BR9813405A - Máscara de amplitude, e aparelho e processo para fabricação de filtro de retìcula de longa duração usando a mesma - Google Patents
Máscara de amplitude, e aparelho e processo para fabricação de filtro de retìcula de longa duração usando a mesmaInfo
- Publication number
- BR9813405A BR9813405A BR9813405-1A BR9813405A BR9813405A BR 9813405 A BR9813405 A BR 9813405A BR 9813405 A BR9813405 A BR 9813405A BR 9813405 A BR9813405 A BR 9813405A
- Authority
- BR
- Brazil
- Prior art keywords
- amplitude mask
- lasting
- laser light
- same
- long
- Prior art date
Links
- 230000005923 long-lasting effect Effects 0.000 abstract 2
- 238000004519 manufacturing process Methods 0.000 abstract 2
- 238000000034 method Methods 0.000 abstract 2
- 239000013307 optical fiber Substances 0.000 abstract 2
- 230000007774 longterm Effects 0.000 abstract 1
- 230000035900 sweating Effects 0.000 abstract 1
Classifications
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B5/00—Optical elements other than lenses
- G02B5/20—Filters
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70216—Mask projection systems
- G03F7/70283—Mask effects on the imaging process
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B6/00—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings
- G02B6/02—Optical fibres with cladding with or without a coating
- G02B6/02057—Optical fibres with cladding with or without a coating comprising gratings
- G02B6/02076—Refractive index modulation gratings, e.g. Bragg gratings
- G02B6/02123—Refractive index modulation gratings, e.g. Bragg gratings characterised by the method of manufacture of the grating
- G02B6/02142—Refractive index modulation gratings, e.g. Bragg gratings characterised by the method of manufacture of the grating based on illuminating or irradiating an amplitude mask, i.e. a mask having a repetitive intensity modulating pattern
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B6/00—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings
- G02B6/02—Optical fibres with cladding with or without a coating
- G02B6/02057—Optical fibres with cladding with or without a coating comprising gratings
- G02B6/02076—Refractive index modulation gratings, e.g. Bragg gratings
- G02B6/02123—Refractive index modulation gratings, e.g. Bragg gratings characterised by the method of manufacture of the grating
- G02B6/02152—Refractive index modulation gratings, e.g. Bragg gratings characterised by the method of manufacture of the grating involving moving the fibre or a manufacturing element, stretching of the fibre
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B6/00—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings
- G02B6/02—Optical fibres with cladding with or without a coating
- G02B6/02057—Optical fibres with cladding with or without a coating comprising gratings
- G02B6/02076—Refractive index modulation gratings, e.g. Bragg gratings
- G02B6/0208—Refractive index modulation gratings, e.g. Bragg gratings characterised by their structure, wavelength response
- G02B6/02085—Refractive index modulation gratings, e.g. Bragg gratings characterised by their structure, wavelength response characterised by the grating profile, e.g. chirped, apodised, tilted, helical
- G02B6/02095—Long period gratings, i.e. transmission gratings coupling light between core and cladding modes
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/0005—Production of optical devices or components in so far as characterised by the lithographic processes or materials used therefor
- G03F7/001—Phase modulating patterns, e.g. refractive index patterns
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S359/00—Optical: systems and elements
- Y10S359/90—Methods
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- Manufacturing & Machinery (AREA)
- Optics & Photonics (AREA)
- Optical Fibers, Optical Fiber Cores, And Optical Fiber Bundles (AREA)
- Diffracting Gratings Or Hologram Optical Elements (AREA)
- Optical Integrated Circuits (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
- Respiratory Apparatuses And Protective Means (AREA)
Abstract
MáSCARA DE AMPLITUDE, E APARELHO E PROCESSO PARA FABRICAçãO DE FILTRO DE RETìCULA DE LONGA DURAçãO SUANDO A MESMA Uma máscara de amplitude, e um aparelho e processo para fabricação de um filtro de retícula de longa duração que usa a mesma, são providos. Quando uma retícula de longa duração é fabrica seletivamente passando luz de laser a uma fibra ótica, a máscara de amplitude periodicamente passa luz de laser até a fibra ótica. A máscara de amplitude inclui duas máscaras (300) que tem áreas de passagem alternantes periodicamente para a passagem da luz do laser e áreas de não passagem para impedir a passagem da luz do laser, pelo que as duas máscaras (300) são continuamente giradas em direções opostas. O período da área de passagem (308), deste modo, muda continuamente. Nesta máscara, duas máscaras (300) cada uma tendo um período pré determinado são giradas em direções opostas, para assim proverem um período da máscara de amplitude de dependente do ângulo de rotação. Assim, o período da máscara de amplitude pode ser continuamente trocado.
