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BR8605710A - Composicao fotoendurecivel e material fotossensivel - Google Patents

Composicao fotoendurecivel e material fotossensivel

Info

Publication number
BR8605710A
BR8605710A BR8605710A BR8605710A BR8605710A BR 8605710 A BR8605710 A BR 8605710A BR 8605710 A BR8605710 A BR 8605710A BR 8605710 A BR8605710 A BR 8605710A BR 8605710 A BR8605710 A BR 8605710A
Authority
BR
Brazil
Prior art keywords
photoendurecible
composition
photosensitive material
photosensitive
photoendurecible composition
Prior art date
Application number
BR8605710A
Other languages
English (en)
Inventor
Peter Gottschalk
Douglas Carlyle Neckers
Gary Benjamin Schuster
Original Assignee
Mead Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from US06/917,873 external-priority patent/US4772541A/en
Application filed by Mead Corp filed Critical Mead Corp
Publication of BR8605710A publication Critical patent/BR8605710A/pt

Links

Classifications

    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • G03F7/025Non-macromolecular photopolymerisable compounds having carbon-to-carbon triple bonds, e.g. acetylenic compounds
    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09BORGANIC DYES OR CLOSELY-RELATED COMPOUNDS FOR PRODUCING DYES, e.g. PIGMENTS; MORDANTS; LAKES
    • C09B69/00Dyes not provided for by a single group of this subclass
    • C09B69/02Dyestuff salts, e.g. salts of acid dyes with basic dyes
    • C09B69/06Dyestuff salts, e.g. salts of acid dyes with basic dyes of cationic dyes with organic acids or with inorganic complex acids
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08FMACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F2/00Processes of polymerisation
    • C08F2/46Polymerisation initiated by wave energy or particle radiation
    • C08F2/48Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light
    • C08F2/50Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light with sensitising agents
    • FMECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F16ENGINEERING ELEMENTS AND UNITS; GENERAL MEASURES FOR PRODUCING AND MAINTAINING EFFECTIVE FUNCTIONING OF MACHINES OR INSTALLATIONS; THERMAL INSULATION IN GENERAL
    • F16HGEARING
    • F16H53/00Cams or cam-followers, e.g. rollers for gearing mechanisms
    • F16H53/02Single-track cams for single-revolution cycles; Camshafts with such cams
    • F16H53/025Single-track cams for single-revolution cycles; Camshafts with such cams characterised by their construction, e.g. assembling or manufacturing features
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/002Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor using materials containing microcapsules; Preparing or processing such materials, e.g. by pressure; Devices or apparatus specially designed therefor
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • G03F7/027Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • G03F7/027Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
    • G03F7/029Inorganic compounds; Onium compounds; Organic compounds having hetero atoms other than oxygen, nitrogen or sulfur
    • AHUMAN NECESSITIES
    • A61MEDICAL OR VETERINARY SCIENCE; HYGIENE
    • A61CDENTISTRY; APPARATUS OR METHODS FOR ORAL OR DENTAL HYGIENE
    • A61C13/00Dental prostheses; Making same
    • A61C13/0003Making bridge-work, inlays, implants or the like
    • A61C13/0006Production methods
    • A61C13/0013Production methods using stereolithographic techniques
    • AHUMAN NECESSITIES
    • A61MEDICAL OR VETERINARY SCIENCE; HYGIENE
    • A61CDENTISTRY; APPARATUS OR METHODS FOR ORAL OR DENTAL HYGIENE
    • A61C19/00Dental auxiliary appliances
    • A61C19/003Apparatus for curing resins by radiation

Landscapes

  • Chemical & Material Sciences (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Organic Chemistry (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Inorganic Chemistry (AREA)
  • Engineering & Computer Science (AREA)
  • General Engineering & Computer Science (AREA)
  • Polymers & Plastics (AREA)
  • Medicinal Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Mechanical Engineering (AREA)
  • Health & Medical Sciences (AREA)
  • Materials For Photolithography (AREA)
  • Non-Silver Salt Photosensitive Materials And Non-Silver Salt Photography (AREA)
BR8605710A 1985-11-20 1986-11-19 Composicao fotoendurecivel e material fotossensivel BR8605710A (pt)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US80001485A 1985-11-20 1985-11-20
US86036786A 1986-05-06 1986-05-06
US06/917,873 US4772541A (en) 1985-11-20 1986-10-10 Photohardenable compositions containing a dye borate complex and photosensitive materials employing the same

Publications (1)

Publication Number Publication Date
BR8605710A true BR8605710A (pt) 1987-08-18

Family

ID=27419957

Family Applications (1)

