 claims description 6
- 229910052763 palladium Inorganic materials 0.000 claims description 6
- 229910052703 rhodium Inorganic materials 0.000 claims description 6
- 239000007864 aqueous solution Substances 0.000 claims description 5
- 229910052762 osmium Inorganic materials 0.000 claims description 5
- ZAMOUSCENKQFHK-UHFFFAOYSA-N Chlorine atom Chemical compound [Cl] ZAMOUSCENKQFHK-UHFFFAOYSA-N 0.000 claims description 4
- 238000000151 deposition Methods 0.000 claims description 4
- 239000007800 oxidant agent Substances 0.000 claims description 4
- 239000011780 sodium chloride Substances 0.000 claims description 4
- 238000005341 cation exchange Methods 0.000 claims description 3
- 230000003647 oxidation Effects 0.000 claims description 3
- 238000007254 oxidation reaction Methods 0.000 claims description 3
- RVTZCBVAJQQJTK-UHFFFAOYSA-N oxygen(2-);zirconium(4+) Chemical group [O-2].[O-2].[Zr+4] RVTZCBVAJQQJTK-UHFFFAOYSA-N 0.000 claims description 3
- 229910001925 ruthenium oxide Inorganic materials 0.000 claims description 3
- 229910001928 zirconium oxide Inorganic materials 0.000 claims description 3
- KJTLSVCANCCWHF-UHFFFAOYSA-N Ruthenium Chemical compound [Ru] KJTLSVCANCCWHF-UHFFFAOYSA-N 0.000 claims description 2
- QAOWNCQODCNURD-UHFFFAOYSA-N Sulfuric acid Chemical compound OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 claims description 2
- 238000004519 manufacturing process Methods 0.000 claims description 2
- 239000000463 material Substances 0.000 claims description 2
- 150000002736 metal compounds Chemical class 0.000 claims description 2
- 150000002816 nickel compounds Chemical class 0.000 claims description 2
- MUMZUERVLWJKNR-UHFFFAOYSA-N oxoplatinum Chemical group [Pt]=O MUMZUERVLWJKNR-UHFFFAOYSA-N 0.000 claims description 2
- 229910003446 platinum oxide Inorganic materials 0.000 claims description 2
- 239000001117 sulphuric acid Substances 0.000 claims description 2
- 235000011149 sulphuric acid Nutrition 0.000 claims description 2
- 239000002585 base Substances 0.000 claims 4
- NBIIXXVUZAFLBC-UHFFFAOYSA-N Phosphoric acid Chemical compound OP(O)(O)=O NBIIXXVUZAFLBC-UHFFFAOYSA-N 0.000 claims 2
- GRYLNZFGIOXLOG-UHFFFAOYSA-N Nitric acid Chemical compound O[N+]([O-])=O GRYLNZFGIOXLOG-UHFFFAOYSA-N 0.000 claims 1
- 229910019142 PO4 Inorganic materials 0.000 claims 1
- 229910000147 aluminium phosphate Inorganic materials 0.000 claims 1
- 229910001510 metal chloride Inorganic materials 0.000 claims 1
- 150000002823 nitrates Chemical class 0.000 claims 1
- 229910017604 nitric acid Inorganic materials 0.000 claims 1
- 235000021317 phosphate Nutrition 0.000 claims 1
- 150000003013 phosphoric acid derivatives Chemical class 0.000 claims 1
- 150000003467 sulfuric acid derivatives Chemical class 0.000 claims 1
- 239000007772 electrode material Substances 0.000 abstract description 5
- 238000011065 in-situ storage Methods 0.000 abstract description 3
- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 description 16
- 150000002739 metals Chemical class 0.000 description 15
- KFZMGEQAYNKOFK-UHFFFAOYSA-N Isopropanol Chemical compound CC(C)O KFZMGEQAYNKOFK-UHFFFAOYSA-N 0.000 description 12
- 238000002386 leaching Methods 0.000 description 10
- 239000012267 brine Substances 0.000 description 9
- HPALAKNZSZLMCH-UHFFFAOYSA-M sodium;chloride;hydrate Chemical compound O.[Na+].[Cl-] HPALAKNZSZLMCH-UHFFFAOYSA-M 0.000 description 9
- 229910052742 iron Inorganic materials 0.000 description 8
- KZBUYRJDOAKODT-UHFFFAOYSA-N Chlorine Chemical compound ClCl KZBUYRJDOAKODT-UHFFFAOYSA-N 0.000 description 7
- 239000010959 steel Substances 0.000 description 6
- 239000010936 titanium Substances 0.000 description 6
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 6
- 229910000831 Steel Inorganic materials 0.000 description 5
- 239000002253 acid Substances 0.000 description 5
- 150000002500 ions Chemical class 0.000 description 5
- 238000007750 plasma spraying Methods 0.000 description 5
- 229910052719 titanium Inorganic materials 0.000 description 5
- 150000003839 salts Chemical group 0.000 description 4
- 229910052721 tungsten Inorganic materials 0.000 description 4
- 229910019891 RuCl3 Inorganic materials 0.000 description 3
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 description 3
- 229910052782 aluminium Inorganic materials 0.000 description 3
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 3
- 150000001450 anions Chemical class 0.000 description 3
- 230000003197 catalytic effect Effects 0.000 description 3
- 229910017052 cobalt Inorganic materials 0.000 description 3
- 239000010941 cobalt Substances 0.000 description 3
- GUTLYIVDDKVIGB-UHFFFAOYSA-N cobalt atom Chemical compound [Co] GUTLYIVDDKVIGB-UHFFFAOYSA-N 0.000 description 3
- 229910052802 copper Inorganic materials 0.000 description 3
- 239000010949 copper Substances 0.000 description 3
- 230000000694 effects Effects 0.000 description 3
- 239000003792 electrolyte Substances 0.000 description 3
- 238000010285 flame spraying Methods 0.000 description 3
- YBCAZPLXEGKKFM-UHFFFAOYSA-K ruthenium(iii) chloride Chemical compound [Cl-].[Cl-].[Cl-].[Ru+3] YBCAZPLXEGKKFM-UHFFFAOYSA-K 0.000 description 3
- 229910001220 stainless steel Inorganic materials 0.000 description 3
- WFKWXMTUELFFGS-UHFFFAOYSA-N tungsten Chemical compound [W] WFKWXMTUELFFGS-UHFFFAOYSA-N 0.000 description 3
- 239000010937 tungsten Substances 0.000 description 3
- 229910052726 zirconium Inorganic materials 0.000 description 3
- 229910000497 Amalgam Inorganic materials 0.000 description 2
- 238000006873 Coates reaction Methods 0.000 description 2
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 2
- 241000282337 Nasua nasua Species 0.000 description 2
- 229910052783 alkali metal Inorganic materials 0.000 description 2
- 150000001340 alkali metals Chemical class 0.000 description 2
- 238000004364 calculation method Methods 0.000 description 2
- 239000003054 catalyst Substances 0.000 description 2
- 229910052804 chromium Inorganic materials 0.000 description 2
- 239000011651 chromium Substances 0.000 description 2
- 230000000052 comparative effect Effects 0.000 description 2
- 239000000356 contaminant Substances 0.000 description 2
- 229910052746 lanthanum Inorganic materials 0.000 description 2
- 229910052748 manganese Inorganic materials 0.000 description 2
- 239000011572 manganese Substances 0.000 description 2
- QSHDDOUJBYECFT-UHFFFAOYSA-N mercury Chemical compound [Hg] QSHDDOUJBYECFT-UHFFFAOYSA-N 0.000 description 2
- 229910052753 mercury Inorganic materials 0.000 description 2
- VNWKTOKETHGBQD-UHFFFAOYSA-N methane Chemical compound C VNWKTOKETHGBQD-UHFFFAOYSA-N 0.000 description 2
- 238000002156 mixing Methods 0.000 description 2
- 229910052758 niobium Inorganic materials 0.000 description 2
- 239000010955 niobium Substances 0.000 description 2
- 239000002245 particle Substances 0.000 description 2
- 238000002360 preparation method Methods 0.000 description 2
- 239000000523 sample Substances 0.000 description 2
- 230000003381 solubilizing effect Effects 0.000 description 2
- 238000005507 spraying Methods 0.000 description 2
- 239000010935 stainless steel Substances 0.000 description 2
- 229910052715 tantalum Inorganic materials 0.000 description 2
- 229910052718 tin Inorganic materials 0.000 description 2
- VXUYXOFXAQZZMF-UHFFFAOYSA-N titanium(IV) isopropoxide Chemical compound CC(C)O[Ti](OC(C)C)(OC(C)C)OC(C)C VXUYXOFXAQZZMF-UHFFFAOYSA-N 0.000 description 2
- ZSLUVFAKFWKJRC-IGMARMGPSA-N 232Th Chemical compound [232Th] ZSLUVFAKFWKJRC-IGMARMGPSA-N 0.000 description 1
- 101100230376 Acetivibrio thermocellus (strain ATCC 27405 / DSM 1237 / JCM 9322 / NBRC 103400 / NCIMB 10682 / NRRL B-4536 / VPI 7372) celI gene Proteins 0.000 description 1
- 229910000851 Alloy steel Inorganic materials 0.000 description 1
- VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 description 1
- 101100310856 Drosophila melanogaster spri gene Proteins 0.000 description 1
- UOACKFBJUYNSLK-XRKIENNPSA-N Estradiol Cypionate Chemical compound O([C@H]1CC[C@H]2[C@H]3[C@@H](C4=CC=C(O)C=C4CC3)CC[C@@]21C)C(=O)CCC1CCCC1 UOACKFBJUYNSLK-XRKIENNPSA-N 0.000 description 1
- 229910000640 Fe alloy Inorganic materials 0.000 description 1
- CWYNVVGOOAEACU-UHFFFAOYSA-N Fe2+ Chemical compound [Fe+2] CWYNVVGOOAEACU-UHFFFAOYSA-N 0.000 description 1
- DGAQECJNVWCQMB-PUAWFVPOSA-M Ilexoside XXIX Chemical compound C[C@@H]1CC[C@@]2(CC[C@@]3(C(=CC[C@H]4[C@]3(CC[C@@H]5[C@@]4(CC[C@@H](C5(C)C)OS(=O)(=O)[O-])C)C)[C@@H]2[C@]1(C)O)C)C(=O)O[C@H]6[C@@H]([C@H]([C@@H]([C@H](O6)CO)O)O)O.[Na+] DGAQECJNVWCQMB-PUAWFVPOSA-M 0.000 description 1
- AYFVYJQAPQTCCC-GBXIJSLDSA-N L-threonine Chemical compound C[C@@H](O)[C@H](N)C(O)=O AYFVYJQAPQTCCC-GBXIJSLDSA-N 0.000 description 1
- FYYHWMGAXLPEAU-UHFFFAOYSA-N Magnesium Chemical compound [Mg] FYYHWMGAXLPEAU-UHFFFAOYSA-N 0.000 description 1
- PWHULOQIROXLJO-UHFFFAOYSA-N Manganese Chemical compound [Mn] PWHULOQIROXLJO-UHFFFAOYSA-N 0.000 description 1
- 229910002651 NO3 Inorganic materials 0.000 description 1
- 229920000557 Nafion® Polymers 0.000 description 1
- JQGGAELIYHNDQS-UHFFFAOYSA-N Nic 12 Natural products CC(C=CC(=O)C)c1ccc2C3C4OC4C5(O)CC=CC(=O)C5(C)C3CCc2c1 JQGGAELIYHNDQS-UHFFFAOYSA-N 0.000 description 1
- 229910021586 Nickel(II) chloride Inorganic materials 0.000 description 1
- NHNBFGGVMKEFGY-UHFFFAOYSA-N Nitrate Chemical compound [O-][N+]([O-])=O NHNBFGGVMKEFGY-UHFFFAOYSA-N 0.000 description 1
- 229910019029 PtCl4 Inorganic materials 0.000 description 1
- CDBYLPFSWZWCQE-UHFFFAOYSA-L Sodium Carbonate Chemical compound [Na+].[Na+].[O-]C([O-])=O CDBYLPFSWZWCQE-UHFFFAOYSA-L 0.000 description 1
- QAOWNCQODCNURD-UHFFFAOYSA-L Sulfate Chemical compound [O-]S([O-])(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-L 0.000 description 1
- 241000950638 Symphysodon discus Species 0.000 description 1
- ATJFFYVFTNAWJD-UHFFFAOYSA-N Tin Chemical compound [Sn] ATJFFYVFTNAWJD-UHFFFAOYSA-N 0.000 description 1
- NRTOMJZYCJJWKI-UHFFFAOYSA-N Titanium nitride Chemical compound [Ti]#N NRTOMJZYCJJWKI-UHFFFAOYSA-N 0.000 description 1
- 229910001080 W alloy Inorganic materials 0.000 description 1
- HCHKCACWOHOZIP-UHFFFAOYSA-N Zinc Chemical compound [Zn] HCHKCACWOHOZIP-UHFFFAOYSA-N 0.000 description 1
- QCWXUUIWCKQGHC-UHFFFAOYSA-N Zirconium Chemical compound [Zr] QCWXUUIWCKQGHC-UHFFFAOYSA-N 0.000 description 1
- 229910007926 ZrCl Inorganic materials 0.000 description 1
- DOBZZOPBAIMPRH-UHFFFAOYSA-L [Na+].[Cl-].[Cl-].[Ag+] Chemical compound [Na+].[Cl-].[Cl-].[Ag+] DOBZZOPBAIMPRH-UHFFFAOYSA-L 0.000 description 1
- ROZSPJBPUVWBHW-UHFFFAOYSA-N [Ru]=O Chemical class [Ru]=O ROZSPJBPUVWBHW-UHFFFAOYSA-N 0.000 description 1
- 150000007513 acids Chemical class 0.000 description 1
- 230000001464 adherent effect Effects 0.000 description 1
- 229910001508 alkali metal halide Inorganic materials 0.000 description 1
- 150000008045 alkali metal halides Chemical class 0.000 description 1
- 239000012491 analyte Substances 0.000 description 1
- 239000010953 base metal Substances 0.000 description 1
- 229910052796 boron Inorganic materials 0.000 description 1
- 229910052793 cadmium Inorganic materials 0.000 description 1
- 229940075397 calomel Drugs 0.000 description 1
- 239000003795 chemical substances by application Substances 0.000 description 1
- XTEGARKTQYYJKE-UHFFFAOYSA-M chlorate Inorganic materials [O-]Cl(=O)=O XTEGARKTQYYJKE-UHFFFAOYSA-M 0.000 description 1
- 239000012141 concentrate Substances 0.000 description 1
- 238000010276 construction Methods 0.000 description 1
- 238000001816 cooling Methods 0.000 description 1
- 230000008021 deposition Effects 0.000 description 1
- 238000013461 design Methods 0.000 description 1
- 238000011161 development Methods 0.000 description 1
- 238000009792 diffusion process Methods 0.000 description 1