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| KR1019970066751A KR100265794B1 (ko) | 1997-12-08 | 1997-12-08 | 주기가 조절가능한 진폭 마스크 및 이를 이용한 장주기 격자 필터 제조장치 |
| PCT/KR1998/000414 WO1999030189A1 (en) | 1997-12-08 | 1998-12-08 | Amplitude mask, and apparatus and method for manufacturing long period grating filter using the same |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| BR9813405A true BR9813405A (pt) | 2000-11-14 |
Family
ID=19526713
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| BR9813405-1A BR9813405A (pt) | 1997-12-08 | 1998-12-08 | Máscara de amplitude, e aparelho e processo para fabricação de filtro de retìcula de longa duração usando a mesma |
Country Status (13)
| Country | Link |
|---|---|
| US (1) | US6204969B1 (pt) |
| EP (1) | EP1038196B1 (pt) |
| JP (1) | JP3328648B2 (pt) |
| KR (1) | KR100265794B1 (pt) |
| CN (1) | CN1113253C (pt) |
| AR (1) | AR016975A1 (pt) |
| AU (1) | AU740410C (pt) |
| BR (1) | BR9813405A (pt) |
| CA (1) | CA2311586C (pt) |
| DE (1) | DE69831095T2 (pt) |
| RU (1) | RU2193220C2 (pt) |
| TW (1) | TW408232B (pt) |
| WO (1) | WO1999030189A1 (pt) |
Families Citing this family (29)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| KR100322121B1 (ko) * | 1998-10-13 | 2002-03-08 | 윤종용 | 장주기격자필터제조장치 |
| JP3456927B2 (ja) * | 1999-08-06 | 2003-10-14 | 学校法人早稲田大学 | グレーティング並びにグレーティング形成方法及び装置 |
| KR100342532B1 (ko) * | 2000-08-04 | 2002-06-28 | 윤종용 | 편광 무의존성 장주기 광섬유 격자 제조 장치 |
| US6681067B1 (en) * | 2000-11-03 | 2004-01-20 | Cidra Corporation | Method for selective erasing/apodization of the index of refraction of an optical waveguide and an optical waveguide modified by the method |
| CA2354211A1 (en) * | 2001-07-26 | 2003-01-26 | Paul Lefebvre | Reel to reel manufacturing line |
| US7901630B2 (en) * | 2002-08-20 | 2011-03-08 | Illumina, Inc. | Diffraction grating-based encoded microparticle assay stick |
| US7900836B2 (en) * | 2002-08-20 | 2011-03-08 | Illumina, Inc. | Optical reader system for substrates having an optically readable code |
| US7441703B2 (en) * | 2002-08-20 | 2008-10-28 | Illumina, Inc. | Optical reader for diffraction grating-based encoded optical identification elements |
| US7923260B2 (en) | 2002-08-20 | 2011-04-12 | Illumina, Inc. | Method of reading encoded particles |
| US7164533B2 (en) | 2003-01-22 | 2007-01-16 | Cyvera Corporation | Hybrid random bead/chip based microarray |
| US7872804B2 (en) * | 2002-08-20 | 2011-01-18 | Illumina, Inc. | Encoded particle having a grating with variations in the refractive index |
| US20050227252A1 (en) * | 2002-08-20 | 2005-10-13 | Moon John A | Diffraction grating-based encoded articles for multiplexed experiments |
| US7508608B2 (en) * | 2004-11-17 | 2009-03-24 | Illumina, Inc. | Lithographically fabricated holographic optical identification element |
| EP1540591A1 (en) | 2002-09-12 | 2005-06-15 | Cyvera Corporation | Diffraction grating-based encoded micro-particles for multiplexed experiments |
| US20100255603A9 (en) * | 2002-09-12 | 2010-10-07 | Putnam Martin A | Method and apparatus for aligning microbeads in order to interrogate the same |
