BR0211921B1 - óxidos e sulfetos de mono- e bis-acilfosfina batocrÈmicos e seus usos, seus processos de preparação, sua composição forocurável, processo para fotopolimerização de compostos monoméricos, oligoméricos ou poliméricos não voláteis e substrato revestido. - Google Patents
óxidos e sulfetos de mono- e bis-acilfosfina batocrÈmicos e seus usos, seus processos de preparação, sua composição forocurável, processo para fotopolimerização de compostos monoméricos, oligoméricos ou poliméricos não voláteis e substrato revestido.Info
- Publication number
- BR0211921B1 BR0211921B1 BRPI0211921-8A BR0211921A BR0211921B1 BR 0211921 B1 BR0211921 B1 BR 0211921B1 BR 0211921 A BR0211921 A BR 0211921A BR 0211921 B1 BR0211921 B1 BR 0211921B1
- Authority
- BR
- Brazil
- Prior art keywords
- sub
- forcurable
- batocratic
- oligomeric
- sulfides
- Prior art date
Links
- 238000000034 method Methods 0.000 title 1
- 229920000642 polymer Polymers 0.000 title 1
- 238000002360 preparation method Methods 0.000 title 1
- 239000000758 substrate Substances 0.000 title 1
- 150000003568 thioethers Chemical class 0.000 title 1
- 125000000217 alkyl group Chemical group 0.000 abstract 4
- 229910052736 halogen Inorganic materials 0.000 abstract 3
- 150000002367 halogens Chemical class 0.000 abstract 3
- 229910052739 hydrogen Inorganic materials 0.000 abstract 3
- 239000001257 hydrogen Substances 0.000 abstract 3
- 150000002431 hydrogen Chemical class 0.000 abstract 2
- 229910052760 oxygen Inorganic materials 0.000 abstract 2
- 229910052717 sulfur Inorganic materials 0.000 abstract 2
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 abstract 1
- 150000001875 compounds Chemical class 0.000 abstract 1
- 125000004430 oxygen atom Chemical group O* 0.000 abstract 1
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 abstract 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07F—ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
- C07F9/00—Compounds containing elements of Groups 5 or 15 of the Periodic Table
- C07F9/02—Phosphorus compounds
- C07F9/28—Phosphorus compounds with one or more P—C bonds
- C07F9/50—Organo-phosphines
- C07F9/53—Organo-phosphine oxides; Organo-phosphine thioxides
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07F—ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
- C07F9/00—Compounds containing elements of Groups 5 or 15 of the Periodic Table
- C07F9/02—Phosphorus compounds
- C07F9/28—Phosphorus compounds with one or more P—C bonds
- C07F9/30—Phosphinic acids [R2P(=O)(OH)]; Thiophosphinic acids ; [R2P(=X1)(X2H) (X1, X2 are each independently O, S or Se)]
- C07F9/32—Esters thereof
- C07F9/3205—Esters thereof the acid moiety containing a substituent or a structure which is considered as characteristic
- C07F9/3247—Esters of acids containing the structure -C(=X)-P(=X)(R)(XH) or NC-P(=X)(R)(XH), (X = O, S, Se)
- C07F9/3252—Esters of acids containing the structure -C(=X)-P(=X)(R)(XH) or NC-P(=X)(R)(XH), (X = O, S, Se) containing the structure -C(=X)-P(=X)(R)(XR), (X = O, S, Se)
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07F—ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
- C07F9/00—Compounds containing elements of Groups 5 or 15 of the Periodic Table
- C07F9/02—Phosphorus compounds
- C07F9/28—Phosphorus compounds with one or more P—C bonds
- C07F9/50—Organo-phosphines
- C07F9/53—Organo-phosphine oxides; Organo-phosphine thioxides