- ZOMNIUBKTOKEHS-UHFFFAOYSA-L dimercury dichloride Chemical compound Cl[Hg][Hg]Cl ZOMNIUBKTOKEHS-UHFFFAOYSA-L 0.000 description 1
- 238000007598 dipping method Methods 0.000 description 1
- 238000006073 displacement reaction Methods 0.000 description 1
- 238000001035 drying Methods 0.000 description 1
- 239000010411 electrocatalyst Substances 0.000 description 1
- 238000009713 electroplating Methods 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 230000005496 eutectics Effects 0.000 description 1
- 230000008020 evaporation Effects 0.000 description 1
- 238000001704 evaporation Methods 0.000 description 1
- 239000007888 film coating Substances 0.000 description 1
- 238000009501 film coating Methods 0.000 description 1
- 239000010419 fine particle Substances 0.000 description 1
- ZZUFCTLCJUWOSV-UHFFFAOYSA-N furosemide Chemical compound C1=C(Cl)C(S(=O)(=O)N)=CC(C(O)=O)=C1NCC1=CC=CO1 ZZUFCTLCJUWOSV-UHFFFAOYSA-N 0.000 description 1
- 239000007789 gas Substances 0.000 description 1
- 239000011874 heated mixture Substances 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-M hydroxide Chemical compound [OH-] XLYOFNOQVPJJNP-UHFFFAOYSA-M 0.000 description 1
- 239000004615 ingredient Substances 0.000 description 1
- 150000002484 inorganic compounds Chemical class 0.000 description 1
- 229910010272 inorganic material Inorganic materials 0.000 description 1
- 239000011872 intimate mixture Substances 0.000 description 1
- FZLIPJUXYLNCLC-UHFFFAOYSA-N lanthanum atom Chemical compound [La] FZLIPJUXYLNCLC-UHFFFAOYSA-N 0.000 description 1
- 239000007788 liquid Substances 0.000 description 1
- 230000007774 longterm Effects 0.000 description 1
- 239000011777 magnesium Substances 0.000 description 1
- 229910052749 magnesium Inorganic materials 0.000 description 1
- 238000005259 measurement Methods 0.000 description 1
- 229910001092 metal group alloy Inorganic materials 0.000 description 1
- 229910052750 molybdenum Inorganic materials 0.000 description 1
- 239000003345 natural gas Substances 0.000 description 1
- QMMRZOWCJAIUJA-UHFFFAOYSA-L nickel dichloride Chemical compound Cl[Ni]Cl QMMRZOWCJAIUJA-UHFFFAOYSA-L 0.000 description 1
- GUCVJGMIXFAOAE-UHFFFAOYSA-N niobium atom Chemical compound [Nb] GUCVJGMIXFAOAE-UHFFFAOYSA-N 0.000 description 1
- 229910000510 noble metal Inorganic materials 0.000 description 1
- VIKNJXKGJWUCNN-XGXHKTLJSA-N norethisterone Chemical compound O=C1CC[C@@H]2[C@H]3CC[C@](C)([C@](CC4)(O)C#C)[C@@H]4[C@@H]3CCC2=C1 VIKNJXKGJWUCNN-XGXHKTLJSA-N 0.000 description 1
- 150000002894 organic compounds Chemical class 0.000 description 1
- 230000001590 oxidative effect Effects 0.000 description 1
- 230000000737 periodic effect Effects 0.000 description 1
- 229920000642 polymer Polymers 0.000 description 1
- 239000011148 porous material Substances 0.000 description 1
- 238000003825 pressing Methods 0.000 description 1
- 239000000047 product Substances 0.000 description 1
- 230000002035 prolonged effect Effects 0.000 description 1
- 238000005086 pumping Methods 0.000 description 1
- 230000003134 recirculating effect Effects 0.000 description 1
- 230000002441 reversible effect Effects 0.000 description 1
- 229910052702 rhenium Inorganic materials 0.000 description 1
- WUAPFZMCVAUBPE-UHFFFAOYSA-N rhenium atom Chemical compound [Re] WUAPFZMCVAUBPE-UHFFFAOYSA-N 0.000 description 1
- 239000011833 salt mixture Substances 0.000 description 1
- 239000012266 salt solution Substances 0.000 description 1
- 229910052708 sodium Inorganic materials 0.000 description 1
- 239000011734 sodium Substances 0.000 description 1
- 238000003756 stirring Methods 0.000 description 1
- 229910021653 sulphate ion Inorganic materials 0.000 description 1
- 239000013589 supplement Substances 0.000 description 1
- 238000001847 surface plasmon resonance imaging Methods 0.000 description 1
- GUVRBAGPIYLISA-UHFFFAOYSA-N tantalum atom Chemical compound [Ta] GUVRBAGPIYLISA-UHFFFAOYSA-N 0.000 description 1
- 238000012360 testing method Methods 0.000 description 1
- FBEIPJNQGITEBL-UHFFFAOYSA-J tetrachloroplatinum Chemical compound Cl[Pt](Cl)(Cl)Cl FBEIPJNQGITEBL-UHFFFAOYSA-J 0.000 description 1
- 229910003452 thorium oxide Inorganic materials 0.000 description 1
- 229910052720 vanadium Inorganic materials 0.000 description 1
- 230000008016 vaporization Effects 0.000 description 1
- 229910052725 zinc Inorganic materials 0.000 description 1
- 239000011701 zinc Substances 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25B—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES FOR THE PRODUCTION OF COMPOUNDS OR NON-METALS; APPARATUS THEREFOR
- C25B11/00—Electrodes; Manufacture thereof not otherwise provided for
- C25B11/04—Electrodes; Manufacture thereof not otherwise provided for characterised by the material
- C25B11/051—Electrodes formed of electrocatalysts on a substrate or carrier
- C25B11/052—Electrodes comprising one or more electrocatalytic coatings on a substrate
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25B—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES FOR THE PRODUCTION OF COMPOUNDS OR NON-METALS; APPARATUS THEREFOR
- C25B11/00—Electrodes; Manufacture thereof not otherwise provided for
- C25B11/04—Electrodes; Manufacture thereof not otherwise provided for characterised by the material
- C25B11/051—Electrodes formed of electrocatalysts on a substrate or carrier
- C25B11/073—Electrodes formed of electrocatalysts on a substrate or carrier characterised by the electrocatalyst material
- C25B11/091—Electrodes formed of electrocatalysts on a substrate or carrier characterised by the electrocatalyst material consisting of at least one catalytic element and at least one catalytic compound; consisting of two or more catalytic elements or catalytic compounds
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25B—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES FOR THE PRODUCTION OF COMPOUNDS OR NON-METALS; APPARATUS THEREFOR
- C25B11/00—Electrodes; Manufacture thereof not otherwise provided for
- C25B11/04—Electrodes; Manufacture thereof not otherwise provided for characterised by the material
- C25B11/051—Electrodes formed of electrocatalysts on a substrate or carrier
- C25B11/073—Electrodes formed of electrocatalysts on a substrate or carrier characterised by the electrocatalyst material
- C25B11/091—Electrodes formed of electrocatalysts on a substrate or carrier characterised by the electrocatalyst material consisting of at least one catalytic element and at least one catalytic compound; consisting of two or more catalytic elements or catalytic compounds
- C25B11/093—Electrodes formed of electrocatalysts on a substrate or carrier characterised by the electrocatalyst material consisting of at least one catalytic element and at least one catalytic compound; consisting of two or more catalytic elements or catalytic compounds at least one noble metal or noble metal oxide and at least one non-noble metal oxide
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Electrochemistry (AREA)
- Materials Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Electrodes For Compound Or Non-Metal Manufacture (AREA)
- Secondary Cells (AREA)
- Battery Electrode And Active Subsutance (AREA)
- Electrolytic Production Of Non-Metals, Compounds, Apparatuses Therefor (AREA)
- Electrical Discharge Machining, Electrochemical Machining, And Combined Machining (AREA)
- Crystals, And After-Treatments Of Crystals (AREA)
- Catalysts (AREA)
- Micro-Organisms Or Cultivation Processes Thereof (AREA)
- Oxygen, Ozone, And Oxides In General (AREA)
- Hydrogen, Water And Hydrids (AREA)
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Abstract
ABSTRACT OF THE DISCLOSURE
A substrate is coated with a solution of metal oxide precursor compounds and an etchant for etching the substrate, the metal oxide precursor compounds are thermally concentrated by removing volatiles therefrom, and the so-concentrated metal oxides precursors are thermally oxidized in-situ on the substrate. The so-formed compositions are useful, e.g., as electrode material in electrochemical apparatuses and processes.
A substrate is coated with a solution of metal oxide precursor compounds and an etchant for etching the substrate, the metal oxide precursor compounds are thermally concentrated by removing volatiles therefrom, and the so-concentrated metal oxides precursors are thermally oxidized in-situ on the substrate. The so-formed compositions are useful, e.g., as electrode material in electrochemical apparatuses and processes.
Description
~ 8 This invention pertains ~o a method for prepa~ing elec~rodes and to their use i~ electrolytic cells, for e~ample, brine electrolysis cells.
There are three general types of electrolytic cells used or the production of chlor-alkali: (1) the mercu ~ c~ll, (2~ ~he diaphragm-cell, and (3) the membr~n~ c~ll. Th~ operation of each of these cells is discu~sed i~ Volum~ I o~ the ThirdrEdition of the KIR~C-OTEIMER ENCYI::LOPEDIA OF C~qICAL T~ 3NOLOGY, page ~` ~0 799 ~t. s~q. Qther electroIytic cells which employ electro.des for electrolysis of agueous solutions are the so alled "chlorate cells" which do not use a divider or separator between the ca~hodes and anodes.
In the mercuxy cell, the alkali metal values produc~d by electrolyzing a~ alkali mekal salt form an amalgam ~Ith the mercury; the amalgam, when react~d wi~h water, produces N~O~ and ~ree~ the mercury which can be recovered and cycled back for fur~her use as a liguid cathode.
I~ many chlor-alkali electrolytic processes a b A ne solution (electrolyte) is ~lectrolyzed by passing 31,010-F
There are three general types of electrolytic cells used or the production of chlor-alkali: (1) the mercu ~ c~ll, (2~ ~he diaphragm-cell, and (3) the membr~n~ c~ll. Th~ operation of each of these cells is discu~sed i~ Volum~ I o~ the ThirdrEdition of the KIR~C-OTEIMER ENCYI::LOPEDIA OF C~qICAL T~ 3NOLOGY, page ~` ~0 799 ~t. s~q. Qther electroIytic cells which employ electro.des for electrolysis of agueous solutions are the so alled "chlorate cells" which do not use a divider or separator between the ca~hodes and anodes.
In the mercuxy cell, the alkali metal values produc~d by electrolyzing a~ alkali mekal salt form an amalgam ~Ith the mercury; the amalgam, when react~d wi~h water, produces N~O~ and ~ree~ the mercury which can be recovered and cycled back for fur~her use as a liguid cathode.
I~ many chlor-alkali electrolytic processes a b A ne solution (electrolyte) is ~lectrolyzed by passing 31,010-F
-2-electric current therethrough in a cell ha~ing a diaphraym or a membrane positioned between the cathode and the anode. Chlorine is produced at the anode while sodi.um hydroxide (NaOH~ and hydrogen (~2) are formed at ~he ca~hode. Brine is fed continuously to the cells, while C12, NaOH and H2 are continuously withdra~m from the cells.
~ he minimum voltage re~uired to electrolyze an electrol;yte into Cl2, NaO~ and H2 may be calculated using the thermodynamic data. However, in commercial practice, the theoretical amount of voltage is not achievable and higher voltages must be used to overcome the various resistances i~here~t in the various types of cells. To increase the efficiency of the operation of a ~iaphragm or a membrane cell one may attempt to reduce the over~oltages of the electrodes, to reduce ~he electrical resis-tance of the diaphragm or membrane, or re~uce the electrical resistanc~ o~ the brine b~ing electrol~ze~. The inventio~ herein described results in an el~c~rode.particularly useful as a cathode in the electrolysi~ o brine; cathode overvoltage is substantially r~duced, resulti~g in increased power efficiencies.
Because of the multi million-ton quantity of alkali metal haIides and water electrolyzed each year, even a reduction of as little as 0.05 volts in working voltage tr~nsla~es; ~o vexy meaningful energy savings.