Application Number Title Priority Date Filing Date
BR8605710A BR8605710A (pt) 1985-11-20 1986-11-19 Composicao fotoendurecivel e material fotossensivel

Country Status (6)

Country Link
EP (2) EP0223587B1 (pt)
KR (1) KR940002538B1 (pt)
CN (1) CN86108826A (pt)
BR (1) BR8605710A (pt)
DE (2) DE3677527D1 (pt)
DK (1) DK553786A (pt)

Families Citing this family (195)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4977511A (en) * 1985-11-20 1990-12-11 The Mead Corporation Photosensitive materials containing ionic dye compound as initiators
JPS62232638A (ja) * 1986-04-02 1987-10-13 Brother Ind Ltd 感光感圧記録シ−ト
US4895880A (en) * 1986-05-06 1990-01-23 The Mead Corporation Photocurable compositions containing photobleachable ionic dye complexes
US4950581A (en) * 1987-07-06 1990-08-21 Fuji Photo Film Co., Ltd. Photopolymerizable composition
JPH07120036B2 (ja) * 1987-07-06 1995-12-20 富士写真フイルム株式会社 光重合性組成物
US4751102A (en) * 1987-07-27 1988-06-14 The Mead Corporation Radiation-curable ink and coating compositions containing ionic dye compounds as initiators
JPH0820732B2 (ja) * 1987-10-13 1996-03-04 富士写真フイルム株式会社 光重合性組成物
US4874685A (en) * 1987-11-27 1989-10-17 The Mead Corporation Photocurable composition containing a photoreducible dye a thiol and an N,N'-dialkylaniline
US4840866A (en) * 1988-03-24 1989-06-20 The Mead Corporation Microcapsule imaging system having improved dynamic range
US4859572A (en) * 1988-05-02 1989-08-22 Eastman Kodak Company Dye sensitized photographic imaging system
JP2641260B2 (ja) * 1988-07-26 1997-08-13 キヤノン株式会社 光重合開始剤及び感光性組成物
CN1043995A (zh) * 1988-10-11 1990-07-18 米德公司 通过控制粘度防止短时间倒易律失效
US4954414A (en) * 1988-11-08 1990-09-04 The Mead Corporation Photosensitive composition containing a transition metal coordination complex cation and a borate anion and photosensitive materials employing the same
CA2005933A1 (en) * 1989-01-09 1990-07-09 Jesse Hipps, Sr. Photohardenable composition containing five member aromatic group with imine moiety
JP2571115B2 (ja) * 1989-01-17 1997-01-16 富士写真フイルム株式会社 感光性組成物の増感方法及び増感された感光性組成物
US4954415A (en) * 1989-03-09 1990-09-04 The Mead Corporation Photoinitiator compositions containing O-acylthiohydroxamate or an N-alkoxypyridinethione and photohardenable compositions containing the same
CA2009652A1 (en) * 1989-03-09 1990-09-09 Paul Davis Photoinitiator compositions containing disulfides and photohardenable compositions containing the same
EP0390439A1 (en) * 1989-03-27 1990-10-03 The Mead Corporation Complexes useful as photoinitiators and photohardenable compositions containing the same
DE69030477T2 (de) * 1989-10-13 1997-08-28 Fuji Photo Film Co Ltd Einen Aluminatkomplex enthaltendes Bildaufzeichnungsmaterial
KR910012820A (ko) * 1989-12-20 1991-08-08 로레인 제이. 프란시스 황산화제 배합물을 함유하는 유리 라디칼 중합성 조성물
EP0438123B1 (en) * 1990-01-16 1995-09-13 Showa Denko Kabushiki Kaisha Near infrared polymerization initiator
EP0450254A1 (en) * 1990-04-03 1991-10-09 Ciba-Geigy Ag Photocurable compositions
JPH043064A (ja) * 1990-04-20 1992-01-08 Oriental Photo Ind Co Ltd 感光体
JP3244288B2 (ja) * 1990-07-23 2002-01-07 昭和電工株式会社 近赤外光消色型記録材料
TW207021B (pt) * 1990-07-23 1993-06-01 Showa Denko Kk
TW363999B (en) * 1991-06-04 1999-07-11 Vantico Ag Photosensitive compositions
GB9121789D0 (en) * 1991-10-14 1991-11-27 Minnesota Mining & Mfg Positive-acting photothermographic materials
US5773182A (en) 1993-08-05 1998-06-30 Kimberly-Clark Worldwide, Inc. Method of light stabilizing a colorant
US5733693A (en) 1993-08-05 1998-03-31 Kimberly-Clark Worldwide, Inc. Method for improving the readability of data processing forms
CA2120838A1 (en) 1993-08-05 1995-02-06 Ronald Sinclair Nohr Solid colored composition mutable by ultraviolet radiation
US5700850A (en) 1993-08-05 1997-12-23 Kimberly-Clark Worldwide Colorant compositions and colorant stabilizers
US5681380A (en) 1995-06-05 1997-10-28 Kimberly-Clark Worldwide, Inc. Ink for ink jet printers