- C07F9/5337—Phosphine oxides or thioxides containing the structure -C(=X)-P(=X) or NC-P(=X) (X = O, S, Se)
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07F—ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
- C07F9/00—Compounds containing elements of Groups 5 or 15 of the Periodic Table
- C07F9/02—Phosphorus compounds
- C07F9/547—Heterocyclic compounds, e.g. containing phosphorus as a ring hetero atom
- C07F9/553—Heterocyclic compounds, e.g. containing phosphorus as a ring hetero atom having one nitrogen atom as the only ring hetero atom
- C07F9/572—Five-membered rings
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07F—ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
- C07F9/00—Compounds containing elements of Groups 5 or 15 of the Periodic Table
- C07F9/02—Phosphorus compounds
- C07F9/547—Heterocyclic compounds, e.g. containing phosphorus as a ring hetero atom
- C07F9/6527—Heterocyclic compounds, e.g. containing phosphorus as a ring hetero atom having nitrogen and oxygen atoms as the only ring hetero atoms
- C07F9/6533—Six-membered rings
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F2/00—Processes of polymerisation
- C08F2/46—Polymerisation initiated by wave energy or particle radiation
- C08F2/48—Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light
- C08F2/50—Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light with sensitising agents
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
- G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
- G03F7/029—Inorganic compounds; Onium compounds; Organic compounds having hetero atoms other than oxygen, nitrogen or sulfur
Landscapes
- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Health & Medical Sciences (AREA)
- Life Sciences & Earth Sciences (AREA)
- Biochemistry (AREA)
- General Health & Medical Sciences (AREA)
- Molecular Biology (AREA)
- Crystallography & Structural Chemistry (AREA)
- Physics & Mathematics (AREA)
- Polymers & Plastics (AREA)
- Medicinal Chemistry (AREA)
- Inorganic Chemistry (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Spectroscopy & Molecular Physics (AREA)
- General Physics & Mathematics (AREA)
- Polymerisation Methods In General (AREA)
- Pharmaceuticals Containing Other Organic And Inorganic Compounds (AREA)
- Paints Or Removers (AREA)
- Inks, Pencil-Leads, Or Crayons (AREA)
- Nitrogen Condensed Heterocyclic Rings (AREA)
- Medicines That Contain Protein Lipid Enzymes And Other Medicines (AREA)
- Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
- Polymers With Sulfur, Phosphorus Or Metals In The Main Chain (AREA)
- Dental Preparations (AREA)
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CH15422001 | 2001-08-21 | ||
| PCT/EP2002/009045 WO2003019295A1 (en) | 2001-08-21 | 2002-08-13 | Bathochromic mono- and bis-acylphosphine oxides and sulfides and their use as photoinitiators |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| BR0211921A BR0211921A (pt) | 2004-10-26 |
| BR0211921B1 true BR0211921B1 (pt) | 2012-05-02 |
Family
ID=4565544
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| BRPI0211921-8A BR0211921B1 (pt) | 2001-08-21 | 2002-08-13 | óxidos e sulfetos de mono- e bis-acilfosfina batocrÈmicos e seus usos, seus processos de preparação, sua composição forocurável, processo para fotopolimerização de compostos monoméricos, oligoméricos ou poliméricos não voláteis e substrato revestido. |
Country Status (13)
| Country | Link |
|---|---|
| US (1) | US7148382B2 (pt) |