Consequently, the industry has sought means to reduce the voltage requirement.
Throu~hout the development of chlor-alkali technoloyy, various methods have-be~n developed ~o reduce the~cell voltage. Some practitioners have 31.,010-F ~2-1~4~V(3B
concentrated on reducing cell voltage by modifying the physical design of the electrolytic cell, while others have concentrated their e~foxts on reduciny the over-voltage at the anode or the cathode. The present ~- 5 ~4~ ~ e pertains, in part, to a novel process to make an electrode that is characterized by a signifi-. e ~-cantly ~ overvoltage and to the use of these electrodes in electrolytic cells.
It has been disclosed that a~ electrode's overvoltage is a ~unc~ion of the curren~ density and i~s composi~ion (reference: PHYSICAL CHEMISTRY, 3rd ed., W. J. Moore, Prentice ~all (1962), pp. 406-408), where the current density refers ~o ~he amperage applied per unit of true surface area of an elec~rode and composition refers ~o the chemical and physical makeup o the electrode. Therefore, a process that will inc~ease a~ electrod~'s ~urface area should decrease its overvoltage at a give~ apparent current density.
I~ is also~ desirable ~o use a compositian of matter tha~ is a good electrocatalyst; this ~urther reduces the overvoltage.
It i~ well known in the art to use plasma or flame spraying ~o coat an electrode with an electro-conductive metal~ In U.S. Patent No. 1,263,959 it was 2S tau~ht that anodes may be coated by spraying fine nickel particles.onto an anode, wherein the particles ~re rendered molten and impacted on the iron substrate by means of a blast.
Cathodes, also, have been coated with electro-conductive metals.. In U.S. Patent No. 3,992,278,ca~hodes were coated by plasma spraying or ~lame spraying 31,010-F -3-an admixture o~ particulate cobalt and particulate zirconia. When these electrodes are used for the electrolysis of water or an aqueous alkali metal halide salt solution, they are said to give prolonged lowering of hydrogen overvoltage.
Various metals and combinations of metals have been used to coat electrodes by plasma or flame spraying: U.S. Patent No. 3,630,770 -teaches ~he use of lanthanum boride; U.S. Pate~t No. 3,649,355 teaches ~he use of tungsten ~r tungsten alloy; U.S. Patent No.
3t788.968 teaches the use o~ ti~anium car~ide or titanium nitride and at least one metal and/or metal oxide of the platinum group and a second oxide coating which is porous; U.S. Patent No. 3,945,907 teaches the use of rhenium; and U.S. Patent N~. 3,974,058 teaches the use of cobalt as ~ coating with an overcoat o~ ruthenium.
I~ i~, lik~ise, well known in the art to make porous ele~trode coa~in~s by seIective leaching.
Coating an electrode with particulat~ nickel, ~hen ~i~terin~ the nickel as taught in U.S. Patent Nos.
2,928,783 and 2,969,315; electrodepositing an alloy onto a substrate then leaching out one compon~nt of the alloy as~ taught in U.SO Pat. No. 3r272,788, pressing or cementing two or more components together or onto an electrode subs~rate and then selec~ively leaching out o~e or more of the coating components as illustrated by U.S;. Patent Nos. 3,316,159; 3,326,725; 3,427,204;
~ he minimum voltage re~uired to electrolyze an electrol;yte into Cl2, NaO~ and H2 may be calculated using the thermodynamic data. However, in commercial practice, the theoretical amount of voltage is not achievable and higher voltages must be used to overcome the various resistances i~here~t in the various types of cells. To increase the efficiency of the operation of a ~iaphragm or a membrane cell one may attempt to reduce the over~oltages of the electrodes, to reduce ~he electrical resis-tance of the diaphragm or membrane, or re~uce the electrical resistanc~ o~ the brine b~ing electrol~ze~. The inventio~ herein described results in an el~c~rode.particularly useful as a cathode in the electrolysi~ o brine; cathode overvoltage is substantially r~duced, resulti~g in increased power efficiencies.
Because of the multi million-ton quantity of alkali metal haIides and water electrolyzed each year, even a reduction of as little as 0.05 volts in working voltage tr~nsla~es; ~o vexy meaningful energy savings.
Consequently, the industry has sought means to reduce the voltage requirement.
Throu~hout the development of chlor-alkali technoloyy, various methods have-be~n developed ~o reduce the~cell voltage. Some practitioners have 31.,010-F ~2-1~4~V(3B
concentrated on reducing cell voltage by modifying the physical design of the electrolytic cell, while others have concentrated their e~foxts on reduciny the over-voltage at the anode or the cathode. The present ~- 5 ~4~ ~ e pertains, in part, to a novel process to make an electrode that is characterized by a signifi-. e ~-cantly ~ overvoltage and to the use of these electrodes in electrolytic cells.
It has been disclosed that a~ electrode's overvoltage is a ~unc~ion of the curren~ density and i~s composi~ion (reference: PHYSICAL CHEMISTRY, 3rd ed., W. J. Moore, Prentice ~all (1962), pp. 406-408), where the current density refers ~o ~he amperage applied per unit of true surface area of an elec~rode and composition refers ~o the chemical and physical makeup o the electrode. Therefore, a process that will inc~ease a~ electrod~'s ~urface area should decrease its overvoltage at a give~ apparent current density.
I~ is also~ desirable ~o use a compositian of matter tha~ is a good electrocatalyst; this ~urther reduces the overvoltage.
It i~ well known in the art to use plasma or flame spraying ~o coat an electrode with an electro-conductive metal~ In U.S. Patent No. 1,263,959 it was 2S tau~ht that anodes may be coated by spraying fine nickel particles.onto an anode, wherein the particles ~re rendered molten and impacted on the iron substrate by means of a blast.
Cathodes, also, have been coated with electro-conductive metals.. In U.S. Patent No. 3,992,278,ca~hodes were coated by plasma spraying or ~lame spraying 31,010-F -3-an admixture o~ particulate cobalt and particulate zirconia. When these electrodes are used for the electrolysis of water or an aqueous alkali metal halide salt solution, they are said to give prolonged lowering of hydrogen overvoltage.
Various metals and combinations of metals have been used to coat electrodes by plasma or flame spraying: U.S. Patent No. 3,630,770 -teaches ~he use of lanthanum boride; U.S. Pate~t No. 3,649,355 teaches ~he use of tungsten ~r tungsten alloy; U.S. Patent No.
3t788.968 teaches the use o~ ti~anium car~ide or titanium nitride and at least one metal and/or metal oxide of the platinum group and a second oxide coating which is porous; U.S. Patent No. 3,945,907 teaches the use of rhenium; and U.S. Patent N~. 3,974,058 teaches the use of cobalt as ~ coating with an overcoat o~ ruthenium.
I~ i~, lik~ise, well known in the art to make porous ele~trode coa~in~s by seIective leaching.
Coating an electrode with particulat~ nickel, ~hen ~i~terin~ the nickel as taught in U.S. Patent Nos.
2,928,783 and 2,969,315; electrodepositing an alloy onto a substrate then leaching out one compon~nt of the alloy as~ taught in U.SO Pat. No. 3r272,788, pressing or cementing two or more components together or onto an electrode subs~rate and then selec~ively leaching out o~e or more of the coating components as illustrated by U.S;. Patent Nos. 3,316,159; 3,326,725; 3,427,204;
3,713,891 a~d 3,802,878.
It is also disclosed in the art to combine the steps of making electrodes by plasma- or ~lame-sprayin~ followed by leaching. It is alco disclosed to 3},010-F ~4~
61)0~
Combine the steps of electroplating followed by leaching.
Examples of known methods are illustrated in the following patents; U.S. Patent No. 3,219,730 (Institute of Gas Technology~ dated November 23, 1965 teaches coating a substrate wi~h a multiple oY~ide film coating then removing the substrate by leaching, thus forming an electrode;
U.S. Patent No. 3,4~3,057 ~Carrier Corporation) dated September 24, lg~8 teaches flame or plasma spraying a Raney alloy onto a substrate followed by leaching aluminum out of the alloy thus leaving a porous electrode; U.S.
Patent No. 3,492,720 (Badische Ani'in- & Soda-Fabrik Aktiengesellschaft~ dated February 3, 1970 teaches plasma spraying tungsten, titanium or alloys thereof along with aluminum, thorium and zirconium oxides onto a substrate.
The substrate was su~sequently removed, leaving a porous electrode.
U.S. Patent No. 3,497,425 (Imperial Metal Industries ~Kynoch) Ltd.~ dated February 24, 1970 teaches preparing porous electrodes ~y coating the substrate with a relatively insoluble metal followed by a coating of a more easily dissolvable metal. The teaching requires heat treating to cause inter-diffusion of the two coats, while optimum conditions re~uire separate heat treatments for each coat.
The dissolvable metal is subsequently leached out, leaving a porous electrode. U.S. Patent No. 3,618,136 (T. Fujita) dated November 2, 1971 teaches forming porous electrodes by coating a binary salt composition onto a substrate and leaching a soluble component from the system. The patent teaches that it is critical that the binary salt mixture is an eutectic composition and that optimum results are obtained when the same anions are used for both the active and the inactive salts, e.g. silver chloride -- sodium chloride.
31,010-F _5_ ~2~i0V~
Canadian Patent No. 1,07~,915 (~ooker Chemical & PlastiC Corp.~ teaches the preparation of porous cathodes by applying to a substrate a coating of at least one non-noble metal from the group of nickel, cobalt, chromium, manganese and iron, alloyed with a secondary, less noble, sacrificial metal. Specifically, the sacrificial metal is chosen from the group of zinc, aluminum, magnesium and tin. The sacrificial metal is removed by leaching with a lye solution or an acid solution.
U.S. Patent No. 4,279,709 discloses a method for making electrodes including electrodes having reduced ovexvoltage by applying an admixture of particulate metal and a particulate inorganic compound pore-former 1~ and then leaching out the pore-former to form pores.
Electrodes of film-forming metal substrates, especially titanium, coated with oxides of Group VIII
metals of the Periodic Table of The Elements have been taug~t, especially conjointly with other metal oxides, as being useful as anodes in electrolytic processes, such as in brine electrolysis. Ruthenium oxides, platinum oxides, and ~ther oxides of the "platinum 31,010-F -6-~` .
metal series", in association with various other metal oxides have received much acclaim as coatings for valve metal substrates (esp. Ti) ~or use as anodes. Patents relating to such anodes are, e.g. U.S. Patent Nos.
3,63~,498 and 3,711,3~5. These coatings may be applied in several ways, for example, U.S. Patent No. 3,869,312 teaches ~hat platinum group metal oxides, combined with film-forming metal oxides may be deposited on valve metal substrates by applying a mixture of the.rmally--decomposable compound~ of platinum group metals and a thermally-deco~posable organo compound o~ a film-forming metal in an organic liquid vehicle which may also optio~ally contain a r~ducing agent, to a support member, drying the coa~ing by evaporation of ~he organic vehicle, then heating the member in the range o~ 400-55GC
to ~orm metal oxides. Repeated coats are applied to increase the ~hickness of ~he coating. Also an o~ercoa~ing o a ilm-~orming metal oxide is applied. U.S. Paten~
3,632,498 teaches tha~ coati~gs o~ ~lnely divided oxid`es of platinu~ group metal& and film-forming metals may b~ produced by use of a plasma burner, by heating substxa~es which have been coated with thermally--decomposable compounds of platinum group metals and film-foDmi~g metals, b~ electrically depositing the metals in a galvanic bath followed by heating in air to form the oxid~, among others.
Some further patents relating to electrodes having metal oxide surfaces are, e.g., U.S. Patent Nos.
3,616,445; 4,003,817; 4,072,585; 3-,g77,958; 4,061,549;
It is also disclosed in the art to combine the steps of making electrodes by plasma- or ~lame-sprayin~ followed by leaching. It is alco disclosed to 3},010-F ~4~
61)0~
Combine the steps of electroplating followed by leaching.
Examples of known methods are illustrated in the following patents; U.S. Patent No. 3,219,730 (Institute of Gas Technology~ dated November 23, 1965 teaches coating a substrate wi~h a multiple oY~ide film coating then removing the substrate by leaching, thus forming an electrode;
U.S. Patent No. 3,4~3,057 ~Carrier Corporation) dated September 24, lg~8 teaches flame or plasma spraying a Raney alloy onto a substrate followed by leaching aluminum out of the alloy thus leaving a porous electrode; U.S.
Patent No. 3,492,720 (Badische Ani'in- & Soda-Fabrik Aktiengesellschaft~ dated February 3, 1970 teaches plasma spraying tungsten, titanium or alloys thereof along with aluminum, thorium and zirconium oxides onto a substrate.
The substrate was su~sequently removed, leaving a porous electrode.
U.S. Patent No. 3,497,425 (Imperial Metal Industries ~Kynoch) Ltd.~ dated February 24, 1970 teaches preparing porous electrodes ~y coating the substrate with a relatively insoluble metal followed by a coating of a more easily dissolvable metal. The teaching requires heat treating to cause inter-diffusion of the two coats, while optimum conditions re~uire separate heat treatments for each coat.
The dissolvable metal is subsequently leached out, leaving a porous electrode. U.S. Patent No. 3,618,136 (T. Fujita) dated November 2, 1971 teaches forming porous electrodes by coating a binary salt composition onto a substrate and leaching a soluble component from the system. The patent teaches that it is critical that the binary salt mixture is an eutectic composition and that optimum results are obtained when the same anions are used for both the active and the inactive salts, e.g. silver chloride -- sodium chloride.