US6017661A (en) 1994-11-09 2000-01-25 Kimberly-Clark Corporation Temporary marking using photoerasable colorants
US6211383B1 (en) 1993-08-05 2001-04-03 Kimberly-Clark Worldwide, Inc. Nohr-McDonald elimination reaction
US5645964A (en) 1993-08-05 1997-07-08 Kimberly-Clark Corporation Digital information recording media and method of using same
US5643356A (en) 1993-08-05 1997-07-01 Kimberly-Clark Corporation Ink for ink jet printers
US6017471A (en) 1993-08-05 2000-01-25 Kimberly-Clark Worldwide, Inc. Colorants and colorant modifiers
US5721287A (en) 1993-08-05 1998-02-24 Kimberly-Clark Worldwide, Inc. Method of mutating a colorant by irradiation
ES2127365T5 (es) * 1993-08-26 2002-08-16 Vantico Ag Composicion liquida reticulable por radiacion, destinada en especial a la estereolitografia.
US6033465A (en) 1995-06-28 2000-03-07 Kimberly-Clark Worldwide, Inc. Colorants and colorant modifiers
ATE193532T1 (de) * 1993-09-16 2000-06-15 Ciba Sc Holding Ag Vinyletherverbindungen mit zusätzlichen von vinylethergruppen verschiedenen funktionellen gruppen und deren verwendung zur formulierung härtbarer zusammensetzungen
US6242057B1 (en) 1994-06-30 2001-06-05 Kimberly-Clark Worldwide, Inc. Photoreactor composition and applications therefor
US5739175A (en) 1995-06-05 1998-04-14 Kimberly-Clark Worldwide, Inc. Photoreactor composition containing an arylketoalkene wavelength-specific sensitizer
US5685754A (en) 1994-06-30 1997-11-11 Kimberly-Clark Corporation Method of generating a reactive species and polymer coating applications therefor
US6071979A (en) 1994-06-30 2000-06-06 Kimberly-Clark Worldwide, Inc. Photoreactor composition method of generating a reactive species and applications therefor
US6008268A (en) 1994-10-21 1999-12-28 Kimberly-Clark Worldwide, Inc. Photoreactor composition, method of generating a reactive species, and applications therefor
JP3442176B2 (ja) 1995-02-10 2003-09-02 富士写真フイルム株式会社 光重合性組成物
TW418215B (en) 1995-03-13 2001-01-11 Ciba Sc Holding Ag A process for the production of three-dimensional articles in a stereolithography bath comprising the step of sequentially irradiating a plurality of layers of a liquid radiation-curable composition
US5811199A (en) 1995-06-05 1998-09-22 Kimberly-Clark Worldwide, Inc. Adhesive compositions containing a photoreactor composition
ES2148776T3 (es) 1995-06-05 2000-10-16 Kimberly Clark Co Pre-colorantes y compuestos que los contienen.
US5786132A (en) 1995-06-05 1998-07-28 Kimberly-Clark Corporation Pre-dyes, mutable dye compositions, and methods of developing a color
US5798015A (en) 1995-06-05 1998-08-25 Kimberly-Clark Worldwide, Inc. Method of laminating a structure with adhesive containing a photoreactor composition
US5747550A (en) 1995-06-05 1998-05-05 Kimberly-Clark Worldwide, Inc. Method of generating a reactive species and polymerizing an unsaturated polymerizable material
ATE226509T1 (de) * 1995-09-09 2002-11-15 Vantico Ltd Verfahren zum herstellung von polymerschichten mit selektiv gefärbten zonen
TW466256B (en) * 1995-11-24 2001-12-01 Ciba Sc Holding Ag Borate photoinitiator compounds and compositions comprising the same
TW467933B (en) * 1995-11-24 2001-12-11 Ciba Sc Holding Ag Photopolymerizable compositions comprising borate photoinitiators from monoboranes and the use thereof
US5855655A (en) 1996-03-29 1999-01-05 Kimberly-Clark Worldwide, Inc. Colorant stabilizers
US6099628A (en) 1996-03-29 2000-08-08 Kimberly-Clark Worldwide, Inc. Colorant stabilizers
MX9705708A (es) 1995-11-28 1997-10-31 Kimberly Clark Co Estabilizadores de colorante mejorados.
US5782963A (en) 1996-03-29 1998-07-21 Kimberly-Clark Worldwide, Inc. Colorant stabilizers
US5891229A (en) 1996-03-29 1999-04-06 Kimberly-Clark Worldwide, Inc. Colorant stabilizers
KR100491736B1 (ko) * 1996-07-29 2005-09-09 반티코 아게 입체리토그래피용방사선-경화성액체조성물
