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AU2110299A - Linear developer - Google Patents

Linear developer

Info

Publication number
AU2110299A
AU2110299A AU21102/99A AU2110299A AU2110299A AU 2110299 A AU2110299 A AU 2110299A AU 21102/99 A AU21102/99 A AU 21102/99A AU 2110299 A AU2110299 A AU 2110299A AU 2110299 A AU2110299 A AU 2110299A
Authority
AU
Australia
Prior art keywords
linear developer
developer
linear
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Abandoned
Application number
AU21102/99A
Inventor
Gregory M. Gibson
Carl W. Newquist
Ocie T. Snodgrass
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
FAStar Ltd
Original Assignee
FAStar Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by FAStar Ltd filed Critical FAStar Ltd
Publication of AU2110299A publication Critical patent/AU2110299A/en
Abandoned legal-status Critical Current

Links

Classifications

    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03DAPPARATUS FOR PROCESSING EXPOSED PHOTOGRAPHIC MATERIALS; ACCESSORIES THEREFOR
    • G03D5/00Liquid processing apparatus in which no immersion is effected; Washing apparatus in which no immersion is effected
    • G03D5/04Liquid processing apparatus in which no immersion is effected; Washing apparatus in which no immersion is effected using liquid sprays

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Cleaning Or Drying Semiconductors (AREA)
AU21102/99A 1998-01-09 1999-01-08 Linear developer Abandoned AU2110299A (en)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US7097198P 1998-01-09 1998-01-09
US60070971 1998-01-09
PCT/US1999/000494 WO1999035535A1 (en) 1998-01-09 1999-01-08 Linear developer

Publications (1)

Publication Number Publication Date
AU2110299A true AU2110299A (en) 1999-07-26

Family

ID=22098472

Family Applications (1)

Application Number Title Priority Date Filing Date
AU21102/99A Abandoned AU2110299A (en) 1998-01-09 1999-01-08 Linear developer

Country Status (4)

Country Link
JP (1) JP2002501298A (en)
KR (1) KR20010034009A (en)
AU (1) AU2110299A (en)
WO (1) WO1999035535A1 (en)

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3957983B2 (en) * 2001-03-01 2007-08-15 大日本スクリーン製造株式会社 Substrate developing device
EP1271250A3 (en) * 2001-06-21 2005-02-09 Agfa-Gevaert N.V. Method of developing a lithographic printing plate precursor
US6645699B2 (en) 2001-06-21 2003-11-11 Agfa-Gevaert Method of processing a lithographic printing plate precursor
US7018481B2 (en) 2002-01-28 2006-03-28 Kabushiki Kaisha Toshiba Substrate treating method, substrate-processing apparatus, developing method, method of manufacturing a semiconductor device, and method of cleaning a developing solution nozzle
JP5305330B2 (en) * 2008-06-13 2013-10-02 東京エレクトロン株式会社 Ultrasonic development processing method and ultrasonic development processing apparatus
US20100154826A1 (en) * 2008-12-19 2010-06-24 Tokyo Electron Limited System and Method For Rinse Optimization

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5309191A (en) * 1992-03-02 1994-05-03 Eastman Kodak Company Recirculation, replenishment, refresh, recharge and backflush for a photographic processing apparatus
US5625433A (en) * 1994-09-29 1997-04-29 Tokyo Electron Limited Apparatus and method for developing resist coated on a substrate
JP3227595B2 (en) * 1996-08-20 2001-11-12 東京エレクトロン株式会社 Development processing method and development processing apparatus

Also Published As

Publication number Publication date
WO1999035535A1 (en) 1999-07-15
JP2002501298A (en) 2002-01-15
KR20010034009A (en) 2001-04-25

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Legal Events

Date Code Title Description
MK6 Application lapsed section 142(2)(f)/reg. 8.3(3) - pct applic. not entering national phase