31,010-F _5_ ~2~i0V~
Canadian Patent No. 1,07~,915 (~ooker Chemical & PlastiC Corp.~ teaches the preparation of porous cathodes by applying to a substrate a coating of at least one non-noble metal from the group of nickel, cobalt, chromium, manganese and iron, alloyed with a secondary, less noble, sacrificial metal. Specifically, the sacrificial metal is chosen from the group of zinc, aluminum, magnesium and tin. The sacrificial metal is removed by leaching with a lye solution or an acid solution.
U.S. Patent No. 4,279,709 discloses a method for making electrodes including electrodes having reduced ovexvoltage by applying an admixture of particulate metal and a particulate inorganic compound pore-former 1~ and then leaching out the pore-former to form pores.
Electrodes of film-forming metal substrates, especially titanium, coated with oxides of Group VIII
metals of the Periodic Table of The Elements have been taug~t, especially conjointly with other metal oxides, as being useful as anodes in electrolytic processes, such as in brine electrolysis. Ruthenium oxides, platinum oxides, and ~ther oxides of the "platinum 31,010-F -6-~` .
metal series", in association with various other metal oxides have received much acclaim as coatings for valve metal substrates (esp. Ti) ~or use as anodes. Patents relating to such anodes are, e.g. U.S. Patent Nos.
3,63~,498 and 3,711,3~5. These coatings may be applied in several ways, for example, U.S. Patent No. 3,869,312 teaches ~hat platinum group metal oxides, combined with film-forming metal oxides may be deposited on valve metal substrates by applying a mixture of the.rmally--decomposable compound~ of platinum group metals and a thermally-deco~posable organo compound o~ a film-forming metal in an organic liquid vehicle which may also optio~ally contain a r~ducing agent, to a support member, drying the coa~ing by evaporation of ~he organic vehicle, then heating the member in the range o~ 400-55GC
to ~orm metal oxides. Repeated coats are applied to increase the ~hickness of ~he coating. Also an o~ercoa~ing o a ilm-~orming metal oxide is applied. U.S. Paten~
3,632,498 teaches tha~ coati~gs o~ ~lnely divided oxid`es of platinu~ group metal& and film-forming metals may b~ produced by use of a plasma burner, by heating substxa~es which have been coated with thermally--decomposable compounds of platinum group metals and film-foDmi~g metals, b~ electrically depositing the metals in a galvanic bath followed by heating in air to form the oxid~, among others.
Some further patents relating to electrodes having metal oxide surfaces are, e.g., U.S. Patent Nos.
3,616,445; 4,003,817; 4,072,585; 3-,g77,958; 4,061,549;
4,073~,873; an~ 4,142,005.
The use of platinum group metal oxides, particularly ruthenium oxide, in active coatings for 31,010-~ -7-3~`~
the evolution o~ hydrogen is also known (ref. ~elendres, Carlos A., SPRI~G MEETING ELECTROCHEM. SOC., May 11~
1975). U~S. Paten~ No. 3,816,464 (Hodogaya Chemical Co., Ltd.~. dated November 17, 1~81refer to the use of a mixture of platinum group metal oxide(s~ with another metal oxide as active cathode coatings. U.S. Patent No. ~7 4,238,311 ~.Chlorine Engineers Corp., Ltd.) dated December 9, 1980 teaches that a cathode coating consisting of fine particles of platinum group metals and/or platinum group metal oxides in nickel is useful as a cathode coating.
In general, it is known by those skilled in the art that the use of oxides of platinum group metals as active catalysts for the evolution of hydrogen in modern electrolytic chlor-alkali cells employing permionic membranes is not useful because of extreme conditions of NaOH concentration and temperature now possible, wherein NaOH concentrations of 30 percent and temperatures exceeding 95C are not uncommon. Oxide coatings prepared according to the known art are found to decrepitate with use and.fail by loss of adherence to the substrate, accompanied presumably by substantial reduction, in some cases, to base metals.
It is also well known to those practiced in the art that catalytic coatings consisting of metals with intrinsically low hydrogen overvoltage properties are subject in actual practice to loss of catalytic activity due to overplating with metallic contaminants, such as iro,n or example, which are commonly present in brine and water employed in the process of electrolysis.
Consequently, active coatings found useful by those practiced in the art for evolution of hydrogen in modern electrolytic membrane chlor-alkali cells are 31,010-F -8-k g limited to the type characterized by high surface area, or porous coatings, with compo~itions resistant to some degree to chemical at~ack at these co~ditions, e.g.
nickel or various stainless steels.
In these cases, the ~ull effec~ of ~he catalytic nature of intrinsically low hydrogen overvoltage catalysts are not realized in practice, since, as is well known to those practiced in the art, the performance of these essentially high surface area coatings degrades in time to a level characterized by the eguivalent coating of the predominant metallic contaminant present in the brine or water Qmployed i~ the electrolytic process, usu211y Fe. Conse~uently, the Tafel slope charactexizing the electroly~ic activity of the applied coating changes to ess~ntially that of iron, with a resul~ing increase in hydrogen overvQltage, especially at higher urrent densities, 0.23 to 0.54 amp/cm~ ~1.5 to 3.5 amps/in2) and above, as ar~ common in modern membrane chlox-alkali c~llæ.. In con~rast, it i~ desirable to maintain the intrinsically low overvoltage properties of khose materials which are k~own- to be characterized by low Tafel slopes, i.e~ pla~i~um group metal oxides, particularly ru~henium oxide, during long-term operation i~ membxa~e chlor-aIkali cells. It has now been discovered, among other things, that active coatings of o~ide~ of platinum group metals and secondary electro-catalytic me~als when prepared according to the process of the i~vention/ exhibit unexpected properties of low hydro~en over~oltage, physical stability, and long~term efficacy as cathodes in the el~ctxolysis of brine at conditions of high NaO~ con~entrations, temperatures, and process pressures. It has also been discovered that the use of these electrodes in electrolytic 31,010-F -g-` ~16~
process wherein chlorine and cau.stic soda are produced at certain process conditions of temperature~ ~aOH
concentration, pressure, etc., results in reduced energy requirements not otherwise attainable in practice.
The invention particularly resides in a method o~ making a low hydrogen overvoltage cathode which comprises a nickel substrate having coated thereon an electrocatalytically-active heterogeneous mixture of nickel 02ide and a platinum group metal oxide, said method comprising the steps of (a) depositing on a nickel substrate, a coating solution containing a nickel compound which is effective as a precursor for nickel oxide, and at least one platinum group metal compound which is effective as a precursor for a platinum group metal oxide, said coating solution also containing an etchant capable of etching the surface of the substrate and/or any previously applied coating, (b) heating to remove volatiles from the~so-coated substrate to cause the metal values of the precursor compounds and those etched from the substrate or previous coating to be concentrated and recoated on the substrate or previously applied coating9 an~ (c) further heating, in the presence of oxygen, air or an oxidizing agent, to a temperature sufficient to oxidize the metal values, said steps (a), (b), and (c) being performed a plurality of timesO
3o The present invention also resides in a process for the electrolysis of aqueous solutions of sodium chloride in an electrolysis of aqueous solutions of sodium chloride in an elec~rolytic cell comprising an anolyte compartment and a catholyte compartment separated by a cation exchange membrane to produce an 31,010-F -10-h~
fi~3~8 -10a- 4693-3433 aqueous solution of sodium hydroxide in the catholyte compartment, and chlorine in the anolyte compartment, wherein the cathode of said proces~ is a low hydrogen overvoltage cathode made by applying to an electroconductive substrate a coating solution of nickel oxide and platinum group metal oxide precursor compound(s) and an etchant capable of etching the surface of the substrate and/or any previously applied coating, heating to remove volatiles from the so-coated substrate to cause the metal values of the precursor compounds and those etched from the substrate or previous coating to be concentrated and recoated on the substrate or previously applied coating, and further heating, in the presence of oxygen, air or an oxidizing agent~ to a temperature sufficient to oxidize the metal values, thereby obtaining on said substrate an electro-catalytically active heterogeneous coating o~ a mixture of nickel oxide and at least one platinum group metal oxide.
The present invention further resides in an electrode for use in an eletrochemical cell comprising a substrate having an electrocatalytically active coating deposited thereon, said coating comprising a heterogeneous mixture of metal oxides containing nickel oxide and at least one oxide of a metal selected from Ru, Rh, Pd, Os, Ir 7 and Pt.
The present invention further resides in a low hydrogen overvoltage cathode for use in a chlor-alkali electrolytic cell comprising a substrate having an electrocatalytically active coating deposited thereon, said coating comprising a heterogeneous mixture of metal oxides containing at least one oxide o~ a metal selected ~rom Ru, Rh, Pd, Os, Ir, and Pt, and nickel.
31,010-F -lOa-, .
.
3L24~ 8 -lOb-Figure 1 illustrates graphizally data from some of the tests described hereinafter.
Electrodes comprising an electrically conductive, or non-conductive substrate having a coating of heterogeneous oxide mixtures of platinum group metals and secondary electrocatalytic metals are prepared by applying soluble metal compounds and an etchant for the substrate, and, in cases of successive coats, etching the metal oxides previously applied to the substrate, thereby, it is believed, attacking and solubilizing the least chemically resistant portions of the coating, then, as the substrate is heated to oxidize the metal values, concentrating and redepositing the said metal 3o 31,010-F -lOb-.
values on the subs~rate, and oxidizing them to produce a substantially hard, stable mixture of heterogeneou~
oxides of the metal values.
The pre~errsd electrically-conductive sub-strate may be any metal structure which re~ains itsphysical integrity during the preparation o~ the electrode. Metal laminates may be usedt such as a ~errous metal coated with another metal, e.g., nickel or a film-forming metal (also known as.valve metal).
The subs.~ra~e may be a ~errous metal, such as iron, steel, stainless steel or other metal alloys wherein the major component is iron. The ubstrate may also be a non-ferrou~ metal, such as a film~forming metal or a non-film-forming metal, e.g., Ni. Film-forming metals are well known in these relevan~ ar~ as including, notably, titanium, tantalum, zirconium, niobium, tungsten and alloys o-~ these with each other and with minor amounts of othe~ metals~ Non-conductive sub-~trates ma~ ~ employed, especially if they are then 20 coated with a conductive layer o~to which the instant metal oxides are deposited.
Th~ shape or c:onfiguration of the substrate used in the present coating process may be a flat sheet, curved surface~ con~oluted surface, punched 25 plat~, woven wire, ~xpanded metal sheet, rod, tube, porous., no~-porous, sin~ered, filamentary, re~ular, or irr.e~lar~ The p~esent novel coating process-is not.
depe~dent on having ~ substrate of a particular shape, since the chemical and thermal steps in~olved are applicable ~o virtually any shape which could be useful as an electrode article. Many electrolytic cells contain foraminous (mesh) sheets or flat plate sheets;
31,010-F -11--these are sometimes ben-t to form "pocket" electrodes with substantially parallel sides in a spaced-apart relationship~
The preferred substrate configura~ion com-pris:es expanded mesh, punched plate, woven wire, sinteredmetal, plate, or sheet, with expanded mesh being one of the most preferred of the porous substxates.
~ he preferred composition of the substrate comprises nickel, iron, copper, steel, stainless steel, or ferrous metal laminated with nickel, with nickel bei~g especially preferred~. It will be understood that these substrates, onto which the me~al oxide coatings are to be- deposited, may themselves be supported or xeinforced by an undexlying substrate or me~ber, especial~ wh~r~ nickel, iron, or copper is carried by, or ~r an. underlying substrate or member. The substrate, o~o which th~ me~al oxide coating is ~o be deposi~ed, ma~ itseL~ be an outer la~er o~ ~ laminate or coated structure, and i~ may be, optio~ally, a non-conductive substrate.onto which the metal oxide coating is deposited.
Th~ pla~inum metal serie~ comprises Ru, Rh, Pd, Qs, Ir, and Pt.. Of these, the pre~erred metals are platLnum and ruthe~ium, w~h xuthenium b~ing most preferred. The soluble.platinum metal compound may be ~5. ~he halids, sulphate, nitrate or other soluble salt or soluble compou~d of th~ metal and is preferably the halide salt, such as RuCl3 hydrate, PtCl4 hydxate, and the like.
The seconda~y electrocatalytic metal oxide precursor o~ ~he present coating ma~ be at least one 31,010-F -12-derived from a soluble compound of Ni, Co, Fe, Cu, W, V, Mn, Mo, Nb, Ta, Ti, Zr, Cd, Cr, B, Sn, La, or si.
The preferred of these are Ni, Zr, and Ti, with Ni being khe most preferred.
The solution of the present invention contains at least one chemically active agen~ capable of etching ~he s~bstrate, and, in the case of second and later coatings, etching and solubilizing the most chemically--susceptible portions o~ the 02ides previously formed, while also, preferably as the ~emperature is elev~ted, vaporizing, in many cases, from the heated mixture, along with volatilized anions or negative-valence radicals from the platinum metal oxide precursor and th~ secondary electrocatalytic metal oxide precursor.
The preferred chemically active etchants comprise most common acids, such as hydrochloric acid, sulphuric acid, ~i~ric acid, p~osphoric acid; also hydrazine hydrosulphate, and the lik~, with hydrochloric acid and hydrazine~hydrosulphat~ being among the most preferred.