DE69710657T3 (de) 1996-08-23 2007-07-05 Showa Denko K.K. Photohärtbare Zusammensetzung und Härtungsverfahren
JPH10319584A (ja) * 1997-05-21 1998-12-04 Brother Ind Ltd マイクロカプセルを用いた感光性記録材料
US6524379B2 (en) 1997-08-15 2003-02-25 Kimberly-Clark Worldwide, Inc. Colorants, colorant stabilizers, ink compositions, and improved methods of making the same
DE69821190D1 (de) 1997-11-05 2004-02-26 Showa Denko Kk Photohärtbare Farbzusammensetzung für Strassenmarkierungen
JP2002505447A (ja) * 1998-02-25 2002-02-19 サイカラー インコーポレイテッド カプセルに封入した放射線感光性組成物を使用した画像形成システム
JPH11249304A (ja) * 1998-03-02 1999-09-17 Oriental Photo Ind Co Ltd 乾式画像形成材料及び乾式画像形成方法
US6100007A (en) 1998-04-06 2000-08-08 Ciba Specialty Chemicals Corp. Liquid radiation-curable composition especially for producing cured articles by stereolithography having high heat deflection temperatures
JP2002517540A (ja) 1998-06-03 2002-06-18 キンバリー クラーク ワールドワイド インコーポレイテッド インク及びインクジェット印刷用のネオナノプラスト及びマイクロエマルション技術
KR20010022593A (ko) 1998-06-03 2001-03-26 로날드 디. 맥크레이 신규 광개시제 및 그 이용
AU5219299A (en) 1998-07-20 2000-02-07 Kimberly-Clark Worldwide, Inc. Improved ink jet ink compositions
DE59903270D1 (de) * 1998-08-21 2002-12-05 Ciba Sc Holding Ag Photoaktivierbare stickstoffhaltige basen
US6398981B1 (en) 1998-09-18 2002-06-04 Universite Laval Photopolymerizable composition sensitive to light in a green to infrared region of the optical spectrum
ES2263291T3 (es) 1998-09-28 2006-12-01 Kimberly-Clark Worldwide, Inc. Quelatos que comprenden grupos quinoides como fotoiniciadores.
ATE265481T1 (de) * 1998-11-17 2004-05-15 Showa Denko Kk Photohärtbare zusammensetzung
AU2853000A (en) 1999-01-19 2000-08-01 Kimberly-Clark Worldwide, Inc. Novel colorants, colorant stabilizers, ink compositions, and improved methods ofmaking the same
US6331056B1 (en) 1999-02-25 2001-12-18 Kimberly-Clark Worldwide, Inc. Printing apparatus and applications therefor
US6174642B1 (en) 1999-02-25 2001-01-16 Cycolor, Inc. Imaging system employing encapsulated radiation sensitive composition
US6294698B1 (en) 1999-04-16 2001-09-25 Kimberly-Clark Worldwide, Inc. Photoinitiators and applications therefor
US6368395B1 (en) 1999-05-24 2002-04-09 Kimberly-Clark Worldwide, Inc. Subphthalocyanine colorants, ink compositions, and method of making the same
AU2001269905A1 (en) 2000-06-19 2002-01-08 Kimberly-Clark Worldwide, Inc. Novel photoinitiators and applications therefor
US6841589B2 (en) 2001-10-03 2005-01-11 3D Systems, Inc. Ultra-violet light curable hot melt composition
EP1456307B1 (en) 2001-10-03 2011-12-07 3D Systems, Inc. Phase change support material composition
KR100811393B1 (ko) * 2001-12-04 2008-03-07 주식회사 하이닉스반도체 패턴 붕괴 개선용 포토레지스트 첨가제 및 이를 함유하는포토레지스트 조성물
ES2405107T3 (es) 2002-05-03 2013-05-30 Dsm Ip Assets B.V. Composición de resina curable por radiación y procedimiento para la formación rápida de prototipos utilizando la misma
US6989225B2 (en) 2002-07-18 2006-01-24 3D Systems, Inc. Stereolithographic resins with high temperature and high impact resistance
US7635727B2 (en) 2003-06-24 2009-12-22 Ppg Industries Ohio, Inc. Composite transparencies
EP1622178A1 (en) * 2004-07-29 2006-02-01 Ecole Polytechnique Federale De Lausanne (Epfl) 2,2 -Bipyridine ligand, sensitizing dye and dye sensitized solar cell
DE102004058584A1 (de) 2004-12-03 2006-06-08 Basf Ag Strahlungshärtbare Beschichtungsmassen
US7591865B2 (en) 2005-01-28 2009-09-22 Saint-Gobain Abrasives, Inc. Method of forming structured abrasive article
US8287611B2 (en) 2005-01-28 2012-10-16 Saint-Gobain Abrasives, Inc. Abrasive articles and methods for making same
US8435098B2 (en) 2006-01-27 2013-05-07 Saint-Gobain Abrasives, Inc. Abrasive article with cured backsize layer
US20080103226A1 (en) 2006-10-31 2008-05-01 Dsm Ip Assets B.V. Photo-curable resin composition
CA2672243C (en) 2006-12-21 2012-04-03 Saint-Gobain Abrasives, Inc. Low corrosion abrasive articles and methods for forming same