| US7092160B2 (en) * | 2002-09-12 | 2006-08-15 | Illumina, Inc. | Method of manufacturing of diffraction grating-based optical identification element |
| EP1575707A1 (en) | 2002-09-12 | 2005-09-21 | Cyvera Corporation | Method and apparatus for aligning elongated microbeads in order to interrogate the same |
| US20060057729A1 (en) * | 2003-09-12 | 2006-03-16 | Illumina, Inc. | Diffraction grating-based encoded element having a substance disposed thereon |
| US7277604B2 (en) * | 2003-12-12 | 2007-10-02 | Lxsix Photonics Inc. | Method and apparatus for inducing an index of refraction change on a substrate sensitive to electromagnetic radiation |
| US7433123B2 (en) | 2004-02-19 | 2008-10-07 | Illumina, Inc. | Optical identification element having non-waveguide photosensitive substrate with diffraction grating therein |
| WO2006020363A2 (en) | 2004-07-21 | 2006-02-23 | Illumina, Inc. | Method and apparatus for drug product tracking using encoded optical identification elements |
| US7602952B2 (en) | 2004-11-16 | 2009-10-13 | Illumina, Inc. | Scanner having spatial light modulator |
| AU2005307746B2 (en) | 2004-11-16 | 2011-05-12 | Illumina, Inc. | And methods and apparatus for reading coded microbeads |
| US7604173B2 (en) * | 2004-11-16 | 2009-10-20 | Illumina, Inc. | Holographically encoded elements for microarray and other tagging labeling applications, and method and apparatus for making and reading the same |
| CN100375912C (zh) * | 2005-04-28 | 2008-03-19 | 北京印刷学院 | 一种利用电子束制备长周期光纤光栅的方法 |
| US7623624B2 (en) * | 2005-11-22 | 2009-11-24 | Illumina, Inc. | Method and apparatus for labeling using optical identification elements characterized by X-ray diffraction |
| US7830575B2 (en) * | 2006-04-10 | 2010-11-09 | Illumina, Inc. | Optical scanner with improved scan time |
| WO2015007580A1 (en) * | 2013-07-18 | 2015-01-22 | Basf Se | Solar light management |
| CN110542946B (zh) * | 2018-05-28 | 2022-07-22 | 福州高意光学有限公司 | 一种用于快速调节啁啾光纤光栅带宽的振幅模板装置与方法 |
Family Cites Families (14)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| AUPM386794A0 (en) * | 1994-02-14 | 1994-03-10 | University Of Sydney, The | Optical grating |
| US5559907A (en) * | 1994-02-17 | 1996-09-24 | Lucent Technologies Inc. | Method of controlling polarization properties of a photo-induced device in an optical waveguide and method of investigating structure of an optical waveguide |
| GB2289770A (en) * | 1994-05-17 | 1995-11-29 | Northern Telecom Ltd | Writing bragg gratings in photosensitive waveguides |
| GB2289771B (en) * | 1994-05-26 | 1997-07-30 | Northern Telecom Ltd | Forming Bragg gratings in photosensitive waveguides |
| US5604829A (en) * | 1995-04-17 | 1997-02-18 | Hughes Aircraft Company | Optical waveguide with diffraction grating and method of forming the same |
| GB9509874D0 (en) * | 1995-05-16 | 1995-07-12 | Univ Southampton | Optical waveguide grating |
| WO1996036892A1 (en) * | 1995-05-19 | 1996-11-21 | Cornell Research Foundation, Inc. | Cascaded self-induced holography |