In general, ~he preferred method contemplated in the present in~ention comprises applying to the de~ired;substrate a solution containing at least one platinum me~al series compound, at leas~ one electro-catalytic me~al compound, and a chemical etchant, preferably containing a volatile organic vehicle, such as isopropanol, a~d allowing the volatile vehicle to evaporate, leaving the etcha~t and the dissolved metal values; the~ heatin~ ~he substrate to a temperature sufficient to concentrate the metal values, also sub-30 ~tantially driving out the volatilized etchant alongwith the anions or ne~ative-valence radicals released from th~-metal oxide precursors, and heating the 31,01Q-F -13-substrate in the presence of oxygen or air to a temper-ature sufficient to ~he~nally oxidize and convert the metals to metal oxides in-situ on the substrate. The steps may be repeated a plurality of times in order to attain the best full effect of the i~vention by increasi~g the thic~ness of the coating. Furthermore there is, at times, a benefit to be derived from laying do~m 2 or more layers of the metal oxide precursors between each thermal oxidation step.
In a particularly preferred embodiment an electrode material is prepared by applying a hetero-g.e~eou& metal oxide coating, said heterogeneous metal o~id~ coatin~ comprising nickel o~ide and a platinum group me~al oxide ~op~io~ally contai~ing a modifier metal oxide, e.g., ZrO2), onto a nickel metal layer (which.may be in ~he form-of a nickel layer on an elec~roconducti~e substrate~ by the process which compri~e~ (a) applyi~ ta said nickel metal layer a.
coating solutio~ compriæing a Dickel oxide precursor, a platinum group metal oxide precursor, an optional modifier metal o~ide precursor, and an etchant for dissolving the mos-t soluble portions of the nickel m~tal ~urface, (b) heating.to e~aporate volatile porti:ons o~ the coating solution, thereby concentrating and depo~iting ~he metal oxide precursors on the ~o-etched nickel metal surface, (c) heating i~ the presence of air or oxygen at a temperature hetween 3Q0C to 600C for ~ time suficient to oxidize the ~- metals of the m0tal oxide precursors, and (d) cooling ~he so-prepared electrode material. Additional coati~gs may be applied in similar manner so as to increase the thickness o~ ~he so-produced heterogeneous metal oxide coating on the nlckel metal surface, though the etchant 31,010-F -14-~2~
for ~he second and later coating applications may beneficially be the same as, or different from, the etchant used in the initial coating application. There is thus prepared an electrode material comprising a nickel metal layer ha~ing tigh~ly adhered thereto a heterogeneous metal oxide coating comprising nickel o~ide and a platinum group metal oxide, op~ionally also containing a modifier metal oxide. Preferably, the platinum group metal oxide is ru~henium oxide. The pre~erred optional modifier metal oxide is zirconium oxide.. A~ economical form of the nickel metal layer is that of a nickel layer on a less expensive electro-conductiv~ substrate, such as steel or iron alloys.
Such electrode material is particularly useful as cathodes in chlor-alkali cells.
Ordinarily-the temperatures at which thermal oxidatlon of the metals:is achieved is somewhat depen-den~ on the metaIs, but a temperature in the range o~
fr~m~ 3:00Q to 650C, more or less~, is generally e~fective.
It is; generally preferred ~hat the thermal oxidation be per~ormed at a temperature in the range of from 350 to 550C.
The effect of the invention is to produce a s~bstantially hard, adherent coating of heterogeneou6 oxides of th~ solubilized metals.
It is within ~he purvie~ of the present i~ventive co~cept that the ~olubilization, reconcen-tration, and in-situ deposition.of the solubilized - metals, usin~ chemical etchi~g of the previously deposited layers and/or substrate produces an intimate mixture of oxides which are mutually s~abili2ing and electrocatalytically compleme~tary.
31,010-F -15~
~16-The following examples illustrate particular embodiments, but the invention is not limited to the particular embodiments illustrated.
Exam~le 1 A solu~ion was prepared which con~isted of 1 part RuCl3 3H20, 1 part NiC12 6~20, 3.3 parts H2NNH2-H2SO4 (hydrazine hydrosulphate), 5 parts HzO, and 28 parts isopropanol. The solution was prepared by first mixing together all ingredients other than ~he isopropan~l by stirring overnight, then adding the isopropanol and continuing to s~ir for approximately 6 houxs.
A cathode was prepared which was constructed of a 40% expanded mesh of nickel. The cathode was first sa~dblasted, ~h~n etched in 1:1 ~Cl. I~ was subse~ue~tIy ri~sed, dipped in isopropanol and air dried~ T~ cathode was coated by dipping it into the coa~ing solution, alIowing it to air dry, ~hen baking it in a~ oYe~ at 375C for 20 minutes. In the same maDner, a total of 6 coats were applied. The ca~hode waæ immersed in a heated bath containing 35% NaOH at a ~empe*ature of 90C. A current was applied and potential measurements were take~ using ~-standard Calomel Reference Electrode (SCE) a~d a Luggi~ probe. The cathode potential was measured at -1145 millivol~s vs. SCE at a current density oi~ 2 amp5 per square inch (0.31 amps per cm2 ) .
The cathode was asæembled in a laboratory membrane chlorine cell and operated a~ 90C, producing C12 at the anod~ and E2 at the cathode, at 31-33% NaO~
concentration, operating at 0.31 ampjcm2 (2 amp/in current density. The pvten~ial of the cathode was monitore~ and averaged per week. The results are shown in Table I.
31,01Q-F -16-- ~Z~6~
.
Example 2 A solution was prepared which consisted of 1 part RuC13-3H20, 1 part Nicl2~6H2o~ and 3.3 parts concentrated HCl. It was allowed to mix overnight.
Subseguently, 33 parts isoprop~nol were added and mi~ing continued 2 hours. A cathode was prepared in accordance with the procedure of Example 1. The cathode was then coated in the same manner as Example 1 except baki~g was carried out at a temperature of 495-500C.
Ten coats were applied. The cathode potential was measured as in E~ample 1. The potential was -1135 millivolts vs. SCE. The cathode was assembled in a laboratory cell containing a commercially a~ailable NAFION* polymer ~*a tradeRame o~ E. I. duPont de Nemours) 15 membrane. The cell was operated a~ gOC, 31-33% NaOH, and 0.31 amp/Cm2 ~2 amp/in2) curren~ density. The pote~tial of the cathode was monitored and averaged per week. The resul~s ar.e shown in Table I.
E~ampl ~3 A so:lution wa~ prepared which consisted of 1 par~ N~20~C1, 5 parts concentrated RCl, 2 parts 10%
PtClS~6E~0, 1 par~ NiCl2 6H20, and 1 par~ RuCl3 3H~O.
The solution was~ allowed to mix ~or 12 hours. Then 75 parts isopropanol were added and mixing continued for 2 hours~ A cathode-was prepared according to Example l. The cathode wa-q then coated in ~he same manner as Example 1 except baking:was carried out at a tempera.ture of 470-480C. Five coats were applied.
sixth cQa~ was applied and the alectrode was baked for 30 minutes at a temperature o~ 470-480C~ The potential of the cathode was measured as in Example 1. The pote~tial was ~1108 millivolts vs. SCE. The cathode . was assembled in a laboratory membrane chlorine cell 31,010-F -17-containing a commercialy availcible membrane, as in Example 2. The cell was operated at 90C, 31-33% NaQ~, and 0.31 amp/cm2 (2 amp/in2) current density. The potential of the cathode was monitored and averaged per week. The results are shown in Table I.
A solution was prepared which consisted of 3 parts RuC13 3H2O, 3 parts NiClz 6H2O, 1 part ZrCl~, 5 parts concentrated ~Cl, and 42 parts isopropanol. The solution was allowed to mix 2 hours. The cathode was then coated in ~he same manner as Example 1 except baki~g was carried out at a temperature of 495-500C.
. Eight coats were applied. A ninth coa~ was appli~d and the electrode was baked for 30 minutes at a temperature o~ 470~480C. The po~ential of the cathode was measured as in Example 1. The pote~tial was. 1146 milli~olts vs. SCE. T~e~ca~h~d~ wa assembled in a laborato~y membrane~chloriné c~l-1 contai~in~ a.commercially available membrane, ~ in ~ample 2. The cell was operated at 90C, 31-33~ NaOX~ ~nd 0.31 amp/cm2 (2 amp/i~Z) current de~sity. The poten~ial of th~ cathode was monitored and a~araged per week. The results are shown in Table I.
Example 5 A cathode was prepared as in the previous e~amples, ~hen d~pped in a solution contai~iny 1 gxam of tetraisopropyl titanate in 100 ml of isopropan~l.
Th~ cathode waa then baked at a temperature of 475-500C for 10 minutes. Thre~ co~ts were applied.
A solutio~ was prepared as in Example 2. The cathode was dipped in the soluti~, air dried, and baked at a temperatur~ of 475-500C. Six coats were applied.
31,010-F- -18-3~4~
The potential of the cathode was measured as in khe previous examples. The potential was -1154 millivolts vs, SCE. The cathode was assembled in a laboratory membranP chlorine cell containing a commercially
The use of platinum group metal oxides, particularly ruthenium oxide, in active coatings for 31,010-~ -7-3~`~
the evolution o~ hydrogen is also known (ref. ~elendres, Carlos A., SPRI~G MEETING ELECTROCHEM. SOC., May 11~
1975). U~S. Paten~ No. 3,816,464 (Hodogaya Chemical Co., Ltd.~. dated November 17, 1~81refer to the use of a mixture of platinum group metal oxide(s~ with another metal oxide as active cathode coatings. U.S. Patent No. ~7 4,238,311 ~.Chlorine Engineers Corp., Ltd.) dated December 9, 1980 teaches that a cathode coating consisting of fine particles of platinum group metals and/or platinum group metal oxides in nickel is useful as a cathode coating.
In general, it is known by those skilled in the art that the use of oxides of platinum group metals as active catalysts for the evolution of hydrogen in modern electrolytic chlor-alkali cells employing permionic membranes is not useful because of extreme conditions of NaOH concentration and temperature now possible, wherein NaOH concentrations of 30 percent and temperatures exceeding 95C are not uncommon. Oxide coatings prepared according to the known art are found to decrepitate with use and.fail by loss of adherence to the substrate, accompanied presumably by substantial reduction, in some cases, to base metals.
It is also well known to those practiced in the art that catalytic coatings consisting of metals with intrinsically low hydrogen overvoltage properties are subject in actual practice to loss of catalytic activity due to overplating with metallic contaminants, such as iro,n or example, which are commonly present in brine and water employed in the process of electrolysis.
Consequently, active coatings found useful by those practiced in the art for evolution of hydrogen in modern electrolytic membrane chlor-alkali cells are 31,010-F -8-k g limited to the type characterized by high surface area, or porous coatings, with compo~itions resistant to some degree to chemical at~ack at these co~ditions, e.g.
nickel or various stainless steels.
In these cases, the ~ull effec~ of ~he catalytic nature of intrinsically low hydrogen overvoltage catalysts are not realized in practice, since, as is well known to those practiced in the art, the performance of these essentially high surface area coatings degrades in time to a level characterized by the eguivalent coating of the predominant metallic contaminant present in the brine or water Qmployed i~ the electrolytic process, usu211y Fe. Conse~uently, the Tafel slope charactexizing the electroly~ic activity of the applied coating changes to ess~ntially that of iron, with a resul~ing increase in hydrogen overvQltage, especially at higher urrent densities, 0.23 to 0.54 amp/cm~ ~1.5 to 3.5 amps/in2) and above, as ar~ common in modern membrane chlox-alkali c~llæ.. In con~rast, it i~ desirable to maintain the intrinsically low overvoltage properties of khose materials which are k~own- to be characterized by low Tafel slopes, i.e~ pla~i~um group metal oxides, particularly ru~henium oxide, during long-term operation i~ membxa~e chlor-aIkali cells. It has now been discovered, among other things, that active coatings of o~ide~ of platinum group metals and secondary electro-catalytic me~als when prepared according to the process of the i~vention/ exhibit unexpected properties of low hydro~en over~oltage, physical stability, and long~term efficacy as cathodes in the el~ctxolysis of brine at conditions of high NaO~ con~entrations, temperatures, and process pressures. It has also been discovered that the use of these electrodes in electrolytic 31,010-F -g-` ~16~
process wherein chlorine and cau.stic soda are produced at certain process conditions of temperature~ ~aOH
concentration, pressure, etc., results in reduced energy requirements not otherwise attainable in practice.
The invention particularly resides in a method o~ making a low hydrogen overvoltage cathode which comprises a nickel substrate having coated thereon an electrocatalytically-active heterogeneous mixture of nickel 02ide and a platinum group metal oxide, said method comprising the steps of (a) depositing on a nickel substrate, a coating solution containing a nickel compound which is effective as a precursor for nickel oxide, and at least one platinum group metal compound which is effective as a precursor for a platinum group metal oxide, said coating solution also containing an etchant capable of etching the surface of the substrate and/or any previously applied coating, (b) heating to remove volatiles from the~so-coated substrate to cause the metal values of the precursor compounds and those etched from the substrate or previous coating to be concentrated and recoated on the substrate or previously applied coating9 an~ (c) further heating, in the presence of oxygen, air or an oxidizing agent, to a temperature sufficient to oxidize the metal values, said steps (a), (b), and (c) being performed a plurality of timesO
3o The present invention also resides in a process for the electrolysis of aqueous solutions of sodium chloride in an electrolysis of aqueous solutions of sodium chloride in an elec~rolytic cell comprising an anolyte compartment and a catholyte compartment separated by a cation exchange membrane to produce an 31,010-F -10-h~
fi~3~8 -10a- 4693-3433 aqueous solution of sodium hydroxide in the catholyte compartment, and chlorine in the anolyte compartment, wherein the cathode of said proces~ is a low hydrogen overvoltage cathode made by applying to an electroconductive substrate a coating solution of nickel oxide and platinum group metal oxide precursor compound(s) and an etchant capable of etching the surface of the substrate and/or any previously applied coating, heating to remove volatiles from the so-coated substrate to cause the metal values of the precursor compounds and those etched from the substrate or previous coating to be concentrated and recoated on the substrate or previously applied coating, and further heating, in the presence of oxygen, air or an oxidizing agent~ to a temperature sufficient to oxidize the metal values, thereby obtaining on said substrate an electro-catalytically active heterogeneous coating o~ a mixture of nickel oxide and at least one platinum group metal oxide.