IL200995A0 (en) 2008-10-01 2010-06-30 Bayer Materialscience Ag Polyether-based polyurethane formulations for the production of holographic media
JP5524218B2 (ja) 2008-10-01 2014-06-18 バイエル・マテリアルサイエンス・アクチェンゲゼルシャフト ホログラフィック媒体製造用のプレポリマー系ポリウレタン配合物
IL200996A0 (en) 2008-10-01 2010-06-30 Bayer Materialscience Ag Photopolymer formulations having a low crosslinking density
IL200997A0 (en) 2008-10-01 2010-06-30 Bayer Materialscience Ag Special polyether-based polyurethane formulations for the production of holographic media
IL200722A0 (en) 2008-10-01 2010-06-30 Bayer Materialscience Ag Photopolymer compositions for optical elements and visual displays
EP2218742A1 (de) 2009-02-12 2010-08-18 Bayer MaterialScience AG Photopolymerzusammensetzungen als verdruckbare Formulierungen
EP2218743A1 (de) 2009-02-12 2010-08-18 Bayer MaterialScience AG Prepolymerbasierte Polyurethanformulierungen zur Herstellung holographischer Filme
EP2219073B1 (de) 2009-02-17 2020-06-03 Covestro Deutschland AG Holografische Medien und Photopolymerzusammensetzungen
EP2406318B1 (en) 2009-03-13 2021-04-21 DSM IP Assets B.V. Radiation curable resin composition and rapid three-dimensional imaging process using the same
US20120237856A1 (en) 2009-11-03 2012-09-20 Bayer Intellectual Property Gmbh Selection method for additives in photopolymers
TWI488877B (zh) 2009-11-03 2015-06-21 Bayer Materialscience Ag 製造全像膜之方法
PL2496617T3 (pl) 2009-11-03 2015-07-31 Bayer Ip Gmbh Uretany jako dodatki w formulacji fotopolimerowej
KR101747467B1 (ko) 2009-11-03 2017-06-14 코베스트로 도이칠란드 아게 굴절률이 높고 이중 결합 밀도가 감소된 우레탄 아크릴레이트
EP2497082B1 (de) 2009-11-03 2013-09-04 Bayer Intellectual Property GmbH Fluorurethane als additive in einer photopolymer-formulierung
ES2381808T3 (es) 2009-11-03 2012-05-31 Bayer Materialscience Ag Formulaciones de fotopolímeros con módulo mecánico ajustable Guv
WO2011054797A1 (de) 2009-11-03 2011-05-12 Bayer Materialscience Ag Photopolymer-formulierung mit verschiedenen schreibcomonomeren
CN102666469B (zh) 2009-11-03 2016-03-02 拜尔材料科学股份公司 新型非结晶甲基丙烯酸酯、其的制备和应用
EP2354845B1 (de) 2010-02-02 2015-12-23 Covestro Deutschland AG Photopolymer-Formulierung zur Herstellung holographischer Medien
CN102763037A (zh) 2010-02-02 2012-10-31 拜耳知识产权有限责任公司 具有三嗪基书写单体的光聚合物配制品
CN102754026B (zh) 2010-02-02 2015-10-07 拜耳知识产权有限责任公司 具有酯基书写单体的光聚合物制剂
EP2330461A1 (de) 2010-03-26 2011-06-08 Bayer MaterialScience AG Projektionseinrichtung für einen Picoprojektor und holographischer Projektionsschirm
WO2012020061A1 (de) 2010-08-11 2012-02-16 Bayer Materialscience Ag Difunktionelle (meth)-acrylat-schreibmonomere
EP2450893A1 (de) 2010-11-08 2012-05-09 Bayer MaterialScience AG Photopolymer-Formulierung zur Herstellung holographischer Medien mit hoch vernetzten Matrixpolymeren
EP2450387A1 (de) 2010-11-08 2012-05-09 Bayer MaterialScience AG Photopolymer-Formulierung für die Herstellung holographischer Medien
US8460451B2 (en) 2011-02-23 2013-06-11 3D Systems, Inc. Support material and applications thereof
US9394441B2 (en) 2011-03-09 2016-07-19 3D Systems, Inc. Build material and applications thereof
US9157007B2 (en) 2011-03-09 2015-10-13 3D Systems, Incorporated Build material and applications thereof
US20120295999A1 (en) * 2011-05-16 2012-11-22 Deepak Shukla Photoinitiator and photocurable compositions and uses
US9475889B2 (en) 2011-05-16 2016-10-25 Eastman Kodak Company Photoinitiator and photocurable compositions and uses
JP2014535072A (ja) 2011-10-12 2014-12-25 バイエル・インテレクチュアル・プロパティ・ゲゼルシャフト・ミット・ベシュレンクテル・ハフツングBayer Intellectual Property GmbH ポリウレタン系フォトポリマー処方物における連鎖移動剤
EP2766902A1 (de) 2011-10-12 2014-08-20 Bayer Intellectual Property GmbH Schwefelhaltige kettenübertragungsreagenzien in polyurethan-basierten photopolymer-formulierungen
PL2613318T3 (pl) 2012-01-05 2014-12-31 Bayer Ip Gmbh Struktura warstwowa z warstwą ochronną i naświetloną warstwą fotopolimerową