| EP (1) | EP1423757B1 (pt) |
| JP (1) | JP4225898B2 (pt) |
| KR (1) | KR100903939B1 (pt) |
| CN (1) | CN100437354C (pt) |
| AT (1) | ATE430329T1 (pt) |
| BR (1) | BR0211921B1 (pt) |
| CA (1) | CA2454914A1 (pt) |
| DE (1) | DE60232160D1 (pt) |
| DK (1) | DK1423757T3 (pt) |
| ES (1) | ES2324983T3 (pt) |
| MX (1) | MXPA04001483A (pt) |
| WO (1) | WO2003019295A1 (pt) |
Families Citing this family (102)
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|---|---|---|---|---|
| DE10206096A1 (de) * | 2002-02-13 | 2003-08-14 | Basf Ag | Mono- und Bisacylphosphinderivate |
| WO2005029188A1 (ja) * | 2003-09-24 | 2005-03-31 | Hitachi Chemical Co., Ltd. | 感光性エレメント、レジストパターンの形成方法及びプリント配線板の製造方法 |
| US7642296B2 (en) | 2004-04-19 | 2010-01-05 | Ciba Specialty Chemicals Corporation | Photoinitiators |
| EP1814891B1 (en) * | 2004-11-23 | 2011-01-26 | Basf Se | Bisacylphosphanes and their use as photoinitiators; process for preparing acylphosphanes |
| WO2006074983A1 (en) * | 2005-01-17 | 2006-07-20 | Ciba Specialty Chemicals Holding Inc. | Process for preparing acylphosphanes and their oxides and sulphides |
| DE502005006753D1 (de) | 2005-08-01 | 2009-04-16 | Ivoclar Vivadent Ag | Photopolymerisierbare Dentalmaterialien mit Bisacylphosphinoxiden als Initiator |
| DE102006050153A1 (de) | 2006-10-25 | 2008-05-08 | Ivoclar Vivadent Ag | Mikroverkapselte Photoinitiatoren und deren Verwendung für Dentalmaterialien |
| DE102009016025B4 (de) | 2009-04-02 | 2014-12-11 | Voco Gmbh | Kunststoffmodifizierter Glasionomerzement, seine Verwendung sowie Verfahren zu seiner Herstellung |
| WO2010121387A1 (en) * | 2009-04-20 | 2010-10-28 | ETH Zürich | Polymer nanoparticles |
| JP5832430B2 (ja) | 2009-07-06 | 2015-12-16 | ビーエーエスエフ ソシエタス・ヨーロピアＢａｓｆ Ｓｅ | ポリマーに固定されたビスアシルホスフィンオキシド |
| JP5701576B2 (ja) | 2009-11-20 | 2015-04-15 | 富士フイルム株式会社 | 分散組成物及び感光性樹脂組成物、並びに固体撮像素子 |
| DE102010003881A1 (de) | 2010-04-12 | 2011-10-13 | Voco Gmbh | Dentale Abdeckmasse |
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| JP5544239B2 (ja) | 2010-07-29 | 2014-07-09 | 富士フイルム株式会社 | 重合性組成物 |
| JP5688939B2 (ja) * | 2010-09-16 | 2015-03-25 | クラレノリタケデンタル株式会社 | ビスアシルホスフィンオキサイド化合物及びそれを含む重合性組成物 |
| EP2436365B1 (de) | 2010-09-30 | 2017-03-08 | VOCO GmbH | Kompositmaterial umfassend ein Monomer mit einem polyalicyclischen Strukturelement |
| US8697769B2 (en) | 2010-09-30 | 2014-04-15 | Voco Gmbh | Lacquer composition comprising a monomer with a polyalicyclic structure element |
| EP2436366B1 (de) | 2010-09-30 | 2015-07-29 | VOCO GmbH | Kompositmaterial umfassend ein Monomer mit einem polyalicyclischen Strukturelement als Versiegelungsmaterial |
| EP2436668B1 (de) | 2010-09-30 | 2012-09-12 | VOCO GmbH | Polymerisierbare Verbindungen umfassend ein polyalicyclisches Strukturelement |
| US8915736B2 (en) | 2010-09-30 | 2014-12-23 | Voco Gmbh | Composition comprising a monomer with a polyalicyclic structure element for filling and/or sealing a root canal |
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| EP2472330B1 (en) | 2010-12-28 | 2017-01-25 | Fujifilm Corporation | Black radiation-sensitive composition, black cured film, solid-state imaging element, and method of producing black cured film |
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| EP2715416B1 (en) | 2011-09-14 | 2019-10-30 | FUJIFILM Corporation | Colored radiation-sensitive composition for color filter, pattern forming method, color filter and method of producing the same, and solid-state image sensor |