The present invention further resides in an electrode for use in an eletrochemical cell comprising a substrate having an electrocatalytically active coating deposited thereon, said coating comprising a heterogeneous mixture of metal oxides containing nickel oxide and at least one oxide of a metal selected from Ru, Rh, Pd, Os, Ir 7 and Pt.
The present invention further resides in a low hydrogen overvoltage cathode for use in a chlor-alkali electrolytic cell comprising a substrate having an electrocatalytically active coating deposited thereon, said coating comprising a heterogeneous mixture of metal oxides containing at least one oxide o~ a metal selected ~rom Ru, Rh, Pd, Os, Ir, and Pt, and nickel.
31,010-F -lOa-, .
.
3L24~ 8 -lOb-Figure 1 illustrates graphizally data from some of the tests described hereinafter.
Electrodes comprising an electrically conductive, or non-conductive substrate having a coating of heterogeneous oxide mixtures of platinum group metals and secondary electrocatalytic metals are prepared by applying soluble metal compounds and an etchant for the substrate, and, in cases of successive coats, etching the metal oxides previously applied to the substrate, thereby, it is believed, attacking and solubilizing the least chemically resistant portions of the coating, then, as the substrate is heated to oxidize the metal values, concentrating and redepositing the said metal 3o 31,010-F -lOb-.
values on the subs~rate, and oxidizing them to produce a substantially hard, stable mixture of heterogeneou~
oxides of the metal values.
The pre~errsd electrically-conductive sub-strate may be any metal structure which re~ains itsphysical integrity during the preparation o~ the electrode. Metal laminates may be usedt such as a ~errous metal coated with another metal, e.g., nickel or a film-forming metal (also known as.valve metal).
The subs.~ra~e may be a ~errous metal, such as iron, steel, stainless steel or other metal alloys wherein the major component is iron. The ubstrate may also be a non-ferrou~ metal, such as a film~forming metal or a non-film-forming metal, e.g., Ni. Film-forming metals are well known in these relevan~ ar~ as including, notably, titanium, tantalum, zirconium, niobium, tungsten and alloys o-~ these with each other and with minor amounts of othe~ metals~ Non-conductive sub-~trates ma~ ~ employed, especially if they are then 20 coated with a conductive layer o~to which the instant metal oxides are deposited.
Th~ shape or c:onfiguration of the substrate used in the present coating process may be a flat sheet, curved surface~ con~oluted surface, punched 25 plat~, woven wire, ~xpanded metal sheet, rod, tube, porous., no~-porous, sin~ered, filamentary, re~ular, or irr.e~lar~ The p~esent novel coating process-is not.
depe~dent on having ~ substrate of a particular shape, since the chemical and thermal steps in~olved are applicable ~o virtually any shape which could be useful as an electrode article. Many electrolytic cells contain foraminous (mesh) sheets or flat plate sheets;
31,010-F -11--these are sometimes ben-t to form "pocket" electrodes with substantially parallel sides in a spaced-apart relationship~
The preferred substrate configura~ion com-pris:es expanded mesh, punched plate, woven wire, sinteredmetal, plate, or sheet, with expanded mesh being one of the most preferred of the porous substxates.
~ he preferred composition of the substrate comprises nickel, iron, copper, steel, stainless steel, or ferrous metal laminated with nickel, with nickel bei~g especially preferred~. It will be understood that these substrates, onto which the me~al oxide coatings are to be- deposited, may themselves be supported or xeinforced by an undexlying substrate or me~ber, especial~ wh~r~ nickel, iron, or copper is carried by, or ~r an. underlying substrate or member. The substrate, o~o which th~ me~al oxide coating is ~o be deposi~ed, ma~ itseL~ be an outer la~er o~ ~ laminate or coated structure, and i~ may be, optio~ally, a non-conductive substrate.onto which the metal oxide coating is deposited.
Th~ pla~inum metal serie~ comprises Ru, Rh, Pd, Qs, Ir, and Pt.. Of these, the pre~erred metals are platLnum and ruthe~ium, w~h xuthenium b~ing most preferred. The soluble.platinum metal compound may be ~5. ~he halids, sulphate, nitrate or other soluble salt or soluble compou~d of th~ metal and is preferably the halide salt, such as RuCl3 hydrate, PtCl4 hydxate, and the like.
The seconda~y electrocatalytic metal oxide precursor o~ ~he present coating ma~ be at least one 31,010-F -12-derived from a soluble compound of Ni, Co, Fe, Cu, W, V, Mn, Mo, Nb, Ta, Ti, Zr, Cd, Cr, B, Sn, La, or si.
The preferred of these are Ni, Zr, and Ti, with Ni being khe most preferred.
The solution of the present invention contains at least one chemically active agen~ capable of etching ~he s~bstrate, and, in the case of second and later coatings, etching and solubilizing the most chemically--susceptible portions o~ the 02ides previously formed, while also, preferably as the ~emperature is elev~ted, vaporizing, in many cases, from the heated mixture, along with volatilized anions or negative-valence radicals from the platinum metal oxide precursor and th~ secondary electrocatalytic metal oxide precursor.
The preferred chemically active etchants comprise most common acids, such as hydrochloric acid, sulphuric acid, ~i~ric acid, p~osphoric acid; also hydrazine hydrosulphate, and the lik~, with hydrochloric acid and hydrazine~hydrosulphat~ being among the most preferred.
In general, ~he preferred method contemplated in the present in~ention comprises applying to the de~ired;substrate a solution containing at least one platinum me~al series compound, at leas~ one electro-catalytic me~al compound, and a chemical etchant, preferably containing a volatile organic vehicle, such as isopropanol, a~d allowing the volatile vehicle to evaporate, leaving the etcha~t and the dissolved metal values; the~ heatin~ ~he substrate to a temperature sufficient to concentrate the metal values, also sub-30 ~tantially driving out the volatilized etchant alongwith the anions or ne~ative-valence radicals released from th~-metal oxide precursors, and heating the 31,01Q-F -13-substrate in the presence of oxygen or air to a temper-ature sufficient to ~he~nally oxidize and convert the metals to metal oxides in-situ on the substrate. The steps may be repeated a plurality of times in order to attain the best full effect of the i~vention by increasi~g the thic~ness of the coating. Furthermore there is, at times, a benefit to be derived from laying do~m 2 or more layers of the metal oxide precursors between each thermal oxidation step.
In a particularly preferred embodiment an electrode material is prepared by applying a hetero-g.e~eou& metal oxide coating, said heterogeneous metal o~id~ coatin~ comprising nickel o~ide and a platinum group me~al oxide ~op~io~ally contai~ing a modifier metal oxide, e.g., ZrO2), onto a nickel metal layer (which.may be in ~he form-of a nickel layer on an elec~roconducti~e substrate~ by the process which compri~e~ (a) applyi~ ta said nickel metal layer a.
coating solutio~ compriæing a Dickel oxide precursor, a platinum group metal oxide precursor, an optional modifier metal o~ide precursor, and an etchant for dissolving the mos-t soluble portions of the nickel m~tal ~urface, (b) heating.to e~aporate volatile porti:ons o~ the coating solution, thereby concentrating and depo~iting ~he metal oxide precursors on the ~o-etched nickel metal surface, (c) heating i~ the presence of air or oxygen at a temperature hetween 3Q0C to 600C for ~ time suficient to oxidize the ~- metals of the m0tal oxide precursors, and (d) cooling ~he so-prepared electrode material. Additional coati~gs may be applied in similar manner so as to increase the thickness o~ ~he so-produced heterogeneous metal oxide coating on the nlckel metal surface, though the etchant 31,010-F -14-~2~
for ~he second and later coating applications may beneficially be the same as, or different from, the etchant used in the initial coating application. There is thus prepared an electrode material comprising a nickel metal layer ha~ing tigh~ly adhered thereto a heterogeneous metal oxide coating comprising nickel o~ide and a platinum group metal oxide, op~ionally also containing a modifier metal oxide. Preferably, the platinum group metal oxide is ru~henium oxide. The pre~erred optional modifier metal oxide is zirconium oxide.. A~ economical form of the nickel metal layer is that of a nickel layer on a less expensive electro-conductiv~ substrate, such as steel or iron alloys.
Such electrode material is particularly useful as cathodes in chlor-alkali cells.
Ordinarily-the temperatures at which thermal oxidatlon of the metals:is achieved is somewhat depen-den~ on the metaIs, but a temperature in the range o~
fr~m~ 3:00Q to 650C, more or less~, is generally e~fective.
It is; generally preferred ~hat the thermal oxidation be per~ormed at a temperature in the range of from 350 to 550C.
The effect of the invention is to produce a s~bstantially hard, adherent coating of heterogeneou6 oxides of th~ solubilized metals.
It is within ~he purvie~ of the present i~ventive co~cept that the ~olubilization, reconcen-tration, and in-situ deposition.of the solubilized - metals, usin~ chemical etchi~g of the previously deposited layers and/or substrate produces an intimate mixture of oxides which are mutually s~abili2ing and electrocatalytically compleme~tary.
31,010-F -15~
~16-The following examples illustrate particular embodiments, but the invention is not limited to the particular embodiments illustrated.
Exam~le 1 A solu~ion was prepared which con~isted of 1 part RuCl3 3H20, 1 part NiC12 6~20, 3.3 parts H2NNH2-H2SO4 (hydrazine hydrosulphate), 5 parts HzO, and 28 parts isopropanol. The solution was prepared by first mixing together all ingredients other than ~he isopropan~l by stirring overnight, then adding the isopropanol and continuing to s~ir for approximately 6 houxs.
A cathode was prepared which was constructed of a 40% expanded mesh of nickel. The cathode was first sa~dblasted, ~h~n etched in 1:1 ~Cl. I~ was subse~ue~tIy ri~sed, dipped in isopropanol and air dried~ T~ cathode was coated by dipping it into the coa~ing solution, alIowing it to air dry, ~hen baking it in a~ oYe~ at 375C for 20 minutes. In the same maDner, a total of 6 coats were applied. The ca~hode waæ immersed in a heated bath containing 35% NaOH at a ~empe*ature of 90C. A current was applied and potential measurements were take~ using ~-standard Calomel Reference Electrode (SCE) a~d a Luggi~ probe. The cathode potential was measured at -1145 millivol~s vs. SCE at a current density oi~ 2 amp5 per square inch (0.31 amps per cm2 ) .
The cathode was asæembled in a laboratory membrane chlorine cell and operated a~ 90C, producing C12 at the anod~ and E2 at the cathode, at 31-33% NaO~
concentration, operating at 0.31 ampjcm2 (2 amp/in current density. The pvten~ial of the cathode was monitore~ and averaged per week. The results are shown in Table I.
31,01Q-F -16-- ~Z~6~
.
Example 2 A solution was prepared which consisted of 1 part RuC13-3H20, 1 part Nicl2~6H2o~ and 3.3 parts concentrated HCl. It was allowed to mix overnight.
Subseguently, 33 parts isoprop~nol were added and mi~ing continued 2 hours. A cathode was prepared in accordance with the procedure of Example 1. The cathode was then coated in the same manner as Example 1 except baki~g was carried out at a temperature of 495-500C.
Ten coats were applied. The cathode potential was measured as in E~ample 1. The potential was -1135 millivolts vs. SCE. The cathode was assembled in a laboratory cell containing a commercially a~ailable NAFION* polymer ~*a tradeRame o~ E. I. duPont de Nemours) 15 membrane. The cell was operated a~ gOC, 31-33% NaOH, and 0.31 amp/Cm2 ~2 amp/in2) curren~ density. The pote~tial of the cathode was monitored and averaged per week. The resul~s ar.e shown in Table I.
E~ampl ~3 A so:lution wa~ prepared which consisted of 1 par~ N~20~C1, 5 parts concentrated RCl, 2 parts 10%
PtClS~6E~0, 1 par~ NiCl2 6H20, and 1 par~ RuCl3 3H~O.
The solution was~ allowed to mix ~or 12 hours. Then 75 parts isopropanol were added and mixing continued for 2 hours~ A cathode-was prepared according to Example l. The cathode wa-q then coated in ~he same manner as Example 1 except baking:was carried out at a tempera.ture of 470-480C. Five coats were applied.
sixth cQa~ was applied and the alectrode was baked for 30 minutes at a temperature o~ 470-480C~ The potential of the cathode was measured as in Example 1. The pote~tial was ~1108 millivolts vs. SCE. The cathode . was assembled in a laboratory membrane chlorine cell 31,010-F -17-containing a commercialy availcible membrane, as in Example 2. The cell was operated at 90C, 31-33% NaQ~, and 0.31 amp/cm2 (2 amp/in2) current density. The potential of the cathode was monitored and averaged per week. The results are shown in Table I.
A solution was prepared which consisted of 3 parts RuC13 3H2O, 3 parts NiClz 6H2O, 1 part ZrCl~, 5 parts concentrated ~Cl, and 42 parts isopropanol. The solution was allowed to mix 2 hours. The cathode was then coated in ~he same manner as Example 1 except baki~g was carried out at a temperature of 495-500C.