TWI557187B (zh) 2012-05-03 2016-11-11 拜耳材料科學股份有限公司 用於光聚合物之新穎光起始劑
EP2700510B1 (de) 2012-08-23 2015-09-16 Bayer MaterialScience AG Polycarbonatbasierte Sicherheits- und/oder Wertdokumente mit Hologramm im Kartenkörper
KR102089118B1 (ko) 2012-08-23 2020-03-13 코베스트로 도이칠란드 아게 홀로그램을 갖는 시각적으로 변화가능한 윈도우를 함유하는 보안 문서 및/또는 중요 문서
US8980406B2 (en) 2012-08-28 2015-03-17 3D Systems, Inc. Color stable inks and applications thereof
US9657186B2 (en) 2012-09-13 2017-05-23 3D Systems, Inc. Opaque inks and applications thereof
JP2016511712A (ja) 2013-01-25 2016-04-21 バイエル・マテリアルサイエンス・アクチェンゲゼルシャフトBayer MaterialScience AG 体積ホログラムと印刷されたフィーチャを有するセキュリティ要素
EP2772917A1 (de) 2013-02-27 2014-09-03 Bayer MaterialScience AG Schutzlacke auf Basis von strahlenvernetzbaren Polyurethandispersionen
TWI640428B (zh) 2013-02-27 2018-11-11 拜耳材料科學股份有限公司 以丙烯酸酯為基底之保護塗層與黏著劑
US9353284B2 (en) 2013-03-15 2016-05-31 3D Systems, Inc. Three dimensional printing material system and method
JP6497850B2 (ja) 2013-05-08 2019-04-10 コベストロ、ドイチュラント、アクチエンゲゼルシャフトCovestro Deutschland Ag ハロー防止層を有するホログラフィック記録媒体およびその製造
ES2679543T3 (es) 2013-10-17 2018-08-28 Covestro Deutschland Ag Formulación de fotopolímero para la fabricación de medios holográficos con boratos con TG baja
EP3063762B1 (de) 2013-10-30 2018-07-04 Covestro Deutschland AG Verbund umfassend ein substrat und einen photopolymerfilm
CN106030711B (zh) 2013-12-20 2019-02-22 科思创德国股份有限公司 具有改进的光敏性的全息介质
WO2015100243A1 (en) 2013-12-23 2015-07-02 3D Systems, Inc. Three dimensional printing materials, systems, and methods
WO2015138567A1 (en) 2014-03-11 2015-09-17 3D Systems, Incorporated 3d printing colorization
US9921473B2 (en) 2014-04-25 2018-03-20 Covestro Deutschland Ag Aromatic glycol ethers as writing monomers in holographic photopolymer formulations
EP3148782B1 (en) 2014-05-30 2019-05-08 3D Systems, Incorporated Water dispersible support materials for 3d printing
EP3540017B1 (en) 2014-06-04 2021-10-27 3D Systems, Inc. Inks comprising gellants for 3d printing
US9827712B2 (en) 2014-06-09 2017-11-28 3D Systems, Inc. Method of printing grayscale and full-color 3D articles
US9650526B2 (en) 2014-09-09 2017-05-16 3D Systems, Inc. Method of printing a three-dimensional article
KR101989717B1 (ko) 2014-11-24 2019-06-14 3디 시스템즈 인코오퍼레이티드 3d 인쇄를 위한 액체 고무를 포함하는 잉크
WO2016091965A1 (de) 2014-12-12 2016-06-16 Covestro Deutschland Ag Naphthylacrylate als schreibmonomere für photopolymere
US10329244B2 (en) 2014-12-19 2019-06-25 Covestro Deutschland Ag Moisture-stable holographic media
TWI698326B (zh) 2015-01-14 2020-07-11 德商科思創德意志股份有限公司 以全相光學元件製備光學鑄件之方法及光學鑄件
CN107750246B (zh) 2015-06-23 2021-10-22 科思创德国股份有限公司 取代三嗪
US10435573B2 (en) 2015-11-03 2019-10-08 3D Systems, Inc. Biocompatible inks for 3D printing
EP3166109A1 (de) 2015-11-09 2017-05-10 Covestro Deutschland AG Kit-of-parts enthaltend versiegellungsschicht und photopolymer
EP3950855A1 (en) 2016-03-08 2022-02-09 3D Systems, Incorporated Non-isocyanate polyurethane inks for 3d printing
CN109196062B (zh) 2016-04-07 2023-06-06 3D系统公司 用于3d印刷的硫醇-烯油墨
EP3538534B1 (de) 2016-11-09 2020-09-16 Covestro Intellectual Property GmbH & Co. KG Verfahren zur herstellung von triaryl-organoboraten
WO2018087064A1 (de) 2016-11-09 2018-05-17 Covestro Deutschland Ag Verfahren zur herstellung von triaryl-organoboraten
US11242360B2 (en) 2016-11-09 2022-02-08 Covestro Deutschland Ag Process for the manufacturing of triaryl-organo borates
EP4140694A1 (en) 2017-02-01 2023-03-01 3D Systems, Inc. Method of 3d printing using 3d printing ink containing a cyclopolymerizable monomer
WO2018206503A1 (de) 2017-05-09 2018-11-15 Covestro Deutschland Ag Holographisches medium enthaltend eine photopolymerschicht zur holographischen belichtung und eine lackschicht hoher beständigkeit
EP3401910A1 (de) 2017-05-09 2018-11-14 Covestro Deutschland AG Holographisches medium enthaltend eine photopolymerschicht zur holographischen belichtung und eine lackschicht hoher beständigkeit