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| DE2909994A1 (de) * | 1979-03-14 | 1980-10-02 | Basf Ag | Acylphosphinoxidverbindungen, ihre herstellung und verwendung |
| DE2909992A1 (de) | 1979-03-14 | 1980-10-02 | Basf Ag | Photopolymerisierbare aufzeichnungsmassen, insbesondere zur herstellung von druckplatten und reliefformen |
| DE3139984A1 (de) | 1981-10-08 | 1983-04-28 | Basf Ag, 6700 Ludwigshafen | Verfahren zur herstellung von acylphosphinoxiden |
| DE3443221A1 (de) | 1984-11-27 | 1986-06-05 | ESPE Fabrik pharmazeutischer Präparate GmbH, 8031 Seefeld | Bisacylphosphinoxide, ihre herstellung und verwendung |
| US5218009A (en) * | 1989-08-04 | 1993-06-08 | Ciba-Geigy Corporation | Mono- and di-acylphosphine oxides |
| DE59201477D1 (de) | 1991-01-14 | 1995-04-06 | Ciba Geigy Ag | Bisacylphosphinsulfide. |
| EP0600373A1 (de) * | 1992-12-03 | 1994-06-08 | Hoechst Aktiengesellschaft | Arylphosphonsäurealkyl-arylester, Verfahren zu ihrer Herstellung und ihre Verwendung |
| SE520727C2 (sv) * | 1996-03-04 | 2003-08-19 | Ciba Sc Holding Ag | Alkylfenylbisacylfosfinoxid och fotoinitiatorblandningar |
| JPH10279787A (ja) * | 1997-04-09 | 1998-10-20 | Mitsubishi Eng Plast Kk | ポリカーボネート樹脂組成物 |
| ATE221893T1 (de) * | 1998-11-30 | 2002-08-15 | Ciba Sc Holding Ag | Verfahren zur herstellung von acylphosphinen und derivaten |
| GB2360283B (en) | 2000-02-08 | 2002-08-21 | Ciba Sc Holding Ag | Monoacylarylphosphines and acylphosphine oxides and sulphides |
| GB2365430B (en) | 2000-06-08 | 2002-08-28 | Ciba Sc Holding Ag | Acylphosphine photoinitiators and intermediates |
| CN1264876C (zh) | 2000-09-14 | 2006-07-19 | 西巴特殊化学品控股有限公司 | 在甲基丙烯酸酯铸模树脂中的酰基膦氧化物光引发剂 |
-
2002
- 2002-08-13 KR KR1020047002548A patent/KR100903939B1/ko not_active Expired - Lifetime
- 2002-08-13 AT AT02796226T patent/ATE430329T1/de not_active IP Right Cessation
- 2002-08-13 BR BRPI0211921-8A patent/BR0211921B1/pt not_active IP Right Cessation
- 2002-08-13 WO PCT/EP2002/009045 patent/WO2003019295A1/en not_active Ceased
- 2002-08-13 ES ES02796226T patent/ES2324983T3/es not_active Expired - Lifetime
- 2002-08-13 DE DE60232160T patent/DE60232160D1/de not_active Expired - Lifetime
- 2002-08-13 CN CNB028162811A patent/CN100437354C/zh not_active Expired - Lifetime
- 2002-08-13 US US10/485,836 patent/US7148382B2/en not_active Expired - Lifetime
- 2002-08-13 CA CA002454914A patent/CA2454914A1/en not_active Abandoned
- 2002-08-13 DK DK02796226T patent/DK1423757T3/da active
- 2002-08-13 EP EP02796226A patent/EP1423757B1/en not_active Expired - Lifetime
- 2002-08-13 MX MXPA04001483A patent/MXPA04001483A/es active IP Right Grant
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Also Published As
| Publication number | Publication date |
|---|---|
| EP1423757B1 (en) | 2009-04-29 |
| CN100437354C (zh) | 2008-11-26 |
| US20040204613A1 (en) | 2004-10-14 |
| ATE430329T1 (de) | 2009-05-15 |
| DE60232160D1 (de) | 2009-06-10 |
| JP4225898B2 (ja) | 2009-02-18 |
| EP1423757A1 (en) | 2004-06-02 |
| DK1423757T3 (da) | 2009-08-17 |
| BR0211921A (pt) | 2004-10-26 |
| KR100903939B1 (ko) | 2009-06-25 |
| CA2454914A1 (en) | 2003-03-06 |
| US7148382B2 (en) | 2006-12-12 |
| JP2005501124A (ja) | 2005-01-13 |
| KR20040028996A (ko) | 2004-04-03 |
| ES2324983T3 (es) | 2009-08-21 |
| CN1545643A (zh) | 2004-11-10 |
| WO2003019295A1 (en) | 2003-03-06 |
| MXPA04001483A (es) | 2004-07-30 |
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