| RU2097803C1 (ru) * | 1996-06-04 | 1997-11-27 | Научный центр волоконной оптики при Институте общей физики РАН | Способ изменения показателя преломления в германосиликатном стекле |
| US5620495A (en) * | 1995-08-16 | 1997-04-15 | Lucent Technologies Inc. | Formation of gratings in polymer-coated optical fibers |
| JP2853659B2 (ja) * | 1996-06-11 | 1999-02-03 | 日本電気株式会社 | 回折格子の作製方法 |
| US5953471A (en) * | 1997-07-01 | 1999-09-14 | Lucent Technologies, Inc. | Optical communication system having short period reflective Bragg gratings |
| KR100258968B1 (ko) * | 1997-07-21 | 2000-06-15 | 윤종용 | 진폭마스크 및 이를 이용한 장주기 격자 필터 제조장치 |
| EP0978738A1 (en) * | 1998-08-03 | 2000-02-09 | BRITISH TELECOMMUNICATIONS public limited company | Apparatus and method for generating an interference pattern to be written as a grating in a sample of a photosensitive material |
| US6067391A (en) * | 1998-09-02 | 2000-05-23 | The United States Of America As Represented By The Secretary Of The Air Force | Multiply periodic refractive index modulated optical filters |
-
1997
- 1997-12-08 KR KR1019970066751A patent/KR100265794B1/ko not_active Expired - Fee Related
-
1998
- 1998-12-07 AR ARP980106211A patent/AR016975A1/es active IP Right Grant
- 1998-12-08 AU AU15102/99A patent/AU740410C/en not_active Ceased
- 1998-12-08 BR BR9813405-1A patent/BR9813405A/pt not_active Application Discontinuation
- 1998-12-08 EP EP98959267A patent/EP1038196B1/en not_active Expired - Lifetime
- 1998-12-08 WO PCT/KR1998/000414 patent/WO1999030189A1/en not_active Ceased
- 1998-12-08 US US09/207,584 patent/US6204969B1/en not_active Expired - Lifetime
- 1998-12-08 TW TW087120317A patent/TW408232B/zh not_active IP Right Cessation
- 1998-12-08 CA CA002311586A patent/CA2311586C/en not_active Expired - Fee Related
- 1998-12-08 JP JP2000524692A patent/JP3328648B2/ja not_active Expired - Fee Related
- 1998-12-08 DE DE69831095T patent/DE69831095T2/de not_active Expired - Fee Related
- 1998-12-08 CN CN98811862A patent/CN1113253C/zh not_active Expired - Fee Related
- 1998-12-08 RU RU2000114832/28A patent/RU2193220C2/ru not_active IP Right Cessation
Also Published As
| Publication number | Publication date |
|---|---|
| KR19980086448A (ko) | 1998-12-05 |
| CA2311586A1 (en) | 1999-06-17 |
| DE69831095T2 (de) | 2006-06-01 |
| EP1038196B1 (en) | 2005-08-03 |
| RU2193220C2 (ru) | 2002-11-20 |
| CN1113253C (zh) | 2003-07-02 |
| EP1038196A1 (en) | 2000-09-27 |
| TW408232B (en) | 2000-10-11 |
| DE69831095D1 (de) | 2005-09-08 |
| AU740410B2 (en) | 2001-11-01 |
| US6204969B1 (en) | 2001-03-20 |
| KR100265794B1 (ko) | 2000-09-15 |
| CA2311586C (en) | 2003-04-08 |
| CN1281554A (zh) | 2001-01-24 |
| JP2001526403A (ja) | 2001-12-18 |
| AR016975A1 (es) | 2001-08-01 |
| JP3328648B2 (ja) | 2002-09-30 |
| AU740410C (en) | 2002-06-06 |
| AU1510299A (en) | 1999-06-28 |
| WO1999030189A1 (en) | 1999-06-17 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| B06A | Notification to applicant to reply to the report for non-patentability or inadequacy of the application [chapter 6.1 patent gazette] | ||
| B11B | Dismissal acc. art. 36, par 1 of ipl - no reply within 90 days to fullfil the necessary requirements |