TW201906882A (zh) 2017-05-09 2019-02-16 德商科思創德意志股份有限公司 含有用於全像照射的光聚合物層及高度耐性漆層之薄膜結構
TW201906730A (zh) 2017-05-09 2019-02-16 德商科思創德意志股份有限公司 用於保護光聚合物膜複合物中之全像圖之含uv硬化性黏著層的塑膠膜
EP3401909A1 (de) 2017-05-09 2018-11-14 Covestro Deutschland AG Folienaufbau enthaltend eine photopolymerschicht zur holographischen belichtung und eine lackschicht hoher beständigkeit
US11640136B2 (en) 2017-05-09 2023-05-02 Covestro Deutschland Ag System consisting of two UV-curing dry-transfer coating layers for the protection of a hologram in a photopolymer film composite
EP3435156A1 (de) 2017-07-26 2019-01-30 Covestro Deutschland AG Schutzschicht für photopolymer
JP7062778B2 (ja) 2017-10-05 2022-05-06 スリーディー システムズ インコーポレーテッド 3dプリント用の環化重合性化合物
US11384250B2 (en) 2017-11-07 2022-07-12 3D Systems, Inc. Inks for 3D printing having low print through depth
EP3495886A1 (de) 2017-12-06 2019-06-12 Covestro Deutschland AG Klebstofffreier photopolymerschichtaufbau
WO2019245845A1 (en) 2018-06-22 2019-12-26 3D Systems, Inc. 3d printing build materials and support materials comprising a phosphor
US11247386B2 (en) 2018-06-22 2022-02-15 3D Systems, Inc. Method of verifying integrity of a post-process removal of support material
EP3887126A1 (en) 2018-11-30 2021-10-06 3D Systems, Inc. Inks for 3d printing having low polymerization shrinkage
US11718743B2 (en) 2019-07-12 2023-08-08 3D Systems, Inc. Build materials for 3D printing
EP3772671A1 (de) 2019-08-06 2021-02-10 Covestro Deutschland AG Schichtaufbau für die belichtung von hologrammen
EP4038151A1 (en) 2019-10-01 2022-08-10 3D Systems, Inc. Optically active build materials for 3d printing
WO2021067540A1 (en) 2019-10-01 2021-04-08 3D Systems, Inc. Shelf-stable build materials for 3d printing
US11701838B2 (en) 2020-01-24 2023-07-18 3D Systems, Inc. Water soluble waxy support materials for three-dimensional printing applications
EP4244066A1 (en) 2020-11-16 2023-09-20 3D Systems, Inc. Build materials for printing 3d articles
JP7662790B2 (ja) 2020-12-10 2025-04-15 スリーディー システムズ インコーポレーテッド 難燃性造形材料および関連するプリントされた3d物品
WO2022192317A1 (en) 2021-03-10 2022-09-15 3D Systems, Inc. Additives for build materials and associated printed 3d articles
JP7700253B2 (ja) 2021-03-10 2025-06-30 スリーディー システムズ インコーポレーテッド 耐炎性造形材料および関連するプリントされた3d物品
WO2022235893A1 (en) 2021-05-07 2022-11-10 3D Systems, Inc. Additives for build materials and associated printed 3d articles
JP2024536807A (ja) 2021-09-21 2024-10-08 スリーディー システムズ インコーポレーテッド 生物医学的用途のための硬化性化合物および配合物
WO2023156484A1 (de) 2022-02-21 2023-08-24 Covestro Deutschland Ag Photopolymerzusammensetzungen für thermostabile photopolymere im sichtbaren spektralbereich
WO2023156485A1 (de) 2022-02-21 2023-08-24 Covestro Deutschland Ag Triarylalkylboratsalze als coinitiatoren in nir-photopolymerzusammensetzungen
JP2025507602A (ja) 2022-02-21 2025-03-21 コベストロ、ドイチュラント、アクチエンゲゼルシャフト 可視スペクトル範囲の熱安定性フォトポリマーおよびそれを含有するフォトポリマー組成物
US12384935B2 (en) 2022-07-15 2025-08-12 3D Systems, Inc. Hydrogels for 3D printing having high resolution
JP2025532501A (ja) 2022-09-07 2025-10-01 コベストロ、ドイチュラント、アクチエンゲゼルシャフト フォトポリマー組成物のための染料としての特定のベンゾピリリウム塩
EP4630503A1 (en) 2022-12-09 2025-10-15 3D Systems, Inc. Inks for 3d printing having high modulus and dispersion stability
CN121079366A (zh) 2023-03-08 2025-12-05 3D系统公司 用于构建材料的添加剂和相关的印刷3d制品
US20250144872A1 (en) 2023-11-03 2025-05-08 3D Systems, Inc. Water dispersible build materials for molding applications
WO2025155855A1 (en) 2024-01-17 2025-07-24 3D Systems, Inc. Systems, methods, and compositions for additive manufacturing
EP4632020A1 (en) 2024-04-12 2025-10-15 3D Systems, Incorporated Methods and compositions for additive manufacturing having high water permeability
US20250340689A1 (en) 2024-05-02 2025-11-06 3D Systems, Inc. Compositions and methods for 3d printing for molding applications

