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AU2003302066A1 - Position measurement method, position measurement device, exposure method, and exposure device - Google Patents

Position measurement method, position measurement device, exposure method, and exposure device

Info

Publication number
AU2003302066A1
AU2003302066A1 AU2003302066A AU2003302066A AU2003302066A1 AU 2003302066 A1 AU2003302066 A1 AU 2003302066A1 AU 2003302066 A AU2003302066 A AU 2003302066A AU 2003302066 A AU2003302066 A AU 2003302066A AU 2003302066 A1 AU2003302066 A1 AU 2003302066A1
Authority
AU
Australia
Prior art keywords
position measurement
exposure
measurement device
measurement method
exposure device
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Abandoned
Application number
AU2003302066A
Inventor
Tsuneyuki Hagiwara
Naoto Kondo
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Nikon Corp
Original Assignee
Nikon Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nikon Corp filed Critical Nikon Corp
Publication of AU2003302066A1 publication Critical patent/AU2003302066A1/en
Abandoned legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
    • G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
    • G03F9/7003—Alignment type or strategy, e.g. leveling, global alignment
    • G03F9/7023—Aligning or positioning in direction perpendicular to substrate surface
    • G03F9/7026—Focusing

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Length Measuring Devices By Optical Means (AREA)
AU2003302066A 2002-11-20 2003-11-20 Position measurement method, position measurement device, exposure method, and exposure device Abandoned AU2003302066A1 (en)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2002-336778 2002-11-20
JP2002336778 2002-11-20
PCT/JP2003/014828 WO2004047156A1 (en) 2002-11-20 2003-11-20 Position measurement method, position measurement device, exposure method, and exposure device

Publications (1)

Publication Number Publication Date
AU2003302066A1 true AU2003302066A1 (en) 2004-06-15

Family

ID=32321815

Family Applications (1)

Application Number Title Priority Date Filing Date
AU2003302066A Abandoned AU2003302066A1 (en) 2002-11-20 2003-11-20 Position measurement method, position measurement device, exposure method, and exposure device

Country Status (3)

Country Link
JP (1) JPWO2004047156A1 (en)
AU (1) AU2003302066A1 (en)
WO (1) WO2004047156A1 (en)

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4942535B2 (en) * 2007-04-04 2012-05-30 大日本スクリーン製造株式会社 Position detection apparatus, pattern drawing apparatus, and position detection method
JP5447388B2 (en) * 2007-11-28 2014-03-19 株式会社ニコン Autofocus system with error compensation
NL1036558A1 (en) * 2008-03-25 2009-09-28 Asml Netherlands Bv Method and lithographic apparatus for acquiring height data related to a substrate surface.
JP2016015371A (en) * 2014-07-01 2016-01-28 ウシオ電機株式会社 Thickness measurement apparatus, thickness measurement method and exposure apparatus
US11513085B2 (en) * 2020-02-20 2022-11-29 Kla Corporation Measurement and control of wafer tilt for x-ray based metrology

Family Cites Families (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0652707B2 (en) * 1988-10-11 1994-07-06 キヤノン株式会社 Surface position detection method
US5124562A (en) * 1989-01-27 1992-06-23 Canon Kabushiki Kaisha Surface position detecting method at a predetermined and plurality of adjacent points
JPH05157058A (en) * 1991-12-02 1993-06-22 Koyo Seiko Co Ltd Vane pump
DE69329611T2 (en) * 1992-08-19 2001-05-03 Canon K.K., Tokio/Tokyo Method of registration by means of a projecting optical system, exposure apparatus for its implementation and semiconductor manufacturing method using this exposure apparatus
JPH10239015A (en) * 1997-02-27 1998-09-11 Nikon Corp Surface position detector
JP4392914B2 (en) * 1999-11-11 2010-01-06 キヤノン株式会社 Surface position detection apparatus, exposure apparatus, and device manufacturing method
JP2002270498A (en) * 2001-03-14 2002-09-20 Nikon Corp Exposure apparatus and exposure method

Also Published As

Publication number Publication date
JPWO2004047156A1 (en) 2006-03-23
WO2004047156B1 (en) 2004-07-29
WO2004047156A1 (en) 2004-06-03

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Legal Events

Date Code Title Description
MK6 Application lapsed section 142(2)(f)/reg. 8.3(3) - pct applic. not entering national phase