AU2110299A - Linear developer - Google Patents
Linear developerInfo
- Publication number
- AU2110299A AU2110299A AU21102/99A AU2110299A AU2110299A AU 2110299 A AU2110299 A AU 2110299A AU 21102/99 A AU21102/99 A AU 21102/99A AU 2110299 A AU2110299 A AU 2110299A AU 2110299 A AU2110299 A AU 2110299A
- Authority
- AU
- Australia
- Prior art keywords
- linear developer
- developer
- linear
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Abandoned
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03D—APPARATUS FOR PROCESSING EXPOSED PHOTOGRAPHIC MATERIALS; ACCESSORIES THEREFOR
- G03D5/00—Liquid processing apparatus in which no immersion is effected; Washing apparatus in which no immersion is effected
- G03D5/04—Liquid processing apparatus in which no immersion is effected; Washing apparatus in which no immersion is effected using liquid sprays
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Photosensitive Polymer And Photoresist Processing (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
- Cleaning Or Drying Semiconductors (AREA)
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US7097198P | 1998-01-09 | 1998-01-09 | |
| US60070971 | 1998-01-09 | ||
| PCT/US1999/000494 WO1999035535A1 (en) | 1998-01-09 | 1999-01-08 | Linear developer |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| AU2110299A true AU2110299A (en) | 1999-07-26 |
Family
ID=22098472
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| AU21102/99A Abandoned AU2110299A (en) | 1998-01-09 | 1999-01-08 | Linear developer |
Country Status (4)
| Country | Link |
|---|---|
| JP (1) | JP2002501298A (en) |
| KR (1) | KR20010034009A (en) |
| AU (1) | AU2110299A (en) |
| WO (1) | WO1999035535A1 (en) |
Families Citing this family (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP3957983B2 (en) * | 2001-03-01 | 2007-08-15 | 大日本スクリーン製造株式会社 | Substrate developing device |
| EP1271250A3 (en) * | 2001-06-21 | 2005-02-09 | Agfa-Gevaert N.V. | Method of developing a lithographic printing plate precursor |
| US6645699B2 (en) | 2001-06-21 | 2003-11-11 | Agfa-Gevaert | Method of processing a lithographic printing plate precursor |
| US7018481B2 (en) | 2002-01-28 | 2006-03-28 | Kabushiki Kaisha Toshiba | Substrate treating method, substrate-processing apparatus, developing method, method of manufacturing a semiconductor device, and method of cleaning a developing solution nozzle |
| JP5305330B2 (en) * | 2008-06-13 | 2013-10-02 | 東京エレクトロン株式会社 | Ultrasonic development processing method and ultrasonic development processing apparatus |
| US20100154826A1 (en) * | 2008-12-19 | 2010-06-24 | Tokyo Electron Limited | System and Method For Rinse Optimization |
Family Cites Families (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5309191A (en) * | 1992-03-02 | 1994-05-03 | Eastman Kodak Company | Recirculation, replenishment, refresh, recharge and backflush for a photographic processing apparatus |
| US5625433A (en) * | 1994-09-29 | 1997-04-29 | Tokyo Electron Limited | Apparatus and method for developing resist coated on a substrate |
| JP3227595B2 (en) * | 1996-08-20 | 2001-11-12 | 東京エレクトロン株式会社 | Development processing method and development processing apparatus |
-
1999
- 1999-01-08 JP JP2000527860A patent/JP2002501298A/en active Pending
- 1999-01-08 AU AU21102/99A patent/AU2110299A/en not_active Abandoned
- 1999-01-08 KR KR1020007007603A patent/KR20010034009A/en not_active Withdrawn
- 1999-01-08 WO PCT/US1999/000494 patent/WO1999035535A1/en not_active Application Discontinuation
Also Published As
| Publication number | Publication date |
|---|---|
| WO1999035535A1 (en) | 1999-07-15 |
| JP2002501298A (en) | 2002-01-15 |
| KR20010034009A (en) | 2001-04-25 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| MK6 | Application lapsed section 142(2)(f)/reg. 8.3(3) - pct applic. not entering national phase |