Family Cites Families (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3567453A (en) * 1967-12-26 1971-03-02 Eastman Kodak Co Light sensitive compositions for photoresists and lithography
JPS509178B1 (pt) * 1970-12-28 1975-04-10
US4026705A (en) * 1975-05-02 1977-05-31 General Electric Company Photocurable compositions and methods
US4343891A (en) * 1980-05-23 1982-08-10 Minnesota Mining And Manufacturing Company Fixing of tetra (hydrocarbyl) borate salt imaging systems
US4447521A (en) * 1982-10-25 1984-05-08 Minnesota Mining And Manufacturing Company Fixing of tetra(hydrocarbyl)borate salt imaging systems
US4746685A (en) * 1984-08-31 1988-05-24 Nippon Oil And Fats Co., Ltd. Light curable dental composition
JPS61213838A (ja) * 1985-03-20 1986-09-22 Nippon Oil & Fats Co Ltd 感光性平版印刷版
GB8529448D0 (en) * 1985-11-29 1986-01-08 Ward Blenkinsop & Co Ltd Thioxanthone derivatives

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DK553786D0 (da) 1986-11-19
DE3650107D1 (de) 1994-11-24
EP0389067A2 (en) 1990-09-26
CN86108826A (zh) 1987-11-25
DE3650107T2 (de) 1995-05-24
DE3677527D1 (de) 1991-03-21
DK553786A (da) 1987-05-21
EP0223587A1 (en) 1987-05-27
EP0223587B1 (en) 1991-02-13
KR870005270A (ko) 1987-06-05

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