. Eight coats were applied. A ninth coa~ was appli~d and the electrode was baked for 30 minutes at a temperature o~ 470~480C. The po~ential of the cathode was measured as in Example 1. The pote~tial was. 1146 milli~olts vs. SCE. T~e~ca~h~d~ wa assembled in a laborato~y membrane~chloriné c~l-1 contai~in~ a.commercially available membrane, ~ in ~ample 2. The cell was operated at 90C, 31-33~ NaOX~ ~nd 0.31 amp/cm2 (2 amp/i~Z) current de~sity. The poten~ial of th~ cathode was monitored and a~araged per week. The results are shown in Table I.
Example 5 A cathode was prepared as in the previous e~amples, ~hen d~pped in a solution contai~iny 1 gxam of tetraisopropyl titanate in 100 ml of isopropan~l.
Th~ cathode waa then baked at a temperature of 475-500C for 10 minutes. Thre~ co~ts were applied.
A solutio~ was prepared as in Example 2. The cathode was dipped in the soluti~, air dried, and baked at a temperatur~ of 475-500C. Six coats were applied.
31,010-F- -18-3~4~
The potential of the cathode was measured as in khe previous examples. The potential was -1154 millivolts vs, SCE. The cathode was assembled in a laboratory membranP chlorine cell containing a commercially
5 available membrane, as in Example 2. The cell was operated a~ 90C, 31~33% NaOH, and 0.31 amp/cm2 ( 2 amp/in2 ) current density. The potential of the cathode was monitored and averaged per week. The results axe shown in Table I and also in Figure l. .
Exam~le_6 (Comparative Example) A 40% expanded mesh electrode of steel was prepared, but no~ coated, and assembled as the cathode in a laboratory cell as in ~xamples 2-5, using the same type membrane. The potential of the cathode was monitored and averaged per week. The results are shown in Tabl~ I.
Exame~e 7 (Comparativ~ E~ample) A 40% expanded mesh elec~rode of ~ickel was prepared, but not coate~, and assembled as the cathode in a laboratory cell as in E~amples 2-5, using the same type membrane. The poten~ial of the cathode was monitore& and a~eraged per week. The results are shown in Table I and also in Figure 1.
31,010~F -19-~24~
TABLE I
NegatiYe volkage* averaged ~ach week for No. oElectrodes No 1 thru 7 . .
Weeks Ex. 1 Ex. 2 Ex. 3 Ex. 4 Ex. 5 CEx. 6 CEx. 7 11.145 1.120 1.135 l.lZ0 1.140 1.~75 1.49~
21.1~0 1.1~0 1.150 1.130 1.130 1.460 1.475 31.150 1.125 1.160 1.150 1.110 1.455 1.470 41.155 1.130 1.150 1.155 1.080 1.455 1.470 51.155 1.130 1.150 1.150 1.070 1.465 1~475 61.150 1.130 1.~80 1.15~ 1.060 1.475 1.480 71.150 1.125 1.185 1.155 1.060 1.480 1.4g5 81.150 1.125 1~180 1.160 1.060 1.480 1.510 91.140 1.120 ~.160 1.155 1.070 1.480 1.510 lO1.130 1.110 1.185 1.160 1.080 1.475 1.510 111.115 1.11~ 1.190 1.170 1.080 1.480 1.515 121.1~0 1.1~0 1.190 1.165 1.080 1.490 1.520 13I.100 1.110 1.150 10165 1.080 1.485 1.520 ~ l00 1.115 l.l90~ 1.1701.080 - - 1.520 I5l.Og5 1.120 I.190 1~170 1.090 - - 1;525 l*~.090 1.120 1~190 1.170 1.090 - - 1.530 171 ~85~ 0 1.190 1.170 1.09~
18I.080 1.120 1~.190 1.1651.100 lg1.0~0 l.llO 1.190 1.160 1.100 - - - -1.080~ 1~110 1.190 -1.100 - - - -21l.Q80 l.110 1.190 221.090 - - 1.190 23l.Q90 - ~l.l9Q-24I.100 - l.lgO
251.100 26I.090 271.090 ~ - - - - - - - -CEx - Comparative Example * The voltages recorded in Table I were all measured in the sam~ manner, using a Luggin probe, thus are relevant 31,010-F 20-..
4~V~
to each other, though all are believed to be slighkly lower than what one should expect to find from a theo-retical calculation~ By thermodyn~nic calculations, the actual absolute reversible voltage should be about -1.093V for a cell at'90C, 31-33% NaOH, and at a current density of 0.31 amp/inZ t2 ~np/in2).
Example 8 The cells o~ Examples 2-7 were operated at 90C, 31-33% NaOHr and 0.31 amp/cm2 (2 amp/inZ) current de~sity while maintaini~g atmospheric pressures in the anolyte an~ catholyte compartments of the cell. Sodium chIoride brine and water were fed to the anolyte and catholyte compartments, respecti~ely, in order to main~ai~ anolyte concentrations i~ the range 180-200 grams per liter NaCl a~d 31-33% NaO~. Internal mi~ing of the cells was accomplished by natural gas lift due to evolution of hydrogen gas at the cathode and chlorine gas at the anode. Data including mass and energy balance& were~collected periodically over the period of 2Q operation o~ ~h~ celIs and energy requirements for the ~roductio~ o~ NaOH were caLcuIate~. The results are show~ in Tabl~ 2.
Electrode ~ Cathode KW~MT NaO~
2 coate~ 2208 3 coated 2221 4 coated 2229 coated 2259
Exam~le_6 (Comparative Example) A 40% expanded mesh electrode of steel was prepared, but no~ coated, and assembled as the cathode in a laboratory cell as in ~xamples 2-5, using the same type membrane. The potential of the cathode was monitored and averaged per week. The results are shown in Tabl~ I.
Exame~e 7 (Comparativ~ E~ample) A 40% expanded mesh elec~rode of ~ickel was prepared, but not coate~, and assembled as the cathode in a laboratory cell as in E~amples 2-5, using the same type membrane. The poten~ial of the cathode was monitore& and a~eraged per week. The results are shown in Table I and also in Figure 1.
31,010~F -19-~24~
TABLE I
NegatiYe volkage* averaged ~ach week for No. oElectrodes No 1 thru 7 . .
Weeks Ex. 1 Ex. 2 Ex. 3 Ex. 4 Ex. 5 CEx. 6 CEx. 7 11.145 1.120 1.135 l.lZ0 1.140 1.~75 1.49~
21.1~0 1.1~0 1.150 1.130 1.130 1.460 1.475 31.150 1.125 1.160 1.150 1.110 1.455 1.470 41.155 1.130 1.150 1.155 1.080 1.455 1.470 51.155 1.130 1.150 1.150 1.070 1.465 1~475 61.150 1.130 1.~80 1.15~ 1.060 1.475 1.480 71.150 1.125 1.185 1.155 1.060 1.480 1.4g5 81.150 1.125 1~180 1.160 1.060 1.480 1.510 91.140 1.120 ~.160 1.155 1.070 1.480 1.510 lO1.130 1.110 1.185 1.160 1.080 1.475 1.510 111.115 1.11~ 1.190 1.170 1.080 1.480 1.515 121.1~0 1.1~0 1.190 1.165 1.080 1.490 1.520 13I.100 1.110 1.150 10165 1.080 1.485 1.520 ~ l00 1.115 l.l90~ 1.1701.080 - - 1.520 I5l.Og5 1.120 I.190 1~170 1.090 - - 1;525 l*~.090 1.120 1~190 1.170 1.090 - - 1.530 171 ~85~ 0 1.190 1.170 1.09~
18I.080 1.120 1~.190 1.1651.100 lg1.0~0 l.llO 1.190 1.160 1.100 - - - -1.080~ 1~110 1.190 -1.100 - - - -21l.Q80 l.110 1.190 221.090 - - 1.190 23l.Q90 - ~l.l9Q-24I.100 - l.lgO
251.100 26I.090 271.090 ~ - - - - - - - -CEx - Comparative Example * The voltages recorded in Table I were all measured in the sam~ manner, using a Luggin probe, thus are relevant 31,010-F 20-..
4~V~
to each other, though all are believed to be slighkly lower than what one should expect to find from a theo-retical calculation~ By thermodyn~nic calculations, the actual absolute reversible voltage should be about -1.093V for a cell at'90C, 31-33% NaOH, and at a current density of 0.31 amp/inZ t2 ~np/in2).
Example 8 The cells o~ Examples 2-7 were operated at 90C, 31-33% NaOHr and 0.31 amp/cm2 (2 amp/inZ) current de~sity while maintaini~g atmospheric pressures in the anolyte an~ catholyte compartments of the cell. Sodium chIoride brine and water were fed to the anolyte and catholyte compartments, respecti~ely, in order to main~ai~ anolyte concentrations i~ the range 180-200 grams per liter NaCl a~d 31-33% NaO~. Internal mi~ing of the cells was accomplished by natural gas lift due to evolution of hydrogen gas at the cathode and chlorine gas at the anode. Data including mass and energy balance& were~collected periodically over the period of 2Q operation o~ ~h~ celIs and energy requirements for the ~roductio~ o~ NaOH were caLcuIate~. The results are show~ in Tabl~ 2.
Electrode ~ Cathode KW~MT NaO~
2 coate~ 2208 3 coated 2221 4 coated 2229 coated 2259
6 steel 2497
7 nickel 2504 31,010-F -21-Example 9 In a large scale tes~, two series of pressure membrane chlorine cellq were con~tructed. The con-struction and de~ign of the cells were identical except that the series identified as Series 1 had a nickel-wall catholyte compartment and nickel electrode~ installed in the catholyte compartment of the cells, while the ~eries identified as Series 2 have a steel-wall cathode compartment and steel cathodes. The electrodes of Series 1 were coated according to the process of the invention, while those of Series 2 were uncoated. Both series were erected with a commercially available cation exchange membrane, as in Example 2. The two series were operated simultaneously at 90C, 0.31 amp/cm2 ~2 amp/in2) current denqity, and 31 to 33% sodium hydroxide in the catholyte chamber. The series were operated at pressures of 101,325 to 202,650 Pa (1 to 2 atmospheres) while recirculating the anolyte and the catholyte through the cells using centrifugal pumps.
The ratio of the catholyte flow to the anolyte flow was maintained at a value greater than 1. Energy and mass balance data were collected and average performance data were calculated over a period of 45 days. The results clearly show that the energy savings attained with the use of the electrodes of the present invention (Series 1) averaged greater than a 5% reduction in energy, compared with Series 2.
It is within the purview of the present invention to employ the present novel electrodes at temperatures encountered in cell~ operated at super-atmospheric pressures, as well as at atmospheric or subatmospheric pressures. The electrodes are especially suitable for opera~ion in the elevated temperature 31,010-F -22-range of from 85 to 105C. Pressures a~ around 101,325 Pa (1 a~m.), more or less, are ordinarily used iTl chlor-alkali cells, though pressures up to abouk 303,975 Pa (3 atm.) or more may be used.
The electrodes of the present invention are useful in cells wherein circulation within each electrolyte compar~ment is created by ~he gas~lift (displacement) actio~ of gaseous products produced therein, though in some cells, such as in electrolyte series flow from cell-to-cell, another pumping means may be provided to supplement, or substi~ute for, the gas-lift action. We fi~d it ad~isable, in some cases, to maintain the ratio o~ ~he volume o~ catholyte pumped to that of -the a~olyte volume pumped, at a ratio greater than unity.
The electrodes of this invention are useful i~ chlor-alkali electro~ytic cells in which the anoly~e -has, or i~. adju~ted:to haYe, a p~ in the range of from l-to.5~ su~h as when an acid~, ~.g. ~Cl, is added to the analyte.
31,010-F -23:-
The ratio of the catholyte flow to the anolyte flow was maintained at a value greater than 1. Energy and mass balance data were collected and average performance data were calculated over a period of 45 days. The results clearly show that the energy savings attained with the use of the electrodes of the present invention (Series 1) averaged greater than a 5% reduction in energy, compared with Series 2.
It is within the purview of the present invention to employ the present novel electrodes at temperatures encountered in cell~ operated at super-atmospheric pressures, as well as at atmospheric or subatmospheric pressures. The electrodes are especially suitable for opera~ion in the elevated temperature 31,010-F -22-range of from 85 to 105C. Pressures a~ around 101,325 Pa (1 a~m.), more or less, are ordinarily used iTl chlor-alkali cells, though pressures up to abouk 303,975 Pa (3 atm.) or more may be used.
The electrodes of the present invention are useful in cells wherein circulation within each electrolyte compar~ment is created by ~he gas~lift (displacement) actio~ of gaseous products produced therein, though in some cells, such as in electrolyte series flow from cell-to-cell, another pumping means may be provided to supplement, or substi~ute for, the gas-lift action. We fi~d it ad~isable, in some cases, to maintain the ratio o~ ~he volume o~ catholyte pumped to that of -the a~olyte volume pumped, at a ratio greater than unity.
The electrodes of this invention are useful i~ chlor-alkali electro~ytic cells in which the anoly~e -has, or i~. adju~ted:to haYe, a p~ in the range of from l-to.5~ su~h as when an acid~, ~.g. ~Cl, is added to the analyte.
31,010-F -23:-
Claims (36)
PROPERTY OR PRIVILEGE IS CLAIMED ARE DEFINED AS FOLLOWS:
1. A method of making a low hydrogen over-voltage cathode which comprises a nickel substrate having coated thereon an electrocatalytically-active heterogeneous mixture of nickel oxide and a platinum group metal oxide, said method comprising the steps of (a) depositing on a nickel substrate a coating solution containing a nickel compound which is effective as a precursor for nickel oxide, and at least one platinum group metal compound which is effective as a precursor for a platinum group metal oxide, said coating solution also containing an etchant capable of etching the surface of the substrate and/or any previously applied coating, (b) heating to remove volatiles from the so-coated substrate to cause the metal values of the precursor compounds and those etched from the substrate or previous coating to be concentrated and recoated on the substrate or previously applied coating, and (c) further heating, in the presence of oxygen, air or an oxidizing agent, to a temperature sufficient to oxidize the metal values, said steps (a), (b), and (c) being performed a plurality of times.
2. The method of Claim 1 wherein the coating solution contains a metal compound which is effective as a precursor for a modifier metal oxide for modifying the heterogeneous mixture of nickel oxide and platinum group metal oxide.
3. The method of Claim 2 wherein the modifier metal oxide is zirconium oxide.
4. The method of Claim 1 wherein the platinum group metal is selected from platinum and ruthenium, and alloys thereof.
5. The method of Claim 1 wherein the nickel substrate is self-supporting.
6. The method of Claim 1 wherein the nickel substrate is supported by, carried by, or laminated to an underlying substrate selected from an electro-conductive and non-electroconductive material.
7. The method of Claim 1 wherein the metal oxide precursor compounds are selected from metal chlorides, nitrates, sulphates, and phosphates.
8. The method of Claim 1 wherein the etchant is selected from hydrochloric acid, sulphuric acid, nitric acid, phosphoric acid, and hydrazine hydrosulphate.
9. The method of Claim 1 wherein the temperature at which the oxidation of the metal values is carried out is in the range of from 300°C to 600°C.
10. The method of Claim 1 wherein the nickel metal substrate comprises a sheet of an expanded mesh.
11. A process for the electrolysis of aqueous solutions of sodium chloride in an electrolytic cell comprising an anolyte compartment and a catholyte compartment separated by a cation exchange membrane to produce an aqueous solution of sodium hydroxide in the catholyte compartment, and chlorine in the anolyte compartment, wherein the cathode of said process is a low hydrogen overvoltage cathode made by applying to an electroconductive substrate a coating solution of nickel and at least one platinum group precursor compound(s) and an etchant capable of etching the surface of the substrate and/or any previously applied coating, heating to remove volatiles from the so-coated substrate to cause the metal values of the precursor compounds and those etched from the substrate or previous coating to be concentrated and recoated on the substrate or previously applied coating, and further heating, in the presence of oxygen, air or an oxidizing agent, to a temperature sufficient to oxidize the metal values, thereby obtaining on said substrate an electro-catalytically active heterogeneous coating of a mixture of nickel oxide and at least one platinum group metal oxide.
12. The process of Claim 11 wherein the cathode comprises a layer of nickel having tightly adhered thereto said heterogeneous metal oxide coating.
13 The process of Claim 12 wherein said coating contains at least one oxide of said platinum group metal selected from Ru, Rh, Pd, Os, Ir, and Pt.
14. The process of Claim 13 wherein the platinum group metal oxide is selected from platinum oxide and ruthenium oxide.
15. The process of Claim 11 wherein the heterogeneous metal oxide coating includes a modifier metal oxide.
16. The process of Claim 15 wherein the modifier metal oxide is ZrO2..
17. The process of Claim 16 wherein the heterogeneous metal oxide coating comprises RuO2 and NiO.
18. The process of Claim 11, wherein the substrate is supported by an electroconductive base.
19. The process of Claim 11, wherein the substrate is supported by a substantially non-electro-conductive base.
20. The process of Claim 11, wherein the substrate has a layer of nickel between it and the heterogeneous metal oxide coating.
21. The process of Claim 11, wherein the substrate is supported by a substantially non-conductive base and wherein there is a layer of nickel between the substrate and the heterogeneous metal oxide coating.
22. The process of Claim 11, wherein there is a layer of nickel between the electroconductive substrate and the heterogeneous metal oxide coating.
23. The process of Claim 11, wherein the substrate has a layer of Ni between it and the heterogeneous metal oxide coating, and wherein said heterogeneous metal oxide coating comprises, predominantly, RuO2 and NiO, along with ZrO2 as a modifier metal oxide.
24. An electrode for use in an electro-chemical cell comprising a substrate having an electrocatalytically active coating deposited thereon, said coating comprising a heterogeneous mixture of metal oxides containing nickel oxide and at least one platinum group metal oxide.
25. The electrode of Claim 24, wherein said coating contains at least one oxide of said platinum group metal selected from Ru, Rh, Pd, Os, Ir, and Pt.
26. An electrode of Claim 24, wherein the mixture of metal oxides includes a minor amount of a modifier metal oxide.
27 The electrode of Claim 26, wherein the modifier metal oxide is ZrO2.
28. The electrode of Claim 24, wherein the substrate has a layer of nickel between it and the heterogeneous metal oxide mixture.
29. The electrode of Claim 24, wherein the substrate is supported by a substantially non-conductive base and wherein there is a layer of nickel between the substrate and the heterogeneous metal oxide coating.
30. The electrode of Claim 24, wherein the substrate has a layer of Ni between it and the heterogeneous metal oxide coating, and wherein said heterogeneous metal oxide coating comprises, predominantly, RuO2 and NiO, along with ZrO2 as a modifier metal oxide.
31. The electrode of Claim 24, wherein the substrate comprises an expanded mesh sheet.
32. A low hydrogen overvoltage cathode for use in a chlor-alkali electrolytic cell comprising a substrate having an electrocatalytically active coating deposited thereon, said coating comprising a heterogeneous mixture of metal oxides containing nickel oxide and at least one oxide of a metal selected from Ru, Rh, Pd, Os, Ir, and Pt.
33. The cathode of Claim 32, wherein the heterogeneous mixture of metal oxides comprises RuO2 and NiO.
34. The cathode of Claim 32 or 33 wherein the heterogeneous mixture of metal oxides includes a modifier metal oxide.
35. The cathode of Claim 34, wherein the modifier metal oxides is ZrO2.
36. The cathode of Claim 32, wherein the substrate has a layer of Ni between it and the heterogeneous mixture of metal oxides.
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US49962683A | 1983-05-31 | 1983-05-31 | |
| US499,626 | 1983-05-31 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CA1246008A true CA1246008A (en) | 1988-12-06 |
Family
ID=23986028
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CA000455237A Expired CA1246008A (en) | 1983-05-31 | 1984-05-28 | Electrode with nickel substrate and coating of nickel and platinum group metal compounds |
Country Status (16)
| Country | Link |
|---|---|
| EP (1) | EP0129734B1 (en) |
| JP (1) | JPS59232284A (en) |
| KR (1) | KR870001769B1 (en) |
| AT (1) | ATE50003T1 (en) |
| AU (1) | AU580002B2 (en) |
| BR (1) | BR8402693A (en) |
| CA (1) | CA1246008A (en) |
| CS (1) | CS273157B2 (en) |
| DD (1) | DD253648A1 (en) |
| DE (1) | DE3481203D1 (en) |
| FI (1) | FI75872C (en) |
| HU (1) | HU201124B (en) |
| IN (1) | IN161186B (en) |
| NO (1) | NO164487C (en) |
| PL (1) | PL143728B1 (en) |
| ZA (1) | ZA844069B (en) |
Families Citing this family (14)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE3322169A1 (en) * | 1983-06-21 | 1985-01-10 | Sigri Elektrographit Gmbh, 8901 Meitingen | CATHODE FOR AQUEOUS ELECTROLYSIS |
| DE3344416A1 (en) * | 1983-12-08 | 1985-12-05 | Sigri GmbH, 8901 Meitingen | Method of producing a cathode for aqueous electrolysis |
| IN164233B (en) * | 1984-12-14 | 1989-02-04 | Oronzio De Nora Impianti | |
| FR2579628A1 (en) * | 1985-03-29 | 1986-10-03 | Atochem | CATHODE FOR ELECTROLYSIS AND METHOD FOR MANUFACTURING THE SAME CATHODE |
| MX169643B (en) * | 1985-04-12 | 1993-07-16 | Oronzio De Nora Impianti | ELECTRODE FOR ELECTROCHEMICAL PROCESSES, PROCEDURE FOR ITS PRODUCTION AND ELECTROLYSIS TANK CONTAINING SUCH ELECTRODE |
| CN1012970B (en) * | 1987-06-29 | 1991-06-26 | 耐用电极株式会社 | Cathode for electrolysis and method for preparing same |
| WO1992022909A1 (en) * | 1991-06-13 | 1992-12-23 | Purdue Research Foundation | Solid state surface micro-plasma fusion device |
| JP4142191B2 (en) * | 1999-02-24 | 2008-08-27 | ペルメレック電極株式会社 | Method for producing activated cathode |
| TW200304503A (en) | 2002-03-20 | 2003-10-01 | Asahi Chemical Ind | Electrode for generation of hydrogen |
| CN1938453B (en) | 2004-04-23 | 2010-10-20 | 东曹株式会社 | Electrode for generating hydrogen, manufacturing method thereof, and electrolysis method using same |
| JP4578348B2 (en) * | 2005-03-24 | 2010-11-10 | 旭化成ケミカルズ株式会社 | Electrode for hydrogen generation |
| JP5317012B2 (en) * | 2009-03-11 | 2013-10-16 | ダイソー株式会社 | Manufacturing method of low hydrogen overvoltage cathode |
| JP5429789B2 (en) * | 2009-04-21 | 2014-02-26 | 国立大学法人東北大学 | Electrodialysis machine |
| EP4402303A2 (en) * | 2021-09-13 | 2024-07-24 | Magneto Special Anodes B.V. | An electrolyzer electrocatalyst comprising cobalt (co) oxide, zirconium (zr) and a noble metal, an electrode comprising the electrocatalyst and the use of the electrocatalyst in an electrolysis process |
Family Cites Families (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5228106B2 (en) * | 1973-08-20 | 1977-07-25 | ||
| US4300992A (en) * | 1975-05-12 | 1981-11-17 | Hodogaya Chemical Co., Ltd. | Activated cathode |
| US3990957A (en) * | 1975-11-17 | 1976-11-09 | Ppg Industries, Inc. | Method of electrolysis |
| US4100049A (en) * | 1977-07-11 | 1978-07-11 | Diamond Shamrock Corporation | Coated cathode for electrolysis cells |
| JPS56130485A (en) * | 1980-02-26 | 1981-10-13 | Vladimir Reonidouitsuchi Kubas | Electrode for electrochemical process and method |
| CA1190186A (en) * | 1980-08-18 | 1985-07-09 | Henri B. Beer | Electrode with mixed oxide interface on valve metal base and stable outer coating |
-
1984
- 1984-05-28 CA CA000455237A patent/CA1246008A/en not_active Expired
- 1984-05-28 AU AU28749/84A patent/AU580002B2/en not_active Ceased
- 1984-05-29 DE DE8484106102T patent/DE3481203D1/en not_active Expired - Lifetime
- 1984-05-29 EP EP84106102A patent/EP0129734B1/en not_active Expired - Lifetime
- 1984-05-29 FI FI842145A patent/FI75872C/en not_active IP Right Cessation
- 1984-05-29 ZA ZA844069A patent/ZA844069B/en unknown
- 1984-05-29 AT AT84106102T patent/ATE50003T1/en not_active IP Right Cessation
- 1984-05-29 IN IN393/MAS/84A patent/IN161186B/en unknown
- 1984-05-30 KR KR1019840002998A patent/KR870001769B1/en not_active Expired
- 1984-05-30 NO NO842156A patent/NO164487C/en unknown
- 1984-05-30 PL PL1984247951A patent/PL143728B1/en unknown
- 1984-05-30 BR BR8402693A patent/BR8402693A/en unknown
- 1984-05-30 HU HU842109A patent/HU201124B/en unknown
- 1984-05-30 DD DD84263577A patent/DD253648A1/en not_active IP Right Cessation
- 1984-05-31 CS CS409284A patent/CS273157B2/en unknown
- 1984-05-31 JP JP59109775A patent/JPS59232284A/en active Granted
Also Published As
| Publication number | Publication date |
|---|---|
| AU580002B2 (en) | 1988-12-22 |
| FI842145A0 (en) | 1984-05-29 |
| AU2874984A (en) | 1984-12-06 |
| CS409284A2 (en) | 1990-07-12 |
| FI842145L (en) | 1984-12-01 |
| DD253648A1 (en) | 1988-01-27 |
| JPH0375635B2 (en) | 1991-12-02 |
| DD232514A5 (en) | 1986-01-29 |
| PL143728B1 (en) | 1988-03-31 |
| FI75872C (en) | 1988-08-08 |
| NO164487C (en) | 1990-10-10 |
| IN161186B (en) | 1987-10-17 |
| KR870001769B1 (en) | 1987-10-06 |
| EP0129734A3 (en) | 1985-06-05 |
| FI75872B (en) | 1988-04-29 |
| EP0129734B1 (en) | 1990-01-31 |
| HU201124B (en) | 1990-09-28 |
| ATE50003T1 (en) | 1990-02-15 |
| EP0129734A2 (en) | 1985-01-02 |
| DE3481203D1 (en) | 1990-03-08 |
| NO164487B (en) | 1990-07-02 |
| HUT34562A (en) | 1985-03-28 |
| ZA844069B (en) | 1986-01-29 |
| JPS59232284A (en) | 1984-12-27 |
| KR840009124A (en) | 1984-12-24 |
| BR8402693A (en) | 1985-05-07 |
| PL247951A1 (en) | 1985-02-27 |
| NO842156L (en) | 1984-12-03 |
| CS273157B2 (en) | 1991-03-12 |
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